WO2004086389A1 - 波面収差補正装置及びこれを備えた光ピックアップ装置 - Google Patents
波面収差補正装置及びこれを備えた光ピックアップ装置 Download PDFInfo
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- WO2004086389A1 WO2004086389A1 PCT/JP2004/003100 JP2004003100W WO2004086389A1 WO 2004086389 A1 WO2004086389 A1 WO 2004086389A1 JP 2004003100 W JP2004003100 W JP 2004003100W WO 2004086389 A1 WO2004086389 A1 WO 2004086389A1
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- WIPO (PCT)
- Prior art keywords
- wavefront aberration
- light
- transparent electrode
- liquid crystal
- optical pickup
- Prior art date
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Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/12—Heads, e.g. forming of the optical beam spot or modulation of the optical beam
- G11B7/135—Means for guiding the beam from the source to the record carrier or from the record carrier to the detector
- G11B7/1392—Means for controlling the beam wavefront, e.g. for correction of aberration
- G11B7/13925—Means for controlling the beam wavefront, e.g. for correction of aberration active, e.g. controlled by electrical or mechanical means
- G11B7/13927—Means for controlling the beam wavefront, e.g. for correction of aberration active, e.g. controlled by electrical or mechanical means during transducing, e.g. to correct for variation of the spherical aberration due to disc tilt or irregularities in the cover layer thickness
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/12—Heads, e.g. forming of the optical beam spot or modulation of the optical beam
- G11B7/135—Means for guiding the beam from the source to the record carrier or from the record carrier to the detector
- G11B7/1365—Separate or integrated refractive elements, e.g. wave plates
- G11B7/1369—Active plates, e.g. liquid crystal panels or electrostrictive elements
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/133776—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers having structures locally influencing the alignment, e.g. unevenness
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
- G02F2201/38—Anti-reflection arrangements
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2203/00—Function characteristic
- G02F2203/18—Function characteristic adaptive optics, e.g. wavefront correction
Definitions
- the present invention relates to an optical pickup device for reading and writing recorded information from an optical disc, and more particularly, to a wavefront aberration correction device using liquid crystal and an optical pickup device including the wavefront aberration correction device.
- Optical discs such as CD (compact disc) and DVD (digital versatile disc) are known as information recording media for optical information recording or information reproduction.
- Various types of optical disks have been developed, such as a read-only optical disk, a write-once optical disk on which information can be additionally recorded, and a rewritable optical disk on which information can be erased and re-recorded.
- Non-Patent Document 1 research and development of high-performance optical pickup devices and information recording / reproducing devices have been promoted in order to cope with such high density and large capacity of optical disks.
- NA numerical aperture
- NA numerical aperture
- tilt angle When the incident angle of light with respect to the normal direction (so-called tilt angle) is tilted, the influence of coma aberration increases.
- the aberration varies depending on the substrate thickness of the optical disk, when the CD is thicker than the DVD, spherical aberration occurs when the CD is reproduced using an optical pickup device for reproducing the DVD.
- the spot diameter of the light is greatly expanded.
- such a liquid crystal element has a structure in which an ITO (hereinafter simply referred to as “ ⁇ ⁇ ”) layer, which is an oxide of indium and tin, and an alignment film layer are sequentially laminated.
- ⁇ ⁇ an ITO
- a pair of transparent glass substrates face each other, a liquid crystal layer is provided between the pair of transparent glass substrates, and at least one monochromatic light having an insulating film formed between the alignment film layer and the ITO layer on one of the transparent substrates.
- a liquid crystal element that modulates the phase of a laser beam in which the relationship between the thickness of each layer and the refractive index thereof is optimized in order to minimize the change in light transmittance of the liquid crystal element, is disclosed. (For example, see Patent Document 1).
- liquid crystal element that appropriately corrects wavefront aberration generated in an optical system without being affected by a quarter-wave plate disposed on an optical path from a light source through a recording medium to a photodetector (for example, see Patent Document 2).
- a technique using a liquid crystal substrate having a curved shape is disclosed, but such a curved shape cannot be said to contribute to an improvement in light transmittance.
- Non-Patent Document 1 Journal of the Japan Society of Mechanical Engineers 2001.4 Vol. 104 No. 989
- Patent Document 1 JP-A-2002-2081 58
- Patent Document 2 Japanese Patent Application Laid-Open No. 2000-205
- the light transmittance is an important factor for practical use of the optical pickup device. If a blue semiconductor laser, which is expected to be developed for high-density recording, is used as the light source in the future, the problem related to the fluctuation of the light transmittance of the liquid crystal element will be a major barrier to its practical use. It is highly likely that such problems will become more apparent as the trend toward more advanced technologies continues.
- the present invention has as its first object to provide a high transmittance and a wavefront aberration correction device including a liquid crystal element that minimizes fluctuations in light transmittance.
- the uneven portion is formed in a one-dimensional and / or two-dimensional shape.
- the antireflection member in the wavefront aberration correction device, is characterized in that the base is made of glass, and the microstructure is made of resin.
- the antireflection member in the wavefront aberration correction device, is characterized in that the base is made of resin, and the microstructure is made of glass.
- the light is a blue semiconductor laser beam.
- the second object is to provide a light source that emits light for irradiating a recording medium, and to converge light from the light source on an information recording surface of the recording medium.
- An optical pickup device comprising: an objective lens; and a wavefront aberration correction device disposed between the light source and the objective lens, the optical pickup device comprising: a pair of transparent lenses facing each other in an optical path in the optical pickup; An electrode layer; and a wavefront aberration corrector having a liquid crystal interposed between the transparent electrode films, which causes a phase change with respect to light passing therethrough by applying a voltage to the transparent electrode layer.
- At least one of the optical pickup device is disposed on an antireflection body comprising: a base; and a microstructure formed on the base and having an uneven portion. Achievement It is. ' ;
- the uneven portion is formed in a one-dimensional and / or two-dimensional shape.
- the base and the fine structure are both made of glass or resin, and the base and the fine structure are integrally formed. It is special ⁇ ⁇ .
- the antireflection body is characterized in that the base is made of glass, and the microstructure is made of resin.
- the transparent electrode layer is made of ITO, which is an oxide of indium and tin.
- the transparent electrode layer is divided into pixels.
- the light is a blue semiconductor laser beam.
- fine structure used in the present application means a structure having a fine structure of nanometer (1/100 million) level on its surface, but is not necessarily limited to the nanometer level. However, it also includes a structure having a fine structure at the 1 ⁇ level.
- FIG. 6 is a sectional view of a step for explaining one method of manufacturing an antireflection body according to the present invention.
- FIG. 7 is a cross-sectional view of a step illustrating another method for manufacturing an antireflection body according to the present invention.
- the arrows in FIG. 5 indicate the irradiation of the electron beam with the dose controlled.
- FIG. 9 is a diagram illustrating a configuration of an embodiment of an optical system of an optical pickup device including the wavefront aberration correction device according to the present invention.
- FIG. 10 shows that, in a liquid crystal element provided with an antireflection body having a fine structure according to the present invention, when the surface of the fine structure has periodic unevenness, the pitch width of the periodic unevenness is changed.
- FIG. 7 is a diagram showing a simulation result of light transmittance of the liquid crystal element in the case where the liquid crystal element is used. The simulation was performed with a light wavelength of 400 nm.
- FIG. 11 shows that, in a liquid crystal element including an antireflection body having a fine structure according to the present invention, when the surface of the fine structure has a periodic uneven portion, the depth of the periodic uneven portion is changed.
- FIG. 9 is a diagram showing a simulation result of light transmittance of the liquid crystal element in the case. The simulation was performed with a light wavelength of 400 nm.
- FIG. 12 is a diagram showing a simulation result of wavelength dependence of light transmittance in a comparison between a liquid crystal element having the antireflection body according to the present invention and a liquid crystal element having no antireflection body.
- FIG. 13 shows a liquid crystal element including the antireflection body according to the present invention, wherein the liquid crystal element has periodic irregularities on the surface of the antireflection body, and the pitch width of the periodic irregularities is changed.
- FIG. 9 is a view showing a simulation result of light transmittance of FIG. The simulation was performed with a light wavelength of 65 nm.
- FIG. 14 shows a liquid crystal device including the antireflection body according to the present invention, in which the antireflection body surface has periodic irregularities, and the liquid crystal element in the case where the pitch width of the periodic irregularities is changed.
- FIG. 9 is a diagram showing a simulation result of light transmittance of the present invention. The simulation was performed with a light wavelength of 780 nm.
- FIG. 15 is a diagram showing a simulation result of the light transmittance (TM) of the entire liquid crystal element including the antireflection body according to the present invention when the phase of the liquid crystal layer is changed by the applied voltage.
- TM light transmittance
- FIG. 16 is a diagram showing a simulation result of the light transmittance (TE) of the entire liquid crystal element including the antireflection body according to the present invention when the phase of the liquid crystal layer is changed by the applied voltage.
- TE light transmittance
- FIG. 2 is a cross-sectional view schematically showing the configuration of the wavefront aberration correction device 100 according to the present invention.
- the wavefront aberration correcting apparatus 100 according to the present invention is one in which liquid crystal molecules are sealed by a pair of substrates 110.
- the material of the base may be the same as or different from the material of the fine structure 120 described later.
- Specific examples of the material of the substrate are not limited to these, but glass and transparent resin are preferable.
- Specific examples of the resin include polymethyl methacrylate / polycarbonate.
- FIG. 3 is a schematic perspective view of one embodiment of the shape of the fine structure 120 according to the present invention.
- the fine structure 120 is formed on a base 110 as shown in FIG. 3, and an anti-reflection body 180 is formed from the base 110 and the fine structure 120.
- the substrate 110 and the fine structure 120 are separately illustrated.
- the antireflection member 1 is integrally formed.
- make up 80 the shape of the fine structure 120 illustrated in FIG. 3 is periodically formed in a one-dimensional shape, the concave and convex portions forming the one-dimensional shape are not necessarily formed periodically.
- the shape of the microstructure according to the present invention is a combination of the one-dimensional uneven shape illustrated in FIG. 3 and the two-dimensional uneven shape illustrated in FIG. It is possible to achieve the purpose of.
- one-dimensional used in the present application refers to a dimension in which the shape of the uneven portion of the surface changes in one direction
- two-dimensional used in the present application refers to the unevenness of the surface.
- the ITO film 130 is formed on the uneven portion by sputtering or electron beam evaporation. As a result, the ITO film 130 itself has a shape conforming to the shape of the concave portion. Therefore, as described later, it is possible to improve light transmittance by preventing light reflection.
- the transparent electrode film 130 is preferably formed to a thickness of about 10 to 50 nm in view of the necessity that the film itself has good transparency.
- FIG. 5 is a schematic view of one embodiment of a pixel-divided transparent electrode film used in the present invention. As shown in Fig. 5, the transparent electrode is concentric and radially divided, and by applying different levels of voltage to each divided electrode film, it is possible to obtain the voltage distribution applied to the liquid crystal become.
- the black part in FIG. 5 indicates the ITO film 130.
- the effect is that the refractive index effectively and continuously changes in the transition region.
- the phenomenon where the refractive index changes continuously and gradually is a phenomenon that occurs when the period of the concave and convex portions is smaller than the wavelength of light. Then, by utilizing this phenomenon, the antireflection effect of the antireflection body according to the present invention can be achieved.
- the pitch width of the irregularities on the surface of the microstructure 120 according to the present invention is different from the refractive index of the alignment film or the ITO film and the wavelength of light.
- the thickness is preferably 500 nm or less, more preferably 350 nm or less, and still more preferably It is less than 250 nm.
- the material of the fine structure according to the present invention is not limited to these, but is preferably glass or a transparent resin from the viewpoint of light transmittance.
- an anti-reflection body 180 comprising a base 110 and a microstructure 120 according to the present invention. 1
- the manufacturing method is not limited to these methods.
- FIG. 6 is a cross-sectional view of a process for explaining one method of manufacturing an antireflection body that can be used as a microstructure according to the present invention.
- the manufacturing method illustrated in FIG. 6 is a method for manufacturing a microstructure by repeating a lithography process.
- a resist film 420 is previously coated on a glass substrate 430, and exposed and developed through a mask 410 having a first predetermined pattern prepared in advance. Then, a pattern corresponding to the first resist pattern is formed on the glass substrate (see FIG. 6 (b)). Thereafter, as shown in FIG. 6 (c), the first pattern is formed on the glass substrate by etching the glass with an ion beam. Next, a resist 450 is formed on the entire surface of the glass substrate (see FIG. 6D). Then, the resist pattern 460 shown in FIG. 6E is formed on the glass substrate 430 by performing exposure and development through a mask 440 having a second pattern different from the first pattern. Next, the glass substrate is etched using an ion beam. By repeating the above steps as many times as necessary, an anti-reflection body 480 having a fine structure having an uneven portion on the surface is manufactured as shown in FIG. 6 (f).
- FIG. 7 is a cross-sectional view of a step for explaining another method for manufacturing an antireflection member having the fine structure according to the present invention.
- the manufacturing method shown in FIG. 7 is a manufacturing method based on a combination of use of a low ⁇ resist and control of a dose amount by electron beam drawing.
- a low ⁇ resist 510 is formed on a glass substrate 500.
- an electron beam of which dose is controlled is sequentially drawn on the resist portion from the end (see FIGS. 7B to 7E).
- the arrows in FIG. 7 indicate the above-described irradiation of the electron beam with the dose controlled.
- development is performed to form a resist film having a predetermined pattern on the glass substrate (see FIG. 7 (f)).
- an anti-reflection body 580 having a fine structure having an uneven portion on the surface can be manufactured as shown in FIG. 7 (g).
- the antireflection members 480 and 500 in which the substrate and the fine structure are in a body shape are manufactured. Further, by attaching a plate-shaped body made of resin to the lower part of the microstructure manufactured by the manufacturing method illustrated in FIGS. 6 and 7, the base is made of resin, and the microstructure is made of glass. An anti-reflective body having the above structure can be manufactured.
- FIG. 8 is a cross-sectional view of a step for explaining still another method for manufacturing an antireflection member having the fine structure according to the present invention.
- the manufacturing method illustrated in FIG. 8 can be obtained by a method of transferring a stamper, which is manufactured by an electrode and has a predetermined uneven portion on its surface, to a resin.
- a mold 600 in which a surface of a substrate having a fine pattern is subjected to a conductor treatment is nickel-electrode (reference numeral 61 in FIG. 8 (b)). 0), and the mold 600 is peeled off or dissolved from the substrate to obtain a stamper 630 having an uneven shape on the surface (see FIG. 8C). Then, as shown in FIG. 8 (d), by pressing the stamper 630 against the transparent resin 640, the shape of the surface of the stamper 640 is changed to the resin 640. Then, an antireflection body 680 having an uneven portion on the surface is manufactured. In addition, when the resin is heated when transferring the resin, the transfer proceeds more easily and quickly.
- an antireflection body composed of a glass substrate and a resin by attaching a glass substrate to the lower portion of the resin 644 thus transferred.
- the microstructure according to the present invention can be manufactured.
- the shape and size of the uneven portion on the surface of the microstructure are, specifically, the pitch width of the uneven portion is as described above. It can be manufactured to any size by controlling the mask pattern and electron beam spot diameter, as well as the accuracy of the stamper.
- the pitch width of the periodic structure of the irregularities on the surface of the microstructure according to the present invention is, as described above, the wavelength of light used for information reproduction on a recording medium. It is preferably smaller than.
- Figure 9 is a schematic illustration of a structure of one embodiment of an optical system of an optical pickup device 7 0 0 having a wavefront aberration correcting apparatus 1 0 0 according to the present invention.
- the optical path between the laser light source 7100 as the light source 7100 and the objective lens 7400 can be controlled by a collimator lens 720, a beam spiriter 7300, and a liquid crystal driving device 20.0.
- the wavefront aberration corrector 100 according to the present invention and the force are sequentially provided along the optical axis OA.
- a laser light source used in the present invention a near-infrared laser having a wavelength of 780 nm or a red laser having a wavelength of 650 nm, or a blue laser having a wavelength of around 400 nm is used.
- the wavefront aberration correction device according to the present invention can maximize the light use efficiency of a combination with a blue laser whose luminous efficiency is lower than that of a red laser.
- the light beam emitted from the light source 710 is reflected by the optical disk 750, and the reflected light beam on the return path is separated by the beam splitter 730 and condensed by the condenser lens 760.
- An image is formed on the photodetector 770 and received.
- the photodetector 770 outputs an aberration correction signal 7 from the liquid crystal driving device 200.
- 80 is sent to the wavefront aberration corrector 100, and the alignment state of the liquid crystal molecules of the wavefront aberration corrector 100 is controlled to sequentially perform the aberration correction.
- the antireflection body according to the present invention refers to a body including: a base; and a microstructure configured to have a concave and convex portion formed on the base on the surface.
- the pitch width of the periodic irregularities on the substrate surface was 10 to 350 nm
- the depth of the periodic irregularities was 0.75 times the pitch width.
- the pitch width of the periodic unevenness refers to the pitch width shown in FIG. 2
- the depth of the periodic unevenness refers to the distance between the top of the protrusion and the bottom of the recess.
- the simulation was performed assuming a light wavelength of 400 nm.
- FIG. 10 is a diagram showing a simulation result of the light transmittance of a liquid crystal element including the antireflection member according to the present invention when the pitch width of the periodic uneven portion is changed.
- TE is the l & of transverse electronics
- TM is the abbreviation of transverse magnetics, which represents the polarization state of incident light. From the results shown in Fig. 10, the value of TM starts to decrease at a pitch width of 220 nm or more, and the light transmittance value at a pitch width of 350 nm is about 10% of that at a pitch width of 200 nm. Diminished. In the region where the pitch width of the periodic irregularities is 250 nm or more, a decrease in light transmittance due to the diffraction phenomenon was confirmed.
- FIG. 11 is a diagram showing a simulation result of the light transmittance of a liquid crystal element including the antireflection body according to the present invention when the depth of the periodic uneven portion is changed.
- the depth of the periodic irregularities on the surface of the fine structure constituting the antireflection body is 10 nm or less.
- the light transmittance hardly changes, and a simulation that obtains a nearly constant light transmittance 5 results.
- FIG. 12 is a diagram showing a simulation result of the wavelength dependence of light transmittance in a comparison between a liquid crystal element having the antireflection body according to the present invention and a liquid crystal element having no antireflection body.
- the pitch width of the periodic irregularities on the surface of the antireflection body was set to 200 nm and its depth was set to 150 nm.
- the simulation conditions other than the pitch width and depth were as shown in FIG. This is the same condition as the simulation exemplified in FIG. In examining the wavelength dependence, the oscillation wavelength of a semiconductor laser used for an optical disc, etc., varies depending on the ambient temperature during operation.
- FIG. 13 shows the results.
- the simulation conditions shown in FIG. 13 are such that the pitch width of the periodic uneven portion on the surface of the antireflection body is 5 to 800 nm, and the depth of the periodic uneven portion is 0.75 times the pitch width.
- FIG. 14 shows a simulation result when the wavelength of light is set at 780 nm under the same conditions as the simulation conditions shown in FIG.
- both TE and TM were obtained when the pitch width was not more than about 370 nm. Also, from the results shown in FIG. 14, both values of TE and TM indicate that a high light transmittance was obtained when the pitch width was about 500 nm or less. Turned out to be.
- the pitch width of the periodic irregularities for obtaining a high light transmittance depends on the wavelength of the light used. was found to change. Since the light transmittance of the liquid crystal element also changes depending on the refractive index of the substrate, the transparent electrode, the alignment film, and the liquid crystal, in order to achieve a high light transmittance in the liquid crystal element including the antireflection body according to the present invention. It is necessary that at least the pitch width of the periodic uneven portions on the surface of the antireflection body be 500 nm or less.
- FIG. 15 is a diagram showing a simulation result of the light transmittance (TM) of the entire liquid crystal element when the phase difference of the liquid crystal layer is changed by the applied voltage.
- the liquid crystal phase difference in FIGS. 15 and 16 described below is a phase change caused by a change in the refractive index of the liquid crystal layer due to an applied voltage.
- FIG. 16 is a diagram illustrating a simulation result of the light transmittance (TE) of the entire liquid crystal element when the phase difference of the liquid crystal layer is changed by the applied voltage. As evident from the results shown in FIG. 16, the simulation results show that the variation rate of the light transmittance of the entire device is not more than 0.01% even when the applied voltage is changed.
- TE light transmittance
- the wavefront aberration correction device according to the present invention can be applied not only to a laser wavefront control element but also to a liquid crystal display device, particularly to a reflection type color liquid crystal display device. Also, as described above, the loss of the special 1 "life as a resonator, and naturally the fluctuation in the transmittance due to the wavelength is reduced, so that the design of the color balance becomes easy, and the display device having good color reproducibility is obtained. Can be provided.
- a wavefront aberration correcting apparatus including a liquid crystal element composed of liquid crystal molecules sandwiched between two substrates, an antireflection body having a fine structure is provided on the substrate, and the antireflection member is provided.
- the transparent electrode By arranging the transparent electrode on the body, light reflection in the device is efficiently prevented, so that the light transmittance of the entire wavefront aberration correcting device is improved.
- the wavefront aberration correction device including the antireflection body according to the present invention not only corrects aberration caused by tilt of an optical disc or a change in substrate thickness, but also corrects aberration of an optical system itself such as an objective lens. Is also possible.
- the optical pickup device provided with the wavefront aberration correcting device according to the present invention has a high light transmittance, particularly when combined with a blue semiconductor laser that emits light of a short wavelength, and thus has a high light transmittance.
- An optical pickup device with high use efficiency can be provided.
Abstract
Description
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Priority Applications (2)
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US10/527,053 US7236444B2 (en) | 2003-03-27 | 2004-03-10 | Wavefront aberration correcting device and optical pickup equipped with the same |
JP2005503994A JPWO2004086389A1 (ja) | 2003-03-27 | 2004-03-10 | 波面収差補正装置及びこれを備えた光ピックアップ装置 |
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JP2003-087676 | 2003-03-27 | ||
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JP4626721B1 (ja) * | 2009-09-02 | 2011-02-09 | ソニー株式会社 | 透明導電性電極、タッチパネル、情報入力装置、および表示装置 |
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JP5782719B2 (ja) * | 2011-01-19 | 2015-09-24 | デクセリアルズ株式会社 | 透明導電性素子、入力装置、および表示装置 |
CN104465821B (zh) * | 2014-12-25 | 2017-11-24 | 胡明建 | 一种圆锥形等距矩阵排列太阳能板的设计方法 |
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JPWO2004086389A1 (ja) | 2006-06-29 |
US20050237897A1 (en) | 2005-10-27 |
US7236444B2 (en) | 2007-06-26 |
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