WO2004088708A3 - System and method for generating an electorn beam - Google Patents

System and method for generating an electorn beam Download PDF

Info

Publication number
WO2004088708A3
WO2004088708A3 PCT/NL2004/000224 NL2004000224W WO2004088708A3 WO 2004088708 A3 WO2004088708 A3 WO 2004088708A3 NL 2004000224 W NL2004000224 W NL 2004000224W WO 2004088708 A3 WO2004088708 A3 WO 2004088708A3
Authority
WO
WIPO (PCT)
Prior art keywords
generating
electorn
electrons
cycle
phase
Prior art date
Application number
PCT/NL2004/000224
Other languages
French (fr)
Dutch (nl)
Other versions
WO2004088708A2 (en
Inventor
Sergey Wasiliewich Mitko
Original Assignee
Nl Ct Voor Laser Res B V
Sergey Wasiliewich Mitko
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nl Ct Voor Laser Res B V, Sergey Wasiliewich Mitko filed Critical Nl Ct Voor Laser Res B V
Publication of WO2004088708A2 publication Critical patent/WO2004088708A2/en
Publication of WO2004088708A3 publication Critical patent/WO2004088708A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
    • H01J3/02—Electron guns

Abstract

A system for generating an electron beam, comprising: a dielectric body; a device for generating an electric field; a source of electrons; and a control unit for controlling the device, wherein the control unit operatively controls such that in a first phase of a cycle, electrons end up from the source on the dielectric surface, and in a second phase of the cycle, electrons leave the dielectric body.
PCT/NL2004/000224 2003-04-04 2004-04-05 System and method for generating an electorn beam WO2004088708A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL1023111 2003-04-04
NL1023111A NL1023111C2 (en) 2003-04-04 2003-04-04 System and method for generating an electron burst.

Publications (2)

Publication Number Publication Date
WO2004088708A2 WO2004088708A2 (en) 2004-10-14
WO2004088708A3 true WO2004088708A3 (en) 2005-07-07

Family

ID=33129156

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/NL2004/000224 WO2004088708A2 (en) 2003-04-04 2004-04-05 System and method for generating an electorn beam

Country Status (2)

Country Link
NL (1) NL1023111C2 (en)
WO (1) WO2004088708A2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7615931B2 (en) 2005-05-02 2009-11-10 International Technology Center Pulsed dielectric barrier discharge
GB2464926A (en) * 2008-10-28 2010-05-05 Ex Beams Ltd Apparatus for generating an electron beam

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3824400A (en) * 1969-09-25 1974-07-16 K Lehovec Induced charge transfer devices
US4363774A (en) * 1978-01-24 1982-12-14 Bennett Willard H Production and utilization of ion cluster acceleration
US5508590A (en) * 1994-10-28 1996-04-16 The Regents Of The University Of California Flat panel ferroelectric electron emission display system

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3824400A (en) * 1969-09-25 1974-07-16 K Lehovec Induced charge transfer devices
US4363774A (en) * 1978-01-24 1982-12-14 Bennett Willard H Production and utilization of ion cluster acceleration
US5508590A (en) * 1994-10-28 1996-04-16 The Regents Of The University Of California Flat panel ferroelectric electron emission display system

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
A.V. AZAROV ET AL.: "An open barrier discharge as Xe laser pumping source", INTERNATIONAL CONFERENCE ON LASERS, APPLICATIONS, AND TECHNOLOGIES 2002. ADVANCED LASER AND SYSTEMS 22-27 JUNE 2002 MOSCOW, RUSSIA, vol. 5137, no. 1, October 2003 (2003-10-01), Proceedings of the SPIE - The International Society for Optical Engineering SPIE-Int. Soc. Opt. Eng USA, pages 227 - 234, XP002325449, ISSN: 0277-786X *
A.V. AZAROV ET AL.: "Xe laser pumped by fast electrons generated in barrier discharge", QUANTUM ELECTRONICS TURPION LTD.; KVANTOVAYA ELEKTRONIKA UK, vol. 32, no. 8, 2002, MOSCOW, RU, pages 675 - 679, XP002325448, ISSN: 1063-7818 *
BENEDEK G ET AL: "Displacement and emission currents from PLZT 8/65/35 and 4/95/5 excited by a negative voltage pulse at the rear electrode", NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, SECTION - A: ACCELERATORS, SPECTROMETERS, DETECTORS AND ASSOCIATED EQUIPMENT, NORTH-HOLLAND PUBLISHING COMPANY. AMSTERDAM, NL, vol. 393, no. 1-3, 1 July 1997 (1997-07-01), pages 469 - 473, XP004093002, ISSN: 0168-9002 *

Also Published As

Publication number Publication date
NL1023111C2 (en) 2004-10-05
WO2004088708A2 (en) 2004-10-14

Similar Documents

Publication Publication Date Title
AU2002354459A1 (en) High-frequency power source and its control method, and plasma processor
EP1285835A3 (en) Electrically driven brake device and control apparatus thereof
WO2004079752A3 (en) Systems and methods for controlling an x-ray source
AU5927794A (en) Method of manufacturing electron source, electron source manufactured by said method, and image forming apparatus using said electron sources
AU2002356655A1 (en) Method and device for controlling a beam extraction raster scan irradiation device for heavy ions or protons
WO2000040064A3 (en) Method for treating a target volume with a particle beam and device implementing same
AU2003221662A1 (en) Method for operating an appliance that uses the method
AU2002339871A1 (en) Method and apparatus for feedback controlled electrospray
AU2002319735A1 (en) Envelope modulator for haptic feedback devices
DE60024764D1 (en) Device for remote control of an arc welding system
AU2003230067A1 (en) Dialog control for an electric apparatus
AU2003234556A1 (en) Stabilization of electronegative plasmas with feedback control of rf generator systems
WO2002054443A3 (en) Ion accelaration method and apparatus in an ion implantation system
WO2003036700A1 (en) Device and method for microwave plasma processing, and microwave power supply device
TW200741828A (en) Ion implantation apparatus and method for obtaining non-uniform ion implantation energy
AU2001264608A1 (en) Linear actuator control structure
EP1286445A3 (en) Control system and method for a vehicle generator
AU2001280200A1 (en) Magnetic field generator for magnetron plasma, and plasma etching apparatus and method comprising the magnetic field generator
AU2002336893A1 (en) System for generating electrical energy and method for operating a system for generating electrical energy
EP1465464A3 (en) Dimmer booster
WO2004088708A3 (en) System and method for generating an electorn beam
AU2001261331A1 (en) Uniform emission current for field emission device
AU2002231361A1 (en) System and method for rapidly controlling the output of an ion source for ion implantation
AU2003288986A1 (en) Microwave plasma generating device
AU2003254998A1 (en) Ion generating device, method for manufacturing ion generating device, ion generator having ion generating device, and electric apparatus having ion generator

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A2

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW

AL Designated countries for regional patents

Kind code of ref document: A2

Designated state(s): BW GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
WWE Wipo information: entry into national phase

Ref document number: 2006507862

Country of ref document: JP

NENP Non-entry into the national phase

Ref country code: JP

WWW Wipo information: withdrawn in national office

Country of ref document: JP

DPEN Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed from 20040101)
122 Ep: pct application non-entry in european phase