WO2004092830A3 - Liquid jet and recovery system for immersion lithography - Google Patents
Liquid jet and recovery system for immersion lithography Download PDFInfo
- Publication number
- WO2004092830A3 WO2004092830A3 PCT/US2004/010071 US2004010071W WO2004092830A3 WO 2004092830 A3 WO2004092830 A3 WO 2004092830A3 US 2004010071 W US2004010071 W US 2004010071W WO 2004092830 A3 WO2004092830 A3 WO 2004092830A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- nozzles
- immersion lithography
- exposure region
- liquid jet
- serve
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
Abstract
Priority Applications (10)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006509591A JP4582089B2 (en) | 2003-04-11 | 2004-04-01 | Liquid jet recovery system for immersion lithography |
US11/236,759 US7443482B2 (en) | 2003-04-11 | 2005-09-28 | Liquid jet and recovery system for immersion lithography |
US11/808,850 US7932989B2 (en) | 2003-04-11 | 2007-06-13 | Liquid jet and recovery system for immersion lithography |
US12/232,513 US8059258B2 (en) | 2003-04-11 | 2008-09-18 | Liquid jet and recovery system for immersion lithography |
US12/923,948 US20110031416A1 (en) | 2003-04-11 | 2010-10-15 | Liquid jet and recovery system for immersion lithography |
US13/200,982 US20120019792A1 (en) | 2003-04-11 | 2011-10-06 | Liquid jet and recovery system for immersion lithography |
US14/283,827 US9304409B2 (en) | 2003-04-11 | 2014-05-21 | Liquid jet and recovery system for immersion lithography |
US15/086,675 US9785057B2 (en) | 2003-04-11 | 2016-03-31 | Liquid jet and recovery system for immersion lithography |
US15/723,628 US10185222B2 (en) | 2003-04-11 | 2017-10-03 | Liquid jet and recovery system for immersion lithography |
US16/234,264 US20190129311A1 (en) | 2003-04-11 | 2018-12-27 | Liquid jet and recovery system for immersion lithography |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US46278603P | 2003-04-11 | 2003-04-11 | |
US60/462,786 | 2003-04-11 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/236,759 Continuation US7443482B2 (en) | 2003-04-11 | 2005-09-28 | Liquid jet and recovery system for immersion lithography |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2004092830A2 WO2004092830A2 (en) | 2004-10-28 |
WO2004092830A3 true WO2004092830A3 (en) | 2005-06-16 |
Family
ID=33299990
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2004/010071 WO2004092830A2 (en) | 2003-04-11 | 2004-04-01 | Liquid jet and recovery system for immersion lithography |
Country Status (3)
Country | Link |
---|---|
US (9) | US7443482B2 (en) |
JP (1) | JP4582089B2 (en) |
WO (1) | WO2004092830A2 (en) |
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ATE548679T1 (en) * | 2008-05-08 | 2012-03-15 | Asml Netherlands Bv | LITHOGRAPHIC IMMERSION APPARATUS, DRYING APPARATUS, IMMERSION METROLOGY APPARATUS AND METHOD FOR PRODUCING A DEVICE |
US8421993B2 (en) | 2008-05-08 | 2013-04-16 | Asml Netherlands B.V. | Fluid handling structure, lithographic apparatus and device manufacturing method |
EP2131241B1 (en) * | 2008-05-08 | 2019-07-31 | ASML Netherlands B.V. | Fluid handling structure, lithographic apparatus and device manufacturing method |
JP5097166B2 (en) | 2008-05-28 | 2012-12-12 | エーエスエムエル ネザーランズ ビー.ブイ. | Lithographic apparatus and method of operating the apparatus |
JP4922359B2 (en) * | 2008-07-25 | 2012-04-25 | エーエスエムエル ネザーランズ ビー.ブイ. | Fluid handling structure, lithographic apparatus, and device manufacturing method |
NL2003333A (en) | 2008-10-23 | 2010-04-26 | Asml Netherlands Bv | Fluid handling structure, lithographic apparatus and device manufacturing method. |
NL2004102A (en) * | 2009-02-25 | 2010-08-26 | Asml Holding Nv | A fluid handling device, an immersion lithographic apparatus and a device manufacturing method. |
JP5016705B2 (en) * | 2009-06-09 | 2012-09-05 | エーエスエムエル ネザーランズ ビー.ブイ. | Fluid handling structure |
SG188036A1 (en) | 2011-08-18 | 2013-03-28 | Asml Netherlands Bv | Lithographic apparatus, support table for a lithographic apparatus and device manufacturing method |
US9152929B2 (en) | 2013-01-23 | 2015-10-06 | Splunk Inc. | Real time display of statistics and values for selected regular expressions |
US11343864B2 (en) * | 2014-04-25 | 2022-05-24 | Lenovo (Singapore) Pte. Ltd. | Device pairing |
DE112014005277T5 (en) * | 2014-06-12 | 2016-10-06 | Fuji Electric Co., Ltd. | Device for introducing impurities, method for introducing impurities and method for producing a semiconductor element |
US20160155077A1 (en) * | 2014-12-02 | 2016-06-02 | Opower, Inc. | Generating a green business guide |
US20170163565A1 (en) * | 2015-12-04 | 2017-06-08 | Bank Of America Corporation | System for analysis of resource usage and availability |
CN109844649B (en) * | 2016-10-20 | 2022-01-25 | Asml荷兰有限公司 | Pressure control valve, fluid handling structure for a lithographic apparatus and lithographic apparatus |
US10948830B1 (en) | 2019-12-23 | 2021-03-16 | Waymo Llc | Systems and methods for lithography |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DD221563A1 (en) * | 1983-09-14 | 1985-04-24 | Mikroelektronik Zt Forsch Tech | IMMERSIONS OBJECTIVE FOR THE STEP-BY-STEP PROJECTION IMAGING OF A MASK STRUCTURE |
US5825043A (en) * | 1996-10-07 | 1998-10-20 | Nikon Precision Inc. | Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus |
WO1999049504A1 (en) * | 1998-03-26 | 1999-09-30 | Nikon Corporation | Projection exposure method and system |
Family Cites Families (133)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4346164A (en) * | 1980-10-06 | 1982-08-24 | Werner Tabarelli | Photolithographic method for the manufacture of integrated circuits |
JPS57153433A (en) | 1981-03-18 | 1982-09-22 | Hitachi Ltd | Manufacturing device for semiconductor |
JPS58202448A (en) | 1982-05-21 | 1983-11-25 | Hitachi Ltd | Exposing device |
JPS5919912A (en) | 1982-07-26 | 1984-02-01 | Hitachi Ltd | Immersion distance holding device |
DD224448A1 (en) | 1984-03-01 | 1985-07-03 | Zeiss Jena Veb Carl | DEVICE FOR PHOTOLITHOGRAPHIC STRUCTURAL TRANSMISSION |
JPS6265326A (en) | 1985-09-18 | 1987-03-24 | Hitachi Ltd | Exposure device |
JPS63157419A (en) | 1986-12-22 | 1988-06-30 | Toshiba Corp | Fine pattern transfer apparatus |
JPH04305917A (en) | 1991-04-02 | 1992-10-28 | Nikon Corp | Adhesion type exposure device |
JPH04305915A (en) | 1991-04-02 | 1992-10-28 | Nikon Corp | Adhesion type exposure device |
JPH0562877A (en) | 1991-09-02 | 1993-03-12 | Yasuko Shinohara | Optical system for lsi manufacturing contraction projection aligner by light |
JPH06124873A (en) | 1992-10-09 | 1994-05-06 | Canon Inc | Liquid-soaking type projection exposure apparatus |
JP2753930B2 (en) * | 1992-11-27 | 1998-05-20 | キヤノン株式会社 | Immersion type projection exposure equipment |
JPH07220990A (en) | 1994-01-28 | 1995-08-18 | Hitachi Ltd | Pattern forming method and exposure apparatus therefor |
JPH08316125A (en) | 1995-05-19 | 1996-11-29 | Hitachi Ltd | Method and apparatus for projection exposing |
JPH08316124A (en) * | 1995-05-19 | 1996-11-29 | Hitachi Ltd | Method and apparatus for projection exposing |
EP0780345A1 (en) * | 1995-12-22 | 1997-06-25 | Corning Incorporated | Optical element for UV transmission |
JPH1133506A (en) * | 1997-07-24 | 1999-02-09 | Tadahiro Omi | Fluid treatment device and cleaning treatment system |
JP3747566B2 (en) | 1997-04-23 | 2006-02-22 | 株式会社ニコン | Immersion exposure equipment |
JP3817836B2 (en) | 1997-06-10 | 2006-09-06 | 株式会社ニコン | EXPOSURE APPARATUS, ITS MANUFACTURING METHOD, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD |
JPH11176727A (en) | 1997-12-11 | 1999-07-02 | Nikon Corp | Projection aligner |
JP2000058436A (en) | 1998-08-11 | 2000-02-25 | Nikon Corp | Projection aligner and exposure method |
US7187503B2 (en) * | 1999-12-29 | 2007-03-06 | Carl Zeiss Smt Ag | Refractive projection objective for immersion lithography |
US6995930B2 (en) * | 1999-12-29 | 2006-02-07 | Carl Zeiss Smt Ag | Catadioptric projection objective with geometric beam splitting |
TW591653B (en) * | 2000-08-08 | 2004-06-11 | Koninkl Philips Electronics Nv | Method of manufacturing an optically scannable information carrier |
KR100866818B1 (en) * | 2000-12-11 | 2008-11-04 | 가부시키가이샤 니콘 | Projection optical system and exposure apparatus comprising the same |
WO2002091078A1 (en) | 2001-05-07 | 2002-11-14 | Massachusetts Institute Of Technology | Methods and apparatus employing an index matching medium |
US6970232B2 (en) * | 2001-10-30 | 2005-11-29 | Asml Netherlands B.V. | Structures and methods for reducing aberration in integrated circuit fabrication systems |
US7092069B2 (en) * | 2002-03-08 | 2006-08-15 | Carl Zeiss Smt Ag | Projection exposure method and projection exposure system |
DE10210899A1 (en) * | 2002-03-08 | 2003-09-18 | Zeiss Carl Smt Ag | Refractive projection lens for immersion lithography |
DE10229818A1 (en) * | 2002-06-28 | 2004-01-15 | Carl Zeiss Smt Ag | Focus detection method and imaging system with focus detection system |
KR20050035890A (en) | 2002-08-23 | 2005-04-19 | 가부시키가이샤 니콘 | Projection optical system and method for photolithography and exposure apparatus and method using same |
US7367345B1 (en) | 2002-09-30 | 2008-05-06 | Lam Research Corporation | Apparatus and method for providing a confined liquid for immersion lithography |
US7093375B2 (en) * | 2002-09-30 | 2006-08-22 | Lam Research Corporation | Apparatus and method for utilizing a meniscus in substrate processing |
US6988326B2 (en) * | 2002-09-30 | 2006-01-24 | Lam Research Corporation | Phobic barrier meniscus separation and containment |
US6954993B1 (en) * | 2002-09-30 | 2005-10-18 | Lam Research Corporation | Concentric proximity processing head |
US6788477B2 (en) * | 2002-10-22 | 2004-09-07 | Taiwan Semiconductor Manufacturing Co., Ltd. | Apparatus for method for immersion lithography |
SG121818A1 (en) * | 2002-11-12 | 2006-05-26 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
DE60335595D1 (en) * | 2002-11-12 | 2011-02-17 | Asml Netherlands Bv | Immersion lithographic apparatus and method of making a device |
SG121822A1 (en) * | 2002-11-12 | 2006-05-26 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
SG121819A1 (en) * | 2002-11-12 | 2006-05-26 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
CN101470360B (en) * | 2002-11-12 | 2013-07-24 | Asml荷兰有限公司 | Immersion lithographic apparatus and device manufacturing method |
US7110081B2 (en) * | 2002-11-12 | 2006-09-19 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
DE10253679A1 (en) * | 2002-11-18 | 2004-06-03 | Infineon Technologies Ag | Optical arrangement used in the production of semiconductor components comprises a lens system arranged behind a mask, and a medium having a specified refractive index lying between the mask and the lens system |
SG131766A1 (en) * | 2002-11-18 | 2007-05-28 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
DE10258718A1 (en) * | 2002-12-09 | 2004-06-24 | Carl Zeiss Smt Ag | Projection lens, in particular for microlithography, and method for tuning a projection lens |
US6992750B2 (en) * | 2002-12-10 | 2006-01-31 | Canon Kabushiki Kaisha | Exposure apparatus and method |
TW200421444A (en) * | 2002-12-10 | 2004-10-16 | Nippon Kogaku Kk | Optical device and projecting exposure apparatus using such optical device |
CN100446179C (en) * | 2002-12-10 | 2008-12-24 | 株式会社尼康 | Exposure apparatus and device manufacturing method |
JP4184346B2 (en) | 2002-12-13 | 2008-11-19 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | Liquid removal in a method and apparatus for irradiating a spot on a layer |
US7514699B2 (en) | 2002-12-19 | 2009-04-07 | Koninklijke Philips Electronics N.V. | Method and device for irradiating spots on a layer |
CN100385535C (en) | 2002-12-19 | 2008-04-30 | 皇家飞利浦电子股份有限公司 | Method and device for irradiating spots on a layer |
US7010958B2 (en) * | 2002-12-19 | 2006-03-14 | Asml Holding N.V. | High-resolution gas gauge proximity sensor |
US6781670B2 (en) * | 2002-12-30 | 2004-08-24 | Intel Corporation | Immersion lithography |
JP4266310B2 (en) * | 2003-01-31 | 2009-05-20 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | Photosensitive resin composition and method for forming resin pattern using the composition |
US7090964B2 (en) * | 2003-02-21 | 2006-08-15 | Asml Holding N.V. | Lithographic printing with polarized light |
US7206059B2 (en) * | 2003-02-27 | 2007-04-17 | Asml Netherlands B.V. | Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems |
US6943941B2 (en) * | 2003-02-27 | 2005-09-13 | Asml Netherlands B.V. | Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems |
US7029832B2 (en) | 2003-03-11 | 2006-04-18 | Samsung Electronics Co., Ltd. | Immersion lithography methods using carbon dioxide |
US20050164522A1 (en) | 2003-03-24 | 2005-07-28 | Kunz Roderick R. | Optical fluids, and systems and methods of making and using the same |
KR20110104084A (en) | 2003-04-09 | 2011-09-21 | 가부시키가이샤 니콘 | Immersion lithography fluid control system |
EP3062152B1 (en) | 2003-04-10 | 2017-12-20 | Nikon Corporation | Environmental system including vaccum scavenge for an immersion lithography apparatus |
SG2012050829A (en) | 2003-04-10 | 2015-07-30 | Nippon Kogaku Kk | Environmental system including vacuum scavange for an immersion lithography apparatus |
CN1771463A (en) | 2003-04-10 | 2006-05-10 | 株式会社尼康 | Run-off path to collect liquid for an immersion lithography apparatus |
WO2004090633A2 (en) | 2003-04-10 | 2004-10-21 | Nikon Corporation | An electro-osmotic element for an immersion lithography apparatus |
JP4582089B2 (en) * | 2003-04-11 | 2010-11-17 | 株式会社ニコン | Liquid jet recovery system for immersion lithography |
KR101324818B1 (en) | 2003-04-11 | 2013-11-01 | 가부시키가이샤 니콘 | Cleanup method for optics in immersion lithography |
KR101697896B1 (en) | 2003-04-11 | 2017-01-18 | 가부시키가이샤 니콘 | Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine |
EP1614000B1 (en) | 2003-04-17 | 2012-01-18 | Nikon Corporation | Immersion lithographic apparatus |
JP4025683B2 (en) * | 2003-05-09 | 2007-12-26 | 松下電器産業株式会社 | Pattern forming method and exposure apparatus |
JP4146755B2 (en) * | 2003-05-09 | 2008-09-10 | 松下電器産業株式会社 | Pattern formation method |
DE10324477A1 (en) | 2003-05-30 | 2004-12-30 | Carl Zeiss Smt Ag | Microlithographic projection exposure system |
JP4084710B2 (en) * | 2003-06-12 | 2008-04-30 | 松下電器産業株式会社 | Pattern formation method |
JP4054285B2 (en) * | 2003-06-12 | 2008-02-27 | 松下電器産業株式会社 | Pattern formation method |
US6867844B2 (en) * | 2003-06-19 | 2005-03-15 | Asml Holding N.V. | Immersion photolithography system and method using microchannel nozzles |
JP4084712B2 (en) * | 2003-06-23 | 2008-04-30 | 松下電器産業株式会社 | Pattern formation method |
JP4029064B2 (en) * | 2003-06-23 | 2008-01-09 | 松下電器産業株式会社 | Pattern formation method |
US6809794B1 (en) * | 2003-06-27 | 2004-10-26 | Asml Holding N.V. | Immersion photolithography system and method using inverted wafer-projection optics interface |
EP1639391A4 (en) | 2003-07-01 | 2009-04-29 | Nikon Corp | Using isotopically specified fluids as optical elements |
US7384149B2 (en) | 2003-07-21 | 2008-06-10 | Asml Netherlands B.V. | Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system |
US7006209B2 (en) | 2003-07-25 | 2006-02-28 | Advanced Micro Devices, Inc. | Method and apparatus for monitoring and controlling imaging in immersion lithography systems |
US7326522B2 (en) * | 2004-02-11 | 2008-02-05 | Asml Netherlands B.V. | Device manufacturing method and a substrate |
US7175968B2 (en) * | 2003-07-28 | 2007-02-13 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and a substrate |
US7579135B2 (en) * | 2003-08-11 | 2009-08-25 | Taiwan Semiconductor Manufacturing Company, Ltd. | Lithography apparatus for manufacture of integrated circuits |
US7061578B2 (en) * | 2003-08-11 | 2006-06-13 | Advanced Micro Devices, Inc. | Method and apparatus for monitoring and controlling imaging in immersion lithography systems |
US7700267B2 (en) * | 2003-08-11 | 2010-04-20 | Taiwan Semiconductor Manufacturing Company, Ltd. | Immersion fluid for immersion lithography, and method of performing immersion lithography |
US7085075B2 (en) * | 2003-08-12 | 2006-08-01 | Carl Zeiss Smt Ag | Projection objectives including a plurality of mirrors with lenses ahead of mirror M3 |
US6844206B1 (en) | 2003-08-21 | 2005-01-18 | Advanced Micro Devices, Llp | Refractive index system monitor and control for immersion lithography |
US8149381B2 (en) * | 2003-08-26 | 2012-04-03 | Nikon Corporation | Optical element and exposure apparatus |
KR101094114B1 (en) * | 2003-08-26 | 2011-12-15 | 가부시키가이샤 니콘 | Optical element and exposure device |
US7070915B2 (en) * | 2003-08-29 | 2006-07-04 | Tokyo Electron Limited | Method and system for drying a substrate |
US6954256B2 (en) * | 2003-08-29 | 2005-10-11 | Asml Netherlands B.V. | Gradient immersion lithography |
US7014966B2 (en) * | 2003-09-02 | 2006-03-21 | Advanced Micro Devices, Inc. | Method and apparatus for elimination of bubbles in immersion medium in immersion lithography systems |
EP1660925B1 (en) | 2003-09-03 | 2015-04-29 | Nikon Corporation | Apparatus and method for providing fluid for immersion lithography |
US6961186B2 (en) * | 2003-09-26 | 2005-11-01 | Takumi Technology Corp. | Contact printing using a magnified mask image |
US7369217B2 (en) * | 2003-10-03 | 2008-05-06 | Micronic Laser Systems Ab | Method and device for immersion lithography |
US7678527B2 (en) * | 2003-10-16 | 2010-03-16 | Intel Corporation | Methods and compositions for providing photoresist with improved properties for contacting liquids |
JP2007525824A (en) | 2003-11-05 | 2007-09-06 | ディーエスエム アイピー アセッツ ビー.ブイ. | Method and apparatus for manufacturing a microchip |
US7924397B2 (en) * | 2003-11-06 | 2011-04-12 | Taiwan Semiconductor Manufacturing Company, Ltd. | Anti-corrosion layer on objective lens for liquid immersion lithography applications |
US7545481B2 (en) | 2003-11-24 | 2009-06-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
WO2005054953A2 (en) | 2003-11-24 | 2005-06-16 | Carl-Zeiss Smt Ag | Holding device for an optical element in an objective |
US7125652B2 (en) | 2003-12-03 | 2006-10-24 | Advanced Micro Devices, Inc. | Immersion lithographic process using a conforming immersion medium |
KR100965330B1 (en) | 2003-12-15 | 2010-06-22 | 칼 짜이스 에스엠티 아게 | Objective as a microlithography projection objective with at least one liquid lens |
JP5106858B2 (en) | 2003-12-15 | 2012-12-26 | カール・ツァイス・エスエムティー・ゲーエムベーハー | Projection objective having a high numerical aperture and a planar end face |
US20050185269A1 (en) * | 2003-12-19 | 2005-08-25 | Carl Zeiss Smt Ag | Catadioptric projection objective with geometric beam splitting |
WO2005059645A2 (en) | 2003-12-19 | 2005-06-30 | Carl Zeiss Smt Ag | Microlithography projection objective with crystal elements |
US7460206B2 (en) * | 2003-12-19 | 2008-12-02 | Carl Zeiss Smt Ag | Projection objective for immersion lithography |
US7589818B2 (en) * | 2003-12-23 | 2009-09-15 | Asml Netherlands B.V. | Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus |
US7394521B2 (en) | 2003-12-23 | 2008-07-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7119884B2 (en) | 2003-12-24 | 2006-10-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US20050147920A1 (en) * | 2003-12-30 | 2005-07-07 | Chia-Hui Lin | Method and system for immersion lithography |
US7088422B2 (en) * | 2003-12-31 | 2006-08-08 | International Business Machines Corporation | Moving lens for immersion optical lithography |
JP4371822B2 (en) * | 2004-01-06 | 2009-11-25 | キヤノン株式会社 | Exposure equipment |
JP4429023B2 (en) * | 2004-01-07 | 2010-03-10 | キヤノン株式会社 | Exposure apparatus and device manufacturing method |
US20050153424A1 (en) * | 2004-01-08 | 2005-07-14 | Derek Coon | Fluid barrier with transparent areas for immersion lithography |
JP5420821B2 (en) | 2004-01-14 | 2014-02-19 | カール・ツァイス・エスエムティー・ゲーエムベーハー | Catadioptric projection objective |
KR101295439B1 (en) | 2004-01-16 | 2013-08-09 | 칼 짜이스 에스엠티 게엠베하 | Polarization-modulating optical element |
WO2005069078A1 (en) | 2004-01-19 | 2005-07-28 | Carl Zeiss Smt Ag | Microlithographic projection exposure apparatus with immersion projection lens |
ATE459898T1 (en) | 2004-01-20 | 2010-03-15 | Zeiss Carl Smt Ag | EXPOSURE DEVICE AND MEASURING DEVICE FOR A PROJECTION LENS |
US7026259B2 (en) * | 2004-01-21 | 2006-04-11 | International Business Machines Corporation | Liquid-filled balloons for immersion lithography |
US7391501B2 (en) * | 2004-01-22 | 2008-06-24 | Intel Corporation | Immersion liquids with siloxane polymer for immersion lithography |
EP1723467A2 (en) * | 2004-02-03 | 2006-11-22 | Rochester Institute of Technology | Method of photolithography using a fluid and a system thereof |
EP1716454A1 (en) | 2004-02-09 | 2006-11-02 | Carl Zeiss SMT AG | Projection objective for a microlithographic projection exposure apparatus |
US7050146B2 (en) * | 2004-02-09 | 2006-05-23 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US20070165198A1 (en) * | 2004-02-13 | 2007-07-19 | Carl Zeiss Smt Ag | Projection objective for a microlithographic projection exposure apparatus |
EP1721201A1 (en) | 2004-02-18 | 2006-11-15 | Corning Incorporated | Catadioptric imaging system for high numerical aperture imaging with deep ultraviolet light |
US20050205108A1 (en) * | 2004-03-16 | 2005-09-22 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method and system for immersion lithography lens cleaning |
US7027125B2 (en) * | 2004-03-25 | 2006-04-11 | International Business Machines Corporation | System and apparatus for photolithography |
US7084960B2 (en) * | 2004-03-29 | 2006-08-01 | Intel Corporation | Lithography using controlled polarization |
US7034917B2 (en) * | 2004-04-01 | 2006-04-25 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and device manufactured thereby |
US7227619B2 (en) * | 2004-04-01 | 2007-06-05 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7091502B2 (en) * | 2004-05-12 | 2006-08-15 | Taiwan Semiconductor Manufacturing, Co., Ltd. | Apparatus and method for immersion lithography |
US7812926B2 (en) * | 2005-08-31 | 2010-10-12 | Nikon Corporation | Optical element, exposure apparatus based on the use of the same, exposure method, and method for producing microdevice |
US20090086338A1 (en) * | 2007-09-28 | 2009-04-02 | Carl Zeiss Smt Ag | High Aperture Folded Catadioptric Projection Objective |
-
2004
- 2004-04-01 JP JP2006509591A patent/JP4582089B2/en not_active Expired - Fee Related
- 2004-04-01 WO PCT/US2004/010071 patent/WO2004092830A2/en active Application Filing
-
2005
- 2005-09-28 US US11/236,759 patent/US7443482B2/en not_active Expired - Fee Related
-
2007
- 2007-06-13 US US11/808,850 patent/US7932989B2/en not_active Expired - Fee Related
-
2008
- 2008-09-18 US US12/232,513 patent/US8059258B2/en not_active Expired - Fee Related
-
2010
- 2010-10-15 US US12/923,948 patent/US20110031416A1/en not_active Abandoned
-
2011
- 2011-10-06 US US13/200,982 patent/US20120019792A1/en not_active Abandoned
-
2014
- 2014-05-21 US US14/283,827 patent/US9304409B2/en not_active Expired - Fee Related
-
2016
- 2016-03-31 US US15/086,675 patent/US9785057B2/en not_active Expired - Fee Related
-
2017
- 2017-10-03 US US15/723,628 patent/US10185222B2/en not_active Expired - Fee Related
-
2018
- 2018-12-27 US US16/234,264 patent/US20190129311A1/en not_active Abandoned
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DD221563A1 (en) * | 1983-09-14 | 1985-04-24 | Mikroelektronik Zt Forsch Tech | IMMERSIONS OBJECTIVE FOR THE STEP-BY-STEP PROJECTION IMAGING OF A MASK STRUCTURE |
US5825043A (en) * | 1996-10-07 | 1998-10-20 | Nikon Precision Inc. | Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus |
WO1999049504A1 (en) * | 1998-03-26 | 1999-09-30 | Nikon Corporation | Projection exposure method and system |
Cited By (62)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8797503B2 (en) | 2002-11-12 | 2014-08-05 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method with a liquid inlet above an aperture of a liquid confinement structure |
US7982850B2 (en) | 2002-11-12 | 2011-07-19 | Asml Netherlands B.V. | Immersion lithographic apparatus and device manufacturing method with gas supply |
US9366972B2 (en) | 2002-11-12 | 2016-06-14 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US8208120B2 (en) | 2002-11-12 | 2012-06-26 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US9091940B2 (en) | 2002-11-12 | 2015-07-28 | Asml Netherlands B.V. | Lithographic apparatus and method involving a fluid inlet and a fluid outlet |
US9482966B2 (en) | 2002-11-12 | 2016-11-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US9477160B2 (en) | 2003-05-13 | 2016-10-25 | Asml Netherland B.V. | Lithographic apparatus and device manufacturing method |
USRE42741E1 (en) | 2003-06-27 | 2011-09-27 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US9285686B2 (en) | 2003-07-31 | 2016-03-15 | Asml Netherlands B.V. | Lithographic apparatus involving an immersion liquid supply system with an aperture |
US8937704B2 (en) | 2003-07-31 | 2015-01-20 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method involving a resistivity sensor |
US9134623B2 (en) | 2003-11-14 | 2015-09-15 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
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Also Published As
Publication number | Publication date |
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US7932989B2 (en) | 2011-04-26 |
US9785057B2 (en) | 2017-10-10 |
US10185222B2 (en) | 2019-01-22 |
US20180024442A1 (en) | 2018-01-25 |
US9304409B2 (en) | 2016-04-05 |
US7443482B2 (en) | 2008-10-28 |
US20110031416A1 (en) | 2011-02-10 |
US20060023183A1 (en) | 2006-02-02 |
WO2004092830A2 (en) | 2004-10-28 |
JP4582089B2 (en) | 2010-11-17 |
US8059258B2 (en) | 2011-11-15 |
US20080030698A1 (en) | 2008-02-07 |
US20090051888A1 (en) | 2009-02-26 |
US20190129311A1 (en) | 2019-05-02 |
JP2006523029A (en) | 2006-10-05 |
US20160209762A1 (en) | 2016-07-21 |
US20140253888A1 (en) | 2014-09-11 |
US20120019792A1 (en) | 2012-01-26 |
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