WO2004093160A3 - Run-off path to collect liquid for an immersion lithography apparatus - Google Patents
Run-off path to collect liquid for an immersion lithography apparatus Download PDFInfo
- Publication number
- WO2004093160A3 WO2004093160A3 PCT/US2004/009993 US2004009993W WO2004093160A3 WO 2004093160 A3 WO2004093160 A3 WO 2004093160A3 US 2004009993 W US2004009993 W US 2004009993W WO 2004093160 A3 WO2004093160 A3 WO 2004093160A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- immersion fluid
- run
- path
- lithography apparatus
- immersion lithography
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
Abstract
Priority Applications (9)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP04759084.9A EP1611482B1 (en) | 2003-04-10 | 2004-04-01 | Run-off path to collect liquid for an immersion lithography apparatus |
KR1020057019304A KR101129213B1 (en) | 2003-04-10 | 2004-04-01 | Run-off path to collect liquid for an immersion lithography apparatus |
JP2006509567A JP4488005B2 (en) | 2003-04-10 | 2004-04-01 | Outflow passage for collecting liquid for an immersion lithographic apparatus |
EP17202526.4A EP3352010A1 (en) | 2003-04-10 | 2004-04-01 | Run-off path to collect liquid for an immersion lithography apparatus |
US11/235,323 US7397532B2 (en) | 2003-04-10 | 2005-09-27 | Run-off path to collect liquid for an immersion lithography apparatus |
HK06107409.4A HK1087195A1 (en) | 2003-04-10 | 2006-06-30 | Run-off path to collect liquid for an immersion lithography apparatus |
US12/155,377 US8243253B2 (en) | 2003-04-10 | 2008-06-03 | Lyophobic run-off path to collect liquid for an immersion lithography apparatus |
US13/543,238 US9007561B2 (en) | 2003-04-10 | 2012-07-06 | Immersion lithography apparatus with hydrophilic region encircling hydrophobic region which encircles substrate support |
US14/642,030 US20150177628A1 (en) | 2003-04-10 | 2015-03-09 | Run-off path to collect liquid for an immersion lithography apparatus |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US46211403P | 2003-04-10 | 2003-04-10 | |
US60/462,114 | 2003-04-10 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/235,323 Continuation US7397532B2 (en) | 2003-04-10 | 2005-09-27 | Run-off path to collect liquid for an immersion lithography apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2004093160A2 WO2004093160A2 (en) | 2004-10-28 |
WO2004093160A3 true WO2004093160A3 (en) | 2005-02-24 |
Family
ID=33299911
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2004/009993 WO2004093160A2 (en) | 2003-04-10 | 2004-04-01 | Run-off path to collect liquid for an immersion lithography apparatus |
Country Status (7)
Country | Link |
---|---|
US (4) | US7397532B2 (en) |
EP (3) | EP2921905B1 (en) |
JP (1) | JP4488005B2 (en) |
KR (1) | KR101129213B1 (en) |
CN (1) | CN1771463A (en) |
HK (3) | HK1087195A1 (en) |
WO (1) | WO2004093160A2 (en) |
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Publication number | Publication date |
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US20150177628A1 (en) | 2015-06-25 |
HK1255862A1 (en) | 2019-08-30 |
US8243253B2 (en) | 2012-08-14 |
EP3352010A1 (en) | 2018-07-25 |
JP2006523027A (en) | 2006-10-05 |
EP2921905A1 (en) | 2015-09-23 |
HK1087195A1 (en) | 2006-10-06 |
US20120268726A1 (en) | 2012-10-25 |
US20080239261A1 (en) | 2008-10-02 |
KR101129213B1 (en) | 2012-03-27 |
US7397532B2 (en) | 2008-07-08 |
EP2921905B1 (en) | 2017-12-27 |
EP1611482A4 (en) | 2008-10-15 |
JP4488005B2 (en) | 2010-06-23 |
US20060023181A1 (en) | 2006-02-02 |
US9007561B2 (en) | 2015-04-14 |
KR20050120796A (en) | 2005-12-23 |
HK1214000A1 (en) | 2016-07-15 |
WO2004093160A2 (en) | 2004-10-28 |
EP1611482B1 (en) | 2015-06-03 |
CN1771463A (en) | 2006-05-10 |
EP1611482A2 (en) | 2006-01-04 |
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