WO2004094328A1 - Coating compositions - Google Patents

Coating compositions Download PDF

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Publication number
WO2004094328A1
WO2004094328A1 PCT/GB2004/001666 GB2004001666W WO2004094328A1 WO 2004094328 A1 WO2004094328 A1 WO 2004094328A1 GB 2004001666 W GB2004001666 W GB 2004001666W WO 2004094328 A1 WO2004094328 A1 WO 2004094328A1
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composition according
linear
branched
poly
composition
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PCT/GB2004/001666
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French (fr)
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Peter Trenton Bishop
Patricia Ann Sutton
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Johnson Matthey Public Limited Company
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23Oxides
    • C03C17/25Oxides by deposition from the liquid phase
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/21Oxides
    • C03C2217/214Al2O3
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/21Oxides
    • C03C2217/215In2O3
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/21Oxides
    • C03C2217/216ZnO
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/21Oxides
    • C03C2217/228Other specific oxides
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/21Oxides
    • C03C2217/24Doped oxides
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/10Deposition methods
    • C03C2218/11Deposition methods from solutions or suspensions
    • C03C2218/116Deposition methods from solutions or suspensions by spin-coating, centrifugation
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/10Deposition methods
    • C03C2218/11Deposition methods from solutions or suspensions
    • C03C2218/119Deposition methods from solutions or suspensions by printing

Definitions

  • This invention relates to coating compositions and in particular to coating compositions suitable for the formation of transparent conducting zinc oxide films.
  • the invention also relates to methods for the formation of such films and applications thereof.
  • Transparent conducting oxide (TCO) coatings find use in a wide range of applications including solar cells, flat-panel display electrodes, optical waveguides, electromagnetic shielding, gas sensors, 'smart' displays and low emissivity and electrochromic windows.
  • TCO Transparent conducting oxide
  • Such materials should be able to form as substantially transparent films with good electrical conductivity. This combination of high optical transparency and high electrical conductivity is not possible in an intrinsically stoichiometric material.
  • the only way to create transparent conductors is to create electron degeneracy in a wide band gap material (>3eV) by controllably introducing non-stoichiometry and/or suitable dopant ions.
  • Such conditions may be obtained in oxides of cadmium, tin, indium, zinc and their alloys in thin film form.
  • a variety of production techniques have been investigated, which have led to films being commercially produced with optical transparencies of 85- 90% and resistivities down to 10 "5 ⁇ cm.
  • TCO fabrication The principal techniques for TCO fabrication are as follows: - i) Evaporation of metallic or oxide sources; ii) Reactive and non-reactive forms of dc, rf, magnetron and ion-beam sputtering; iii) Chemical vapour deposition; iv) Spray pyrolysis; and v) Chemical solution growth (dip or spin coating).
  • optical and electronic properties are controlled by the deposition conditions and film characteristics. Good conductivity and high transparency are key desirable properties however, they are often related, leading to a trade-off between the two. For films deposited under optimised conditions both conductivity and transparency are strongly dependent on film thickness.
  • the precursor materials are cheap and abundant, which contrasts favourably with the inherently more expensive indium oxide based systems; ii) They are non-toxic, in contrast to cadmium containing materials; iii) A variety of synthetic routes are available, including large area chemical solution methods; iv) The band gap lies close to the short wavelength end of the visible spectrum.
  • Doped ZnO based systems have another advantage in terms of application to ⁇ - Si:H based solar cells.
  • conventional materials such as ITO have been used as windows in such devices.
  • the fabrication process for ⁇ -Si:H solar cells normally involves plasma enhanced chemical vapour deposition.
  • the hydrogen plasma acts to reduce metal oxide materials to metals, thereby reducing cell efficiency.
  • This degradation process for ITO and SnO 2 :F occurs even under relatively benign plasma conditions.
  • ZnO based films are, however, more stable to hydrogen plasma and as such are expected to bring significant benefits in terms of solar cell efficiency.
  • the present invention addresses the aforementioned problems and provides an improved coating composition for the production of ZnO films.
  • the composition is stable with respect to hydrolysis, has low temperature thermal decomposition characteristics and is non-toxic.
  • the composition comprises a zinc carboxylate species, a liquid carrier and a dopant; characterised in that the zinc carboxylate species comprises a species according to formula I: Zn(O 2 CAr)(O 2 CAr')
  • each aryl group has the formula II:
  • R 1; R 2; R 3j R 4 and R 5 are each selected from the group consisting of hydrogen, amino, linear or branched CrC 10 alkylamino, linear or branched CrC 10 dialkylamino, linear or branched C Cio alkyl, C 3 -C 12 cycloalkyl, C -C 20 bicycloalkyl, C 5 -C 2 o polycycloalkyl, linear or branched Ci-Cio hydroxyalkyl, linear or branched C C 10 haloalkyl, linear or branched C C 10 perhaloalkyl, phenyl, linear or branched alkylsulfonyl, aryl, heteroaryl, tosyl, arylsulfonyl, acyl, linear or branched Cj-Cio alkylcarbonyl, benzoyl, aroyl, substituted aroyl, butoxycarbonyl, C ⁇ o alkoxy
  • the zinc carboxylate species is chosen from: Zn(O 2 C-C6H - p-CMe 3 ) 2 , Zn(O 2 C-C 6 H 4 -2-OH) 2 , Zn(O 2 C-C 6 H 4 -p-OCH 3 ) 2 , Zn(O 2 C-C 6 H4-p- OCH 2 CH 3 ) 2 , Zn(O 2 C-C 6 H 3 -2-OH-3-CHMe 2 ) 2 , Zn(O 2 C-C 6 H 3 -3,5-CMe 3 ) 2 , Zn(O 2 C- C 6 H 3 -2,4-OH) 2 and Zn(O 2 C-C 6 H 2 -3,4,5-OEt) 2 , and in particular embodiments, the zinc carboxylate species is one of 2n(O 2 C-C 6 H 2 -2-OH-3,5-CMe 3 ) 25 Zn(O 2 C-C 6 H 2 -2-OH-3 5 5- CHM
  • composition may contain more than one different zinc carboxylate species.
  • the amount of zinc carboxylate species in the composition may be any suitable amount however generally, the zinc carboxylate species comprises between 0.1 and 30 wt% of the composition when expressed as an equivalent amount of ZnO. In a particular embodiment, the zinc carboxylate species comprises between 0.1 and 10 wt% of the composition when expressed as an equivalent amount of ZnO, for example 2.5 wt%.
  • a key benefit of the zinc carboxylate species of the present invention over amine stabilised zinc acetates, is their resistance to hydrolysis. Far less control over the humidity of the atmosphere during processing is thus required, leading to a simpler and less costly process. Furthermore, thermal decomposition behaviour is also superior, with complete decomposition occurring below 500 °C, and substantially lower still in many cases. Again, this provides cost benefits.
  • the liquid carrier is a solvent
  • the solvent is a glycol ether such as, propylene glycol methyl ether acetate (PMA), propylene glycol methyl ether (Dowanol PM), propylene glycol propyl ether or dipropylene glycol dimethyl ether.
  • PMA propylene glycol methyl ether acetate
  • Dowanol PM propylene glycol methyl ether
  • propylene glycol propyl ether or dipropylene glycol dimethyl ether.
  • other solvents such as acetone, alcohols, xylene and cyclohexanone may be used. Mixtures of two or more solvents are also suitable.
  • the coating composition is an emulsion.
  • Dopants are conventionally used in the formation of TCO films to provide or enhance conductivity.
  • the dopant generally comprises between 0.001 and 10 wt%, more typically, between 0.001 and 5 wt% expressed with respect to the amount of ZnO in the composition. Higher concentrations of dopant may also be used.
  • the dopant comprises at least one species of aluminium, gallium, indium, arsenic, yttrium, fluorine, boron and nitrogen.
  • suitable dopants include Al(acac) , Al(O 2 CC 6 H 2 -2-OH-3,5-CHMe 2 ) 3 , aluminium nitrate, aluminium chloride, Ga(acac) 3 , Ga(O 2 CC 6 H 2 -2-OH-3,5-CHMe 2 ) 3 , gallium nitrate, gallium chloride, and In(acac) 3 , In(O 2 CC 6 H 2 -2-OH-3,5-CHMe 2 ) 3 , indium nitrate, indium chloride; although other species may also be used.
  • aluminium, gallium or indium doped ZnO films is a feature of the present invention, it is not intended to be limited thereto.
  • Other metal or non-metal dopant species may be used to produce alternatively doped films, for example
  • Y, F, B, N with dopants capable of providing 3+ ions being particularly preferred. More than one dopant species may be included in the composition.
  • the composition may further comprise one or more additives.
  • Additives may include those which improve or alter the physical properties of the composition such as surfactants, rheology modifiers, adhesion strengthening additives and drying accelerators. Suitable surfactants will be known to those skilled in the art, for example carboxylates, phosphates, alcohols, amines, amides, polyethylene glycols, esters, ethoxylated surfactants and fluorinated surfactants.
  • Alternative or additional additives may for example include, metals or other functional materials or pigments, such as gold based pigments. Amounts of additives used will be dependent on the intended application of the composition.
  • compositions comprising a zinc carboxylate species, a liquid carrier and a dopant are generally of low viscosity. This makes them suitable for application by methods such as spin-coating and spraying.
  • the viscosity and other properties of the compositions may be altered by the addition of polymers.
  • the composition further comprises a polymer species.
  • Compositions including polymer species, in addition to being suitable for application using spin-coating and spraying, may also be applied using techniques such as screen printing or ink-jet printing.
  • the polymer species may comprise any suitable amount of the composition. Precise amounts of polymer will depend on the specific application, the molecular weight of the polymer and its solubility in the chosen liquid carrier.
  • the polymer may comprise between 0.01 and 60 wt% of the composition, typically between 0.01 and 30 wt% for example, between 0.5 and 20 wt%.
  • the polymer comprises a poIy(meth)acrylate based polymer.
  • Poly(meth)acrylates consist of long chains of small repeating units, the structure of which units is drawn below:
  • R" H
  • R" methacrylates
  • R" methyl
  • R'" alkyl or aryl groups.
  • Polymer chains can consist of only one repeating unit (homo-polymers), or consist of either blocks or random distributions of different units (co-polymers). Specific examples include; poly(ethyl acrylate-co-efhyl methacrylate-co-methyl methacrylate), poly(isobutyl methacrylate), poly(methyl methacrylate), poly(isobornyl methacrylate), poly(butyl methacrylate-co-methyl methacrylate) and poly(tert-butyl acrylate-co-ethyl acrylate-co-methacrylic acid).
  • a method of forming a coating comprising zinc oxide comprises the steps of:
  • Suitable methods for applying the coating composition include spin coating, dip coating, spraying, aerosol, pyrosol, misting, brushing, screen printing or ink-jet printing, although other methods will be known to those skilled in the art.
  • Compositions including polymer species are especially suitable for application by screen printing and ink-jet printing. Heretofore, is has been unknown to use screen printing or ink-jet printing for the formation of ZnO films. Screen printing and ink-jet printing have distinct advantages over application methods such as spin-coating and dip-coating.
  • the composition can be applied only where required and in complex patterns or arrangements. This not only minimises waste but also obviates the need for post treatments to remove the coating from regions where it is not required; etching is commonly used for this purpose.
  • the substrate is substantially transparent.
  • the substrate will be glass although transparent and semi-transparent crystal surfaces and high temperature polymers may equally be used.
  • the method of the invention is primarily aimed at the production of transparent coatings on at least partially transparent substrates, it is not limited thereto.
  • the substrate may equally be an opaque substrate for example, a metal or silicon.
  • Substrates may be also pre-coated for example, with a metal or other type of coating.
  • a particular advantage of the method of the invention is the low thermal decomposition behaviour of the compositions used compared to those comprising amine stabilised zinc acetates.
  • the substrate is heat treated at a temperature of between 200 and 600 °C, more typically, between 400 and 500 °C. Actual treatment temperatures and treatment times will vary dependent on the exact nature of the zinc carboxylate species, the polymer species, if present, and the nature of the substrate. Low treatment temperatures allow the formation of ZnO coatings on substrates which would be damaged by higher temperatures, such as low softening point glasses. Such substrates cannot be coated successfully using some zinc acetate based compositions.
  • the process of the invention is also advantageous for substrates which can generally withstand high treatment temperatures. For example, the optical properties of some substrates may be compromised by high temperature treatment even though their gross physical properties may remain unaffected.
  • the method of the invention can be used to produce coatings which are substantially transparent.
  • a completely transparent film will transmit 100% of visible light incident on it.
  • films produced according to the invention will transmit at least 70%, typically at least 80% and more typically at least 90% of incident visible light.
  • the films produced are also conducting, doped with for example, an aluminium, gallium or indium species if required.
  • the invention provides a substrate coated using the method of the invention.
  • Such coated substrates are suitable for incorporation into devices such as solar cells, flat-panel display electrodes, optical waveguides, gas sensors, 'smart' displays and low emissivity and electrochromic windows.
  • the coated substrates may also be used for electromagnetic shielding and as IR reflectors. Other applications will be known to those skilled in the art.
  • Figure 1 is an electron microscopy image showing the uniform coating achieved using a screen printing formulation containing zinc carboxylate, solvent, dopant and polymer, after annealing at 500 °C.
  • the following examples are formulations, containing the preferred zinc(II) carboxylate compounds, which form high quality thin films of zinc oxide on thermal decomposition. All formulations were prepared with a "ZnO" concentration of 2.5 wt%. Films have been heat-treated and air annealed in a Nanetti Fast Fire Kiln and annealed under atmosphere in a tube furnace. Film thickness has been measured using a Laser profilometer and confirmed by Fast Ion Bombardment Transmission Electron Microscopy (FIB-TEM). Electrical measurements were made using a Jandel Engineering Four Point Conductivity Probe station in combination with a Keithley 237 high voltage source measurement and Keithley 181 nanovoltmeter.
  • FIB-TEM Fast Ion Bombardment Transmission Electron Microscopy
  • Thin layers of ZnO ( ⁇ 20 nm) were prepared by spin coating the formulation onto AF45 alkali-free glass (pre-heat treated at 400 °C, cleaned with ethanol) at 1500 rpm for 20 seconds, followed by heat treating the film at 400 °C for 10 minutes (10 °C / minute ramp-rate) in order to thermally decompose the zinc carboxylate to zinc oxide. This process was repeated until the desired number of layers (five) had been deposited. The film was then annealed at 500 °C for 1 hour in air to produce a highly transparent ZnO film of 100 nm thickness and poor conductivity.
  • a multiple layer film (five layers) of ZnO was prepared as for Example 4. On annealing at 500 °C for 1 hour in air a highly transparent zinc oxide film of ⁇ 100 nm thickness and of low conductivity was obtained.
  • Thin layers of aluminium doped zinc oxide (1.2 at % Al) were prepared by spin coating as described in Example 4. After the deposition and heat treatment of seven layers the film was annealed in air at 500 °C in air for 1 hour. The resultant film was again highly transparent and, in contrast to the undoped films, was found to be conductive (Table 3).
  • Thin layers of aluminium doped zinc oxide (1.2 at % Al) were prepared by spin coating as described in Example 4. The spin speed was increased to 2500 rpm resulting in the deposition of thinner layers (- 13 nm). After the deposition and heat treatment of nine layers the film was annealed in air at 500 °C in air for 1 hour. The resultant film was again highly transparent and, in contrast to the undoped films, was found to be conductive (Table 3).
  • the pofyacrylate polymer was incorporated into the formulation by pre- dissolving within Dowanol PM at a concentration of 30 wt%.
  • the homogenous formulation was used to prepare a zinc oxide film by the method described in Example 4. Films were spun at 2500 rpm. After the deposition and heat treatment of five layers the film was annealed at 500 °C for 1 hour in air to produce a highly transparent film of similar conductivity to those prepared from non-polymer containing formulations (Table 4). The film was then annealed under N 2 /H 2 (95:5 %) at 500 °C for 1 hour, further improving the film conductivity (Table 4).
  • the polyacrylate polymer was incorporated into the formulation by pre- dissolving within Dowanol PM at a concentration of 30 wt%.
  • the homogenous formulation was used to prepare a zinc oxide film by the method described in Example 4. Films were spun at 2500 rpm. After the deposition and heat treatment of nine layers the film was annealed at 500 °C for 1 hour in air to produce a highly transparent film of similar conductivity to those prepared from non-polymer containing formulations (Table 4). The film was then annealed under N 2 /H 2 (95:5 %) at 500 °C for 1 hour, further improving the film conductivity (Table 4).
  • the polyacrylate polymer was incorporated into the formulation by pre- dissolving within Dowanol PM at a concentration of 30 wt%.
  • the homogenous formulation was used to prepare a zinc oxide film by the method described in Example 4. Films were spun at 1500 rpm. After the deposition and heat treatment of seven layers the film was annealed at 500 °C for 1 hour in air to produce a highly transparent film of similar conductivity to those prepared from non-polymer containing formulations (Table 4).
  • the polyacrylate polymer was incorporated into the formulation by pre- dissolving within Dowanol PM at a concentration of 30 wt%.
  • the homogenous formulation was used to prepare a zinc oxide film by the method described in Example 4. Films were spun at 1500 rpm. In contrast to previous examples, slightly hazy films were obtained prior to firing, showing a lower level of compatibility between the zinc compound and this polymer. After the deposition and heat treatment of seven layers the film was annealed at 500 °C for 1 hour in air to produce a slightly hazy film of similar conductivity to those prepared from non-polymer containing formulations (Table 4).
  • the polyacrylate polymer was incorporated into the formulation by pre- dissolving within Dowanol PM at a concentration of 20 wt%.
  • the homogenous formulation was used to prepare a zinc oxide film by the method described in Example 4. Films were spun at 1000 rpm. After the deposition and heat treatment of eight layers the film was annealed at 500 °C for 1 hour in air to produce a highly transparent, conductive film (Table 4).
  • the polyacrylate polymer was incorporated into the formulation by pre-dissolving into dipropylene glycol dimethyl ether at a concentration of 40 wt%.
  • the formulation was hand printed through a 390# mesh polyester screen onto AF45 glass and the resulting organic film was heat treated at 400 °C (10 °C / minute ramp-rate) and then annealed at 500 °C for 1 hour in air to produce a highly transparent film with a pale blue colouration at certain angles of view that was of low conductivity.
  • Example 15 The formulation was prepared and deposited onto AF45 glass as described in Example 15. The film obtained after air annealing at 500 °C was visually similar to that obtained for Example 15, but was found to be conductive (Table 5). SEM analysis of the fired film suggested a film thickness of 80 - 100 nm from a single screen printed layer. Conductivity was shown to be similar to that obtained from films prepared by the deposition of multiple layers via spin coating. Thicker films were prepared from this formulation by printing and heat-treating five layers. The films were then annealed in air at 500 °C for 1 hour. Multiple layer films were found lo be of similar resistivity to the single layer films (Table 5).
  • the conductivity of the multiple layer film was improved by further annealing under N 2 /H 2 at 400 °C for 1-2 hours (Table 5).
  • the formulation was prepared and deposited onto AF45 glass as described in
  • Example 15 The film obtained after air annealing at 550 °C for 1 hour was visually similar to that obtained for Example 10, but was found to be conductive (Table 5). SEM analysis of the fired film suggested a film thickness of 80 - 100 nm from a single screen printed layer.
  • Example 15 The film obtained after air annealing at 525 °C for 1 hour was visually similar to that obtained for Example 15, but was found to be conductive (Table 5). SEM analysis of the fired film suggested a film thickness of 80 - 100 nm from a single screen printed layer.
  • the formulation was prepared and deposited onto AF45 glass as described in
  • Example 15 The film obtained after air annealing at 500 °C for 1 hour was visually similar to that obtained for Example 15. The film was found to be conductive (Table 5).
  • the formulation was prepared and deposited onto AF45 glass as described in Example 15. Thicker films of 300 nm were prepared from this formulation by printing and heat treating five layers, followed by annealing in air at 500 °C for 1 hour. This resulted in conductive, transparent films. The resistivity was lowered further by annealing the film under N 2 H 2 (Table 5).
  • the formulation (same as for Example 6) was deposited onto AF45 glass using a TRIDENT Ultrajet II 96 printhead.
  • the film was heat treated at 400 °C for 10 minutes (20 °C / minute ramp-rate) and then annealed at 500 °C for 1 hour in air.
  • the film was highly transparent and found to be conductive (Table 6).
  • the film thickness was shown to be - 87 nm by FIB-TEM analysis which is similar to layer thickness deposited by a single screen print.
  • the zinc compound was dispersed within the polymer solution using an ah driven Silverson mixer for 10 minutes.
  • the formulation was then spin coated onto AF45 glass at 1000 rpm for 20 seconds.
  • the resultant film was heat treated at 400 °C for 10 minutes (30 °C / minute ramp-rate) in order to thermally decompose the zinc carboxylate to zinc oxide. This process was repeated until the desired number of layers had been deposited.
  • the film was then annealed at 500 °C for 1 hour in air to produce a ZnO film of low transparency compared to those prepared from more soluble precursors.

Abstract

A coating composition comprises a zinc carboxylate species and a liquid carrier. The zinc carboxylate species comprises a species according to formula (I):wherein Ar and Ar' are aryl groups which may be the same or different, substituted or unsubstituted. The compositions are suitable for the production of transparent conducting ZnO films and may contain dopants, polymers and additives. A method for the production of ZnO films on substrates is also disclosed, as are applications of such coated substrates.

Description

COATING COMPOSITIONS
This invention relates to coating compositions and in particular to coating compositions suitable for the formation of transparent conducting zinc oxide films. The invention also relates to methods for the formation of such films and applications thereof.
Transparent conducting oxide (TCO) coatings find use in a wide range of applications including solar cells, flat-panel display electrodes, optical waveguides, electromagnetic shielding, gas sensors, 'smart' displays and low emissivity and electrochromic windows. Ideally, such materials should be able to form as substantially transparent films with good electrical conductivity. This combination of high optical transparency and high electrical conductivity is not possible in an intrinsically stoichiometric material. With the exception of thin metallic films, the only way to create transparent conductors is to create electron degeneracy in a wide band gap material (>3eV) by controllably introducing non-stoichiometry and/or suitable dopant ions.
Such conditions may be obtained in oxides of cadmium, tin, indium, zinc and their alloys in thin film form. A variety of production techniques have been investigated, which have led to films being commercially produced with optical transparencies of 85- 90% and resistivities down to 10"5 Ωcm.
The conducting properties of transparent oxides began to be investigated in the late 1940's, and concentrated on SnO2 and CdO. In recent years the range of materials available has expanded considerably to include doped compounds such as SnO2:F, ZnO:Al and In2O3:SnO2 (ITO).
The principal techniques for TCO fabrication are as follows: - i) Evaporation of metallic or oxide sources; ii) Reactive and non-reactive forms of dc, rf, magnetron and ion-beam sputtering; iii) Chemical vapour deposition; iv) Spray pyrolysis; and v) Chemical solution growth (dip or spin coating).
Of these techniques, sputtering is the most commonly used to produce TCO films. Chemical solution synthesis has also been used to produce large area films of SnO and In2O3.
The optical and electronic properties are controlled by the deposition conditions and film characteristics. Good conductivity and high transparency are key desirable properties however, they are often related, leading to a trade-off between the two. For films deposited under optimised conditions both conductivity and transparency are strongly dependent on film thickness.
Within the field of transparent conducting oxides (TCO's), the majority of attention has been focussed on the In2O3:SnO2 system (ITO) and SnO2:F. Both of these materials are commercially available. However, doped ZnO based systems have the following advantages:
i) The precursor materials are cheap and abundant, which contrasts favourably with the inherently more expensive indium oxide based systems; ii) They are non-toxic, in contrast to cadmium containing materials; iii) A variety of synthetic routes are available, including large area chemical solution methods; iv) The band gap lies close to the short wavelength end of the visible spectrum.
Doped ZnO based systems have another advantage in terms of application to α- Si:H based solar cells. To date conventional materials such as ITO have been used as windows in such devices. The fabrication process for α-Si:H solar cells normally involves plasma enhanced chemical vapour deposition. The hydrogen plasma acts to reduce metal oxide materials to metals, thereby reducing cell efficiency. This degradation process for ITO and SnO2:F occurs even under relatively benign plasma conditions. ZnO based films are, however, more stable to hydrogen plasma and as such are expected to bring significant benefits in terms of solar cell efficiency.
Accordingly, studies have been undertaken to assess the properties and fabrication routes to ZnO TCO materials containing Al, Ga, or In. Sputtering, although successful, is an inherently complex and expensive technique. Ohyama et al., Thin Solid Films 306 (1997) 78-85, have used sol-gel methods using zinc acetate as a starting material. A solution of zinc acetate in 2-methoxyethanol, stabilised by the addition of monoethanolamine, was used to deposit thin films which could be converted to ZnO on heating to between 400 and 800 °C, with optimum film properties achieved on firing at 600 °C
The present applicants have carried out a detailed study of the film forming abilities of the types of materials described by Ohyama et al. These studies were extended to include zinc acetate solutions stabilised with alternative amine ligands. Although in some cases, acceptable films were produced, the amine stabilised zinc acetate solutions were found to be very sensitive to atmospheric moisture, undergoing rapid hydrolysis on any contact with water. Hydrolysis of the solutions was found to have a detrimental affect on film formation.
A further disadvantage with the solutions used by Ohyama et al, is the toxicity of the 2-methoxyethanol used as a solvent.
The present invention addresses the aforementioned problems and provides an improved coating composition for the production of ZnO films. The composition is stable with respect to hydrolysis, has low temperature thermal decomposition characteristics and is non-toxic.
In accordance with a first aspect of the present invention, the composition comprises a zinc carboxylate species, a liquid carrier and a dopant; characterised in that the zinc carboxylate species comprises a species according to formula I: Zn(O2CAr)(O2CAr')
(I) wherein the aryl groups are the same or different, substituted or unsubstituted.
In one embodiment, each aryl group has the formula II:
Figure imgf000005_0001
(II) wherein the R1; R2; R3j R4 and R5 are each selected from the group consisting of hydrogen, amino, linear or branched CrC10 alkylamino, linear or branched CrC10 dialkylamino, linear or branched C Cio alkyl, C3-C12 cycloalkyl, C -C20 bicycloalkyl, C5-C2o polycycloalkyl, linear or branched Ci-Cio hydroxyalkyl, linear or branched C C10 haloalkyl, linear or branched C C10 perhaloalkyl, phenyl, linear or branched alkylsulfonyl, aryl, heteroaryl, tosyl, arylsulfonyl, acyl, linear or branched Cj-Cio alkylcarbonyl, benzoyl, aroyl, substituted aroyl, butoxycarbonyl, C^ o alkoxy, linear or branched Cι-C10 alkylthio, linear O-acetyl, O-benzyl, O-substituted benzyl, O-tetrahydropyranyl, O- linear or branched Cj-C10 alkylacetyl, O-benzoyl, O-aroyl, S-acetyl, S-benzyl, S-substituted benzyl, S- linear or branched Ci-Cio alkylacetyl, S-benzoyl, S-aroyl, hydroxyl, halogen, linear or branched C C10 (C^Cs alkoxy) alkyl, formyl, acetyl, nitrile, carboxyl, linear or branched -Cio alkoxycarbonyl, nitro and amido or wherein neighbouring R groups form part of a further aromatic ring, optionally including one or more hetero atoms selected from N, S, O, further optionally substituted with any of the preceeding substirutents. For example, at least one aryl group can be a condensed polycyclic aromatic group, substituted or unsubstituted, for example naphthyl.
In specific embodiments the zinc carboxylate species is chosen from: Zn(O2C-C6H - p-CMe3)2, Zn(O2C-C6H4-2-OH)2, Zn(O2C-C6H4-p-OCH3)2, Zn(O2C-C6H4-p- OCH2CH3)2, Zn(O2C-C6H3-2-OH-3-CHMe2)2, Zn(O2C-C6H3-3,5-CMe3)2, Zn(O2C- C6H3-2,4-OH)2 and Zn(O2C-C6H2-3,4,5-OEt)2, and in particular embodiments, the zinc carboxylate species is one of 2n(O2C-C6H2-2-OH-3,5-CMe3)25 Zn(O2C-C6H2-2-OH-355- CHMe2)2 or Zn(O2C-C6H2-4-OH-3,5-CMe3)2.
It will be understood that the composition may contain more than one different zinc carboxylate species.
The amount of zinc carboxylate species in the composition may be any suitable amount however generally, the zinc carboxylate species comprises between 0.1 and 30 wt% of the composition when expressed as an equivalent amount of ZnO. In a particular embodiment, the zinc carboxylate species comprises between 0.1 and 10 wt% of the composition when expressed as an equivalent amount of ZnO, for example 2.5 wt%.
A key benefit of the zinc carboxylate species of the present invention over amine stabilised zinc acetates, is their resistance to hydrolysis. Far less control over the humidity of the atmosphere during processing is thus required, leading to a simpler and less costly process. Furthermore, thermal decomposition behaviour is also superior, with complete decomposition occurring below 500 °C, and substantially lower still in many cases. Again, this provides cost benefits.
In one embodiment the liquid carrier is a solvent, preferably the solvent is a glycol ether such as, propylene glycol methyl ether acetate (PMA), propylene glycol methyl ether (Dowanol PM), propylene glycol propyl ether or dipropylene glycol dimethyl ether. Alternatively, other solvents such as acetone, alcohols, xylene and cyclohexanone may be used. Mixtures of two or more solvents are also suitable.
In another embodiment of the invention, the coating composition is an emulsion.
Dopants are conventionally used in the formation of TCO films to provide or enhance conductivity. The dopant generally comprises between 0.001 and 10 wt%, more typically, between 0.001 and 5 wt% expressed with respect to the amount of ZnO in the composition. Higher concentrations of dopant may also be used.
In a particular embodiment the dopant comprises at least one species of aluminium, gallium, indium, arsenic, yttrium, fluorine, boron and nitrogen. Some non-limiting examples of suitable dopants include Al(acac) , Al(O2CC6H2-2-OH-3,5-CHMe2)3, aluminium nitrate, aluminium chloride, Ga(acac)3, Ga(O2CC6H2-2-OH-3,5-CHMe2)3, gallium nitrate, gallium chloride, and In(acac)3, In(O2CC6H2-2-OH-3,5-CHMe2)3, indium nitrate, indium chloride; although other species may also be used.
Although the formation of aluminium, gallium or indium doped ZnO films is a feature of the present invention, it is not intended to be limited thereto. Other metal or non-metal dopant species may be used to produce alternatively doped films, for example
As, Y, F, B, N, with dopants capable of providing 3+ ions being particularly preferred. More than one dopant species may be included in the composition.
The composition may further comprise one or more additives. Additives may include those which improve or alter the physical properties of the composition such as surfactants, rheology modifiers, adhesion strengthening additives and drying accelerators. Suitable surfactants will be known to those skilled in the art, for example carboxylates, phosphates, alcohols, amines, amides, polyethylene glycols, esters, ethoxylated surfactants and fluorinated surfactants. Alternative or additional additives may for example include, metals or other functional materials or pigments, such as gold based pigments. Amounts of additives used will be dependent on the intended application of the composition.
Compositions comprising a zinc carboxylate species, a liquid carrier and a dopant are generally of low viscosity. This makes them suitable for application by methods such as spin-coating and spraying. The viscosity and other properties of the compositions may be altered by the addition of polymers. Thus in a particular embodiment, the composition further comprises a polymer species. Compositions including polymer species, in addition to being suitable for application using spin-coating and spraying, may also be applied using techniques such as screen printing or ink-jet printing. When present, the polymer species may comprise any suitable amount of the composition. Precise amounts of polymer will depend on the specific application, the molecular weight of the polymer and its solubility in the chosen liquid carrier. Generally, the polymer may comprise between 0.01 and 60 wt% of the composition, typically between 0.01 and 30 wt% for example, between 0.5 and 20 wt%.
Suitably, the polymer comprises a poIy(meth)acrylate based polymer. Poly(meth)acrylates consist of long chains of small repeating units, the structure of which units is drawn below:
— CHR" — CH
CO2R
where for acrylates, R" = H, for methacrylates, R" = methyl and R'" = alkyl or aryl groups.
Polymer chains can consist of only one repeating unit (homo-polymers), or consist of either blocks or random distributions of different units (co-polymers). Specific examples include; poly(ethyl acrylate-co-efhyl methacrylate-co-methyl methacrylate), poly(isobutyl methacrylate), poly(methyl methacrylate), poly(isobornyl methacrylate), poly(butyl methacrylate-co-methyl methacrylate) and poly(tert-butyl acrylate-co-ethyl acrylate-co-methacrylic acid). Other polymers will be known to those skilled in the art, such as poly(ethylene-co-vinyl acetate), poly(propylene carbonate) and poly(vinyl butyral). Mixtures of polymer species may also be used. The polymer species used should have similar thermal decomposition characteristics to the zinc carboxylate species. It is presently thought that traces of the polymer should not be retained in the ZnO film if good conductivity is to be achieved. In accordance with a second aspect of the present invention, a method of forming a coating comprising zinc oxide comprises the steps of:
(a) applying a coating composition in accordance with a first aspect of the invention to a substrate; and
(b) heat treating the substrate.
Suitable methods for applying the coating composition include spin coating, dip coating, spraying, aerosol, pyrosol, misting, brushing, screen printing or ink-jet printing, although other methods will be known to those skilled in the art. Compositions including polymer species are especially suitable for application by screen printing and ink-jet printing. Heretofore, is has been unknown to use screen printing or ink-jet printing for the formation of ZnO films. Screen printing and ink-jet printing have distinct advantages over application methods such as spin-coating and dip-coating. The composition can be applied only where required and in complex patterns or arrangements. This not only minimises waste but also obviates the need for post treatments to remove the coating from regions where it is not required; etching is commonly used for this purpose.
Generally, the substrate is substantially transparent. Most commonly, the substrate will be glass although transparent and semi-transparent crystal surfaces and high temperature polymers may equally be used. Although the method of the invention is primarily aimed at the production of transparent coatings on at least partially transparent substrates, it is not limited thereto. The substrate may equally be an opaque substrate for example, a metal or silicon. Substrates may be also pre-coated for example, with a metal or other type of coating.
A particular advantage of the method of the invention is the low thermal decomposition behaviour of the compositions used compared to those comprising amine stabilised zinc acetates. Generally, the substrate is heat treated at a temperature of between 200 and 600 °C, more typically, between 400 and 500 °C. Actual treatment temperatures and treatment times will vary dependent on the exact nature of the zinc carboxylate species, the polymer species, if present, and the nature of the substrate. Low treatment temperatures allow the formation of ZnO coatings on substrates which would be damaged by higher temperatures, such as low softening point glasses. Such substrates cannot be coated successfully using some zinc acetate based compositions. The process of the invention is also advantageous for substrates which can generally withstand high treatment temperatures. For example, the optical properties of some substrates may be compromised by high temperature treatment even though their gross physical properties may remain unaffected.
The method of the invention can be used to produce coatings which are substantially transparent. A completely transparent film will transmit 100% of visible light incident on it. Generally, films produced according to the invention will transmit at least 70%, typically at least 80% and more typically at least 90% of incident visible light.
In a particular embodiment, the films produced are also conducting, doped with for example, an aluminium, gallium or indium species if required.
In a further aspect, the invention provides a substrate coated using the method of the invention. Such coated substrates are suitable for incorporation into devices such as solar cells, flat-panel display electrodes, optical waveguides, gas sensors, 'smart' displays and low emissivity and electrochromic windows. The coated substrates may also be used for electromagnetic shielding and as IR reflectors. Other applications will be known to those skilled in the art.
In order that the invention may be more fully understood the following Examples are provided by way of illustration only and with reference to the accompanying drawing, in which:
Figure 1 is an electron microscopy image showing the uniform coating achieved using a screen printing formulation containing zinc carboxylate, solvent, dopant and polymer, after annealing at 500 °C. General Preparation of Zincffl) Carboxylate Compounds, Zn(OjCAr)(Q2CAr')
Preparation of Zinc Carboxylates by Zine Chloride Ronte
The desired carboxylic acid ligand, HO2Ar (1 equivalent) was added slowly to a stirring solution of sodium hydroxide (1 equivalent) in water. The solution pH was carefully controlled to ensure the formation of a neutral solution. The above solution was added to a stirring solution of zinc chloride (0.5 equivalent) in water affording immediate precipitation of the desired product. The reaction was left to stir for 15-30 minutes before the product was collected by filtration. The product was dried at 100 °C prior to use. Microanalysis for preferred carboxylates is given in Table 1.
Figure imgf000011_0001
Table 1: Microanalysis of Zinc (II) Carboxylates, Zn(O2CCR)2
EXAMPLE 2 Preparation of Al(O2CCgHr2-OH-3,5-CHMe2)j dopant
The carboxylic acid, HO2CC6H2-2-OH-3,5-CHMe2, (1 equivalent) was added to a stirring solution of sodium hydroxide (1 equivalent) in water. The solution pH was carefully controlled to ensure the resulting solution was close to neutral prior to reaction with aluminium chloride. The above solution was added dropwise to a stirring solution of AlCl3.6H2O (0.33 equivalent) in water. Addition caused the immediate precipitation of a white precipitate that was collected by filtration. The product was dried on the filter, and then at 70 °C overnight prior to use. EXAMPLE 3 - Solubility ofZnOD Carboxylates in Varied Solvents
The solubility of zinc carboxylates using substituted aryl carboxylic acids was assessed at a concentration of 10wt% within the solvents given in Table 2 below.
Figure imgf000012_0001
Formulations
The following examples are formulations, containing the preferred zinc(II) carboxylate compounds, which form high quality thin films of zinc oxide on thermal decomposition. All formulations were prepared with a "ZnO" concentration of 2.5 wt%. Films have been heat-treated and air annealed in a Nanetti Fast Fire Kiln and annealed under atmosphere in a tube furnace. Film thickness has been measured using a Laser profilometer and confirmed by Fast Ion Bombardment Transmission Electron Microscopy (FIB-TEM). Electrical measurements were made using a Jandel Engineering Four Point Conductivity Probe station in combination with a Keithley 237 high voltage source measurement and Keithley 181 nanovoltmeter.
Example 4 - 14 - Spin Coating Formulations
EXAMPLE 4
15.6 % Zn(O2CC6H2-2-OH-3 ,5-CHMe2)2 84.4 % 2-Methoxyethanol (Dowanol PM)
Thin layers of ZnO (~ 20 nm) were prepared by spin coating the formulation onto AF45 alkali-free glass (pre-heat treated at 400 °C, cleaned with ethanol) at 1500 rpm for 20 seconds, followed by heat treating the film at 400 °C for 10 minutes (10 °C / minute ramp-rate) in order to thermally decompose the zinc carboxylate to zinc oxide. This process was repeated until the desired number of layers (five) had been deposited. The film was then annealed at 500 °C for 1 hour in air to produce a highly transparent ZnO film of 100 nm thickness and poor conductivity.
EXAMPLE S
17.3 % Zn(O2CC6H2-2-OH-3,5-CMe3)2
82.7 % 2-Methoxyethanol (Dowanol PM) A multiple layer film (five layers) of ZnO was prepared as for Example 4. On annealing at 500 °C for 1 hour in air a highly transparent zinc oxide film of - 100 nm thickness and of low conductivity was obtained.
EXAMPLE 6
17.3 % Zn(O2CC6H2-4-OH-3,5-CMe3)2
82.7 % 2-Methoxyethanol (Dowanol PM)
A multiple layer film (five layers) of ZnO was prepared as for Example 4. On annealing at 500 °C for 1 hour in air a highly transparent zinc oxide film of ~ 100 nm thickness and of low conductivity was obtained.
EXAMPLE 7
15.6 % Zn(O2CC6H2-2-OH-3 ,5-CHMe2)2
84.28 % 2-Methoxyethanol (Dowanol PM)
0.12 % Aluminium acetylacetonate (Aldrich)
Thin layers of aluminium doped zinc oxide (1.2 at % Al) were prepared by spin coating as described in Example 4. After the deposition and heat treatment of seven layers the film was annealed in air at 500 °C in air for 1 hour. The resultant film was again highly transparent and, in contrast to the undoped films, was found to be conductive (Table 3).
EXAMPLE 8
15.6 % Zn(O2CC6H2-2-OH-355-CHMe2)2
84.28 % Propylene glycol methyl ether acetate 0.12 % Aluminium acetylacetonate (Aldrich) Thin layers of aluminium doped zinc oxide (1.2 at % Al) were prepared by spin coating as described in Example 4. After the deposition and heat treatment of seven layers the film was annealed in air at 500 °C in air for 1 hour. The use of an alternative solvent within the formulation resulted in the deposition of a thinner film that was again both highly transparent and conductive (Table 3).
E AMP E S
17.3 % Zn(O2CC6H2-2-OH-3,5-CMe3)2 82.58 % 2-Methoxyethanol (Dowanol PM)
0.12 % Aluminium acetylacetonate (Aldrich)
Thin layers of aluminium doped zinc oxide (1.2 at % Al) were prepared by spin coating as described in Example 4. The spin speed was increased to 2500 rpm resulting in the deposition of thinner layers (- 13 nm). After the deposition and heat treatment of nine layers the film was annealed in air at 500 °C in air for 1 hour. The resultant film was again highly transparent and, in contrast to the undoped films, was found to be conductive (Table 3).
Figure imgf000015_0001
Table 3 : Film Properties of Spin Coated Films
EXAMPLE 10
17.3 % Zn(O2CC6H2-2-OH-3,5-CMe3)2
75.08 % 2-Methoxyethanol (Dowanol PM) 0.12 % Aluminium acetylacetonate (Aldrich)
7.5 % Poly (ethyl acrylate-co-ethyl methacrylate-co-methyl methacrylate)
(Neocryl B-814)
The pofyacrylate polymer was incorporated into the formulation by pre- dissolving within Dowanol PM at a concentration of 30 wt%. The homogenous formulation was used to prepare a zinc oxide film by the method described in Example 4. Films were spun at 2500 rpm. After the deposition and heat treatment of five layers the film was annealed at 500 °C for 1 hour in air to produce a highly transparent film of similar conductivity to those prepared from non-polymer containing formulations (Table 4). The film was then annealed under N2/H2 (95:5 %) at 500 °C for 1 hour, further improving the film conductivity (Table 4).
EXAMPLE 11
17.3 % Zn(O2CC6H2-2-OH-3,5-CMe3)2
75.08 % 2-Methoxyethanol (Dowanol PM)
0.12 % Aluminium acetylacetonate (Aldrich)
7.5 % Poly(isobutyl methacrylate) (Neocryl B-700)
The polyacrylate polymer was incorporated into the formulation by pre- dissolving within Dowanol PM at a concentration of 30 wt%. The homogenous formulation was used to prepare a zinc oxide film by the method described in Example 4. Films were spun at 2500 rpm. After the deposition and heat treatment of nine layers the film was annealed at 500 °C for 1 hour in air to produce a highly transparent film of similar conductivity to those prepared from non-polymer containing formulations (Table 4). The film was then annealed under N2/H2 (95:5 %) at 500 °C for 1 hour, further improving the film conductivity (Table 4). EXAMPLE 12
15.6 % Zn(O2CC6H2-2-OH-3 ,5-CHMe2)2
76.78 % 2-Methoxyethanol (Dowanol PM) 0.12 % Aluminium acetylacetonate (Aldrich)
7.5 % Poly(ethyl acrylate-co-ethyl methacrylate-co-methyl methacrylate)
(Neocryl B-814)
The polyacrylate polymer was incorporated into the formulation by pre- dissolving within Dowanol PM at a concentration of 30 wt%. The homogenous formulation was used to prepare a zinc oxide film by the method described in Example 4. Films were spun at 1500 rpm. After the deposition and heat treatment of seven layers the film was annealed at 500 °C for 1 hour in air to produce a highly transparent film of similar conductivity to those prepared from non-polymer containing formulations (Table 4).
EXAMPLE 13
15.6 % Zn(O2CC6H2-2-OH-3,5-CHMe2)2 79.78 % 2-Methoxyethanol (Dowanol PM)
0.12 % Aluminium acetylacetonate (Aldrich)
4.5 % Poly(methyl methacrylate) (Neocryl B-728)
The polyacrylate polymer was incorporated into the formulation by pre- dissolving within Dowanol PM at a concentration of 30 wt%. The homogenous formulation was used to prepare a zinc oxide film by the method described in Example 4. Films were spun at 1500 rpm. In contrast to previous examples, slightly hazy films were obtained prior to firing, showing a lower level of compatibility between the zinc compound and this polymer. After the deposition and heat treatment of seven layers the film was annealed at 500 °C for 1 hour in air to produce a slightly hazy film of similar conductivity to those prepared from non-polymer containing formulations (Table 4). EXAMPLE 14
15.6 % Zn(O2CC6H2-2-OH-3,5-CHMe2)2
54.08 % Dipropylene glycol dimethyl ether (Proglyde DMM) 25.0 % 2-Methoxyethanol (Dowanol PM)
0.32 % Indium acetylacetonate (Aldrich)
5.0 % Poly (ethyl acrylate-co-ethyl methacrylate-co-methyl methacrylate)
(Neocryl B-814)
The polyacrylate polymer was incorporated into the formulation by pre- dissolving within Dowanol PM at a concentration of 20 wt%. The homogenous formulation was used to prepare a zinc oxide film by the method described in Example 4. Films were spun at 1000 rpm. After the deposition and heat treatment of eight layers the film was annealed at 500 °C for 1 hour in air to produce a highly transparent, conductive film (Table 4).
Figure imgf000018_0001
Table 4: Film Properties of Spin Coated Films Examples 15 — 21 - Screen Printing Formulations
ElIAMPLE 15
15.6 % Zn(O2CC6H2-2-OH-3 ,5-CHMe2)2
43.8 % Dipropylene glycol dimethyl ether (Proglyde DMM)
19.9 % 2-Methoxyethanol (Dowanol PM)
20.7 % Poly(ethyl acrylate-co-ethyl methacrylate-co-methyl methacrylate)
(Neocryl B-814)
The polyacrylate polymer was incorporated into the formulation by pre-dissolving into dipropylene glycol dimethyl ether at a concentration of 40 wt%. The formulation was hand printed through a 390# mesh polyester screen onto AF45 glass and the resulting organic film was heat treated at 400 °C (10 °C / minute ramp-rate) and then annealed at 500 °C for 1 hour in air to produce a highly transparent film with a pale blue colouration at certain angles of view that was of low conductivity.
EXAMPLE 16
15.6 % Zn(O2CC6H2-2-OH-3,5-CHMe2)2
43.68 % Dipropylene glycol dimethyl ether (Proglyde DMM)
19.9 % 2-Methoxyethanol (Dowanol PM)
0.12 % Aluminium acetylacetonate (Aldrich)
20.7 % Poly(ethyl acrylate-co-ethyl methacrylate-co-methyl methacrylate) (Neocryl B-814)
The formulation was prepared and deposited onto AF45 glass as described in Example 15. The film obtained after air annealing at 500 °C was visually similar to that obtained for Example 15, but was found to be conductive (Table 5). SEM analysis of the fired film suggested a film thickness of 80 - 100 nm from a single screen printed layer. Conductivity was shown to be similar to that obtained from films prepared by the deposition of multiple layers via spin coating. Thicker films were prepared from this formulation by printing and heat-treating five layers. The films were then annealed in air at 500 °C for 1 hour. Multiple layer films were found lo be of similar resistivity to the single layer films (Table 5). Analysis of the film prepared by multiple layer deposition by FIB-TEM revealed a film of 350 nm thickness consisting of densely packed ZnO crystallites (20 -50 nm), see Figure 1. The film was homogenous with no evidence of the film having been prepared by the deposition of five separate layers (Figure 1).
The conductivity of the multiple layer film was improved by further annealing under N2/H2 at 400 °C for 1-2 hours (Table 5).
EXAMPLE 17
15.6 % Zn(O2CC6H2-2-OH-3 ,5-CHMe2)2 43.68 % Dipropylene glycol dimethyl ether (Proglyde DMM)
19.9 % 2-Methoxyethanol (Dowanol PM)
0.12 % Aluminium acetylacetonate (Aldrich)
20.7 % Poly(isobutyl methacrylate) (Neocryl B-700)
The formulation was prepared and deposited onto AF45 glass as described in
Example 15. The film obtained after air annealing at 550 °C for 1 hour was visually similar to that obtained for Example 10, but was found to be conductive (Table 5). SEM analysis of the fired film suggested a film thickness of 80 - 100 nm from a single screen printed layer. EXAMPLE 18
15.6 % Zn(O2CC6H2-2-OH-3,5-CHMe2)2
43.68 % Dipropylene glycol dimethyl ether (Proglyde DMM)
19.9 % 2-Methoxyethanol (Dowanol PM) 0.12 % Aluniinium acetylacetonate (Aldrich)
20.7 % Poly(butyl-co-methacrylate), mol. wt 150,000 (Aldrich) The formulation was prepared and deposited onto AF45 glass as described in
Example 15. The film obtained after air annealing at 525 °C for 1 hour was visually similar to that obtained for Example 15, but was found to be conductive (Table 5). SEM analysis of the fired film suggested a film thickness of 80 - 100 nm from a single screen printed layer.
EXAMPLE 19
17.3 % Zn(O2CC6H2-4-OH-3,5-CMe3)2 41.98 % Dipropylene glycol dimethyl ether (Proglyde DMM)
19.9 % 2-Methoxyethanol (Dowanol PM)
0.12 % Aluminium acetylacetonate (Aldrich)
20.7 % Poly(ethyl acrylate-co-ethyl methacrylate-co-methyl methacrylate)
(Neocryl B-814)
The formulation was prepared and deposited onto AF45 glass as described in
Example 15. The film obtained after air annealing at 500 °C for 1 hour was visually similar to that obtained for Example 15. The film was found to be conductive (Table 5).
EXAMPLE 20
17.3 % Zn(O2CC6H2-2-OH-3,5-CMe3)2
41.98 % Dipropylene glycol dimethyl ether (Proglyde DMM)
19.9 % 2-Methoxyethanol (Dowanol PM) 0.12 % Aluminium acetylacetonate (Aldrich)
20.7 % Poly(ethyl acrylate-co-ethyl methacrylate-co-methyl methacrylate)
(Neocryl B-814)
The formulation was prepared and deposited onto AF45 glass as described in Example 15. In contrast to results obtained from the other zinc carboxylates in combination with this polymer the film was hazy and of negligible conductivity. EXAMPLE 21
15.6 % Zn(O2CC6H2-2-OH-3,5-CHMe2)2
43.1 % Dipropylene glycol dimethyl ether (Proglyde DMM)
19.8 % 2-Methoxyethanol (Dowanol PM)
0.23 % Gallium acetylacetonate (Aldrich)
0.5 % Byk 354
20.7 % Poly(ethyl acrylate-co-ethyl methacrylate-co-methyl methacrylate)
(Neocryl B-814)
The formulation was prepared and deposited onto AF45 glass as described in Example 15. Thicker films of 300 nm were prepared from this formulation by printing and heat treating five layers, followed by annealing in air at 500 °C for 1 hour. This resulted in conductive, transparent films. The resistivity was lowered further by annealing the film under N2 H2 (Table 5).
Figure imgf000022_0001
Table 5: Film Properties of Screen Printed Films EXAMPLE 22
Inkjet Printing Formulation
15.6 % Zn(O2CC6H2-2-OH-3 ,5-CHMe2)2 84.28 % 2-Methoxyethanol (Dowanol PM)
0.12 % Aluminium acetylacetonate (Aldrich)
The formulation (same as for Example 6) was deposited onto AF45 glass using a TRIDENT Ultrajet II 96 printhead. The film was heat treated at 400 °C for 10 minutes (20 °C / minute ramp-rate) and then annealed at 500 °C for 1 hour in air. The film was highly transparent and found to be conductive (Table 6). The film thickness was shown to be - 87 nm by FIB-TEM analysis which is similar to layer thickness deposited by a single screen print.
Figure imgf000023_0001
Table 6: Film Properties of Inkjet Printed Films
EXAMPLE 23 Emulsion Formulation
16.7 % Zn(O2CC6H2-3 ,4,5-OMe)2
58.3 % 2-methoxyethanol (Dowanol PM)
20.0 % dipropylene glycol dimethyl ether
5.0 % poly(ethyl acrylate-co-ethyl methacrylate-co-methyl methacrylate)
(Neocryl B-814)
The zinc compound was dispersed within the polymer solution using an ah driven Silverson mixer for 10 minutes. The formulation was then spin coated onto AF45 glass at 1000 rpm for 20 seconds. The resultant film was heat treated at 400 °C for 10 minutes (30 °C / minute ramp-rate) in order to thermally decompose the zinc carboxylate to zinc oxide. This process was repeated until the desired number of layers had been deposited. The film was then annealed at 500 °C for 1 hour in air to produce a ZnO film of low transparency compared to those prepared from more soluble precursors.

Claims

1. A coating composition, the composition comprising a zinc carboxylate species, a liquid carrier and a dopant; characterised in that the zinc carboxylate species comprises a species according to formula I:
Zn(O2CAr)(O2CAr')
(I) wherein the aryl groups are the same or different, substituted or unsubstituted.
2. A composition according to claim 1, each aryl group has the formula II:
Figure imgf000025_0001
(II) wherein the R1; R2, R3, and R5 are each selected from the group consisting of hydrogen, amino, linear or branched Ci-Cio alkylamino, linear or branched Cι-Cιo dialkylamino, linear or branched Ci-Cio alkyl, C3-C12 cycloalkyl, C4-C20 bicycloalkyl, C5-C2o polycycloalkyl, linear or branched Cι-C10 hydroxyalkyl, linear or branched Ci-Cio haloalkyl, linear or branched Cι-Cιo perhaloalkyl, phenyl, linear or branched alkylsulfonyl, aryl, heteroaryl, tosyl, arylsulfonyl, acyl, linear or branched CpCio alkylcarbonyl, benzoyl, aroyl, substituted aroyl, butoxycarbonyl, Ci-Cio alkoxy, linear or branched - o alkylthio, linear O-acetyl, O-benzyl, O-substituted benzyl, O-tetrahydropyranyl, O- linear or branched Ci-Cio alkylacetyl, O-benzoyl, O-aroyl, S-acetyl, S-benzyl, S-substituted benzyl, S- linear or branched CpCio alkylacetyl, S-benzoyl, S-aroyl, hydroxyl, halogen, linear or branched Ci-Cio (CpCs alkoxy) alkyl, formyl, acetyl, nitrile, carboxyl, linear or branched Ci-Cio alkoxycarbonyl, nitro and amido, or wherein neighbouring R groups form part of a further aromatic ring, optionally including one or more hereto atoms selected from N, S, O, further optionally substituted with any of the preceeding substitutents.
3. A composition according to claim 1 or 2, wherein at least one aryl group is a condensed polycyclic aromatic group, substituted or unsubstituted, optionally naphthyl.
4. A composition according to claim 1, 2 or 3, wherein the zinc carboxylate species is chosen from the group consisting of Zn(O2C-C6H4-p-CMe3)2, Zn(O2C-C6H2-2-OH-3,5-CMe3)2, Zn(O2C-C6H4-2-OH)2, Zn(O2C-C6H4-p-OCH3)2, Zn(O2C-C6H4-p-OCH2CH3)2, Zn(O2C-C6H2-2-OH-3,5-CHMe2)2, Zn(O2C-C6H2-4-OH- 3,5-CMe3)2, Zn(O2C-C6H3-2-OH-3-CHMe2)2, Zn(O2C-C6H3-3,5-CMe3)2, Zn(O2C-C6H3- 2,4-OH)2 and Zn(O2C-C6H2-3,4,5-OEt)2.
5. A composition according to any of claims 1 to 4, wherein the zinc carboxylate species is chosen from the group consisting of Zn(O2C-C6H2-2-OH-3,5-CMe3)2,
Zn(O2C-C6H2-2-OH-3,5-CHMe2)2 and Zn(O2C-C6H2-4-OH-3,5-CMe3)2.
6. A composition according to any preceding claim, wherein the zinc carboxylate species comprises 0.1 and 30 wt% of the composition when expressed as an equivalent amount of ZnO
7. A composition according to any preceding claim, wherein the liquid carrier is a solvent.
8. A composition according claim 7, wherein the solvent comprises at least one of a glycol ether, acetone, an alcohol, xylene and cyclohexanone.
9. A composition according to any of claims 1 to 6, wherein the composition is an emulsion.
10. A composition according to any preceding claim, wherein the dopant comprises between 0.001 and 10 wt% expressed with respect to the amount of ZnO in the composition
11. A composition according to claim 10, wherein the dopant comprises at least one of aluminium, gallium, indium, arsenic, yttrium, fluorine, boron and nitrogen
12. A composition according to claim 10 or 11, wherein the dopant is chosen from the group consisting of: Al(acac)3, Al(O2CC6H2-2-OH-3,5-CHMe2)3, aluminium nitrate and aluminium chloride.
13. A composition according to claim 10 or 11, wherein the dopant is chosen from the group consisting of Ga(acac)3, Ga(O2CC6H2-2-OH-3,5-CHMe2)3, gallium nitrate and gallium chloride.
14. A composition according to claim 10 or 11, wherein the dopant is chosen from the group consisting of In(acac)3, In(O CC6H2-2-OH-3,5-CHMe2)3, indium nitrate and indium chloride.
15. A composition according to any preceding claim further comprising one or more additives chosen from the group consisting of surfactants, rheology modifiers, adhesion strengthening additives, drying accelerators and pigments.
16. A composition according to any preceding claim further comprising a polymer species.
17. A composition according to claim 16, wherein the polymer species comprises from between 0.01 and 60 wt% of the composition.
18. A composition according to claim 16 or 17, wherein the polymer species comprises a poly(meth)acrylate.
19. A composition according to claim 16 to 17, wherein the polymer species is chosen from the group consisting of poly(ethyl acrylate-co-ethyl methacrylate-co-methyl methacrylate), poly(isobutyl methacrylate), pory(methyl methacrylate), poly(isobornyl methacrylate), poly(butyl methacrylate-co-methyl methacrylate), poly(tert-butyl acrylate- co-ethyl acrylate-co-methacrylic acid), poly(ethylene-co-vinyl acetate), poly(proρylene carbonate) and poly (vinyl butyral).
20. A method of forming a coating comprising zinc oxide, the method comprising the steps of: (a) applying a composition according to any preceding claim to a substrate, and (b) heat treating the substrate.
21. A method according to claim 20, wherein the composition is applied to the substrate by spin coating, dip coating, spraying, aerosol, pyrosol, misting, brushing, screen printing or ink-jet printing.
22. A method according to claim 20 or claim 21, wherein the substrate is substantially transparent.
23. A method according to any of claims 20 to 22, wherein the substrate is glass.
24. A method according to any of claims 20 to 23, wherein the substrate is heat treated at a temperature between 200 °C and 600 °C.
25. A method according to any of claims 20 to 24, wherein the coating is substantially transparent and conducting.
26. A substrate coated using a method according to any of claims 20 to 25.
27. A flat-panel display electrode incorporating a substrate according to claim 26.
8. A solar cell incorporating a substrate according to claim 26.
PCT/GB2004/001666 2003-04-17 2004-04-16 Coating compositions WO2004094328A1 (en)

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GB2428689A (en) * 2005-08-01 2007-02-07 Johnson Matthey Plc Process for preparing transparent conducting metal oxides
WO2007005813A3 (en) * 2005-07-02 2007-05-03 Hewlett Packard Development Co Inorganic semiconductive films and methods therefor
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GB2425536A (en) * 2005-04-28 2006-11-01 Johnson Matthey Plc Coating compositions
WO2007005813A3 (en) * 2005-07-02 2007-05-03 Hewlett Packard Development Co Inorganic semiconductive films and methods therefor
US7695998B2 (en) 2005-07-02 2010-04-13 Hewlett-Packard Development Company, L.P. Methods for making and using high-mobility inorganic semiconductive films
GB2428689A (en) * 2005-08-01 2007-02-07 Johnson Matthey Plc Process for preparing transparent conducting metal oxides
US8753455B2 (en) 2005-11-10 2014-06-17 Handy + Harman Brazing material containing a flux
US10071445B2 (en) 2006-05-25 2018-09-11 Bellman-Melcor Development, Llc Filler metal with flux for brazing and soldering and method of making and using same
US7858204B2 (en) 2006-05-25 2010-12-28 Bellman-Melcor Development, Llc Filler metal with flux for brazing and soldering
US9095937B2 (en) 2006-05-25 2015-08-04 Bellman-Melcor Development, Llc Filler metal with flux for brazing and soldering and method of making and using same
US8507833B2 (en) 2006-12-11 2013-08-13 Lucas-Milhaupt, Inc. System and method of brazing using non-silver metals
US9157134B2 (en) 2009-10-26 2015-10-13 Lucas-Milhaupt, Inc. Low silver, low nickel brazing material
US9314862B2 (en) 2013-05-30 2016-04-19 Lucas-Milhaupt, Inc. Process for flux coating braze preforms and discrete parts
US9731383B2 (en) 2014-07-09 2017-08-15 Bellman-Melcor Development, Llc Filler metal with flux for brazing and soldering and method of using same
US10744601B2 (en) 2015-08-07 2020-08-18 Bellman-Melcor Development, Llc Bonded brazing ring system and method for adhering a brazing ring to a tube
US11316344B2 (en) 2020-06-18 2022-04-26 Enphase Energy, Inc. Capacity estimator for an energy generation and/or storage system
US11322938B2 (en) 2020-06-18 2022-05-03 Enphase Energy, Inc. Capacity estimator for an energy generation and/or storage system
US11626732B2 (en) 2020-06-18 2023-04-11 Enphase Energy, Inc. Capacity estimator for an energy generation and/or storage system
US11909208B2 (en) 2020-06-18 2024-02-20 Enphase Energy, Inc. Capacity estimator for an energy generation and/or storage system

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