WO2004095135A3 - Optical arrangement of autofocus elements for use with immersion lithography - Google Patents

Optical arrangement of autofocus elements for use with immersion lithography Download PDF

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Publication number
WO2004095135A3
WO2004095135A3 PCT/US2004/011287 US2004011287W WO2004095135A3 WO 2004095135 A3 WO2004095135 A3 WO 2004095135A3 US 2004011287 W US2004011287 W US 2004011287W WO 2004095135 A3 WO2004095135 A3 WO 2004095135A3
Authority
WO
WIPO (PCT)
Prior art keywords
target surface
light beam
autofocus
immersion lithography
fluid
Prior art date
Application number
PCT/US2004/011287
Other languages
French (fr)
Other versions
WO2004095135A2 (en
Inventor
W Thomas Novak
Original Assignee
Nippon Kogaku Kk
W Thomas Novak
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to AT04759834T priority Critical patent/ATE542167T1/en
Priority to EP04759834A priority patent/EP1614000B1/en
Priority to KR1020127029277A priority patent/KR101369582B1/en
Priority to JP2006509951A priority patent/JP2006523958A/en
Application filed by Nippon Kogaku Kk, W Thomas Novak filed Critical Nippon Kogaku Kk
Publication of WO2004095135A2 publication Critical patent/WO2004095135A2/en
Publication of WO2004095135A3 publication Critical patent/WO2004095135A3/en
Priority to US11/234,279 priority patent/US7414794B2/en
Priority to US11/606,914 priority patent/US7570431B2/en
Priority to US12/457,742 priority patent/US8018657B2/en
Priority to US12/461,762 priority patent/US8094379B2/en
Priority to US13/313,399 priority patent/US8599488B2/en
Priority to US14/066,315 priority patent/US8810915B2/en
Priority to US14/330,263 priority patent/US8953250B2/en
Priority to US14/589,399 priority patent/US9086636B2/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70641—Focus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7034—Leveling

Abstract

An autofocus unit is provided to an immersion lithography apparatus for having a fluid over a target surface of a workpiece and an image pattern projected on this target surface through the fluid. The autofocus unit has an optical element such as a projection lens disposed opposite and above the target surface. An autofocus light source is arranged to project a light beam obliquely at a specified angle such that this light beam passes through the fluid and is reflected by the target surface of the workpiece at a specified reflection position which is below the optical element. A receiver receives and analyzes the reflected light. Correction lenses may be disposed on the optical path of the light beam for correcting propagation of the light beam.
PCT/US2004/011287 2003-04-17 2004-04-12 Optical arrangement of autofocus elements for use with immersion lithography WO2004095135A2 (en)

Priority Applications (12)

Application Number Priority Date Filing Date Title
AT04759834T ATE542167T1 (en) 2003-04-17 2004-04-12 LITHOGRAPHIC IMMERSION DEVICE
EP04759834A EP1614000B1 (en) 2003-04-17 2004-04-12 Immersion lithographic apparatus
KR1020127029277A KR101369582B1 (en) 2003-04-17 2004-04-12 Optical arrangement of autofocus elements for use with immersion lithography
JP2006509951A JP2006523958A (en) 2003-04-17 2004-04-12 Optical structure of an autofocus element for use in immersion lithography
US11/234,279 US7414794B2 (en) 2003-04-17 2005-09-26 Optical arrangement of autofocus elements for use with immersion lithography
US11/606,914 US7570431B2 (en) 2003-04-17 2006-12-01 Optical arrangement of autofocus elements for use with immersion lithography
US12/457,742 US8018657B2 (en) 2003-04-17 2009-06-19 Optical arrangement of autofocus elements for use with immersion lithography
US12/461,762 US8094379B2 (en) 2003-04-17 2009-08-24 Optical arrangement of autofocus elements for use with immersion lithography
US13/313,399 US8599488B2 (en) 2003-04-17 2011-12-07 Optical arrangement of autofocus elements for use with immersion lithography
US14/066,315 US8810915B2 (en) 2003-04-17 2013-10-29 Optical arrangement of autofocus elements for use with immersion lithography
US14/330,263 US8953250B2 (en) 2003-04-17 2014-07-14 Optical arrangement of autofocus elements for use with immersion lithography
US14/589,399 US9086636B2 (en) 2003-04-17 2015-01-05 Optical arrangement of autofocus elements for use with immersion lithography

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US46439203P 2003-04-17 2003-04-17
US60/464,392 2003-04-17

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US11/234,279 Continuation US7414794B2 (en) 2003-04-17 2005-09-26 Optical arrangement of autofocus elements for use with immersion lithography

Publications (2)

Publication Number Publication Date
WO2004095135A2 WO2004095135A2 (en) 2004-11-04
WO2004095135A3 true WO2004095135A3 (en) 2004-12-09

Family

ID=33310880

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2004/011287 WO2004095135A2 (en) 2003-04-17 2004-04-12 Optical arrangement of autofocus elements for use with immersion lithography

Country Status (8)

Country Link
US (8) US7414794B2 (en)
EP (1) EP1614000B1 (en)
JP (2) JP2006523958A (en)
KR (2) KR20050122269A (en)
CN (1) CN1774667A (en)
AT (1) ATE542167T1 (en)
SG (2) SG194246A1 (en)
WO (1) WO2004095135A2 (en)

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EP1614000A4 (en) 2007-05-09
US20090262322A1 (en) 2009-10-22
KR20120132694A (en) 2012-12-07
JP2006523958A (en) 2006-10-19
EP1614000A2 (en) 2006-01-11
US20070076303A1 (en) 2007-04-05
US20140055762A1 (en) 2014-02-27
KR20050122269A (en) 2005-12-28
KR101369582B1 (en) 2014-03-04
JP2010093299A (en) 2010-04-22
US20120075609A1 (en) 2012-03-29
WO2004095135A2 (en) 2004-11-04
US8018657B2 (en) 2011-09-13
EP1614000B1 (en) 2012-01-18
US7570431B2 (en) 2009-08-04
CN1774667A (en) 2006-05-17
US8810915B2 (en) 2014-08-19
US20150109595A1 (en) 2015-04-23
US8953250B2 (en) 2015-02-10
ATE542167T1 (en) 2012-02-15
US9086636B2 (en) 2015-07-21
US20090317751A1 (en) 2009-12-24
SG152078A1 (en) 2009-05-29
US20060017900A1 (en) 2006-01-26
US7414794B2 (en) 2008-08-19
SG194246A1 (en) 2013-11-29
US8599488B2 (en) 2013-12-03
US8094379B2 (en) 2012-01-10
US20140320833A1 (en) 2014-10-30

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