WO2005010611A3 - Wafer table for immersion lithography - Google Patents
Wafer table for immersion lithography Download PDFInfo
- Publication number
- WO2005010611A3 WO2005010611A3 PCT/US2004/017452 US2004017452W WO2005010611A3 WO 2005010611 A3 WO2005010611 A3 WO 2005010611A3 US 2004017452 W US2004017452 W US 2004017452W WO 2005010611 A3 WO2005010611 A3 WO 2005010611A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- wafer table
- top surface
- assembly
- wafer
- immersion lithography
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70975—Assembly, maintenance, transport or storage of apparatus
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49826—Assembling or joining
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Priority Applications (13)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP04754129.7A EP1652003B1 (en) | 2003-07-08 | 2004-06-02 | Wafer table for immersion lithography |
JP2006518633A JP4697138B2 (en) | 2003-07-08 | 2004-06-02 | Immersion lithography apparatus, immersion lithography method, and device manufacturing method |
TW101127186A TWI412875B (en) | 2003-07-08 | 2004-06-18 | Wafer table for immersion lithography |
TW101127184A TWI414879B (en) | 2003-07-08 | 2004-06-18 | Wafer table for immersion lithography |
TW102130167A TWI476503B (en) | 2003-07-08 | 2004-06-18 | Wafer table for immersion lithography |
TW102131512A TWI476504B (en) | 2003-07-08 | 2004-06-18 | Wafer table for immersion lithography |
TW093117615A TWI412874B (en) | 2003-07-08 | 2004-06-18 | Wafer table for immersion lithography |
TW100109479A TWI461823B (en) | 2003-07-08 | 2004-06-18 | Wafer table for immersion lithography |
US11/319,399 US7301607B2 (en) | 2003-07-08 | 2005-12-29 | Wafer table for immersion lithography |
US11/606,913 US7486380B2 (en) | 2003-07-08 | 2006-12-01 | Wafer table for immersion lithography |
US12/318,122 US8508718B2 (en) | 2003-07-08 | 2008-12-22 | Wafer table having sensor for immersion lithography |
US13/938,491 US20130301018A1 (en) | 2003-07-08 | 2013-07-10 | Wafer table having sensor for immersion lithography |
US13/941,849 US20130301016A1 (en) | 2003-07-08 | 2013-07-15 | Wafer table having sensor for immersion lithography |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US48586803P | 2003-07-08 | 2003-07-08 | |
US60/485,868 | 2003-07-08 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/319,399 Continuation US7301607B2 (en) | 2003-07-08 | 2005-12-29 | Wafer table for immersion lithography |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2005010611A2 WO2005010611A2 (en) | 2005-02-03 |
WO2005010611A3 true WO2005010611A3 (en) | 2005-09-15 |
Family
ID=34102667
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2004/017452 WO2005010611A2 (en) | 2003-07-08 | 2004-06-02 | Wafer table for immersion lithography |
Country Status (6)
Country | Link |
---|---|
US (5) | US7301607B2 (en) |
EP (6) | EP2853943B1 (en) |
JP (7) | JP4697138B2 (en) |
HK (2) | HK1206111A1 (en) |
TW (6) | TWI476503B (en) |
WO (1) | WO2005010611A2 (en) |
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US8441617B2 (en) | 2004-12-10 | 2013-05-14 | Asml Netherlands B.V. | Substrate placement in immersion lithography |
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US8848165B2 (en) | 2005-06-28 | 2014-09-30 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US8859188B2 (en) | 2005-02-10 | 2014-10-14 | Asml Netherlands B.V. | Immersion liquid, exposure apparatus, and exposure process |
US8860926B2 (en) | 2004-12-08 | 2014-10-14 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
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US8913225B2 (en) | 2004-12-28 | 2014-12-16 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US8941810B2 (en) | 2005-12-30 | 2015-01-27 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US8941811B2 (en) | 2004-12-20 | 2015-01-27 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US8947629B2 (en) | 2007-05-04 | 2015-02-03 | Asml Netherlands B.V. | Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method |
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US8958051B2 (en) | 2005-02-28 | 2015-02-17 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid |
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US9013672B2 (en) | 2007-05-04 | 2015-04-21 | Asml Netherlands B.V. | Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method |
US9099501B2 (en) | 2005-06-28 | 2015-08-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
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