WO2005024325A3 - Method and system for drying a substrate - Google Patents
Method and system for drying a substrate Download PDFInfo
- Publication number
- WO2005024325A3 WO2005024325A3 PCT/US2004/018925 US2004018925W WO2005024325A3 WO 2005024325 A3 WO2005024325 A3 WO 2005024325A3 US 2004018925 W US2004018925 W US 2004018925W WO 2005024325 A3 WO2005024325 A3 WO 2005024325A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- thin film
- drying
- interaction
- substrate
- baking
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K5/00—Irradiation devices
- G21K5/08—Holders for targets or for other objects to be irradiated
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K5/00—Irradiation devices
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K5/00—Irradiation devices
- G21K5/10—Irradiation devices with provision for relative movement of beam source and object to be irradiated
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
Abstract
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020117007545A KR101098067B1 (en) | 2003-08-29 | 2004-07-08 | Method and system for drying a substrate |
EP04755234.4A EP1658622B1 (en) | 2003-08-29 | 2004-07-08 | Method and system for drying a substrate |
CN2004800220345A CN1830039B (en) | 2003-08-29 | 2004-07-08 | Method and system for drying a substrate |
JP2006524623A JP4584926B2 (en) | 2003-08-29 | 2004-07-08 | A method and system for drying a substrate. |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/650,729 US7070915B2 (en) | 2003-08-29 | 2003-08-29 | Method and system for drying a substrate |
US10/650,729 | 2003-08-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2005024325A2 WO2005024325A2 (en) | 2005-03-17 |
WO2005024325A3 true WO2005024325A3 (en) | 2005-06-30 |
Family
ID=34217235
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2004/018925 WO2005024325A2 (en) | 2003-08-29 | 2004-07-08 | Method and system for drying a substrate |
Country Status (7)
Country | Link |
---|---|
US (2) | US7070915B2 (en) |
EP (1) | EP1658622B1 (en) |
JP (1) | JP4584926B2 (en) |
KR (2) | KR101044981B1 (en) |
CN (1) | CN1830039B (en) |
TW (1) | TWI278595B (en) |
WO (1) | WO2005024325A2 (en) |
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Also Published As
Publication number | Publication date |
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US20060216651A1 (en) | 2006-09-28 |
CN1830039B (en) | 2010-11-03 |
TWI278595B (en) | 2007-04-11 |
CN1830039A (en) | 2006-09-06 |
TW200532155A (en) | 2005-10-01 |
KR20060038394A (en) | 2006-05-03 |
US7070915B2 (en) | 2006-07-04 |
US7582414B2 (en) | 2009-09-01 |
US20050046934A1 (en) | 2005-03-03 |
KR20110044333A (en) | 2011-04-28 |
KR101098067B1 (en) | 2011-12-26 |
JP2007504646A (en) | 2007-03-01 |
EP1658622B1 (en) | 2016-01-06 |
WO2005024325A2 (en) | 2005-03-17 |
EP1658622A2 (en) | 2006-05-24 |
JP4584926B2 (en) | 2010-11-24 |
KR101044981B1 (en) | 2011-06-29 |
EP1658622A4 (en) | 2008-06-11 |
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