WO2005031799A3 - 露光装置、露光方法及びデバイス製造方法 - Google Patents
露光装置、露光方法及びデバイス製造方法 Download PDFInfo
- Publication number
- WO2005031799A3 WO2005031799A3 PCT/JP2004/014693 JP2004014693W WO2005031799A3 WO 2005031799 A3 WO2005031799 A3 WO 2005031799A3 JP 2004014693 W JP2004014693 W JP 2004014693W WO 2005031799 A3 WO2005031799 A3 WO 2005031799A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- exposure
- optical system
- projection optical
- device manufacturing
- exposure apparatus
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
- G03F7/706—Aberration measurement
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
Landscapes
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Public Health (AREA)
- Epidemiology (AREA)
- Environmental & Geological Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Manufacturing Optical Record Carriers (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
Priority Applications (22)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020167006334A KR101739711B1 (ko) | 2003-09-29 | 2004-09-29 | 노광장치, 노광방법 및 디바이스 제조방법 |
KR1020067006005A KR101323396B1 (ko) | 2003-09-29 | 2004-09-29 | 노광장치, 노광방법 및 디바이스 제조방법 |
EP04788458A EP1670043B1 (en) | 2003-09-29 | 2004-09-29 | Exposure apparatus, exposure method, and device manufacturing method |
KR1020177013519A KR20170058458A (ko) | 2003-09-29 | 2004-09-29 | 노광장치, 노광방법 및 디바이스 제조방법 |
KR1020137014762A KR101421398B1 (ko) | 2003-09-29 | 2004-09-29 | 노광장치, 노광방법 및 디바이스 제조방법 |
KR1020127021591A KR101335736B1 (ko) | 2003-09-29 | 2004-09-29 | 노광장치, 노광방법 및 디바이스 제조방법 |
KR1020147029481A KR101664642B1 (ko) | 2003-09-29 | 2004-09-29 | 노광장치, 노광방법 및 디바이스 제조방법 |
KR1020137014763A KR101441840B1 (ko) | 2003-09-29 | 2004-09-29 | 노광장치, 노광방법 및 디바이스 제조방법 |
KR1020147005637A KR101498437B1 (ko) | 2003-09-29 | 2004-09-29 | 노광장치, 노광방법 및 디바이스 제조방법 |
KR1020117024402A KR101289918B1 (ko) | 2003-09-29 | 2004-09-29 | 노광장치, 노광방법 및 디바이스 제조방법 |
KR1020157013859A KR101743378B1 (ko) | 2003-09-29 | 2004-09-29 | 노광장치, 노광방법 및 디바이스 제조방법 |
IL174296A IL174296A0 (en) | 2003-09-29 | 2006-03-13 | Exposure appartus, exposure method, and method for producing device |
US11/390,178 US8305552B2 (en) | 2003-09-29 | 2006-03-28 | Exposure apparatus, exposure method, and method for producing device |
US11/403,922 US8139198B2 (en) | 2003-09-29 | 2006-04-14 | Exposure apparatus, exposure method, and method for producing device |
HK06113781.0A HK1093119A1 (en) | 2003-09-29 | 2006-12-14 | Exposure apparatus, exposure method, and device manufacturing method |
US11/896,447 US8039807B2 (en) | 2003-09-29 | 2007-08-31 | Exposure apparatus, exposure method, and method for producing device |
US13/633,599 US8749759B2 (en) | 2003-09-29 | 2012-10-02 | Exposure apparatus, exposure method, and method for producing device |
IL231730A IL231730A (en) | 2003-09-29 | 2014-03-26 | Exposure facility and method of manufacturing the facility |
US14/268,356 US9513558B2 (en) | 2003-09-29 | 2014-05-02 | Exposure apparatus, exposure method, and method for producing device |
IL235090A IL235090A (en) | 2003-09-29 | 2014-10-07 | Exposure facility, method of exposure and method of manufacturing the facility |
US15/369,062 US10025194B2 (en) | 2003-09-29 | 2016-12-05 | Exposure apparatus, exposure method, and method for producing device |
US16/034,490 US20180348643A1 (en) | 2003-09-29 | 2018-07-13 | Exposure apparatus, exposure method, and method for producing device |
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003-338420 | 2003-09-29 | ||
JP2003338420 | 2003-09-29 | ||
JP2003-344938 | 2003-10-02 | ||
JP2003344938 | 2003-10-02 | ||
JP2004-042931 | 2004-02-19 | ||
JP2004042931 | 2004-02-19 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/390,178 Continuation US8305552B2 (en) | 2003-09-29 | 2006-03-28 | Exposure apparatus, exposure method, and method for producing device |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2005031799A2 WO2005031799A2 (ja) | 2005-04-07 |
WO2005031799A3 true WO2005031799A3 (ja) | 2005-06-23 |
Family
ID=34396843
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2004/014693 WO2005031799A2 (ja) | 2003-09-29 | 2004-09-29 | 露光装置、露光方法及びデバイス製造方法 |
Country Status (8)
Country | Link |
---|---|
US (7) | US8305552B2 (ja) |
EP (6) | EP2837969B1 (ja) |
KR (10) | KR101664642B1 (ja) |
HK (3) | HK1093119A1 (ja) |
IL (3) | IL174296A0 (ja) |
SG (2) | SG2014014971A (ja) |
TW (6) | TW201809911A (ja) |
WO (1) | WO2005031799A2 (ja) |
Cited By (2)
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---|---|---|---|---|
US8891053B2 (en) | 2008-09-10 | 2014-11-18 | Asml Netherlands B.V. | Lithographic apparatus, method of manufacturing an article for a lithographic apparatus and device manufacturing method |
US9195153B2 (en) | 2002-11-12 | 2015-11-24 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
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