WO2005040455A1 - Nanowire and nanoarray composed of tusnsten, molybdenum and the oxide thereof which have a large area and the preparation and the application - Google Patents

Nanowire and nanoarray composed of tusnsten, molybdenum and the oxide thereof which have a large area and the preparation and the application Download PDF

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WO2005040455A1
WO2005040455A1 PCT/CN2004/000992 CN2004000992W WO2005040455A1 WO 2005040455 A1 WO2005040455 A1 WO 2005040455A1 CN 2004000992 W CN2004000992 W CN 2004000992W WO 2005040455 A1 WO2005040455 A1 WO 2005040455A1
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molybdenum
tungsten
nanowires
substrate
dioxide
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PCT/CN2004/000992
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French (fr)
Chinese (zh)
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Ningsheng Xu
Juncong She
Shaozhi Deng
Jun Chen
Jun Zhou
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Zhongshan University
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00Coating not provided for in groups C23C2/00 - C23C24/00
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/08Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
    • C23C8/10Oxidising

Definitions

  • the present invention relates to a large area of nanowires of tungsten, molybdenum, and oxides thereof, an array thereof, a preparation method thereof, and applications thereof.
  • Tungsten and molybdenum have relatively low work functions in metals, good mechanical properties, especially high temperature performance, and low evaporation rate. They were first used as field emission materials. As field electron emission materials, they also have the most significant advantage of being able to output a large emission current density, which is very important for applications in field electron emission devices.
  • Tungsten dioxide and molybdenum dioxide are both metal conductive oxides. They are also widely used as memory materials, catalysts and sensors.
  • Tungsten trioxide and molybdenum trioxide are both n-type wide bandgap semiconductor materials. They are widely used in displays, sensors, solar cells, and as catalysts.
  • Another object of the present invention is to provide application of a nanowire of tungsten, molybdenum, and its oxide, and an array thereof.
  • Technical solution adopted by the present invention is to provide a nanowire of tungsten, molybdenum, and its oxide, and an array thereof.
  • nanowires or arrays of tungsten dioxide and molybdenum dioxide we first prepare a large area of nanowires or arrays of tungsten dioxide and molybdenum dioxide, and then obtain tungsten and molybdenum simple nanowires or arrays by reduction, respectively, and use the oxidation method Nanowires or arrays of tungsten trioxide and molybdenum trioxide are obtained.
  • the present invention adopts the following process steps: 1. Preparation of nanowires or arrays of tungsten dioxide and molybdenum dioxide:
  • tungsten (molybdenum) source and substrate separately.
  • the tungsten source is heated to 1000 ⁇ 2000 ° C, and the substrate is heated to 900 ⁇ 1400 ° C ;
  • the molybdenum source is heated to 1000 ⁇ 2000 ° C, and the substrate is heated to 80 (10O ° C. Holding time is 1 minute to 120 minutes.
  • thorium uses tungsten powder, tungsten flakes, or tungsten boats as the tungsten source (molybdenum powder, molybdenum flakes, or molybdenum boats as the molybdenum source).
  • the substrates used are single crystal silicon wafers, silicon pinpoint arrays, metal wafers, glass, ceramics, and other high-temperature resistant materials, and the geometry is not limited.
  • the temperature of the sample is raised to 500-1000 ° C, and the temperature is maintained for 2-60 minutes; when preparing the molybdenum trioxide, the temperature of the sample is raised to 300-600 ° C, and the temperature is maintained for 2-60 minutes.
  • the invention provides a method for preparing nanowires of tungsten, molybdenum, and their oxides, and arrays thereof, by using large flours.
  • the preparation method is simple and straightforward, does not require high equipment, and has low cost.
  • it has been proved through experiments that they have excellent field electron emission properties and have great application prospects as cold cathode electron sources, especially in field electron emission flat panel displays, cold cathode light emitting tubes, and cold light sources.
  • Figure la is the XRD spectrum of the MoO2 nanowire film.
  • Figure lb is a SEM photograph of a MoO nanowire film.
  • Figure lc is a high-resolution TEM and corresponding electron diffraction pattern of a Mo 2 nanowire film.
  • Figure 2a is an XRD spectrum of a simple molybdenum nanowire film.
  • Figure 2b is a morphology of a simple molybdenum nanowire film.
  • Fig. 2c is a high-resolution TEM and corresponding electron diffraction pattern of a simple molybdenum nanowire film.
  • Fig. 3a is an XRD spectrum of a molybdenum trioxide nanowire film.
  • Figure 3b is a morphology of a MoO3 nanowire film.
  • Figure 3c is a high-resolution TEM and corresponding electron diffraction pattern of a MoO3 nanowire film.
  • Figure 4a is the XRD spectrum of the tungsten dioxide nanowire film.
  • Figure 4b is a SEM photograph of a tungsten dioxide nanowire film.
  • Figure 4c is a high-resolution TEM and corresponding electron diffraction pattern of a tungsten dioxide nanowire film.
  • Figure 5a is the IXRD spectrum of a simple tungsten nanowire film.
  • Figure 5b is an SEM image of a simple tungsten nanowire film.
  • Figure 5c is a high-resolution TEM and corresponding electron diffraction pattern of a simple tungsten nanowire film.
  • Figure 6a is an XRD spectrum of a tungsten trioxide nanowire film.
  • Figure 6b is a SEM image of a tungsten trioxide nanowire film.
  • Figure 6c is a high-resolution TEM and corresponding electron diffraction pattern of a tungsten trioxide nanowire film.
  • Figure 7a is a field emission image of a molybdenum dioxide nanowire film.
  • Figure 8a is a field emission image of a simple molybdenum nanowire film.
  • Figure 9a is a field emission image of a molybdenum trioxide nanowire film.
  • Figure 7b shows the field emission J-E and F-N characteristics of the MoO2 nanowire film.
  • Figure 8b shows the field emission J-E and F-N characteristics of the elemental molybdenum nanowire film.
  • Figure 9b shows the field emission J-E and F-N characteristics of the MoO3 nanowire film.
  • Figure 7c is the field emission stability curve of the MoO2 nanowire film.
  • Figure 8c is the field emission stability curve of the elemental molybdenum nanowire film.
  • Fig. 9c is the field emission stability curve of the molybdenum trioxide nanowire film.
  • Fig. 10 is a graph of field emission J-E and F-N characteristics of a tungsten dioxide nanowire film.
  • Figure 11a is a field emission image of a tungsten dioxide nanowire film.
  • Figure lib is a graph of field emission J-E and F-N characteristics of elemental tungsten nanowire films.
  • Fig. 11c is a graph of field emission stability of a thin film of tungsten dioxide nanowires.
  • Figure 12a is a field emission image of a tungsten trioxide nanowire film.
  • Figure 12b is a graph of field emission JE and FN characteristics of a tungsten trioxide nanowire film.
  • FIG. 12c is a field emission stability graph of a tungsten trioxide nanowire film.
  • FIG. 13a shows a case where a molybdenum oxide nanowire film is applied to a cold cathode light emitting tube, and the light emitting tube is working.
  • FIG. 13b is an IV characteristic curve of a molybdenum oxide nanowire film applied to a cold cathode light-emitting tube when the anode voltage is 7 kV, and the anode voltage is 7 kV.
  • XRD X-ray diffraction
  • SEM scanning electron microscopy
  • TEM transmission electron microscopy
  • EDS energy spectroscopy
  • RAMAN Raman spectroscopy
  • Figure 1 (a) is the XRD spectrum of the molybdenum dioxide sodium noodle film.
  • Figure 1 (b) is the SEM photos of typical samples.
  • Figure 1 (c) shows that the nanowires are grown perpendicular to the substrate.
  • the diameter of the nanowires is about 150 nanometers and the length is about 3 micrometers.
  • Figure 2 (a) is the XRD spectrum of the elemental molybdenum nanowire film.
  • the nanowire film is a very pure molybdenum nanowire with a body-centered cubic structure.
  • the morphology of molybdenum nanowires is similar to that of molybdenum dioxide nanowires.
  • the diameter is slightly smaller, about 100 nm [Fig. 2 (b)].
  • Figure 3 (a) is the XRD spectrum of the trioxide nanowire film.
  • the nanowire film is a very pure molybdenum trioxide nanowire with an orthogonal structure.
  • Molybdenum trioxide nanowires are also grown on a vertical substrate, and their morphology is basically similar to that of molybdenum dioxide nanowires, with a diameter of about 200 nm [Fig. 3 (b)].
  • Figure 3 (c) By high-resolution TEM [ Figure 3 (c)] and corresponding electron diffraction analysis (inset in the upper right corner of Figure 3 (c)), we can know that the nanowire has a crystal structure.
  • Figure 4 (a) is the XRD spectrum of the tungsten dioxide nanowire film.
  • the nanowire film is a tungsten dioxide nanowire with a monoclinic structure. From the SEM photos of typical samples ( Figure 4 (b)), it can be seen that the diameter of the nanowires is about 100 nanometers and the length is about 2 micrometers. Through high-resolution TEM ( Figure 4 (c)) and corresponding electron diffraction (inset in the upper right corner of Figure 1 (c)) analysis, we can also confirm that the nanowire has a crystal structure, but there are many defects.
  • Figure 5 (a) is the XRD spectrum of the elemental tungsten nanowire film. By analyzing the spectrum, we can confirm that the nanowire film is a very pure tungsten nanowire with a body-centered cubic structure. FIG.
  • FIG. 5 (b) is an SEM image of tungsten nanowires.
  • Fig. 5 (c) ytterbium-resolved TEM
  • Fig. 2 (c) corresponding electron diffraction
  • Figure 6 (a) is the XRD spectrum of the tungsten trioxide nanowire film.
  • FIG. 6 (b) is a SEM image of a tungsten trioxide nanowire film. From high-resolution TEM [ Figure 6 (c)] and the corresponding electron line analysis (inset in the upper right corner of Figure 6 (c)), we can know that the nanowire has a single crystal structure.
  • Figures 7 (a), 8 (a), and 9 (a) are the field emission images of molybdenum dioxide, elemental molybdenum, and molybdenum trioxide nanowire thin films. We can find that these nanowire thin films have very uniform field emission and emit light.
  • the morphology of the area is basically the same as the morphology of the film (insets in the upper left corner of Figures 7 (a), 8 (a), and 9 (a)).
  • Figures 7 (b), 8 (b), and 9Cb) and the upper left illustration are the field emission JE and FN characteristic curves of molybdenum dioxide, elemental molybdenum, and molybdenum trioxide nanowire films, respectively.
  • molybdenum dioxide, open field and threshold field elemental molybdenum and molybdenum trioxide nanowire film are 2MV / m, 2.2MV / m, 3.5MV / m and 4.75MV / m, 6.24MV / m and 7.65MV / m.
  • Their threshold electric field can be comparable to that of carbon nanotubes.
  • Their FN curves are linear, indicating that their field emission meets the classical field emission theory.
  • Figures ⁇ (c), 8 (c) and 9 (c) are dioxide
  • the field emission stability curves of molybdenum, elemental molybdenum, and molybdenum trioxide nanowire films have only fluctuations, respectively.
  • Figure 11 (a) and Figure 12 (a) are the field emission images of tungsten dioxide and tungsten trioxide nanowire films, respectively. We can find that the nanowire films have very uniform field emission, and the morphology of the light-emitting area and the film morphology ( Figure 11 (a) and Figure 12 (a)) are basically the same.
  • Figure 10, Figure 11 (b) and Figure 12 (b), and the upper left illustration are the field emission JE and FN characteristic curves of tungsten dioxide, elemental tungsten, and tungsten trioxide nanowire films, respectively.
  • Figure 11 (c) and Figure 12 (c) are the field emission stability curves of tungsten dioxide and tungsten trioxide nanowire films, respectively, and their fluctuations are only ⁇ 4% and ⁇ 2%, respectively. This shows that they have excellent field emission stability, which is of great significance to them in practical applications.
  • Table 1 shows the field emission characteristics of various nanowire films: (see Table 1)
  • FIG. 13 shows the application of molybdenum dioxide nanowire thin film to a cold cathode light emitting tube.
  • Fig. 13 (a) shows the situation that the arc tube is working. It can be seen that the arc tube emits light very uniformly.
  • 13 (b) shows the IV characteristic curve when the anode voltage is 7 kV. From the curve, we can see that the arc tube At below 500 volts there is an emission current.
  • nanowire thin films of tungsten, molybdenum and their oxides have very good field emission characteristics. Their opening electric fields and threshold electric fields are low, and their stability is relatively good. This shows that they can fully meet the requirements for field electron emission display materials and can be applied to field emission Flat panel display, cold cathode light emitting tube, cold light source, etc.

Abstract

The present invention discloses a nanowire and nanoarray composed of tungsten, molybdenum and the oxide thereof which have a large area. The present invention also discloses the method for preparating the nanowire and nanoarray, as well as the application.The method according to the present invention is simple and direct, the demand of the equipment and the cost is low. At the saure time, the nanowire and nanoarray which have a large area prepared according to the invention have a excellent field electron emmision property and a extensive future of application, especially in the field of electron emmision FPD, cold cathode flaring tube, cold light illuminator etc.

Description

大面积钨、 钼及其氧化物纳米线与阵列以及其制备与应用  Large-area tungsten, molybdenum and its oxide nanowires and arrays, and preparation and application thereof
本发明所属技术领域 TECHNICAL FIELD
本发明涉及大面积钨、 钼及其氧化物的纳米线及其阵列、 它们的制备方法以 及应用。  The present invention relates to a large area of nanowires of tungsten, molybdenum, and oxides thereof, an array thereof, a preparation method thereof, and applications thereof.
在本发明之前的现有技术 Prior art prior to the present invention
钨和钼在金属中逸出功相对较低, 机械性能好, 尤其是高温性能好, 蒸发率 小, 最早被用作为场发射材料。 作为场电子发射材料, 它们还有一个最显著的优 点就是能够输出大的发射电流密度, 这一点对于在场致电子发射器件上应用是非 常重要的。 二氧化钨和二氧化钼都是具有金属导电性的氧化物。 它们也被广泛用 作记忆性材料、 催化剂和传感器等。 三氧化钨和三氧化钼都是 n型的宽带隙半导 体材料, 它们广泛地被用于显示器、 传感器、 太阳能电池以及用做催化剂等。  Tungsten and molybdenum have relatively low work functions in metals, good mechanical properties, especially high temperature performance, and low evaporation rate. They were first used as field emission materials. As field electron emission materials, they also have the most significant advantage of being able to output a large emission current density, which is very important for applications in field electron emission devices. Tungsten dioxide and molybdenum dioxide are both metal conductive oxides. They are also widely used as memory materials, catalysts and sensors. Tungsten trioxide and molybdenum trioxide are both n-type wide bandgap semiconductor materials. They are widely used in displays, sensors, solar cells, and as catalysts.
在我们的发明之前, 仅有关于利用电化学法合成钼纳米线, 以及利用无机物 作为先驱体合成钨纳米线的报道。 但是他们的制备方法成本高、 产率低、 工艺复 杂, 而且不能制备大面积的纳米线薄膜, 特别是不能制备有序的上述材料的纳米 线阵列。 这些大大制约了它们的应用。  Prior to our invention, there were only reports on the electrochemical synthesis of molybdenum nanowires and the use of inorganic substances as precursors to synthesize tungsten nanowires. However, their preparation method has high cost, low yield, complicated process, and cannot prepare large-area nanowire films, especially the ordered nanowire arrays of the above materials. These greatly restrict their application.
发明目的 Object of the invention
本发明的目的在于提供一种大面积制备钨、钼及其氧化物的纳米线及其阵列。 本发明的另一个目的在于提供一种钨、 钼单质及其氧化物的纳米线及其阵列 的制备方法。  An object of the present invention is to provide a nanowire and an array of tungsten, molybdenum, and oxides thereof prepared in a large area. Another object of the present invention is to provide a method for preparing a nanowire of tungsten, molybdenum simple substance and its oxide, and an array thereof.
本发明还有一目的在于提供一种钨、 钼及其氧化物的纳米线及其阵列的应用。 本发明采用的技术方案  Another object of the present invention is to provide application of a nanowire of tungsten, molybdenum, and its oxide, and an array thereof. Technical solution adopted by the present invention
在我们的发明中, 我们是先制备出大面积的二氧化钨和二氧化钼的纳米线或 阵列, 然后再通过还原的方法分别获得钨、 钼单质的纳米线或阵列, 而用氧化的 方法获得三氧化钨和三氧化钼的纳米线或阵列。  In our invention, we first prepare a large area of nanowires or arrays of tungsten dioxide and molybdenum dioxide, and then obtain tungsten and molybdenum simple nanowires or arrays by reduction, respectively, and use the oxidation method Nanowires or arrays of tungsten trioxide and molybdenum trioxide are obtained.
为了制备钨、 钼及其氧化物的纳米线或阵列, 本发明分别采用如下工艺步骤: 一、 制备二氧化钨和二氧化钼的纳米线或阵列:  In order to prepare nanowires or arrays of tungsten, molybdenum and their oxides, the present invention adopts the following process steps: 1. Preparation of nanowires or arrays of tungsten dioxide and molybdenum dioxide:
1 清洗衬底, 除去衬底上的杂质。  1 Clean the substrate to remove impurities from the substrate.
2 将钨 (钼) 源和衬底放入真空加热装置中, 衬底放在钨 (钼)源的正上方 或并排在同一平面 (它们之间的距离可调), 先对真空加热装置预抽真空, 然  2 Place the tungsten (molybdenum) source and the substrate in a vacuum heating device. The substrate is placed directly above the tungsten (molybdenum) source or on the same plane (the distance between them is adjustable). Evacuate, then
1 1
确 认 本 后通入惰性气体作为保护气体, 并保持恒流。 Confirm this After that, an inert gas is passed in as a protective gas, and a constant current is maintained.
3 对钨(钼)源和衬底分别升温。制备二氧化钨时, 钨源加热至 1000~2000°C, 衬底加热至 900〜1400°C; 制备二氧化钼时, 钼源加热至 1000~2000°C, 衬 底加热至 80( 10O°C。 保温时间为 1分钟至 120分钟。 3 Heat the tungsten (molybdenum) source and substrate separately. When preparing tungsten dioxide, the tungsten source is heated to 1000 ~ 2000 ° C, and the substrate is heated to 900 ~ 1400 ° C ; when preparing molybdenum dioxide, the molybdenum source is heated to 1000 ~ 2000 ° C, and the substrate is heated to 80 (10O ° C. Holding time is 1 minute to 120 minutes.
4 在惰性气体气氛下降温, 直至冷却至室温。  4 Reduce the temperature in an inert gas atmosphere until it cools to room temperature.
在上述工艺中, 釆用钨粉、 钨片或钨舟作为钨源 (钼粉、 钼片或钼舟作为 钼源)。 采用的衬底是单晶硅片、 硅针尖阵列、 金属片、 玻璃、 陶瓷及其他 耐高温的材料, 几何形状不限。  In the above process, thorium uses tungsten powder, tungsten flakes, or tungsten boats as the tungsten source (molybdenum powder, molybdenum flakes, or molybdenum boats as the molybdenum source). The substrates used are single crystal silicon wafers, silicon pinpoint arrays, metal wafers, glass, ceramics, and other high-temperature resistant materials, and the geometry is not limited.
二、 制备单质钨和钼的纳米线或阵列: 2. Preparation of nanowires or arrays of elemental tungsten and molybdenum:
1 将二氧化钨 (二氧化钼) 纳米线或阵列的样品放入真空加热装置中, 先对 真空加热装置预抽真空, 然后通入氢气作为还原气体, 并保持恒流。  1 Put a sample of tungsten dioxide (molybdenum dioxide) nanowires or arrays into a vacuum heating device, pre-evacuate the vacuum heating device, and then pass in hydrogen as a reducing gas, and maintain a constant current.
2 将样品升温至 5O0~1000°C, 保温 3至 15小时。  2 Warm up the sample to 5O0 ~ 1000 ° C and keep it for 3 to 15 hours.
3 在氢气气氛下降温, 直至冷却至室温。  3 Reduce the temperature in a hydrogen atmosphere until it cools to room temperature.
三、 制备三氧化钨和三氧化钼的纳米线或阵列- 1 将二氧化钨 (二氧化钼) 纳米线或阵列放入真空加热装置中, 先对真空加 热装置预抽真空, 然后通入氩气和氧气的混合气体, 并保持恒流。 3. Preparation of Nanowires or Arrays of Tungsten Trioxide and Molybdenum Trioxide-1 Place tungsten dioxide (Molybdenum Dioxide) nanowires or arrays into a vacuum heating device, pre-evacuate the vacuum heating device, and then pass argon A mixture of gas and oxygen, and maintain a constant current.
2 制备三氧化钨时, 样品升温至 500-1000°C, 保温 2-60分钟; 制备三氧化 钼时, 样品升温至 300-600°C, 保温 2-60分钟。  2 During the preparation of tungsten trioxide, the temperature of the sample is raised to 500-1000 ° C, and the temperature is maintained for 2-60 minutes; when preparing the molybdenum trioxide, the temperature of the sample is raised to 300-600 ° C, and the temperature is maintained for 2-60 minutes.
3 在氩气和氧气的混合气体气氛下降温, 直至冷却至室温。  3 Reduce the temperature in a mixed gas atmosphere of argon and oxygen until it cools to room temperature.
本发明提供了大面禾只制备钨、钼及其氧化物的纳米线及其阵列的方法。制备 方法简单、 直接, 对设备要求不高, 成本低廉。 同时还通过实验证明, 它们具有 优异的场致电子发射性 , 作为冷阴极电子源会有很大的应用前景,尤其是在场 致电子发射平板显示器、 冷阴极发光管、 冷光源等。  The invention provides a method for preparing nanowires of tungsten, molybdenum, and their oxides, and arrays thereof, by using large flours. The preparation method is simple and straightforward, does not require high equipment, and has low cost. At the same time, it has been proved through experiments that they have excellent field electron emission properties and have great application prospects as cold cathode electron sources, especially in field electron emission flat panel displays, cold cathode light emitting tubes, and cold light sources.
附图说明 BRIEF DESCRIPTION OF THE DRAWINGS
图 la是二氧化钼纳米线薄膜的 XRD谱。  Figure la is the XRD spectrum of the MoO2 nanowire film.
图 lb是二氧化钼纳米线薄膜的 SEM照片。  Figure lb is a SEM photograph of a MoO nanowire film.
图 lc是二氧化钼纳米线薄膜的高分辨 TEM及相应的电子衍射图。  Figure lc is a high-resolution TEM and corresponding electron diffraction pattern of a Mo 2 nanowire film.
2a是单质钼纳米线薄膜的 XRD谱。 Figure 2a is an XRD spectrum of a simple molybdenum nanowire film.
2b是单质钼纳米线薄膜的形貌图。 图 2c是单质钼纳米线薄膜的高分辨 TEM及相应的电子衍射图。 图 3a是三氧化钼纳米线薄膜的 XRD谱。 Figure 2b is a morphology of a simple molybdenum nanowire film. Fig. 2c is a high-resolution TEM and corresponding electron diffraction pattern of a simple molybdenum nanowire film. Fig. 3a is an XRD spectrum of a molybdenum trioxide nanowire film.
图 3b是三氧化钼纳米线薄膜的形貌图。 Figure 3b is a morphology of a MoO3 nanowire film.
图 3c是三氧化钼纳米线薄膜的高分辨 TEM及相应的电子衍射图。 图 4a是二氧化钨纳米线薄膜的 XRD谱。 Figure 3c is a high-resolution TEM and corresponding electron diffraction pattern of a MoO3 nanowire film. Figure 4a is the XRD spectrum of the tungsten dioxide nanowire film.
图 4b是二氧化钨纳米线薄膜的 SEM照片。 Figure 4b is a SEM photograph of a tungsten dioxide nanowire film.
图 4c是二氧化钨纳米线薄膜的高分辨 TEM及相应的电子衍射图。 图 5a是单质钨纳米线薄膜的 IXRD谱。 Figure 4c is a high-resolution TEM and corresponding electron diffraction pattern of a tungsten dioxide nanowire film. Figure 5a is the IXRD spectrum of a simple tungsten nanowire film.
图 5b是单质钨纳米线薄膜的 SEM图。 Figure 5b is an SEM image of a simple tungsten nanowire film.
图 5c是单质钨纳米线薄膜的高分辨 TEM及相应的电子衍射图。 图 6a是三氧化钨纳米线薄膜的 XRD谱。 Figure 5c is a high-resolution TEM and corresponding electron diffraction pattern of a simple tungsten nanowire film. Figure 6a is an XRD spectrum of a tungsten trioxide nanowire film.
图 6b是三氧化钨纳米线薄膜的 SEM图。 Figure 6b is a SEM image of a tungsten trioxide nanowire film.
图 6c是三氧化钨纳米线薄膜的高分辨 TEM及相应的电子衍射图。 图 7a是二氧化钼纳米线薄膜的场发射像。 Figure 6c is a high-resolution TEM and corresponding electron diffraction pattern of a tungsten trioxide nanowire film. Figure 7a is a field emission image of a molybdenum dioxide nanowire film.
图 8a是单质钼纳米线薄膜的场发射像。  Figure 8a is a field emission image of a simple molybdenum nanowire film.
图 9a是三氧化钼纳米线薄膜的场发射像。  Figure 9a is a field emission image of a molybdenum trioxide nanowire film.
图 7b是二氧化钼纳米线薄膜的场发射 J-E和 F-N特性曲线图。 图 8b是单质钼纳米线薄膜的场发射 J-E和 F-N特性曲线图。 图 9b是三氧化钼纳米线薄膜的场发射 J-E和 F-N特性曲线图。 图 7c是二氧化钼纳米线薄膜的场发射稳定性曲线。  Figure 7b shows the field emission J-E and F-N characteristics of the MoO2 nanowire film. Figure 8b shows the field emission J-E and F-N characteristics of the elemental molybdenum nanowire film. Figure 9b shows the field emission J-E and F-N characteristics of the MoO3 nanowire film. Figure 7c is the field emission stability curve of the MoO2 nanowire film.
图 8c是单质钼纳米线薄膜的场发射稳定性曲线。  Figure 8c is the field emission stability curve of the elemental molybdenum nanowire film.
图 9c是三氧化钼纳米线薄膜的场发射稳定性曲线。  Fig. 9c is the field emission stability curve of the molybdenum trioxide nanowire film.
图 10是二氧化钨纳米线薄膜的场发射 J-E和 F-N特性曲线图。 图 11a是二氧化钨纳米线薄膜的场发射像。 '  Fig. 10 is a graph of field emission J-E and F-N characteristics of a tungsten dioxide nanowire film. Figure 11a is a field emission image of a tungsten dioxide nanowire film. '
图 lib是单质钨纳米线薄膜 场发射 J-E和 F-N特性曲线图。 图 11c是二氧化钨纳米线薄應的场发射稳定性曲线图。  Figure lib is a graph of field emission J-E and F-N characteristics of elemental tungsten nanowire films. Fig. 11c is a graph of field emission stability of a thin film of tungsten dioxide nanowires.
图 12a是三氧化钨纳米线薄膜的场发射像。  Figure 12a is a field emission image of a tungsten trioxide nanowire film.
图 12b是三氧化钨纳米线薄膜的场发射 J-E和 F-N特性曲线图。 图 12c是三氧化钨纳米线薄膜的场发射稳定性曲线图。 图 13a是氧化钼纳米线薄膜应用到冷阴极发光管中, 发光管正在工作的情况。 图 13b是阳极电压为 7千伏时氧化钼纳米线薄膜应用到冷阴极发光管中, 阳 极电压为 7千伏时的 I-V特'性曲线。 Figure 12b is a graph of field emission JE and FN characteristics of a tungsten trioxide nanowire film. FIG. 12c is a field emission stability graph of a tungsten trioxide nanowire film. FIG. 13a shows a case where a molybdenum oxide nanowire film is applied to a cold cathode light emitting tube, and the light emitting tube is working. FIG. 13b is an IV characteristic curve of a molybdenum oxide nanowire film applied to a cold cathode light-emitting tube when the anode voltage is 7 kV, and the anode voltage is 7 kV.
实施例 Examples
一、 制备二氧化钼的纳米线薄膜。 1. Prepare a nanowire film of molybdenum dioxide.
1 选用 (100) 面的单晶娃片作为衬底, 先在丙酮中超声清洗 5 分钟, 然后在 无水乙醇中超声清洗 5分钟。  1 Using a (100) plane single crystal silicon wafer as the substrate, first ultrasonically clean it in acetone for 5 minutes, and then ultrasonically clean it in absolute ethanol for 5 minutes.
2 选用钼舟作为钼源, 将钼舟放在真空加热装置中 (c|)350x400mm), 将硅片放 在钼舟的源的正上方, 它们之间的距离为 lmm。先对真空加热装置预抽真空 至 1.0xlO-2Torr,然后通入氩气作为保护气体,气流量为 200标准立方厘米每 秒, 并保持恒流。 2 Select a molybdenum boat as the molybdenum source, place the molybdenum boat in a vacuum heating device (c |) 350x400mm), and place the silicon wafer directly above the source of the molybdenum boat with a distance of 1mm between them. Pre-evacuate the vacuum heating device to 1.0xlO- 2 Torr, and then pass in argon as a protective gas with a gas flow rate of 200 standard cubic centimeters per second and maintain a constant current.
3 将钼舟升温,升温速度为 100°C /每分钟,最后升温至 1200°C并保温 30分钟。  3 Increase the temperature of the molybdenum boat at a rate of 100 ° C / minute, and finally raise the temperature to 1200 ° C and keep it for 30 minutes.
4 在氩气气氛下降温, 直至冷却至室温。  4 Reduce the temperature in an argon atmosphere until it cools to room temperature.
二、 制备单质钼的纳米线薄膜。 2. Prepare a nanowire film of elemental molybdenum.
1 将二氧化钼纳米线薄膜样品放在真空加热装置中 (φ350χ400ηιπι)。将真空加 热装置预抽真空至 1.0x l(T2Torr, 然后通入高纯度氢气, 氢气气流量为 200 标准立方厘米每秒。 1 Place a sample of Mo 2 nanowire film in a vacuum heating device (φ350 × 400ηιπι). Pre-evacuate the vacuum heating device to 1.0 × l (T 2 Torr), and then pass in high-purity hydrogen with a hydrogen gas flow rate of 200 standard cubic centimeters per second.
2 给样品升温, 升温速度为 100°C /每分钟, 最后升温至 800°C并保温 10个小 时。  2 Warm up the sample at a rate of 100 ° C / minute, and finally raise the temperature to 800 ° C and keep it for 10 hours.
3 在氢气气氛下降温, 直至冷却至室温。  3 Reduce the temperature in a hydrogen atmosphere until it cools to room temperature.
三、 制备三氧化钼的纳米线薄膜。 3. Preparation of nanowire films of molybdenum trioxide.
1 将二氧化钼纳米线薄膜样品放在真空加热装置中 (φ350χ400πιηι)。 将真空 加热装置预抽真空至 1.0Χ10·2ΤΟΓΓ, 然后通入氩气和氧气的混合气体, 气流 量分别为 100标准立方厘米每秒。 1 Place a sample of Mo 2 nanowire film in a vacuum heating device (φ350 × 400πιη). The vacuum heating device was pre-evacuated to 1.0 × 10 · 2 ΤΟΓΓ, and then a mixed gas of argon and oxygen was introduced, and the gas flow rates were 100 standard cubic centimeters per second.
2 将样品升温,升温速度为 100°C /每分钟,最后升温至 400°C并保温 30分钟。  2 Increase the temperature of the sample at a rate of 100 ° C / minute, and finally increase the temperature to 400 ° C and hold for 30 minutes.
3 在氩气和氧气的混合气体气氛下降温, 直至冷却至室温。  3 Reduce the temperature in a mixed gas atmosphere of argon and oxygen until it cools to room temperature.
四、 制备二氧化钨的纳米线簿膜。 4. Prepare a nanowire film of tungsten dioxide.
1 选用 (100)面的单晶桂片作为衬底, 先在丙酮中超声清洗 5分钟, 然后在 无水乙醇中超声清洗 5分钟。 2 选用钨舟作为钨源, 将钨舟放在真空加热装置中 ((|)350><400mm), 将硅片放 在钨舟上。先对真空加热装置预抽真空至 1.0xl 0_2Torr,然后通入氩气作为保 护气体, 气流量为 200标准立方厘米每秒, 并保持恒流。 1 Using a (100) plane single crystal cassia wafer as the substrate, first ultrasonically clean it in acetone for 5 minutes, and then ultrasonically clean it in absolute ethanol for 5 minutes. 2 Select a tungsten boat as the tungsten source, place the tungsten boat in a vacuum heating device ((|) 350><400mm), and place the silicon wafer on the tungsten boat. Pre-evacuate the vacuum heating device to 1.0xl 0_ 2 Torr, and then introduce argon as a protective gas with a gas flow rate of 200 standard cubic centimeters per second and maintain a constant current.
3 将钨舟升温,升温速度为 100°C /每分钟,最后升温至 1200°C并保温 30分钟。 4 在氩气气氛下降温, 直至冷却至室温。  3 Increase the temperature of the tungsten boat to 100 ° C per minute, and finally raise the temperature to 1200 ° C and keep it for 30 minutes. 4 Reduce the temperature in an argon atmosphere until it cools to room temperature.
五、 制备单质钨的纳米线薄膜。 5. Preparation of nanowire thin film of elemental tungsten.
1 将二氧化钨纳米线薄膜样品放在真空加热装置中 ((()350x400mm)。 将真空 加热装置预抽真空至 1.0xlO_2Torr, 然后通入高纯度氢气, 氢气气流量为 200 标准立方厘米每秒。 1 Place a sample of tungsten dioxide nanowire film in a vacuum heating device ((() 350x400mm). Pre-evacuate the vacuum heating device to 1.0xlO_ 2 Torr, and then pass in high-purity hydrogen, and the hydrogen gas flow rate is 200 standard cubic centimeters. Every second.
2 给样品升温, 升温速度为 100°C /每分钟, 最后升温至 800°C并保温 10个小 时。  2 Warm up the sample at a rate of 100 ° C / minute, and finally raise the temperature to 800 ° C and keep it for 10 hours.
3 在氢气气氛下降温, 直至冷却至室温。  3 Reduce the temperature in a hydrogen atmosphere until it cools to room temperature.
六、 制备三氧化钨的纳米线薄膜。 6. Prepare a nanowire film of tungsten trioxide.
1 将二氧化钨纳米线薄膜样品放在真空加热装置中 (φ350χ400ιηιη)。将真空加 热装置预抽真空至 1.0x l O—2Torr, 然后通入氩气和氧气的混合气体, 气流量 分别为 100标准立方厘米每秒。 1 Place a sample of tungsten dioxide nanowire film in a vacuum heating device (φ350 × 400ιηη). The vacuum heating device was pre-evacuated to 1.0xl O- 2 Torr, and then a mixed gas of argon and oxygen was passed in, and the gas flow rates were 100 standard cubic centimeters per second.
2 将样品升温,升温速度为 100°C /每分钟,最后升温至 800。C并保温 30分钟。  2 Raise the temperature of the sample at 100 ° C / minute, and finally increase the temperature to 800. C and incubate for 30 minutes.
3 在氩气和氧气的混合气体气氛下降温, 直至冷却至室温。  3 Reduce the temperature in a mixed gas atmosphere of argon and oxygen until it cools to room temperature.
对于上面实施例中所制备的钨、 钼及其氧化物的纳米线薄膜, 我们用 X射线 衍射 (XRD)、扫描电镜 ( SEM)、透射电镜 (TEM)、能谱 (EDS )和拉曼光谱 (RAMAN) 等进行观察和分析。 还研究了它们的场致电子发射特性, 并应用到冷阴极发光管 中。 以下结合附图和附表对本发明作进一步说明。  For the nanowire thin films of tungsten, molybdenum and their oxides prepared in the above examples, we used X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM), energy spectroscopy (EDS), and Raman spectroscopy (RAMAN), etc. for observation and analysis. Their field electron emission characteristics have also been studied and applied to cold cathode light emitting tubes. The present invention is further described below with reference to the accompanying drawings and the attached table.
图 1 (a)是二氧化钼鈉米线薄膜的 XRD谱, 通过对该谱进行分析, 我们可以 知道该纳米线薄膜是具有单斜结构二氧化钼纳米线。 从典型样品的 SEM照片(图 1 (b) ) 中可以看到, 纳米线是垂直于衬底生长的, 纳米线的直径约为 150纳米, 长约为 3微米。 通过高分辨 TEM (图 1 (c) ) 及相应的电子衍射 (图 1 (c) 右上 角插图) 分析, 我们还可以确知该纳米线具有晶体结构。 图 2 (a) 是单质钼纳米 线薄膜的 XRD谱, 通过对该谱进行分析, 我们可以确知该纳米线薄膜是非常纯的 具有体心立方结构的钼纳米线。 钼纳米线的形貌与二氧化钼纳米线相似, 纳米线 的直径稍微小一点, 约为 lOOnm [图 2 (b) ]。通过高分辨 TEM [图 2 (c) ]及相应 的电子衍射(图 2 (c) 右上角插图) 分析, 我们可以确知钼纳米线也具有晶体结 构。 图 3 (a)是三氧化 目纳米线薄膜的 XRD谱, 通过分析, 我们可以确知该纳 米线薄膜是非常纯的具有正交结构的三氧化钼纳米线。 三氧化钼纳米线也是垂直 衬底生长的, 形貌与二氧化钼纳米线基本相似, 直径约为 200nm [图 3 (b) ]。 通 过高分辨 TEM [图 3 (c ) ] 及相应的电子衍射(图 3 (c)右上角插图)分析, 我 们可以知道该纳米线具有晶体结构。 图 4 (a) 是二氧化钨纳米线薄膜的 XRD谱, 通过对该谱进行分析, 我们可以知道该纳米线薄膜是具有单斜结构二氧化钨纳米 线。 从典型样品的 SEM照片 (图 4 (b) ) 中可以看到, 纳米线的直径约为 100纳 米, 长约为 2微米。 通过高分辨 TEM (图 4 (c) )及相应的电子衍射 (图 1 (c) 右上角插图) 分析, 我 ί门还可以确知该纳米线具有晶体结构, 但是有很多缺陷。 图 5 (a)是单质钨纳米线薄膜的 XRD谱, 通过对该谱进行分析, 我们可以确知该 纳米线薄膜是非常纯的具有体心立方结构的钨纳米线。 图 5 (b ) 是钨纳米线的 SEM图。通过髙分辨 TEM [图 5 (c) ]及相应的电子衍射(图 2 (c)右上角插图) 分析, 我们可以确知钨内米线也具有晶体结构。 图 6 ( a) 是三氧化钨纳米线薄膜 的 XRD谱, 通过分析, 我们可以确知该纳米线薄膜是非常纯的具有单斜结构的 三氧化钨纳米线。图 6 (b )是三氧化钨纳米线薄膜的 SEM图。通过高分辨 TEM [图 6 (c) ]及相应的电子 ί行^" (图 6 (c) 右上角插图)分析, 我们可以知道该纳米 线具有单晶结构。 Figure 1 (a) is the XRD spectrum of the molybdenum dioxide sodium noodle film. By analyzing the spectrum, we can know that the nanowire film is a molybdenum dioxide nanowire with a monoclinic structure. From the SEM photos of typical samples (Figure 1 (b)), it can be seen that the nanowires are grown perpendicular to the substrate. The diameter of the nanowires is about 150 nanometers and the length is about 3 micrometers. Through high-resolution TEM (Figure 1 (c)) and corresponding electron diffraction (inset in the upper right corner of Figure 1 (c)) analysis, we can also confirm that the nanowire has a crystal structure. Figure 2 (a) is the XRD spectrum of the elemental molybdenum nanowire film. By analyzing the spectrum, we can confirm that the nanowire film is a very pure molybdenum nanowire with a body-centered cubic structure. The morphology of molybdenum nanowires is similar to that of molybdenum dioxide nanowires. The diameter is slightly smaller, about 100 nm [Fig. 2 (b)]. By high-resolution TEM [Fig. 2 (c)] and the corresponding electron diffraction (inset in the upper right corner of Fig. 2 (c)) analysis, we can confirm that the molybdenum nanowires also have a crystal structure. Figure 3 (a) is the XRD spectrum of the trioxide nanowire film. Through analysis, we can confirm that the nanowire film is a very pure molybdenum trioxide nanowire with an orthogonal structure. Molybdenum trioxide nanowires are also grown on a vertical substrate, and their morphology is basically similar to that of molybdenum dioxide nanowires, with a diameter of about 200 nm [Fig. 3 (b)]. By high-resolution TEM [Figure 3 (c)] and corresponding electron diffraction analysis (inset in the upper right corner of Figure 3 (c)), we can know that the nanowire has a crystal structure. Figure 4 (a) is the XRD spectrum of the tungsten dioxide nanowire film. By analyzing the spectrum, we can know that the nanowire film is a tungsten dioxide nanowire with a monoclinic structure. From the SEM photos of typical samples (Figure 4 (b)), it can be seen that the diameter of the nanowires is about 100 nanometers and the length is about 2 micrometers. Through high-resolution TEM (Figure 4 (c)) and corresponding electron diffraction (inset in the upper right corner of Figure 1 (c)) analysis, we can also confirm that the nanowire has a crystal structure, but there are many defects. Figure 5 (a) is the XRD spectrum of the elemental tungsten nanowire film. By analyzing the spectrum, we can confirm that the nanowire film is a very pure tungsten nanowire with a body-centered cubic structure. FIG. 5 (b) is an SEM image of tungsten nanowires. Through the analysis of ytterbium-resolved TEM [Fig. 5 (c)] and the corresponding electron diffraction (inset in the upper right corner of Fig. 2 (c)), we can confirm that the noodles in tungsten also have a crystal structure. Figure 6 (a) is the XRD spectrum of the tungsten trioxide nanowire film. Through analysis, we can confirm that the nanowire thin film is a very pure tungsten trioxide nanowire with a monoclinic structure. FIG. 6 (b) is a SEM image of a tungsten trioxide nanowire film. From high-resolution TEM [Figure 6 (c)] and the corresponding electron line analysis (inset in the upper right corner of Figure 6 (c)), we can know that the nanowire has a single crystal structure.
图 7 (a)、 图 8 (a) 和图 9 (a) 分别是二氧化钼、 单质钼和三氧化钼纳米线 薄膜的场发射像, 我们可以发现这些纳米线薄膜场发射非常均匀, 发光区域的形 貌与薄膜形貌(图 7 (a)、 图 8 (a)和图 9 ( a) 的左上角插图)基本一致。 图 7 (b)、 图 8 (b)和图 9 Cb) 及左上角插图分别是二氧化钼、 单质钼和三氧化钼纳 米线薄膜的场发射 J-E禾口 F-N特性曲线图,从它们的 J-E特性图中我们可以发现二 氧化钼、 单质钼和三氧化钼纳米线薄膜的开启电场和阈值电场 (开启电场和阈值 电场分别定义为产生 10 μ A/cm2和 lOmA/cm2电流密度所需的电场) 分别为 2MV/m、 2.2MV/m、 3.5MV/m和 4.75MV/m、 6.24MV/m和 7.65MV/m。 它们的阈 值电场可以与碳纳米管的阈值电场相当。 它们的 F-N曲线成线性关系, 说明它们 的场发射满足经典的场发^理论。 图 Ί (c)、 图 8 (c) 和图 9 (c) 分别是二氧化 钼、 单质钼和三氧化钼纳米线薄膜的场发射稳定性曲线, 它们的波动分别只有Figures 7 (a), 8 (a), and 9 (a) are the field emission images of molybdenum dioxide, elemental molybdenum, and molybdenum trioxide nanowire thin films. We can find that these nanowire thin films have very uniform field emission and emit light. The morphology of the area is basically the same as the morphology of the film (insets in the upper left corner of Figures 7 (a), 8 (a), and 9 (a)). Figures 7 (b), 8 (b), and 9Cb) and the upper left illustration are the field emission JE and FN characteristic curves of molybdenum dioxide, elemental molybdenum, and molybdenum trioxide nanowire films, respectively. From their JE characteristic diagram, we can find molybdenum dioxide, open field and threshold field elemental molybdenum and molybdenum trioxide nanowire film (turn-on field threshold field are defined required to produce a 10 μ a / cm 2 and lOmA / cm 2 current density Electric field) are 2MV / m, 2.2MV / m, 3.5MV / m and 4.75MV / m, 6.24MV / m and 7.65MV / m. Their threshold electric field can be comparable to that of carbon nanotubes. Their FN curves are linear, indicating that their field emission meets the classical field emission theory. Figures Ί (c), 8 (c) and 9 (c) are dioxide The field emission stability curves of molybdenum, elemental molybdenum, and molybdenum trioxide nanowire films have only fluctuations, respectively.
±2.5%、 ±5%和 ±10%。 图 11 (a)和图 12 (a)分别是二氧化钨和三氧化钨纳米线 薄膜的场发射像, 我们可以发现这些纳米线薄膜场发射非常均匀, 发光区域的形 貌与薄膜形貌(图 11 (a)和图 12 (a))基本一致。 图 10、 图 11 (b)和图 12 (b) 及左上角插图分别是二氧化钨、单质钨和三氧化钨纳米线薄膜的场发射 J-E和 F-N 特性曲线图,从它们的 J-E特性图中我们可以发现二氧化钨、单质钨和三氧化钨纳 米线薄膜的开启电场 5.2MV/m、 8MV/m和 2.45MV/m。 图 11 (c)和图 12 (c)分 别是二氧化钨和三氧化钨纳米线薄膜的场发射稳定性曲线, 它们的波动分别只有 ±4%和 ±2%。这说明它们具有优异的场发射稳定性,这对它们在实际应用中很有意 义。 表 1给出了各种纳米线薄膜的场发射特性: (见表一) ± 2.5%, ± 5%, and ± 10%. Figure 11 (a) and Figure 12 (a) are the field emission images of tungsten dioxide and tungsten trioxide nanowire films, respectively. We can find that the nanowire films have very uniform field emission, and the morphology of the light-emitting area and the film morphology ( Figure 11 (a) and Figure 12 (a)) are basically the same. Figure 10, Figure 11 (b) and Figure 12 (b), and the upper left illustration are the field emission JE and FN characteristic curves of tungsten dioxide, elemental tungsten, and tungsten trioxide nanowire films, respectively. From their JE characteristic diagrams We can find the opening electric fields of tungsten dioxide, elemental tungsten and tungsten trioxide nanowire films at 5.2MV / m, 8MV / m and 2.45MV / m. Figure 11 (c) and Figure 12 (c) are the field emission stability curves of tungsten dioxide and tungsten trioxide nanowire films, respectively, and their fluctuations are only ± 4% and ± 2%, respectively. This shows that they have excellent field emission stability, which is of great significance to them in practical applications. Table 1 shows the field emission characteristics of various nanowire films: (see Table 1)
表 1  Table 1
Figure imgf000008_0001
Figure imgf000008_0001
从表中可以看到, 我们所制备的纳米线薄膜的开启电场和阈值电场比报道的 最好的碳纳米管和碳化硅纳米线高一些, 不过与其它的材料相比可以相当或更好。 图 13给出了二氧化钼纳米线薄膜应用到冷阴极发光管中的情况。 图 13 (a) 是发 光管正在工作的情况, 可以看到发光管发光非常均匀; 13 (b)给出了阳极电压为 7千伏时的 I-V特性曲线, 从曲线中可以看到, 发光管在低于 500伏就开始有发射 电流了。 It can be seen from the table that the opening electric field and threshold electric field of the nanowire thin films we prepared are higher than the best reported carbon nanotubes and silicon carbide nanowires, but they can be comparable or better than other materials. Figure 13 shows the application of molybdenum dioxide nanowire thin film to a cold cathode light emitting tube. Fig. 13 (a) shows the situation that the arc tube is working. It can be seen that the arc tube emits light very uniformly. 13 (b) shows the IV characteristic curve when the anode voltage is 7 kV. From the curve, we can see that the arc tube At below 500 volts there is an emission current.
从上述分析结果可以得出结论, 我们所制备出了钨、 钼及其氧化物的纳米线 薄膜。 同时上述纳米线薄膜具有很好的场发射特性, 它们的开启电场和阈值电场 都 较低, 稳定性比较优异, 这说明它们完全可以满足作为场致电子发射显示材 料的要求, 可以应用到场致发射平板显示器、 冷阴极发光管、 冷光源等。  From the above analysis results, we can conclude that we have prepared nanowire thin films of tungsten, molybdenum and their oxides. At the same time, the above nanowire films have very good field emission characteristics. Their opening electric fields and threshold electric fields are low, and their stability is relatively good. This shows that they can fully meet the requirements for field electron emission display materials and can be applied to field emission Flat panel display, cold cathode light emitting tube, cold light source, etc.

Claims

权 利 要 求 Rights request
1、 一种大面积钨、 钼及其氧化物纳米线与阵列, 其特征在于: 钨、 钼及其氧 化物的纳米线及其阵列生长在大面积的衬底上。  1. A large-area tungsten, molybdenum, and oxide nanowires and arrays thereof, characterized in that: the tungsten, molybdenum, and oxide nanowires and arrays are grown on a large-area substrate.
2、 根据权利要求 1 所述的一种大面积钨、 钼及其氧化物纳米线与阵列, 其特 征在于: 所述的衬底是单晶硅片、 金属片、 玻璃、 陶瓷及其他耐高温的材 料, 几何形状不限, 纳米线生长在上述衬底上形成纳米线薄膜和阵列。 2. The large-area tungsten, molybdenum, and oxide nanowires and arrays thereof according to claim 1, wherein the substrate is a single crystal silicon wafer, a metal wafer, glass, ceramic, or other high-temperature resistant Materials are not limited in geometry, and nanowires are grown on the substrate to form nanowire films and arrays.
3、 根据权利要求 1 所述的一种大面积钨、 钼及其氧化物纳米线与阵列, 其特 征在于: 所述的衬底是硅针尖阵列, 钨、 钼及其氧化物的纳米线生长在硅 针尖上形成纳米线的阵列。 3. The large-area tungsten, molybdenum and its oxide nanowires and arrays according to claim 1, wherein: the substrate is a silicon pinpoint array, and the nanowires of tungsten, molybdenum and its oxides are grown. An array of nanowires is formed on the silicon tip.
4、 权利要求 1、 2或 3任一权利要求所述的氧化物中的二氧化钨和二氧化钼纳 米线及其阵列的制备方法, 按以下步骤进行- a)清洗衬底, 除去衬底上的杂质; 4. The method for preparing tungsten dioxide and molybdenum dioxide nanowires and their arrays in the oxide according to any one of claims 1, 2 or 3, is performed according to the following steps-a) cleaning the substrate, removing the substrate Impurities on
b)将钨(钼)源和衬底放在真空加热装置, 先将装置预抽真空, 然后通入 惰性气体作为保护气体, 并保持恒流;  b) The tungsten (molybdenum) source and substrate are placed in a vacuum heating device, the device is pre-evacuated, and then an inert gas is passed as a protective gas, and a constant current is maintained;
c) 对钨 (钼) 源和衬底分别升温。 制备二氧化钨时, 钨源加热至 c) Heating the tungsten (molybdenum) source and substrate separately. When preparing tungsten dioxide, the tungsten source is heated to
1000~2000°C , 衬底加热至 900~1400°C ; 制备二氧化钼时, 钼源加热至 1000~2000°C, 衬底加热至 800~1100°C。 保温时间为 1分钟至 120分钟。 d)在惰性气体气氛下降温, 直至冷却至室温。 1000 ~ 2000 ° C, the substrate is heated to 900 ~ 1400 ° C; when preparing molybdenum dioxide, the molybdenum source is heated to 1000 ~ 2000 ° C, and the substrate is heated to 800 ~ 1100 ° C. The holding time is from 1 minute to 120 minutes. d) The temperature is lowered in an inert gas atmosphere until it is cooled to room temperature.
5、 根据权利要求 4所述的二氧化钨和二氧化钼的纳米线及其阵列的制备方法, 其特征在于: 所述的钨源是钨粉、 钨片或钨舟, 钼源是钼粉、 钼片或钼舟。 5. The method for preparing nanowires and arrays of tungsten dioxide and molybdenum dioxide according to claim 4, wherein: the tungsten source is tungsten powder, tungsten sheet or tungsten boat, and the molybdenum source is molybdenum powder , Molybdenum flakes or Molybdenum boat.
6、 权利要求 1、 2或 3所述的单质的钨、 钼的纳米线及其阵列的制备方法, 按 以下步骤进行- a)将长有二氧化钨(或二氧化钼) 纳米线及其阵列的衬底放在真空加热装 置中, 先对真空加热装置预抽真空, 然后通入氢气作为还原气体, 并保持 恒流。 6. The method for preparing elemental tungsten and molybdenum nanowires and their arrays according to claim 1, 2 or 3, is performed according to the following steps-a) growing tungsten dioxide (or molybdenum dioxide) nanowires and The substrate of the array is placed in a vacuum heating device. The vacuum heating device is pre-evacuated, and then hydrogen is passed as a reducing gas, and a constant current is maintained.
b)对衬底升温至 500~1100°C, 保温 3至 15小时。  b) The substrate is warmed to 500 ~ 1100 ° C and held for 3 to 15 hours.
c)在氢气气氛下降温, 直至冷却至室温。  c) The temperature is lowered in a hydrogen atmosphere until it is cooled to room temperature.
7、 权利要求 1、 2或 3所述的氧化物中的三氧化钨和三氧化铝的纳米线及其阵 列的制备方法, 按以下步骤进行: a)将长有二氧化钨(二氧化钼)纳米线及其阵列的衬底放在真空加热装置中, 先对真空加热装置预抽真空, 然后通入氩气和氧气的混合气体, 并保持恒 流; 7. The method for preparing the nanowires of tungsten trioxide and aluminum trioxide and the arrays thereof in the oxide according to claim 1, 2 or 3, is performed according to the following steps: a) Placing the substrate with tungsten dioxide (molybdenum dioxide) nanowires and their arrays in a vacuum heating device, pre-evacuating the vacuum heating device, and then passing in a mixed gas of argon and oxygen, and maintaining Constant current
b) 制备三氧化钨时对衬底升温至 500-1000°C, 保温 2-60分钟; 制备三氧化 钼对衬底升温至 300-600°C, 保温 2-60分钟;  b) The substrate is heated to 500-1000 ° C during the preparation of tungsten trioxide and held for 2-60 minutes; the preparation of molybdenum trioxide is heated to 300-600 ° C for the substrate and held for 2-60 minutes;
c)在氩气和氧气的混合气体气氛下降温, 直至冷却至室温;  c) The temperature is lowered in a mixed gas atmosphere of argon and oxygen until cooled to room temperature;
、 权利要求 1、 2或 3所述的钨、 钼及其氧化物的纳米线及其阵列用作场致电 子发射冷阴极材料的应用。 The nanowires and arrays of tungsten, molybdenum, and their oxides as claimed in claim 1, 2 or 3, for use as a field cathode cold cathode material.
、 根据权利要求 8所述的应用包括冷阴极发光管的应用。 The application according to claim 8, including the application of a cold cathode light emitting tube.
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