WO2005047979A3 - Optical system - Google Patents

Optical system Download PDF

Info

Publication number
WO2005047979A3
WO2005047979A3 PCT/EP2004/012113 EP2004012113W WO2005047979A3 WO 2005047979 A3 WO2005047979 A3 WO 2005047979A3 EP 2004012113 W EP2004012113 W EP 2004012113W WO 2005047979 A3 WO2005047979 A3 WO 2005047979A3
Authority
WO
WIPO (PCT)
Prior art keywords
bearing
optical system
stages
gap
lenses
Prior art date
Application number
PCT/EP2004/012113
Other languages
French (fr)
Other versions
WO2005047979A2 (en
Inventor
Erik Sohmen
Paul Kaufmann
Werner Schwarz
Original Assignee
Zeiss Carl Smt Ag
Erik Sohmen
Paul Kaufmann
Werner Schwarz
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag, Erik Sohmen, Paul Kaufmann, Werner Schwarz filed Critical Zeiss Carl Smt Ag
Publication of WO2005047979A2 publication Critical patent/WO2005047979A2/en
Publication of WO2005047979A3 publication Critical patent/WO2005047979A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

Abstract

An optical signal, in particular for projection microlithography, having optical elements (2), in particular mirrors and/or lenses, in a sealed sheath in which there is an inert gas or vacuum, and having a bearing (1) with a bearing gap. The bearing is a fluid bearing and the bearing gap (7) has restriction stages and is pumped differentially in two or more stages.
PCT/EP2004/012113 2003-11-06 2004-10-27 Optical system WO2005047979A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US51770603P 2003-11-06 2003-11-06
US60/517,706 2003-11-06

Publications (2)

Publication Number Publication Date
WO2005047979A2 WO2005047979A2 (en) 2005-05-26
WO2005047979A3 true WO2005047979A3 (en) 2005-09-09

Family

ID=34590184

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2004/012113 WO2005047979A2 (en) 2003-11-06 2004-10-27 Optical system

Country Status (1)

Country Link
WO (1) WO2005047979A2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006038455A1 (en) * 2006-08-16 2008-02-21 Carl Zeiss Smt Ag Optical system for semiconductor lithography, has adjusting unit positioning optical component, where contact points of adjusting unit at optical component is selected, such that no moments develop at optical component
US8952342B2 (en) 2009-12-17 2015-02-10 Mapper Lithography Ip B.V. Support and positioning structure, semiconductor equipment system and method for positioning
DE102015220817A1 (en) 2015-10-26 2015-12-24 Carl Zeiss Smt Gmbh Measuring device with air bearing

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010038442A1 (en) * 2000-05-03 2001-11-08 Silicon Valley Group, Inc. Method and apparatus for a non-contact scavenging seal
US20020180946A1 (en) * 1999-04-19 2002-12-05 Asml Netherlands B.V. Motion feed-through into a vacuum chamber and its application in lithographic projection apparatus
EP1306592A2 (en) * 2001-10-24 2003-05-02 Ebara Corporation Differential pressure seal apparatus with pumped fluid
EP1310828A1 (en) * 2001-11-09 2003-05-14 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1318424A2 (en) * 2001-12-06 2003-06-11 Nikon Corporation Non-contacting holding device for an optical component

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020180946A1 (en) * 1999-04-19 2002-12-05 Asml Netherlands B.V. Motion feed-through into a vacuum chamber and its application in lithographic projection apparatus
US20010038442A1 (en) * 2000-05-03 2001-11-08 Silicon Valley Group, Inc. Method and apparatus for a non-contact scavenging seal
EP1306592A2 (en) * 2001-10-24 2003-05-02 Ebara Corporation Differential pressure seal apparatus with pumped fluid
EP1310828A1 (en) * 2001-11-09 2003-05-14 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1318424A2 (en) * 2001-12-06 2003-06-11 Nikon Corporation Non-contacting holding device for an optical component

Also Published As

Publication number Publication date
WO2005047979A2 (en) 2005-05-26

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