WO2005054955A3 - Lithographic apparatus and device manufacturing method - Google Patents
Lithographic apparatus and device manufacturing method Download PDFInfo
- Publication number
- WO2005054955A3 WO2005054955A3 PCT/EP2004/013310 EP2004013310W WO2005054955A3 WO 2005054955 A3 WO2005054955 A3 WO 2005054955A3 EP 2004013310 W EP2004013310 W EP 2004013310W WO 2005054955 A3 WO2005054955 A3 WO 2005054955A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- joint
- device manufacturing
- lithographic apparatus
- lens
- support
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
Abstract
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/719,683 | 2003-11-24 | ||
US10/719,683 US7545481B2 (en) | 2003-11-24 | 2003-11-24 | Lithographic apparatus and device manufacturing method |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2005054955A2 WO2005054955A2 (en) | 2005-06-16 |
WO2005054955A3 true WO2005054955A3 (en) | 2006-01-05 |
Family
ID=34591399
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2004/013310 WO2005054955A2 (en) | 2003-11-24 | 2004-11-24 | Lithographic apparatus and device manufacturing method |
Country Status (4)
Country | Link |
---|---|
US (2) | US7545481B2 (en) |
CN (1) | CN1906541A (en) |
TW (1) | TWI261150B (en) |
WO (1) | WO2005054955A2 (en) |
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58202448A (en) * | 1982-05-21 | 1983-11-25 | Hitachi Ltd | Exposing device |
JPH06124873A (en) * | 1992-10-09 | 1994-05-06 | Canon Inc | Liquid-soaking type projection exposure apparatus |
US5610683A (en) * | 1992-11-27 | 1997-03-11 | Canon Kabushiki Kaisha | Immersion type projection exposure apparatus |
US20010055826A1 (en) * | 2000-06-16 | 2001-12-27 | Keiko Chiba | Method for manufacturing optical element, optical element, optical system using optical element, optical apparatus and exposure apparatus using optical system, and method for manufacturing device |
US6417974B1 (en) * | 1999-06-26 | 2002-07-09 | Karl-Heinz Schuster | Objective, in particular an objective for a semiconductor lithography projection exposure machine, and a production method |
Family Cites Families (104)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE206607C (en) | ||||
DE242880C (en) | ||||
US396705A (en) * | 1889-01-22 | Emil meyer | ||
DE221563C (en) | ||||
DE224448C (en) | ||||
US3253331A (en) * | 1962-12-06 | 1966-05-31 | Westinghouse Electric Corp | Glass-metallizing technique |
GB1242527A (en) * | 1967-10-20 | 1971-08-11 | Kodak Ltd | Optical instruments |
US3573975A (en) * | 1968-07-10 | 1971-04-06 | Ibm | Photochemical fabrication process |
US4200794A (en) * | 1978-11-08 | 1980-04-29 | Control Data Corporation | Micro lens array and micro deflector assembly for fly's eye electron beam tubes using silicon components and techniques of fabrication and assembly |
NL7904283A (en) * | 1979-05-31 | 1980-12-02 | Philips Nv | COUPLING ELEMENT WITH A LIGHT SOURCE AND A LENS-SHAPED ELEMENT. |
ATE1462T1 (en) | 1979-07-27 | 1982-08-15 | Werner W. Dr. Tabarelli | OPTICAL LITHOGRAPHY PROCESS AND DEVICE FOR COPYING A PATTERN ONTO A SEMICONDUCTOR DISC. |
FR2474708B1 (en) | 1980-01-24 | 1987-02-20 | Dme | HIGH-RESOLUTION MICROPHOTOLITHOGRAPHY PROCESS |
JPS5754317A (en) | 1980-09-19 | 1982-03-31 | Hitachi Ltd | Method and device for forming pattern |
US4346164A (en) * | 1980-10-06 | 1982-08-24 | Werner Tabarelli | Photolithographic method for the manufacture of integrated circuits |
US4509852A (en) * | 1980-10-06 | 1985-04-09 | Werner Tabarelli | Apparatus for the photolithographic manufacture of integrated circuit elements |
US4390273A (en) * | 1981-02-17 | 1983-06-28 | Censor Patent-Und Versuchsanstalt | Projection mask as well as a method and apparatus for the embedding thereof and projection printing system |
JPS57153433A (en) * | 1981-03-18 | 1982-09-22 | Hitachi Ltd | Manufacturing device for semiconductor |
DD206607A1 (en) | 1982-06-16 | 1984-02-01 | Mikroelektronik Zt Forsch Tech | METHOD AND DEVICE FOR ELIMINATING INTERFERENCE EFFECTS |
DD242880A1 (en) | 1983-01-31 | 1987-02-11 | Kuch Karl Heinz | DEVICE FOR PHOTOLITHOGRAPHIC STRUCTURAL TRANSMISSION |
DD221563A1 (en) | 1983-09-14 | 1985-04-24 | Mikroelektronik Zt Forsch Tech | IMMERSIONS OBJECTIVE FOR THE STEP-BY-STEP PROJECTION IMAGING OF A MASK STRUCTURE |
DD224448A1 (en) | 1984-03-01 | 1985-07-03 | Zeiss Jena Veb Carl | DEVICE FOR PHOTOLITHOGRAPHIC STRUCTURAL TRANSMISSION |
NL8501773A (en) * | 1985-06-20 | 1987-01-16 | Philips Nv | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICES |
JPS6265326A (en) | 1985-09-18 | 1987-03-24 | Hitachi Ltd | Exposure device |
JPS62121417A (en) | 1985-11-22 | 1987-06-02 | Hitachi Ltd | Liquid-immersion objective lens device |
JPS63157419A (en) | 1986-12-22 | 1988-06-30 | Toshiba Corp | Fine pattern transfer apparatus |
US5040020A (en) * | 1988-03-31 | 1991-08-13 | Cornell Research Foundation, Inc. | Self-aligned, high resolution resonant dielectric lithography |
JPH03209479A (en) | 1989-09-06 | 1991-09-12 | Sanee Giken Kk | Exposure method |
NL8902271A (en) * | 1989-09-12 | 1991-04-02 | Philips Nv | METHOD FOR CONNECTING TWO BODIES. |
US5121256A (en) * | 1991-03-14 | 1992-06-09 | The Board Of Trustees Of The Leland Stanford Junior University | Lithography system employing a solid immersion lens |
JPH04305917A (en) | 1991-04-02 | 1992-10-28 | Nikon Corp | Adhesion type exposure device |
JPH04305915A (en) | 1991-04-02 | 1992-10-28 | Nikon Corp | Adhesion type exposure device |
US5428482A (en) * | 1991-11-04 | 1995-06-27 | General Signal Corporation | Decoupled mount for optical element and stacked annuli assembly |
US5436766A (en) * | 1992-09-04 | 1995-07-25 | Lockheed Missiles & Space Company, Inc. | Bond between a rigid refractive element and a surrounding housing structure in an optical system containing a liquid refractive element |
JP2520833B2 (en) | 1992-12-21 | 1996-07-31 | 東京エレクトロン株式会社 | Immersion type liquid treatment device |
JPH07220990A (en) | 1994-01-28 | 1995-08-18 | Hitachi Ltd | Pattern forming method and exposure apparatus therefor |
JPH08316124A (en) * | 1995-05-19 | 1996-11-29 | Hitachi Ltd | Method and apparatus for projection exposing |
EP0780345A1 (en) * | 1995-12-22 | 1997-06-25 | Corning Incorporated | Optical element for UV transmission |
US5754893A (en) * | 1996-01-26 | 1998-05-19 | Asahi Kogaku Kogyo Kabushiki Kaisha | Lens barrel having waterproof coating |
US6104687A (en) * | 1996-08-26 | 2000-08-15 | Digital Papyrus Corporation | Method and apparatus for coupling an optical lens to a disk through a coupling medium having a relatively high index of refraction |
US5825043A (en) * | 1996-10-07 | 1998-10-20 | Nikon Precision Inc. | Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus |
JP3612920B2 (en) | 1997-02-14 | 2005-01-26 | ソニー株式会社 | Exposure apparatus for producing an optical recording medium master |
JPH10255319A (en) | 1997-03-12 | 1998-09-25 | Hitachi Maxell Ltd | Master disk exposure device and method therefor |
EP1014429A4 (en) * | 1997-04-18 | 2000-07-19 | Nikon Corp | Method and device for exposure control, method and device for exposure, and method of manufacture of device |
JP3747566B2 (en) | 1997-04-23 | 2006-02-22 | 株式会社ニコン | Immersion exposure equipment |
JP3817836B2 (en) | 1997-06-10 | 2006-09-06 | 株式会社ニコン | EXPOSURE APPARATUS, ITS MANUFACTURING METHOD, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD |
US5900354A (en) * | 1997-07-03 | 1999-05-04 | Batchelder; John Samuel | Method for optical inspection and lithography |
DE19735760A1 (en) * | 1997-08-18 | 1999-02-25 | Zeiss Carl Fa | Soldering an optical component to a metal mounting |
US6147817A (en) * | 1997-12-11 | 2000-11-14 | Nippon Sheet Glass Co., Ltd. | Optical module |
JPH11176727A (en) | 1997-12-11 | 1999-07-02 | Nikon Corp | Projection aligner |
EP1039511A4 (en) | 1997-12-12 | 2005-03-02 | Nikon Corp | Projection exposure method and projection aligner |
DE19755356A1 (en) * | 1997-12-12 | 1999-06-17 | Zeiss Carl Fa | VUV-resistant connection technology for lenses and frames |
AU2747999A (en) | 1998-03-26 | 1999-10-18 | Nikon Corporation | Projection exposure method and system |
DE19818962A1 (en) * | 1998-04-28 | 1999-11-04 | Degussa | Method for connecting two solid bodies and the component produced in this way |
EP1098360A4 (en) * | 1998-06-15 | 2004-09-15 | Nikon Corp | Position sensing method, position sensor, exposure method, exposure apparatus, and production process thereof, and device and device manufacturing method |
JP2000058436A (en) | 1998-08-11 | 2000-02-25 | Nikon Corp | Projection aligner and exposure method |
TWI242111B (en) * | 1999-04-19 | 2005-10-21 | Asml Netherlands Bv | Gas bearings for use in vacuum chambers and their application in lithographic projection apparatus |
US6448568B1 (en) * | 1999-07-30 | 2002-09-10 | Applied Materials, Inc. | Electron beam column using high numerical aperture photocathode source illumination |
JP4504479B2 (en) | 1999-09-21 | 2010-07-14 | オリンパス株式会社 | Immersion objective lens for microscope |
FR2803047B1 (en) * | 1999-12-23 | 2002-07-19 | Opticom Innovation | HYBRID OPTOCOUPLING COMPONENT |
JP2001272604A (en) * | 2000-03-27 | 2001-10-05 | Olympus Optical Co Ltd | Immersion objective lens and optical device using the same |
KR100714927B1 (en) * | 2000-04-25 | 2007-05-07 | 에이에스엠엘 유에스, 인크. | Apparatus, system, and method for precision positioning and alignment of a lens in an optical system |
TW591653B (en) * | 2000-08-08 | 2004-06-11 | Koninkl Philips Electronics Nv | Method of manufacturing an optically scannable information carrier |
KR100866818B1 (en) * | 2000-12-11 | 2008-11-04 | 가부시키가이샤 니콘 | Projection optical system and exposure apparatus comprising the same |
WO2002091078A1 (en) * | 2001-05-07 | 2002-11-14 | Massachusetts Institute Of Technology | Methods and apparatus employing an index matching medium |
US6600547B2 (en) * | 2001-09-24 | 2003-07-29 | Nikon Corporation | Sliding seal |
EP1446703A2 (en) * | 2001-11-07 | 2004-08-18 | Applied Materials, Inc. | Optical spot grid array printer |
DE10229818A1 (en) * | 2002-06-28 | 2004-01-15 | Carl Zeiss Smt Ag | Focus detection method and imaging system with focus detection system |
US7092069B2 (en) * | 2002-03-08 | 2006-08-15 | Carl Zeiss Smt Ag | Projection exposure method and projection exposure system |
DE10210899A1 (en) | 2002-03-08 | 2003-09-18 | Zeiss Carl Smt Ag | Refractive projection lens for immersion lithography |
US6775076B2 (en) * | 2002-06-15 | 2004-08-10 | Intel Corporation | Micro optical bench for mounting precision aligned optics, optical assembly and method of mounting optics |
TWI242691B (en) | 2002-08-23 | 2005-11-01 | Nikon Corp | Projection optical system and method for photolithography and exposure apparatus and method using same |
US7701652B2 (en) * | 2002-09-20 | 2010-04-20 | Mems Optical, Inc. | Optical element/device mounting process and apparatus |
US6788477B2 (en) * | 2002-10-22 | 2004-09-07 | Taiwan Semiconductor Manufacturing Co., Ltd. | Apparatus for method for immersion lithography |
JP3977324B2 (en) | 2002-11-12 | 2007-09-19 | エーエスエムエル ネザーランズ ビー.ブイ. | Lithographic apparatus |
CN101713932B (en) | 2002-11-12 | 2012-09-26 | Asml荷兰有限公司 | Lithographic apparatus and device manufacturing method |
SG121822A1 (en) | 2002-11-12 | 2006-05-26 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
CN101349876B (en) | 2002-11-12 | 2010-12-01 | Asml荷兰有限公司 | Immersion lithographic apparatus and device manufacturing method |
DE60335595D1 (en) | 2002-11-12 | 2011-02-17 | Asml Netherlands Bv | Immersion lithographic apparatus and method of making a device |
SG131766A1 (en) | 2002-11-18 | 2007-05-28 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
TWI255971B (en) | 2002-11-29 | 2006-06-01 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
DE10258718A1 (en) * | 2002-12-09 | 2004-06-24 | Carl Zeiss Smt Ag | Projection lens, in particular for microlithography, and method for tuning a projection lens |
JP4232449B2 (en) | 2002-12-10 | 2009-03-04 | 株式会社ニコン | Exposure method, exposure apparatus, and device manufacturing method |
SG2011031200A (en) | 2002-12-10 | 2014-09-26 | Nippon Kogaku Kk | Exposure apparatus and device manufacturing method |
AU2003302831A1 (en) | 2002-12-10 | 2004-06-30 | Nikon Corporation | Exposure method, exposure apparatus and method for manufacturing device |
WO2004053957A1 (en) | 2002-12-10 | 2004-06-24 | Nikon Corporation | Surface position detection apparatus, exposure method, and device porducing method |
SG150388A1 (en) | 2002-12-10 | 2009-03-30 | Nikon Corp | Exposure apparatus and method for producing device |
US6992750B2 (en) * | 2002-12-10 | 2006-01-31 | Canon Kabushiki Kaisha | Exposure apparatus and method |
KR101157002B1 (en) | 2002-12-10 | 2012-06-21 | 가부시키가이샤 니콘 | Exposure apparatus and method for manufacturing device |
EP1571694A4 (en) | 2002-12-10 | 2008-10-15 | Nikon Corp | Exposure apparatus and method for manufacturing device |
DE10257766A1 (en) | 2002-12-10 | 2004-07-15 | Carl Zeiss Smt Ag | Method for setting a desired optical property of a projection lens and microlithographic projection exposure system |
JP4352874B2 (en) | 2002-12-10 | 2009-10-28 | 株式会社ニコン | Exposure apparatus and device manufacturing method |
WO2004053950A1 (en) | 2002-12-10 | 2004-06-24 | Nikon Corporation | Exposure apparatus and method for manufacturing device |
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WO2004055803A1 (en) | 2002-12-13 | 2004-07-01 | Koninklijke Philips Electronics N.V. | Liquid removal in a method and device for irradiating spots on a layer |
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US6781670B2 (en) * | 2002-12-30 | 2004-08-24 | Intel Corporation | Immersion lithography |
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-
2003
- 2003-11-24 US US10/719,683 patent/US7545481B2/en not_active Expired - Fee Related
-
2004
- 2004-11-22 CN CNA2004800408354A patent/CN1906541A/en active Pending
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- 2004-11-24 WO PCT/EP2004/013310 patent/WO2005054955A2/en active Application Filing
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- 2009-05-08 US US12/463,242 patent/US8472006B2/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58202448A (en) * | 1982-05-21 | 1983-11-25 | Hitachi Ltd | Exposing device |
JPH06124873A (en) * | 1992-10-09 | 1994-05-06 | Canon Inc | Liquid-soaking type projection exposure apparatus |
US5610683A (en) * | 1992-11-27 | 1997-03-11 | Canon Kabushiki Kaisha | Immersion type projection exposure apparatus |
US6417974B1 (en) * | 1999-06-26 | 2002-07-09 | Karl-Heinz Schuster | Objective, in particular an objective for a semiconductor lithography projection exposure machine, and a production method |
US20010055826A1 (en) * | 2000-06-16 | 2001-12-27 | Keiko Chiba | Method for manufacturing optical element, optical element, optical system using optical element, optical apparatus and exposure apparatus using optical system, and method for manufacturing device |
Non-Patent Citations (2)
Title |
---|
PATENT ABSTRACTS OF JAPAN vol. 008, no. 051 (P - 259) 8 March 1984 (1984-03-08) * |
PATENT ABSTRACTS OF JAPAN vol. 018, no. 414 (E - 1587) 3 August 1994 (1994-08-03) * |
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Also Published As
Publication number | Publication date |
---|---|
US7545481B2 (en) | 2009-06-09 |
TWI261150B (en) | 2006-09-01 |
US20050110973A1 (en) | 2005-05-26 |
TW200528931A (en) | 2005-09-01 |
WO2005054955A2 (en) | 2005-06-16 |
US8472006B2 (en) | 2013-06-25 |
CN1906541A (en) | 2007-01-31 |
US20090214986A1 (en) | 2009-08-27 |
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