WO2005059600A1 - Antifogging element - Google Patents
Antifogging element Download PDFInfo
- Publication number
- WO2005059600A1 WO2005059600A1 PCT/JP2003/016109 JP0316109W WO2005059600A1 WO 2005059600 A1 WO2005059600 A1 WO 2005059600A1 JP 0316109 W JP0316109 W JP 0316109W WO 2005059600 A1 WO2005059600 A1 WO 2005059600A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- thin film
- film
- transparent
- hydrophilic
- substrate member
- Prior art date
Links
- 239000010409 thin film Substances 0.000 claims abstract description 223
- 239000000758 substrate Substances 0.000 claims abstract description 64
- 239000000126 substance Substances 0.000 claims abstract description 28
- 239000000376 reactant Substances 0.000 claims abstract description 12
- 230000001699 photocatalysis Effects 0.000 claims description 12
- 239000011941 photocatalyst Substances 0.000 abstract 1
- 230000003449 preventive effect Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 104
- 239000011521 glass Substances 0.000 description 70
- 238000002834 transmittance Methods 0.000 description 23
- 238000010586 diagram Methods 0.000 description 22
- 230000003595 spectral effect Effects 0.000 description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 16
- 239000010410 layer Substances 0.000 description 14
- 238000000034 method Methods 0.000 description 13
- 230000000694 effects Effects 0.000 description 9
- 229910052809 inorganic oxide Inorganic materials 0.000 description 9
- 239000000463 material Substances 0.000 description 8
- 239000002356 single layer Substances 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 238000005240 physical vapour deposition Methods 0.000 description 7
- 238000005229 chemical vapour deposition Methods 0.000 description 6
- 238000013032 photocatalytic reaction Methods 0.000 description 6
- 238000009833 condensation Methods 0.000 description 5
- 230000005494 condensation Effects 0.000 description 5
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- 230000003667 anti-reflective effect Effects 0.000 description 4
- 239000002131 composite material Substances 0.000 description 4
- 239000005357 flat glass Substances 0.000 description 4
- 238000010030 laminating Methods 0.000 description 3
- 238000003475 lamination Methods 0.000 description 3
- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 150000004706 metal oxides Chemical class 0.000 description 3
- 239000005416 organic matter Substances 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 230000020169 heat generation Effects 0.000 description 2
- TUJKJAMUKRIRHC-UHFFFAOYSA-N hydroxyl Chemical compound [OH] TUJKJAMUKRIRHC-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000001443 photoexcitation Effects 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- -1 superoxide ion Chemical class 0.000 description 2
- 230000001629 suppression Effects 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 229910001887 tin oxide Inorganic materials 0.000 description 2
- 241000257465 Echinoidea Species 0.000 description 1
- 206010037660 Pyrexia Diseases 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920003217 poly(methylsilsesquioxane) Polymers 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000002459 sustained effect Effects 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
-
- B01J35/39—
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
Definitions
- the present invention relates to an antifogging element having an antifogging property on the surface side of a substrate member such as a glass plate, and particularly to an antifogging element configured as a hood glass for a camera.
- the dew condensation panel 101 as an anti-fog element is formed on the back side of the glass plate 102 in a shape suitable for the heat generating area suitable for preventing dew condensation.
- Thin-film layer 103 made of tin oxide, zinc oxide, etc.
- an electrode film 105 connected to this thin-film layer 103 for energization, and a power supply terminal 100 to which a power supply wire 107 is connected.
- a protective glass plate 104 provided on the thin film layer 103, the electrode film 105, and the like for preventing and protecting from electric shock.
- the thin film layer 103 is energized, and the heat generated raises the temperature of the surface of the glass plate 102 to prevent dew condensation.
- the window glass for automobiles as an anti-fog element 201 is made of a transparent electrode such as ITO on the front side of a transparent glass substrate 202 constituting the window glass body.
- film 2 0 4, Ding 1 0 2 film 2 0 3 and, overall sequentially deposited porous S i โ 2 film 2 0 3 b has been configured transparent.
- the porous SiO 2 film 203b exhibits hydrophilicity, and the attached water droplets are spread not in a ball shape but in a thin film shape (the contact area with air is reduced).
- clip electrodes 205 and 206 are mounted on the upper side and lower side of the laminated body of the transparent glass substrate 202 and the transparent electrode film 204, and the transparent electrode is supplied from the power supply 2007.
- Ri by the energizing the membrane 2 0 4, and the transparent electrode film 2 0 4 fever, effectively removing the spread water droplets into a thin film shape with porous S i 0 2 film 2 0 3 b surface ing.
- T i 0 2 film 2 O 3 a photoexcited Ri by the porous S i 0 2 film 2 0 3 b the transmitted sunlight other rays, electrons and holes pairs are generated. Then, the electron-positive:?
- the porous SiO 2 film exhibiting hydrophilicity and the transparent electrode film serving as a heating element are provided on the surface side of the transparent glass substrate.
- the anti-fog element is a camera hood glass
- the temperature of the inside and outside air of the storage container tends to be different, so the air inside the storage container will be on the back side (inside air side) of the hood glass.
- the water vapor will condense and cause fogging I'm sorry.
- the above phenomenon is particularly remarkable.
- the transparent electrode film is disposed on the back side of the transparent glass substrate.However, since ITO or the like used for the transparent electrode film has a large refractive index, light is not reflected on the transparent electrode film. appear. Therefore, when the anti-fog element is a camera hood glass, the reflected image of the transparent electrode film appears in the camera image transmitted through the anti-fog element, and a good image cannot be obtained. Was.
- the transparent electrode film or the like as a heating element is disposed on the surface side of the transparent glass substrate, the heating element is exposed to the outside air. As a result, it is necessary to consider the durability of the heating element, for example, acid resistance, etc., and there is a problem that the materials and the like constituting the heating element are limited, and the manufacturing cost is increased.
- JP-A-10-364144 a thin film layer made of tin oxide, indium oxide or the like is used.
- the reflected image appears in the camera image, and there is a problem that a good image cannot be obtained.
- the present invention solves the above-mentioned problem, has excellent anti-fog properties, suppresses reflection of the heating element, and obtains a good image without reflection of the reflection image of the heating element.
- the purpose is to provide an antifogging element that can be manufactured at low cost. Disclosure of the invention
- a first invention is a transparent substrate member, a transparent hydrophilic thin film provided on the surface side of the transparent substrate member and containing a photocatalytic reaction substance and a hydrophilic substance, A transparent conductive thin film provided on the back surface side of the transparent substrate member and containing a conductive substance; and a further back surface of the conductive thin film And a transparent anti-reflection thin film containing a low-refractive-index substance.
- front side means a side of the anti-fogging element that comes into contact with the outside air
- back side means a side of the anti-fogging element that does not come into contact with the outside air
- the hydrophilic substance of the hydrophilic thin film imparts hydrophilicity to the surface side of the transparent substrate member, and water droplets attached to the surface side of the transparent substrate member evaporate in a thin film form.
- the hydrophilic thin film contains the photocatalytic reactant, electron-hole pairs are generated from the photocatalytic reactant by photoexcitation. The electron and hole pairs react with air and water to produce o 2 โ (superoxide ion) and โ OH (hydroxyl radical), which are attached to the hydrophilic thin film by the O and โ OH. Organic matter is decomposed and removed. As a result, the hydrophilicity of the hydrophilic thin film does not decrease.
- a transparent first intermediate thin film is provided between the transparent substrate member and the hydrophilic thin film, and the refractive index of the first intermediate thin film is different from the refractive index of the hydrophilic thin film and the transparent thin film. This is configured as an anti-fog element having an intermediate value of the refractive index of the substrate member.
- the first intermediate thin film fills a large difference in refractive index between the hydrophilic thin film and the transparent substrate member.
- the antireflection thin film is configured as an antifogging element having a laminated structure in which two or more thin films are laminated.
- a fourth invention provides a transparent substrate member, provided on a front surface side of the transparent substrate member, a transparent hydrophilic thin film containing a photocatalytic reactant and a hydrophilic substance, provided on a back surface side of the transparent substrate member.
- a transparent second intermediate thin film further provided on the back side of the second intermediate thin film, and a transparent conductive thin film containing a conductive material, wherein the refractive index of the second intermediate thin film is
- the antifogging element has an intermediate value between the refractive index of the substrate member and the refractive index of the conductive thin film.
- the hydrophilicity of the hydrophilic thin film due to the hydrophilicity of the hydrophilic thin film, water droplets adhered to the surface side of the transparent substrate member evaporate in a thin film shape.
- the hydrophilic thin film contains the photocatalytic reactant, organic substances attached to the hydrophilic thin film are decomposed and removed by electrons and holes generated from the photocatalytic reactant by photoexcitation, and the hydrophilic thin film is removed. Does not decrease in hydrophilicity.
- the heat generated by the conductive thin film water droplets attached to the back surface of the transparent substrate member evaporate.
- the second intermediate thin film fills a large difference in refractive index between the transparent substrate member and the conductive thin film.
- FIG. 1 (a) is a perspective view showing the configuration of a camera hood, and (b) is a cross-sectional view taken along the line X-X of (a) of the first embodiment of the anti-fog element according to the present invention.
- FIG. 7C is a schematic diagram showing the configuration of the cross section of the modification of FIG. 5B in an enlarged manner in the width direction.
- FIG. 2 (a) is a second embodiment of the anti-fogging element according to the present invention, (b) is a third embodiment, and (c) is an enlarged cross-sectional configuration of the fourth embodiment in the width direction.
- FIG. 1 is a perspective view showing the configuration of a camera hood
- FIG. 7C is a schematic diagram showing the configuration of the cross section of the modification of FIG. 5B in an enlarged manner in the width direction.
- FIG. 2 (a) is a second embodiment of the anti-fogging element according to the present invention, (b) is a third embodiment, and (c)
- FIG. 3 is a spectral transmittance characteristic diagram of the first embodiment of the anti-fog element according to the present invention.
- FIG. 4 is a spectral transmittance characteristic diagram of the first embodiment of the antifogging element according to the present invention.
- FIG. 5 is a spectral transmittance characteristic diagram of the first embodiment of the anti-fogging element according to the present invention.
- FIG. 6 is a spectral transmittance characteristic diagram of a third embodiment of the anti-fogging element according to the present invention.
- FIG. 7 is a spectral transmittance characteristic diagram of a third embodiment of the anti-fogging element according to the present invention.
- FIG. 8 is a spectral transmittance characteristic diagram of a third embodiment of the antifogging element according to the present invention.
- FIG. 9 is a spectral transmittance characteristic diagram of the third embodiment of the antifogging element according to the present invention.
- FIG. 10 is a spectral transmittance characteristic diagram of a fourth embodiment of the antifogging element according to the present invention.
- FIGS. 11 (a) and (b) are schematic diagrams showing the cross-sectional configuration of a conventional anti-fog element enlarged in the width direction.
- FIG. 1 (a) is a perspective view showing the configuration of a camera hood, and (b) is an enlarged cross-sectional view of the configuration of (a) of the first embodiment of the antifogging element, taken along the line X-X-ray.
- (C) is a schematic diagram showing the cross-sectional configuration of the modification of (b) enlarged in the width direction
- FIG. 2 (a) is the second embodiment, and (b) is the third embodiment Form
- (c) is a schematic diagram showing a cross-sectional configuration of the fourth embodiment enlarged in the width direction
- FIG. 1 (b) shows a first embodiment of the present invention.
- the anti-fogging element 1 includes a transparent substrate member 2, a hydrophilic thin film 3, a conductive thin film 4, and an anti-reflection thin film 5.
- the transparent substrate member 2 is a plate-like substrate containing transparent glass or acrylic resin.
- the anti-fogging element can take various shapes according to the use status and application, and for example, may be a thin film.
- plastics other than acrylic resin can be used as long as the material has transparency, and more preferably, it has heat resistance and insulating properties.
- the thickness of the transparent substrate member 2 is preferably 1 to 1 Omm.
- the hydrophilic thin film 3 is a transparent thin film containing a photocatalytic reaction substance and a hydrophilic substance.
- the hydrophilic property of this hydrophilic substance imparts hydrophilicity to the hydrophilic thin film 3
- the hydrophilic thin film 3 is formed in a porous shape. Due to this porous shape, the wettability of the surface of the hydrophilic thin film 3 is improved by capillary action, and the hydrophilicity is enhanced.
- the hydrophilic substance is preferably an inorganic oxide, and more preferably a metal oxide.
- Metal oxides for example, an S i 0 2, A 1 2 0 3 or mixtures thereof, these metal oxides show a hydrophilic since it has a hydrophilic OH groups on the surface.
- the photocatalytic reaction substance, T i O have Z n O, S N_ โ 2, Z n S
- the semiconductor is preferably composed mainly of C d S or mixtures thereof, T i 0 2 reactivity, sustained Most preferred in terms of safety and safety.
- the photocatalytic reactant is photoexcited by irradiation with sunlight or the like (light having energy equal to or greater than the band gap of the semiconductor), and electron-hole pairs are generated in the photocatalytic reactant.
- the electron-hole pairs react with air and water in the hydrophilic thin film 3 to generate oxidizing O 2 (superoxide ion) and ' โ H (hydroxyl radical).
- the hydrophilic thin film 3 in FIG. 1 (b) is formed by dispersing (mixing) a photocatalytic reactant in a hydrophilic substance to form a porous film.
- a laminate in which a porous hydrophilic functional thin film 3b containing a hydrophilic substance is laminated on the surface side of a reactive thin film 3a containing a photocatalytic reactant may be used.
- the porous opening of the hydrophilic functional thin film 3b of this laminate is reactive It is more advantageous to reach the surface of the thin film 3a for the decomposition and removal of the organic matter by the electron-pair.
- the hydrophilic thin film 3, the reactive thin film 3a, and the hydrophilic functional thin film 3b may be formed by physical vapor deposition (PVD) such as ion plating and sputtering, thermal CVD, and plasma CVD. It is preferable to carry out by a conventionally known thin film forming method such as a chemical vapor deposition (CVD) method such as VD.
- the thickness of each thin film is preferably 50 to 100 nm in the case of a single-layer hydrophilic thin film 3 in consideration of the hydrophilicity, photocatalytic reactivity, thin film strength and the like of the hydrophilic thin film 3.
- the reactive thin film 3a preferably has a thickness of 50 to 100 nm
- the hydrophilic thin film 3b has a thickness of 5 to 100 nm.
- Electroconductive thin film 4 a transparent conductive material, e.g., ITO, I n 2 0 3 , S N_ โ 2, T a 2 0 5 or including a material which generates heat by energization, such as a mixture thereof. Further, since the conductive thin film 4 is provided on the back side of the transparent substrate member 2, water droplets (fogging) generated on the back side of the transparent substrate member can be removed, and the anti-fogging property is excellent. In particular, as shown in FIG. 1 (a), when the anti-fog element 1 is used for a camera hood 10 in which the temperature of the inside and outside air tends to be different (the transparent substrate member 2 tends to be fogged). It is advantageous.
- the conductive thin film 4 is housed in the camera hood 10, so that the conductive thin film 4 is not exposed to the outside air. Therefore, the material constituting the conductive thin film 4 only needs to consider the above-described electrical conductivity (heat generation), and the durability due to exposure to the outside air, For example, there is no need to consider chemical resistance. As a result, the range of selection as a constituent material is expanded, the conductive thin film 4 can be formed with an inexpensive material, and the manufacturing cost of the anti-fog element 1 can be reduced.
- the hydrophilic thin film 3 prevents the front side of the transparent substrate member 2 from fogging, and only when the rear side of the transparent substrate member 2 becomes fogged, By causing the conductive thin film 4 to generate heat when energized to prevent fogging on the rear surface side, the amount of energization can be reduced, and the running cost of the anti-fogging element 1 can be reduced.
- the conductive thin film 4 is preferably formed by a PVD method, a CVD method, a printing method, a coating method, or the like, similar to the method for forming the hydrophilic thin film 3.
- the thickness of the conductive thin film 4 is preferably 10 to 100 nm in consideration of heat generation, thin film strength, reflection characteristics and the like.
- the conductive thin film 4 is connected to an electrode (electrode film) for conducting electricity.
- Antireflection film 5 the transparent low refractive index material, for example, S i 0 2, A 1 2 0 3, C e F 3, L a F 3, B a F 2, C a F 2, L i F, N including a 3 a l F 6, N a F, M g F 2, a 1 2 0 3 and Z r 0 mixture of 2 or the like is also a combination of these.
- the method for forming the anti-reflection thin film 5 is preferably performed by the same PVD method, CVD method, or the like as the hydrophilic thin film 3.
- the thickness of the antireflection thin film 5 is preferably 50 to 150 nm in consideration of antireflection characteristics, light interference suppression characteristics, and the like. If it is less than 50 nm, the effect of preventing reflection and the effect of suppressing light interference are small, and light transmitted through the anti-fog element tends to have an interference color. In addition, the strength of the thin film is small and it is easy to be ruptured, and the film thickness is too thin to control the film formation. If the thickness exceeds 15 O nm, the antireflection effect tends to decrease, and the conductive thin film 4 Reflection is not suppressed, and the reflection image of the conductive thin film 4 easily appears in the image transmitted through the anti-fog element 1.
- FIGS. 3 to 5 show spectral transmittance characteristics of the anti-fog element.
- (A) is a spectral transmittance characteristic diagram of the anti-fogging element having no anti-reflection thin film
- (B 1) to (B 6) are anti-fogging elements of the present invention having an anti-reflection thin film (single layer).
- FIG. 4 is a spectral transmittance characteristic diagram of FIG.
- FIG. 3 shows an example in which a SiO 2 film (Si i 2 has a refractive index of 1.46) is used as an anti-reflection thin film (single layer).
- Transparent glass 1 9 mm (hereinafter, simply referred to as a transparent glass.) T i โ on the surface of 2 film 2 0 0 nm, are sequentially deposited S i โ 2 film 2 0 nm, ITO on the back surface of the transparent glass An anti-fog element with a thickness of 200 nm.
- the refractive index, S i O 2 force SI. 4 6 T i 0 2 is 2.3 5
- glass is 1. 5
- FIG. 4 shows an example in which a MgF 2 film (the refractive index of MgF 2 is 1.38) is used as an anti-reflection thin film (single layer).
- Antifogging element having the same configuration as (A) in Fig. 3.
- (B 3) S i 0 2 ZT i 0 2 / Garasuno ITO / M g F 2 5 T i 0 on the surface of the 0 nm transparent glass 2 film 2 0 0 nm, S i 0 2 film sequentially formed 2 0 nm and, ITO film 2 0 0 nm on the back surface of the transparent glass, M g F 2 film 5 0 nm sequentially deposited anti-fog element.
- Figure 5 is a anti-reflection film (single layer)
- a 1 2 0 3 film (refractive index of A l 2 โ 3 1.6 7) is an example of using,
- Antifogging element having the same configuration as (A) in Fig. 3.
- the anti-fog element 1 is composed of a transparent substrate member 2 and a hydrophilic thin film. 3, a conductive thin film 4, and an anti-reflection thin film 5, and a first intermediate thin film 6 provided between the transparent substrate member 2 and the hydrophilic thin film 3.
- the transparent substrate member 2, the hydrophilic thin film 3, the conductive thin film 4, and the anti-reflection thin film 5 have the same configurations as in the above (1) to (4), and thus the description is omitted.
- the refractive index of the first intermediate thin film 6 has an intermediate value between the refractive index of the hydrophilic thin film 3 and the refractive index of the transparent substrate member 2. Then, its refractive index is smaller than the refractive index of the hydrophilic thin film 3, and larger structure is preferably made than the refractive index of the transparent substrate member 2, for example, ITO, I n 2 0 3 , S n 0 2, Z n O, W0 3 , T a 2 0 5, Z r โ inorganic oxides such as 2, composite inorganic oxides such as a mixture of a 1 2 0 3 and L a, or transparency of a combination of these Including.
- This first intermediate thin film 6 is preferably formed by a PVD method, a CVD method, or the like, similar to the method for forming the hydrophilic thin film 3. Further, the first intermediate thin film 6 is formed by laminating a plurality of thin films containing the above-mentioned inorganic oxide, composite inorganic oxide, or a combination thereof.
- the refractive index of the hydrophilic thin film 3 and the transparent substrate 2 It may have a refractive index between the above and a single-layer thin film.
- the thickness of the first intermediate thin film 6 is preferably 5 to 200 nm in consideration of antireflection characteristics, light interference suppression characteristics, and the like. If it is less than 5 nm, the effect of preventing reflection and the effect of suppressing light interference are small, and light transmitted through the anti-fog element tends to have an interference color. In addition, the film thickness is too thin, and it is easy to control the film formation. If it exceeds 200 nm, the antireflection effect tends to be small, the reflection on the hydrophilic thin film 3 is not suppressed, and the reflection image of the hydrophilic thin film 3 is easily reflected on the image transmitted through the anti-fog element 1.
- FIG. 2 (b) shows a third embodiment of the present invention. As shown in FIG.
- the anti-fogging element 1 includes a transparent substrate member 2, a hydrophilic thin film 3, a conductive thin film 4, and an anti-reflective thin film 5a. It has a laminated structure where two or more thin films are laminated (a thin film 51 and a thin film 52 in FIG. 2 (b)).
- a transparent substrate member 2 the hydrophilic thin film 3, and the conductive thin film 4 have the same configurations as in the above (1) to (3), and thus description thereof will be omitted.
- the anti-reflection thin film 5a is formed by laminating two or more transparent thin films containing substances having different refractive indexes.
- the thin film 52 is formed of a low-refractive index substance, for example, S i 0 2 , A 1 2 โ 3 , C e F or L a F or B a F 2 โ C a F 2 , L i F, N a 3 A l F 6 , N a F, M g F 2 , A 1 2 0 3 and Z r 0 mixture of 2 or consists like a combination of these, a thin film 5 1, sea urchin by which the refractive index is larger than the refractive index of the thin film 5 2, for example, T i O 2, Z r O 2 , Ta 2 โ 5 etc.
- the refractive index of the entire antireflection thin film 5 a is set to be smaller than the refractive index of the conductive thin film 4.
- This anti-reflection thin film 5a is preferably formed by the same PVD method, C VD method or the like as in the case of the hydrophilic thin film 3.
- the thickness of the antireflection thin film 5a (thin film 51, 52) is appropriately set in consideration of antireflection characteristics and the like.
- FIG. 6 to 9 show spectral transmittance characteristics of the anti-fog element.
- (A) is a spectral transmittance characteristic diagram of the antifogging element having no antireflection thin film (lamination)
- (B7;) to (B10) are the present invention having an antireflection thin film (lamination)
- FIG. 5 is a spectral transmittance characteristic diagram of the anti-fog element of FIG. Figure 6 is an example using the T i โ 2 film and the S i โ 2 film as an antireflection film (laminate),
- Antifogging element having the same configuration as (A) in Fig. 3.
- T i 0 2 film 2 0 0 nm on a surface of a transparent glass S i 0 2 film 2 0 nm are sequentially deposited, ITO layer 2 0 O nm on the back surface of the transparent glass, T i 0 2 film 2 5 nm, S i 0 2 film 4 5 nm, T i โ 2 film 2 7 0 nm, 3 1 โ 2 film 1 3 0 11 111 sequentially deposited anti-fog element.
- Figure 7 is an example of using the Z r โ 2 film and the S i โ 2 film as an antireflection film (laminate),
- Antifogging element having the same configuration as (A) in Fig. 3.
- S i โ 2 film 2 are sequentially deposited 0 nm, ITO film 2 0 0 nm on the back surface of the transparent glass, S i โ 2 film 4 5 nm, Z r โ 2 film 2 5 nm, S i โ 2 film 4 5 nm, Z R_ โ 2 film 2 7 0 nm, S i 0 2 film 1 3 0 nm sequentially deposited anti-fog element.
- Figure 8 is an example of using the T a 2 0 5 film and S i โ 2 film as an antireflection film (laminate),
- Antifogging element having the same configuration as (A) in Fig. 3.
- T i 0 2 film 2 0 0 nm on a surface of a transparent glass S i 0 2 film 2 are sequentially deposited 0 nm, ITO film 2 0 0 nm on the back surface of the transparent glass, T a 2 0 5 film 2 5 nm , S i โ 2 film 2 5 nm, T a 2 0 5 film 1 6 0 nm, S i โ 2 film 3 0 nm, T a 2 0 5 film 1 2 0 nm, S i 0 2 film 1 3 0 nm , Anti-fog element 0
- Figure 9 is an example of using the T a 2 0 5 film and M g F 2 film as an antireflection film (laminate),
- Antifogging element having the same configuration as (A) in Fig. 3. .
- FIG. 2 (c) shows a fourth embodiment of the present invention.
- the anti-fogging element 1 has a transparent substrate member 2, a hydrophilic thin film 3, and a conductive thin film 4, and has a structure between the transparent substrate member 2 and the conductive thin film 4. It has a second intermediate thin film 7 provided on the substrate.
- the transparent substrate member 2, the hydrophilic thin film 3, and the conductive thin film 4 have the same configurations as in the above (1) to (3), and thus description thereof will be omitted.
- the refractive index of the second intermediate thin film 7 has an intermediate value between the refractive index of the transparent substrate member 2 and the refractive index of the conductive thin film 4.
- the refractive index of the transparent substrate member Greater than 2 of the refractive index, and is preferably is also smaller configuration Ri by the refractive index of the conductive thin film 4, for example, A 1 2 0 3, WO M g inorganic oxides such as O, A 1 2 0 Includes composite inorganic oxides such as a mixture of 3 and La, or transparent materials combining these.
- This second intermediate thin film 7 is preferably formed by a PVD method, a CVD method, or the like, similar to the method for forming the hydrophilic thin film 3.
- the second intermediate thin film 7 is formed by laminating a plurality of thin films containing the above-described inorganic oxide, composite inorganic oxide, or a combination thereof, and the refractive index of the transparent substrate member 2 and the conductive thin film 4 It may have a refractive index intermediate between the refractive index of the film and a single-layer thin film.
- the thickness of the second intermediate thin film 7 is preferably 5 to 200 nm in consideration of the antireflection effect. If the film thickness is outside the above range, the effect of suppressing reflection at the conductive thin film 4 tends to be small, and the reflection image of the conductive thin film 4 tends to be reflected on the image transmitted through the anti-fog element 1.
- FIG. 10 shows a spectral transmittance characteristic diagram of the anti-fog element.
- (A) is a spectral transmittance characteristic diagram of the anti-fogging element without the second intermediate thin film
- (B 11) is a spectral transmittance characteristic diagram of the anti-fogging element of the present invention having the second intermediate thin film. It is.
- the first 0 figure as the second intermediate thin an example using A 1 2 โ 3 film
- Antifogging element having the same configuration as (A) in Fig. 3.
- the refractive index, S i 0 2 is 1. 4
- T i O 2 is 2.3 5, glass 1. 5 2
- ITO is 2.0 6 It is.
- FIG. 10 it was found that the presence of the second intermediate thin film increased the transmittance in the visible light region and prevented reflection on the conductive thin film (see B11). ).
- the present invention is not limited to the first to fourth embodiments.
- a configuration in which a second intermediate thin film 7 is added to the second embodiment (FIG. 2A)
- a third embodiment (FIG. 2 (b)) in which at least one of first intermediate thin film 6 and second intermediate thin film 7 is added.
- First intermediate thin film 6 is added in the fourth embodiment (FIG. 2 (c)).
- the configuration may be as follows. Industrial applicability
- the hydrophilic thin film evaporates water droplets adhered to the surface side of the transparent substrate member, thereby preventing clouding. Further, the photocatalytic reaction substance of the hydrophilic thin film does not decrease the hydrophilicity of the hydrophilic thin film, and maintains the anti-fogging property.
- the conductive thin film prevents water droplets adhering to the back surface of the transparent substrate member from evaporating, thereby preventing fogging.
- the present invention can be applied to an anti-fog element typified by a hood glass for a camera which requires excellent anti-fog properties.
- the anti-reflection thin film suppresses reflection at the conductive thin film caused by a difference in refractive index, and prevents a reflected image of the conductive thin film from being reflected on an image transmitted through the anti-fog element, thereby providing a good image. It can be applied to anti-fog elements such as required camera hood glass. Furthermore, since there is no need to consider the durability of the conductive thin film and anti-reflective thin film, there are no restrictions on the constituent materials, and the anti-fog element represented by camera hood glass, which requires low cost, is required. Can be applied. Further, according to the second invention, the difference in the refractive index can be reduced by the first intermediate thin film.
- the laminated structure of the anti-reflection thin film enhances the anti-reflection effect in the visible ray region, and the image transmitted through the anti-fog element becomes closer to the real image.
- the present invention can be applied to an anti-fog element typified by a camera hood glass requiring a good image.
- the reflection of the conductive thin film caused by the difference in the refractive index is suppressed by the second intermediate thin film, and the reflected image of the conductive thin film is displayed on the image transmitted through the anti-fog element.
- This can be applied to an anti-fog element typified by a hood glass for a camera that requires no good image.
Abstract
An antifogging element which has excellent antifogging properties and can suppress exothermic body reflection, enabling obtaining excellent images free of catching of exothermic body reflection images and which can be produced with low cost. In particular, antifogging element (1) characterized by comprising transparent substrate member (2); transparent hydrophilic thin film (3) disposed on the front surface side of the transparent substrate member (2) and comprising a photocatalyst reactant and a hydrophilic substance; transparent conductive thin film (4) disposed on the back side of the transparent substrate member (2) and comprising a conductive substance; and transparent reflection preventive thin film (5) disposed on the back side of the transparent conductive thin film (4) and comprising a low refractive index substance.
Description
ๆ ็ดฐ ๆธ ้ฒๆ็ด ๅญ ๆ่กๅ้ ย Description Anti-fog element Technical field
ๆฌ็บๆใฏใ ใฌใฉในๆฟ็ญใฎๅบๆฟ้จๆใฎ่กจ้ขๅดใซ้ฒๆๆงใๆใใใ้ฒๆ็ด ๅญใซ้ขใใ ็นใซใซใกใฉ็จใใผใใฌใฉในใจใใฆๆงๆใใใ้ฒๆ็ด ๅญใซ้ขใ ใใ ย The present invention relates to an antifogging element having an antifogging property on the surface side of a substrate member such as a glass plate, and particularly to an antifogging element configured as a hood glass for a camera.
่ๆฏๆ่ก Background art
ใฌใฉในๆฟ็ญใฎๅบๆฟ้จๆใฎ่กจ้ขๅดใซ้ฒๆๆงใๆใใใ้ฒๆ็ด ๅญใ็น้ๅนณ 0 7โ 2 6 3 2 0 1ๅท ๏ผๆฎต่ฝ็ชๅท [ 0 0 0 2 ] ใ [ 0 0 0 3 ] ใ ๅณ 5ใ ๅณ 6 ) ใงๆๆกใใใฆใใใ ็ฌฌ 1 1ๅณ ๏ผ a ) ใซ็คบใใใใซใ ้ฒๆ็ด ๅญใจ ใ ใฆใฎ็ต้ฒใใใซ 1 0 1ใฏใ ใฌใฉในๆฟ 1 0 2ใฎ่ฃ้ขๅดใซ็ต้ฒ้ฒๆญขใซ้ฉใใ ็บ็ฑ็ฎๆใซๅใใใๅฝข็ถใซๆ่ใใใ้
ธๅ้ซใ ้
ธๅใฃใณใธใฅใ ็ญใใใช ใ่่ๅฑค 1 0 3 ใจใ ใใฎ่่ๅฑค 1 0 3ใซๆฅ็ถใ้้ปใใ้ปๆฅต่ 1 0 5ใ ใใณ็ตฆ้ป็จใฎ้ป็ท 1 0 7ใๆฅ็ถใใใ็ตฆ้ป็ซฏๅญ 1 0 6 ใจใ ๆ้ป้ฒๆญขใจไฟ ่ญทใฎใใใซๅ่จ่่ๅฑค 1 0 3ใ ้ปๆฅต่ 1 0 5ใชใฉใฎไธใซ่จญใใใใฆใใ ไฟ่ญท็จใฌใฉในๆฟ 1 0 4 ใจใๆใใใ ใใฎ็ต้ฒ้ฒๆญขใใใซ 1 0 1 ใซใใใฆ ใฏใ ่่ๅฑค 1 0 3ใซ้้ปใใ ใใฎ็บ็ฑใซใใใฌใฉในๆฟ 1 0 2่กจ้ขใฎๆธฉๅบฆ ใไธใใ ็ต้ฒใ้ฒๆญขใใใด้คๅปใใฆใใใ ย Japanese Patent Application Laid-Open No. H07-2632201 (paragraph numbers [00002], [00003], It is proposed in Figure 5 and Figure 6). As shown in Fig. 11 (a), the dew condensation panel 101 as an anti-fog element is formed on the back side of the glass plate 102 in a shape suitable for the heat generating area suitable for preventing dew condensation. Thin-film layer 103 made of tin oxide, zinc oxide, etc., an electrode film 105 connected to this thin-film layer 103 for energization, and a power supply terminal 100 to which a power supply wire 107 is connected. And a protective glass plate 104 provided on the thin film layer 103, the electrode film 105, and the like for preventing and protecting from electric shock. In the dew condensation preventing panel 101, the thin film layer 103 is energized, and the heat generated raises the temperature of the surface of the glass plate 102 to prevent dew condensation.
ใใใใชใใใ ๅ่จ็ต้ฒใใใซ 1 0 1ใซใใใฆใฏใ ใฌใฉในๆฟ 1 0 2ใฎ ๆฅๆฐดๆงใซใใใ ใฌใฉในๆฟ 1 0 2่กจ้ขใซไป็ใใๆฐดๆปดใฏ็็ถใจใชใใ ใใฎ ใใใ ่่ๅฑค 1 0 3ใซ้้ปใใฆใใ ๆฐดๆปดใ่ธ็บใใซใ ใใ ้ฒๆๆงใจ ใใฆ ใฏไธๅๅใงใใคใใ ย However, in the dew condensation panel 101, water droplets adhering to the surface of the glass plate 102 have a ball shape due to the water repellency of the glass plate 102. For this reason, even when the thin film layer 103 was energized, the water droplets did not easily evaporate, and the antifogging property was insufficient.
ใใใฆใ ใใฎใ ใใชๅ้กใ่งฃๆฑบใใ้ฒๆ็ด ๅญใ็น้ๅนณ 1 0โ 3 6 1 4
4ๅท ๏ผๆฎต่ฝ็ชๅท [ 0 0 1 7] ใ [ 0 0 3 6 ] ใ ๅณ 1 2 ) ใงๆๆกใใใฆใ ใใ ็ฌฌ 1 1ๅณ ๏ผ b ) ใซ็คบใใ ใใซใ ้ฒๆ็ด ๅญใจ ใใฆใฎ่ชๅ่ป็จใฆใฃใณใ ใฅใฌใฉใน 2 0 1ใฏใ ใฆใฃใณใใฆใฌใฉในๆฌไฝใๆงๆใใ้ๆใฌใฉในๅบๆฟ 2 0 2ใฎ่กจ้ขๅดใซใ I T O็ญใฎ้ๆ้ปๆฅต่ 2 0 4ใ ไธ 1 02่2 0 3 &ใ ๅคๅญ่ณช็ถ S i ใ2่ 2 0 3 bใ้ ๆฌกๆ่ใใฆๅ
จไฝใ้ๆใซๆงๆใใใฆใ ใใ ใใฎ่ชๅ่ป็จใฆใฃใณใใฆใฌใฉใน 2 0 1 ใซใใใฆใฏใ ๅคๅญ่ณช็ถ S i O 2่ 2 0 3 bใ่ฆชๆฐดๆงใๅใใ ไป็ใใๆฐดๆปดใ็็ถใงใฏใชใ่ใ่็ถใซ ๅบใใฆ ๏ผ็ฉบๆฐใจใฎๆฅ่งฆ้ข็ฉใๅบใใใ ่ธ็บใใใใใชใ๏ผ ้ฒๆๆงใ็บๆฎ ใใใ ใพใใ ้ๆใฌใฉในๅบๆฟ 2 0 2 ใจ้ๆ้ปๆฅต่ 2 0 4ใฎ็ฉๅฑคไฝใฎไธ่พบ ใใใดไธ่พบใซใฏใฏ ใช ใใ้ปๆฅต 2 0 5ใ 2 0 6ใ่ฃ
็ใใใ ้ปๆบ 2 0 7ใ ใ้ๆ้ปๆฅต่ 2 0 4ใซ้้ปใใใใจใซใ ใใ ้ๆ้ปๆฅต่ 2 0 4ใ็บ็ฑใ ใ ๅคๅญ่ณช็ถ S i 02่ 2 0 3 bใฎ่กจ้ขใง่ใ่็ถใซๅบใใฃใๆฐดๆปดใๅนๆ ็ใซ้คๅปใใฆใใใ ใพใใ T i 02่ 2 O 3 aใงใฏใ ๅคๅญ่ณช็ถ S i 02่ 2 0 3 bใ้้ใใๅคช้ฝๅ
ใใฎไปใฎๅ
็ทใซใ ใๅ
ๅฑ่ตทใใใ ้ปๅญ ยท ๆญฃๅญ ๅฏพใ็บ็ใใใ ใใใฆใ ใใฎ้ปๅญ ยท ๆญฃ:?ใๅฏพใซใ ใใ ๅคๅญ่ณช็ถ S i 02่ 2 0 3 bใฎ้ๅฃๅ
ใซไป็ใใๆๆฉ็ฉใๅ่งฃใ ้คๅปใใใใ ใใใใฃใฆใ ๅคๅญ่ณช็ถ S i 02่ 2 0 3 bใฎ่ฆชๆฐดๆงใฎไฝไธใ้ฒๆญขใใใ ้ทๆ้ใซใใ ใ้ฒๆๆงใ็ถญๆใใใใจใใงใใใ An anti-fog element that has solved such a problem is disclosed in No. 4 (paragraph numbers [0 17], [0 36], Figure 12). As shown in Fig. 11 (b), the window glass for automobiles as an anti-fog element 201 is made of a transparent electrode such as ITO on the front side of a transparent glass substrate 202 constituting the window glass body. film 2 0 4, Ding 1 0 2 film 2 0 3 and, overall sequentially deposited porous S i ใ 2 film 2 0 3 b has been configured transparent. In this automotive window glass 201, the porous SiO 2 film 203b exhibits hydrophilicity, and the attached water droplets are spread not in a ball shape but in a thin film shape (the contact area with air is reduced). (It spreads and evaporates easily.) In addition, clip electrodes 205 and 206 are mounted on the upper side and lower side of the laminated body of the transparent glass substrate 202 and the transparent electrode film 204, and the transparent electrode is supplied from the power supply 2007. Ri by the energizing the membrane 2 0 4, and the transparent electrode film 2 0 4 fever, effectively removing the spread water droplets into a thin film shape with porous S i 0 2 film 2 0 3 b surface ing. Also, in T i 0 2 film 2 O 3 a, photoexcited Ri by the porous S i 0 2 film 2 0 3 b the transmitted sunlight other rays, electrons and holes pairs are generated. Then, the electron-positive:? Ri by the tooth pair, organic substances adhering to the porous S i 0 2 film 2 0 3 b of the opening is decomposed and removed. Therefore, the hydrophilicity of the porous SiO 2 film 203 b is prevented from lowering, and the anti-fogging property can be maintained for a long period of time.
ใใใใชใใใ ็น้ๅนณ 1 0 _ 3 6 1 4 4ๅทใฎ้ฒๆ็ด ๅญใซใใใฆใฏใ ่ฆช ๆฐดๆงใๅใใๅคๅญ่ณช็ถ S i 02่ใใใดๅช็ฑไฝใงใใ้ๆ้ปๆฅต่ใ้ๆ ใฌใฉในๅบๆฟใฎ่กจ้ขๅดใซ้
็ฝฎใใใฆใใใใใ ้ๆใฌใฉในๅบๆฟใฎ่กจ้ขๅดใซ ็บ็ใใๆใใ้คๅปใใใใจใฏๅฏ่ฝใงใใใใ ้ๆใฌใฉในๅบๆฟใฎ่ฃ้ขๅด ใซ็บ็ใใๆใใ้คๅปใงใใใ ้ฒๆๆงใซใใใฆไธๅๅใงใใใจใใๅ้ก ใใใฃใใ ็นใซใ ้ฒๆ็ด ๅญใใซใกใฉ็จใใผใใฌใฉในใงใใๅ ดๅใซใฏใ ๅ ใกใฉๅ็ดๅฎนๅจใฎๅ
ๅคๆฐใฎๆธฉๅบฆใซๅทฎใ็ใใใใใใใ ใใผใใฌใฉในใฎ่ฃ ้ขๅด ๏ผๅ
ๆฐๅด๏ผ ใซใ ๅ็ดๅฎนๅจๅ
ใฎ็ฉบๆฐใฎๆฐด่ธๆฐใ็ต้ฒใใ ๆใใ็ใใ
ใใใ ใพใใ ๅฏๅทๅฐใพใใฏ้ซๅฐใงไฝฟ็จใใใๅ ดๅใซใฏใ ๅ่จ็พ่ฑกใ็นใซ ้ก่ใงใใใ However, in the anti-fog element disclosed in Japanese Patent Application Laid-Open No. 10-36144, the porous SiO 2 film exhibiting hydrophilicity and the transparent electrode film serving as a heating element are provided on the surface side of the transparent glass substrate. , It is possible to remove the fogging generated on the front side of the transparent glass substrate, but it is not possible to remove the fogging generated on the back side of the transparent glass substrate, and the antifogging property is insufficient. There was a problem. In particular, if the anti-fog element is a camera hood glass, the temperature of the inside and outside air of the storage container tends to be different, so the air inside the storage container will be on the back side (inside air side) of the hood glass. The water vapor will condense and cause fogging I'm sorry. In addition, when used in cold regions or high altitudes, the above phenomenon is particularly remarkable.
ใพใใ ้ๆ้ปๆฅต่ใ้ๆใฌใฉในๅบๆฟใฎ่ฃ้ขๅดใซ้
็ฝฎใใใใจใ่จ่ผใ ใใฆใใใใ ้ๆ้ปๆฅต่ใซไฝฟ็จใใใฆใใ I T O็ญใฏๅฑๆ็ใๅคงใใใ ใใ ้ๆ้ปๆฅต่ใงใฏๅ
ใฎๅๅฐใ็บ็ใใใ ใใฎใใใ ้ฒๆ็ด ๅญใใซใก ใฉ ็จใใผใใฌใฉในใงใใๅ ดๅใซใฏใ ้ฒๆ็ด ๅญใ้้ใใใซใกใฉ็ปๅใซ้ๆ ้ปๆฅต่ใฎๅๅฐๅใๅใ่พผใใงใใพใใ ่ฏๅฅฝใช็ปๅใๅพใใใชใใจใใๅ ้กใใใฃใใ ย It is also described that the transparent electrode film is disposed on the back side of the transparent glass substrate.However, since ITO or the like used for the transparent electrode film has a large refractive index, light is not reflected on the transparent electrode film. appear. Therefore, when the anti-fog element is a camera hood glass, the reflected image of the transparent electrode film appears in the camera image transmitted through the anti-fog element, and a good image cannot be obtained. Was.
ใพใใ ็บ็ฑไฝใงใใ้ๆ้ปๆฅต่็ญใ้ๆใฌใฉในๅบๆฟใฎ่กจ้ขๅดใซ้
็ฝฎใ ใใฆใใใใใ ็บ็ฑไฝใๅคๆฐใซใ ใใใใใใจใซใชใใ ใใฎ็ตๆใ ็บ็ฑ ไฝใฎ่ไน
ๆงใ ไพใใฐ่้
ธๆง็ญใ่ๆ
ฎใใๅฟ
่ฆใ็ใใ ็บ็ฑไฝใๆงๆใใ ๆๆ็ญใๅถ้ใใใ ่ฃฝ้ ใณใน ใใ้ซใใชใใจใใๅ้กใใใฃใใ ย Further, since the transparent electrode film or the like as a heating element is disposed on the surface side of the transparent glass substrate, the heating element is exposed to the outside air. As a result, it is necessary to consider the durability of the heating element, for example, acid resistance, etc., and there is a problem that the materials and the like constituting the heating element are limited, and the manufacturing cost is increased.
ใใใซใ ็น้ๅนณ 0 7โ 2 6 3 2 0 1ๅท 1ใฎ้ฒๆ็ด ๅญใซใใใฆใใ ็น้ ๅนณ 1 0โ 3 6 1 4 4ๅทใจๅๆงใซใ ้
ธๅ้ซใ ้
ธๅใฃใณใธใฅใ ็ญใใใชใ่ ่ๅฑคใงใฏๅ
ใๅๅฐใใ ใซใกใฉ็จ้ใจ ใใๅ ดๅใซใฏๅๅฐๅใใซใกใฉ็ปๅใซ ๅใ ใใฟใ ่ฏๅฅฝใช็ปๅใๅพใใใชใใจใใๅ้กใใใฃใใ ย Further, in the anti-fog element of JP-A-07-263210, as in JP-A-10-364144, a thin film layer made of tin oxide, indium oxide or the like is used. When the light is reflected and used for a camera, the reflected image appears in the camera image, and there is a problem that a good image cannot be obtained.
ใใใงใ ๆฌ็บๆใงใฏใ ๅ่จใใๅ้กใ่งฃๆฑบใใ ๅชใใ้ฒๆๆงใๆใใ ใจๅ
ฑใซใ ็บ็ฑไฝใฎๅๅฐใๆๅถใใ ็บ็ฑไฝใฎๅๅฐๅใฎๅใ ใใฟใฎใชใ่ฏๅฅฝ ใช็ปๅใๅพใใใ ใใคใ ไฝใณใน ใใง่ฃฝ้ ใใใใจใๅฏ่ฝใช้ฒๆ็ด ๅญใๆ ไพใใใใจใ็ฎ็ใจใใใ ็บๆใฎ้็คบ ย In view of the above, the present invention solves the above-mentioned problem, has excellent anti-fog properties, suppresses reflection of the heating element, and obtains a good image without reflection of the reflection image of the heating element. The purpose is to provide an antifogging element that can be manufactured at low cost. Disclosure of the invention
ๅ่จๅ้กใ่งฃๆฑบใใๆฌ็บๆใซใใใฆใ ็ฌฌ 1ใฎ็บๆใฏใ ้ๆๅบๆฟ้จๆใจ ใ ๅ่จ้ๆๅบๆฟ้จๆใฎ่กจ้ขๅดใซ่จญใใใใ ๅ
่งฆๅชๅๅฟ็ฉ่ณชใใใด่ฆชๆฐดๆง ็ฉ่ณชใๅซใ้ๆใช่ฆชๆฐดๆง่่ใจใ ๅ่จ้ๆๅบๆฟ้จๆใฎ่ฃ้ขๅดใซ่จญใใใ ใ ๅฐ้ปๆง็ฉ่ณชใๅซใ้ๆใชๅฐ้ปๆง่่ใจใ ๅ่จๅฐ้ปๆง่่ใฎใใใซ่ฃ้ข
ๅดใซ่จญใใใใ ไฝๅฑๆ็็ฉ่ณชใๅซใ้ๆใชๅๅฐ้ฒๆญข่่ใจใๆใใ้ฒๆ ็ด ๅญใจ ใใฆๆงๆใใใใฎใงใใใ In the present invention that solves the above problems, a first invention is a transparent substrate member, a transparent hydrophilic thin film provided on the surface side of the transparent substrate member and containing a photocatalytic reaction substance and a hydrophilic substance, A transparent conductive thin film provided on the back surface side of the transparent substrate member and containing a conductive substance; and a further back surface of the conductive thin film And a transparent anti-reflection thin film containing a low-refractive-index substance.
ใชใใ ๆฌ็บๆใซใใใฆใ ใ่กจ้ขๅดใ ใจใฏใ ้ฒๆ็ด ๅญใซใใใฆๅคๆฐใจๆฅ ใใๅดใๆๅณใใ ใ่ฃ้ขๅดใ ใจใฏใ ้ฒๆ็ด ๅญใซใใใฆๅคๆฐใจๆฅใใชใๅด ใๆๅณใใใ ย In the present invention, โfront sideโ means a side of the anti-fogging element that comes into contact with the outside air, and โback sideโ means a side of the anti-fogging element that does not come into contact with the outside air.
ๅ่จๆงๆใซใใใฐใ ่ฆชๆฐดๆง่่ใฎ่ฆชๆฐดๆง็ฉ่ณชใซใใใ ้ๆๅบๆฟ้จๆใฎ ่กจ้ขๅดใซ่ฆชๆฐดๆงใไปไธใใใ ้ๆๅบๆฟ้จๆใฎ่กจ้ขๅดใซไป็ใใๆฐดๆปดใ่ ใ่็ถใจใชใฃใฆ่ธ็บใใใ ใพใใ ่ฆชๆฐดๆง่่ใๅ
่งฆๅชๅๅฟ็ฉ่ณชใๅซใใ ใจใซใใใ ๅ
ๅฑ่ตทใซใใฃใฆๅ
่งฆๅชๅๅฟ็ฉ่ณชใ ใ้ปๅญ ยท ๆญฃๅญๅฏพใ็บ็ใใ ใ ใใฎ้ปๅญ ยท ๆญฃๅญๅฏพใ็ฉบๆฐใใใณๆฐดใจๅๅฟใใฆ o 2โ (ในใผใใผใฉใญใตใค ใใขไบใชใณ๏ผ ใใใณ ยท O H (ใ ใใญใญใทใฉใธใซใซ) ใ็ๆใใ ใใฎ O ใใใณ ยท O Hใซใใฃใฆ่ฆชๆฐดๆง่่ใซไป็ใใๆๆฉ็ฉใๅ่งฃใ ้คๅปใใใ ใ ใใฎ็ตๆใ ่ฆชๆฐดๆง่่ใฎ่ฆชๆฐดๆงใไฝไธใใชใใ ใพใใ ๅฐ้ปๆง่่ใฎ็บ ็ฑใซใใใ ้ๆๅบๆฟ้จๆใฎ่ฃ้ขๅดใซไป็ใใๆฐดๆปดใ่ธ็บใใใ ใพใใ ๅ ๅฐ้ฒๆญข่ใซใใใ ๅฐ้ปๆง่่ใจ็ฉบๆฐใจใฎ้ใฎๅคงใใชๅฑๆ็ใฎๅทฎใๅใใ ใใใ ใใใซใ ๅฐ้ปๆง่่ใใใณๅๅฐ้ฒๆญข่ใ้ๆๅบๆฟ้จๆใฎ่ฃ้ขๅดใซ ่จญใใใใฆใใใใจใซใใใ ๅคๆฐใซใใใใใใใจใใชใ ใชใใ ่ไน
ๆง ใ่ๆ
ฎใใๅฟ
่ฆใใชใใชใใ ใพใใ ็ฌฌ 2ใฎ็บๆใฏใ ๅ่จ้ๆๅบๆฟ้จๆใจ ๅ่จ่ฆชๆฐดๆง่่ใฎ้ใซ้ๆ ใช็ฌฌ 1 ไธญ้่่ใ่จญใใใใ ใใฎ็ฌฌ 1ไธญ้่่ใฎๅฑๆ็ใๅ่จ่ฆชๆฐดๆง่ ่ใฎๅฑๆ็ใจๅ่จ้ๆๅบๆฟ้จๆใฎๅฑๆ็ใฎไธญ้ใฎๅคใๆใใ้ฒๆ็ด ๅญใจ ใใฆๆงๆใใใใฎใงใใใ According to the configuration, the hydrophilic substance of the hydrophilic thin film imparts hydrophilicity to the surface side of the transparent substrate member, and water droplets attached to the surface side of the transparent substrate member evaporate in a thin film form. Further, when the hydrophilic thin film contains the photocatalytic reactant, electron-hole pairs are generated from the photocatalytic reactant by photoexcitation. The electron and hole pairs react with air and water to produce o 2 โ (superoxide ion) and ยท OH (hydroxyl radical), which are attached to the hydrophilic thin film by the O and ยท OH. Organic matter is decomposed and removed. As a result, the hydrophilicity of the hydrophilic thin film does not decrease. In addition, due to the heat generated by the conductive thin film, water droplets attached to the back surface of the transparent substrate member evaporate. In addition, the antireflection film bridges a large difference in refractive index between the conductive thin film and air. Further, since the conductive thin film and the antireflection film are provided on the back surface side of the transparent substrate member, it is not exposed to the outside air, and it is not necessary to consider durability. Further, in the second invention, a transparent first intermediate thin film is provided between the transparent substrate member and the hydrophilic thin film, and the refractive index of the first intermediate thin film is different from the refractive index of the hydrophilic thin film and the transparent thin film. This is configured as an anti-fog element having an intermediate value of the refractive index of the substrate member.
ๅ่จๆงๆใซใใใฐใ ็ฌฌ 1ไธญ้่่ใซใใใ ่ฆชๆฐดๆง่่ใจ้ๆๅบๆฟ้จๆ ใจใฎ้ใฎๅคงใใชๅฑๆ็ใฎๅทฎใๅใใใใใ
ใพใใ ็ฌฌ 3ใฎ็บๆใฏใ ๅ่จๅๅฐ้ฒๆญข่่ใ 2ใคไปฅไธใฎ่่ใ็ฉๅฑคใใ ็ฉๅฑคๆง้ ใๆใใ้ฒๆ็ด ๅญใจใใฆๆงๆใใใใฎใงใใใ According to the configuration, the first intermediate thin film fills a large difference in refractive index between the hydrophilic thin film and the transparent substrate member. In a third aspect of the present invention, the antireflection thin film is configured as an antifogging element having a laminated structure in which two or more thin films are laminated.
ๅ่จๆงๆใซใใใฐใ ๅๅฐ้ฒๆญข่่ใฎ็ฉๅฑคๆง้ ใซใใใ ๅฐ้ปๆง่่ใจ็ฉบ ๆฐใจใฎ้ใฎๅคงใใชๅฑๆ็ใฎๅทฎใๅใใใใใ ใพใใ ็ฌฌ 4ใฎ็บๆใฏใ ้ๆๅบๆฟ้จๆใจ ใ ๅ่จ้ๆๅบๆฟ้จๆใฎ่กจ้ขๅดใซ ่จญใใใใ ๅ
่งฆๅชๅๅฟ็ฉ่ณชใใใณ่ฆชๆฐดๆง็ฉ่ณชใๅซใ้ๆใช่ฆชๆฐดๆง่่ใจ ใ ๅ่จ้ๆๅบๆฟ้จๆใฎ่ฃ้ขๅดใซ่จญใใใใ้ๆใช็ฌฌ 2ไธญ้่่ใจใ .ๅ่จ ็ฌฌ 2ไธญ้่่ใฎใใใซ่ฃ้ขๅดใซ่จญใใใใ ๅฐ้ปๆง็ฉ่ณชใๅซใ้ๆใชๅฐ้ป ๆง่่ใจใๆใใ ๅ่จ็ฌฌ 2ไธญ้่่ใฎๅฑๆ็ใใ ๅ่จ้ๆๅบๆฟ้จๆใฎๅฑ ๆ็ใจๅ่จๅฐ้ปๆง่่ใฎๅฑๆ็ใฎไธญ้ใฎๅคใๆใใ้ฒๆ็ด ๅญใจ ใใฆๆงๆ ใใใใฎใงใใใ ย According to the configuration, the large refractive index difference between the conductive thin film and the air is filled by the laminated structure of the antireflection thin film. Further, a fourth invention provides a transparent substrate member, provided on a front surface side of the transparent substrate member, a transparent hydrophilic thin film containing a photocatalytic reactant and a hydrophilic substance, provided on a back surface side of the transparent substrate member. A transparent second intermediate thin film, further provided on the back side of the second intermediate thin film, and a transparent conductive thin film containing a conductive material, wherein the refractive index of the second intermediate thin film is The antifogging element has an intermediate value between the refractive index of the substrate member and the refractive index of the conductive thin film.
ๅ่จๆงๆใซใใใฐใ ่ฆชๆฐดๆง่่ใฎ่ฆชๆฐดๆงใซใใใ ้ๆๅบๆฟ้จๆใฎ่กจ้ข ๅดใซไป็ใใๆฐดๆปดใ่ใ่็ถใจใชใฃใฆ่ธ็บใใใ ใพใใ ่ฆชๆฐดๆง่่ใๅ
่งฆๅชๅๅฟ็ฉ่ณชใๅซใใใจใซใใใ ่ฆชๆฐดๆง่่ใซไป็ใใๆๆฉ็ฉใๅ
ๅฑ่ตท ใซใใคใฆๅ
่งฆๅชๅๅฟ็ฉ่ณชใใ็บ็ใใ้ปๅญ ' ยทๆญฃๅญๅฏพใซใใคใฆๅ่งฃใ ้คๅป ใใใ ่ฆชๆฐดๆง่่ใฎ่ฆชๆฐดๆงใไฝไธใใชใใ ใพใใ ๅฐ้ปๆง่่ใฎ็บ็ฑใซใ ใใ ้ๆๅบๆฟ้จๆใฎ่ฃ้ขๅดใซไป็ใใๆฐดๆปดใ่ธ็บใใใ ใพใใ ็ฌฌ 2ไธญ้ ่่ใซใใใ ้ๆๅบๆฟ้จๆใจๅฐ้ปๆง่่ใจใฎ้ใฎๅคงใใชๅฑๆ็ใฎๅทฎใๅ ใใใใใ ๅณ้ขใฎ็ฐกๅใช่ชฌๆ ย According to the above configuration, due to the hydrophilicity of the hydrophilic thin film, water droplets adhered to the surface side of the transparent substrate member evaporate in a thin film shape. In addition, since the hydrophilic thin film contains the photocatalytic reactant, organic substances attached to the hydrophilic thin film are decomposed and removed by electrons and holes generated from the photocatalytic reactant by photoexcitation, and the hydrophilic thin film is removed. Does not decrease in hydrophilicity. In addition, due to the heat generated by the conductive thin film, water droplets attached to the back surface of the transparent substrate member evaporate. In addition, the second intermediate thin film fills a large difference in refractive index between the transparent substrate member and the conductive thin film. Brief Description of Drawings
็ฌฌ 1ๅณ ๏ผ a ) ใฏใ ใซใกใฉ็จใใผใใฎๆงๆใ็คบใๆ่ฆๅณใ ๏ผ b ) ใฏๆฌ็บ ๆใซไฟใ้ฒๆ็ด ๅญใฎ็ฌฌ 1ใฎๅฎๆฝๅฝขๆ
ใฎ ๏ผ a ) ใฎ Xโ X็ทๆญ้ขใฎๆงๆใๅน
ๆนๅใซๆกๅคงใใฆ็คบใๆจกๅผๅณใ ๏ผ c ) ใฏ ๏ผ b ) ใฎๅคๅฝขไพใฎๆญ้ขใฎๆงๆใๅน
ๆนๅใซๆกๅคงใใฆ็คบใๆจกๅผๅณใงใใใ
็ฌฌ 2ๅณ ๏ผ a ) ใฏๆฌ็บๆใซไฟใ้ฒๆ็ด ๅญใฎ็ฌฌ 2ใฎๅฎๆฝๅฝขๆ
ใ ๏ผ b ) ใฏ็ฌฌ 3ใฎๅฎๆฝๅฝขๆ
ใ ๏ผ c ) ใฏ็ฌฌ 4ใฎๅฎๆฝๅฝขๆ
ใฎๆญ้ขใฎๆงๆใๅน
ๆนๅใซๆกๅคงใ ใฆ็คบใๆจกๅผๅณใงใใใ FIG. 1 (a) is a perspective view showing the configuration of a camera hood, and (b) is a cross-sectional view taken along the line X-X of (a) of the first embodiment of the anti-fog element according to the present invention. FIG. 7C is a schematic diagram showing the configuration of the cross section of the modification of FIG. 5B in an enlarged manner in the width direction. FIG. 2 (a) is a second embodiment of the anti-fogging element according to the present invention, (b) is a third embodiment, and (c) is an enlarged cross-sectional configuration of the fourth embodiment in the width direction. FIG.
็ฌฌ 3ๅณใฏใ ๆฌ็บๆใซไฟใ้ฒๆ็ด ๅญใฎ็ฌฌ 1ใฎๅฎๆฝๅฝขๆ
ใฎๅๅ
้้็็นๆง ๅณใงใใใ ย FIG. 3 is a spectral transmittance characteristic diagram of the first embodiment of the anti-fog element according to the present invention.
็ฌฌ 4ๅณใฏใ ๆฌ็บๆใซไฟใ้ฒๆ็ด ๅญใฎ็ฌฌ 1ใฎๅฎๆฝๅฝขๆ
ใฎๅๅ
้้็็นๆง ๅณใงใใใ ย FIG. 4 is a spectral transmittance characteristic diagram of the first embodiment of the antifogging element according to the present invention.
็ฌฌ 5ๅณใฏใ ๆฌ็บๆใซไฟใ้ฒๆ็ด ๅญใฎ็ฌฌ 1ใฎๅฎๆฝๅฝขๆ
ใฎๅๅ
้้็็นๆง ๅณใงใใใ ย FIG. 5 is a spectral transmittance characteristic diagram of the first embodiment of the anti-fogging element according to the present invention.
็ฌฌ 6ๅณใฏใ ๆฌ็บๆใซไฟใ้ฒๆ็ด ๅญใฎ็ฌฌ 3ใฎๅฎๆฝๅฝขๆ
ใฎๅๅ
้้็็นๆง ๅณใงใใใ ย FIG. 6 is a spectral transmittance characteristic diagram of a third embodiment of the anti-fogging element according to the present invention.
็ฌฌ 7ๅณใฏใ ๆฌ็บๆใซไฟใ้ฒๆ็ด ๅญใฎ็ฌฌ 3ใฎๅฎๆฝๅฝขๆ
ใฎๅๅ
้้็็นๆง ๅณใงใใใ ย FIG. 7 is a spectral transmittance characteristic diagram of a third embodiment of the anti-fogging element according to the present invention.
็ฌฌ 8ๅณใฏใ ๆฌ็บๆใซไฟใ้ฒๆ็ด ๅญใฎ็ฌฌ 3ใฎๅฎๆฝๅฝขๆ
ใฎๅๅ
้้็็นๆง ๅณใงใใใ ย FIG. 8 is a spectral transmittance characteristic diagram of a third embodiment of the antifogging element according to the present invention.
็ฌฌ 9ๅณใฏใ ๆฌ็บๆใซไฟใ้ฒๆ็ด ๅญใฎ็ฌฌ 3ใฎๅฎๆฝๅฝขๆ
ใฎๅๅ
้้็็นๆง ๅณใงใใใ ย FIG. 9 is a spectral transmittance characteristic diagram of the third embodiment of the antifogging element according to the present invention.
็ฌฌ 1 0ๅณใฏใ ๆฌ็บๆใซไฟใ้ฒๆ็ด ๅญใฎ็ฌฌ 4ใฎๅฎๆฝๅฝขๆ
ใฎๅๅ
้้็็น ๆงๅณใงใใใ ย FIG. 10 is a spectral transmittance characteristic diagram of a fourth embodiment of the antifogging element according to the present invention.
็ฌฌ 1 1ๅณ ๏ผ a ) ใ ( b ) ใฏใ ๅพๆฅใฎ้ฒๆ็ด ๅญใฎๆญ้ขใฎๆงๆใๅน
ๆนๅใซ ๆกๅคงใใฆ็คบใๆจกๅผๅณใงใใใ ็บๆใๅฎๆฝใใใใใฎๆ่ฏใฎๅฝขๆ
ย FIGS. 11 (a) and (b) are schematic diagrams showing the cross-sectional configuration of a conventional anti-fog element enlarged in the width direction. BEST MODE FOR CARRYING OUT THE INVENTION
ใคใใซใ ๆฌ็บๆใฎๅฎๆฝๅฝขๆ
ใซใคใใฆใ ๅณ้ขใๅ็
งใใฆ่ฉณ็ดฐใซ่ชฌๆใใ ใ ็ฌฌ 1ๅณ ๏ผ a ) ใฏใซใกใฉ็จใใผ ใใฎๆงๆใ็คบใๆ่ฆๅณใ ๏ผ b ) ใฏ้ฒๆ็ด ๅญใฎ็ฌฌ 1ใฎๅฎๆฝๅฝขๆ
ใฎ ๏ผ a ) ใฎ Xโ X็ทๆญ้ขใฎๆงๆใๅน
ๆนๅใซๆกๅคงใใฆ
็คบใๆจกๅผๅณใ ๏ผ c ) ใฏ ๏ผb ) ใฎๅคๅฝขไพใฎๆญ้ขใฎๆงๆใๅน
ๆนๅใซๆกๅคงใใฆ ็คบใๆจกๅผๅณใ ็ฌฌ 2ๅณ ๏ผ a ) ใฏ็ฌฌ 2ใฎๅฎๆฝๅฝขๆ
ใ ๏ผb ) ใฏ็ฌฌ 3ใฎๅฎๆฝๅฝขๆ
ใ ( c ) ใฏ็ฌฌ 4ใฎๅฎๆฝๅฝขๆ
ใฎๆญ้ขใฎๆงๆใๅน
ๆนๅใซๆกๅคงใใฆ็คบใๆจกๅผๅณ ใ ็ฌฌ 3ๅณใ็ฌฌ 5ๅณใฏ้ฒๆ็ด ๅญใฎ็ฌฌ 1ใฎๅฎๆฝๅฝขๆ
ใฎๅๅ
้้็็นๆงๅณใ ็ฌฌ 6ๅณใ็ฌฌ 9ๅณใฏ้ฒๆ็ด ๅญใฎ็ฌฌ 3ใฎๅฎๆฝๅฝขๆ
ใฎๅๅ
้้็็นๆงๅณใ ็ฌฌ 1 0 ๅณใฏ้ฒๆ็ด ๅญใฎ็ฌฌ 4ใฎๅฎๆฝๅฝขๆ
ใฎๅๅ
้้็็นๆงๅณใงใใใ ๆฌ็บๆใฎ้ฒๆ็ด ๅญใฏใ ็ฌฌ 1ๅณ ๏ผ a ) ใซ็คบใใใใซใ ใซใกใฉ็จใใผใใฌ ใฉในใจ ใใฆไฝฟ็จใใใใ ใใใใชใใใ ๆฌ็บๆใฎ้ฒๆ็ด ๅญใฏใ ใซใก ใฉ็จ ใใผใใฌใฉในใซ้ๅฎใใใใใฎใงใฏใชใใ ้ฒๆๆงใๅฟ
่ฆใจใใใ็ด ๅญใ ไพใใฐใ ่ชๅ่ป็จใฆใฃใณใใฆใฌใฉในใชใฉใงใใใใ ๆฌ็บๆใฎ็ฌฌ 1ใฎๅฎๆฝๅฝขๆ
ใ็ฌฌ 1ๅณ ๏ผb ) ใซ็คบใใ ็ฌฌ 1ๅณ ๏ผ b ) ใซ็คบใ ใ ใใซใ ้ฒๆ็ด ๅญ 1ใฏใ ้ๆๅบๆฟ้จๆ 2 ใจใ ่ฆชๆฐดๆง่่ 3 ใจใ ๅฐ้ปๆง่ ่ 4ใจใ ๅๅฐ้ฒๆญข่่ 5 ใจใๆใใใ ไปฅไธใ ๅๆงๆใซใคใใฆ่ฉณ็ดฐใซ่ชฌๆ ใใใ Next, embodiments of the present invention will be described in detail with reference to the drawings. Fig. 1 (a) is a perspective view showing the configuration of a camera hood, and (b) is an enlarged cross-sectional view of the configuration of (a) of the first embodiment of the antifogging element, taken along the line X-X-ray. hand (C) is a schematic diagram showing the cross-sectional configuration of the modification of (b) enlarged in the width direction, FIG. 2 (a) is the second embodiment, and (b) is the third embodiment Form, (c) is a schematic diagram showing a cross-sectional configuration of the fourth embodiment enlarged in the width direction, FIGS. 3 to 5 are spectral transmittance characteristic diagrams of the first embodiment of the anti-fog element, 6 to 9 are spectral transmittance characteristic diagrams of the third embodiment of the anti-fog element, and FIG. 10 is a spectral transmittance characteristic diagram of the fourth embodiment of the anti-fog element. The anti-fog element of the present invention is used as a hood glass for a camera as shown in FIG. 1 (a). However, the anti-fog element of the present invention is not limited to camera hood glass, but may be an element requiring anti-fog properties, for example, window glass for automobiles. FIG. 1 (b) shows a first embodiment of the present invention. As shown in FIG. 1 (b), the anti-fogging element 1 includes a transparent substrate member 2, a hydrophilic thin film 3, a conductive thin film 4, and an anti-reflection thin film 5. Hereinafter, each configuration will be described in detail.
( 1 ) ้ๆๅบๆฟ้จๆ ย (1) Transparent substrate member
้ๆๅบๆฟ้จๆ 2ใฏใ ้ๆๆงใๆใใใฌใฉในใ ใพใใฏใขใฏ ใชใซๆจน่ใๅซ ใๆฟ็ถใฎๅบๆฟใงใใใ ้ฒๆ็ด ๅญใฎๅฉ็จ็ถๆณใ ็จ้ใซๅฟใใฆ่ซธๅฝข็ถใใจใ ใใจใใงใใ ไพใใฐใ ่่็ถใงใใใใ ใพใใ ๆ่ณชใ้ๆๆงใๆใใฆใ ใใฐใ ใขใฏ ใชใซๆจน่ไปฅๅคใฎใใฉในใใใฏใไฝฟ็จใใใใจใใงใใ ใใๅฅฝ ใพใใใฏใ ่็ฑๆงใ ็ตถ็ธๆงใๆใใใใฎใงใใใ ใพใใ ้ๆๅบๆฟ้จๆ 2 ใฎๅใฟใฏ 1ใ 1 O m mใๅฅฝใพใใใ ย The transparent substrate member 2 is a plate-like substrate containing transparent glass or acrylic resin. The anti-fogging element can take various shapes according to the use status and application, and for example, may be a thin film. In addition, plastics other than acrylic resin can be used as long as the material has transparency, and more preferably, it has heat resistance and insulating properties. Further, the thickness of the transparent substrate member 2 is preferably 1 to 1 Omm.
( 2 ) ่ฆชๆฐดๆง่่ ย (2) Hydrophilic thin film
่ฆชๆฐดๆง่่ 3ใฏใ ๅ
่งฆๅชๅๅฟ็ฉ่ณชใใใณ่ฆชๆฐดๆง็ฉ่ณชใๅซใ้ๆใช่่ ใงใใใ ใใฎ่ฆชๆฐดๆง็ฉ่ณชใฎ่ฆชๆฐดๆงใซใใใ ่ฆชๆฐดๆง่่ 3ใซ่ฆชๆฐดๆงใไปไธ
ใใใ ่ฆชๆฐดๆง่่ 3ใซไป็ใใๆฐดๆปดใ็็ถใซใชใใใซ่ใ่็ถใจใชใใ ้ฒๆ็ด ๅญ 1ใ้ฒๆๆงใๆใใใใจใจใชใใ ใใใฆใ ่ฆชๆฐดๆง่่ 3ใๅคๅญ ่ณช็ถใซๅฝขๆใใใฆใใใใจใๅฅฝใพใใใ ใใฎๅคๅญ่ณชใฎๅฝข็ถใซใใใ ๆฏ็ดฐ ็ฎก็พ่ฑกใซใใใ ่ฆชๆฐดๆง่่ 3ใฎ่กจ้ขใฎๆฟกใๆงใๅไธใใ ่ฆชๆฐดๆงใ้ซใใ ใใใ The hydrophilic thin film 3 is a transparent thin film containing a photocatalytic reaction substance and a hydrophilic substance. The hydrophilic property of this hydrophilic substance imparts hydrophilicity to the hydrophilic thin film 3 As a result, the water droplets adhering to the hydrophilic thin film 3 do not become beads but become a thin film, and the anti-fog element 1 has anti-fog properties. Further, it is preferable that the hydrophilic thin film 3 is formed in a porous shape. Due to this porous shape, the wettability of the surface of the hydrophilic thin film 3 is improved by capillary action, and the hydrophilicity is enhanced.
ใพใใ ่ฆชๆฐดๆง็ฉ่ณชใฏใ ็กๆฉ้
ธๅ็ฉใๅฅฝใพใใ ใ ้ๅฑ้
ธๅ็ฉใใใๅฅฝใพ ใใใ ้ๅฑ้
ธๅ็ฉใฏใ ไพใใฐใ S i 0 2ใ A 1 2 0 3 ใพใใฏใใใใฎๆททๅ ็ฉ็ญใงใใใ ใใใใฎ้ๅฑ้
ธๅ็ฉใฏ่กจ้ขใซ่ฆชๆฐดๆงใฎ O Hๅบใๆใใฆใใ ใใ่ฆชๆฐดๆงใ็คบใใ Further, the hydrophilic substance is preferably an inorganic oxide, and more preferably a metal oxide. Metal oxides, for example, an S i 0 2, A 1 2 0 3 or mixtures thereof, these metal oxides show a hydrophilic since it has a hydrophilic OH groups on the surface.
ใพใใ ๅ
่งฆๅชๅๅฟ็ฉ่ณชใฏใ T i Oใ Z n Oใ S nใ2ใ Z n Sใ C d Sใพใใฏใใใใฎๆททๅ็ฉ็ญใไธปๆๅใจใใๅๅฐไฝใๅฅฝใพใใ ใ T i 0 2 ใๅๅฟๆงใ ๆ็ถๆงใ ๅฎๅ
จๆง็ญใฎ็นใงๆใๅฅฝใพใใใ ใใฎๅ
่งฆๅชๅๅฟ็ฉ่ณช ใฏใ ๅคช้ฝๅ
็ญ (ๅๅฐไฝใฎใใณใใฎใฃใใไปฅไธใฎใจใใซใฎใผใๆใคๅ
) ใฎ ็
งๅฐใซใใๅ
ๅฑ่ตทใใ ๅ
่งฆๅชๅๅฟ็ฉ่ณชๅ
ใซ้ปๅญ ยท ๆญฃๅญๅฏพใ็บ็ใใใ ใ ใฎ้ปๅญ ยทๆญฃๅญๅฏพใฏใ ่ฆชๆฐดๆง่่ 3ใซใใใ็ฉบๆฐใใใณๆฐดใจๅๅฟใใฆใ ้
ธ ๅๅใซๅฏใ O 2 (ในใผใใผใฉใญใตใค ใใขไบใชใณ๏ผ ใใใณ ' ใ H (ใ ใใญ ใญใทใฉใธใซใซ๏ผ ใ็ๆใใใใ ใใฎ 0 2โใใใณ ยท O Hใฏใ ่ฆชๆฐดๆง่่ 3 ใฎๅคๅญ่ณชใฎ่กจ้ขใ ้ๅฃใซไป็ใใๆฑๆ็ฉใ ไพใใฐใ ใฏใใฏใน็ญใฎๆๆฉ็ฉ ใพใใฏๅคงๆฐไธญใฎ N O X็ญใๅน็็ใซๅ่งฃใใฆ้คๅปใใ ๏ผๅ
่งฆๅชๅๅฟ๏ผ ใ ใใฎ็ตๆใ ่ฆชๆฐดๆง่่ 3ใฎ่ฆชๆฐดๆงใฎไฝไธใ้ฒๆญขใใใ ้ทๆ้ใซใใใ้ฒ ๆๆงใ็ถญๆใใใใจใใงใใใ Further, the photocatalytic reaction substance, T i O have Z n O, S N_ใ 2, Z n S, the semiconductor is preferably composed mainly of C d S or mixtures thereof, T i 0 2 reactivity, sustained Most preferred in terms of safety and safety. The photocatalytic reactant is photoexcited by irradiation with sunlight or the like (light having energy equal to or greater than the band gap of the semiconductor), and electron-hole pairs are generated in the photocatalytic reactant. The electron-hole pairs react with air and water in the hydrophilic thin film 3 to generate oxidizing O 2 (superoxide ion) and 'ใH (hydroxyl radical). These 0 2 -and ยท OH efficiently decompose and remove contaminants attached to the porous surface and openings of the hydrophilic thin film 3, such as organic substances such as wax or NOX in the atmosphere (photocatalytic reaction). ). As a result, a decrease in hydrophilicity of the hydrophilic thin film 3 is prevented, and the antifogging property can be maintained for a long time.
ใพใใ ็ฌฌ 1ๅณ ๏ผ b ) ใฎ่ฆชๆฐดๆง่่ 3ใฏใ ่ฆชๆฐดๆง็ฉ่ณชๅ
ใซๅ
่งฆๅชๅๅฟ็ฉ ่ณชใๅๆฃ ๏ผๆททๅ๏ผ ใใฆใ ๅคๅญ่ณช็ถใซๅฝขๆใใใใฎใงใใใใ ็ฌฌ 1ๅณ ๏ผ c ) ใซ็คบใใ ใใซใ ๅ
่งฆๅชๅๅฟ็ฉ่ณชใๅซใๅๅฟๆง่่ 3 a ใฎ่กจ้ขๅดใซใ ่ฆช ๆฐดๆง็ฉ่ณชใๅซใๅคๅญ่ณช็ถใฎ่ฆชๆฐดๆฉ่ฝๆง่่ 3 b ใ็ฉๅฑคใใ็ฉๅฑคไฝใงใใค ใฆใใใใ ใใฎ็ฉๅฑคไฝใฎ่ฆชๆฐดๆฉ่ฝๆง่่ 3 bใฎๅคๅญ่ณชใฎ้ๅฃใฏใ ๅๅฟๆง
่่ 3 aใฎ่กจ้ขใซใพใง้ใใใใใซใใๆนใใ ๅ่จ้ปๅญ ยทๆญฃ ใๅฏพใซใใ ๆๆฉ็ฉใฎๅ่งฃใ ้คๅปใซๆๅฉใงใใใ ใใใใชใใใ ๅคๅญ่ณชใฎ้ๅฃใๅๅฟ ๆง่่ 3 aใฎ่กจ้ขใซใพใง้ใใฆใใชใใฆใ ๏ผใใชใใกใ ๅๅฟ'ๆง่่ 3 a ใฎ่กจ้ขใซ้ใใ้ไธญใงๅกใใใฆใใฆใ๏ผ ใ ๅ่จ้ปๅญ ยทๆญฃๅญๅฏพใใพ้ๆใช่ฆช ๆฐดๆฉ่ฝๆง่่ 3 bใ้้ใใใใใ ๅ
่งฆๅชๅๅฟใๅๅ้ฒ่กใใ ๆๆฉ็ฉใ ๅ่งฃใ ้คๅปใงใใใ The hydrophilic thin film 3 in FIG. 1 (b) is formed by dispersing (mixing) a photocatalytic reactant in a hydrophilic substance to form a porous film. As shown in the figure, a laminate in which a porous hydrophilic functional thin film 3b containing a hydrophilic substance is laminated on the surface side of a reactive thin film 3a containing a photocatalytic reactant may be used. The porous opening of the hydrophilic functional thin film 3b of this laminate is reactive It is more advantageous to reach the surface of the thin film 3a for the decomposition and removal of the organic matter by the electron-pair. However, even if the porous opening does not reach the surface of the reactive thin film 3a (that is, is closed on the way to the surface of the reactive thin film 3a), the electron-hole pair does not [Because it passes through the transparent hydrophilic functional thin film 3b, the photocatalytic reaction proceeds sufficiently, and organic matter can be decomposed and removed.
ใพใใ ๅ่จ่ฆชๆฐดๆง่่ 3ใ ๅๅฟๆง่่ 3 aใ ่ฆชๆฐดๆฉ่ฝๆง่่ 3 bใฎๆ ่ๆนๆณใจใใฆใฏใ ใคใชใณใใฌใผใใฃใณใฐใ ในใใใฟใชใณใฐ็ญใฎ็ฉ็็่ธ ็ ๏ผP VD) ๆณใ ็ฑ C VDใ ใใฉใบใ C VD็ญใฎๅๅญฆ็่ธ็ ๏ผC VD) ๆณ็ญใฎๅพๆฅๅ
ฌ็ฅใฎ่่ๅฝขๆๆนๆณใง่กใใฎใๅฅฝใพใใใ ใใใฆใ ๅ่่ใฎ ่ๅใฏใ ่ฆชๆฐดๆง่่ 3ใฎ่ฆชๆฐดๆงใ ๅ
่งฆๅชๅๅฟๆงใ ่่ๅผทๅบฆ็ญใ่ๆ
ฎใใฆ ใ ๅๅฑคใฎ่ฆชๆฐดๆง่่ 3ใฎๅ ดๅใซใฏ 5 0ใ 1 0 0 0 n mใๅฅฝใพใใใ ็ฉๅฑค ไฝใฎ่ฆชๆฐดๆง่่ 3ใฎๅ ดๅใซใฏๅๅฟๆง่่ 3 aใ 5 0ใ 1 0 0 O n mใ ่ฆช ๆฐดๆฉ่ฝๆง่่ 3 bใ 5ใ 1 0 0 n mใๅฅฝใพใใใ ย The hydrophilic thin film 3, the reactive thin film 3a, and the hydrophilic functional thin film 3b may be formed by physical vapor deposition (PVD) such as ion plating and sputtering, thermal CVD, and plasma CVD. It is preferable to carry out by a conventionally known thin film forming method such as a chemical vapor deposition (CVD) method such as VD. The thickness of each thin film is preferably 50 to 100 nm in the case of a single-layer hydrophilic thin film 3 in consideration of the hydrophilicity, photocatalytic reactivity, thin film strength and the like of the hydrophilic thin film 3. In the case of the hydrophilic thin film 3 of the laminate, the reactive thin film 3a preferably has a thickness of 50 to 100 nm, and the hydrophilic thin film 3b has a thickness of 5 to 100 nm.
( 3 ) ๅฐ้ปๆง่่ ย (3) Conductive thin film
ๅฐ้ปๆง่่ 4ใฏใ ้ๆใชๅฐ้ปๆง็ฉ่ณชใ ไพใใฐใ I T Oใ I n 203ใ S nใ2ใ T a 205ใ ใพใใฏใใใใฎๆททๅ็ฉ็ญใฎ้้ปใใฆ็บ็ฑใใ็ฉ่ณชใๅซ ใใ ใพใใ ใใฎๅฐ้ปๆง่่ 4ใฏใ ้ๆๅบๆฟ้จๆ 2ใฎ่ฃๅดใซ่จญใใใใฆใ ใใใใ ้ๆๅบๆฟ้จๆใฎ่ฃ้ขๅดใซ็บ็ใใๆฐดๆปด ๏ผๆใ๏ผ ใ้คๅปใใใใจ ใใงใใ ้ฒๆๆงใซๅชใใใ ็นใซใ ็ฌฌ 1ๅณ ๏ผ a ) ใซ็คบใใ ใใซใ ้ฒๆ็ด ๅญ 1ใใ ๅ
ๅคๆฐใฎๆธฉๅบฆใซๅทฎใ็ใๆใ ๏ผ้ๆๅบๆฟ้จๆ 2ใซๆใใ็ใใใ ใ๏ผ ใซใกใฉ็จใใผใ 1 0ใซไฝฟ็จใใๅ ดๅใซๆๅฉใงใใใ ใใใฆใ ้ฒๆ็ด ๅญ ๏ผใซใกใฉ็จใใผใใฌใฉใน๏ผ 1ใงใฏใ ๅฐ้ปๆง่่ 4ใใซใกใฉ็จใใผใ 1 0ๅ
ใซๅ็ดใใใๆงๆใจใชใใ ๅฐ้ปๆง่่ 4ใๅคๆฐใซใใใใใใใจใ ใชใใ ใใใใฃใฆใ ๅฐ้ปๆง่่ 4ใๆงๆใใๆๆใฏใ ๅ่จใใ้้ปๆง ๏ผ ็บ็ฑๆง๏ผ ใฎใฟใ่ๆ
ฎใใใฐใใใ ๅคๆฐใซใใใใใใใจใซใใ่ไน
ๆงใ
ไพใใฐใ ่่ฌๅๆง็ญใ่ๆ
ฎใใๅฟ
่ฆใใชใใชใใ ใใฎ็ตๆใ ๆงๆๆๆใจ ใใฆใฎ้ธๆ็ฏๅฒใๅบใใใ ๅฎไพกใชๆๆใงๅฐ้ปๆง่่ 4 ใๆงๆใงใใ ้ฒๆ ็ด ๅญ 1 ใฎ่ฃฝ้ ใณใน ใใไธใใใใจใใงใใใ ใพใใ ๅ่จ่ฆชๆฐดๆง่่ 3 ใจ ใฎ็ตๅใใซใใใ ้ๅธธใฏใ ่ฆชๆฐดๆง่่ 3ใง้ๆๅบๆฟ้จๆ 2ใฎ่กจ้ขๅดใฎๆ ใ ใ้ฒๆญขใใ ้ๆๅบๆฟ้จๆ 2ใฎ่ฃ้ขๅดใซๆใใ็บ็ใใๅ ดๅใซใฎใฟใ ๅฐ ้ปๆง่่ 4ใ้้ปใซใใ็บ็ฑใใใฆใ ่ฃ้ขๅดใฎๆใใ้ฒๆญขใใใ ใใซใ ใใฐใ ้้ป้ใๅๆธใใใใจใใงใใ ้ฒๆ็ด ๅญ 1 ใฎใฉ ใณใใณใฐใณใน ใใ ไฝไธใใใใจใใงใใใ Electroconductive thin film 4, a transparent conductive material, e.g., ITO, I n 2 0 3 , S N_ใ 2, T a 2 0 5 or including a material which generates heat by energization, such as a mixture thereof. Further, since the conductive thin film 4 is provided on the back side of the transparent substrate member 2, water droplets (fogging) generated on the back side of the transparent substrate member can be removed, and the anti-fogging property is excellent. In particular, as shown in FIG. 1 (a), when the anti-fog element 1 is used for a camera hood 10 in which the temperature of the inside and outside air tends to be different (the transparent substrate member 2 tends to be fogged). It is advantageous. In the anti-fog element (camera hood glass) 1, the conductive thin film 4 is housed in the camera hood 10, so that the conductive thin film 4 is not exposed to the outside air. Therefore, the material constituting the conductive thin film 4 only needs to consider the above-described electrical conductivity (heat generation), and the durability due to exposure to the outside air, For example, there is no need to consider chemical resistance. As a result, the range of selection as a constituent material is expanded, the conductive thin film 4 can be formed with an inexpensive material, and the manufacturing cost of the anti-fog element 1 can be reduced. In addition, in combination with the hydrophilic thin film 3, usually, the hydrophilic thin film 3 prevents the front side of the transparent substrate member 2 from fogging, and only when the rear side of the transparent substrate member 2 becomes fogged, By causing the conductive thin film 4 to generate heat when energized to prevent fogging on the rear surface side, the amount of energization can be reduced, and the running cost of the anti-fogging element 1 can be reduced.
ใใฎๅฐ้ปๆง่่ 4ใฎๆ่ๆนๆณใฏใ ๅ่จ่ฆชๆฐดๆง่่ 3 ใจๅๆงใช P VDๆณ ใ C VDๆณใพใใฏๅฐๅทๆณใ ๅกๅธๆณ็ญใง่กใ ใใจใๅฅฝใพ ใใใ ใใใฆใ ๅฐ ้ปๆง่่ 4ใฎ่ๅใฏใ ็บ็ฑๆงใ ่่ๅผทๅบฆใ ๅๅฐ็นๆง็ญใ่ๆ
ฎใใฆใ 1 0 ใ 1 0 0 0 n mใๅฅฝใพใใใ ใพใใ ๅณ็คบใใชใใใ ๅฐ้ปๆง่่ 4ใซใฏ้ ้ปใฎใใใฎ้ปๆฅต ๏ผ้ปๆฅต่๏ผ ็ญใๆฅ็ถใใใฆใใใ ย The conductive thin film 4 is preferably formed by a PVD method, a CVD method, a printing method, a coating method, or the like, similar to the method for forming the hydrophilic thin film 3. The thickness of the conductive thin film 4 is preferably 10 to 100 nm in consideration of heat generation, thin film strength, reflection characteristics and the like. Although not shown, the conductive thin film 4 is connected to an electrode (electrode film) for conducting electricity.
( 4 ) ๅๅฐ้ฒๆญข่่ ๏ผๅๅฑค๏ผ ย (4) Anti-reflective thin film (single layer)
ๅๅฐ้ฒๆญข่่ 5ใฏใ ้ๆใชไฝๅฑๆ็็ฉ่ณชใ ไพใใฐใ S i 02ใ A 1 203 ใ C e F3ใ L a F3ใ B a F2ใ C a F2ใ L i Fใ N a 3A l F6ใ N a F ใ M g F2ใ A 1 203 ใจ Z r 02ใฎๆททๅ็ฉใพใใฏใใใใ็ตใฟๅใใใใ ใฎ็ญใๅซใใ ใใฎๅๅฐ้ฒๆญข่่ 5ใ่จญใใใใจใซใ ใ ใ ๅ่จ ๏ผ 3 ) ใฎๅฐ ้ปๆง่่ 4ใงใฎๅๅฐใๆๅถใใใใจใใงใใใ ใใฎๅๅฐ้ฒๆญข่่ 5ใฎๆ ่ๆนๆณใฏใ ๅ่จ่ฆชๆฐดๆง่่ 3 ใจๅๆงใช P VDๆณใ C V Dๆณ็ญใง่กใ ใใจ ใๅฅฝใพใใใ ใใใฆใ ใใฎๅๅฐ้ฒๆญข่่ 5ใฎ่ๅใฏใ ๅๅฐ้ฒๆญข็นๆงใ ๅ
ๅนฒๆธๆๅถ็นๆง็ญใ่ๆ
ฎใใฆใ 5 0ใ 1 5 0 n mใๅฅฝใพใใใ 5 0 n mๆช ๆบใงใฏๅๅฐใ้ฒๆญขใใๅนๆใ ๅ
ๅนฒๆธใๆๅถใใๅนๆใๅฐใใใ ้ฒๆ็ด ๅญ ใ้้ใใๅ
ใซๅนฒๆธ่ฒใใคใใใใใ ใพใใ ่่ๅผทๅบฆใๅฐใใ็ ดๅฃใใ ใใใ ใชใใจๅ
ฑใซใ ่ๅใ่ใใใฆๆ่ๅถๅพกใ้ฃใใ ใชใใใใใ 1 5 O n mใ่ถ
ใใใจๅๅฐ้ฒๆญขๅนๆใๅฐใใใชใใใใใ ๅ่จๅฐ้ปๆง่่ 4
ใงใฎๅๅฐใๆๅถใใใใ ๅฐ้ปๆง่่ 4ใฎๅๅฐๅใ้ฒๆ็ด ๅญ 1ใ้้ใใ ็ปๅใซๅใ่พผใฟใใใใชใใ Antireflection film 5, the transparent low refractive index material, for example, S i 0 2, A 1 2 0 3, C e F 3, L a F 3, B a F 2, C a F 2, L i F, N including a 3 a l F 6, N a F, M g F 2, a 1 2 0 3 and Z r 0 mixture of 2 or the like is also a combination of these. By providing the anti-reflection thin film 5, the reflection at the conductive thin film 4 of (3) can be suppressed. The method for forming the anti-reflection thin film 5 is preferably performed by the same PVD method, CVD method, or the like as the hydrophilic thin film 3. The thickness of the antireflection thin film 5 is preferably 50 to 150 nm in consideration of antireflection characteristics, light interference suppression characteristics, and the like. If it is less than 50 nm, the effect of preventing reflection and the effect of suppressing light interference are small, and light transmitted through the anti-fog element tends to have an interference color. In addition, the strength of the thin film is small and it is easy to be ruptured, and the film thickness is too thin to control the film formation. If the thickness exceeds 15 O nm, the antireflection effect tends to decrease, and the conductive thin film 4 Reflection is not suppressed, and the reflection image of the conductive thin film 4 easily appears in the image transmitted through the anti-fog element 1.
็ฌฌ 3ๅณใ็ฌฌ 5ๅณใซ้ฒๆ็ด ๅญใฎๅๅ
้้็็นๆงๅณใ็คบใใใ ๅณไธญใฎ (A ) ใฏๅๅฐ้ฒๆญข่่ใๆใใฆใใชใ้ฒๆ็ด ๅญใฎๅๅ
้้็็นๆงๅณใ ๏ผB 1 ) ใ ๏ผB 6 ) ใฏๅๅฐ้ฒๆญข่่ ๏ผๅๅฑค๏ผ ใๆใใๆฌ็บๆใฎ้ฒๆ็ด ๅญใฎๅๅ
้้็็นๆงๅณใงใใใ ย FIGS. 3 to 5 show spectral transmittance characteristics of the anti-fog element. In the figure, (A) is a spectral transmittance characteristic diagram of the anti-fogging element having no anti-reflection thin film, and (B 1) to (B 6) are anti-fogging elements of the present invention having an anti-reflection thin film (single layer). FIG. 4 is a spectral transmittance characteristic diagram of FIG.
็ฌฌ 3ๅณใฏใ ๅๅฐ้ฒๆญข่่ ๏ผๅๅฑค๏ผ ใจใใฆ S i 02่ ๏ผ S i ใ2ใฎๅฑๆ็ ใฏ 1 . 4 6 ) ใไฝฟ็จใใไพใงใใใ FIG. 3 shows an example in which a SiO 2 film (Si i 2 has a refractive index of 1.46) is used as an anti-reflection thin film (single layer).
( A) S i 02/T i ใ2Zใฌใฉใน / I T O (A) S i 0 2 / T i ใ 2 Z glass / ITO
้ๆใฌใฉใน 1. 9 mm (ไปฅไธใ ๅใซ้ๆใฌใฉในใจ็งฐใใ ๏ผ ใฎ่กจ้ขใซ T i ใ2่ 2 0 0 n mใ S i ใ2่ 2 0 n mใ้ ๆฌกๆ่ใใ ้ๆใฌใฉในใฎ่ฃ ้ขใซ I T O่ 2 0 0 n mใๆ่ใใ้ฒๆ็ด ๅญใ ใชใใ ๅฑๆ็ใฏใ S i O 2ๅ S I . 4 6ใ T i 02ใ 2. 3 5ใ ใฌใฉในใ 1 . 5 2ใ I T Oใ 2. 0 6ใงใใใ Transparent glass 1. 9 mm (hereinafter, simply referred to as a transparent glass.) T i ใ on the surface of 2 film 2 0 0 nm, are sequentially deposited S i ใ 2 film 2 0 nm, ITO on the back surface of the transparent glass An anti-fog element with a thickness of 200 nm. Incidentally, the refractive index, S i O 2 force SI. 4 6, T i 0 2 is 2.3 5, glass is 1. 5 2, ITO 2. 0 6.
( B 1 ) S i 02/T i ใ2/ใฌใฉใน / I T O/ S i 025 0 n m (B 1) S i 0 2 / T i ใ 2 / Glass / ITO / S i 0 2 5 0 nm
้ๆใฌใฉในใฎ่กจ้ขใซ T i 02่ 2 0 0 n mใ S i 02่ 2 0 n mใ้ ๆฌก ๆ่ใใ ้ๆใฌใฉในใฎ่ฃ้ขใซ I T O่ 2 0 0 n mใ S i ใ2่ 5 0 n m ใ้ ๆฌกๆ่ใใ้ฒๆ็ด ๅญใ T i 0 2 film 2 0 0 nm on a surface of a transparent glass, sequentially deposited S i 0 2 film 2 0 nm, ITO film 2 0 0 nm on the back surface of the transparent glass, the S i ใ 2 film 5 0 nm Antifogging elements formed sequentially.
( B 2 ) S i 02/T i 02/ใฌใฉใน / I T O/ S i ใ21 5 0 n m ้ๆใฌใฉในใฎ่กจ้ขใซ T i 02่ 2 0 0 n mใ S i ใ2่ 2 0 n mใ้ ๆฌก ๆ่ใใ ้ๆใฌใฉในใฎ่ฃ้ขใซ I T O่ 2 0 O n mใ S i 02่ 1 5 0 n mใ้ ๆฌกๆ่ใใ้ฒๆ็ด ๅญใ (B 2) S i 0 2 / T i 0 2 / Glass / ITO / S i ใ 2 1 5 0 nm T i on the surface of the transparent glass 0 2 film 2 0 0 nm, the S i ใ 2 film 2 0 nm sequentially deposited, ITO layer 2 0 O nm on the back surface of the transparent glass, S i 0 2 film 1 5 0 nm sequentially deposited anti-fog element.
็ฌฌ 4ๅณใฏใ ๅๅฐ้ฒๆญข่่ ๏ผๅๅฑค๏ผ ใจใใฆ M g F2่ ๏ผM g F2ใฎๅฑๆ็ ใฏ 1 . 3 8 ) ใไฝฟ็จใใไพใงใใใ FIG. 4 shows an example in which a MgF 2 film (the refractive index of MgF 2 is 1.38) is used as an anti-reflection thin film (single layer).
( A) S i 02/T i ใ2/ใฌใฉใน / I T O (A) S i 0 2 / T i ใ 2 / glass / ITO
็ฌฌ 3ๅณใฎ ๏ผA) ใจๅๆงใชๆงๆใฎ้ฒๆ็ด ๅญใ
( B 3 ) S i 02ZT i 02 /ใฌใฉในใ I T O/M g F 25 0 n m ้ๆใฌใฉในใฎ่กจ้ขใซ T i 02่ 2 0 0 n mใ S i 02่ 2 0 n mใ้ ๆฌก ๆ่ใใ ้ๆใฌใฉในใฎ่ฃ้ขใซ I T O่ 2 0 0 n mใ M g F 2่ 5 0 n m ใ้ ๆฌกๆ่ใใ้ฒๆ็ด ๅญใ Antifogging element having the same configuration as (A) in Fig. 3. (B 3) S i 0 2 ZT i 0 2 / Garasuno ITO / M g F 2 5 T i 0 on the surface of the 0 nm transparent glass 2 film 2 0 0 nm, S i 0 2 film sequentially formed 2 0 nm and, ITO film 2 0 0 nm on the back surface of the transparent glass, M g F 2 film 5 0 nm sequentially deposited anti-fog element.
( B 4 ) S i 02ใ T i ใ2Zใฌใฉใน/ I T O/M g F 2 l 5 0 n m ้ๆใฌใฉในใฎ่กจ้ขใซ T i ใ2่ 2 0 0 n mใ S i ใ2่ 2 0 n mใ้ ๆฌก ๆ่ใใ ้ๆใฌใฉในใฎ่ฃ้ขใซ I T O่ 2 0 0 n mใ M g F 2่ 1 5 0 ฮท mใ้ ๆฌกๆ่ใใ้ฒๆ็ด ๅญใ (B 4) S i 0 2 T i ใ 2 Z glass / ITO / M g F 2 l 50 nm T i ใ 2 film 200 nm, S i ใ 2 film 20 nm on transparent glass surface sequentially deposited, ITO layer 2 0 0 nm on the back surface of the transparent glass, M g F 2 film 1 5 0 eta sequentially deposited anti-fog element m.
็ฌฌ 5ๅณใฏใ ๅๅฐ้ฒๆญข่่ ๏ผๅๅฑค๏ผ ใจ ใใฆ A 1203่ ๏ผA l 2ใ3 ใฎๅฑๆ ็ใฏ 1 . 6 7 ) ใไฝฟ็จใใไพใงใใใ Figure 5 is a anti-reflection film (single layer) A 1 2 0 3 film (refractive index of A l 2 ใ 3 1.6 7) is an example of using,
( A) S i 02/T i O 2/ใฌใฉใน ฮช T O (A) S i 0 2 / T i O 2 / glass ฮช TO
็ฌฌ 3ๅณใฎ ๏ผA) ใจๅๆงใชๆงๆใฎ้ฒๆ็ด ๅญใ ย Antifogging element having the same configuration as (A) in Fig. 3.
( B 5 ) S i 02ZT i 02 /ใฌใฉใน I T O/ A 1 2035 0 n m ้ๆใฌใฉในใฎ่กจ้ขใซ T i 02่ 2 0 0 n mใ S i ใ2่ 2 0 n mใ้ ๆฌก ๆ่ใใ ้ๆใฌใฉในใฎ่ฃ้ขใซ I T O่ 2 0 0 n,imใ A 1 203 ่ 5 0 n m ใ้ ๆฌกๆ่ใใ้ฒๆ็ด ๅญใ (B 5) S i 0 2 ZT i 0 2 / Glass ITO / A 1 2 3 0 0 5 0 nm A Ti 0 2 film 200 nm and a S i ใ 2 film 20 nm are sequentially formed on the surface of the transparent glass. film, ITO film 2 0 0 n on the underside of a transparent glass, im, a 1 2 0 3 film 5 0 nm sequentially deposited anti-fog element.
( B 6 ) S i 02ZT i 02Zใฌใฉใน/ I T O/A 1 2031 5 0 n m ้ๆใฌใฉในใฎ่กจ้ขใซ T i 02่ 2 0 0 n mใ S i 02่ 2 0 n mใ้ ๆฌก ๆ่ใใ ้ๆใฌใฉในใฎ่ฃ้ขใซ I T O่ 2 0 0 n mใ A 1 203 ่ 1 5 0 ฮท mใ้ ๆฌกๆ่ใใ้ฒๆ็ด ๅญใ (B 6) S i 0 2 ZT i 0 2 Z glass / ITO / A 1 2 0 3 1 5 0 nm T i on the surface of the transparent glass 0 2 film 2 0 0 nm, the S i 0 2 film 2 0 nm sequentially deposited, ITO layer 2 0 0 nm on the back surface of the transparent glass, a 1 2 0 3 film 1 5 0 eta sequentially deposited anti-fog element m.
็ฌฌ 3ๅณใ็ฌฌ 5ๅณใซ็คบใใใใซใ ๅๅฐ้ฒๆญข่่ใๆใใใใจ ใซใใใ ๅฏ ่ฆๅ
็ท้ ๅใซใใใ้้็ใ้ซใ ใชใใ ๅฐ้ปๆง่่ใงใฎๅๅฐใ้ฒๆญขใใ ใฆใใใใจใ่ฆๅบใใใ ๏ผB 1ใB 6ๅ็
ง๏ผ ใ ใคใใซใ ๆฌ็บๆใฎ็ฌฌ 2ใฎๅฎๆฝๅฝขๆ
ใซใคใใฆ็ฌฌ 2ๅณ ๏ผ a ) ใซ็คบใใ ็ฌฌ 2 ๅณ ๏ผ a ) ใซ็คบใใ ใใซใ ้ฒๆ็ด ๅญ 1ใฏใ ้ๆๅบๆฟ้จๆ 2 ใจใ ่ฆชๆฐดๆง่่
3 ใจใ ๅฐ้ปๆง่่ 4 ใจใ ๅๅฐ้ฒๆญข่่ 5 ใจใๆใใใจๅ
ฑใซใ ้ๆๅบๆฟ้จ ๆ 2ใจ่ฆชๆฐดๆง่่ 3ใฎ้ใซ่จญใใใใ็ฌฌ 1 ไธญ้่่ 6ใๆใใใ ไปฅไธใ ๅๆงๆใซใคใใฆ่ฉณ็ดฐใซ่ชฌๆใใใ ใชใใ ้ๆๅบๆฟ้จๆ 2ใ ่ฆชๆฐดๆง่่ 3 ใ ๅฐ้ปๆง่่ 4ใ ๅๅฐ้ฒๆญข่่ 5ใฏๅ่จ ๏ผ 1 ) ใ ๏ผ4 ) ใจๅๆงใฎๆงๆใง ใใใฎใง่ชฌๆใ็็ฅใใใ As shown in FIGS. 3 to 5, it was found that the presence of the anti-reflection thin film increased the transmittance in the visible light region, and prevented reflection on the conductive thin film (B 1 to B6). Next, a second embodiment of the present invention is shown in FIG. 2 (a). As shown in FIG. 2 (a), the anti-fog element 1 is composed of a transparent substrate member 2 and a hydrophilic thin film. 3, a conductive thin film 4, and an anti-reflection thin film 5, and a first intermediate thin film 6 provided between the transparent substrate member 2 and the hydrophilic thin film 3. Hereinafter, each configuration will be described in detail. The transparent substrate member 2, the hydrophilic thin film 3, the conductive thin film 4, and the anti-reflection thin film 5 have the same configurations as in the above (1) to (4), and thus the description is omitted.
( 5 ) ็ฌฌ 1ไธญ้่่ ย (5) First intermediate thin film
็ฌฌ 1ไธญ้่่ 6ใฏใ ใใฎๅฑๆ็ใ่ฆชๆฐดๆง่่ 3ใฎๅฑๆ็ใจ้ๆๅบๆฟ้จ ๆ 2ใฎๅฑๆ็ใฎไธญ้ใฎๅคใๆใใใ ใใใฆใ ใใฎๅฑๆ็ใใ ่ฆชๆฐดๆง่่ 3ใฎๅฑๆ็ใใ ใๅฐใใใ ใใค้ๆๅบๆฟ้จๆ 2ใฎๅฑๆ็ใใใๅคงใใๆง ๆใใใใใจใๅฅฝใพใใใ ไพใใฐใ I T Oใ I n 203ใ S n 02ใ Z n O ใ W03ใ T a 205ใ Z r ใ2็ญใฎ็กๆฉ้
ธๅ็ฉใ A 1 203 ใจ L a ใฎๆททๅ็ฉ ็ญใฎ่คๅ็กๆฉ้
ธๅ็ฉใ ใพใใฏใใใใ็ตใฟๅใใใ้ๆ็ฉใๅซใใ ใใฎ ็ฌฌ 1ไธญ้่่ 6ใ่จญใใใใจใซใ ใใ ๅ่จ ๏ผ 2 ) ใฎ่ฆชๆฐดๆง่่ 3ใงใฎๅ ๅฐใๆๅถใใใใจใใงใใใ ใใฎ็ฌฌ 1ไธญ้่่ 6ใฎๆ่ๆนๆณใฏใ ๅ่จ่ฆช ๆฐดๆง่่ 3 ใจๅๆงใช P VDๆณใ C VDๆณ็ญใง่กใ ใใจใๅฅฝใพใใใ ใพใ ใ ็ฌฌ 1 ไธญ้่่ 6ใฏๅ่จใฎ็กๆฉ้
ธๅ็ฉใ ่คๅ็กๆฉ้
ธๅ็ฉใ ใพใใฏใใใ ใ็ตใฟๅใใใใใฎใๅซใ่่ใ่คๆฐ็ฉๅฑคใใ ็ฉๅฑคใฎ่่ๅ
จไฝใง่ฆชๆฐดๆง ่่ 3ใฎๅฑๆ็ใจ้ๆๅบๆฟ้จๆ 2ใฎๅฑๆ็ใจใฎ้ใฎๅฑๆ็ใๆใคใใฎใง ใใ ๅๅฑคใฎ่่ใงใใฃใฆใใใใ The refractive index of the first intermediate thin film 6 has an intermediate value between the refractive index of the hydrophilic thin film 3 and the refractive index of the transparent substrate member 2. Then, its refractive index is smaller than the refractive index of the hydrophilic thin film 3, and larger structure is preferably made than the refractive index of the transparent substrate member 2, for example, ITO, I n 2 0 3 , S n 0 2, Z n O, W0 3 , T a 2 0 5, Z r ใ inorganic oxides such as 2, composite inorganic oxides such as a mixture of a 1 2 0 3 and L a, or transparency of a combination of these Including. By providing the first intermediate thin film 6, it is possible to suppress the reflection at the hydrophilic thin film 3 of the above (2). This first intermediate thin film 6 is preferably formed by a PVD method, a CVD method, or the like, similar to the method for forming the hydrophilic thin film 3. Further, the first intermediate thin film 6 is formed by laminating a plurality of thin films containing the above-mentioned inorganic oxide, composite inorganic oxide, or a combination thereof. The refractive index of the hydrophilic thin film 3 and the transparent substrate 2 It may have a refractive index between the above and a single-layer thin film.
ใใใฆใ ใใฎ็ฌฌ 1ไธญ้่่ 6ใฎ่ๅใฏใ ๅๅฐ้ฒๆญข็นๆงใ ๅ
ๅนฒๆธๆๅถ็น ๆง็ญใ่ๆ
ฎใใฆใ 5ใ 2 0 0 n mใๅฅฝใพใใใ 5 n mๆชๆบใงใฏๅๅฐใ้ฒ ๆญขใใๅนๆใ ๅ
ๅนฒๆธใๆๅถใใๅนๆใๅฐใใใ ้ฒๆ็ด ๅญใ้้ใใๅ
ใซ ๅนฒๆธ่ฒใใคใใใใใ ใพใใ ่ๅใ่ใใใฆๆ่ๅถๅพกใ้ฃใใ ใชใใใ ใใ 2 0 0 n mใ่ถ
ใใใจๅๅฐ้ฒๆญขๅนๆใๅฐใใใชใใใใใ ๅ่จ่ฆชๆฐด ๆง่่ 3ใงใฎๅๅฐใๆๅถใใใใ ่ฆชๆฐดๆง่่ 3ใฎๅๅฐๅใ้ฒๆ็ด ๅญ 1 ใ ้้ใใ็ปๅใซๅใ่พผใฟใใใใชใใ
ใพใใ ๆฌ็บๆใฎ็ฌฌ 3ใฎๅฎๆฝๅฝขๆ
ใ็ฌฌ 2ๅณ ๏ผb ) ใซ็คบใใ ็ฌฌ 2ๅณ ๏ผ b ) ใซ็คบใใใใซใ ้ฒๆ็ด ๅญ 1ใฏใ ้ๆๅบๆฟ้จๆ 2 ใจใ ่ฆชๆฐดๆง่่ 3 ใจใ ๅฐ ้ปๆง่่ 4 ใจใ ๅๅฐ้ฒๆญข่่ 5 a ใจใๆใใ ๅๅฐ้ฒๆญข่่ 5 aใ 2ใฃไปฅ ไธใฎ่่ใ็ฉๅฑคใใ็ฉๅฑคๆง้ ใๆใใ ๏ผ็ฌฌ 2ๅณ ๏ผ b ) ใงใฏใ ่่ 5 1 ใ ่่ 5 2ใฎ 2ๅฑค๏ผ ใ ไปฅไธใ ๅๆงๆใซใคใใฆ่ฉณ็ดฐใซ่ชฌๆใใใ ใชใใ ้ๆ ๅบๆฟ้จๆ 2ใ ่ฆชๆฐดๆง่่ 3ใ ๅฐ้ปๆง่่ 4ใฏๅ่จ ๏ผ 1 ) ใ ๏ผ 3 ) ใจๅๆง ใฎๆงๆใงใใใฎใง่ชฌๆใ็็ฅใใใ The thickness of the first intermediate thin film 6 is preferably 5 to 200 nm in consideration of antireflection characteristics, light interference suppression characteristics, and the like. If it is less than 5 nm, the effect of preventing reflection and the effect of suppressing light interference are small, and light transmitted through the anti-fog element tends to have an interference color. In addition, the film thickness is too thin, and it is easy to control the film formation. If it exceeds 200 nm, the antireflection effect tends to be small, the reflection on the hydrophilic thin film 3 is not suppressed, and the reflection image of the hydrophilic thin film 3 is easily reflected on the image transmitted through the anti-fog element 1. FIG. 2 (b) shows a third embodiment of the present invention. As shown in FIG. 2 (b), the anti-fogging element 1 includes a transparent substrate member 2, a hydrophilic thin film 3, a conductive thin film 4, and an anti-reflective thin film 5a. It has a laminated structure where two or more thin films are laminated (a thin film 51 and a thin film 52 in FIG. 2 (b)). Hereinafter, each configuration will be described in detail. Note that the transparent substrate member 2, the hydrophilic thin film 3, and the conductive thin film 4 have the same configurations as in the above (1) to (3), and thus description thereof will be omitted.
( 6 ) ๅๅฐ้ฒๆญข่่ ๏ผ็ฉๅฑค๏ผ ย (6) Anti-reflective thin film (laminated)
ๅๅฐ้ฒๆญข่่ 5 aใฏใ ๅฑๆ็ใฎ็ฐใชใ็ฉ่ณชใๅซใ 2ใคไปฅไธใฎ้ๆใช่ ่ใ็ฉๅฑคใใใใฎใงใ ไพใใฐใ ่่ 5 2ใใ ไฝๅฑๆ็็ฉ่ณชใงใใใ ไพใ ใฐใ S i 02ใ A 1 2ใ3ใ C e Fใ L a Fใ B a F 2ใฝ C a F 2ใ L i F ใ N a 3A l F6ใ N a Fใ M g F2ใ A 1 203 ใจ Z r 02 ใฎๆททๅ็ฉใพใใฏ ใใใใ็ตใฟๅใใใใใฎ็ญใใๆงๆใใ ่่ 5 1ใใ ใใฎๅฑๆ็ใ่ ่ 5 2ใฎๅฑๆ็ใใๅคงใใใชใใ ใใซใ ไพใใฐใ T i O 2ใ Z r O 2ใ T a 2ใ5็ญใงๆงๆใใใ ใใใฆใ ใใฎๅๅฐ้ฒๆญข่่ 5 aๅ
จไฝใฎๅฑๆ็ใใ ๅฐ้ปๆง่่ 4ใฎๅฑๆ็ใใๅฐใใ ใชใใใใซใใใ ใใฎๅๅฐ้ฒๆญข่ 5 a (่่ 5 1ใ 5 2 ) ใ่จญใใใใจใซใใใ ๅ่จ ๏ผ 3 ) ใฎๅฐ้ปๆง่่ 4ใง ใฎๅๅฐใๆๅถใงใใใ ใใฎๅๅฐ้ฒๆญข่่ 5 aใฎๆ่ๆนๆณใฏใ ๅ่จ่ฆชๆฐดๆง ่่ 3 ใจๅๆงใช P VDๆณใ C VDๆณ็ญใง่กใ ใใจใๅฅฝใพใใใ ใใใฆใ ใใฎๅๅฐ้ฒๆญข่่ 5 a (่่ 5 1ใ 5 2 ) ใฎ่ๅใฏใ ๅๅฐ้ฒๆญข็น f็็ญใ ่ๆ
ฎใใฆใ ้ฉๅฎ่จญๅฎใใใ The anti-reflection thin film 5a is formed by laminating two or more transparent thin films containing substances having different refractive indexes. For example, the thin film 52 is formed of a low-refractive index substance, for example, S i 0 2 , A 1 2 ใ 3 , C e F or L a F or B a F 2ใฝ C a F 2 , L i F, N a 3 A l F 6 , N a F, M g F 2 , A 1 2 0 3 and Z r 0 mixture of 2 or consists like a combination of these, a thin film 5 1, sea urchin by which the refractive index is larger than the refractive index of the thin film 5 2, for example, T i O 2, Z r O 2 , Ta 2 ใ 5 etc. Then, the refractive index of the entire antireflection thin film 5 a is set to be smaller than the refractive index of the conductive thin film 4. By providing the antireflection film 5a (thin films 51, 52), reflection at the conductive thin film 4 of (3) can be suppressed. This anti-reflection thin film 5a is preferably formed by the same PVD method, C VD method or the like as in the case of the hydrophilic thin film 3. The thickness of the antireflection thin film 5a (thin film 51, 52) is appropriately set in consideration of antireflection characteristics and the like.
็ฌฌ 6ๅณใ็ฌฌ 9ๅณใซ้ฒๆ็ด ๅญใฎๅๅ
้้็็นๆงๅณใ็คบใใใ ๅณไธญใฎ ๏ผA ) ใฏๅๅฐ้ฒๆญข่่ ๏ผ็ฉๅฑค๏ผ ใๆใใฆใใชใ้ฒๆ็ด ๅญใฎๅๅ
้้็็นๆงๅณ ใ ๏ผB 7๏ผ) ใ ๏ผB 1 0 ) ใฏๅๅฐ้ฒๆญข่่ ๏ผ็ฉๅฑค๏ผ ใๆใใๆฌ็บๆใฎ้ฒๆ ็ด ๅญใฎๅๅ
้้็็นๆงๅณใงใใใ
็ฌฌ 6ๅณใฏใ ๅๅฐ้ฒๆญข่่ ๏ผ็ฉๅฑค๏ผ ใจใใฆ T i ใ2่ใจ S i ใ2่ใไฝฟ็จ ใใไพใงใใใ 6 to 9 show spectral transmittance characteristics of the anti-fog element. In the figure, (A) is a spectral transmittance characteristic diagram of the antifogging element having no antireflection thin film (lamination), and (B7;) to (B10) are the present invention having an antireflection thin film (lamination). FIG. 5 is a spectral transmittance characteristic diagram of the anti-fog element of FIG. Figure 6 is an example using the T i ใ 2 film and the S i ใ 2 film as an antireflection film (laminate),
( A) S i 02/T i 02/ใฌใฉใน / I T O (A) S i 0 2 / T i 0 2 / Glass / ITO
็ฌฌ 3ๅณใฎ ๏ผA) ใจๅๆงใชๆงๆใฎ้ฒๆ็ด ๅญใ ย Antifogging element having the same configuration as (A) in Fig. 3.
( B 7 ) S i 02/T i 02Zใฌใฉใน/ I T O/ 2ๅฑค (T i Oใ S i 02 (B 7) S i 0 2 / T i 0 2 Z glass / ITO / two layers (T i O no S i 0 2
) )
้ๆใฌใฉในใฎ่กจ้ขใซ T i 02่ 2 0 0 n mใ S i 02่ 2 0 n mใ้ ๆฌก ๆ่ใใ ้ๆใฌใฉในใฎ่ฃ้ขใซ I T O่ 2 0 O n mใ T i 02่ 2 5 n m ใ S i 02่ 4 5 n mใ T i ใ2่ 2 7 0 n mใ 3 1 ใ2่ 1 3 0 11 111ใ ้ ๆฌกๆ่ใใ้ฒๆ็ด ๅญใ T i 0 2 film 2 0 0 nm on a surface of a transparent glass, S i 0 2 film 2 0 nm are sequentially deposited, ITO layer 2 0 O nm on the back surface of the transparent glass, T i 0 2 film 2 5 nm, S i 0 2 film 4 5 nm, T i ใ 2 film 2 7 0 nm, 3 1 ใ 2 film 1 3 0 11 111 sequentially deposited anti-fog element.
็ฌฌ 7ๅณใฏใ ๅๅฐ้ฒๆญข่่ ๏ผ็ฉๅฑค๏ผ ใจใใฆ Z r ใ2่ใจ S i ใ2่ใไฝฟ็จ ใใไพใงใใใ Figure 7 is an example of using the Z r ใ 2 film and the S i ใ 2 film as an antireflection film (laminate),
( A) S i 02/T i O 2Zใฌใฉใน / I T O (A) S i 0 2 / T i O 2 Z glass / ITO
็ฌฌ 3ๅณใฎ ๏ผA) ใจๅๆงใชๆงๆใฎ้ฒๆ็ด ๅญใ ย Antifogging element having the same configuration as (A) in Fig. 3.
( B 8 ) S i O 2/ T i 02 ใฌใฉใน 1 T O / S i ใ2 2ๅฑค ( Z r O 2 (B 8) S i O 2 / T i 0 2 Glass 1 TO / S i ใ 2 2 layers (Z r O 2
/s i o2) / sio 2 )
้ๆใฌใฉในใฎ่กจ้ขใซ T i 02่ 2 0 O n mใ S i ใ2่ 2 0 n mใ้ ๆฌก ๆ่ใใ ้ๆใฌใฉในใฎ่ฃ้ขใซ I T O่ 2 0 0 n mใ S i ใ2่ 4 5 n m ใ Z r ใ2่ 2 5 n mใ S i ใ2่ 4 5 n mใ Z rใ2 ่ 2 7 0 n mใ S i 02่ 1 3 0 n mใ้ ๆฌกๆ่ใใ้ฒๆ็ด ๅญใ T i 0 2 film 2 0 O nm on the surface of the transparent glass, S i ใ 2 film 2 are sequentially deposited 0 nm, ITO film 2 0 0 nm on the back surface of the transparent glass, S i ใ 2 film 4 5 nm, Z r ใ 2 film 2 5 nm, S i ใ 2 film 4 5 nm, Z R_ใ 2 film 2 7 0 nm, S i 0 2 film 1 3 0 nm sequentially deposited anti-fog element.
็ฌฌ 8ๅณใฏใ ๅๅฐ้ฒๆญข่่ ๏ผ็ฉๅฑค๏ผ ใจ ใใฆ T a 205่ใจ S i ใ2่ใไฝฟ ็จใใไพใงใใใ Figure 8 is an example of using the T a 2 0 5 film and S i ใ 2 film as an antireflection film (laminate),
( A) S i 02/T i 02/ใฌใฉใน / I T O (A) S i 0 2 / T i 0 2 / Glass / ITO
็ฌฌ 3ๅณใฎ ๏ผA) ใจๅๆงใชๆงๆใฎ้ฒๆ็ด ๅญใ ย Antifogging element having the same configuration as (A) in Fig. 3.
( B 9 ) S i 02ZT i 02Zใฌใฉใน/ I T O/ 3ๅฑค ( T a 20ใ S i 02 (B 9) S i 0 2 ZT i 0 2 Z glass / ITO / 3 layer (T a 20 o S i 0 2
)
้ๆใฌใฉในใฎ่กจ้ขใซ T i 02่ 2 0 0 n mใ S i 02่ 2 0 n mใ้ ๆฌก ๆ่ใใ ้ๆใฌใฉในใฎ่ฃ้ขใซ I T O่ 2 0 0 n mใ T a 205่ 2 5 n m ใ S i ใ2่ 2 5 n mใ T a 205่ 1 6 0 n mใ S i ใ2่ 3 0 n mใ T a 205่ 1 2 0 n mใ S i 02่ 1 3 0 n mใ ใ้ ๆฌกๆ่ใใ้ฒๆ็ด ๅญ 0 ) T i 0 2 film 2 0 0 nm on a surface of a transparent glass, S i 0 2 film 2 are sequentially deposited 0 nm, ITO film 2 0 0 nm on the back surface of the transparent glass, T a 2 0 5 film 2 5 nm , S i ใ 2 film 2 5 nm, T a 2 0 5 film 1 6 0 nm, S i ใ 2 film 3 0 nm, T a 2 0 5 film 1 2 0 nm, S i 0 2 film 1 3 0 nm , Anti-fog element 0
็ฌฌ 9ๅณใฏใ ๅๅฐ้ฒๆญข่่ ๏ผ็ฉๅฑค๏ผ ใจ ใใฆ T a 205่ใจ M g F2่ใไฝฟ ็จใใไพใงใใใ Figure 9 is an example of using the T a 2 0 5 film and M g F 2 film as an antireflection film (laminate),
( A) S i 02/T i ใ2/ใฌใฉใน / I T O (A) S i 0 2 / T i ใ 2 / glass / ITO
็ฌฌ 3ๅณใฎ ๏ผA) ใจๅๆงใชๆงๆใฎ้ฒๆ็ด ๅญใ . ย Antifogging element having the same configuration as (A) in Fig. 3. .
( B 1 0 ) S i ฮ,/ฮ i 02/ใฌใฉใน Z I T O/T a ,Os/M g F 2 ้ๆใฌใฉในใฎ่กจ้ขใซ T i 02่ 2 0 0 n mใ S i 02่ 2 0 n mใ้ ๆฌก ๆ่ใใ ้ๆใฌใฉในใฎ่ฃ้ขใซ I T O่ 2 0 0 n mใ T a 2ใ5่ 2 7 0 ฮท mใ M g F2่ 1 3 0 n mใ้ ๆฌกๆ่ใใ้ฒๆ็ด ๅญใ (B1 0) S i ฮ, / ฮ i 0 2 / glass ZITO / T a, O s / M g F 2 T i 0 2 film 200 nm, S i 0 2 film 20 on transparent glass surface nm are sequentially deposited, ITO layer 2 0 0 nm on the back surface of the transparent glass, T a 2 ใ 5 film 2 7 0 ฮท m, M g F 2 film 1 3 0 nm sequentially deposited anti-fog element.
็ฌฌ 6ๅณใ็ฌฌ 9ๅณใซ็คบใใใใซใ ๅๅฐ้ฒๆญข่่ ๏ผ็ฉๅฑค๏ผ ใๆใใใใจใซ ใใใ ๅฏ่ฆๅ
็ท้ ๅใซใใใ้้็ใ้ซใ ใชใใ ๅฐ้ปๆง่่ใซใใใๅ ๅฐใ้ฒๆญขใใใฆใใใใจใ่ฆๅบใใใ ๏ผB 7ใ๏ผ B 1 0 ๅ็
ง๏ผ ใ ใพใใ ๆฌ็บๆใฎ็ฌฌ 4ใฎๅฎๆฝๅฝขๆ
ใ็ฌฌ 2ๅณ ๏ผ c ) ใซ็คบใใ ็ฌฌ 2ๅณ ๏ผ c ) ใซ็คบใใใใซใ ้ฒๆ็ด ๅญ 1ใฏใ ้ๆๅบๆฟ้จๆ 2 ใจใ ่ฆชๆฐดๆง่่ 3 ใจใ ๅฐ ้ปๆง่่ 4 ใจใๆใใใจๅ
ฑใซใ ้ๆๅบๆฟ้จๆ 2 ใจๅฐ้ปๆง่่ 4ใฎ้ใซ่จญ ใใใใ็ฌฌ 2ไธญ้่่ 7ใๆใใใ ไปฅไธใ ๅๆงๆใซใคใใฆ่ฉณ็ดฐใซ่ชฌๆใ ใใ ใชใใ ้ๆๅบๆฟ้จๆ 2ใ ่ฆชๆฐดๆง่่ 3ใ ๅฐ้ปๆง่่ 4ใฏๅ่จ ๏ผ 1 ) ใ ๏ผ 3 ) ใจๅๆงใฎๆงๆใงใใใฎใง่ชฌๆใ็็ฅใใใ ย As shown in FIGS. 6 to 9, it was found that the presence of the anti-reflection thin film (lamination) increased the transmittance in the visible light region, and prevented reflection in the conductive thin film. (See B7-: B10). FIG. 2 (c) shows a fourth embodiment of the present invention. As shown in FIG. 2 (c), the anti-fogging element 1 has a transparent substrate member 2, a hydrophilic thin film 3, and a conductive thin film 4, and has a structure between the transparent substrate member 2 and the conductive thin film 4. It has a second intermediate thin film 7 provided on the substrate. Hereinafter, each configuration will be described in detail. Note that the transparent substrate member 2, the hydrophilic thin film 3, and the conductive thin film 4 have the same configurations as in the above (1) to (3), and thus description thereof will be omitted.
( 7 ) ็ฌฌ 2ไธญ้่่ ย (7) Second intermediate thin film
็ฌฌ 2ไธญ้่่ 7ใฏใ ใใฎๅฑๆ็ใ้ๆๅบๆฟ้จๆ 2ใฎๅฑๆ็ใจๅฐ้ปๆง่ ่ 4ใฎๅฑๆ็ใฎไธญ้ใฎๅคใๆใใใ ใใใฆใ ใใฎๅฑๆ็ใ้ๆๅบๆฟ้จๆ
2ใฎๅฑๆ็ใใ ใๅคงใใใ ใใคๅฐ้ปๆง่่ 4ใฎๅฑๆ็ใ ใ ใๅฐใใๆงๆ ใใใฆใใใใจใๅฅฝใพใใใ ไพใใฐใ A 1 203ใ WO M g O็ญใฎ็กๆฉ ้
ธๅ็ฉใ A 1203 ใจ L a ใจใฎๆททๅ็ฉ็ญใฎ่คๅ็กๆฉ้
ธๅ็ฉใพใใฏใใใใ ็ตใฟๅใใใ้ๆ็ฉใๅซใใ ใใฎ็ฌฌ 2ไธญ้่่ 7ใ่จญใใใใจใซใ ใใ ๅ่จ ๏ผ 3 ) ใฎๅฐ้ปๆง่่ 4ใงใฎๅๅฐใๆๅถใใใใจใใงใใใ ใใฎ็ฌฌ 2 ไธญ้่่ 7ใฎๆ่ๆนๆณใฏใ ๅ่จ่ฆชๆฐดๆง่่ 3 ใจๅๆงใช P VDๆณใ C VD ๆณ็ญใง่กใ ใใจใๅฅฝใพใใใ ใพใใ ็ฌฌ 2ไธญ้่่ 7ใฏๅ่จใฎ็กๆฉ้
ธๅ็ฉ ใ ่คๅ็กๆฉ้
ธๅ็ฉใ ใพใใฏใใใใ็ตใฟๅใใใใใฎใๅซใ่่ใ่คๆฐ ็ฉๅฑคใใ ็ฉๅฑคใฎ่่ๅ
จไฝใง้ๆๅบๆฟ้จๆ 2 ใฎๅฑๆ็ใจๅฐ้ปๆง่่ 4ใฎๅฑ ๆ็ใจใฎไธญ้ใฎๅฑๆ็ใๆใคใใฎใงใใ ๅๅฑคใฎ่่ใงใใฃใฆใใใใ The refractive index of the second intermediate thin film 7 has an intermediate value between the refractive index of the transparent substrate member 2 and the refractive index of the conductive thin film 4. And the refractive index of the transparent substrate member Greater than 2 of the refractive index, and is preferably is also smaller configuration Ri by the refractive index of the conductive thin film 4, for example, A 1 2 0 3, WO M g inorganic oxides such as O, A 1 2 0 Includes composite inorganic oxides such as a mixture of 3 and La, or transparent materials combining these. By providing the second intermediate thin film 7, the reflection at the conductive thin film 4 of (3) can be suppressed. This second intermediate thin film 7 is preferably formed by a PVD method, a CVD method, or the like, similar to the method for forming the hydrophilic thin film 3. The second intermediate thin film 7 is formed by laminating a plurality of thin films containing the above-described inorganic oxide, composite inorganic oxide, or a combination thereof, and the refractive index of the transparent substrate member 2 and the conductive thin film 4 It may have a refractive index intermediate between the refractive index of the film and a single-layer thin film.
ใใใฆใ ใใฎ็ฌฌ 2ไธญ้่่ 7ใฎ่ๅใฏใ ๅๅฐ้ฒๆญขๅนๆใ่ๆ
ฎใใฆ 5ใ 2 0 0 n mใๅฅฝใพใใใ ่ๅใๅ่จ็ฏๅฒๅคใงใใใจใ ๅฐ้ปๆง่่ 4ใงใฎ ๅๅฐๆๅถๅนๆใๅฐใใใชใใใใใ ๅฐ้ปๆง่่ 4ใฎๅๅฐๅใ้ฒๆ็ด ๅญ 1 ใ้้ใใ็ปๅใซๅใ่พผใฟใใใใชใใ ย The thickness of the second intermediate thin film 7 is preferably 5 to 200 nm in consideration of the antireflection effect. If the film thickness is outside the above range, the effect of suppressing reflection at the conductive thin film 4 tends to be small, and the reflection image of the conductive thin film 4 tends to be reflected on the image transmitted through the anti-fog element 1.
็ฌฌ 1 0ๅณใซ้ฒๆ็ด ๅญใฎๅๅ
้้็็นๆงๅณใ็คบใใใ ๅณไธญใฎ ๏ผA) ใฏ็ฌฌ 2ไธญ้่่ใๆใใฆใใชใ้ฒๆ็ด ๅญใฎๅๅ
้้็็นๆงๅณใ ๏ผB 1 1 ) ใฏ ็ฌฌ 2ไธญ้่่ใๆใใๆฌ็บๆใฎ้ฒๆ็ด ๅญใฎๅๅ
้้็็นๆงๅณใงใใใ ็ฌฌ 1 0ๅณใฏใ ็ฌฌ 2ไธญ้่่ใจ ใใฆ A 12ใ3่ใไฝฟ็จใใไพใงใใใ ( A) S i 02ZT i 02 ใฌใฉใน / I TO FIG. 10 shows a spectral transmittance characteristic diagram of the anti-fog element. In the figure, (A) is a spectral transmittance characteristic diagram of the anti-fogging element without the second intermediate thin film, and (B 11) is a spectral transmittance characteristic diagram of the anti-fogging element of the present invention having the second intermediate thin film. It is. The first 0 figure as the second intermediate thin an example using A 1 2 ใ 3 film, (A) S i 0 2 ZT i 0 2 glass / I TO
็ฌฌ 3ๅณใฎ ๏ผA) ใจๅๆงใชๆงๆใฎ้ฒๆ็ด ๅญใ ย Antifogging element having the same configuration as (A) in Fig. 3.
( B 1 1 ) S i ฮฟ2/ฯ i ใ2Zใฌใฉใน Z A 12o3Z I T O (B 1 1) S i ฮฟ 2 / ฯ i ใ 2 Z glass ZA 1 2 o 3 ZITO
้ๆใฌใฉในใฎ่กจ้ขใซ T i 02่ 2 0 0 n mใ S i 02่ 2 0 n mใ้ ๆฌก ๆ่ใใ ้ๆใฌใฉในใฎ่ฃ้ขใซ A 1203่ 5 O n mใ 1 ไธใ่ 2 0 0 11 111 ใ้ ๆฌกๆ่ใใ้ฒๆ็ด ๅญใ ใชใใ ๅฑๆ็ใฏใ S i 02 ใ 1 . 4 6ใ T i O 2 ใ 2. 3 5ใ ใฌใฉในใ 1. 5 2ใ A 1 203 ๅ 1 . 6 7ใ I T Oใ 2 . 0 6ใงใใใ
็ฌฌ 1 0ๅณใซ็คบใใใใซใ ็ฌฌ 2ไธญ้่่ใๆใใใใจใซใใใ ๅฏ่ฆๅ
็ท ้ ๅใซใใใ้้็ใ้ซใใชใใ ๅฐ้ปๆง่่ใงใฎๅๅฐใ้ฒๆญขใใใฆใใ ใใจใ่ฆๅบใใใ ๏ผB 1 1ๅ็
ง๏ผ ใ ใชใใ ๆฌ็บๆใฏๅ่จ็ฌฌ 1ใ็ฌฌ 4 ใฎๅฎๆฝๅฝขๆ
ใซ้ๅฎใใใใ ไพใใฐใ ็ฌฌ 2ใฎๅฎๆฝๅฝขๆ
๏ผ็ฌฌ 2ๅณ ๏ผ a ) ) ใซ็ฌฌ 2ไธญ้่่ 7ใ่ฟฝๅ ใใๆงๆใ ็ฌฌ 3 ใฎๅฎๆฝๅฝขๆ
๏ผ็ฌฌ 2ๅณ ๏ผb ) ) ใซ็ฌฌ 1 ไธญ้่่ 6ใใใณ็ฌฌ 2ไธญ้่่ 7ใฎ ๅฐใชใ ใจใไธๆนใ่ฟฝๅ ใใๆงๆใ ็ฌฌ 4ใฎๅฎๆฝๅฝขๆ
๏ผ็ฌฌ 2ๅณ ๏ผ c ) ) ใซ็ฌฌ 1ไธญ้่่ 6ใ่ฟฝๅ ใใๆงๆใงใใฃใฆใใใใ ็ฃๆฅญไธใฎๅฉ็จๅฏ่ฝๆง T i 0 2 film 2 0 0 nm on a surface of a transparent glass, S i 0 2 film successively deposited 2 0 nm, A 1 2 0 3 film 5 O nm on the back surface of the transparent glass, 1 chome ใ film 2 0 An antifogging element in which 0 11 111 is sequentially formed. The refractive index, S i 0 2 is 1. 4 6, T i O 2 is 2.3 5, glass 1. 5 2, A 1 2 0 3 force 1. 6 7, ITO is 2.0 6 It is. As shown in FIG. 10, it was found that the presence of the second intermediate thin film increased the transmittance in the visible light region and prevented reflection on the conductive thin film (see B11). ). The present invention is not limited to the first to fourth embodiments. For example, a configuration in which a second intermediate thin film 7 is added to the second embodiment (FIG. 2A), a third embodiment (FIG. 2 (b)) in which at least one of first intermediate thin film 6 and second intermediate thin film 7 is added. First intermediate thin film 6 is added in the fourth embodiment (FIG. 2 (c)). The configuration may be as follows. Industrial applicability
ใใฎ็ฌฌ 1ใฎ็บๆใซใใใฐใ ่ฆชๆฐดๆง่่ใซใใใ ้ๆๅบๆฟ้จๆใฎ่กจ้ขๅด ใซไป็ใใๆฐดๆปดใ่ธ็บใใ ๆใใฎ็บ็ใ้ฒๆญขใใใใ ใพใใ ่ฆชๆฐดๆง่่ ใฎๅ
่งฆๅชๅๅฟ็ฉ่ณชใซใใใ ่ฆชๆฐดๆง่่ใฎ่ฆชๆฐดๆงใไฝไธใใใ ้ฒๆๆงใ็ถญ ๆใใใใ ใพใใ ๅฐ้ปๆง่่ใซใ ใใ ้ๆๅบๆฟ้จๆใฎ่ฃ้ขๅดใซไป็ใใ ๆฐดๆปดใ่ธ็บใใ ๆใใฎ็บ็ใ้ฒๆญขใใใใ ใใฎ็ตๆใ ๅชใใ้ฒๆๆงใ่ฆ ๆฑใใใใซใกใฉ็จใใผใใฌใฉในใซไปฃ่กจใใใ้ฒๆ็ด ๅญใซ้ฉ็จใใใใจใ ใงใใใ ใพใใ ๅๅฐ้ฒๆญข่่ใซใ ใใ ๅฑๆ็ใฎๅทฎใใ็ใใๅฐ้ปๆง่่ ใงใฎๅๅฐใๆๅถใใใ ้ฒๆ็ด ๅญใ้้ใใ็ปๅใซๅฐ้ปๆง่่ใฎๅๅฐๅใ ๅใ ใใใใจใใชใใชใใ ่ฏๅฅฝใช็ปๅใ่ฆๆฑใใใใซใกใฉ็จใใผใใฌใฉ ในใซไปฃ่กจใใใ้ฒๆ็ด ๅญใซ้ฉ็จใใใใจใใงใใใ ใ ใใซใ ๅฐ้ปๆง่่ ใใใณๅๅฐ้ฒๆญข่่ใฎ่ไน
ๆงใ่ๆ
ฎใใๅฟ
่ฆใใชใใใจใซใใใ ๆงๆๆ ๆใฎๅถ้ใใชใใชใใ ไฝใใณใน ใใ่ฆๆฑใใใใซใกใฉ็จใใผใใฌใฉในใซ ไปฃ่กจใใใ้ฒๆ็ด ๅญใซ้ฉ็จใใใ ใจใใงใใใ ใพใใ ใใฎ็ฌฌ 2ใฎ็บๆใซใใใฐใ ็ฌฌ 1 ไธญ้่่ใซใ ใใ ๅฑๆ็ใฎๅทฎใ
ใ็ใใ่ฆชๆฐดๆง่่ใงใฎๅๅฐใๆๅถใใใ ้ฒๆ็ด ๅญใ้้ใใ็ปๅใซ่ฆช ๆฐดๆง่่ใฎๅๅฐๅใๅใ ใใใใจใใชใใชใใ ่ฏๅฅฝใช็ปๅใ่ฆๆฑใใใ ใซใกใฉ็จใใผใใฌใฉในใซไปฃ่กจใใใ้ฒๆ็ด ๅญใซ้ฉ็จใใใใจใใงใใใ ใพใใ ใใฎ็ฌฌ 3ใฎ็บๆใซใใใฑใ ๅๅฐ้ฒๆญข่่ใฎ็ฉๅฑคๆง้ ใซใ ใใ ๅฏ ่ฆๅ
็ท้ ๅใฎๅๅฐ้ฒๆญขๅนๆใๅคงใใ ใชใใ ้ฒๆ็ด ๅญใ้้ใใ็ปๅใ็พ ๅฎใฎ็ปๅใซ่ฟใใชใใ ใใฎ็ตๆใ ่ฏๅฅฝใช็ปๅใ่ฆๆฑใใใใซใกใฉ็จใใผ ใใฌใฉในใซไปฃ่กจใใใ้ฒๆ็ด ๅญใซ้ฉ็จใใใใจใใงใใใ ใพใใ ใใฎ็ฌฌ 4ใฎ็บๆใซใใใฐใ ็ฌฌ 2ไธญ้่่ใซใ ใใ ๅฑๆ็ใฎๅทฎใ ใ็ใใๅฐ้ปๆง่่ใฎๅๅฐใๆ jใใใ ้ฒๆ็ด ๅญใ้้ใใ็ปๅใซๅฐ้ป ๆง่่ใฎๅๅฐๅใๅใ ใใใใจใใชใใชใใ ่ฏๅฅฝใช็ปๅใ่ฆๆฑใใใๅ ใกใฉ็จใใผใใฌใฉในใซไปฃ่กจใใใ้ฒๆ็ด ๅญใซ้ฉ็จใใใใจใใงใใใ
According to the first aspect, the hydrophilic thin film evaporates water droplets adhered to the surface side of the transparent substrate member, thereby preventing clouding. Further, the photocatalytic reaction substance of the hydrophilic thin film does not decrease the hydrophilicity of the hydrophilic thin film, and maintains the anti-fogging property. In addition, the conductive thin film prevents water droplets adhering to the back surface of the transparent substrate member from evaporating, thereby preventing fogging. As a result, the present invention can be applied to an anti-fog element typified by a hood glass for a camera which requires excellent anti-fog properties. In addition, the anti-reflection thin film suppresses reflection at the conductive thin film caused by a difference in refractive index, and prevents a reflected image of the conductive thin film from being reflected on an image transmitted through the anti-fog element, thereby providing a good image. It can be applied to anti-fog elements such as required camera hood glass. Furthermore, since there is no need to consider the durability of the conductive thin film and anti-reflective thin film, there are no restrictions on the constituent materials, and the anti-fog element represented by camera hood glass, which requires low cost, is required. Can be applied. Further, according to the second invention, the difference in the refractive index can be reduced by the first intermediate thin film. Reflection of the hydrophilic thin film that occurs is suppressed, and the reflected image of the hydrophilic thin film does not appear in the image transmitted through the anti-fog element, and a good image is required. It can be applied to devices. According to the third aspect of the present invention, the laminated structure of the anti-reflection thin film enhances the anti-reflection effect in the visible ray region, and the image transmitted through the anti-fog element becomes closer to the real image. As a result, the present invention can be applied to an anti-fog element typified by a camera hood glass requiring a good image. According to the fourth aspect, the reflection of the conductive thin film caused by the difference in the refractive index is suppressed by the second intermediate thin film, and the reflected image of the conductive thin film is displayed on the image transmitted through the anti-fog element. This can be applied to an anti-fog element typified by a hood glass for a camera that requires no good image.
Claims
1 . ้ๆๅบๆฟ้จๆใจใ 1. A transparent substrate member,
ๅ่จ้ๆๅบๆฟ้จๆใฎ่กจ้ขๅดใซ่จญใใใใ ๅ
่งฆๅชๅๅฟ็ฉ่ณชใใใณ่ฆชๆฐดๆง ็ฉ่ณชใๅซใ้ๆใช่ฆชๆฐดๆง่่ใจใ ย A transparent hydrophilic thin film provided on the surface side of the transparent substrate member and containing a photocatalytic reactant and a hydrophilic substance;
ๅ่จ้ๆๅบๆฟ้จๆใฎ่ฃ้ขๅดใซ่จญใใใใ ๅฐ้ปๆง็ฉ่ณชใๅซใ้ๆใชๅฐ้ป ๆง่่ใจใ ย A transparent conductive thin film provided on the back side of the transparent substrate member and containing a conductive substance;
ๅ่จๅฐ้ปๆง่่ใฎใใใซ่ฃ้ขๅดใซ่จญใใใใ ไฝๅฑๆ็็ฉ่ณชใๅซใ้ๆ ใชๅๅฐ้ฒๆญข่่ใจใๆใใใใจใ็นๅพดใจใใ้ฒๆ็ด ๅญใ ย An anti-fog element comprising: a transparent anti-reflection thin film further provided on the back side of the conductive thin film and containing a low refractive index substance.
2 . ๅ่จ้ๆๅบๆฟ้จๆใจๅ่จ่ฆชๆฐดๆง่่ใฎ้ใซ้ๆใช็ฌฌ 1ไธญ้่่ใ ่จญใใใใ ใใฎ็ฌฌ 1ไธญ้่่ใฎๅฑๆ็ใใ ๅ่จ่ฆชๆฐดๆง่่ใฎๅฑๆ็ใจๅ ่จ้ๆๅบๆฟ้จๆใฎๅฑๆ็ใฎไธญ้ใฎๅคใๆใใใใจใ็นๅพดใจใใ่ซๆฑใฎ็ฏ ๅฒ็ฌฌ 1้
ใซ่จ่ผใฎ้ฒๆ็ด ๅญใ ย 2. A transparent first intermediate thin film is provided between the transparent substrate member and the hydrophilic thin film, and the refractive index of the first intermediate thin film is determined by the refractive index of the hydrophilic thin film and the refractive index of the transparent substrate member. The anti-fogging element according to claim 1, wherein the anti-fogging element has an intermediate value of the following.
3 . ๅ่จๅๅฐ้ฒๆญข่่ใ 2ใคไปฅไธใฎ่่ใ็ฉๅฑคใใ็ฉๅฑคๆง้ ใๆใใ ใใฎใงใใใใจใ็นๅพดใจใใ่ซๆฑใฎ็ฏๅฒ็ฌฌ 1้
ใซ่จ่ผใฎ้ฒๆ็ด ๅญใ ย 3. The anti-fogging element according to claim 1, wherein the anti-reflection thin film has a laminated structure in which two or more thin films are laminated.
4 . ้ๆๅบๆฟ้จๆใจใ 4. A transparent substrate member,
ๅ่จ้ๆๅบๆฟ้จๆใฎ่กจ้ขๅดใซ่จญใใใใ ๅ
่งฆๅชๅๅฟ็ฉ่ณชใใใณ่ฆชๆฐดๆง ็ฉ่ณชใๅซใ้ๆใช่ฆชๆฐดๆง่่ใจใ ย A transparent hydrophilic thin film provided on the surface side of the transparent substrate member and containing a photocatalytic reactant and a hydrophilic substance;
ๅ่จ้ๆๅบๆฟ้จๆใฎ่ฃ้ขๅดใซ่จญใใใใ้ๆใช็ฌฌ 2ไธญ้่่ใจใ ๅ่จ็ฌฌ 2ไธญ้่่ใฎใใใซ่ฃ้ขๅดใซ่จญใใใใ ๅฐ้ปๆง็ฉ่ณชใๅซใ้ๆ ใชๅฐ้ปๆง่่ใจใๆใใ ย A transparent second intermediate thin film provided on the back side of the transparent substrate member, and a transparent conductive thin film further provided on the back side of the second intermediate thin film and containing a conductive substance,
ๅ่จ็ฌฌ 2ไธญ้่่ใฎๅฑๆ็ใใ ๅ่จ้ๆๅบๆฟ้จๆใฎๅฑๆ็ใจๅ่จๅฐ้ป ๆง่่ใฎๅฑๆ็ใฎไธญ้ใฎๅคใๆใใใใจใ็นๅพดใจใใ้ฒๆ็ด ๅญใ
ย The anti-fogging element, wherein a refractive index of the second intermediate thin film has an intermediate value between a refractive index of the transparent substrate member and a refractive index of the conductive thin film.
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CN103443663A (en) * | 2011-03-25 | 2013-12-11 | Hoyaๆ ชๅผไผ็คพ | Plastic lens |
CN108419005A (en) * | 2018-05-15 | 2018-08-17 | ๆทฑๅณไบ่กๆบ่ฝ็งๆๆ้ๅ ฌๅธ | Antifog photographic device and vending equipment based on graphene heating |
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US4957358A (en) * | 1988-01-19 | 1990-09-18 | Canon Kabushiki Kaisha | Antifogging film and optical element using the same |
US5854708A (en) * | 1996-07-26 | 1998-12-29 | Murakami Corporation | Anti-fog element |
US20020187371A1 (en) * | 1999-03-23 | 2002-12-12 | Tatsuji Nakajima | Process for producing laminated film and reflection reducing film |
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US4957358A (en) * | 1988-01-19 | 1990-09-18 | Canon Kabushiki Kaisha | Antifogging film and optical element using the same |
US5854708A (en) * | 1996-07-26 | 1998-12-29 | Murakami Corporation | Anti-fog element |
US20020187371A1 (en) * | 1999-03-23 | 2002-12-12 | Tatsuji Nakajima | Process for producing laminated film and reflection reducing film |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103443663A (en) * | 2011-03-25 | 2013-12-11 | Hoyaๆ ชๅผไผ็คพ | Plastic lens |
US9022585B2 (en) | 2011-03-25 | 2015-05-05 | Hoya Corporation | Plastic lens |
CN108419005A (en) * | 2018-05-15 | 2018-08-17 | ๆทฑๅณไบ่กๆบ่ฝ็งๆๆ้ๅ ฌๅธ | Antifog photographic device and vending equipment based on graphene heating |
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