WO2005064404A1 - Replacement apparatus for an optical element - Google Patents
Replacement apparatus for an optical element Download PDFInfo
- Publication number
- WO2005064404A1 WO2005064404A1 PCT/EP2004/013576 EP2004013576W WO2005064404A1 WO 2005064404 A1 WO2005064404 A1 WO 2005064404A1 EP 2004013576 W EP2004013576 W EP 2004013576W WO 2005064404 A1 WO2005064404 A1 WO 2005064404A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- optical element
- replacement apparatus
- lithography objective
- holder
- lithography
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 125
- 238000001459 lithography Methods 0.000 claims abstract description 75
- 239000000463 material Substances 0.000 claims description 5
- 210000001747 pupil Anatomy 0.000 claims description 3
- 239000011343 solid material Substances 0.000 claims description 3
- 238000004026 adhesive bonding Methods 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 229920000136 polysorbate Polymers 0.000 abstract description 2
- 238000003384 imaging method Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 125000006850 spacer group Chemical group 0.000 description 3
- 239000000126 substance Substances 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229920002449 FKM Polymers 0.000 description 1
- 229910000760 Hardened steel Inorganic materials 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- 229910052729 chemical element Inorganic materials 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000010437 gem Substances 0.000 description 1
- 229910001751 gemstone Inorganic materials 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000010979 ruby Substances 0.000 description 1
- 229910001750 ruby Inorganic materials 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
- G02B7/023—Mountings, adjusting means, or light-tight connections, for optical elements for lenses permitting adjustment
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
- G02B7/14—Mountings, adjusting means, or light-tight connections, for optical elements for lenses adapted to interchange lenses
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Toxicology (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Lens Barrels (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020067012405A KR101116999B1 (en) | 2003-12-23 | 2004-11-30 | Replacement apparatus for an optical element |
DE602004016048T DE602004016048D1 (en) | 2003-12-23 | 2004-11-30 | LITHOGRAPHY OBJECTIVE WITH EXCHANGE DEVICE FOR AN OPTICAL ELEMENT AND METHOD OF MANUFACTURE THROUGH THIS LITHOGRAPHY LENS |
JP2006545958A JP4750043B2 (en) | 2003-12-23 | 2004-11-30 | Exchange device for optical elements |
EP04820811A EP1700167B1 (en) | 2003-12-23 | 2004-11-30 | Lithography objective with replacement apparatus for an optical element and manufacturing method using the lithography objective |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10361441.9 | 2003-12-23 | ||
DE10361441 | 2003-12-23 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2005064404A1 true WO2005064404A1 (en) | 2005-07-14 |
Family
ID=34673078
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2004/013576 WO2005064404A1 (en) | 2003-12-23 | 2004-11-30 | Replacement apparatus for an optical element |
Country Status (8)
Country | Link |
---|---|
US (8) | US7265917B2 (en) |
EP (1) | EP1700167B1 (en) |
JP (1) | JP4750043B2 (en) |
KR (1) | KR101116999B1 (en) |
CN (2) | CN101614967B (en) |
AT (1) | ATE405866T1 (en) |
DE (1) | DE602004016048D1 (en) |
WO (1) | WO2005064404A1 (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102005060622A1 (en) * | 2005-12-19 | 2007-04-19 | Carl Zeiss Smt Ag | Assembly device for projection objective in semiconductor fabrication lithography, has lifting device and setting angle for positioning structural parts |
JP2007208257A (en) * | 2006-01-30 | 2007-08-16 | Asml Netherlands Bv | Lithography apparatus, method of manufacturing device, and exchangeable optical element |
WO2008064859A2 (en) * | 2006-12-01 | 2008-06-05 | Carl Zeiss Smt Ag | Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations |
DE102008032853A1 (en) * | 2008-07-14 | 2010-01-21 | Carl Zeiss Smt Ag | Optical device with a deformable optical element |
US8605253B2 (en) | 2006-07-03 | 2013-12-10 | Carl Zeiss Smt Gmbh | Lithographic projection objective |
Families Citing this family (21)
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---|---|---|---|---|
EP1695148B1 (en) * | 2003-11-24 | 2015-10-28 | Carl Zeiss SMT GmbH | Immersion objective |
US7265917B2 (en) * | 2003-12-23 | 2007-09-04 | Carl Zeiss Smt Ag | Replacement apparatus for an optical element |
US7986472B2 (en) * | 2005-05-31 | 2011-07-26 | Carl Zeiss SMT, AG. | Optical element module |
EP1922586B1 (en) | 2005-08-23 | 2016-05-11 | Carl Zeiss SMT GmbH | Replacement device for an optical element |
DE102006038455A1 (en) * | 2006-08-16 | 2008-02-21 | Carl Zeiss Smt Ag | Optical system for semiconductor lithography, has adjusting unit positioning optical component, where contact points of adjusting unit at optical component is selected, such that no moments develop at optical component |
DE102006046675A1 (en) * | 2006-09-29 | 2008-04-03 | Carl Zeiss Smt Ag | Micro-lithographic projection illumination system for manufacturing e.g. highly integrated electrical circuit, has correction device including correction unit that is attached and demounted in objective without dismantling objective |
DE102006050835A1 (en) * | 2006-10-27 | 2008-05-08 | Carl Zeiss Smt Ag | Method and device for exchanging object parts |
DE102007009867A1 (en) * | 2007-02-28 | 2008-09-11 | Carl Zeiss Smt Ag | Imaging device with interchangeable diaphragms and method for this |
DE102008000790A1 (en) | 2007-03-20 | 2008-09-25 | Carl Zeiss Smt Ag | A method for improving imaging properties of an optical system and such an optical system |
JP5063224B2 (en) * | 2007-07-03 | 2012-10-31 | キヤノン株式会社 | Projection lens and image projection apparatus |
EP2287647A4 (en) * | 2008-06-17 | 2012-07-11 | Konica Minolta Opto Inc | Lens drive device and camera unit |
JP2010097986A (en) * | 2008-10-14 | 2010-04-30 | Nikon Corp | Projection optical system, exposure apparatus, and device manufacturing method |
JP6182071B2 (en) | 2010-12-10 | 2017-08-16 | スリーエム イノベイティブ プロパティズ カンパニー | Glazing articles that reduce glare |
NL2007392C2 (en) | 2011-09-12 | 2013-03-13 | Mapper Lithography Ip Bv | Assembly for providing an aligned stack of two or more modules and a lithography system or a microscopy system comprising such an assembly. |
JP6731850B2 (en) | 2013-09-02 | 2020-07-29 | オキュスペクト オサケ ユキチュア | Threshold inspection and determination |
USD734471S1 (en) * | 2013-09-02 | 2015-07-14 | Ocuspecto Oy | Eye testing apparatus |
USD738510S1 (en) * | 2014-10-02 | 2015-09-08 | Carl Zeiss Meditec, Inc. | Ophthalmic device |
CN105467548B (en) * | 2015-12-04 | 2018-05-01 | 中国科学院长春光学精密机械与物理研究所 | The replaceable lithographic objective frame of the eyeglass of high position precision |
US10811044B2 (en) * | 2018-07-19 | 2020-10-20 | Western Digital Technologies, Inc. | In-pivot stepper motor for ball screw cam elevator mechanism for cold storage data storage device |
US11031037B1 (en) | 2020-06-12 | 2021-06-08 | Western Digital Technologies, Inc. | System for disk-to-disk access for reduced-head data storage device |
CN114994852B (en) * | 2022-06-21 | 2024-03-26 | 云从科技集团股份有限公司 | Lens mounting structure, camera and sales counter |
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2007
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2009
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2010
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2011
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2013
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US8159648B2 (en) | 2006-01-30 | 2012-04-17 | Carl Zeiss Smt Gmbh | Method and device for the correction of imaging defects |
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US9217936B2 (en) | 2008-07-14 | 2015-12-22 | Carl Zeiss Smt Gmbh | Optical device having a deformable optical element |
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US9798243B2 (en) | 2008-07-14 | 2017-10-24 | Carl Zeiss Smt Gmbh | Optical device having a deformable optical element |
Also Published As
Publication number | Publication date |
---|---|
ATE405866T1 (en) | 2008-09-15 |
CN1898610A (en) | 2007-01-17 |
US7265917B2 (en) | 2007-09-04 |
EP1700167B1 (en) | 2008-08-20 |
US8488261B2 (en) | 2013-07-16 |
US20160041475A1 (en) | 2016-02-11 |
US8902519B2 (en) | 2014-12-02 |
JP2007515797A (en) | 2007-06-14 |
CN101614967A (en) | 2009-12-30 |
EP1700167A1 (en) | 2006-09-13 |
US20130279029A1 (en) | 2013-10-24 |
KR101116999B1 (en) | 2012-03-15 |
US20070297074A1 (en) | 2007-12-27 |
US20050134972A1 (en) | 2005-06-23 |
US20110255181A1 (en) | 2011-10-20 |
US20150070789A1 (en) | 2015-03-12 |
CN100545754C (en) | 2009-09-30 |
US9081296B2 (en) | 2015-07-14 |
US7515363B2 (en) | 2009-04-07 |
US7995296B2 (en) | 2011-08-09 |
US7768723B2 (en) | 2010-08-03 |
JP4750043B2 (en) | 2011-08-17 |
US20100271716A1 (en) | 2010-10-28 |
CN101614967B (en) | 2011-11-30 |
KR20060111597A (en) | 2006-10-27 |
US20090168207A1 (en) | 2009-07-02 |
DE602004016048D1 (en) | 2008-10-02 |
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