WO2005064405A3 - Lithographic apparatus and device manufacturing method - Google Patents
Lithographic apparatus and device manufacturing method Download PDFInfo
- Publication number
- WO2005064405A3 WO2005064405A3 PCT/EP2004/014282 EP2004014282W WO2005064405A3 WO 2005064405 A3 WO2005064405 A3 WO 2005064405A3 EP 2004014282 W EP2004014282 W EP 2004014282W WO 2005064405 A3 WO2005064405 A3 WO 2005064405A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- device manufacturing
- lithographic apparatus
- barrier member
- substrate
- space
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
Abstract
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006545996A JP4157146B2 (en) | 2003-12-23 | 2004-12-15 | Lithographic apparatus and device manufacturing method |
EP17181223.3A EP3287848B1 (en) | 2003-12-23 | 2004-12-15 | Lithographic apparatus |
EP04803901A EP1697799A2 (en) | 2003-12-23 | 2004-12-15 | Lithographic apparatus and device manufacturing method |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/743,271 | 2003-12-23 | ||
US10/743,271 US7394521B2 (en) | 2003-12-23 | 2003-12-23 | Lithographic apparatus and device manufacturing method |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2005064405A2 WO2005064405A2 (en) | 2005-07-14 |
WO2005064405A3 true WO2005064405A3 (en) | 2006-03-09 |
Family
ID=34678626
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2004/014282 WO2005064405A2 (en) | 2003-12-23 | 2004-12-15 | Lithographic apparatus and device manufacturing method |
Country Status (7)
Country | Link |
---|---|
US (2) | US7394521B2 (en) |
EP (3) | EP2259139B1 (en) |
JP (2) | JP4157146B2 (en) |
KR (1) | KR100855337B1 (en) |
CN (2) | CN100507721C (en) |
TW (1) | TWI261151B (en) |
WO (1) | WO2005064405A2 (en) |
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EP2136250A1 (en) | 2008-06-18 | 2009-12-23 | ASML Netherlands B.V. | Lithographic apparatus and method |
NL2002983A1 (en) | 2008-06-26 | 2009-12-29 | Asml Netherlands Bv | A lithographic apparatus and a method of operating the lithographic apparatus. |
JP4922359B2 (en) | 2008-07-25 | 2012-04-25 | エーエスエムエル ネザーランズ ビー.ブイ. | Fluid handling structure, lithographic apparatus, and device manufacturing method |
NL2003111A1 (en) | 2008-07-25 | 2010-01-26 | Asml Netherlands Bv | Method of designing sets or mask patterns, sets of mask patterns, and device manufacturing method. |
NL2003226A (en) | 2008-08-19 | 2010-03-09 | Asml Netherlands Bv | Lithographic apparatus, drying device, metrology apparatus and device manufacturing method. |
SG159467A1 (en) * | 2008-09-02 | 2010-03-30 | Asml Netherlands Bv | Fluid handling structure, lithographic apparatus and device manufacturing method |
NL2003363A (en) | 2008-09-10 | 2010-03-15 | Asml Netherlands Bv | Lithographic apparatus, method of manufacturing an article for a lithographic apparatus and device manufacturing method. |
NL2003392A (en) | 2008-09-17 | 2010-03-18 | Asml Netherlands Bv | Lithographic apparatus and a method of operating the apparatus. |
NL2003362A (en) | 2008-10-16 | 2010-04-19 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
NL2003333A (en) | 2008-10-23 | 2010-04-26 | Asml Netherlands Bv | Fluid handling structure, lithographic apparatus and device manufacturing method. |
NL2003575A (en) | 2008-10-29 | 2010-05-03 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
NL2003638A (en) | 2008-12-03 | 2010-06-07 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
NL2003758A (en) | 2008-12-04 | 2010-06-07 | Asml Netherlands Bv | A member with a cleaning surface and a method of removing contamination. |
TWI438577B (en) | 2008-12-08 | 2014-05-21 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
EP2196857A3 (en) * | 2008-12-09 | 2010-07-21 | ASML Netherlands BV | Lithographic apparatus and device manufacturing method |
JP5001343B2 (en) | 2008-12-11 | 2012-08-15 | エーエスエムエル ネザーランズ ビー.ブイ. | Fluid extraction system, immersion lithographic apparatus, and method for reducing pressure fluctuations of an immersion liquid used in an immersion lithographic apparatus |
EP2221669A3 (en) | 2009-02-19 | 2011-02-09 | ASML Netherlands B.V. | A lithographic apparatus, a method of controlling the apparatus and a device manufacturing method |
NL2004305A (en) | 2009-03-13 | 2010-09-14 | Asml Netherlands Bv | Substrate table, immersion lithographic apparatus and device manufacturing method. |
JP2010251745A (en) | 2009-04-10 | 2010-11-04 | Asml Netherlands Bv | Immersion lithography device and device manufacturing method |
NL2004362A (en) | 2009-04-10 | 2010-10-12 | Asml Netherlands Bv | A fluid handling device, an immersion lithographic apparatus and a device manufacturing method. |
NL2004497A (en) | 2009-05-01 | 2010-11-02 | Asml Netherlands Bv | Lithographic apparatus and a method of operating the apparatus. |
NL2004523A (en) | 2009-05-08 | 2010-11-09 | Asml Netherlands Bv | Immersion lithographic apparatus and device manufacturing method. |
NL2004540A (en) | 2009-05-14 | 2010-11-18 | Asml Netherlands Bv | Lithographic apparatus and a method of operating the apparatus. |
NL2004547A (en) | 2009-05-14 | 2010-11-18 | Asml Netherlands Bv | An immersion lithographic apparatus and a device manufacturing method. |
SG166747A1 (en) | 2009-05-26 | 2010-12-29 | Asml Netherlands Bv | Fluid handling structure, lithographic apparatus and device manufacturing method |
JP5016705B2 (en) | 2009-06-09 | 2012-09-05 | エーエスエムエル ネザーランズ ビー.ブイ. | Fluid handling structure |
EP2264529A3 (en) | 2009-06-16 | 2011-02-09 | ASML Netherlands B.V. | A lithographic apparatus, a method of controlling the apparatus and a method of manufacturing a device using a lithographic apparatus |
EP2264528A1 (en) | 2009-06-19 | 2010-12-22 | ASML Netherlands B.V. | Sensor and lithographic apparatus |
JP5058305B2 (en) | 2009-06-19 | 2012-10-24 | エーエスエムエル ネザーランズ ビー.ブイ. | Immersion lithographic apparatus, liquid confinement structure, final element of a projection system for an immersion lithographic apparatus, and substrate table |
NL2004808A (en) | 2009-06-30 | 2011-01-12 | Asml Netherlands Bv | Fluid handling structure, lithographic apparatus and device manufacturing method. |
NL2004807A (en) | 2009-06-30 | 2011-01-04 | Asml Netherlands Bv | Substrate table for a lithographic apparatus, litographic apparatus, method of using a substrate table and device manufacturing method. |
NL2004820A (en) | 2009-06-30 | 2011-01-04 | Asml Netherlands Bv | Lithographic apparatus and a method of measuring flow rate in a two phase flow. |
NL2004980A (en) | 2009-07-13 | 2011-01-17 | Asml Netherlands Bv | Heat transfers assembly, lithographic apparatus and manufacturing method. |
NL2005009A (en) * | 2009-07-27 | 2011-01-31 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
NL2005322A (en) | 2009-09-11 | 2011-03-14 | Asml Netherlands Bv | A shutter member, a lithographic apparatus and device manufacturing method. |
NL2005120A (en) | 2009-09-21 | 2011-03-22 | Asml Netherlands Bv | Lithographic apparatus, coverplate and device manufacturing method. |
NL2005089A (en) | 2009-09-23 | 2011-03-28 | Asml Netherlands Bv | FLUID HANDLING STRUCTURE, LITHOGRAPHIC EQUIPMENT AND DEVICE MANUFACTURING METHOD. |
NL2005208A (en) * | 2009-09-28 | 2011-03-29 | Asml Netherlands Bv | Heat pipe, lithographic apparatus and device manufacturing method. |
NL2005167A (en) | 2009-10-02 | 2011-04-05 | Asml Netherlands Bv | Lithographic apparatus and a method of operating the apparatus. |
NL2005478A (en) | 2009-11-17 | 2011-05-18 | Asml Netherlands Bv | Lithographic apparatus, removable member and device manufacturing method. |
NL2005479A (en) | 2009-11-17 | 2011-05-18 | Asml Netherlands Bv | Lithographic apparatus, removable member and device manufacturing method. |
NL2005610A (en) | 2009-12-02 | 2011-06-06 | Asml Netherlands Bv | Lithographic apparatus and surface cleaning method. |
NL2005528A (en) | 2009-12-02 | 2011-06-07 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
NL2005657A (en) | 2009-12-03 | 2011-06-06 | Asml Netherlands Bv | A lithographic apparatus and a method of forming a lyophobic coating on a surface. |
NL2005717A (en) | 2009-12-18 | 2011-06-21 | Asml Netherlands Bv | A lithographic apparatus and a device manufacturing method. |
WO2011090690A1 (en) * | 2009-12-28 | 2011-07-28 | Pioneer Hi-Bred International, Inc. | Sorghum fertility restorer genotypes and methods of marker-assisted selection |
NL2005874A (en) | 2010-01-22 | 2011-07-25 | Asml Netherlands Bv | A lithographic apparatus and a device manufacturing method. |
NL2005951A (en) | 2010-02-02 | 2011-08-03 | Asml Netherlands Bv | Lithographic apparatus and a device manufacturing method. |
NL2006054A (en) | 2010-02-09 | 2011-08-10 | Asml Netherlands Bv | Fluid handling structure, lithographic apparatus and device manufacturing method. |
NL2005974A (en) | 2010-02-12 | 2011-08-15 | Asml Netherlands Bv | Lithographic apparatus and a device manufacturing method. |
NL2006076A (en) | 2010-03-04 | 2011-09-06 | Asml Netherlands Bv | A lithographic apparatus and a method of manufacturing a device using a lithographic apparatus. |
EP2365390A3 (en) | 2010-03-12 | 2017-10-04 | ASML Netherlands B.V. | Lithographic apparatus and method |
NL2006244A (en) | 2010-03-16 | 2011-09-19 | Asml Netherlands Bv | Lithographic apparatus, cover for use in a lithographic apparatus and method for designing a cover for use in a lithographic apparatus. |
NL2006243A (en) | 2010-03-19 | 2011-09-20 | Asml Netherlands Bv | A lithographic apparatus, an illumination system, a projection system and a method of manufacturing a device using a lithographic apparatus. |
NL2006389A (en) | 2010-04-15 | 2011-10-18 | Asml Netherlands Bv | Fluid handling structure, lithographic apparatus and a device manufacturing method. |
NL2006272A (en) | 2010-05-04 | 2011-11-07 | Asml Netherlands Bv | A fluid handling structure, a lithographic apparatus and a device manufacturing method. |
NL2006615A (en) | 2010-05-11 | 2011-11-14 | Asml Netherlands Bv | Fluid handling structure, lithographic apparatus and device manufacturing method. |
JP5313293B2 (en) | 2010-05-19 | 2013-10-09 | エーエスエムエル ネザーランズ ビー.ブイ. | Lithographic apparatus, fluid handling structure used in lithographic apparatus, and device manufacturing method |
NL2006648A (en) | 2010-06-01 | 2011-12-06 | Asml Netherlands Bv | A fluid supply system, a lithographic apparatus, a method of varying fluid flow rate and a device manufacturing method. |
NL2006818A (en) | 2010-07-02 | 2012-01-03 | Asml Netherlands Bv | A method of adjusting speed and/or routing of a table movement plan and a lithographic apparatus. |
NL2006913A (en) | 2010-07-16 | 2012-01-17 | Asml Netherlands Bv | Lithographic apparatus and method. |
EP2423749B1 (en) | 2010-08-24 | 2013-09-11 | ASML Netherlands BV | A lithographic apparatus and device manufacturing method |
NL2008183A (en) | 2011-02-25 | 2012-08-28 | Asml Netherlands Bv | A lithographic apparatus, a method of controlling the apparatus and a device manufacturing method. |
NL2008751A (en) | 2011-06-06 | 2012-12-10 | Asml Netherlands Bv | Temperature sensing probe, burl plate, lithographic apparatus and method. |
US20130169944A1 (en) * | 2011-12-28 | 2013-07-04 | Nikon Corporation | Exposure apparatus, exposure method, device manufacturing method, program, and recording medium |
CN105527797B (en) * | 2014-09-28 | 2018-05-04 | 上海微电子装备(集团)股份有限公司 | Immersion fluid system and its supply control method |
CN111381448B (en) * | 2018-12-28 | 2021-05-25 | 上海微电子装备(集团)股份有限公司 | Liquid control system and method for immersion lithography apparatus |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1999049504A1 (en) * | 1998-03-26 | 1999-09-30 | Nikon Corporation | Projection exposure method and system |
Family Cites Families (148)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE224448C (en) | ||||
DE242880C (en) | ||||
DE206607C (en) | ||||
DE221563C (en) | ||||
GB1242527A (en) | 1967-10-20 | 1971-08-11 | Kodak Ltd | Optical instruments |
US3573975A (en) | 1968-07-10 | 1971-04-06 | Ibm | Photochemical fabrication process |
ATE1462T1 (en) | 1979-07-27 | 1982-08-15 | Werner W. Dr. Tabarelli | OPTICAL LITHOGRAPHY PROCESS AND DEVICE FOR COPYING A PATTERN ONTO A SEMICONDUCTOR DISC. |
FR2474708B1 (en) | 1980-01-24 | 1987-02-20 | Dme | HIGH-RESOLUTION MICROPHOTOLITHOGRAPHY PROCESS |
JPS5754317A (en) | 1980-09-19 | 1982-03-31 | Hitachi Ltd | Method and device for forming pattern |
US4509852A (en) * | 1980-10-06 | 1985-04-09 | Werner Tabarelli | Apparatus for the photolithographic manufacture of integrated circuit elements |
US4346164A (en) | 1980-10-06 | 1982-08-24 | Werner Tabarelli | Photolithographic method for the manufacture of integrated circuits |
US4390273A (en) | 1981-02-17 | 1983-06-28 | Censor Patent-Und Versuchsanstalt | Projection mask as well as a method and apparatus for the embedding thereof and projection printing system |
JPS57153433A (en) | 1981-03-18 | 1982-09-22 | Hitachi Ltd | Manufacturing device for semiconductor |
JPS58202448A (en) | 1982-05-21 | 1983-11-25 | Hitachi Ltd | Exposing device |
JPS5919912A (en) | 1982-07-26 | 1984-02-01 | Hitachi Ltd | Immersion distance holding device |
JPH0747157B2 (en) | 1985-02-15 | 1995-05-24 | 株式会社日立製作所 | Ultrapure water production system |
JPS6265326A (en) | 1985-09-18 | 1987-03-24 | Hitachi Ltd | Exposure device |
JPS62121417A (en) | 1985-11-22 | 1987-06-02 | Hitachi Ltd | Liquid-immersion objective lens device |
JPS63157419A (en) | 1986-12-22 | 1988-06-30 | Toshiba Corp | Fine pattern transfer apparatus |
US5040020A (en) | 1988-03-31 | 1991-08-13 | Cornell Research Foundation, Inc. | Self-aligned, high resolution resonant dielectric lithography |
JPH03209479A (en) | 1989-09-06 | 1991-09-12 | Sanee Giken Kk | Exposure method |
US5121256A (en) | 1991-03-14 | 1992-06-09 | The Board Of Trustees Of The Leland Stanford Junior University | Lithography system employing a solid immersion lens |
JPH04305915A (en) | 1991-04-02 | 1992-10-28 | Nikon Corp | Adhesion type exposure device |
JPH04305917A (en) | 1991-04-02 | 1992-10-28 | Nikon Corp | Adhesion type exposure device |
JPH0562877A (en) | 1991-09-02 | 1993-03-12 | Yasuko Shinohara | Optical system for lsi manufacturing contraction projection aligner by light |
JPH05304072A (en) | 1992-04-08 | 1993-11-16 | Nec Corp | Manufacture of semiconductor device |
JPH06124873A (en) | 1992-10-09 | 1994-05-06 | Canon Inc | Liquid-soaking type projection exposure apparatus |
JP2753930B2 (en) | 1992-11-27 | 1998-05-20 | キヤノン株式会社 | Immersion type projection exposure equipment |
JPH06181157A (en) | 1992-12-15 | 1994-06-28 | Nikon Corp | Apparatus with low dust-generating property |
JP2520833B2 (en) | 1992-12-21 | 1996-07-31 | 東京エレクトロン株式会社 | Immersion type liquid treatment device |
JP3316833B2 (en) * | 1993-03-26 | 2002-08-19 | 株式会社ニコン | Scanning exposure method, surface position setting device, scanning type exposure device, and device manufacturing method using the method |
JPH07220990A (en) | 1994-01-28 | 1995-08-18 | Hitachi Ltd | Pattern forming method and exposure apparatus therefor |
JPH08316124A (en) | 1995-05-19 | 1996-11-29 | Hitachi Ltd | Method and apparatus for projection exposing |
JPH08316125A (en) | 1995-05-19 | 1996-11-29 | Hitachi Ltd | Method and apparatus for projection exposing |
US6104687A (en) | 1996-08-26 | 2000-08-15 | Digital Papyrus Corporation | Method and apparatus for coupling an optical lens to a disk through a coupling medium having a relatively high index of refraction |
US5825043A (en) | 1996-10-07 | 1998-10-20 | Nikon Precision Inc. | Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus |
JPH10116760A (en) | 1996-10-08 | 1998-05-06 | Nikon Corp | Aligner and substrate holding device |
JP3612920B2 (en) | 1997-02-14 | 2005-01-26 | ソニー株式会社 | Exposure apparatus for producing an optical recording medium master |
JPH10255319A (en) * | 1997-03-12 | 1998-09-25 | Hitachi Maxell Ltd | Master disk exposure device and method therefor |
JP3747566B2 (en) * | 1997-04-23 | 2006-02-22 | 株式会社ニコン | Immersion exposure equipment |
JP3817836B2 (en) * | 1997-06-10 | 2006-09-06 | 株式会社ニコン | EXPOSURE APPARATUS, ITS MANUFACTURING METHOD, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD |
US5900354A (en) * | 1997-07-03 | 1999-05-04 | Batchelder; John Samuel | Method for optical inspection and lithography |
JPH11176727A (en) * | 1997-12-11 | 1999-07-02 | Nikon Corp | Projection aligner |
AU1505699A (en) | 1997-12-12 | 1999-07-05 | Nikon Corporation | Projection exposure method and projection aligner |
JP2000058436A (en) | 1998-08-11 | 2000-02-25 | Nikon Corp | Projection aligner and exposure method |
TWI242111B (en) | 1999-04-19 | 2005-10-21 | Asml Netherlands Bv | Gas bearings for use in vacuum chambers and their application in lithographic projection apparatus |
JP4504479B2 (en) | 1999-09-21 | 2010-07-14 | オリンパス株式会社 | Immersion objective lens for microscope |
US7187503B2 (en) | 1999-12-29 | 2007-03-06 | Carl Zeiss Smt Ag | Refractive projection objective for immersion lithography |
US6995930B2 (en) | 1999-12-29 | 2006-02-07 | Carl Zeiss Smt Ag | Catadioptric projection objective with geometric beam splitting |
DE19963587B4 (en) * | 1999-12-29 | 2007-10-04 | Carl Zeiss Smt Ag | Projection exposure system |
JP2001272604A (en) | 2000-03-27 | 2001-10-05 | Olympus Optical Co Ltd | Immersion objective lens and optical device using the same |
JP2001358056A (en) * | 2000-06-15 | 2001-12-26 | Canon Inc | Exposure apparatus |
TW591653B (en) | 2000-08-08 | 2004-06-11 | Koninkl Philips Electronics Nv | Method of manufacturing an optically scannable information carrier |
KR100866818B1 (en) | 2000-12-11 | 2008-11-04 | 가부시키가이샤 니콘 | Projection optical system and exposure apparatus comprising the same |
US20020109823A1 (en) * | 2001-02-09 | 2002-08-15 | Nikon Corporation. | Wafer stage assembly |
WO2002091078A1 (en) | 2001-05-07 | 2002-11-14 | Massachusetts Institute Of Technology | Methods and apparatus employing an index matching medium |
US6600547B2 (en) | 2001-09-24 | 2003-07-29 | Nikon Corporation | Sliding seal |
US6897941B2 (en) | 2001-11-07 | 2005-05-24 | Applied Materials, Inc. | Optical spot grid array printer |
DE10229818A1 (en) | 2002-06-28 | 2004-01-15 | Carl Zeiss Smt Ag | Focus detection method and imaging system with focus detection system |
US7092069B2 (en) | 2002-03-08 | 2006-08-15 | Carl Zeiss Smt Ag | Projection exposure method and projection exposure system |
DE10210899A1 (en) | 2002-03-08 | 2003-09-18 | Zeiss Carl Smt Ag | Refractive projection lens for immersion lithography |
US7093375B2 (en) | 2002-09-30 | 2006-08-22 | Lam Research Corporation | Apparatus and method for utilizing a meniscus in substrate processing |
US6954993B1 (en) | 2002-09-30 | 2005-10-18 | Lam Research Corporation | Concentric proximity processing head |
US7367345B1 (en) | 2002-09-30 | 2008-05-06 | Lam Research Corporation | Apparatus and method for providing a confined liquid for immersion lithography |
US6988326B2 (en) | 2002-09-30 | 2006-01-24 | Lam Research Corporation | Phobic barrier meniscus separation and containment |
US6788477B2 (en) | 2002-10-22 | 2004-09-07 | Taiwan Semiconductor Manufacturing Co., Ltd. | Apparatus for method for immersion lithography |
CN100568101C (en) | 2002-11-12 | 2009-12-09 | Asml荷兰有限公司 | Lithographic equipment and device making method |
DE60335595D1 (en) | 2002-11-12 | 2011-02-17 | Asml Netherlands Bv | Immersion lithographic apparatus and method of making a device |
SG121822A1 (en) | 2002-11-12 | 2006-05-26 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
US7110081B2 (en) | 2002-11-12 | 2006-09-19 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
KR100585476B1 (en) | 2002-11-12 | 2006-06-07 | 에이에스엠엘 네델란즈 비.브이. | Lithographic Apparatus and Device Manufacturing Method |
EP1420299B1 (en) * | 2002-11-12 | 2011-01-05 | ASML Netherlands B.V. | Immersion lithographic apparatus and device manufacturing method |
CN101349876B (en) | 2002-11-12 | 2010-12-01 | Asml荷兰有限公司 | Immersion lithographic apparatus and device manufacturing method |
DE10253679A1 (en) | 2002-11-18 | 2004-06-03 | Infineon Technologies Ag | Optical arrangement used in the production of semiconductor components comprises a lens system arranged behind a mask, and a medium having a specified refractive index lying between the mask and the lens system |
SG131766A1 (en) | 2002-11-18 | 2007-05-28 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
TWI255971B (en) | 2002-11-29 | 2006-06-01 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
DE10258718A1 (en) | 2002-12-09 | 2004-06-24 | Carl Zeiss Smt Ag | Projection lens, in particular for microlithography, and method for tuning a projection lens |
AU2003289271A1 (en) | 2002-12-10 | 2004-06-30 | Nikon Corporation | Exposure apparatus, exposure method and method for manufacturing device |
DE10257766A1 (en) | 2002-12-10 | 2004-07-15 | Carl Zeiss Smt Ag | Method for setting a desired optical property of a projection lens and microlithographic projection exposure system |
JP4352874B2 (en) | 2002-12-10 | 2009-10-28 | 株式会社ニコン | Exposure apparatus and device manufacturing method |
WO2004053951A1 (en) | 2002-12-10 | 2004-06-24 | Nikon Corporation | Exposure method, exposure apparatus and method for manufacturing device |
JP4232449B2 (en) | 2002-12-10 | 2009-03-04 | 株式会社ニコン | Exposure method, exposure apparatus, and device manufacturing method |
JP4529433B2 (en) * | 2002-12-10 | 2010-08-25 | 株式会社ニコン | Exposure apparatus, exposure method, and device manufacturing method |
EP1429190B1 (en) | 2002-12-10 | 2012-05-09 | Canon Kabushiki Kaisha | Exposure apparatus and method |
CN1717776A (en) | 2002-12-10 | 2006-01-04 | 株式会社尼康 | Optical device and projection exposure apparatus using such optical device |
WO2004053955A1 (en) | 2002-12-10 | 2004-06-24 | Nikon Corporation | Exposure system and device producing method |
AU2003289272A1 (en) | 2002-12-10 | 2004-06-30 | Nikon Corporation | Surface position detection apparatus, exposure method, and device porducing method |
SG150388A1 (en) | 2002-12-10 | 2009-03-30 | Nikon Corp | Exposure apparatus and method for producing device |
AU2003302830A1 (en) | 2002-12-10 | 2004-06-30 | Nikon Corporation | Exposure apparatus and method for manufacturing device |
EP1571696A4 (en) | 2002-12-10 | 2008-03-26 | Nikon Corp | Exposure apparatus and method for manufacturing device |
SG171468A1 (en) | 2002-12-10 | 2011-06-29 | Nikon Corp | Exposure apparatus and method for producing device |
DE60326384D1 (en) | 2002-12-13 | 2009-04-09 | Koninkl Philips Electronics Nv | LIQUID REMOVAL IN A PROCESS AND DEVICE FOR IRRADIATING STAIN ON A LAYER |
WO2004057590A1 (en) | 2002-12-19 | 2004-07-08 | Koninklijke Philips Electronics N.V. | Method and device for irradiating spots on a layer |
US7514699B2 (en) | 2002-12-19 | 2009-04-07 | Koninklijke Philips Electronics N.V. | Method and device for irradiating spots on a layer |
US7010958B2 (en) | 2002-12-19 | 2006-03-14 | Asml Holding N.V. | High-resolution gas gauge proximity sensor |
US6781670B2 (en) | 2002-12-30 | 2004-08-24 | Intel Corporation | Immersion lithography |
TWI247339B (en) | 2003-02-21 | 2006-01-11 | Asml Holding Nv | Lithographic printing with polarized light |
JP4604452B2 (en) * | 2003-02-26 | 2011-01-05 | 株式会社ニコン | Exposure apparatus, exposure method, and device manufacturing method |
US7206059B2 (en) | 2003-02-27 | 2007-04-17 | Asml Netherlands B.V. | Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems |
US6943941B2 (en) | 2003-02-27 | 2005-09-13 | Asml Netherlands B.V. | Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems |
US7029832B2 (en) | 2003-03-11 | 2006-04-18 | Samsung Electronics Co., Ltd. | Immersion lithography methods using carbon dioxide |
US20050164522A1 (en) | 2003-03-24 | 2005-07-28 | Kunz Roderick R. | Optical fluids, and systems and methods of making and using the same |
KR20110104084A (en) | 2003-04-09 | 2011-09-21 | 가부시키가이샤 니콘 | Immersion lithography fluid control system |
WO2004090633A2 (en) | 2003-04-10 | 2004-10-21 | Nikon Corporation | An electro-osmotic element for an immersion lithography apparatus |
EP2950148B1 (en) | 2003-04-10 | 2016-09-21 | Nikon Corporation | Environmental system including vaccum scavenge for an immersion lithography apparatus |
KR101129213B1 (en) | 2003-04-10 | 2012-03-27 | 가부시키가이샤 니콘 | Run-off path to collect liquid for an immersion lithography apparatus |
KR101431938B1 (en) | 2003-04-10 | 2014-08-19 | 가부시키가이샤 니콘 | Environmental system including a transport region for an immersion lithography apparatus |
WO2004092830A2 (en) | 2003-04-11 | 2004-10-28 | Nikon Corporation | Liquid jet and recovery system for immersion lithography |
SG2013077797A (en) | 2003-04-11 | 2017-02-27 | Nippon Kogaku Kk | Cleanup method for optics in immersion lithography |
SG139736A1 (en) | 2003-04-11 | 2008-02-29 | Nikon Corp | Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly |
EP1614000B1 (en) | 2003-04-17 | 2012-01-18 | Nikon Corporation | Immersion lithographic apparatus |
JP4146755B2 (en) | 2003-05-09 | 2008-09-10 | 松下電器産業株式会社 | Pattern formation method |
JP4025683B2 (en) | 2003-05-09 | 2007-12-26 | 松下電器産業株式会社 | Pattern forming method and exposure apparatus |
JP2005277363A (en) * | 2003-05-23 | 2005-10-06 | Nikon Corp | Exposure device and device manufacturing method |
JP4084710B2 (en) | 2003-06-12 | 2008-04-30 | 松下電器産業株式会社 | Pattern formation method |
JP4054285B2 (en) | 2003-06-12 | 2008-02-27 | 松下電器産業株式会社 | Pattern formation method |
EP3104396B1 (en) * | 2003-06-13 | 2018-03-21 | Nikon Corporation | Exposure method, substrate stage, exposure apparatus, and device manufacturing method |
US6867844B2 (en) | 2003-06-19 | 2005-03-15 | Asml Holding N.V. | Immersion photolithography system and method using microchannel nozzles |
JP4084712B2 (en) | 2003-06-23 | 2008-04-30 | 松下電器産業株式会社 | Pattern formation method |
JP4029064B2 (en) | 2003-06-23 | 2008-01-09 | 松下電器産業株式会社 | Pattern formation method |
US6809794B1 (en) | 2003-06-27 | 2004-10-26 | Asml Holding N.V. | Immersion photolithography system and method using inverted wafer-projection optics interface |
US7236232B2 (en) | 2003-07-01 | 2007-06-26 | Nikon Corporation | Using isotopically specified fluids as optical elements |
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US7006209B2 (en) | 2003-07-25 | 2006-02-28 | Advanced Micro Devices, Inc. | Method and apparatus for monitoring and controlling imaging in immersion lithography systems |
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US7061578B2 (en) | 2003-08-11 | 2006-06-13 | Advanced Micro Devices, Inc. | Method and apparatus for monitoring and controlling imaging in immersion lithography systems |
US7700267B2 (en) | 2003-08-11 | 2010-04-20 | Taiwan Semiconductor Manufacturing Company, Ltd. | Immersion fluid for immersion lithography, and method of performing immersion lithography |
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US7085075B2 (en) | 2003-08-12 | 2006-08-01 | Carl Zeiss Smt Ag | Projection objectives including a plurality of mirrors with lenses ahead of mirror M3 |
US6844206B1 (en) | 2003-08-21 | 2005-01-18 | Advanced Micro Devices, Llp | Refractive index system monitor and control for immersion lithography |
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US7070915B2 (en) | 2003-08-29 | 2006-07-04 | Tokyo Electron Limited | Method and system for drying a substrate |
US6954256B2 (en) | 2003-08-29 | 2005-10-11 | Asml Netherlands B.V. | Gradient immersion lithography |
US7014966B2 (en) | 2003-09-02 | 2006-03-21 | Advanced Micro Devices, Inc. | Method and apparatus for elimination of bubbles in immersion medium in immersion lithography systems |
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US6961186B2 (en) | 2003-09-26 | 2005-11-01 | Takumi Technology Corp. | Contact printing using a magnified mask image |
US7369217B2 (en) | 2003-10-03 | 2008-05-06 | Micronic Laser Systems Ab | Method and device for immersion lithography |
US7678527B2 (en) | 2003-10-16 | 2010-03-16 | Intel Corporation | Methods and compositions for providing photoresist with improved properties for contacting liquids |
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US7545481B2 (en) | 2003-11-24 | 2009-06-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
WO2005054953A2 (en) | 2003-11-24 | 2005-06-16 | Carl-Zeiss Smt Ag | Holding device for an optical element in an objective |
US7125652B2 (en) | 2003-12-03 | 2006-10-24 | Advanced Micro Devices, Inc. | Immersion lithographic process using a conforming immersion medium |
KR101281397B1 (en) * | 2003-12-15 | 2013-07-02 | 가부시키가이샤 니콘 | Stage system, exposure apparatus and exposure method |
US7589818B2 (en) | 2003-12-23 | 2009-09-15 | Asml Netherlands B.V. | Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus |
US7394521B2 (en) | 2003-12-23 | 2008-07-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7050146B2 (en) | 2004-02-09 | 2006-05-23 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7898642B2 (en) | 2004-04-14 | 2011-03-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
-
2003
- 2003-12-23 US US10/743,271 patent/US7394521B2/en not_active Expired - Lifetime
-
2004
- 2004-12-15 EP EP10180289.0A patent/EP2259139B1/en not_active Expired - Fee Related
- 2004-12-15 CN CNB2004800383431A patent/CN100507721C/en not_active Expired - Fee Related
- 2004-12-15 JP JP2006545996A patent/JP4157146B2/en not_active Expired - Fee Related
- 2004-12-15 CN CN2009101391092A patent/CN101872129B/en active Active
- 2004-12-15 EP EP17181223.3A patent/EP3287848B1/en not_active Expired - Fee Related
- 2004-12-15 EP EP04803901A patent/EP1697799A2/en not_active Withdrawn
- 2004-12-15 KR KR1020067012462A patent/KR100855337B1/en not_active IP Right Cessation
- 2004-12-15 WO PCT/EP2004/014282 patent/WO2005064405A2/en not_active Application Discontinuation
- 2004-12-17 TW TW093139476A patent/TWI261151B/en not_active IP Right Cessation
-
2007
- 2007-07-31 US US11/882,292 patent/US7710541B2/en not_active Expired - Fee Related
-
2008
- 2008-03-12 JP JP2008062774A patent/JP4526572B2/en not_active Expired - Fee Related
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1999049504A1 (en) * | 1998-03-26 | 1999-09-30 | Nikon Corporation | Projection exposure method and system |
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US9366972B2 (en) | 2002-11-12 | 2016-06-14 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
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US9285686B2 (en) | 2003-07-31 | 2016-03-15 | Asml Netherlands B.V. | Lithographic apparatus involving an immersion liquid supply system with an aperture |
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Also Published As
Publication number | Publication date |
---|---|
US7394521B2 (en) | 2008-07-01 |
JP4526572B2 (en) | 2010-08-18 |
KR100855337B1 (en) | 2008-09-04 |
JP4157146B2 (en) | 2008-09-24 |
JP2007515798A (en) | 2007-06-14 |
CN1898606A (en) | 2007-01-17 |
EP2259139B1 (en) | 2017-08-23 |
CN100507721C (en) | 2009-07-01 |
EP1697799A2 (en) | 2006-09-06 |
JP2008219020A (en) | 2008-09-18 |
WO2005064405A2 (en) | 2005-07-14 |
US20080186459A1 (en) | 2008-08-07 |
CN101872129A (en) | 2010-10-27 |
EP2259139A1 (en) | 2010-12-08 |
TWI261151B (en) | 2006-09-01 |
EP3287848A1 (en) | 2018-02-28 |
US7710541B2 (en) | 2010-05-04 |
US20050134815A1 (en) | 2005-06-23 |
KR20060103271A (en) | 2006-09-28 |
TW200534031A (en) | 2005-10-16 |
EP3287848B1 (en) | 2018-11-07 |
CN101872129B (en) | 2013-01-23 |
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