WO2005064406A3 - Projection optical system - Google Patents

Projection optical system Download PDF

Info

Publication number
WO2005064406A3
WO2005064406A3 PCT/EP2004/014336 EP2004014336W WO2005064406A3 WO 2005064406 A3 WO2005064406 A3 WO 2005064406A3 EP 2004014336 W EP2004014336 W EP 2004014336W WO 2005064406 A3 WO2005064406 A3 WO 2005064406A3
Authority
WO
WIPO (PCT)
Prior art keywords
optical system
projection optical
lenses
radiation
trc
Prior art date
Application number
PCT/EP2004/014336
Other languages
French (fr)
Other versions
WO2005064406A2 (en
Inventor
Daniel Kraehmer
Eric Eva
Original Assignee
Zeiss Carl Smt Ag
Daniel Kraehmer
Eric Eva
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag, Daniel Kraehmer, Eric Eva filed Critical Zeiss Carl Smt Ag
Publication of WO2005064406A2 publication Critical patent/WO2005064406A2/en
Publication of WO2005064406A3 publication Critical patent/WO2005064406A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties

Abstract

Radiation-induced damage to a lens material in a projection exposure system is reduced by selection of maximum design fluence values HD for lenses and at least one lens made of a material having a characteristic transition point TRC after exposure to a given amount of radiation, wherein, for instance, TRC < 0.8. HD among other relationships and/or characteristics of the lenses.
PCT/EP2004/014336 2003-12-24 2004-12-15 Projection optical system WO2005064406A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/743,815 US6992753B2 (en) 2003-12-24 2003-12-24 Projection optical system
US10/743,815 2003-12-24

Publications (2)

Publication Number Publication Date
WO2005064406A2 WO2005064406A2 (en) 2005-07-14
WO2005064406A3 true WO2005064406A3 (en) 2005-11-24

Family

ID=34700506

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2004/014336 WO2005064406A2 (en) 2003-12-24 2004-12-15 Projection optical system

Country Status (2)

Country Link
US (1) US6992753B2 (en)
WO (1) WO2005064406A2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7599435B2 (en) * 2004-01-30 2009-10-06 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. Video frame encoding and decoding
JP5253081B2 (en) * 2008-10-14 2013-07-31 キヤノン株式会社 Projection optical system, exposure apparatus, and device manufacturing method
JP2011192991A (en) 2010-03-12 2011-09-29 Asml Netherlands Bv Lithographic apparatus and method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030119652A1 (en) * 2001-12-06 2003-06-26 Bodo Kuhn Quartz glass blank for an optical component and its utilization

Family Cites Families (17)

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Publication number Priority date Publication date Assignee Title
US5523193A (en) 1988-05-31 1996-06-04 Texas Instruments Incorporated Method and apparatus for patterning and imaging member
DE59105735D1 (en) 1990-05-02 1995-07-20 Fraunhofer Ges Forschung EXPOSURE DEVICE.
US5410428A (en) 1990-10-30 1995-04-25 Shin-Etsu Quartz Products Co. Ltd. Optical member made of high-purity and transparent synthetic silica glass and method for production thereof or blank thereof
US5229872A (en) 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
EP0835848A3 (en) * 1996-08-21 1998-06-10 Nikon Corporation Fluorine-containing silica glass, its method of manufacture and a projection exposure apparatus comprising the glass
KR20000035883A (en) 1996-08-29 2000-06-26 알프레드 엘. 미첼슨 Silica with low compaction under high energy irradiation
US6483639B2 (en) 1997-03-25 2002-11-19 Heraeus Quarzglas Gmbh Optical system for integrated circuit fabrication
US8402786B2 (en) 1998-01-30 2013-03-26 Asahi Glass Company, Limited Synthetic silica glass optical component and process for its production
US6376401B1 (en) * 1998-09-07 2002-04-23 Tosoh Corporation Ultraviolet ray-transparent optical glass material and method of producing same
US6782716B2 (en) * 1999-02-12 2004-08-31 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
JP3069562B1 (en) * 1999-10-19 2000-07-24 信越石英株式会社 Silica glass optical material for excimer laser and excimer lamp and method for producing the same
US6339505B1 (en) 2000-06-26 2002-01-15 International Business Machines Corporation Method for radiation projection and lens assembly for semiconductor exposure tools
EP1330679A4 (en) * 2000-10-03 2006-09-06 Corning Inc Photolithography methods and systems
JP2002244034A (en) 2001-02-21 2002-08-28 Nikon Corp Projection optical system and exposure device provided with it
DE10159961C2 (en) 2001-12-06 2003-12-24 Heraeus Quarzglas Quartz glass blank for an optical component and method of making and using same
DE10159962A1 (en) 2001-12-06 2003-07-03 Heraeus Quarzglas Quartz glass blank for an optical component and method for producing and using the same
DE60329671D1 (en) * 2002-04-23 2009-11-26 Asahi Glass Co Ltd JECTION EXPOSURE DEVICE AND PROJECTION EXPOSURE METHOD

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030119652A1 (en) * 2001-12-06 2003-06-26 Bodo Kuhn Quartz glass blank for an optical component and its utilization

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
J M ALGOTS ET AL: "Compaction and Rarefaction of Fused Silica with 193-nm Excimer Laser Exposure", PROCEEDINGS OF SPIE, OPTICAL MICROLITHOGRAPHY XVI, vol. 5040, June 2003 (2003-06-01), pages 1639 - 1650, XP002347037 *
KUHN B ET AL: "Compaction versus expansion behavior related to the OH-content of synthetic fused silica under prolonged UV-laser irradiation", JOURNAL OF NON-CRYSTALLINE SOLIDS, NORTH-HOLLAND PHYSICS PUBLISHING. AMSTERDAM, NL, vol. 330, no. 1-3, 15 November 2003 (2003-11-15), pages 23 - 32, XP004471710, ISSN: 0022-3093 *

Also Published As

Publication number Publication date
US20050140954A1 (en) 2005-06-30
WO2005064406A2 (en) 2005-07-14
US6992753B2 (en) 2006-01-31

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