WO2006025084A1 - 積層型半導体装置用キャリア構成、この製造方法及び積層型半導体装置の製造方法 - Google Patents
積層型半導体装置用キャリア構成、この製造方法及び積層型半導体装置の製造方法 Download PDFInfo
- Publication number
- WO2006025084A1 WO2006025084A1 PCT/JP2004/012476 JP2004012476W WO2006025084A1 WO 2006025084 A1 WO2006025084 A1 WO 2006025084A1 JP 2004012476 W JP2004012476 W JP 2004012476W WO 2006025084 A1 WO2006025084 A1 WO 2006025084A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- carrier
- semiconductor package
- manufacturing
- semiconductor device
- opening
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/67333—Trays for chips
- H01L21/67336—Trays for chips characterized by a material, a roughness, a coating or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/03—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
- H01L25/10—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices having separate containers
- H01L25/105—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices having separate containers the devices being of a type provided for in group H01L27/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/50—Multistep manufacturing processes of assemblies consisting of devices, each device being of a type provided for in group H01L27/00 or H01L29/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32135—Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/32145—Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
- H01L2225/03—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
- H01L2225/04—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers
- H01L2225/065—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers the devices being of a type provided for in group H01L27/00
- H01L2225/06503—Stacked arrangements of devices
- H01L2225/06513—Bump or bump-like direct electrical connections between devices, e.g. flip-chip connection, solder bumps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
- H01L2225/03—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
- H01L2225/10—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers
- H01L2225/1005—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00
- H01L2225/1011—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00 the containers being in a stacked arrangement
- H01L2225/1017—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00 the containers being in a stacked arrangement the lowermost container comprising a device support
- H01L2225/1023—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00 the containers being in a stacked arrangement the lowermost container comprising a device support the support being an insulating substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
- H01L2225/03—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
- H01L2225/10—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers
- H01L2225/1005—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00
- H01L2225/1011—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00 the containers being in a stacked arrangement
- H01L2225/1047—Details of electrical connections between containers
- H01L2225/1058—Bump or bump-like electrical connections, e.g. balls, pillars, posts
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/03—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
- H01L25/04—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L25/065—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00
- H01L25/0657—Stacked arrangements of devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/35—Mechanical effects
- H01L2924/351—Thermal stress
- H01L2924/3511—Warping
Definitions
- Carrier structure for stacked semiconductor device manufacturing method thereof, and manufacturing method of stacked semiconductor device
- the present invention relates to a carrier configuration for a stacked semiconductor device, a manufacturing method thereof, and a manufacturing method of a stacked semiconductor device, and in particular, a stacked semiconductor device in which a plurality of semiconductor packages are stacked to form one semiconductor package.
- the present invention relates to a manufacturing carrier configuration, a manufacturing method thereof, and a manufacturing method of a laminated semiconductor device.
- CSP chip-scale packages
- MCP multi-chip packages
- PoP Package on Package
- the carrier used for manufacturing the stacked package needs to stack the upper and lower semiconductor packages with high positional accuracy, and the carrier for that purpose is also suitable for maintaining the manufacturing yield of the semiconductor package. Manufacturing accuracy is required.
- the present invention has been made in view of the above problems, and a carrier configuration for manufacturing a stacked semiconductor device, a manufacturing method thereof, and the stacked semiconductor device capable of improving the manufacturing yield of the stacked semiconductor device. It aims at providing the manufacturing method of.
- the present invention provides a lower carrier having an opening for placing a first semiconductor package and configured by stacking a plurality of thin plates, and a second semiconductor A carrier structure for manufacturing a stacked semiconductor device, including an upper carrier having an opening for disposing a package on the first semiconductor package. If the lower carrier is made by metal IJ loading, it will be difficult to maintain a uniform thickness, which tends to cause warpage. For this reason, if this lower carrier is used in the manufacture of a stacked semiconductor device, it will cause a mismatch in external dimensions and defective bonding of upper and lower semiconductor packages, and the manufacturing yield of the semiconductor device will decrease. On the other hand, since the thin plate is manufactured by rolling, the thickness accuracy is extremely high.
- the warpage can be reduced by dispersing the stress of each thin plate as well as making the plate thickness uniform.
- the manufacturing yield of the stacked semiconductor can be improved.
- a thin plate having an opening area larger than the outer size of the first semiconductor package is laminated on a thin plate having an opening area smaller than the outer size of the first semiconductor package. Since the opening area of a thin plate with a small opening area is smaller than the outer size of the first semiconductor device package, the relay substrate (interposer) portion of the first semiconductor package can be placed on this thin plate, and the opening Can be prevented from falling off.
- the thin plate having a large opening area on it can serve as an outer guide larger than the outer size of the semiconductor package.
- the opening area of a plate having a large opening area is determined in view of the accuracy of the external size of the semiconductor device and the processing dimension accuracy of the carrier.
- a magnet is embedded in the lower carrier. Since the lower carrier and the upper carrier need to be brought into close contact with each other as much as possible, a gap is created only with the positioning pin, which may affect the positioning accuracy during loading. By arranging the magnets, they can be brought into close contact with each other, and the production yield of the laminated semiconductor device can be improved.
- the lower carrier includes a plurality of magnets. By arranging a plurality of magnets so that they are uniformly distributed over the entire surface of the lower carrier, the lower semiconductor package and the upper semiconductor package can be brought into close contact with each other, and the manufacturing yield of the stacked semiconductor device can be improved. Can do.
- the lower carrier is formed with a plurality of openings, a plurality of semiconductor devices can be accommodated.
- production efficiency can be improved. This is particularly effective in terms of production efficiency when loading with automatic machines.
- the lower carrier has a relief structure with respect to the corner portion of the first semiconductor package at a corner portion of the opening. Since the external size and mounting position variation of the semiconductor package are different, the corner of the lower semiconductor package may come into contact with the carrier when the upper semiconductor package is mounted or when the carrier is transported. For this reason, this structure can prevent deformation and breakage of the corner portion of the semiconductor device.
- the relief structure is formed on a part of a thin plate constituting the lower carrier.
- the opening pattern to be the opening of the thin plate constituting the lower carrier is formed by etching or electric discharge machining.
- etching or electric discharge machining There are two types of thin plate processing methods: cutting and stamping, but both cause warping and the immediate punching method tends to cause burrs on the cut surface. If warpage or burrs exist, there is a possibility that a lower semiconductor package insertion failure or mounting position misalignment may occur in the semiconductor package stacking process, which may reduce the yield.
- the above-described problems can be solved by performing etching or, for example, wire discharge power.
- the plurality of thin plates constituting the lower carrier are joined by spot welding.
- warpage is likely to occur due to stress generated at the interface between different materials (due to the difference in thermal expansion coefficient).
- it is possible to suppress warping as much as possible by locally joining by spot welding without using another material. By using this technology, it is particularly effective in reducing warpage during reflow.
- the present invention is a manufacturing method of a carrier structure for manufacturing a stacked semiconductor device comprising a lower carrier and an upper carrier, and forming an opening pattern of a plurality of thin plates constituting the lower carrier by etching or electric discharge machining Steps to perform.
- etching or electric discharge machining Steps There are two types of thin plate machining methods: cutting and stamping, but both cause warping and the punching method tends to cause burrs on the cut surface. If warpage or burrs exist, there is a possibility that a lower package insertion failure or mounting position shift may occur in the stacking process of the semiconductor package, which may reduce the yield. As in the present invention, it is possible to reduce the occurrence of warpage and burrs by performing etching or wire discharge.
- the present invention is a method of manufacturing a carrier structure for manufacturing a stacked semiconductor device comprising a lower carrier and an upper carrier, wherein a plurality of thin plates constituting the lower carrier are stacked, and the plurality of thin plates are spot-welded.
- the step of joining For example, in a method in which both are bonded to the entire upper surface of the mold resin portion of the lower semiconductor package using an adhesive or the like, warping occurs due to stress (due to the difference in thermal expansion coefficient) generated at the interface between different materials. I'm going to be. As in the present invention, warping can be suppressed as much as possible by locally joining without using another material. By using this technology, it is particularly effective for reducing warpage during reflow.
- the present invention also includes a lower carrier and a second semiconductor package, each of which has an opening for placing the first semiconductor package and is formed by laminating a plurality of thin plates.
- a method of manufacturing a stacked semiconductor device including a step of bonding a semiconductor package of 1 and a second semiconductor package. According to the present invention, the manufacturing yield of the stacked semiconductor device can be improved.
- the present invention also provides a carrier configuration having a laminated thin plate and a carrier having a first opening for mounting a semiconductor package.
- the carrier may include a thin plate having an opening area smaller than the outer shape of the semiconductor package and another thin plate stacked on the thin plate and having an opening larger than the outer shape of the semiconductor package. it can.
- the carrier may have a magnet that is loaded.
- the carrier may have a relief structure with respect to a corner portion of the semiconductor package, and the relief structure may be disposed in the first opening. And it is preferable that the relief structure is defined by a part of the laminated thin plates.
- the present invention it is possible to provide a carrier structure for manufacturing a stacked semiconductor device, a manufacturing method thereof, and a manufacturing method of the stacked semiconductor device that can improve the manufacturing yield of the stacked semiconductor device. .
- FIG. 1 is a cross-sectional view of a carrier configuration for manufacturing a stacked semiconductor device of this example.
- FIG. 2 (a) is a top view of the lower carrier, and (b) is an XX ′ cross-sectional view of (a).
- FIG. 3 is an enlarged view of SI shown in FIG. 2 (b).
- FIG. 4 (a) is a cross-sectional view taken along line YY ′ of FIG. 2 (a), and (b) is a diagram showing an example in which the lower carrier is composed of eight thin plates.
- FIG. 5 is an enlarged view of the periphery of the opening of the lower carrier.
- FIG. 6 is a view showing another example of the relief structure formed at the corner of the opening of the lower carrier.
- FIG. 7 (a), (b), and (c) are diagrams illustrating a manufacturing process of a stacked semiconductor device using a carrier according to the present embodiment.
- FIG. 1 is a cross-sectional view of a carrier configuration for manufacturing a stacked semiconductor device according to the present embodiment (hereinafter simply referred to as a carrier).
- carrier 1 consists of upper carrier 2 and lower carrier 3.
- the lower carrier 3 has a plurality of openings 31 for placing the first semiconductor package 10 and is configured by laminating a plurality of thin plates. Each thin plate is made of stainless steel, for example.
- the upper carrier 2 has a plurality of openings 21 for placing the second semiconductor package 11 on the first semiconductor package 10.
- the upper carrier 2 is made of aluminum, for example.
- the upper carrier 2 is overlaid on the lower carrier 3, the first semiconductor package 10 is placed in the opening 31 of the lower carrier 3, and then the second semiconductor package 11 is stacked on the first semiconductor package 10. .
- the solder balls of the semiconductor packages 10 and 11 are melted by reflow heating to manufacture a stacked semiconductor device.
- FIG. 2 (a) is a top view of the lower carrier
- Fig. 2 (b) is an XX 'cross-sectional view of (a). Note that the slit is not shown in FIG.
- FIG. 3 is an enlarged view of S1 shown in FIG. 2 (b).
- the reference numeral 3 mm lower carrier, 31 mm opening ⁇ ⁇ 32 mm positioning pin, 33 mm magnet, 34 mm slit, 35 mm welding position are shown respectively. Yes.
- the lower carrier 3 has 16 openings 31 formed therein. Therefore, 16 semiconductor packages 10 can be stored in the lower carrier 3.
- the lower carrier 3 includes an upper part 5 and a lower part 6.
- the upper part 5 of the lower carrier is formed by laminating thin plates 41 and 42.
- the lower part 6 of the lower carrier is formed by laminating thin plates 43 and 44.
- the lower carrier 3 is formed on the thin plates 43 and 44 having an opening area smaller than the outer size of the first semiconductor package 10, and on the thin plates 41 and 44 having an opening area larger than the outer size of the first semiconductor package 10. 42 is laminated.
- the relay substrate (interposer) portion of the semiconductor package 10 can be placed on the thin plate 43, and the semiconductor package 10 opens. Can be prevented from falling off.
- the thin plates 41 and 42 having a large opening area thereon serve as an outer guide larger than the outer size of the semiconductor package 10.
- the plurality of thin plates 41 to 44 are joined by spot welding at a welding position indicated by reference numeral 35. As a result, local bonding can be performed without using another material such as an adhesive, so that warpage can be suppressed as much as possible.
- the opening pattern to be the opening 31 of the thin plate is formed by chemical etching or wire electric discharge machining, it is possible to reduce the occurrence of warping and burrs on the cut surface.
- the positioning pins 32 are formed at two locations on the lower carrier 3.
- the upper carrier 2 and the lower carrier 3 are engaged with each other by overlapping the upper carrier 2 via the positioning pin 32 with the upper force of the lower carrier 3.
- a plurality of magnets 33 are embedded in the lower carrier 3. Since it is necessary to bring the lower carrier 3 and the upper carrier 2 into close contact with each other as much as possible, a gap is created only with the positioning pin 32, which may affect the positional accuracy during loading. By disposing the magnet 33 inside the lower carrier 3, the magnet 33 can be brought into close contact with each other, and the manufacturing yield of the laminated semiconductor device can be improved.
- FIG. 4 (a) is a cross-sectional view taken along line YY ′ of FIG. 2, and FIG. 4 (b) is a view showing an example in which the lower carrier 3 is composed of eight thin plates.
- FIGS. 2A and 2B are examples in which one thin plate is attached to both surfaces of the magnet 33.
- FIG. 2A the lower carrier 3 is formed by laminating the upper part 5 of the lower carrier and the lower part 6 of the lower carrier.
- the upper part 5 of the lower carrier is constructed by laminating thin plates 41 and 42.
- the lower part 6 of the lower carrier is configured by laminating thin plates 43 and 44. Further, as shown in FIG.
- the lower carrier 3 is configured by laminating thin plates 71 to 74 constituting the upper portion of the lower carrier and thin plates 75 to 78 constituting the lower portion of the lower carrier.
- the magnet 33 is preferably a material that can maintain a certain degree of magnetic force even if it is trapped in a thin plate, for example, a samarium cobalt magnet.
- a large number of slits 34 are formed along the outer peripheral edge of the lower carrier 3. By providing the slit 34, the warp of the lower carrier 3 can be absorbed when heat is applied to the lower carrier 3.
- FIG. 5 is an enlarged view showing the periphery of the opening of the lower carrier 3.
- 31 is the opening of the lower carrier 3
- 5 is the upper part of the lower carrier made of thin plates 41 and 42
- 51 is a circular relief structure formed on the upper part of the lower carrier
- 6 is the lower part of the lower carrier.
- the relief structure 51 is formed on a part of the thin plates 41 and 42 constituting the lower carrier 3. Because the semiconductor package has different external sizes and mounting position variations, the corner of the lower semiconductor package may come into contact with the lower carrier 3 when the upper semiconductor package is mounted or the carrier is transported. The ability to prevent deformation and breakage of the corner of the semiconductor device by forming a relief structure 51 at the corner of the opening 31 of the lower carrier so that the corner of the semiconductor package does not hit the lower carrier 3 S it can.
- FIG. 6 is a view showing another example of the relief structure formed at the corner of the opening of the lower carrier 3.
- reference numeral 31 denotes an opening of the lower carrier
- 5 denotes an upper part of the lower carrier
- 6 denotes a lower part of the lower carrier
- 81 denotes a relief structure.
- the relief structure 81 is formed on all the thin plates 41 to 44 constituting the lower carrier 3. In this way, by forming the relief structure 81 in all the thin plates 41 to 44, it is possible to prevent deformation and breakage of the corner portion of the semiconductor device, and hot air directly hits the corner portion of the semiconductor package during reflow. Therefore, it is possible to increase the temperature of the entire semiconductor package efficiently.
- FIGS. 7 (a), (b), and (c) are diagrams for explaining the manufacturing process of the stacked semiconductor device using the carrier of the present invention, and (a) shows that the upper carrier is mounted on the lower carrier.
- (B) is a cross-sectional view when the lower semiconductor package is set in (a)
- (c) is a cross-sectional view when the upper semiconductor package is mounted in (b).
- the upper carrier 2 is mounted on the lower carrier 3 as shown in FIG.
- the lower semiconductor package 10 is set in the opening 31 of the lower carrier 3.
- the stacked semiconductor device is manufactured by mounting the upper semiconductor package 11 on the lower semiconductor package 10 and melting the solder of the semiconductor package by reflow.
- the carrier for manufacturing a stacked semiconductor device including the lower carrier includes a step of forming an opening pattern of a plurality of thin plates constituting the lower carrier by etching or electric discharge machining, and a plurality of thin films constituting the lower carrier. Laminating plates and joining the plurality of thin plates by spot welding.
- the stacked semiconductor device includes an opening for mounting the first semiconductor package and a lower carrier configured by stacking a plurality of thin plates and a second semiconductor package.
Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006531192A JP4613367B2 (ja) | 2004-08-30 | 2004-08-30 | 積層型半導体装置用キャリア構成、この製造方法及び積層型半導体装置の製造方法 |
PCT/JP2004/012476 WO2006025084A1 (ja) | 2004-08-30 | 2004-08-30 | 積層型半導体装置用キャリア構成、この製造方法及び積層型半導体装置の製造方法 |
US11/214,630 US7489029B2 (en) | 2004-08-30 | 2005-08-30 | Carrier structure for stacked-type semiconductor device, method of producing the same, and method of fabricating stacked-type semiconductor device |
US12/315,417 US9142440B2 (en) | 2004-08-30 | 2008-12-03 | Carrier structure for stacked-type semiconductor device, method of producing the same, and method of fabricating stacked-type semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2004/012476 WO2006025084A1 (ja) | 2004-08-30 | 2004-08-30 | 積層型半導体装置用キャリア構成、この製造方法及び積層型半導体装置の製造方法 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/214,630 Continuation US7489029B2 (en) | 2004-08-30 | 2005-08-30 | Carrier structure for stacked-type semiconductor device, method of producing the same, and method of fabricating stacked-type semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2006025084A1 true WO2006025084A1 (ja) | 2006-03-09 |
Family
ID=35999748
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2004/012476 WO2006025084A1 (ja) | 2004-08-30 | 2004-08-30 | 積層型半導体装置用キャリア構成、この製造方法及び積層型半導体装置の製造方法 |
Country Status (3)
Country | Link |
---|---|
US (2) | US7489029B2 (ja) |
JP (1) | JP4613367B2 (ja) |
WO (1) | WO2006025084A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPWO2006080082A1 (ja) * | 2005-01-28 | 2008-06-19 | スパンション エルエルシー | 積層型半導体装置用キャリア及び積層型半導体装置の製造方法 |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102005061346A1 (de) * | 2005-09-30 | 2007-04-05 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterchip |
DE502005003131D1 (de) * | 2005-11-25 | 2008-04-17 | Siemens Ag | Automatisierungssystem mit einem angeschlossenen RFID-identifizierten Sensor oder Aktor |
EP2129195A4 (en) * | 2007-02-09 | 2011-06-15 | Panasonic Corp | PRINTED CIRCUIT BOARD, MULTILAYER PRINTED CIRCUIT BOARD, AND ELECTRONIC DEVICE |
US8932443B2 (en) | 2011-06-07 | 2015-01-13 | Deca Technologies Inc. | Adjustable wafer plating shield and method |
US9464362B2 (en) | 2012-07-18 | 2016-10-11 | Deca Technologies Inc. | Magnetically sealed wafer plating jig system and method |
US9427818B2 (en) * | 2014-01-20 | 2016-08-30 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor processing boat design with pressure sensor |
US20150228517A1 (en) * | 2014-02-13 | 2015-08-13 | Apple Inc. | Universal process carrier for substrates |
CN104835808A (zh) * | 2015-03-16 | 2015-08-12 | 苏州晶方半导体科技股份有限公司 | 芯片封装方法及芯片封装结构 |
SG10201504586WA (en) * | 2015-06-10 | 2016-09-29 | Apple Inc | Carrier having locking mechanism for holding substrates |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03280496A (ja) * | 1990-03-28 | 1991-12-11 | Taiyo Yuden Co Ltd | 多層基板の電子部品実装構造及びその実装方法 |
JPH0574978A (ja) * | 1991-09-13 | 1993-03-26 | Miyagi Oki Denki Kk | 半導体チツプ実装基板及びその製造方法 |
JPH1145956A (ja) * | 1997-05-17 | 1999-02-16 | Hyundai Electron Ind Co Ltd | パッケージされた集積回路素子及びその製造方法 |
JPH11251483A (ja) * | 1998-03-06 | 1999-09-17 | Hitachi Ltd | 半導体装置 |
JP2003289120A (ja) * | 2002-01-24 | 2003-10-10 | Nec Electronics Corp | フリップチップ型半導体装置及びその製造方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3798194A (en) * | 1968-10-07 | 1974-03-19 | Dow Chemical Co | Preparation of latexes by direct dispersion of acidic organic polymers into aqueous alkaline media containing certain alkanols |
US4445274A (en) * | 1977-12-23 | 1984-05-01 | Ngk Insulators, Ltd. | Method of manufacturing a ceramic structural body |
JPS5884687A (ja) * | 1981-11-16 | 1983-05-20 | Toyota Motor Corp | 積層板の溶接方法 |
US5828224A (en) * | 1994-03-18 | 1998-10-27 | Fujitsu, Limited | Test carrier for semiconductor integrated circuit and method of testing semiconductor integrated circuit |
EP0757512B1 (en) * | 1995-07-31 | 2001-11-14 | STMicroelectronics S.r.l. | Driving circuit, MOS transistor using the same and corresponding applications |
SE513352C2 (sv) * | 1998-10-26 | 2000-08-28 | Ericsson Telefon Ab L M | Kretskort och förfarande för framställning av kretskortet |
KR100282526B1 (ko) * | 1999-01-20 | 2001-02-15 | 김영환 | 적층 반도체 패키지 및 그 제조방법, 그리고 그 적층 반도체 패키지를 제조하기 위한 패키지 얼라인용 치구 |
US6384473B1 (en) * | 2000-05-16 | 2002-05-07 | Sandia Corporation | Microelectronic device package with an integral window |
WO2002055198A2 (en) * | 2000-11-06 | 2002-07-18 | Nanostream Inc | Microfluidic flow control devices |
US6894593B2 (en) * | 2003-02-12 | 2005-05-17 | Moog Inc. | Torque motor |
US20040160742A1 (en) * | 2003-02-14 | 2004-08-19 | Weiss Roger E. | Three-dimensional electrical device packaging employing low profile elastomeric interconnection |
-
2004
- 2004-08-30 JP JP2006531192A patent/JP4613367B2/ja not_active Expired - Fee Related
- 2004-08-30 WO PCT/JP2004/012476 patent/WO2006025084A1/ja active Application Filing
-
2005
- 2005-08-30 US US11/214,630 patent/US7489029B2/en not_active Expired - Fee Related
-
2008
- 2008-12-03 US US12/315,417 patent/US9142440B2/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03280496A (ja) * | 1990-03-28 | 1991-12-11 | Taiyo Yuden Co Ltd | 多層基板の電子部品実装構造及びその実装方法 |
JPH0574978A (ja) * | 1991-09-13 | 1993-03-26 | Miyagi Oki Denki Kk | 半導体チツプ実装基板及びその製造方法 |
JPH1145956A (ja) * | 1997-05-17 | 1999-02-16 | Hyundai Electron Ind Co Ltd | パッケージされた集積回路素子及びその製造方法 |
JPH11251483A (ja) * | 1998-03-06 | 1999-09-17 | Hitachi Ltd | 半導体装置 |
JP2003289120A (ja) * | 2002-01-24 | 2003-10-10 | Nec Electronics Corp | フリップチップ型半導体装置及びその製造方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPWO2006080082A1 (ja) * | 2005-01-28 | 2008-06-19 | スパンション エルエルシー | 積層型半導体装置用キャリア及び積層型半導体装置の製造方法 |
JP4675955B2 (ja) * | 2005-01-28 | 2011-04-27 | スパンション エルエルシー | 積層型半導体装置用キャリア及び積層型半導体装置の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JP4613367B2 (ja) | 2011-01-19 |
US20090093085A1 (en) | 2009-04-09 |
US9142440B2 (en) | 2015-09-22 |
JPWO2006025084A1 (ja) | 2008-07-31 |
US20060043600A1 (en) | 2006-03-02 |
US7489029B2 (en) | 2009-02-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US9142440B2 (en) | Carrier structure for stacked-type semiconductor device, method of producing the same, and method of fabricating stacked-type semiconductor device | |
JP5543125B2 (ja) | 半導体装置および半導体装置の製造方法 | |
JP5515450B2 (ja) | プリント基板の製造方法 | |
JP2008078367A (ja) | 半導体装置 | |
US8803304B2 (en) | Semiconductor package and manufacturing method thereof | |
JP2003168758A (ja) | 半導体装置 | |
KR20110124065A (ko) | 적층형 반도체 패키지 | |
US8507805B2 (en) | Wiring board for semiconductor devices, semiconductor device, electronic device, and motherboard | |
KR20090030540A (ko) | 반도체 패키지, 이를 제조하기 위한 반도체 패키지의제조장치와 반도체 패키지의 제조방법, 그리고 반도체패키지를 구비한 전자 기기 | |
JP5543063B2 (ja) | 半導体装置の製造方法 | |
TWI534951B (zh) | 半導體封裝基板,使用其之封裝系統及其製造方法 | |
US7592694B2 (en) | Chip package and method of manufacturing the same | |
JP2015076604A (ja) | 半導体パッケージ用フレーム補強材およびこれを用いた半導体パッケージの製造方法 | |
TW201405736A (zh) | 半導體封裝基板,使用其之封裝系統及其製造方法 | |
JP4282724B2 (ja) | マイクロボールマウンタ用の振込みマスク | |
JP2009147053A (ja) | 半導体装置及びその製造方法 | |
KR20070051296A (ko) | 적층형 반도체 장치용 캐리어 구성, 그 제조 방법 및적층형 반도체 장치의 제조 방법 | |
JP4755410B2 (ja) | テープ状部品包装体 | |
CN101083215A (zh) | 电子元件封装件及其制造方法 | |
KR101996935B1 (ko) | 반도체 패키지 기판, 이를 이용한 패키지 시스템 및 이의 제조 방법 | |
JP3410961B2 (ja) | 半導体装置の製造方法 | |
WO2014103855A1 (ja) | 半導体装置およびその製造方法 | |
KR20000073867A (ko) | 반도체 패키지의 제조방법 | |
JP2013172069A (ja) | 半導体装置及びその製造方法 | |
JP3818253B2 (ja) | 半導体装置用テープキャリアの製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WWE | Wipo information: entry into national phase |
Ref document number: 11214630 Country of ref document: US |
|
WWP | Wipo information: published in national office |
Ref document number: 11214630 Country of ref document: US |
|
AK | Designated states |
Kind code of ref document: A1 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): BW GH GM KE LS MW MZ NA SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
DPE1 | Request for preliminary examination filed after expiration of 19th month from priority date (pct application filed from 20040101) | ||
WWE | Wipo information: entry into national phase |
Ref document number: 2006531192 Country of ref document: JP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 1020077005057 Country of ref document: KR |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
122 | Ep: pct application non-entry in european phase |