WO2006029824A3 - Monitoring element for lithographic projection systems - Google Patents
Monitoring element for lithographic projection systems Download PDFInfo
- Publication number
- WO2006029824A3 WO2006029824A3 PCT/EP2005/009841 EP2005009841W WO2006029824A3 WO 2006029824 A3 WO2006029824 A3 WO 2006029824A3 EP 2005009841 W EP2005009841 W EP 2005009841W WO 2006029824 A3 WO2006029824 A3 WO 2006029824A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- lithographic projection
- monitoring element
- projection systems
- projection system
- sensor element
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70558—Dose control, i.e. achievement of a desired dose
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
Abstract
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US61057804P | 2004-09-16 | 2004-09-16 | |
US60/610,578 | 2004-09-16 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2006029824A2 WO2006029824A2 (en) | 2006-03-23 |
WO2006029824A3 true WO2006029824A3 (en) | 2006-09-08 |
Family
ID=36046628
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2005/009841 WO2006029824A2 (en) | 2004-09-16 | 2005-09-14 | Monitoring element for lithographic projection systems |
Country Status (1)
Country | Link |
---|---|
WO (1) | WO2006029824A2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7733459B2 (en) | 2003-08-29 | 2010-06-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4752473B2 (en) * | 2004-12-09 | 2011-08-17 | 株式会社ニコン | Exposure apparatus, exposure method, and device manufacturing method |
DE102023200132A1 (en) | 2022-05-04 | 2023-11-09 | Carl Zeiss Smt Gmbh | Device for removing gaseous contamination and device, in particular lithography system, with such a device |
Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4396579A (en) * | 1981-08-06 | 1983-08-02 | Miles Laboratories, Inc. | Luminescence detection device |
JPS61115326A (en) * | 1984-11-12 | 1986-06-02 | Oki Electric Ind Co Ltd | Etching of semiconductor substrate |
US5065140A (en) * | 1991-03-08 | 1991-11-12 | Bell Communications Research, Inc. | Early warning reactive gas detection system |
US5685895A (en) * | 1994-08-10 | 1997-11-11 | Nikon Corporation | Air cleaning apparatus used for an exposure apparatus |
US6096267A (en) * | 1997-02-28 | 2000-08-01 | Extraction Systems, Inc. | System for detecting base contaminants in air |
US20020018189A1 (en) * | 2000-06-01 | 2002-02-14 | Johannes Catharinus Hubertus Mulkens | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
EP1220038A1 (en) * | 2000-12-22 | 2002-07-03 | Asm Lithography B.V. | Lithographic apparatus and device manufacturing method |
US20030035087A1 (en) * | 1996-03-27 | 2003-02-20 | Nikon Corporation | Exposure apparatus and air-conditioning apparatus for use with exposure apparatus |
WO2004044656A2 (en) * | 2002-11-14 | 2004-05-27 | Infineon Technologies Ag | Method for washing an optical lens |
WO2004053958A1 (en) * | 2002-12-10 | 2004-06-24 | Nikon Corporation | Exposure apparatus and method for manufacturing device |
WO2005006026A2 (en) * | 2003-07-01 | 2005-01-20 | Nikon Corporation | Using isotopically specified fluids as optical elements |
EP1522894A2 (en) * | 2003-10-06 | 2005-04-13 | Matsushita Electric Industrial Co., Ltd. | Semiconductor fabrication apparatus and pattern formation method using the same |
US20050185155A1 (en) * | 2004-02-19 | 2005-08-25 | Yasuhiro Kishikawa | Exposure apparatus and method |
-
2005
- 2005-09-14 WO PCT/EP2005/009841 patent/WO2006029824A2/en active Application Filing
Patent Citations (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4396579A (en) * | 1981-08-06 | 1983-08-02 | Miles Laboratories, Inc. | Luminescence detection device |
JPS61115326A (en) * | 1984-11-12 | 1986-06-02 | Oki Electric Ind Co Ltd | Etching of semiconductor substrate |
US5065140A (en) * | 1991-03-08 | 1991-11-12 | Bell Communications Research, Inc. | Early warning reactive gas detection system |
US5685895A (en) * | 1994-08-10 | 1997-11-11 | Nikon Corporation | Air cleaning apparatus used for an exposure apparatus |
US20030035087A1 (en) * | 1996-03-27 | 2003-02-20 | Nikon Corporation | Exposure apparatus and air-conditioning apparatus for use with exposure apparatus |
US6096267A (en) * | 1997-02-28 | 2000-08-01 | Extraction Systems, Inc. | System for detecting base contaminants in air |
US20020018189A1 (en) * | 2000-06-01 | 2002-02-14 | Johannes Catharinus Hubertus Mulkens | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
EP1220038A1 (en) * | 2000-12-22 | 2002-07-03 | Asm Lithography B.V. | Lithographic apparatus and device manufacturing method |
WO2004044656A2 (en) * | 2002-11-14 | 2004-05-27 | Infineon Technologies Ag | Method for washing an optical lens |
WO2004053958A1 (en) * | 2002-12-10 | 2004-06-24 | Nikon Corporation | Exposure apparatus and method for manufacturing device |
EP1571699A1 (en) * | 2002-12-10 | 2005-09-07 | Nikon Corporation | Exposure apparatus and method for manufacturing device |
WO2005006026A2 (en) * | 2003-07-01 | 2005-01-20 | Nikon Corporation | Using isotopically specified fluids as optical elements |
EP1522894A2 (en) * | 2003-10-06 | 2005-04-13 | Matsushita Electric Industrial Co., Ltd. | Semiconductor fabrication apparatus and pattern formation method using the same |
US20050185155A1 (en) * | 2004-02-19 | 2005-08-25 | Yasuhiro Kishikawa | Exposure apparatus and method |
Non-Patent Citations (1)
Title |
---|
PATENT ABSTRACTS OF JAPAN vol. 010, no. 302 (E - 445) 15 October 1986 (1986-10-15) * |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7733459B2 (en) | 2003-08-29 | 2010-06-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US8629971B2 (en) | 2003-08-29 | 2014-01-14 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US8953144B2 (en) | 2003-08-29 | 2015-02-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US9025127B2 (en) | 2003-08-29 | 2015-05-05 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US9581914B2 (en) | 2003-08-29 | 2017-02-28 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
Also Published As
Publication number | Publication date |
---|---|
WO2006029824A2 (en) | 2006-03-23 |
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