WO2006036435A1 - Controlling electromechanical behavior of structures within a microelectromechanical systems device - Google Patents
Controlling electromechanical behavior of structures within a microelectromechanical systems device Download PDFInfo
- Publication number
- WO2006036435A1 WO2006036435A1 PCT/US2005/030902 US2005030902W WO2006036435A1 WO 2006036435 A1 WO2006036435 A1 WO 2006036435A1 US 2005030902 W US2005030902 W US 2005030902W WO 2006036435 A1 WO2006036435 A1 WO 2006036435A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- layer
- sacrificial
- etch
- etch barrier
- over
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/001—Optical devices or arrangements for the control of light using movable or deformable optical elements based on interference in an adjustable optical cavity
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
- B81B3/0064—Constitution or structural means for improving or controlling the physical properties of a device
- B81B3/0086—Electrical characteristics, e.g. reducing driving voltage, improving resistance to peak voltage
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
- B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
- B81C2201/0102—Surface micromachining
- B81C2201/0105—Sacrificial layer
- B81C2201/0109—Sacrificial layers not provided for in B81C2201/0107 - B81C2201/0108
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
- B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
- B81C2201/0128—Processes for removing material
- B81C2201/013—Etching
- B81C2201/0135—Controlling etch progression
- B81C2201/014—Controlling etch progression by depositing an etch stop layer, e.g. silicon nitride, silicon oxide, metal
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/05—Temporary protection of devices or parts of the devices during manufacturing
- B81C2201/053—Depositing a protective layers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Micromachines (AREA)
Abstract
Description
Claims
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007533493A JP2008514438A (en) | 2004-09-27 | 2005-08-30 | Control of electromechanical behavior of structures in microelectromechanical system devices |
BRPI0516020-0A BRPI0516020A (en) | 2004-09-27 | 2005-08-30 | control electromechanical behavior of structures in a device of microelectromechanical systems |
AU2005290030A AU2005290030A1 (en) | 2004-09-27 | 2005-08-30 | Controlling electromechanical behavior of structures within a microelectromechanical systems device |
MX2007003584A MX2007003584A (en) | 2004-09-27 | 2005-08-30 | Controlling electromechanical behavior of structures within a microelectromechanical systems device. |
CA002581670A CA2581670A1 (en) | 2004-09-27 | 2005-08-30 | Controlling electromechanical behavior of structures within a microelectromechanical systems device |
EP05802111A EP1803022A1 (en) | 2004-09-27 | 2005-08-30 | Controlling electromechanical behavior of structures within a microelectromechanical systems device |
IL181616A IL181616A0 (en) | 2004-09-27 | 2007-02-27 | Controlling electromechanical behaviour of structures within a microelectromechanical systems device |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US61346604P | 2004-09-27 | 2004-09-27 | |
US60/613,466 | 2004-09-27 | ||
US11/090,911 US7781850B2 (en) | 2002-09-20 | 2005-03-25 | Controlling electromechanical behavior of structures within a microelectromechanical systems device |
US11/090,911 | 2005-03-25 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2006036435A1 true WO2006036435A1 (en) | 2006-04-06 |
Family
ID=35501019
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2005/030902 WO2006036435A1 (en) | 2004-09-27 | 2005-08-30 | Controlling electromechanical behavior of structures within a microelectromechanical systems device |
Country Status (8)
Country | Link |
---|---|
US (2) | US7781850B2 (en) |
EP (1) | EP1803022A1 (en) |
JP (1) | JP2008514438A (en) |
KR (1) | KR20070062584A (en) |
AU (1) | AU2005290030A1 (en) |
CA (1) | CA2581670A1 (en) |
TW (1) | TWI374854B (en) |
WO (1) | WO2006036435A1 (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1990669A2 (en) * | 2007-05-11 | 2008-11-12 | Qualcomm Mems Technologies, Inc. | Method of fabrication MEMS by lamination and devices formed by same |
WO2010044654A1 (en) * | 2008-10-16 | 2010-04-22 | Miortech Holding B.V. | Electrowetting optical element arranged for preventing charge accumulation, and method for manufacturing an electrowetting optical element |
JP2013051426A (en) * | 2007-09-24 | 2013-03-14 | Qualcomm Mems Technologies Inc | Interferometric photovoltaic cell |
TWI461781B (en) * | 2011-06-03 | 2014-11-21 | Pixtronix Inc | Display device and display device |
US9128287B2 (en) | 2011-06-03 | 2015-09-08 | Pixtronix, Inc. | Display device |
Families Citing this family (39)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7297471B1 (en) * | 2003-04-15 | 2007-11-20 | Idc, Llc | Method for manufacturing an array of interferometric modulators |
US7550794B2 (en) * | 2002-09-20 | 2009-06-23 | Idc, Llc | Micromechanical systems device comprising a displaceable electrode and a charge-trapping layer |
US8928967B2 (en) | 1998-04-08 | 2015-01-06 | Qualcomm Mems Technologies, Inc. | Method and device for modulating light |
WO1999052006A2 (en) | 1998-04-08 | 1999-10-14 | Etalon, Inc. | Interferometric modulation of radiation |
US7781850B2 (en) * | 2002-09-20 | 2010-08-24 | Qualcomm Mems Technologies, Inc. | Controlling electromechanical behavior of structures within a microelectromechanical systems device |
KR101255691B1 (en) | 2004-07-29 | 2013-04-17 | 퀄컴 엠이엠에스 테크놀로지스, 인크. | System and method for micro-electromechanical operating of an interferometric modulator |
US7372613B2 (en) | 2004-09-27 | 2008-05-13 | Idc, Llc | Method and device for multistate interferometric light modulation |
US7944599B2 (en) | 2004-09-27 | 2011-05-17 | Qualcomm Mems Technologies, Inc. | Electromechanical device with optical function separated from mechanical and electrical function |
TWI262042B (en) * | 2004-12-20 | 2006-09-11 | Nan Ya Printed Circuit Board C | Method for cutting printed circuit board |
CN101228091A (en) | 2005-07-22 | 2008-07-23 | 高通股份有限公司 | Support structure for MEMS device and methods thereof |
EP2495212A3 (en) | 2005-07-22 | 2012-10-31 | QUALCOMM MEMS Technologies, Inc. | Mems devices having support structures and methods of fabricating the same |
US20070147761A1 (en) * | 2005-10-07 | 2007-06-28 | Kwakernaak Martin H | Amorphous silicon waveguides on lll/V substrates with barrier layer |
US7795061B2 (en) | 2005-12-29 | 2010-09-14 | Qualcomm Mems Technologies, Inc. | Method of creating MEMS device cavities by a non-etching process |
US7916980B2 (en) | 2006-01-13 | 2011-03-29 | Qualcomm Mems Technologies, Inc. | Interconnect structure for MEMS device |
US7382515B2 (en) * | 2006-01-18 | 2008-06-03 | Qualcomm Mems Technologies, Inc. | Silicon-rich silicon nitrides as etch stops in MEMS manufacture |
US7652814B2 (en) | 2006-01-27 | 2010-01-26 | Qualcomm Mems Technologies, Inc. | MEMS device with integrated optical element |
US7643203B2 (en) | 2006-04-10 | 2010-01-05 | Qualcomm Mems Technologies, Inc. | Interferometric optical display system with broadband characteristics |
US7711239B2 (en) * | 2006-04-19 | 2010-05-04 | Qualcomm Mems Technologies, Inc. | Microelectromechanical device and method utilizing nanoparticles |
US7369292B2 (en) | 2006-05-03 | 2008-05-06 | Qualcomm Mems Technologies, Inc. | Electrode and interconnect materials for MEMS devices |
US7733552B2 (en) | 2007-03-21 | 2010-06-08 | Qualcomm Mems Technologies, Inc | MEMS cavity-coating layers and methods |
GB2453105B (en) * | 2007-09-19 | 2011-01-12 | Wolfson Microelectronics Plc | MEMS device and process |
US20110273701A1 (en) * | 2007-09-28 | 2011-11-10 | QUAL COMM MEMS Technologies, Inc. | Methods for characterization of the mechanical properties of thin films and test structures for performing the same |
EP2285734A2 (en) * | 2008-05-12 | 2011-02-23 | Nxp B.V. | Mems devices and fabrication thereof |
US7851239B2 (en) | 2008-06-05 | 2010-12-14 | Qualcomm Mems Technologies, Inc. | Low temperature amorphous silicon sacrificial layer for controlled adhesion in MEMS devices |
JP2010009642A (en) * | 2008-06-24 | 2010-01-14 | Toshiba Corp | Semiconductor memory device and test method thereof |
US7782522B2 (en) | 2008-07-17 | 2010-08-24 | Qualcomm Mems Technologies, Inc. | Encapsulation methods for interferometric modulator and MEMS devices |
US11143896B2 (en) | 2008-12-11 | 2021-10-12 | Au Optronics Corp. | Touch device and touch display panel |
TWI376537B (en) * | 2008-12-11 | 2012-11-11 | Au Optronics Corp | Structure of touch device and touch panel |
US8551858B2 (en) * | 2010-02-03 | 2013-10-08 | Spansion Llc | Self-aligned SI rich nitride charge trap layer isolation for charge trap flash memory |
CN104053626B (en) * | 2011-10-28 | 2017-06-30 | 意法半导体股份有限公司 | For manufacturing the method for the protective layer for hydrofluoric acid etch, being provided with the semiconductor devices of the protective layer and manufacturing the method for the semiconductor devices |
ITTO20120834A1 (en) * | 2012-09-26 | 2014-03-27 | St Microelectronics Srl | INERTIAL SENSOR WITH ATTACK PROTECTION LAYER AND ITS MANUFACTURING METHOD |
ITTO20110989A1 (en) * | 2011-10-28 | 2013-04-29 | St Microelectronics Srl | MICROELETTROMECHANICAL DEVICE WITH PROTECTION LAYER FROM ATTACK AND RELATIVE MANUFACTURING METHOD |
KR102118578B1 (en) * | 2013-10-17 | 2020-06-04 | 삼성디스플레이 주식회사 | Organic light emitting diode display |
JP6425676B2 (en) * | 2016-03-17 | 2018-11-21 | 三菱電機株式会社 | Method of manufacturing display device |
US9828234B2 (en) | 2016-04-29 | 2017-11-28 | Taiwan Semiconductor Manufacturing Company Ltd. | Semiconductor MEMS structure and manufacturing method thereof |
US10029908B1 (en) * | 2016-12-30 | 2018-07-24 | Texas Instruments Incorporated | Dielectric cladding of microelectromechanical systems (MEMS) elements for improved reliability |
DE102017200156A1 (en) * | 2017-01-09 | 2018-07-12 | Robert Bosch Gmbh | Manufacturing method for a micromechanical sensor device and corresponding micromechanical sensor device |
US10593543B2 (en) * | 2017-06-05 | 2020-03-17 | Applied Materials, Inc. | Method of depositing doped amorphous silicon films with enhanced defect control, reduced substrate sensitivity to in-film defects and bubble-free film growth |
EP3653567B1 (en) | 2018-11-19 | 2024-01-10 | Sciosense B.V. | Method for manufacturing an integrated mems transducer device and integrated mems transducer device |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1995030924A1 (en) * | 1994-05-05 | 1995-11-16 | Etalon, Inc. | Visible spectrum modulator arrays |
EP0695959A1 (en) * | 1994-07-29 | 1996-02-07 | AT&T Corp. | Direct view display based on a micromechanical modulator |
WO1999052006A2 (en) * | 1998-04-08 | 1999-10-14 | Etalon, Inc. | Interferometric modulation of radiation |
WO2002024570A1 (en) * | 2000-09-25 | 2002-03-28 | Bookham Technology Plc | Micro electro-mechanical systems |
WO2005085932A2 (en) * | 2004-03-03 | 2005-09-15 | Idc, Llc | Altering temporal response of micro electromechanical elements |
Family Cites Families (492)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2534846A (en) | 1946-06-20 | 1950-12-19 | Emi Ltd | Color filter |
DE1288651B (en) | 1963-06-28 | 1969-02-06 | Siemens Ag | Arrangement of electrical dipoles for wavelengths below 1 mm and method for producing such an arrangement |
US3616312A (en) | 1966-04-15 | 1971-10-26 | Ionics | Hydrazine manufacture |
FR1603131A (en) | 1968-07-05 | 1971-03-22 | ||
US3813265A (en) | 1970-02-16 | 1974-05-28 | A Marks | Electro-optical dipolar material |
US3653741A (en) | 1970-02-16 | 1972-04-04 | Alvin M Marks | Electro-optical dipolar material |
US3725868A (en) | 1970-10-19 | 1973-04-03 | Burroughs Corp | Small reconfigurable processor for a variety of data processing applications |
DE2336930A1 (en) | 1973-07-20 | 1975-02-06 | Battelle Institut E V | INFRARED MODULATOR (II.) |
US4099854A (en) | 1976-10-12 | 1978-07-11 | The Unites States Of America As Represented By The Secretary Of The Navy | Optical notch filter utilizing electric dipole resonance absorption |
US4196396A (en) | 1976-10-15 | 1980-04-01 | Bell Telephone Laboratories, Incorporated | Interferometer apparatus using electro-optic material with feedback |
US4389096A (en) | 1977-12-27 | 1983-06-21 | Matsushita Electric Industrial Co., Ltd. | Image display apparatus of liquid crystal valve projection type |
US4663083A (en) | 1978-05-26 | 1987-05-05 | Marks Alvin M | Electro-optical dipole suspension with reflective-absorptive-transmissive characteristics |
US4445050A (en) | 1981-12-15 | 1984-04-24 | Marks Alvin M | Device for conversion of light power to electric power |
US4190488A (en) | 1978-08-21 | 1980-02-26 | International Business Machines Corporation | Etching method using noble gas halides |
US4228437A (en) | 1979-06-26 | 1980-10-14 | The United States Of America As Represented By The Secretary Of The Navy | Wideband polarization-transforming electromagnetic mirror |
NL8001281A (en) | 1980-03-04 | 1981-10-01 | Philips Nv | DISPLAY DEVICE. |
DE3012253A1 (en) | 1980-03-28 | 1981-10-15 | Hoechst Ag, 6000 Frankfurt | METHOD FOR VISIBLE MASKING OF CARGO IMAGES AND A DEVICE SUITABLE FOR THIS |
US4377324A (en) * | 1980-08-04 | 1983-03-22 | Honeywell Inc. | Graded index Fabry-Perot optical filter device |
US4441791A (en) | 1980-09-02 | 1984-04-10 | Texas Instruments Incorporated | Deformable mirror light modulator |
FR2506026A1 (en) | 1981-05-18 | 1982-11-19 | Radant Etudes | METHOD AND DEVICE FOR ANALYZING A HYPERFREQUENCY ELECTROMAGNETIC WAVE RADIATION BEAM |
NL8103377A (en) | 1981-07-16 | 1983-02-16 | Philips Nv | DISPLAY DEVICE. |
US4571603A (en) * | 1981-11-03 | 1986-02-18 | Texas Instruments Incorporated | Deformable mirror electrostatic printer |
NL8200354A (en) | 1982-02-01 | 1983-09-01 | Philips Nv | PASSIVE DISPLAY. |
US4500171A (en) * | 1982-06-02 | 1985-02-19 | Texas Instruments Incorporated | Process for plastic LCD fill hole sealing |
US4482213A (en) | 1982-11-23 | 1984-11-13 | Texas Instruments Incorporated | Perimeter seal reinforcement holes for plastic LCDs |
US4498953A (en) | 1983-07-27 | 1985-02-12 | At&T Bell Laboratories | Etching techniques |
US5633652A (en) | 1984-02-17 | 1997-05-27 | Canon Kabushiki Kaisha | Method for driving optical modulation device |
US4863245A (en) | 1984-02-28 | 1989-09-05 | Exxon Research And Engineering Company | Superlattice electrooptic devices |
DE3427986A1 (en) | 1984-07-28 | 1986-01-30 | Deutsche Thomson-Brandt Gmbh, 7730 Villingen-Schwenningen | CIRCUIT ARRANGEMENT FOR CONTROLLING LIQUID CRYSTAL DISPLAYS |
US4710732A (en) | 1984-07-31 | 1987-12-01 | Texas Instruments Incorporated | Spatial light modulator and method |
US4566935A (en) * | 1984-07-31 | 1986-01-28 | Texas Instruments Incorporated | Spatial light modulator and method |
US4596992A (en) | 1984-08-31 | 1986-06-24 | Texas Instruments Incorporated | Linear spatial light modulator and printer |
US5061049A (en) | 1984-08-31 | 1991-10-29 | Texas Instruments Incorporated | Spatial light modulator and method |
US4662746A (en) | 1985-10-30 | 1987-05-05 | Texas Instruments Incorporated | Spatial light modulator and method |
US5096279A (en) * | 1984-08-31 | 1992-03-17 | Texas Instruments Incorporated | Spatial light modulator and method |
US4560435A (en) | 1984-10-01 | 1985-12-24 | International Business Machines Corporation | Composite back-etch/lift-off stencil for proximity effect minimization |
US4615595A (en) | 1984-10-10 | 1986-10-07 | Texas Instruments Incorporated | Frame addressed spatial light modulator |
US4617608A (en) | 1984-12-28 | 1986-10-14 | At&T Bell Laboratories | Variable gap device and method of manufacture |
US5172262A (en) | 1985-10-30 | 1992-12-15 | Texas Instruments Incorporated | Spatial light modulator and method |
GB2186708B (en) | 1985-11-26 | 1990-07-11 | Sharp Kk | A variable interferometric device and a process for the production of the same |
GB8610129D0 (en) | 1986-04-25 | 1986-05-29 | Secr Defence | Electro-optical device |
US4748366A (en) | 1986-09-02 | 1988-05-31 | Taylor George W | Novel uses of piezoelectric materials for creating optical effects |
US4786128A (en) | 1986-12-02 | 1988-11-22 | Quantum Diagnostics, Ltd. | Device for modulating and reflecting electromagnetic radiation employing electro-optic layer having a variable index of refraction |
NL8701138A (en) | 1987-05-13 | 1988-12-01 | Philips Nv | ELECTROSCOPIC IMAGE DISPLAY. |
DE3716485C1 (en) | 1987-05-16 | 1988-11-24 | Heraeus Gmbh W C | Xenon short-arc discharge lamp |
US4900136A (en) * | 1987-08-11 | 1990-02-13 | North American Philips Corporation | Method of metallizing silica-containing gel and solid state light modulator incorporating the metallized gel |
US4956619A (en) | 1988-02-19 | 1990-09-11 | Texas Instruments Incorporated | Spatial light modulator |
JPH0242761A (en) | 1988-04-20 | 1990-02-13 | Matsushita Electric Ind Co Ltd | Manufacture of active matrix substrate |
US4880493A (en) | 1988-06-16 | 1989-11-14 | The United States Of America As Represented By The United States Department Of Energy | Electronic-carrier-controlled photochemical etching process in semiconductor device fabrication |
US4856863A (en) | 1988-06-22 | 1989-08-15 | Texas Instruments Incorporated | Optical fiber interconnection network including spatial light modulator |
US5028939A (en) | 1988-08-23 | 1991-07-02 | Texas Instruments Incorporated | Spatial light modulator system |
JP2700903B2 (en) * | 1988-09-30 | 1998-01-21 | シャープ株式会社 | Liquid crystal display |
US4982184A (en) * | 1989-01-03 | 1991-01-01 | General Electric Company | Electrocrystallochromic display and element |
KR100202246B1 (en) | 1989-02-27 | 1999-06-15 | 윌리엄 비. 켐플러 | Apparatus and method for digital video system |
US5192946A (en) * | 1989-02-27 | 1993-03-09 | Texas Instruments Incorporated | Digitized color video display system |
US5446479A (en) | 1989-02-27 | 1995-08-29 | Texas Instruments Incorporated | Multi-dimensional array video processor system |
US5214419A (en) | 1989-02-27 | 1993-05-25 | Texas Instruments Incorporated | Planarized true three dimensional display |
US5170156A (en) | 1989-02-27 | 1992-12-08 | Texas Instruments Incorporated | Multi-frequency two dimensional display system |
US5079544A (en) * | 1989-02-27 | 1992-01-07 | Texas Instruments Incorporated | Standard independent digitized video system |
US5272473A (en) | 1989-02-27 | 1993-12-21 | Texas Instruments Incorporated | Reduced-speckle display system |
US5287096A (en) * | 1989-02-27 | 1994-02-15 | Texas Instruments Incorporated | Variable luminosity display system |
US5214420A (en) | 1989-02-27 | 1993-05-25 | Texas Instruments Incorporated | Spatial light modulator projection system with random polarity light |
US5206629A (en) | 1989-02-27 | 1993-04-27 | Texas Instruments Incorporated | Spatial light modulator and memory for digitized video display |
US5162787A (en) | 1989-02-27 | 1992-11-10 | Texas Instruments Incorporated | Apparatus and method for digitized video system utilizing a moving display surface |
US4900395A (en) * | 1989-04-07 | 1990-02-13 | Fsi International, Inc. | HF gas etching of wafers in an acid processor |
US5022745A (en) | 1989-09-07 | 1991-06-11 | Massachusetts Institute Of Technology | Electrostatically deformable single crystal dielectrically coated mirror |
US4954789A (en) | 1989-09-28 | 1990-09-04 | Texas Instruments Incorporated | Spatial light modulator |
US5381253A (en) * | 1991-11-14 | 1995-01-10 | Board Of Regents Of University Of Colorado | Chiral smectic liquid crystal optical modulators having variable retardation |
US5124834A (en) | 1989-11-16 | 1992-06-23 | General Electric Company | Transferrable, self-supporting pellicle for elastomer light valve displays and method for making the same |
US5037173A (en) | 1989-11-22 | 1991-08-06 | Texas Instruments Incorporated | Optical interconnection network |
JP2910114B2 (en) | 1990-01-20 | 1999-06-23 | ソニー株式会社 | Electronics |
US5500635A (en) * | 1990-02-20 | 1996-03-19 | Mott; Jonathan C. | Products incorporating piezoelectric material |
US5279990A (en) | 1990-03-02 | 1994-01-18 | Motorola, Inc. | Method of making a small geometry contact using sidewall spacers |
CH682523A5 (en) * | 1990-04-20 | 1993-09-30 | Suisse Electronique Microtech | A modulation matrix addressed light. |
GB9012099D0 (en) | 1990-05-31 | 1990-07-18 | Kodak Ltd | Optical article for multicolour imaging |
US5142405A (en) | 1990-06-29 | 1992-08-25 | Texas Instruments Incorporated | Bistable dmd addressing circuit and method |
US5099353A (en) * | 1990-06-29 | 1992-03-24 | Texas Instruments Incorporated | Architecture and process for integrating DMD with control circuit substrates |
US5083857A (en) * | 1990-06-29 | 1992-01-28 | Texas Instruments Incorporated | Multi-level deformable mirror device |
US5018256A (en) | 1990-06-29 | 1991-05-28 | Texas Instruments Incorporated | Architecture and process for integrating DMD with control circuit substrates |
US5216537A (en) | 1990-06-29 | 1993-06-01 | Texas Instruments Incorporated | Architecture and process for integrating DMD with control circuit substrates |
DE69113150T2 (en) * | 1990-06-29 | 1996-04-04 | Texas Instruments Inc | Deformable mirror device with updated grid. |
US5153771A (en) | 1990-07-18 | 1992-10-06 | Northrop Corporation | Coherent light modulation and detector |
US5192395A (en) * | 1990-10-12 | 1993-03-09 | Texas Instruments Incorporated | Method of making a digital flexure beam accelerometer |
US5526688A (en) | 1990-10-12 | 1996-06-18 | Texas Instruments Incorporated | Digital flexure beam accelerometer and method |
US5044736A (en) | 1990-11-06 | 1991-09-03 | Motorola, Inc. | Configurable optical filter or display |
US5331454A (en) | 1990-11-13 | 1994-07-19 | Texas Instruments Incorporated | Low reset voltage process for DMD |
US5602671A (en) * | 1990-11-13 | 1997-02-11 | Texas Instruments Incorporated | Low surface energy passivation layer for micromechanical devices |
FR2669466B1 (en) | 1990-11-16 | 1997-11-07 | Michel Haond | METHOD FOR ENGRAVING INTEGRATED CIRCUIT LAYERS WITH FIXED DEPTH AND CORRESPONDING INTEGRATED CIRCUIT. |
US5233459A (en) | 1991-03-06 | 1993-08-03 | Massachusetts Institute Of Technology | Electric display device |
US5136669A (en) | 1991-03-15 | 1992-08-04 | Sperry Marine Inc. | Variable ratio fiber optic coupler optical signal processing element |
US5358806A (en) | 1991-03-19 | 1994-10-25 | Hitachi, Ltd. | Phase shift mask, method of correcting the same and apparatus for carrying out the method |
US5439763A (en) | 1991-03-19 | 1995-08-08 | Hitachi, Ltd. | Optical mask and method of correcting the same |
CA2063744C (en) | 1991-04-01 | 2002-10-08 | Paul M. Urbanus | Digital micromirror device architecture and timing for use in a pulse-width modulated display system |
US5142414A (en) | 1991-04-22 | 1992-08-25 | Koehler Dale R | Electrically actuatable temporal tristimulus-color device |
US5226099A (en) | 1991-04-26 | 1993-07-06 | Texas Instruments Incorporated | Digital micromirror shutter device |
FR2679057B1 (en) * | 1991-07-11 | 1995-10-20 | Morin Francois | LIQUID CRYSTAL, ACTIVE MATRIX AND HIGH DEFINITION SCREEN STRUCTURE. |
US5179274A (en) * | 1991-07-12 | 1993-01-12 | Texas Instruments Incorporated | Method for controlling operation of optical systems and devices |
US5168406A (en) | 1991-07-31 | 1992-12-01 | Texas Instruments Incorporated | Color deformable mirror device and method for manufacture |
US5254980A (en) | 1991-09-06 | 1993-10-19 | Texas Instruments Incorporated | DMD display system controller |
CH680534A5 (en) | 1991-09-16 | 1992-09-15 | Landis & Gyr Betriebs Ag | Fabry=perot sensor for optical parameter measurement - uses two opposing mirrors respectively attached to deflected measuring membrane and transparent plate |
US5358601A (en) | 1991-09-24 | 1994-10-25 | Micron Technology, Inc. | Process for isotropically etching semiconductor devices |
US5563398A (en) | 1991-10-31 | 1996-10-08 | Texas Instruments Incorporated | Spatial light modulator scanning system |
CA2081753C (en) | 1991-11-22 | 2002-08-06 | Jeffrey B. Sampsell | Dmd scanner |
CH681047A5 (en) | 1991-11-25 | 1992-12-31 | Landis & Gyr Betriebs Ag | Measuring parameter, esp. pressure difference, using Fabry-Perot detector - controlling optical length of detector according to output parameter to determine working point on graph |
US5233385A (en) | 1991-12-18 | 1993-08-03 | Texas Instruments Incorporated | White light enhanced color field sequential projection |
US5233456A (en) | 1991-12-20 | 1993-08-03 | Texas Instruments Incorporated | Resonant mirror and method of manufacture |
US5228013A (en) | 1992-01-10 | 1993-07-13 | Bik Russell J | Clock-painting device and method for indicating the time-of-day with a non-traditional, now analog artistic panel of digital electronic visual displays |
CA2087625C (en) | 1992-01-23 | 2006-12-12 | William E. Nelson | Non-systolic time delay and integration printing |
US5296950A (en) * | 1992-01-31 | 1994-03-22 | Texas Instruments Incorporated | Optical signal free-space conversion board |
US5231532A (en) | 1992-02-05 | 1993-07-27 | Texas Instruments Incorporated | Switchable resonant filter for optical radiation |
US5212582A (en) | 1992-03-04 | 1993-05-18 | Texas Instruments Incorporated | Electrostatically controlled beam steering device and method |
DE69310974T2 (en) | 1992-03-25 | 1997-11-06 | Texas Instruments Inc | Built-in optical calibration system |
US5312513A (en) | 1992-04-03 | 1994-05-17 | Texas Instruments Incorporated | Methods of forming multiple phase light modulators |
US5401983A (en) * | 1992-04-08 | 1995-03-28 | Georgia Tech Research Corporation | Processes for lift-off of thin film materials or devices for fabricating three dimensional integrated circuits, optical detectors, and micromechanical devices |
US5190637A (en) | 1992-04-24 | 1993-03-02 | Wisconsin Alumni Research Foundation | Formation of microstructures by multiple level deep X-ray lithography with sacrificial metal layers |
US5311360A (en) | 1992-04-28 | 1994-05-10 | The Board Of Trustees Of The Leland Stanford, Junior University | Method and apparatus for modulating a light beam |
TW245772B (en) * | 1992-05-19 | 1995-04-21 | Akzo Nv | |
JPH0651250A (en) * | 1992-05-20 | 1994-02-25 | Texas Instr Inc <Ti> | Monolithic space optical modulator and memory package |
US5638084A (en) | 1992-05-22 | 1997-06-10 | Dielectric Systems International, Inc. | Lighting-independent color video display |
JPH06214169A (en) | 1992-06-08 | 1994-08-05 | Texas Instr Inc <Ti> | Controllable optical and periodic surface filter |
DE69332407T2 (en) | 1992-06-17 | 2003-06-18 | Harris Corp | Manufacture of semiconductor devices on SOI substrates |
US5347377A (en) | 1992-06-17 | 1994-09-13 | Eastman Kodak Company | Planar waveguide liquid crystal variable retarder |
US5818095A (en) * | 1992-08-11 | 1998-10-06 | Texas Instruments Incorporated | High-yield spatial light modulator with light blocking layer |
US5345328A (en) | 1992-08-12 | 1994-09-06 | Sandia Corporation | Tandem resonator reflectance modulator |
US5293272A (en) * | 1992-08-24 | 1994-03-08 | Physical Optics Corporation | High finesse holographic fabry-perot etalon and method of fabricating |
US5327286A (en) | 1992-08-31 | 1994-07-05 | Texas Instruments Incorporated | Real time optical correlation system |
US5325116A (en) | 1992-09-18 | 1994-06-28 | Texas Instruments Incorporated | Device for writing to and reading from optical storage media |
US5296775A (en) | 1992-09-24 | 1994-03-22 | International Business Machines Corporation | Cooling microfan arrangements and process |
US5659374A (en) | 1992-10-23 | 1997-08-19 | Texas Instruments Incorporated | Method of repairing defective pixels |
US5312512A (en) | 1992-10-23 | 1994-05-17 | Ncr Corporation | Global planarization using SOG and CMP |
JP3547160B2 (en) | 1993-01-11 | 2004-07-28 | テキサス インスツルメンツ インコーポレイテツド | Spatial light modulator |
US6674562B1 (en) * | 1994-05-05 | 2004-01-06 | Iridigm Display Corporation | Interferometric modulation of radiation |
US5461411A (en) | 1993-03-29 | 1995-10-24 | Texas Instruments Incorporated | Process and architecture for digital micromirror printer |
US5559358A (en) | 1993-05-25 | 1996-09-24 | Honeywell Inc. | Opto-electro-mechanical device or filter, process for making, and sensors made therefrom |
JP3524122B2 (en) | 1993-05-25 | 2004-05-10 | キヤノン株式会社 | Display control device |
DE4317274A1 (en) | 1993-05-25 | 1994-12-01 | Bosch Gmbh Robert | Process for the production of surface-micromechanical structures |
US5324683A (en) | 1993-06-02 | 1994-06-28 | Motorola, Inc. | Method of forming a semiconductor structure having an air region |
US5489952A (en) | 1993-07-14 | 1996-02-06 | Texas Instruments Incorporated | Method and device for multi-format television |
US5673139A (en) | 1993-07-19 | 1997-09-30 | Medcom, Inc. | Microelectromechanical television scanning device and method for making the same |
US5365283A (en) | 1993-07-19 | 1994-11-15 | Texas Instruments Incorporated | Color phase control for projection display using spatial light modulator |
US5526172A (en) | 1993-07-27 | 1996-06-11 | Texas Instruments Incorporated | Microminiature, monolithic, variable electrical signal processor and apparatus including same |
US5581272A (en) | 1993-08-25 | 1996-12-03 | Texas Instruments Incorporated | Signal generator for controlling a spatial light modulator |
US5552925A (en) | 1993-09-07 | 1996-09-03 | John M. Baker | Electro-micro-mechanical shutters on transparent substrates |
FR2710161B1 (en) | 1993-09-13 | 1995-11-24 | Suisse Electronique Microtech | Miniature array of light shutters. |
US5457493A (en) | 1993-09-15 | 1995-10-10 | Texas Instruments Incorporated | Digital micro-mirror based image simulation system |
US5629790A (en) | 1993-10-18 | 1997-05-13 | Neukermans; Armand P. | Micromachined torsional scanner |
US5497197A (en) * | 1993-11-04 | 1996-03-05 | Texas Instruments Incorporated | System and method for packaging data into video processor |
US5526051A (en) | 1993-10-27 | 1996-06-11 | Texas Instruments Incorporated | Digital television system |
US5459602A (en) | 1993-10-29 | 1995-10-17 | Texas Instruments | Micro-mechanical optical shutter |
US5452024A (en) | 1993-11-01 | 1995-09-19 | Texas Instruments Incorporated | DMD display system |
WO1995012774A1 (en) | 1993-11-05 | 1995-05-11 | Mitsubishi Jidosha Kogyo Kabushiki Kaisha | Speed change control method for an automatic transmission |
US5517347A (en) | 1993-12-01 | 1996-05-14 | Texas Instruments Incorporated | Direct view deformable mirror device |
CA2137059C (en) | 1993-12-03 | 2004-11-23 | Texas Instruments Incorporated | Dmd architecture to improve horizontal resolution |
US5583688A (en) | 1993-12-21 | 1996-12-10 | Texas Instruments Incorporated | Multi-level digital micromirror device |
US5448314A (en) | 1994-01-07 | 1995-09-05 | Texas Instruments | Method and apparatus for sequential color imaging |
US5500761A (en) | 1994-01-27 | 1996-03-19 | At&T Corp. | Micromechanical modulator |
US5444566A (en) | 1994-03-07 | 1995-08-22 | Texas Instruments Incorporated | Optimized electronic operation of digital micromirror devices |
JPH07253594A (en) * | 1994-03-15 | 1995-10-03 | Fujitsu Ltd | Display device |
US5526327A (en) | 1994-03-15 | 1996-06-11 | Cordova, Jr.; David J. | Spatial displacement time display |
EP0674208A1 (en) | 1994-03-22 | 1995-09-27 | Shinto Paint Co., Ltd. | Method for manufacturing of color filter and liquid crystal display |
US5665997A (en) | 1994-03-31 | 1997-09-09 | Texas Instruments Incorporated | Grated landing area to eliminate sticking of micro-mechanical devices |
US5690839A (en) * | 1994-05-04 | 1997-11-25 | Daewoo Electronics Co., Ltd. | Method for forming an array of thin film actuated mirrors |
US7460291B2 (en) * | 1994-05-05 | 2008-12-02 | Idc, Llc | Separable modulator |
US6040937A (en) | 1994-05-05 | 2000-03-21 | Etalon, Inc. | Interferometric modulation |
US6680792B2 (en) | 1994-05-05 | 2004-01-20 | Iridigm Display Corporation | Interferometric modulation of radiation |
US7550794B2 (en) | 2002-09-20 | 2009-06-23 | Idc, Llc | Micromechanical systems device comprising a displaceable electrode and a charge-trapping layer |
US20010003487A1 (en) | 1996-11-05 | 2001-06-14 | Mark W. Miles | Visible spectrum modulator arrays |
US7123216B1 (en) | 1994-05-05 | 2006-10-17 | Idc, Llc | Photonic MEMS and structures |
US6710908B2 (en) | 1994-05-05 | 2004-03-23 | Iridigm Display Corporation | Controlling micro-electro-mechanical cavities |
KR950033432A (en) | 1994-05-12 | 1995-12-26 | 윌리엄 이. 힐러 | Spatial Light Modulator Display Pointing Device |
KR0135391B1 (en) | 1994-05-28 | 1998-04-22 | 김광호 | Self aligned thin film transistor for lcd and manufacture |
US5497172A (en) * | 1994-06-13 | 1996-03-05 | Texas Instruments Incorporated | Pulse width modulation for spatial light modulator with split reset addressing |
US5673106A (en) | 1994-06-17 | 1997-09-30 | Texas Instruments Incorporated | Printing system with self-monitoring and adjustment |
US5454906A (en) | 1994-06-21 | 1995-10-03 | Texas Instruments Inc. | Method of providing sacrificial spacer for micro-mechanical devices |
US5499062A (en) * | 1994-06-23 | 1996-03-12 | Texas Instruments Incorporated | Multiplexed memory timing with block reset and secondary memory |
JPH0822024A (en) | 1994-07-05 | 1996-01-23 | Mitsubishi Electric Corp | Active matrix substrate and its production |
US5485304A (en) | 1994-07-29 | 1996-01-16 | Texas Instruments, Inc. | Support posts for micro-mechanical devices |
US5656554A (en) | 1994-07-29 | 1997-08-12 | International Business Machines Corporation | Semiconductor chip reclamation technique involving multiple planarization processes |
RU2143127C1 (en) | 1994-09-02 | 1999-12-20 | Рэд Хассан Дэббедж | Modulator of light-valve system of reflection type |
US5703710A (en) | 1994-09-09 | 1997-12-30 | Deacon Research | Method for manipulating optical energy using poled structure |
US6053617A (en) | 1994-09-23 | 2000-04-25 | Texas Instruments Incorporated | Manufacture method for micromechanical devices |
US5619059A (en) | 1994-09-28 | 1997-04-08 | National Research Council Of Canada | Color deformable mirror device having optical thin film interference color coatings |
US6560018B1 (en) | 1994-10-27 | 2003-05-06 | Massachusetts Institute Of Technology | Illumination system for transmissive light valve displays |
US5650881A (en) | 1994-11-02 | 1997-07-22 | Texas Instruments Incorporated | Support post architecture for micromechanical devices |
US5552924A (en) | 1994-11-14 | 1996-09-03 | Texas Instruments Incorporated | Micromechanical device having an improved beam |
US5474865A (en) | 1994-11-21 | 1995-12-12 | Sematech, Inc. | Globally planarized binary optical mask using buried absorbers |
JPH08153700A (en) | 1994-11-25 | 1996-06-11 | Semiconductor Energy Lab Co Ltd | Anisotropic etching of electrically conductive coating |
US5610624A (en) * | 1994-11-30 | 1997-03-11 | Texas Instruments Incorporated | Spatial light modulator with reduced possibility of an on state defect |
US5726480A (en) * | 1995-01-27 | 1998-03-10 | The Regents Of The University Of California | Etchants for use in micromachining of CMOS Microaccelerometers and microelectromechanical devices and method of making the same |
US5567334A (en) | 1995-02-27 | 1996-10-22 | Texas Instruments Incorporated | Method for creating a digital micromirror device using an aluminum hard mask |
US5610438A (en) * | 1995-03-08 | 1997-03-11 | Texas Instruments Incorporated | Micro-mechanical device with non-evaporable getter |
US5636185A (en) | 1995-03-10 | 1997-06-03 | Boit Incorporated | Dynamically changing liquid crystal display timekeeping apparatus |
US5535047A (en) | 1995-04-18 | 1996-07-09 | Texas Instruments Incorporated | Active yoke hidden hinge digital micromirror device |
US5784190A (en) | 1995-04-27 | 1998-07-21 | John M. Baker | Electro-micro-mechanical shutters on transparent substrates |
US5641391A (en) | 1995-05-15 | 1997-06-24 | Hunter; Ian W. | Three dimensional microfabrication by localized electrodeposition and etching |
US6969635B2 (en) * | 2000-12-07 | 2005-11-29 | Reflectivity, Inc. | Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates |
US6849471B2 (en) | 2003-03-28 | 2005-02-01 | Reflectivity, Inc. | Barrier layers for microelectromechanical systems |
US6046840A (en) | 1995-06-19 | 2000-04-04 | Reflectivity, Inc. | Double substrate reflective spatial light modulator with self-limiting micro-mechanical elements |
JP3489273B2 (en) | 1995-06-27 | 2004-01-19 | 株式会社デンソー | Manufacturing method of semiconductor dynamic quantity sensor |
JP3477924B2 (en) * | 1995-06-30 | 2003-12-10 | 株式会社デンソー | Method of manufacturing semiconductor dynamic quantity sensor |
US5739945A (en) | 1995-09-29 | 1998-04-14 | Tayebati; Parviz | Electrically tunable optical filter utilizing a deformable multi-layer mirror |
US6324192B1 (en) | 1995-09-29 | 2001-11-27 | Coretek, Inc. | Electrically tunable fabry-perot structure utilizing a deformable multi-layer mirror and method of making the same |
GB9522135D0 (en) | 1995-10-30 | 1996-01-03 | John Mcgavigan Holdings Limite | Display panels |
US5825528A (en) | 1995-12-26 | 1998-10-20 | Lucent Technologies Inc. | Phase-mismatched fabry-perot cavity micromechanical modulator |
JP3799092B2 (en) | 1995-12-29 | 2006-07-19 | アジレント・テクノロジーズ・インク | Light modulation device and display device |
US5771321A (en) | 1996-01-04 | 1998-06-23 | Massachusetts Institute Of Technology | Micromechanical optical switch and flat panel display |
US5638946A (en) | 1996-01-11 | 1997-06-17 | Northeastern University | Micromechanical switch with insulated switch contact |
US5967163A (en) | 1996-01-30 | 1999-10-19 | Abbott Laboratories | Actuator and method |
US5751469A (en) | 1996-02-01 | 1998-05-12 | Lucent Technologies Inc. | Method and apparatus for an improved micromechanical modulator |
US6582921B2 (en) | 1996-07-29 | 2003-06-24 | Nanosphere, Inc. | Nanoparticles having oligonucleotides attached thereto and uses thereof |
US5710656A (en) * | 1996-07-30 | 1998-01-20 | Lucent Technologies Inc. | Micromechanical optical modulator having a reduced-mass composite membrane |
US5793504A (en) | 1996-08-07 | 1998-08-11 | Northrop Grumman Corporation | Hybrid angular/spatial holographic multiplexer |
US5838484A (en) | 1996-08-19 | 1998-11-17 | Lucent Technologies Inc. | Micromechanical optical modulator with linear operating characteristic |
US5912758A (en) | 1996-09-11 | 1999-06-15 | Texas Instruments Incorporated | Bipolar reset for spatial light modulators |
US5884083A (en) * | 1996-09-20 | 1999-03-16 | Royce; Robert | Computer system to compile non-incremental computer source code to execute within an incremental type computer system |
US5771116A (en) | 1996-10-21 | 1998-06-23 | Texas Instruments Incorporated | Multiple bias level reset waveform for enhanced DMD control |
DE19730715C1 (en) | 1996-11-12 | 1998-11-26 | Fraunhofer Ges Forschung | Method of manufacturing a micromechanical relay |
US5683649A (en) | 1996-11-14 | 1997-11-04 | Eastman Kodak Company | Method for the fabrication of micro-electromechanical ceramic parts |
JPH10209471A (en) * | 1997-01-20 | 1998-08-07 | Aisin Seiki Co Ltd | Semiconductor micromachine and fabrication thereof |
ATE255769T1 (en) | 1997-01-21 | 2003-12-15 | Georgia Tech Res Inst | METHOD FOR MAKING AN AIR GAP SEMICONDUCTOR DEVICE FOR ULTRA-LOW CAPACITY INTERCONNECTIONS |
JPH10260641A (en) | 1997-03-17 | 1998-09-29 | Nec Corp | Mount structure for driver ic for flat panel type display device |
EP0877272B1 (en) * | 1997-05-08 | 2002-07-31 | Texas Instruments Incorporated | Improvements in or relating to spatial light modulators |
GB9709659D0 (en) | 1997-05-13 | 1997-07-02 | Surface Tech Sys Ltd | Method and apparatus for etching a workpiece |
US6480177B2 (en) | 1997-06-04 | 2002-11-12 | Texas Instruments Incorporated | Blocked stepped address voltage for micromechanical devices |
US5808780A (en) | 1997-06-09 | 1998-09-15 | Texas Instruments Incorporated | Non-contacting micromechanical optical switch |
US5867302A (en) * | 1997-08-07 | 1999-02-02 | Sandia Corporation | Bistable microelectromechanical actuator |
US6031653A (en) | 1997-08-28 | 2000-02-29 | California Institute Of Technology | Low-cost thin-metal-film interference filters |
US5994174A (en) | 1997-09-29 | 1999-11-30 | The Regents Of The University Of California | Method of fabrication of display pixels driven by silicon thin film transistors |
US5822170A (en) | 1997-10-09 | 1998-10-13 | Honeywell Inc. | Hydrophobic coating for reducing humidity effect in electrostatic actuators |
US5972193A (en) | 1997-10-10 | 1999-10-26 | Industrial Technology Research Institute | Method of manufacturing a planar coil using a transparency substrate |
WO1999023832A1 (en) * | 1997-10-31 | 1999-05-14 | Daewoo Electronics Co., Ltd. | Method for manufacturing thin film actuated mirror array in an optical projection system |
US6008123A (en) | 1997-11-04 | 1999-12-28 | Lucent Technologies Inc. | Method for using a hardmask to form an opening in a semiconductor substrate |
US5945980A (en) | 1997-11-14 | 1999-08-31 | Logitech, Inc. | Touchpad with active plane for pen detection |
US6028690A (en) * | 1997-11-26 | 2000-02-22 | Texas Instruments Incorporated | Reduced micromirror mirror gaps for improved contrast ratio |
US6180428B1 (en) * | 1997-12-12 | 2001-01-30 | Xerox Corporation | Monolithic scanning light emitting devices using micromachining |
KR100253378B1 (en) | 1997-12-15 | 2000-04-15 | 김영환 | Apparatus for displaying output data in asic(application specific ic) |
JPH11211999A (en) | 1998-01-28 | 1999-08-06 | Teijin Ltd | Optical modulating element and display device |
US6016693A (en) * | 1998-02-09 | 2000-01-25 | The Regents Of The University Of California | Microfabrication of cantilevers using sacrificial templates |
US6660656B2 (en) | 1998-02-11 | 2003-12-09 | Applied Materials Inc. | Plasma processes for depositing low dielectric constant films |
US6340435B1 (en) * | 1998-02-11 | 2002-01-22 | Applied Materials, Inc. | Integrated low K dielectrics and etch stops |
US6610440B1 (en) | 1998-03-10 | 2003-08-26 | Bipolar Technologies, Inc | Microscopic batteries for MEMS systems |
US6195196B1 (en) * | 1998-03-13 | 2001-02-27 | Fuji Photo Film Co., Ltd. | Array-type exposing device and flat type display incorporating light modulator and driving method thereof |
US6689211B1 (en) * | 1999-04-09 | 2004-02-10 | Massachusetts Institute Of Technology | Etch stop layer system |
EP0951068A1 (en) | 1998-04-17 | 1999-10-20 | Interuniversitair Micro-Elektronica Centrum Vzw | Method of fabrication of a microstructure having an inside cavity |
US5943158A (en) | 1998-05-05 | 1999-08-24 | Lucent Technologies Inc. | Micro-mechanical, anti-reflection, switched optical modulator array and fabrication method |
US6160833A (en) | 1998-05-06 | 2000-12-12 | Xerox Corporation | Blue vertical cavity surface emitting laser |
US6166422A (en) | 1998-05-13 | 2000-12-26 | Lsi Logic Corporation | Inductor with cobalt/nickel core for integrated circuit structure with high inductance and high Q-factor |
US6282010B1 (en) | 1998-05-14 | 2001-08-28 | Texas Instruments Incorporated | Anti-reflective coatings for spatial light modulators |
US6858080B2 (en) * | 1998-05-15 | 2005-02-22 | Apollo Diamond, Inc. | Tunable CVD diamond structures |
US6046659A (en) | 1998-05-15 | 2000-04-04 | Hughes Electronics Corporation | Design and fabrication of broadband surface-micromachined micro-electro-mechanical switches for microwave and millimeter-wave applications |
US6323982B1 (en) | 1998-05-22 | 2001-11-27 | Texas Instruments Incorporated | Yield superstructure for digital micromirror device |
US6147790A (en) | 1998-06-02 | 2000-11-14 | Texas Instruments Incorporated | Spring-ring micromechanical device |
US6430332B1 (en) | 1998-06-05 | 2002-08-06 | Fiber, Llc | Optical switching apparatus |
JP4177557B2 (en) | 1998-06-08 | 2008-11-05 | 株式会社カネカ | Resistive touch panel for use in liquid crystal display device and liquid crystal display device including the same |
US6496122B2 (en) | 1998-06-26 | 2002-12-17 | Sharp Laboratories Of America, Inc. | Image display and remote control system capable of displaying two distinct images |
US6395618B2 (en) | 1998-07-10 | 2002-05-28 | Stmicroelectronics S.R.L. | Method for manufacturing integrated structures including removing a sacrificial region |
US6100477A (en) * | 1998-07-17 | 2000-08-08 | Texas Instruments Incorporated | Recessed etch RF micro-electro-mechanical switch |
US5976902A (en) | 1998-08-03 | 1999-11-02 | Industrial Technology Research Institute | Method of fabricating a fully self-aligned TFT-LCD |
KR100281182B1 (en) | 1998-08-10 | 2001-04-02 | 윤종용 | Method for forming self-aligned contacts in semiconductor devices |
US6057903A (en) | 1998-08-18 | 2000-05-02 | International Business Machines Corporation | Liquid crystal display device employing a guard plane between a layer for measuring touch position and common electrode layer |
US6710539B2 (en) | 1998-09-02 | 2004-03-23 | Micron Technology, Inc. | Field emission devices having structure for reduced emitter tip to gate spacing |
US6113239A (en) | 1998-09-04 | 2000-09-05 | Sharp Laboratories Of America, Inc. | Projection display system for reflective light valves |
DE19938072A1 (en) | 1998-09-09 | 2000-03-16 | Siemens Ag | Self-aligned structure, especially for semiconductor, micro-optical or micromechanical devices, is produced using an existing substrate structure as mask for back face resist layer exposure |
US6249039B1 (en) | 1998-09-10 | 2001-06-19 | Bourns, Inc. | Integrated inductive components and method of fabricating such components |
JP4074714B2 (en) * | 1998-09-25 | 2008-04-09 | 富士フイルム株式会社 | Array type light modulation element and flat display driving method |
US6323834B1 (en) | 1998-10-08 | 2001-11-27 | International Business Machines Corporation | Micromechanical displays and fabrication method |
DE19847455A1 (en) * | 1998-10-15 | 2000-04-27 | Bosch Gmbh Robert | Silicon multi-layer etching, especially for micromechanical sensor production, comprises etching trenches down to buried separation layer, etching exposed separation layer and etching underlying silicon layer |
JP3919954B2 (en) | 1998-10-16 | 2007-05-30 | 富士フイルム株式会社 | Array type light modulation element and flat display driving method |
US6115326A (en) | 1998-10-22 | 2000-09-05 | Integrated Medical Systems, Inc. | Ultrasonic micro-machined selectable transducer array |
US6171945B1 (en) * | 1998-10-22 | 2001-01-09 | Applied Materials, Inc. | CVD nanoporous silica low dielectric constant films |
US6288824B1 (en) | 1998-11-03 | 2001-09-11 | Alex Kastalsky | Display device based on grating electromechanical shutter |
KR100281241B1 (en) | 1998-11-19 | 2001-06-01 | 하대규 | Plasma etching by changing the lattice plane of the top of Faraday box |
US6391675B1 (en) | 1998-11-25 | 2002-05-21 | Raytheon Company | Method and apparatus for switching high frequency signals |
KR100301050B1 (en) | 1998-12-14 | 2002-06-20 | 윤종용 | Method of manufacturing capacitor of semiconductor device including contacts |
US6194323B1 (en) * | 1998-12-16 | 2001-02-27 | Lucent Technologies Inc. | Deep sub-micron metal etch with in-situ hard mask etch |
EP1145338B1 (en) | 1998-12-16 | 2012-12-05 | Samsung Display Co., Ltd. | Environmental barrier material for organic light emitting device and method of making |
US6284560B1 (en) | 1998-12-18 | 2001-09-04 | Eastman Kodak Company | Method for producing co-planar surface structures |
US6335831B2 (en) * | 1998-12-18 | 2002-01-01 | Eastman Kodak Company | Multilevel mechanical grating device |
US6215221B1 (en) | 1998-12-29 | 2001-04-10 | Honeywell International Inc. | Electrostatic/pneumatic actuators for active surfaces |
US6210988B1 (en) | 1999-01-15 | 2001-04-03 | The Regents Of The University Of California | Polycrystalline silicon germanium films for forming micro-electromechanical systems |
JP2000214804A (en) | 1999-01-20 | 2000-08-04 | Fuji Photo Film Co Ltd | Light modulation element, aligner, and planar display |
US6537427B1 (en) * | 1999-02-04 | 2003-03-25 | Micron Technology, Inc. | Deposition of smooth aluminum films |
JP2000267140A (en) | 1999-03-16 | 2000-09-29 | Fujitsu Ltd | Production of liquid crystal display device |
US6606175B1 (en) | 1999-03-16 | 2003-08-12 | Sharp Laboratories Of America, Inc. | Multi-segment light-emitting diode |
WO2000060652A1 (en) | 1999-03-30 | 2000-10-12 | Citizen Watch Co., Ltd. | Method for fabricating thin-film substrate and thin-film substrate fabricated by the method |
US6358854B1 (en) | 1999-04-21 | 2002-03-19 | Sandia Corporation | Method to fabricate layered material compositions |
US6446486B1 (en) | 1999-04-26 | 2002-09-10 | Sandia Corporation | Micromachine friction test apparatus |
US6449084B1 (en) | 1999-05-10 | 2002-09-10 | Yanping Guo | Optical deflector |
US6342452B1 (en) | 1999-05-20 | 2002-01-29 | International Business Machines Corporation | Method of fabricating a Si3N4/polycide structure using a dielectric sacrificial layer as a mask |
JP3592136B2 (en) * | 1999-06-04 | 2004-11-24 | キヤノン株式会社 | Liquid discharge head, method of manufacturing the same, and method of manufacturing microelectromechanical device |
US6201633B1 (en) * | 1999-06-07 | 2001-03-13 | Xerox Corporation | Micro-electromechanical based bistable color display sheets |
US6359673B1 (en) | 1999-06-21 | 2002-03-19 | Eastman Kodak Company | Sheet having a layer with different light modulating materials |
US6862029B1 (en) | 1999-07-27 | 2005-03-01 | Hewlett-Packard Development Company, L.P. | Color display system |
US6525310B2 (en) | 1999-08-05 | 2003-02-25 | Microvision, Inc. | Frequency tunable resonant scanner |
US6322712B1 (en) | 1999-09-01 | 2001-11-27 | Micron Technology, Inc. | Buffer layer in flat panel display |
KR100333482B1 (en) | 1999-09-15 | 2002-04-25 | 오길록 | High speed semiconductor optical modulator and its fabrication method |
US6337027B1 (en) * | 1999-09-30 | 2002-01-08 | Rockwell Science Center, Llc | Microelectromechanical device manufacturing process |
WO2003007049A1 (en) * | 1999-10-05 | 2003-01-23 | Iridigm Display Corporation | Photonic mems and structures |
US6351329B1 (en) * | 1999-10-08 | 2002-02-26 | Lucent Technologies Inc. | Optical attenuator |
US6960305B2 (en) * | 1999-10-26 | 2005-11-01 | Reflectivity, Inc | Methods for forming and releasing microelectromechanical structures |
US7041224B2 (en) | 1999-10-26 | 2006-05-09 | Reflectivity, Inc. | Method for vapor phase etching of silicon |
US6549338B1 (en) | 1999-11-12 | 2003-04-15 | Texas Instruments Incorporated | Bandpass filter to reduce thermal impact of dichroic light shift |
US6552840B2 (en) | 1999-12-03 | 2003-04-22 | Texas Instruments Incorporated | Electrostatic efficiency of micromechanical devices |
US6548908B2 (en) | 1999-12-27 | 2003-04-15 | Xerox Corporation | Structure and method for planar lateral oxidation in passive devices |
US6545335B1 (en) | 1999-12-27 | 2003-04-08 | Xerox Corporation | Structure and method for electrical isolation of optoelectronic integrated circuits |
US6674090B1 (en) | 1999-12-27 | 2004-01-06 | Xerox Corporation | Structure and method for planar lateral oxidation in active |
JP2001249287A (en) | 1999-12-30 | 2001-09-14 | Texas Instr Inc <Ti> | Method for operating bistabl micro mirror array |
US20010040675A1 (en) | 2000-01-28 | 2001-11-15 | True Randall J. | Method for forming a micromechanical device |
US20020071169A1 (en) | 2000-02-01 | 2002-06-13 | Bowers John Edward | Micro-electro-mechanical-system (MEMS) mirror device |
US6407851B1 (en) | 2000-08-01 | 2002-06-18 | Mohammed N. Islam | Micromechanical optical switch |
DE10006035A1 (en) * | 2000-02-10 | 2001-08-16 | Bosch Gmbh Robert | Micro-mechanical component production, used as sensor element or actuator element, comprises providing functional element and/or functional layer with protective layer |
US6531945B1 (en) * | 2000-03-10 | 2003-03-11 | Micron Technology, Inc. | Integrated circuit inductor with a magnetic core |
JP2001272613A (en) | 2000-03-24 | 2001-10-05 | Seiko Epson Corp | Optical switching element, optical switching device, their manufacturing methods, optical switching unit and video display device |
US6329297B1 (en) | 2000-04-21 | 2001-12-11 | Applied Materials, Inc. | Dilute remote plasma clean |
JP4002712B2 (en) | 2000-05-15 | 2007-11-07 | スパンション エルエルシー | Nonvolatile semiconductor memory device and data holding method of nonvolatile semiconductor memory device |
US7008812B1 (en) * | 2000-05-30 | 2006-03-07 | Ic Mechanics, Inc. | Manufacture of MEMS structures in sealed cavity using dry-release MEMS device encapsulation |
US6465320B1 (en) | 2000-06-16 | 2002-10-15 | Motorola, Inc. | Electronic component and method of manufacturing |
AU2001268577A1 (en) * | 2000-06-22 | 2002-01-02 | Massachusetts Institute Of Technology | Etch stop layer system |
US6452465B1 (en) | 2000-06-27 | 2002-09-17 | M-Squared Filters, Llc | High quality-factor tunable resonator |
US6473274B1 (en) | 2000-06-28 | 2002-10-29 | Texas Instruments Incorporated | Symmetrical microactuator structure for use in mass data storage devices, or the like |
WO2002001584A1 (en) * | 2000-06-28 | 2002-01-03 | The Regents Of The University Of California | Capacitive microelectromechanical switches |
TW535024B (en) | 2000-06-30 | 2003-06-01 | Minolta Co Ltd | Liquid display element and method of producing the same |
EP1170618B1 (en) | 2000-07-03 | 2010-06-16 | Sony Corporation | Optical multilayer structure, optical switching device, and image display |
US6736987B1 (en) | 2000-07-12 | 2004-05-18 | Techbank Corporation | Silicon etching apparatus using XeF2 |
EP1172681A3 (en) * | 2000-07-13 | 2004-06-09 | Creo IL. Ltd. | Blazed micro-mechanical light modulator and array thereof |
US6456420B1 (en) | 2000-07-27 | 2002-09-24 | Mcnc | Microelectromechanical elevating structures |
US6853129B1 (en) * | 2000-07-28 | 2005-02-08 | Candescent Technologies Corporation | Protected substrate structure for a field emission display device |
US6778155B2 (en) | 2000-07-31 | 2004-08-17 | Texas Instruments Incorporated | Display operation with inserted block clears |
US6795605B1 (en) * | 2000-08-01 | 2004-09-21 | Cheetah Omni, Llc | Micromechanical optical switch |
US7083997B2 (en) | 2000-08-03 | 2006-08-01 | Analog Devices, Inc. | Bonded wafer optical MEMS process |
US6392233B1 (en) | 2000-08-10 | 2002-05-21 | Sarnoff Corporation | Optomechanical radiant energy detector |
TW471063B (en) | 2000-08-11 | 2002-01-01 | Winbond Electronics Corp | Method to form opening in insulator layer using ion implantation |
US6635919B1 (en) | 2000-08-17 | 2003-10-21 | Texas Instruments Incorporated | High Q-large tuning range micro-electro mechanical system (MEMS) varactor for broadband applications |
JP4392970B2 (en) | 2000-08-21 | 2010-01-06 | キヤノン株式会社 | Display element using interferometric modulation element |
US6376787B1 (en) | 2000-08-24 | 2002-04-23 | Texas Instruments Incorporated | Microelectromechanical switch with fixed metal electrode/dielectric interface with a protective cap layer |
TWI226103B (en) | 2000-08-31 | 2005-01-01 | Georgia Tech Res Inst | Fabrication of semiconductor devices with air gaps for ultra low capacitance interconnections and methods of making same |
US6643069B2 (en) | 2000-08-31 | 2003-11-04 | Texas Instruments Incorporated | SLM-base color projection display having multiple SLM's and multiple projection lenses |
JP4304852B2 (en) * | 2000-09-04 | 2009-07-29 | コニカミノルタホールディングス株式会社 | Non-flat liquid crystal display element and method for manufacturing the same |
US6466354B1 (en) | 2000-09-19 | 2002-10-15 | Silicon Light Machines | Method and apparatus for interferometric modulation of light |
US6522801B1 (en) * | 2000-10-10 | 2003-02-18 | Agere Systems Inc. | Micro-electro-optical mechanical device having an implanted dopant included therein and a method of manufacture therefor |
GB2367788A (en) | 2000-10-16 | 2002-04-17 | Seiko Epson Corp | Etching using an ink jet print head |
US7268081B2 (en) | 2000-11-02 | 2007-09-11 | California Institute Of Technology | Wafer-level transfer of membranes with gas-phase etching and wet etching methods |
US6859218B1 (en) * | 2000-11-07 | 2005-02-22 | Hewlett-Packard Development Company, L.P. | Electronic display devices and methods |
DE10055421A1 (en) | 2000-11-09 | 2002-05-29 | Bosch Gmbh Robert | Method for producing a micromechanical structure and micromechanical structure |
US6406975B1 (en) | 2000-11-27 | 2002-06-18 | Chartered Semiconductor Manufacturing Inc. | Method for fabricating an air gap shallow trench isolation (STI) structure |
US6906847B2 (en) | 2000-12-07 | 2005-06-14 | Reflectivity, Inc | Spatial light modulators with light blocking/absorbing areas |
DE10063991B4 (en) | 2000-12-21 | 2005-06-02 | Infineon Technologies Ag | Process for the production of micromechanical components |
US6775174B2 (en) | 2000-12-28 | 2004-08-10 | Texas Instruments Incorporated | Memory architecture for micromirror cell |
US6625047B2 (en) | 2000-12-31 | 2003-09-23 | Texas Instruments Incorporated | Micromechanical memory element |
CN100504496C (en) | 2001-01-30 | 2009-06-24 | 松下电器产业株式会社 | Deformable mirror and information apparatus comprising the deformable mirror |
FR2820513B1 (en) | 2001-02-05 | 2004-05-21 | Centre Nat Rech Scient | OPTOELECTRONIC DEVICE WITH WAVELENGTH FILTERING BY CAVITY COUPLING |
US6620712B2 (en) | 2001-02-14 | 2003-09-16 | Intpax, Inc. | Defined sacrifical region via ion implantation for micro-opto-electro-mechanical system (MOEMS) applications |
JP2002270575A (en) | 2001-03-13 | 2002-09-20 | Seiko Epson Corp | Etching method, semiconductor device fabricated by that method and etching system |
WO2002080255A1 (en) | 2001-03-16 | 2002-10-10 | Corning Intellisense Corporation | Electrostatically actuated micro-electro-mechanical devices and method of manufacture |
US6465856B2 (en) | 2001-03-19 | 2002-10-15 | Xerox Corporation | Micro-fabricated shielded conductors |
US6661561B2 (en) | 2001-03-26 | 2003-12-09 | Creo Inc. | High frequency deformable mirror device |
JP4684448B2 (en) | 2001-03-30 | 2011-05-18 | 株式会社リコー | LIGHT MODULATION DEVICE, ITS MODULATION DEVICE MANUFACTURING METHOD, IMAGE FORMING DEVICE HAVING THE LIGHT MODULATION DEVICE, AND IMAGE PROJECTION DISPLAY DEVICE HAVING THE LIGHT MODULATION DEVICE |
US6630786B2 (en) | 2001-03-30 | 2003-10-07 | Candescent Technologies Corporation | Light-emitting device having light-reflective layer formed with, or/and adjacent to, material that enhances device performance |
CN1228818C (en) | 2001-04-02 | 2005-11-23 | 华邦电子股份有限公司 | Method for forming funnel-shaped dielectric layer window in semiconductor |
US20020171610A1 (en) | 2001-04-04 | 2002-11-21 | Eastman Kodak Company | Organic electroluminescent display with integrated touch-screen |
US20020149850A1 (en) | 2001-04-17 | 2002-10-17 | E-Tek Dynamics, Inc. | Tunable optical filter |
US6525396B2 (en) * | 2001-04-17 | 2003-02-25 | Texas Instruments Incorporated | Selection of materials and dimensions for a micro-electromechanical switch for use in the RF regime |
US6600587B2 (en) | 2001-04-23 | 2003-07-29 | Memx, Inc. | Surface micromachined optical system with reinforced mirror microstructure |
US6756317B2 (en) | 2001-04-23 | 2004-06-29 | Memx, Inc. | Method for making a microstructure by surface micromachining |
US6657832B2 (en) | 2001-04-26 | 2003-12-02 | Texas Instruments Incorporated | Mechanically assisted restoring force support for micromachined membranes |
US6465355B1 (en) | 2001-04-27 | 2002-10-15 | Hewlett-Packard Company | Method of fabricating suspended microstructures |
US6602791B2 (en) | 2001-04-27 | 2003-08-05 | Dalsa Semiconductor Inc. | Manufacture of integrated fluidic devices |
US6576489B2 (en) | 2001-05-07 | 2003-06-10 | Applied Materials, Inc. | Methods of forming microstructure devices |
US6808276B2 (en) | 2001-05-08 | 2004-10-26 | Axsun Technologies, Inc. | Suspended high reflectivity coating on release structure and fabrication process therefor |
US7116287B2 (en) | 2001-05-09 | 2006-10-03 | Eastman Kodak Company | Drive for cholesteric liquid crystal displays |
JP4449249B2 (en) | 2001-05-11 | 2010-04-14 | ソニー株式会社 | Method for driving optical multilayer structure, method for driving display device, and display device |
US6424094B1 (en) | 2001-05-15 | 2002-07-23 | Eastman Kodak Company | Organic electroluminescent display with integrated resistive touch screen |
WO2002095800A2 (en) | 2001-05-22 | 2002-11-28 | Reflectivity, Inc. | A method for making a micromechanical device by removing a sacrificial layer with multiple sequential etchants |
US7106307B2 (en) | 2001-05-24 | 2006-09-12 | Eastman Kodak Company | Touch screen for use with an OLED display |
US6743570B2 (en) | 2001-05-25 | 2004-06-01 | Cornell Research Foundation, Inc. | Method of using heat-depolymerizable polycarbonate sacrificial layer to create nano-fluidic devices |
US6803534B1 (en) | 2001-05-25 | 2004-10-12 | Raytheon Company | Membrane for micro-electro-mechanical switch, and methods of making and using it |
KR100421217B1 (en) | 2001-05-30 | 2004-03-02 | 삼성전자주식회사 | Method for fabricating stiction-resistant micromachined structures |
DE10127622B4 (en) | 2001-06-07 | 2009-10-22 | Qimonda Ag | Method of making an isolation trench filled with HDPCVD oxide |
US6958123B2 (en) | 2001-06-15 | 2005-10-25 | Reflectivity, Inc | Method for removing a sacrificial material with a compressed fluid |
JP2003001598A (en) | 2001-06-21 | 2003-01-08 | Sony Corp | ETCHING METHOD OF Si FILM |
US7005314B2 (en) * | 2001-06-27 | 2006-02-28 | Intel Corporation | Sacrificial layer technique to make gaps in MEMS applications |
US6822628B2 (en) | 2001-06-28 | 2004-11-23 | Candescent Intellectual Property Services, Inc. | Methods and systems for compensating row-to-row brightness variations of a field emission display |
US6905613B2 (en) | 2001-07-10 | 2005-06-14 | Honeywell International Inc. | Use of an organic dielectric as a sacrificial layer |
JP4032216B2 (en) * | 2001-07-12 | 2008-01-16 | ソニー株式会社 | OPTICAL MULTILAYER STRUCTURE, ITS MANUFACTURING METHOD, OPTICAL SWITCHING DEVICE, AND IMAGE DISPLAY DEVICE |
US6862022B2 (en) | 2001-07-20 | 2005-03-01 | Hewlett-Packard Development Company, L.P. | Method and system for automatically selecting a vertical refresh rate for a video display monitor |
US6589625B1 (en) | 2001-08-01 | 2003-07-08 | Iridigm Display Corporation | Hermetic seal and method to create the same |
US6600201B2 (en) | 2001-08-03 | 2003-07-29 | Hewlett-Packard Development Company, L.P. | Systems with high density packing of micromachines |
US6632698B2 (en) | 2001-08-07 | 2003-10-14 | Hewlett-Packard Development Company, L.P. | Microelectromechanical device having a stiffened support beam, and methods of forming stiffened support beams in MEMS |
US6577785B1 (en) | 2001-08-09 | 2003-06-10 | Sandia Corporation | Compound semiconductor optical waveguide switch |
JP2003057571A (en) | 2001-08-16 | 2003-02-26 | Sony Corp | Optical multi-layered structure and optical switching element, and image display device |
US6842009B2 (en) | 2001-09-13 | 2005-01-11 | Nth Tech Corporation | Biohazard sensing system and methods thereof |
US6930364B2 (en) * | 2001-09-13 | 2005-08-16 | Silicon Light Machines Corporation | Microelectronic mechanical system and methods |
US6717488B2 (en) | 2001-09-13 | 2004-04-06 | Nth Tech Corporation | Resonator with a member having an embedded charge and a method of making thereof |
US20030053078A1 (en) * | 2001-09-17 | 2003-03-20 | Mark Missey | Microelectromechanical tunable fabry-perot wavelength monitor with thermal actuators |
US6590157B2 (en) | 2001-09-21 | 2003-07-08 | Eastman Kodak Company | Sealing structure for highly moisture-sensitive electronic device element and method for fabrication |
US6866669B2 (en) | 2001-10-12 | 2005-03-15 | Cordis Corporation | Locking handle deployment mechanism for medical device and method |
US6936183B2 (en) | 2001-10-17 | 2005-08-30 | Applied Materials, Inc. | Etch process for etching microstructures |
AUPR846701A0 (en) | 2001-10-25 | 2001-11-15 | Microtechnology Centre Management Limited | A method of fabrication of micro-devices |
US6666979B2 (en) * | 2001-10-29 | 2003-12-23 | Applied Materials, Inc. | Dry etch release of MEMS structures |
US6870581B2 (en) | 2001-10-30 | 2005-03-22 | Sharp Laboratories Of America, Inc. | Single panel color video projection display using reflective banded color falling-raster illumination |
JP2003136499A (en) * | 2001-11-05 | 2003-05-14 | Seiko Epson Corp | Micromachine and its manufacturing method |
US6717496B2 (en) | 2001-11-13 | 2004-04-06 | The Board Of Trustees Of The University Of Illinois | Electromagnetic energy controlled low actuation voltage microelectromechanical switch |
US6803160B2 (en) | 2001-12-13 | 2004-10-12 | Dupont Photomasks, Inc. | Multi-tone photomask and method for manufacturing the same |
US20030111439A1 (en) | 2001-12-14 | 2003-06-19 | Fetter Linus Albert | Method of forming tapered electrodes for electronic devices |
US6782166B1 (en) | 2001-12-21 | 2004-08-24 | United States Of America As Represented By The Secretary Of The Air Force | Optically transparent electrically conductive charge sheet poling electrodes to maximize performance of electro-optic devices |
JP3893421B2 (en) | 2001-12-27 | 2007-03-14 | 富士フイルム株式会社 | Light modulation element, light modulation element array, and exposure apparatus using the same |
US6915046B2 (en) | 2002-01-22 | 2005-07-05 | Agere Sysems, Inc. | Optical systems comprising curved MEMs mirrors and methods for making same |
US6608268B1 (en) | 2002-02-05 | 2003-08-19 | Memtronics, A Division Of Cogent Solutions, Inc. | Proximity micro-electro-mechanical system |
US6794119B2 (en) | 2002-02-12 | 2004-09-21 | Iridigm Display Corporation | Method for fabricating a structure for a microelectromechanical systems (MEMS) device |
JP3558066B2 (en) | 2002-02-19 | 2004-08-25 | ソニー株式会社 | MEMS element and its manufacturing method, light modulation element, GLV device and its manufacturing method, and laser display |
US6574033B1 (en) | 2002-02-27 | 2003-06-03 | Iridigm Display Corporation | Microelectromechanical systems device and method for fabricating same |
AUPS098002A0 (en) * | 2002-03-08 | 2002-03-28 | University Of Western Australia, The | Tunable cavity resonator, and method of fabricating same |
US7145143B2 (en) | 2002-03-18 | 2006-12-05 | Honeywell International Inc. | Tunable sensor |
US7027200B2 (en) * | 2002-03-22 | 2006-04-11 | Reflectivity, Inc | Etching method used in fabrications of microstructures |
US7029829B2 (en) * | 2002-04-18 | 2006-04-18 | The Regents Of The University Of Michigan | Low temperature method for forming a microcavity on a substrate and article having same |
US20030202264A1 (en) | 2002-04-30 | 2003-10-30 | Weber Timothy L. | Micro-mirror device |
US6972882B2 (en) | 2002-04-30 | 2005-12-06 | Hewlett-Packard Development Company, L.P. | Micro-mirror device with light angle amplification |
US6954297B2 (en) | 2002-04-30 | 2005-10-11 | Hewlett-Packard Development Company, L.P. | Micro-mirror device including dielectrophoretic liquid |
US20040212026A1 (en) | 2002-05-07 | 2004-10-28 | Hewlett-Packard Company | MEMS device having time-varying control |
US6791441B2 (en) | 2002-05-07 | 2004-09-14 | Raytheon Company | Micro-electro-mechanical switch, and methods of making and using it |
US6806110B2 (en) | 2002-05-16 | 2004-10-19 | Agilent Technologies, Inc. | Monolithic multi-wavelength vertical-cavity surface emitting laser array and method of manufacture therefor |
US6678085B2 (en) | 2002-06-12 | 2004-01-13 | Eastman Kodak Company | High-contrast display system with scanned conformal grating device |
US20040001258A1 (en) | 2002-06-28 | 2004-01-01 | Mandeep Singh | Solid state etalons with low thermally-induced optical path length change |
DE10228946B4 (en) | 2002-06-28 | 2004-08-26 | Universität Bremen | Optical modulator, display, use of an optical modulator and method for producing an optical modulator |
US6741377B2 (en) * | 2002-07-02 | 2004-05-25 | Iridigm Display Corporation | Device having a light-absorbing mask and a method for fabricating same |
US7071289B2 (en) * | 2002-07-11 | 2006-07-04 | The University Of Connecticut | Polymers comprising thieno [3,4-b]thiophene and methods of making and using the same |
US20040058531A1 (en) | 2002-08-08 | 2004-03-25 | United Microelectronics Corp. | Method for preventing metal extrusion in a semiconductor structure. |
US6674033B1 (en) * | 2002-08-21 | 2004-01-06 | Ming-Shan Wang | Press button type safety switch |
JP2004102022A (en) | 2002-09-11 | 2004-04-02 | Ricoh Co Ltd | Image forming apparatus |
JP2004106074A (en) | 2002-09-13 | 2004-04-08 | Sony Corp | Production method for hollow structure and production method for mems element |
TW544787B (en) * | 2002-09-18 | 2003-08-01 | Promos Technologies Inc | Method of forming self-aligned contact structure with locally etched gate conductive layer |
US7781850B2 (en) * | 2002-09-20 | 2010-08-24 | Qualcomm Mems Technologies, Inc. | Controlling electromechanical behavior of structures within a microelectromechanical systems device |
KR100512960B1 (en) | 2002-09-26 | 2005-09-07 | 삼성전자주식회사 | Flexible MEMS transducer and its manufacturing method, and flexible MEMS wireless microphone |
US6905621B2 (en) | 2002-10-10 | 2005-06-14 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method for preventing the etch transfer of sidelobes in contact hole patterns |
KR100454136B1 (en) | 2002-10-23 | 2004-10-26 | 삼성전자주식회사 | Non-volatile memory device to protect floating gate from charge loss and method for fabricating the same |
US6747785B2 (en) | 2002-10-24 | 2004-06-08 | Hewlett-Packard Development Company, L.P. | MEMS-actuated color light modulator and methods |
US6666561B1 (en) | 2002-10-28 | 2003-12-23 | Hewlett-Packard Development Company, L.P. | Continuously variable analog micro-mirror device |
US7370185B2 (en) | 2003-04-30 | 2008-05-06 | Hewlett-Packard Development Company, L.P. | Self-packaged optical interference display device having anti-stiction bumps, integral micro-lens, and reflection-absorbing layers |
US6741503B1 (en) | 2002-12-04 | 2004-05-25 | Texas Instruments Incorporated | SLM display data address mapping for four bank frame buffer |
US6944008B2 (en) | 2002-12-18 | 2005-09-13 | Lucent Technologies Inc. | Charge dissipation in electrostatically driven devices |
TWI289708B (en) * | 2002-12-25 | 2007-11-11 | Qualcomm Mems Technologies Inc | Optical interference type color display |
TW559686B (en) | 2002-12-27 | 2003-11-01 | Prime View Int Co Ltd | Optical interference type panel and the manufacturing method thereof |
JP2004212656A (en) | 2002-12-27 | 2004-07-29 | Fuji Photo Film Co Ltd | Optical modulator array and plane display |
TW594155B (en) | 2002-12-27 | 2004-06-21 | Prime View Int Corp Ltd | Optical interference type color display and optical interference modulator |
TW200413810A (en) | 2003-01-29 | 2004-08-01 | Prime View Int Co Ltd | Light interference display panel and its manufacturing method |
TW557395B (en) * | 2003-01-29 | 2003-10-11 | Yen Sun Technology Corp | Optical interference type reflection panel and the manufacturing method thereof |
US7205675B2 (en) | 2003-01-29 | 2007-04-17 | Hewlett-Packard Development Company, L.P. | Micro-fabricated device with thermoelectric device and method of making |
US20040147056A1 (en) | 2003-01-29 | 2004-07-29 | Mckinnell James C. | Micro-fabricated device and method of making |
US20040157426A1 (en) | 2003-02-07 | 2004-08-12 | Luc Ouellet | Fabrication of advanced silicon-based MEMS devices |
US6903487B2 (en) | 2003-02-14 | 2005-06-07 | Hewlett-Packard Development Company, L.P. | Micro-mirror device with increased mirror tilt |
TW200417806A (en) | 2003-03-05 | 2004-09-16 | Prime View Int Corp Ltd | A structure of a light-incidence electrode of an optical interference display plate |
US6844953B2 (en) | 2003-03-12 | 2005-01-18 | Hewlett-Packard Development Company, L.P. | Micro-mirror device including dielectrophoretic liquid |
TWI405196B (en) | 2003-03-13 | 2013-08-11 | Lg Electronics Inc | Optical recording medium and defective area management method and apparatus for write-once recording medium |
US6720267B1 (en) | 2003-03-19 | 2004-04-13 | United Microelectronics Corp. | Method for forming a cantilever beam model micro-electromechanical system |
TW567355B (en) | 2003-04-21 | 2003-12-21 | Prime View Int Co Ltd | An interference display cell and fabrication method thereof |
TW594360B (en) | 2003-04-21 | 2004-06-21 | Prime View Int Corp Ltd | A method for fabricating an interference display cell |
TWI224235B (en) | 2003-04-21 | 2004-11-21 | Prime View Int Co Ltd | A method for fabricating an interference display cell |
TWI226504B (en) | 2003-04-21 | 2005-01-11 | Prime View Int Co Ltd | A structure of an interference display cell |
US6853476B2 (en) | 2003-04-30 | 2005-02-08 | Hewlett-Packard Development Company, L.P. | Charge control circuit for a micro-electromechanical device |
US7400489B2 (en) | 2003-04-30 | 2008-07-15 | Hewlett-Packard Development Company, L.P. | System and a method of driving a parallel-plate variable micro-electromechanical capacitor |
US6829132B2 (en) | 2003-04-30 | 2004-12-07 | Hewlett-Packard Development Company, L.P. | Charge control of micro-electromechanical device |
US6741384B1 (en) | 2003-04-30 | 2004-05-25 | Hewlett-Packard Development Company, L.P. | Control of MEMS and light modulator arrays |
US7358966B2 (en) | 2003-04-30 | 2008-04-15 | Hewlett-Packard Development Company L.P. | Selective update of micro-electromechanical device |
US7072093B2 (en) | 2003-04-30 | 2006-07-04 | Hewlett-Packard Development Company, L.P. | Optical interference pixel display with charge control |
US6819469B1 (en) | 2003-05-05 | 2004-11-16 | Igor M. Koba | High-resolution spatial light modulator for 3-dimensional holographic display |
US7218499B2 (en) | 2003-05-14 | 2007-05-15 | Hewlett-Packard Development Company, L.P. | Charge control circuit |
TW591716B (en) | 2003-05-26 | 2004-06-11 | Prime View Int Co Ltd | A structure of a structure release and manufacturing the same |
TW570896B (en) * | 2003-05-26 | 2004-01-11 | Prime View Int Co Ltd | A method for fabricating an interference display cell |
US6917459B2 (en) | 2003-06-03 | 2005-07-12 | Hewlett-Packard Development Company, L.P. | MEMS device and method of forming MEMS device |
US6811267B1 (en) | 2003-06-09 | 2004-11-02 | Hewlett-Packard Development Company, L.P. | Display system with nonvisible data projection |
US7221495B2 (en) | 2003-06-24 | 2007-05-22 | Idc Llc | Thin film precursor stack for MEMS manufacturing |
JP2005051007A (en) | 2003-07-28 | 2005-02-24 | Tokyo Electron Ltd | Manufacturing method of semiconductor chip |
US7190380B2 (en) | 2003-09-26 | 2007-03-13 | Hewlett-Packard Development Company, L.P. | Generating and displaying spatially offset sub-frames |
US7173314B2 (en) * | 2003-08-13 | 2007-02-06 | Hewlett-Packard Development Company, L.P. | Storage device having a probe and a storage cell with moveable parts |
TW200506479A (en) * | 2003-08-15 | 2005-02-16 | Prime View Int Co Ltd | Color changeable pixel for an interference display |
TWI305599B (en) * | 2003-08-15 | 2009-01-21 | Qualcomm Mems Technologies Inc | Interference display panel and method thereof |
TWI251712B (en) * | 2003-08-15 | 2006-03-21 | Prime View Int Corp Ltd | Interference display plate |
TW593127B (en) * | 2003-08-18 | 2004-06-21 | Prime View Int Co Ltd | Interference display plate and manufacturing method thereof |
TWI231865B (en) | 2003-08-26 | 2005-05-01 | Prime View Int Co Ltd | An interference display cell and fabrication method thereof |
US20050057442A1 (en) | 2003-08-28 | 2005-03-17 | Olan Way | Adjacent display of sequential sub-images |
TWI230801B (en) | 2003-08-29 | 2005-04-11 | Prime View Int Co Ltd | Reflective display unit using interferometric modulation and manufacturing method thereof |
TWI232333B (en) | 2003-09-03 | 2005-05-11 | Prime View Int Co Ltd | Display unit using interferometric modulation and manufacturing method thereof |
US6982820B2 (en) | 2003-09-26 | 2006-01-03 | Prime View International Co., Ltd. | Color changeable pixel |
TW593126B (en) | 2003-09-30 | 2004-06-21 | Prime View Int Co Ltd | A structure of a micro electro mechanical system and manufacturing the same |
US20050068583A1 (en) | 2003-09-30 | 2005-03-31 | Gutkowski Lawrence J. | Organizing a digital image |
US6861277B1 (en) | 2003-10-02 | 2005-03-01 | Hewlett-Packard Development Company, L.P. | Method of forming MEMS device |
TWI235345B (en) | 2004-01-20 | 2005-07-01 | Prime View Int Co Ltd | A structure of an optical interference display unit |
TWI256941B (en) | 2004-02-18 | 2006-06-21 | Qualcomm Mems Technologies Inc | A micro electro mechanical system display cell and method for fabricating thereof |
TW200530669A (en) | 2004-03-05 | 2005-09-16 | Prime View Int Co Ltd | Interference display plate and manufacturing method thereof |
TWI261683B (en) | 2004-03-10 | 2006-09-11 | Qualcomm Mems Technologies Inc | Interference reflective element and repairing method thereof |
US20060066932A1 (en) * | 2004-09-27 | 2006-03-30 | Clarence Chui | Method of selective etching using etch stop layer |
US7684104B2 (en) | 2004-09-27 | 2010-03-23 | Idc, Llc | MEMS using filler material and method |
-
2005
- 2005-03-25 US US11/090,911 patent/US7781850B2/en not_active Expired - Fee Related
- 2005-08-30 WO PCT/US2005/030902 patent/WO2006036435A1/en active Application Filing
- 2005-08-30 EP EP05802111A patent/EP1803022A1/en not_active Withdrawn
- 2005-08-30 JP JP2007533493A patent/JP2008514438A/en active Pending
- 2005-08-30 CA CA002581670A patent/CA2581670A1/en not_active Abandoned
- 2005-08-30 AU AU2005290030A patent/AU2005290030A1/en not_active Abandoned
- 2005-08-30 KR KR1020077009521A patent/KR20070062584A/en not_active Application Discontinuation
- 2005-09-14 TW TW094131698A patent/TWI374854B/en not_active IP Right Cessation
-
2010
- 2010-08-23 US US12/861,778 patent/US8278726B2/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1995030924A1 (en) * | 1994-05-05 | 1995-11-16 | Etalon, Inc. | Visible spectrum modulator arrays |
EP0695959A1 (en) * | 1994-07-29 | 1996-02-07 | AT&T Corp. | Direct view display based on a micromechanical modulator |
WO1999052006A2 (en) * | 1998-04-08 | 1999-10-14 | Etalon, Inc. | Interferometric modulation of radiation |
WO2002024570A1 (en) * | 2000-09-25 | 2002-03-28 | Bookham Technology Plc | Micro electro-mechanical systems |
WO2005085932A2 (en) * | 2004-03-03 | 2005-09-15 | Idc, Llc | Altering temporal response of micro electromechanical elements |
Non-Patent Citations (1)
Title |
---|
ARATANI K ET AL: "PROCESS AND DESIGN CONSIDERATIONS FOR SURFACE MICROMACHINED BEAMS FOR A TUNEABLE INTERFEROMETER ARRAY IN SILICON", PROCEEDINGS OF THE WORKSHOP ON MICRO ELECTRO MECHANICAL SYSTEMS (MEMS) FORT LAUDERDALE, FEB. 7 - 10, 1993, NEW YORK, IEEE, US, vol. WORKSHOP 6, 7 February 1993 (1993-02-07), pages 230 - 235, XP000366885, ISBN: 0-7803-0957-X * |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1990669A2 (en) * | 2007-05-11 | 2008-11-12 | Qualcomm Mems Technologies, Inc. | Method of fabrication MEMS by lamination and devices formed by same |
EP1990669A3 (en) * | 2007-05-11 | 2009-02-11 | Qualcomm Mems Technologies, Inc. | Method of fabrication MEMS by lamination and devices formed by same |
JP2013051426A (en) * | 2007-09-24 | 2013-03-14 | Qualcomm Mems Technologies Inc | Interferometric photovoltaic cell |
WO2010044654A1 (en) * | 2008-10-16 | 2010-04-22 | Miortech Holding B.V. | Electrowetting optical element arranged for preventing charge accumulation, and method for manufacturing an electrowetting optical element |
TWI461781B (en) * | 2011-06-03 | 2014-11-21 | Pixtronix Inc | Display device and display device |
US9122057B2 (en) | 2011-06-03 | 2015-09-01 | Pixtronix, Inc. | Display device and method of manufacturing the display device |
US9128287B2 (en) | 2011-06-03 | 2015-09-08 | Pixtronix, Inc. | Display device |
Also Published As
Publication number | Publication date |
---|---|
AU2005290030A1 (en) | 2006-04-06 |
US7781850B2 (en) | 2010-08-24 |
JP2008514438A (en) | 2008-05-08 |
US20050250235A1 (en) | 2005-11-10 |
TW200626486A (en) | 2006-08-01 |
KR20070062584A (en) | 2007-06-15 |
TWI374854B (en) | 2012-10-21 |
CA2581670A1 (en) | 2006-04-06 |
US20100320555A1 (en) | 2010-12-23 |
US8278726B2 (en) | 2012-10-02 |
EP1803022A1 (en) | 2007-07-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2006036435A1 (en) | Controlling electromechanical behavior of structures within a microelectromechanical systems device | |
TWI484566B (en) | Amorphous oxide semiconductor thin film transistor fabrication method | |
US8300299B2 (en) | MEMS devices with multi-component sacrificial layers | |
KR101649972B1 (en) | Dielectric enhanced mirror for imod display | |
US7679812B2 (en) | Support structure for MEMS device and methods therefor | |
JP5180076B2 (en) | MEMS device having support structure configured to minimize deformation due to stress, and method of manufacturing the same | |
US7535621B2 (en) | Aluminum fluoride films for microelectromechanical system applications | |
US7369296B2 (en) | Device and method for modifying actuation voltage thresholds of a deformable membrane in an interferometric modulator | |
TWI353335B (en) | Method and device for packaging a substrate | |
EP2012167A2 (en) | Integrated imods and solar cells on a substrate | |
JP2013178531A (en) | Diffusion barrier layer for mems devices | |
RU2381532C2 (en) | Controlling electromechanical reaction of structures in device based on micro-electromechanical systems | |
TW201329602A (en) | Electromechanical systems variable capacitance device | |
TWI476750B (en) | Methods and systems for energy recovery in a display |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A1 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KM KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NG NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SM SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): GM KE LS MW MZ NA SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LT LU LV MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WWE | Wipo information: entry into national phase |
Ref document number: 181616 Country of ref document: IL |
|
WWE | Wipo information: entry into national phase |
Ref document number: 356/MUMNP/2007 Country of ref document: IN |
|
WWE | Wipo information: entry into national phase |
Ref document number: 200580032155.2 Country of ref document: CN |
|
WWE | Wipo information: entry into national phase |
Ref document number: MX/a/2007/003584 Country of ref document: MX Ref document number: 2581670 Country of ref document: CA Ref document number: 2007533493 Country of ref document: JP |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2005290030 Country of ref document: AU |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2005802111 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 1020077009521 Country of ref document: KR |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2007115882 Country of ref document: RU |
|
WWP | Wipo information: published in national office |
Ref document number: 2005802111 Country of ref document: EP |
|
ENP | Entry into the national phase |
Ref document number: PI0516020 Country of ref document: BR |