WO2006054585A1 - Touch panel display and touch panel - Google Patents

Touch panel display and touch panel Download PDF

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Publication number
WO2006054585A1
WO2006054585A1 PCT/JP2005/021019 JP2005021019W WO2006054585A1 WO 2006054585 A1 WO2006054585 A1 WO 2006054585A1 JP 2005021019 W JP2005021019 W JP 2005021019W WO 2006054585 A1 WO2006054585 A1 WO 2006054585A1
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WO
WIPO (PCT)
Prior art keywords
touch panel
substrate
display device
conductive film
transparent conductive
Prior art date
Application number
PCT/JP2005/021019
Other languages
French (fr)
Japanese (ja)
Inventor
Masafumi Kokura
Shinya Tanaka
Yoshiharu Kataoka
Original Assignee
Sharp Kabushiki Kaisha
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Filing date
Publication date
Application filed by Sharp Kabushiki Kaisha filed Critical Sharp Kabushiki Kaisha
Publication of WO2006054585A1 publication Critical patent/WO2006054585A1/en

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Classifications

    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412Digitisers structurally integrated in a display
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/13338Input devices, e.g. touch panels
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1343Electrodes
    • G02F1/134309Electrodes characterised by their geometrical arrangement
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0444Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single conductive element covering the whole sensing surface, e.g. by sensing the electrical current flowing at the corners
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters

Definitions

  • the present invention relates to a touch panel display device and a touch panel.
  • a touch panel is a device that inputs information interactively to an information processing device such as a computer by touching (pressing) with a finger, a pen, or the like.
  • Touch panels are classified into a resistive film method, a capacitive coupling method, an infrared method, an ultrasonic method, an electromagnetic induction coupling method, and the like according to the operation principle.
  • a resistive film type and capacitive coupling type touch panel that can be mounted at low cost are often used in recent years.
  • the resistance film type touch panel includes, for example, a pair of glass substrates arranged to face each other, an insulating spacer sandwiched between the pair of glass substrates, and an inner side of each glass substrate.
  • a transparent conductive film provided as a resistance film on the entire surface and a touch position detection circuit are included.
  • the touch panel is used by being mounted on the front surface of a display screen such as a liquid crystal display device.
  • the resistive film type touch panel having such a configuration, by touching the front surface of the display screen, the resistive films come into contact (short circuit), and current flows between the resistive films.
  • the touched position is detected by detecting the change in voltage at this time by the touch position detection circuit.
  • the resistive film type touch panel has a pair of resistive films facing each other with an air layer interposed therebetween, so that the difference in refractive index between the air layers increases and the light transmittance decreases. If you do, you will have a flaw.
  • FIG. 13 is a schematic cross-sectional view of a touch panel display device 150 having a general capacitive coupling type touch panel.
  • This touch panel display device 150 includes an active matrix substrate 120, a counter substrate 135, A liquid crystal panel composed of a liquid crystal layer 140 sandwiched between the two substrates 120 and 135, a backlight 106 provided on the lower side of the liquid crystal panel via a polarizing plate 105 and optical sheets 110, A touch panel 130 provided on the upper side of the liquid crystal panel via a polarizing plate 105 is provided.
  • the touch panel 130 has a position detecting transparent electrode 103 on the liquid crystal panel side, and is fixed to the liquid crystal panel by an adhesive layer 117 such as a double-sided tape.
  • the touch panel 130 includes a third glass substrate 116, a position detection transparent electrode 103 provided on the entire surface of the third glass substrate 116, and a constant pitch on a peripheral portion of the position detection transparent electrode 103. And a position detection circuit for detecting the touch position.
  • the touch panel 130 by touching the front surface of the display screen, that is, the surface of the third glass substrate 116, the position detection transparent electrode 103 is grounded via the electrostatic capacity of the human body at the touched point. Therefore, the resistance value between each position detection electrode and the ground point changes. By detecting this change by the touch position detection circuit, the touched position is detected.
  • the number of glass substrates is one less than that of the resistive film type touch panel, and there is no air layer between the glass substrates present in the resistive film type touch panel. Therefore, the light transmittance is excellent.
  • Patent Document 1 discloses a transparent adhesive on the touch surface side of a first transparent substrate provided with a transparent conductive film for touch position detection. Discloses a capacitance type touch panel in which a second transparent substrate for preventing glare is bonded together. According to this document, it is described that damage to the transparent conductive film can be prevented and productivity can be improved.
  • a glass substrate and a touch panel are provided.
  • the position detection transparent electrode is omitted by sharing the position detection transparent electrode with a member constituting the display device.
  • a common transparent electrode, a liquid crystal, and a display transparent electrode are sequentially stacked between two transparent insulating plates to display characters and images, and to contact a contact object such as a finger.
  • a contact object such as a finger.
  • the current flowing between the contact object and the common transparent electrode through the transparent insulating plate at the four corners of the common transparent electrode The position coordinates of the contact part are determined by the current signals from the current detectors at the four corners, which are affected by the change in capacitance caused by the contact with the contact part on the transparent insulating plate.
  • Patent Document 3 discloses a transparent counter electrode in a display device including an active matrix substrate having a plurality of pixel electrodes arranged in a matrix and a transparent counter electrode facing the active matrix substrate.
  • a liquid crystal display circuit that supplies a display voltage or current to the display, a position detection circuit that detects a current flowing through multiple points of the transparent counter electrode, and one of these circuits is electrically connected to the transparent common electrode.
  • a touch sensor body type display device comprising a switching circuit for conducting is described.
  • Patent Document 1 Japanese Patent Laid-Open No. 5-324203
  • Patent Document 2 Japanese Patent Laid-Open No. 2003-99192
  • Patent Document 3 Japanese Unexamined Patent Publication No. 2003-66417
  • Patent Documents 2 and 3 the thickness and cost of the device itself can be reduced by sharing the glass substrate constituting the touch panel and the position detection transparent electrode with the members constituting the display device. Although reduction is possible, there is a risk of degrading display quality.
  • the common transparent electrode of Patent Documents 2 and 3 described above serves as a touch panel electrode for detecting the position and a display electrode for applying a voltage to the liquid crystal layer. It is necessary to have both functions. However, while the touch panel electrode is required to have a high electrical resistance, the display electrode has a low electrical resistance. Is required.
  • the surface resistance is preferably about 400 to 1 600 ⁇ in order to function as a touch panel electrode. Moreover, in order to function as a display electrode, 30-100 ohms or less are preferable. If the surface resistance of the common transparent electrode exceeds 100 ⁇ , the display quality may be deteriorated due to shadowing, which causes shadows that extend along the display characters and non-turns.
  • the surface resistance ( ⁇ ) is the electrical resistance per unit area, which is also called sheet resistance, and is expressed in units such as ⁇ Higuchi and ⁇ / sq.
  • the present invention has been made in view of the strong point, and an object of the present invention is to suppress deterioration of display quality and reduce the thickness of the device itself in a capacitive coupling type touch panel. There is to do.
  • a second transparent conductive film to which a display signal is supplied and a first transparent conductive film for detecting a touched position are provided on the second substrate. is there.
  • a touch panel display device is a touch panel display device that detects a position touched by a capacitive coupling method and displays an image, and includes a first substrate and a first substrate that are arranged to face each other.
  • a first transparent conductive film disposed between the layer and the second substrate for detecting a touched position; and between the first transparent conductive film and the display medium layer, and a display signal is provided.
  • the first transparent conductive film is touched across the second substrate via the capacitance of the touched human body. For example, between each position detection electrode provided around the first conductive film and the grounding point. A change occurs in the resistance value. Then, by detecting this change using, for example, a position detection circuit, the touched position is detected, and it will function as a capacitive coupling type touch panel.
  • the first transparent conductive film for detecting the touch position generally has a higher electrical resistance than the second transparent conductive film to which the display signal is supplied, the position detection signal is the first.
  • the first transparent conductive film is reliably generated, and a display signal is promptly supplied to the display medium layer through the second transparent conductive film. Therefore, even if the touch panel display device of the present invention has a touch panel function, generation of shadowing is suppressed and display quality is prevented from being deteriorated.
  • a touch panel on which a first transparent conductive film for detecting the touch position is formed is mounted on the front surface of the display screen of the display device, and three substrates are used as a display device having a touch panel function.
  • the touch panel display device of the present invention is composed of two substrates and one substrate can be omitted, the device itself can be made thin and lightweight. Become.
  • the surface resistance of the first transparent conductive film may be 400 ⁇ or more and 1600 ⁇ or less.
  • the insulating layer may be a color filter layer! /.
  • the first transparent conductive film and the second transparent conductive film are electrically insulated by one color filter layer. Therefore, in the case of a color display device, the first transparent conductive film This makes it possible to simplify the manufacturing process without requiring a separate insulating layer between the film and the second transparent conductive film insulating layer.
  • One color filter layer may be provided between the second substrate and the first transparent conductive film.
  • the first transparent conductive film, the insulating layer, and the second transparent conductive film are sequentially formed on a general color filter substrate in which one color filter layer is formed on a glass substrate. In this way, since the configuration on the second substrate of the present invention can be realized, the effects of the present invention can be achieved using a general commercially available color filter substrate.
  • the thickness of the first transparent conductive film may be 50 A or more and 150 A or less.
  • the thickness of the first transparent conductive film is less than 50 A, the electric resistance of the first transparent conductive film becomes too high, and the resistance value is not stable within the substrate surface and is touched. It is difficult to detect the position accurately.
  • the thickness of the first transparent conductive film exceeds 150A, the transmittance of the first transparent conductive film is greatly reduced, and the display quality is impaired.
  • the first transparent conductive film may be formed of an amorphous compound of indium oxide and tin oxide or a compound of indium oxide and zinc oxide.
  • the amorphous compound of indium oxide and tin oxide, or the compound of indium oxide and zinc oxide is more than the compound of polycrystalline indium oxide and tin oxide.
  • the contact position is The first transparent conductive film for detecting the electric resistance becomes electrically higher than the second transparent conductive film.
  • the touch panel display device is a touch panel display device that detects the position touched by the capacitive coupling method and displays an image, and is used for a pair of display panels arranged to face each other.
  • an image is displayed on the display panel.
  • the transparent conductive film is grounded via the capacitance of the touched human body at the position touched across the switching panel substrate.
  • the resistance value between each position detection electrode provided around the first conductive film and the contact point changes.
  • the touched position is detected and functions as a capacitive coupling type touch panel.
  • the transparent conductive film for detecting the touch position has a higher electrical resistance than a general transparent conductive film to which a display signal is supplied from the display panel, the position detection signal is transparent. In addition to being reliably generated in the conductive film, a display signal is promptly supplied to the display medium layer in the display panel. Therefore, even if the touch panel display device of the present invention has a touch panel function, generation of shadowing is suppressed and display quality is prevented from being deteriorated.
  • a touch panel on which a transparent conductive film for detecting the touch position is formed is mounted on the front surface of the display screen of the display device, so that five display devices having a touch panel function and a display switching function are provided.
  • the touch panel display device of the present invention is composed of four substrates and one substrate can be omitted, the device itself must be thin and light. It becomes possible.
  • the touch panel according to the present invention is a touch panel for detecting a position touched by a capacitive coupling method, and is provided on the substrate and a first touch panel for detecting the touched position.
  • the first transparent conductive film is grounded via the capacitance of the touched human body at the position touched across the substrate, for example, around the first conductive film. There is a change in the resistance value between each position detection electrode and the ground point. Then, by detecting this change using, for example, a position detection circuit, the touched position is detected, and it functions as a capacitive coupling type touch panel.
  • the first transparent conductive film for detecting the touch position generally has a higher electrical resistance than the second transparent conductive film to which a display signal is supplied, the position detection signal is the first. It is reliably generated in the transparent conductive film, and a display signal is promptly supplied to the second transparent conductive film. Therefore, even if the touch panel of the present invention has a touch panel function, the occurrence of shadowing is suppressed and the deterioration of display quality is suppressed.
  • a touch panel on which a first transparent conductive film for detecting a touch position is formed is attached to the front surface of the display screen of the display device, and three substrates are used as a display device having a touch panel function.
  • the touch panel of the present invention is composed of one of a pair of substrates constituting a display device, and one substrate can be omitted, so that the device itself is thin and lightweight. Is possible.
  • the display quality is prevented from deteriorating and the device itself can be made thin and light.
  • the touch panel display device of the present invention is a touch panel display device that detects the position touched by the capacitive coupling method and displays an image.
  • the second touch panel display device supplies a display signal to the second substrate. Since the transparent conductive film and the first transparent conductive film for detecting the touched position are respectively provided, it is possible to suppress deterioration of display quality and to make the device itself thin and light. .
  • FIG. 1 is a schematic cross-sectional view of a touch panel display device 50a according to Embodiment 1 of the present invention.
  • FIG. 2 is a diagram showing a structure of a touch panel display device 50a according to Embodiment 1 of the present invention.
  • FIG. 6 is a schematic plan view partially showing the H panel 30a.
  • FIG. 3 is a schematic sectional view taken along the line III-III in FIG.
  • FIG. 4 is a schematic plan view showing position detection electrodes A, B, C, and D of the touch panel 30a constituting the touch panel display device 50a according to Embodiment 1 of the present invention.
  • FIG. 5 is a schematic diagram for explaining the operating principle of a capacitive coupling type touch sensor.
  • FIG. 6 is a schematic diagram for explaining the operating principle of the touch panel display device 50a according to Embodiment 1 of the present invention.
  • FIG. 7 is a schematic cross-sectional view of a touch panel 30b constituting the touch panel display device according to Embodiment 1 of the present invention.
  • FIG. 8 is a schematic cross-sectional view of a touch panel display device 50c according to Embodiment 2 of the present invention.
  • FIG. 9 is a schematic cross-sectional view of a touch panel display device 50d according to Embodiment 3 of the present invention.
  • FIG. 10 is a schematic cross-sectional view of a touch panel 30e constituting a touch panel display device according to Embodiment 4 of the present invention.
  • FIG. 11 is a schematic cross-sectional view of a touch panel display device 50f according to Embodiment 5 of the present invention.
  • FIG. 12 is a schematic cross-sectional view of a touch panel 30g constituting a touch panel display device according to Embodiment 5 of the present invention.
  • FIG. 13 is a schematic cross-sectional view of a conventional touch panel display device 150.
  • Second transparent electrode (second transparent conductive film)
  • Second glass substrate (second substrate)
  • FIG. 1 is a schematic cross-sectional view of a touch panel display device 50a according to Embodiment 1 of the present invention.
  • FIG. 2 is a schematic plan view partially showing the touch panel 30a constituting the touch panel display device 50a.
  • FIG. 3 is a schematic cross-sectional view taken along the III-III section in FIG.
  • the touch panel display device 50a is an active matrix substrate 20, a touch panel 30a disposed opposite to the active matrix substrate 20, and the active matrix substrate 20 and the touch panel 30a.
  • the touch panel display device 50a is a display medium layer.
  • the active matrix substrate 20 includes a first glass substrate 8 that is a first substrate, and a TFT array layer 7.
  • the TFT array layer 7 includes a plurality of gate lines provided to extend in parallel to each other, a plurality of source lines provided to extend in parallel to each other in a direction orthogonal to the gate lines, Capacitance lines provided between the gate lines so as to extend in parallel with the gate lines, TFTs provided at the intersections of the gate lines and the source lines, and a pair of adjacent gate lines corresponding to the respective TFTs And a pixel electrode 7a which is provided in a display region surrounded by a pair of adjacent source lines and which constitutes a pixel.
  • the active matrix substrate 20 has a multilayer laminated structure in which a gate insulating film and an interlayer insulating film are sequentially laminated on the first glass substrate 8.
  • a gate line and a capacitor line are provided between the first glass substrate 8 and the gate insulating film.
  • This gate line has a gate electrode projecting in the direction in which the source line extends corresponding to each TFT.
  • a semiconductor layer constituting the TFT is provided between the gate insulating film and the interlayer insulating film, and the source line force and the gate line corresponding to each TFT are provided above the semiconductor layer.
  • a source electrode protruding in the extending direction of the electrode and a drain electrode facing the source electrode are provided.
  • a pixel electrode 7a connected to the drain electrode through a contact hole is provided above the interlayer insulating film, and an alignment film is provided above the pixel electrode 7a.
  • the drain electrode is extended to a region where the capacitance line is arranged, and the portion facing the capacitance line is an auxiliary capacitance electrode.
  • the auxiliary capacitor electrode forms an auxiliary capacitor together with the capacitor line via the gate insulating film.
  • the touch panel 30a includes a second glass substrate 4 that is a second substrate, and a first transparent electrode that is provided on the second glass substrate 4 and that is a first transparent conductive film for detecting the touched position. 3, a color filter layer 2 that covers the first transparent electrode 3 and functions as an insulating layer, and a second transparent conductive film that is provided so as to cover the color filter layer 2 and is supplied with a display signal. And a second transparent electrode 1.
  • the surface resistance of the first transparent electrode 3 is 400 to 1600 ⁇ in order to sufficiently function as a touch panel, and the surface resistance of the second transparent electrode 1 is 30 to 100 ⁇ in order to maintain display quality. It has become.
  • the surface resistance of the first transparent electrode 3 is not less than 400 ⁇ and not more than 1600 ⁇ , a position detection signal is reliably generated in the first transparent electrode 3, and the position detection The signal can be reliably transmitted to the position detection circuit.
  • the surface resistance of the first transparent electrode 3 is less than ⁇ , or exceeds 1600 ⁇ , it is difficult to accurately detect the touched position.
  • the first transparent electrode 3 is provided with position detection electrodes A, B, C, and D that are electrically connected to each corner of the peripheral edge thereof.
  • the second glass substrate 4 includes a position detection wiring portion 11 in which each of the position detection electrodes A, B, C, and D forces also extends, and a position detection wiring terminal that is an end of the position detection wiring portion 11. Part 13 and a frame part 12 provided so as to cover the peripheral edge of the first transparent electrode 3.
  • the color filter layer 2 includes a coloring layer 2a in which one of red, green, and blue is disposed corresponding to each pixel, and a black matrix 2b provided between the coloring layers 2a. I have.
  • the liquid crystal layer 40 is made of a nematic liquid crystal material having liquid crystal molecular force having electro-optical characteristics.
  • this touch panel display device 50a one pixel is formed for each pixel electrode 7a.
  • the source line is turned on.
  • a source signal is sent from the pixel electrode and a predetermined charge is written to the pixel electrode 7a via the source electrode and the drain electrode, and a potential difference is generated between the pixel electrode 7a and the second transparent electrode 1,
  • a predetermined voltage is applied to the liquid crystal capacitor and the auxiliary capacitor composed of the liquid crystal layer 40.
  • an image is displayed by adjusting the transmittance of light incident from the backlight 6 by utilizing the change in the alignment state of the liquid crystal molecules according to the magnitude of the applied voltage. Is done.
  • the first transparent electrode 3 is capacitively coupled to the ground (grounding surface) through a person.
  • This capacity is the sum of the capacity between the polarizing plate 5 and the first transparent electrode 3 and the capacity existing between the person and the ground. If the touch panel 30a is not touched, the position detection electrode A Since the same voltage is applied from B, C and D, no steady current flows.
  • the electrical resistance between the capacitively coupled contact portion and each position detection electrode A, B, C, and D of the first transparent electrode 3 is the contact resistance and each position detection electrode A, B, C, and D. Is proportional to the distance between. Therefore, a current proportional to each distance between the contact portion and the position detection electrodes A, B, C, and D flows through the position detection electrodes A, B, C, and D of the first transparent electrode 3. It will be awkward. By detecting the magnitude of these currents, the position coordinates of the contact portion can be obtained.
  • FIG. 5 a one-dimensional resistor sandwiched between electrodes A and B is shown for ease of explanation.
  • the opposing conductive film having a two-dimensional extent performs the same function as this one-dimensional antibody.
  • a current-voltage conversion resistor r is connected to each of the electrodes A and B.
  • a and B are connected to a position detection circuit.
  • a voltage having the same homologous potential (AC e) is applied between the electrode A and the ground and between the electrode B and the ground. At this time, since the electrodes A and B are always at the same potential, no current flows between the electrodes A and B.
  • Equation 4 Substituting Equation 4 into Equation 1 yields Equation 5 below.
  • Equation 7 is obtained.
  • R / R (2r / R + l) i / (i + i) -r / R (Formula 8)
  • Equation 8 holds, and changes and conditions due to people and materials can be ignored.
  • position detection electrodes A, B, C, and D are formed at each corner (four corners) of the first transparent electrode 3. These position detection electrodes A, B, C, and D are connected to a position detection circuit via a position detection wiring portion 11 and a position detection wiring terminal portion 13.
  • the position detection electrodes A, B, C, and D are applied with alternating voltages of the same homogenous potential, and the currents flowing through the four corners of the first transparent electrode 3 by contact with a finger or the like are respectively i, i, i and i
  • X is the X coordinate of the touched position on the first transparent electrode 3
  • Y is the Y coordinate of the touched position on the first transparent electrode 3.
  • K is the offset
  • k is the magnification
  • the measured force of 1 2 3 and i can also determine the contact position.
  • electrodes are arranged at the four corners of the first transparent electrode 3, and a current flowing through each electrode is measured to detect a contact position on a two-dimensionally spread surface.
  • second 1 The number of electrodes of transparent electrode 3 is not limited to four. The minimum number of electrodes required for two-dimensional position detection is 3. By increasing the number of force electrodes to 5 or more, the accuracy of position detection can be improved.
  • the touch panel display device 50a is manufactured through an active matrix substrate manufacturing process, a touch panel manufacturing process, and a touch panel display device manufacturing process, which will be described later.
  • a metal film (thickness 1500 mm) that has aluminum isotropic force over the entire substrate on the first glass substrate 8.
  • A) is formed by sputtering, and then a pattern is formed by a photolithography technique (hereinafter referred to as “PEP technique”) to form gate lines, gate electrodes, and capacitor lines.
  • PEP technique a photolithography technique
  • CVD Chemical Vapor
  • a silicon nitride film (thickness of about 4000 A) is formed by the D mark osition method, and a gate insulating film is formed.
  • an intrinsic amorphous silicon film (thickness of about 1500 A) and a phosphorus-doped n + amorphous silicon film (thickness of about 400 A) are continuously formed on the entire substrate on the gate insulating film by a CVD method. After that, a film is formed into an island shape by the PEP technique, and a semiconductor layer such as an intrinsic amorphous silicon layer and an n + amorphous silicon layer is formed.
  • a metal film (thickness of about 1500 A) made of aluminum, titanium, or the like is formed on the gate insulating film on which the semiconductor layer is formed by sputtering, and then patterned by PEP technology.
  • a source line, a source electrode, and a drain electrode are formed.
  • n + amorphous silicon layer is etched away using the source electrode and the drain electrode as a mask to form a channel portion.
  • a photosensitive acrylic resin film (thickness of about 3 ⁇ m) or the like is applied to the entire substrate on the gate insulating film on which the source electrode and the drain electrode are formed by using a spin coating method. Form an edge film.
  • a transparent conductive film (thickness of about 1000 A) made of a polycrystalline ITO (Indium Tin Oxide) film is formed on the entire substrate on the interlayer insulating film by sputtering, and then the PEP technology Then, the pixel electrode 7a is formed by pattern formation.
  • a transparent conductive film thickness of about 1000 A
  • ITO Indium Tin Oxide
  • polyimide resin is applied to the entire substrate on which the pixel electrode 7a is formed at a thickness of about 500 A, and an alignment treatment is performed on the surface by rubbing to form an alignment film.
  • the active matrix substrate 20 in which the TFT array layer 7 is formed on the first glass substrate 8 can be manufactured.
  • the first glass substrate 8 has a region extending outside the periphery of the display region, in which the pixel TFT in the display region is driven, and a desired amount of charge is applied to the pixel electrode 7a.
  • a drive circuit (a gate driver and a source drain) for supply is formed.
  • the TFT constituting the drive circuit is formed in the same process as the TFT in the display region, so that the semiconductor layer is made of a polycrystalline silicon film in order to increase the operation speed of the drive circuit. It is preferable to do. Furthermore, in order to increase the TFT operating speed as much as possible, it is desirable to fabricate the TFT using a CGS (Continuous Grain Silicon) film.
  • CGS Continuous Grain Silicon
  • a transparent conductive film (thickness 50 to 150 A) made of an amorphous ITO film or an IZO (Indium Zinc Oxide) film is formed on the second glass substrate 4 so that the surface resistance is 00 to 1600 ⁇ .
  • a first transparent electrode 3 is formed by sputtering using a mask.
  • the transparent conductive film may be a polycrystalline film or an In 2 O film as long as the predetermined surface resistance is reached.
  • the thickness of the first transparent electrode 3 is not less than 50A and not more than 150A, a signal for position detection is reliably generated in the first transparent electrode 3, and the signal for position detection is generated. This can be transmitted to the position detection circuit without fail.
  • the thickness of the first transparent electrode 3 is less than 50 A, the electrical resistance of the first transparent electrode 3 becomes too high, and it is difficult to accurately detect the touched position. is there.
  • the thickness of the first transparent electrode 3 exceeds 150A. In such a case, the transmittance of the first transparent conductive film is greatly reduced, and the display quality is impaired.
  • the second transparent electrode 1 to which a display signal is supplied is formed of a polycrystalline film.
  • the first transparent electrode 3 for detecting the touch position has a higher electrical resistance than the second transparent electrode 1.
  • a transparent conductive film (thickness of about 3000 A) having an ITO film equal force was used using a mask so that the surface resistance was 3 to 5 ⁇ .
  • a frame 12 is formed by sputtering.
  • an Ag alloy (thickness of about 300 OA) is masked so that the surface resistance is 0.2 to 0.3 ⁇ . Films are formed by the sputtering method used to form the position detection wiring part 11 and the position detection electrodes A, B, C and D.
  • the entire thickness of the substrate on which the position detection wiring portion 11 and the position detection electrodes A, B, C, and D are formed is coated with a photosensitive resist material containing a black pigment using a printing method. Apply at ⁇ 2 m, and then form a black matrix 2b by patterning using PEP technology.
  • a photosensitive resist material or the like in which any one of red, green, and blue pigments is dispersed is applied to the entire substrate on which the black matrix 2b is formed in a thickness of about 1 to 3 ⁇ m.
  • a pattern is formed by the PEP technique to form the colored layer 2a of the selected color.
  • the same process is repeated for the other two colors to form a color filter layer 2 in which a colored layer 2a of one color is provided for each pixel.
  • the first transparent electrode 3 for detecting the touch position and the second transparent electrode 1 to which the counter signal is inputted Due to the electrical capacitance C between the first transparent electrode 3 and the second transparent electrode 1, interference may occur, making it difficult to detect the touch position. Therefore, it is desirable to laminate a transparent insulating layer 14 on the color filter layer 2 as shown in FIG. 7 so as not to be affected by the counter signal.
  • This insulating layer 14 is formed after the color filter layer 2 is formed. Alternatively, it may be formed between the first transparent electrode 3 and the color filter layer 2 after the first transparent layer 3 is formed.
  • the insulating layer 14 is made of a photosensitive resist material or the like, and is laminated using PEP technology, a plate, an ink jet, or the like.
  • the capacitance C between the first transparent electrode 3 and the second transparent electrode 1 is calculated by ⁇ (dielectric constant) XS (area) Zd (film thickness). Therefore, the thickness of the insulating layer 14 is about 30 m. If the insulating layer 14 is not provided, the electric capacity C becomes about 0.3 F, and interference is likely to occur between the first transparent electrode 3 and the second transparent electrode 1.
  • a transparent conductive film such as an ITO film is applied to the entire substrate on which the color filter layer 2 is formed, so that the surface resistance is 30 to about ⁇ .
  • the second transparent electrode 1 is formed by forming a film by a notching method using a mask.
  • a polyimide resin is applied to the entire substrate on which the pixel electrode 7a is formed at a thickness of about 500 A, and an alignment treatment is performed on the surface by rubbing to form an alignment film.
  • the touch panel 30a can be manufactured as described above.
  • a sealing material having a thermosetting epoxy resin equivalent force is applied to the frame-like pattern lacking the liquid crystal inlet portion, and applied to the other substrate.
  • the active matrix substrate 20 and the touch panel 30a are bonded together, the sealing material is cured, and empty cells are formed.
  • a liquid crystal material is injected between the active matrix substrate 20 and the touch panel 30a of the empty cell by a decompression method to form a liquid crystal layer 40. Then, apply UV curable resin to the liquid crystal injection port, cure the UV curable resin by UV irradiation, and seal the injection port.
  • the polarizing plate 5, the optical sheets 10 and the backlight 6 are attached to the surface of the active matrix substrate 20, and the polarizing plate 5 is attached to the surface of the touch panel 30a.
  • the touch panel display device 50a can be manufactured as described above.
  • the touch panel display device 50a As described above, according to the touch panel display device 50a according to the first embodiment of the present invention. For example, by supplying a display signal to each pixel electrode 7a provided on the first glass substrate 8 and to the second transparent electrode 1 provided on the second glass substrate 4, the liquid crystal layer 40 is supplied with a display signal. A voltage is applied and an image is displayed.
  • the first transparent electrode 3 has the capacitance of the touched human body at the position touched across the second glass substrate 4.
  • the resistance value between the position detection electrodes A, B, C, and D provided around the first transparent electrode 3 and the contact point changes. Then, by detecting this change by the position detection circuit, the touched position is detected and functions as a capacitive coupling type touch panel.
  • the position detection signal is the first one.
  • the signal can be reliably generated at the 1 transparent electrode 3 and a display signal can be promptly supplied to the liquid crystal layer 40 via the second transparent electrode 1.
  • the touch panel display device 50a of the present embodiment has a touch panel function, the occurrence of shadowing can be suppressed and deterioration of display quality can be suppressed.
  • a touch panel on which a transparent electrode for detecting the touch position is formed is mounted on the front surface of the display screen of the display device, so that three substrates are used as a display device having a touch panel function.
  • the touch panel display device 50a of the present embodiment is composed of two glass substrates 4 and 8 and one glass substrate is omitted, the device itself can be made thin and light. it can.
  • the touch panel display device 50a of the present embodiment since the air layer 118 exists between the polarizing plate 105 and the touch panel 130 attached to the surface, the refractive index of the air layer 118 is reduced. If the difference becomes large and the light transmittance decreases !, the touch panel display device 50a of the present embodiment has no air layer corresponding to the air layer 118. The transmittance can be improved.
  • the liquid crystal panel can be manufactured. After finishing the process, the polarizing plate is attached in a separate process, and after the module is mounted, the touch panel is further attached.
  • the touch panel display device 50a according to the present embodiment has the function of the touch panel. Since it is built into the counter substrate, in-line production is possible, and the manufacturing process can be reduced.
  • the touch panel display device 50a of the present embodiment is constituted by two glass substrates 4 and 8, and it is possible to omit one glass substrate as compared with the conventional glass substrate as described above.
  • the number of divisions of the substrate can be reduced, and the manufacturing process can be reduced. Therefore, it is possible to suppress a decrease in manufacturing yield due to adhesion of cullet (glass waste) at the time of division.
  • FIG. 8 is a schematic cross-sectional view of a touch panel display device 50c according to Embodiment 2 of the present invention.
  • the touch panel display device 50c is a display medium layer sandwiched between the active matrix substrate 20, the touch panel 30c disposed opposite to the active matrix substrate 20, and the active matrix substrate 20 and the touch panel 30c.
  • the components other than the touch panel 30c are substantially the same as those in the first embodiment, and therefore, the touch panel 30c will be mainly described.
  • the touch panel 30c is provided so as to cover the second glass substrate 4 as the second substrate, the color filter layer 2 provided on the second glass substrate 4, and the color filter layer 2.
  • a first transparent electrode 3 which is a first transparent conductive film for detecting the position, a insulating layer 14 covering the first transparent electrode 3, and a display signal provided so as to cover the insulating layer 14.
  • a second transparent electrode 1 which is a second transparent conductive film to which is supplied.
  • a method for manufacturing the touch panel 30c will be described.
  • a photosensitive resist material containing a black pigment is applied to the entire substrate of the second glass substrate 4 at a thickness of about 1-2 / ⁇ ⁇ using a printing method, and then by PEP technology.
  • a black matrix 2b is formed by pattern formation.
  • a photosensitive resist material or the like in which any one of red, green, and blue pigments is dispersed is applied to the entire substrate on which the black matrix 2b is formed in a thickness of about 1 to 3 ⁇ m.
  • a pattern is formed by the PEP technique to form the colored layer 2a of the selected color.
  • the same process is repeated for the other two colors to form a color filter layer 2 in which a colored layer 2a of one color is provided for each pixel.
  • a transparent conductive film (thickness 50-: LOOA) made of an amorphous ITO film or IZO film is formed by sputtering using a mask so as to have a surface resistance of 00-1600 ⁇ .
  • the first transparent electrode 3 is formed as a film.
  • This transparent conductive film may be a polycrystalline film or an In 2 O film as long as it has the predetermined surface resistance.
  • a transparent conductive film (thickness of about 3000 A) having an ITO film equal force was used with a mask so that the surface resistance was 3 to 5 ⁇ .
  • a frame 12 is formed by sputtering.
  • an Ag alloy (thickness of about 3000 mm) is sputtered using a mask so that the surface resistance is 0.2 to 0.3 ⁇ .
  • the film is formed by the method, and the position detection wiring portion 11 and the position detection electrodes A, B, C, and D are formed.
  • a photosensitive resist material or the like is applied to the entire substrate on which the first transparent electrode 3 is formed to a thickness of 30.
  • a transparent conductive film such as an ITO film is applied to the entire substrate on which the insulating layer 14 has been formed, with a mask so that the surface resistance is 30 to: ⁇ ⁇ .
  • the second transparent electrode 1 is formed by film formation by the sputtering method used.
  • polyimide resin is applied to the entire substrate on which the pixel electrode 7a is formed at a thickness of about 500 A, and an alignment process is performed on the surface by rubbing to form an alignment film.
  • the touch panel 30c can be manufactured as described above.
  • the first transparent electrode 3, the insulating layer 14, and the second transparent electrode 1 may be formed in this order on a general color filter substrate in which a color filter layer is formed on a glass substrate.
  • the effects of the present invention can be achieved using a general commercially available color filter substrate.
  • FIG. 9 is a schematic cross-sectional view of a touch panel display device 50d according to Embodiment 3 of the present invention.
  • the touch panel display device 50d is a display medium layer sandwiched between the active matrix substrate 20, the touch panel 30d disposed opposite to the active matrix substrate 20, and the active matrix substrate 20 and the touch panel 30d.
  • the components other than the touch panel 30d are substantially the same as those in the first embodiment, and therefore, the touch panel 30d will be mainly described.
  • the touch panel 30d is provided so as to cover the second glass substrate 4 as the second substrate, the color filter layer 2 provided on the lower side of the second glass substrate 4, and the color filter layer 2.
  • a second transparent electrode 1 that is a second transparent conductive film to which a display signal is supplied and a first glass electrode provided on the upper side of the second glass substrate 4 for detecting the touched position.
  • a first transparent electrode 3 which is a transparent conductive film.
  • a transparent conductive film (thickness 50-: L00A) made of an amorphous ITO film or IZO film is applied to the entire surface of one surface of the second glass substrate 4, and the surface resistance is 00-1600 ⁇ . Then, the first transparent electrode 3 is formed by sputtering using a mask.
  • the transparent conductive film may be a polycrystalline film or an In 2 O film as long as the predetermined surface resistance is reached.
  • a photosensitive resist material containing a black pigment is applied to the entire substrate on the other side of the second glass substrate 4 with a thickness of about 1 to 2 m using a printing method, and then The black matrix 2b is formed by patterning using PEP technology.
  • a photosensitive resist material or the like in which any one of red, green, and blue pigments is dispersed is applied to the entire substrate on which the black matrix 2b is formed in a thickness of about 1 to 3 ⁇ m.
  • a pattern is formed by the PEP technique to form the colored layer 2a of the selected color. Further, the same process is repeated for the other two colors to form a color filter layer 2 in which a colored layer 2a of one color is provided for each pixel.
  • a transparent conductive film such as an ITO film is applied to the entire substrate on which the color filter layer 2 is formed, so that the surface resistance is 30 to: ⁇ ⁇ .
  • the second transparent electrode 1 is formed by forming a film by a sputtering method using a mask.
  • polyimide resin is applied to the entire substrate on which the pixel electrode 7a is formed at a thickness of about 500 A, and an alignment treatment is performed on the surface by rubbing to form an alignment film.
  • the touch panel 30d can be manufactured as described above.
  • the touch panel display device 50d according to Embodiment 3 of the present invention, the first transparent electrode 3 and the general color filter substrate in which the color filter layer is formed on the glass substrate.
  • the second transparent electrode 1 By forming the second transparent electrode 1, the structure of the touch panel of the present invention can be realized, so that the effects of the present invention can be achieved using a general commercially available color filter substrate.
  • FIG. 10 is a schematic cross-sectional view of a touch panel 30e constituting the touch panel display device according to Embodiment 4 of the present invention.
  • the touch panel 30a of the first embodiment and the constituent force of the polarizing plate 5 become the touch panel 30e!
  • the touch panel 30e detects the second glass substrate 4 as the second substrate, the polarization pattern layer 15 provided on the second glass substrate 4, and the touched position covering the polarization pattern layer 15.
  • a first transparent electrode 3 that is a first transparent conductive film
  • a color filter layer 2 that covers the first transparent electrode 3 and functions as an insulating layer, and covers the color filter layer 2 to display
  • a second transparent electrode 1 which is a second transparent conductive film to which a signal for use is supplied.
  • a method for manufacturing the touch panel 30e will be described.
  • a photosensitive resin film having a polarization characteristic (thickness 2 to 3; about ⁇ ⁇ ⁇ ) or the like is applied to the entire second glass substrate 4 using a plate, and the polarization pattern layer 15 is applied. Form.
  • a transparent conductive film (thickness 50 to 150 A) made of an amorphous ITO film or IZO film is applied to the entire substrate on which the polarization pattern layer 15 is formed so that the surface resistance is 00 to 1600 ⁇ .
  • a first transparent electrode 3 is formed by film formation by a sputtering method using a mask.
  • This transparent conductive film may be a polycrystalline film or an InO film as long as it has the predetermined surface resistance.
  • the frame portion 12 is formed by sputtering using a mask so that the surface resistance is 3 to 5 ⁇ .
  • an Ag alloy (thickness of about 3000 mm) is sputtered using a mask so that the surface resistance is 0.2 to 0.3 ⁇ .
  • the position detection wiring 11 and the position detection electrodes A, B, C and D are formed.
  • a photosensitive resist material containing a black pigment is applied to the entire substrate on which the first transparent electrode 3 is formed using a printing method at a thickness of about 1/2 / ⁇ , and then The black matrix 2b is formed by forming a turn using PEP technology.
  • a photosensitive resist material in which any of red, green and blue pigments is dispersed is applied to the entire substrate on which the black matrix 2b is formed in a thickness of about 1 to 3 ⁇ m. Thereafter, a pattern is formed by the PEP technique to form the colored layer 2a of the selected color. Further, the same process is repeated for the other two colors to form a color filter layer 2 in which a colored layer 2a of one color is provided for each pixel.
  • a transparent conductive film such as an ITO film is applied to the entire substrate on which the color filter layer 2 is formed, so that the surface resistance is 30 to: ⁇ ⁇ .
  • the second transparent electrode 1 is formed by forming a film by a sputtering method using a mask.
  • polyimide resin is applied to the entire substrate on which the pixel electrode 7a is formed at a thickness of about 500 A, and an alignment treatment is performed on the surface by rubbing to form an alignment film.
  • the touch panel 30e can be manufactured as described above.
  • a polarizing plate that has been attached to the surface of a display device can be incorporated into the inside of the display device, so that the step of attaching the polarizing plate can be reduced.
  • the polarization pattern layer 15 is applied instead of the polarizing plate 5 constituting the touch panel 30a of the first embodiment.
  • the polarization pattern layer 15 is used in the touch panels of the above-described and following embodiments. You can apply it!
  • FIG. 11 is a schematic cross-sectional view of a touch panel display device 50f according to Embodiment 5 of the present invention.
  • the touch panel display device 50f includes a liquid crystal display panel 45 for displaying an image, a touch panel 30f disposed opposite to the liquid crystal display panel 45 with a polarizing plate 5 and a retardation plate 9, and a liquid crystal display panel 45.
  • a backlight 6 provided through a polarizing plate 5 and an optical sheet 10 is provided on the lower side in FIG.
  • the touch panel display device 50f displays different images for a plurality of viewpoints, such as a 2DZ3D switching type liquid crystal display panel that enables switching between 2D display and 3D display by the touch panel 30f that functions as a switching panel.
  • the first display state to be switched and the second display state to display one image in the full screen display can be switched.
  • the liquid crystal display panel 45 is sandwiched between the active matrix substrate 20a and the color filter substrate 35, which are a pair of display panel substrates arranged to face each other, and the active matrix substrate 20a and the color filter substrate 35. And a liquid layer 40 as a display medium layer.
  • the active matrix substrate 20a has an FPC (Flexible for inputting image data corresponding to an image to be displayed at the end of the active matrix substrate 20 of each of the embodiments described above.
  • FPC Flexible for inputting image data corresponding to an image to be displayed at the end of the active matrix substrate 20 of each of the embodiments described above.
  • the color filter substrate 35 is provided so as to cover the glass substrate 19c, the color filter layer 2 provided on the glass substrate 19, and the color filter layer 2, and a display signal (image data). And a second transparent electrode 1 to which is supplied.
  • the touch panel 30f is a pair of switching panel substrates disposed to face each other.
  • the drive substrate 19a is provided with a drive electrode for applying a drive voltage when the liquid crystal layer 41 is turned on, and a wiring 21b such as an FPC (Flex3 ⁇ 4le Printed Circuit) is attached.
  • a drive electrode for applying a drive voltage when the liquid crystal layer 41 is turned on
  • a wiring 21b such as an FPC (Flex3 ⁇ 4le Printed Circuit) is attached.
  • the counter substrate 19b includes a first transparent electrode 3 which is a transparent conductive film for detecting the touched position, an insulating layer so as to cover the first transparent electrode 3, and a liquid crystal on the insulating layer.
  • a drive electrode for applying a drive voltage when the layer 41 is ON is provided.
  • the first transparent electrode 3 is provided with a position detection electrode electrically connected to each corner of the peripheral end thereof, as in the above embodiments.
  • the counter substrate 19b covers the position detection wiring portion extending from each position detection electrode, the position detection wiring terminal portion that is the end of the position detection wiring portion, and the peripheral edge of the first transparent electrode 3. And a frame portion provided in the frame.
  • the touch panel display device 50f the polarization state of the transmitted light is switched according to ONZOFF of the liquid crystal layer 41 just by functioning as a position detecting means for detecting the touched position of the touch panel 30f. It functions as a switching means that is possible.
  • the touch panel 30f functions as a switching means by changing the optical modulation action to the transmitted light between 2D display and 3D display.
  • the touch panel display device 50f is manufactured through the active matrix substrate manufacturing process described in the first embodiment, the color filter substrate manufacturing process, the touch panel manufacturing process, and the touch panel display device manufacturing process described below.
  • a photosensitive resist material containing a black pigment is applied to the entire substrate on the glass substrate 19c with a thickness of about 1-2 / ⁇ ⁇ using a printing method, and then a black pattern is formed by PEP technology. A matrix 2b is formed.
  • a photosensitive resist material in which any of red, green and blue pigments is dispersed is applied to the entire substrate on which the black matrix 2b is formed in a thickness of about 1 to 3 ⁇ m. And that Thereafter, a pattern is formed by the PEP technique to form the colored layer 2a of the selected color. Further, the same process is repeated for the other two colors to form a color filter layer 2 in which a colored layer 2a of one color is provided for each pixel.
  • a transparent conductive film such as an ITO film is applied to the entire substrate on which the color filter layer 2 is formed, so that the surface resistance is 30 to: ⁇ ⁇ .
  • the second transparent electrode 1 is formed by forming a film by a sputtering method using a mask.
  • a polyimide resin is applied to the entire substrate on which the pixel electrode 7a is formed at a thickness of about 500 A, and an alignment treatment is performed on the surface by rubbing to form an alignment film.
  • the color filter substrate 35 can be produced as described above.
  • a transparent conductive film (thickness of about 100 A) such as an ITO film is formed on a glass substrate by a sputtering method using a mask to form drive electrodes and the like.
  • a polyimide resin is applied to the entire substrate on the drive substrate 19a on which the drive electrodes and the like are formed at a thickness of about 500A, and an alignment treatment is performed on the surface by rubbing to form an alignment film. Then, a driving substrate 19a is manufactured.
  • a transparent conductive film (thickness 50 to 150 A) made of an amorphous ITO film or an IZO (Indium Zinc Oxide) film is formed on the glass substrate 19 so that the surface resistance is 00 to 1600 ⁇ . Then, a transparent electrode 3 is formed by forming a film by a sputtering method using a mask. This transparent conductive film
  • a polycrystalline film or an In 2 O film may be used.
  • a transparent conductive film (thickness of about 3000 A) having an ITO film equal force was used with a mask so that the surface resistance was 3 to 5 ⁇ .
  • the frame is formed by sputtering.
  • an Ag alloy (thickness of about 3000 A) is used so that the surface resistance is 0.2 to 0.3 ⁇ .
  • the position detection wiring portion and each position detection electrode are formed by the sputtering method.
  • a photosensitive resist material or the like is applied to the entire substrate on which the transparent electrode 3, the frame portion, the position detection wiring portion, and each position detection electrode are formed to a thickness of about 1 to 3 m, and thereafter Then, the insulating layer is formed by patterning with PE P technology. Next, a transparent conductive film (thickness 140) such as an ITO film is formed on the entire substrate on which the insulating layer is formed.
  • OA is formed by a sputtering method using a mask so that the surface resistance is 30 to: ⁇ , thereby forming drive electrodes and the like.
  • polyimide resin was applied to the entire substrate on which the drive electrodes and the like were formed to a thickness of about 500 mm, and the surface was subjected to orientation treatment by a rubbing method to produce a counter substrate 19b.
  • the driving substrate 19a and the counter substrate 19b are bonded together, the sealing material is cured, and an empty cell is formed.
  • a liquid crystal material is injected between the driving substrate 19a and the counter substrate 19b of the empty cell by a decompression method to form a liquid crystal layer 41. Then, apply UV curable resin to the liquid crystal inlet, cure the UV curable resin by UV irradiation, and seal the inlet.
  • the polarizing plate 5 is attached to the surface of the counter substrate 19b.
  • the touch panel 30f can be manufactured as described above.
  • a seal material such as a thermosetting epoxy resin is applied on one of the active matrix substrate 20a and the color filter substrate 35 to a frame-like pattern lacking the liquid crystal injection port by screen printing, and the other A spherical spacer made of resin or silica having a diameter corresponding to the thickness of the liquid crystal layer is sprayed on the substrate.
  • the active matrix substrate 20a and the color filter substrate 35 are bonded together, and the seal material is cured to form empty cells.
  • a liquid crystal material is injected between the active matrix substrate 20a of the empty cell and the color filter substrate 35 by a decompression method to form a liquid crystal layer 40.
  • a UV curable resin is applied to the liquid crystal injection port, the UV curable resin is cured by UV irradiation, the injection port is sealed, and the liquid crystal display panel 45 is manufactured.
  • the polarizing plate 5 is provided on the surface of the active matrix substrate 20a constituting the liquid crystal display panel 45, and the polarizing plate 5, the optical sheets 10 and the backlight 6 are provided on the surface of the color filter substrate 35 constituting the liquid crystal display panel 45. Attach to each.
  • the touch panel 30f is attached to the drive substrate 19a side via the phase difference plate 9 on the active matrix substrate 20a side of the liquid crystal display panel 45 to which the polarizing plate 5 and the like are attached.
  • the touch panel display device 50f can be manufactured as described above.
  • the pixel electrodes 7a provided on the first glass substrate 8 and the second glass substrate 4 are provided.
  • a voltage is applied to the liquid crystal layer 40 and an image is displayed.
  • the first transparent electrode 3 is grounded via the capacitance of the touched human body at the position touched over the glass substrate 19. Then, a change occurs in the resistance value between each position detection electrode provided around the first transparent electrode 3 and the ground point. By detecting this change by the position detection circuit, the touched position is detected, and it functions as a capacitively coupled touch panel.
  • the position detection signal is the first one.
  • the signal can be reliably generated at the 1 transparent electrode 3 and a display signal can be promptly supplied to the liquid crystal layer 40 via the second transparent electrode 1.
  • touch panel display device 50f of the present embodiment is composed of four glass substrates, omitting one glass substrate! /, So the device itself is thin and lightweight. Can be. [0216] Therefore, in the capacitively coupled touch panel, it is possible to suppress deterioration of display quality and to make the device itself thin and light.
  • the touch panel 30f is configured as shown in FIG.
  • a touch panel as shown in 2 may be 30 g.
  • the touch panel 30g only the first transparent electrode 3 is provided between the counter substrate 19b and the polarizing plate 5, and the other configuration is substantially the same as that of the touch panel 30f.
  • an active matrix drive type liquid crystal display device in which the switching element for driving the liquid crystal is TFT is suitable in terms of light weight and low power consumption.
  • STN can also be applied to liquid crystal display methods such as liquid crystal and other display devices such as organic EL.
  • the present invention is useful for car navigation systems, PDAs (Personal Digital Assistants) and the like because the device itself can be made thin and light.

Abstract

A touch panel display for detecting a touched position by a capacitive coupling system and displaying an image comprising a first glass substrate (8) and a second glass substrate (4) arranged oppositely to each other, a liquid crystal layer (40) interposed between both glass substrates (8, 4), a plurality of pixel electrodes (7a) arranged between the liquid crystal layer (40) and the first glass substrate (8), a first transparent electrode (3) arranged between the liquid crystal layer (40) and the second glass substrate (4) and detecting a touched position, a second transparent electrode (1) provided between the first transparent electrode (3) and the liquid crystal layer (40) and being supplied with a display signal, and a color filter layer (2) interposed between the second transparent electrode (1) and the first transparent electrode (3).

Description

明 細 書  Specification
タツチパネル表示装置及びタツチパネル  Touch panel display device and touch panel
技術分野  Technical field
[0001] 本発明は、タツチパネル表示装置及びタツチパネルに関するものである。  The present invention relates to a touch panel display device and a touch panel.
背景技術  Background art
[0002] タツチパネルは、指やペン等でタツチ (押圧)することによって、コンピュータ等の情 報処理装置に対話形式で情報を入力する装置である。  A touch panel is a device that inputs information interactively to an information processing device such as a computer by touching (pressing) with a finger, a pen, or the like.
[0003] また、タツチパネルは、その動作原理によって、抵抗膜方式、静電容量結合方式、 赤外線方式、超音波方式及び電磁誘導結合方式等に分類される。その中でも、低コ ストで搭載可能な抵抗膜方式及び静電容量結合方式のタツチパネルが近年よく利用 されている。 [0003] Touch panels are classified into a resistive film method, a capacitive coupling method, an infrared method, an ultrasonic method, an electromagnetic induction coupling method, and the like according to the operation principle. Among them, a resistive film type and capacitive coupling type touch panel that can be mounted at low cost are often used in recent years.
[0004] 上記抵抗膜方式のタツチパネルは、例えば、互いに対向配置された一対のガラス 基板と、それら一対のガラス基板の間に挟持された絶縁性スぺーサ一と、各ガラス基 板の内側の全面に抵抗膜として設けられた透明導電膜と、タツチ位置検知回路とに より構成されている。そして、そのタツチパネルは、液晶表示装置等のディスプレイ画 面の前面に装着して使用される。  [0004] The resistance film type touch panel includes, for example, a pair of glass substrates arranged to face each other, an insulating spacer sandwiched between the pair of glass substrates, and an inner side of each glass substrate. A transparent conductive film provided as a resistance film on the entire surface and a touch position detection circuit are included. The touch panel is used by being mounted on the front surface of a display screen such as a liquid crystal display device.
[0005] このような構成の抵抗膜方式のタツチパネルでは、ディスプレイ画面の前面をタツチ することにより、各抵抗膜同士が接触 (短絡)して、各抵抗膜間に電流が流れる。この ときの電圧の変化をタツチ位置検知回路によって検知することにより、タツチされた位 置が検出される。  In the resistive film type touch panel having such a configuration, by touching the front surface of the display screen, the resistive films come into contact (short circuit), and current flows between the resistive films. The touched position is detected by detecting the change in voltage at this time by the touch position detection circuit.
[0006] し力しながら、抵抗膜方式のタツチパネルは、一対の抵抗膜が空気層を挟んで対 向配置しているので、その空気層によって屈折率の差が大きくなり、光透過率が低下 してしまうと 、う欠点を有して 、る。  [0006] However, the resistive film type touch panel has a pair of resistive films facing each other with an air layer interposed therebetween, so that the difference in refractive index between the air layers increases and the light transmittance decreases. If you do, you will have a flaw.
[0007] 次に、上記静電容量結合方式のタツチパネルについて説明する。  Next, the capacitive coupling type touch panel will be described.
[0008] 図 13は、一般的な静電容量結合方式のタツチパネルを有するタツチパネル表示装 置 150の断面模式図である。  FIG. 13 is a schematic cross-sectional view of a touch panel display device 150 having a general capacitive coupling type touch panel.
[0009] このタツチパネル表示装置 150は、アクティブマトリクス基板 120と、対向基板 135と 、それら両基板 120及び 135に挟持された液晶層 140とにより構成された液晶パネ ルと、上記液晶パネルの下側に偏光板 105及び光学シート類 110を介して設けられ たバックライト 106と、上記液晶パネルの上側に偏光板 105を介して設けられたタツチ パネル 130とを有している。 This touch panel display device 150 includes an active matrix substrate 120, a counter substrate 135, A liquid crystal panel composed of a liquid crystal layer 140 sandwiched between the two substrates 120 and 135, a backlight 106 provided on the lower side of the liquid crystal panel via a polarizing plate 105 and optical sheets 110, A touch panel 130 provided on the upper side of the liquid crystal panel via a polarizing plate 105 is provided.
[0010] このタツチパネル 130は、その液晶パネル側に位置検出用透明電極 103を有し、 両面テープ等の接着層 117によって上記液晶パネルに固定されて 、る。  The touch panel 130 has a position detecting transparent electrode 103 on the liquid crystal panel side, and is fixed to the liquid crystal panel by an adhesive layer 117 such as a double-sided tape.
[0011] また、タツチパネル 130は、第 3ガラス基板 116と、その第 3ガラス基板 116の全面 に設けられた位置検出用透明電極 103と、その位置検出用透明電極 103の周縁部 に一定のピッチで設けられた位置検出用電極と、タツチ位置を検出するための位置 検出回路とにより構成されている。  Further, the touch panel 130 includes a third glass substrate 116, a position detection transparent electrode 103 provided on the entire surface of the third glass substrate 116, and a constant pitch on a peripheral portion of the position detection transparent electrode 103. And a position detection circuit for detecting the touch position.
[0012] このタツチパネル 130では、ディスプレイ画面の前面、即ち、第 3ガラス基板 116の 表面をタツチすることにより、位置検出用透明電極 103はタツチされた点で人体の静 電容量を介して接地されるため、各位置検出用電極と接地点との間の抵抗値に変化 が生じる。この変化をタツチ位置検出回路によって検出することにより、タツチされた 位置が検出される。  [0012] In this touch panel 130, by touching the front surface of the display screen, that is, the surface of the third glass substrate 116, the position detection transparent electrode 103 is grounded via the electrostatic capacity of the human body at the touched point. Therefore, the resistance value between each position detection electrode and the ground point changes. By detecting this change by the touch position detection circuit, the touched position is detected.
[0013] 上記タツチパネル表示装置 150では、上記抵抗膜方式のタツチパネルよりもガラス 基板の枚数が 1枚少なくなると共に、上記抵抗膜方式のタツチパネルにおいて存在 する各ガラス基板の間の空気層が存在しな 、ため、光透過率に優れて 、る。  [0013] In the touch panel display device 150, the number of glass substrates is one less than that of the resistive film type touch panel, and there is no air layer between the glass substrates present in the resistive film type touch panel. Therefore, the light transmittance is excellent.
[0014] また、静電容量結合方式のタツチパネルの 1例として、特許文献 1には、タツチ位置 検出のための透明導電膜が設けられた第 1の透明基板のタツチ面側に、透明接着材 によってグレア防止用の第 2の透明基板が貼り合わせられて構成された静電容量方 式のタツチパネルが開示されている。これによれば、透明導電膜の損傷を防止すると ともに、生産性の向上が可能になると記載されている。  [0014] Further, as an example of a capacitive coupling type touch panel, Patent Document 1 discloses a transparent adhesive on the touch surface side of a first transparent substrate provided with a transparent conductive film for touch position detection. Discloses a capacitance type touch panel in which a second transparent substrate for preventing glare is bonded together. According to this document, it is described that damage to the transparent conductive film can be prevented and productivity can be improved.
[0015] し力しながら、上記のようなタツチパネルをディスプレイ画面の前面に装着して使用 するタイプのタツチパネル表示装置では、タツチパネル自体をディスプレイ画面の前 面に装着する必要があるので、装置全体の厚みや重量が大きくなる、或いはコストが 力かるという問題があった。  [0015] With a touch panel display device of the type that is used with the above touch panel mounted on the front surface of the display screen, however, the touch panel itself must be mounted on the front surface of the display screen. There was a problem that the thickness and weight were increased, or the cost was high.
[0016] そこで、装置の薄型化や軽量化を図るため、タツチパネルを構成するガラス基板及 び位置検出用透明電極を、表示装置を構成する部材と共有させることにより、省略す ることが知られている。 [0016] Therefore, in order to reduce the thickness and weight of the device, a glass substrate and a touch panel are provided. In addition, it is known that the position detection transparent electrode is omitted by sharing the position detection transparent electrode with a member constituting the display device.
[0017] 具体的に特許文献 2には、 2枚の透明絶縁板の間に、共通透明電極、液晶、表示 透明電極を順に積層し、文字や画像を表示すると共に指等の接触物が接触する共 通透明電極側に配置される透明絶縁板上の接触部の位置座標を検知するために、 共通透明電極の四隅に、接触物と透明絶縁板を介して共通透明電極との間に流れ る電流を検出する電流検出器を取り付け、接触物が透明絶縁板上の接触部へ接触 することによる静電容量の変化に影響される四隅の電流検出器からの電流信号によ り接触部の位置座標を計算するための信号処理回路を備えた静電容量式タツチパ ネル装置が記載されて 、る。  [0017] Specifically, in Patent Document 2, a common transparent electrode, a liquid crystal, and a display transparent electrode are sequentially stacked between two transparent insulating plates to display characters and images, and to contact a contact object such as a finger. In order to detect the position coordinates of the contact part on the transparent insulating plate arranged on the transparent electrode side, the current flowing between the contact object and the common transparent electrode through the transparent insulating plate at the four corners of the common transparent electrode The position coordinates of the contact part are determined by the current signals from the current detectors at the four corners, which are affected by the change in capacitance caused by the contact with the contact part on the transparent insulating plate. An electrostatic capacitive touch panel device having a signal processing circuit for calculating the above is described.
[0018] 同様に特許文献 3には、マトリクス状に配列された複数の画素電極を有するァクティ ブマトリクス基板と、そのアクティブマトリクス基板に対向する透明対向電極とを備えた 表示装置において、透明対向電極に対して表示用の電圧又は電流を供給する液晶 表示回路と、透明対向電極の複数の箇所力 流れる電流を検出する位置検出回路 と、これらの回路のいずれか一方を透明共通電極と電気的に導通させるスイッチング 回路とを備えたタツチセンサー体型表示装置が記載されている。  Similarly, Patent Document 3 discloses a transparent counter electrode in a display device including an active matrix substrate having a plurality of pixel electrodes arranged in a matrix and a transparent counter electrode facing the active matrix substrate. A liquid crystal display circuit that supplies a display voltage or current to the display, a position detection circuit that detects a current flowing through multiple points of the transparent counter electrode, and one of these circuits is electrically connected to the transparent common electrode. A touch sensor body type display device comprising a switching circuit for conducting is described.
特許文献 1:特開平 5— 324203号公報  Patent Document 1: Japanese Patent Laid-Open No. 5-324203
特許文献 2:特開 2003 - 99192号公報  Patent Document 2: Japanese Patent Laid-Open No. 2003-99192
特許文献 3 :特開 2003— 66417号公報  Patent Document 3: Japanese Unexamined Patent Publication No. 2003-66417
発明の開示  Disclosure of the invention
発明が解決しょうとする課題  Problems to be solved by the invention
[0019] しカゝしながら、上記特許文献 2及び 3では、タツチパネルを構成するガラス基板及び 位置検出用透明電極を、表示装置を構成する部材と共有させることによって、装置 自体の厚みやコストの削減が可能となるものの、表示品位の低下を招く恐れがある。 However, in Patent Documents 2 and 3, the thickness and cost of the device itself can be reduced by sharing the glass substrate constituting the touch panel and the position detection transparent electrode with the members constituting the display device. Although reduction is possible, there is a risk of degrading display quality.
[0020] 具体的には、上記特許文献 2及び 3の共通透明電極は、位置を検出するためのタ ツチパネル用電極としての機能と、液晶層に電圧を印加するための表示用電極とし ての機能とを併せ持つ必要がある。ところが、タツチパネル用電極としては電気的に 高抵抗であることが要求されるのに対して、表示用電極としては電気的に低抵抗であ ることが要求される。 [0020] Specifically, the common transparent electrode of Patent Documents 2 and 3 described above serves as a touch panel electrode for detecting the position and a display electrode for applying a voltage to the liquid crystal layer. It is necessary to have both functions. However, while the touch panel electrode is required to have a high electrical resistance, the display electrode has a low electrical resistance. Is required.
[0021] 即ち、表面抵抗としては、タツチパネル用電極として機能させるためには約 400〜1 600 Ωが好ましい。また、表示用電極として機能させるためには 30〜100 Ω以下が 好ましい。仮に、共通透明電極の表面抵抗が 100 Ωを超える場合には、表示文字や ノターンに沿って影が延びるシャドーイングと 、う現象が発生して、表示品位が劣化 する恐れがある。なお、表面抵抗(Ω )とは、単位面積当たりの電気抵抗であり、シー ト抵抗とも呼ばれ、 Ω Ζ口、 Ω /sq. (オームパースクエア)という単位でも表現される  That is, the surface resistance is preferably about 400 to 1 600 Ω in order to function as a touch panel electrode. Moreover, in order to function as a display electrode, 30-100 ohms or less are preferable. If the surface resistance of the common transparent electrode exceeds 100 Ω, the display quality may be deteriorated due to shadowing, which causes shadows that extend along the display characters and non-turns. The surface resistance (Ω) is the electrical resistance per unit area, which is also called sheet resistance, and is expressed in units such as Ω Higuchi and Ω / sq.
[0022] 本発明は、力かる点に鑑みてなされたものであり、その目的とするところは、静電容 量結合方式のタツチパネルにおいて、表示品位の劣化を抑止すると共に、装置自体 を薄く軽量にすることにある。 [0022] The present invention has been made in view of the strong point, and an object of the present invention is to suppress deterioration of display quality and reduce the thickness of the device itself in a capacitive coupling type touch panel. There is to do.
課題を解決するための手段  Means for solving the problem
[0023] 本発明は、第 2基板に、表示用の信号が供給される第 2透明導電膜と、タツチされ た位置を検出するための第 1透明導電膜とをそれぞれ設けるようにしたものである。  In the present invention, a second transparent conductive film to which a display signal is supplied and a first transparent conductive film for detecting a touched position are provided on the second substrate. is there.
[0024] 具体的に本発明に係るタツチパネル表示装置は、静電容量結合方式によりタツチさ れた位置を検出すると共に画像を表示するタツチパネル表示装置であって、互いに 対向配置された第 1基板及び第 2基板と、上記第 1基板及び第 2基板の間に設けら れた表示媒体層と、上記表示媒体層及び上記第 1基板の間に配置された複数の画 素電極と、上記表示媒体層及び上記第 2基板の間に配置され、タツチされた位置を 検出するための第 1透明導電膜と、上記第 1透明導電膜及び上記表示媒体層の間 に設けられ、表示用の信号が供給される第 2透明導電膜と、上記第 2透明導電膜及 び上記第 1透明導電膜の間に介在された絶縁層とを備えていることを特徴とする。  Specifically, a touch panel display device according to the present invention is a touch panel display device that detects a position touched by a capacitive coupling method and displays an image, and includes a first substrate and a first substrate that are arranged to face each other. A second substrate; a display medium layer provided between the first substrate and the second substrate; a plurality of pixel electrodes disposed between the display medium layer and the first substrate; and the display medium. A first transparent conductive film disposed between the layer and the second substrate for detecting a touched position; and between the first transparent conductive film and the display medium layer, and a display signal is provided. And a second transparent conductive film to be supplied, and an insulating layer interposed between the second transparent conductive film and the first transparent conductive film.
[0025] 上記の構成によれば、第 1基板上に設けられた各画素電極と、第 2基板上に設けら れた第 2透明導電膜とにそれぞれ表示用の信号を供給することにより、表示媒体層 に電圧が印加されて、画像が表示される。  [0025] According to the above configuration, by supplying display signals to the respective pixel electrodes provided on the first substrate and the second transparent conductive film provided on the second substrate, A voltage is applied to the display medium layer to display an image.
[0026] また、第 2基板の表示媒体層と反対側の表面をタツチすることにより、第 1透明導電 膜は第 2基板を越しにタツチされた位置で、タツチした人体の静電容量を介して接地 され、例えば、第 1導電膜の周囲に設けられた各位置検出用電極と接地点との間の 抵抗値に変化が生じる。そして、この変化を例えば位置検出回路によって検出するこ とにより、タツチされた位置が検出され、静電容量結合方式のタツチパネルとして機能 すること〖こなる。 [0026] Further, by touching the surface of the second substrate opposite to the display medium layer, the first transparent conductive film is touched across the second substrate via the capacitance of the touched human body. For example, between each position detection electrode provided around the first conductive film and the grounding point. A change occurs in the resistance value. Then, by detecting this change using, for example, a position detection circuit, the touched position is detected, and it will function as a capacitive coupling type touch panel.
[0027] さらに、タツチ位置を検出する第 1透明導電膜は、一般に、表示用の信号が供給さ れる第 2透明導電膜よりも電気的に高抵抗であるので、位置検出用の信号が第 1透 明導電膜において確実に発生すると共に、表示用の信号が第 2透明導電膜を介して 表示媒体層に速やかに供給される。そのため、本発明のタツチパネル表示装置は、 タツチパネル機能を有していても、シャドーイングの発生が抑えられ、表示品位の劣 化が抑止される。  [0027] Furthermore, since the first transparent conductive film for detecting the touch position generally has a higher electrical resistance than the second transparent conductive film to which the display signal is supplied, the position detection signal is the first. The first transparent conductive film is reliably generated, and a display signal is promptly supplied to the display medium layer through the second transparent conductive film. Therefore, even if the touch panel display device of the present invention has a touch panel function, generation of shadowing is suppressed and display quality is prevented from being deteriorated.
[0028] また、従来では、タツチ位置を検出する第 1透明導電膜が形成されたタツチパネル を、表示装置のディスプレイ画面の前面に装着して、タツチパネル機能を有する表示 装置として、 3枚の基板を必要としていたのに対して、本発明のタツチパネル表示装 置は、 2枚の基板により構成され、基板を 1枚省略することが可能となるので、装置自 体が薄く軽量にすることが可能になる。  [0028] Conventionally, a touch panel on which a first transparent conductive film for detecting the touch position is formed is mounted on the front surface of the display screen of the display device, and three substrates are used as a display device having a touch panel function. Whereas the touch panel display device of the present invention is composed of two substrates and one substrate can be omitted, the device itself can be made thin and lightweight. Become.
[0029] 以上のことにより、静電容量結合方式のタツチパネルにおいて、表示品位の劣化が 抑止されると共に、装置自体を薄く軽量にすることが可能になる。  Due to the above, in the capacitive coupling type touch panel, it is possible to suppress display quality deterioration and to make the device itself thin and light.
[0030] 上記第 1透明導電膜の表面抵抗は、 400 Ω以上且つ 1600 Ω以下であってもよい。  [0030] The surface resistance of the first transparent conductive film may be 400 Ω or more and 1600 Ω or less.
[0031] 上記の構成によれば、第 1透明導電膜において位置検出用の信号が確実に発生 して、その位置検出用の信号を、例えば、位置検出用回路に確実に伝えることが可 能になる。これとは反対に、第 1透明導電膜のシート抵抗力 ΟΟ Ω未満の場合、又は 1600 Ωを超えた場合には、タツチされた位置を正確に検出することは困難である。  [0031] According to the above configuration, it is possible to reliably generate a position detection signal in the first transparent conductive film and reliably transmit the position detection signal to, for example, the position detection circuit. become. On the other hand, if the sheet resistance of the first transparent conductive film is less than Ω, or exceeds 1600 Ω, it is difficult to accurately detect the touched position.
[0032] 上記絶縁層は、カラーフィルター層であってもよ!/、。  [0032] The insulating layer may be a color filter layer! /.
[0033] 上記の構成によれば、第 1透明導電膜と第 2透明導電膜とをカラーフィルタ一層に よって電気的に絶縁することになるので、カラー表示装置の場合には、第 1透明導電 膜と第 2透明導電膜絶縁層との間に別途絶縁層を設ける必要がなぐ製造工程の簡 略ィ匕が可能になる。  [0033] According to the above configuration, the first transparent conductive film and the second transparent conductive film are electrically insulated by one color filter layer. Therefore, in the case of a color display device, the first transparent conductive film This makes it possible to simplify the manufacturing process without requiring a separate insulating layer between the film and the second transparent conductive film insulating layer.
[0034] 上記第 2基板と上記第 1透明導電膜との間には、カラーフィルタ一層が設けられて いてもよい。 [0035] 上記の構成によれば、例えば、ガラス基板上にカラーフィルタ一層が形成された一 般的なカラーフィルター基板上に、第 1透明導電膜、絶縁層及び第 2透明導電膜を 順に形成することによつても、本発明の第 2基板上の構成が実現可能であるため、一 般的な市販のカラーフィルター基板を利用して本発明の作用効果が奏される。 [0034] One color filter layer may be provided between the second substrate and the first transparent conductive film. [0035] According to the above configuration, for example, the first transparent conductive film, the insulating layer, and the second transparent conductive film are sequentially formed on a general color filter substrate in which one color filter layer is formed on a glass substrate. In this way, since the configuration on the second substrate of the present invention can be realized, the effects of the present invention can be achieved using a general commercially available color filter substrate.
[0036] 上記第 1透明導電膜の厚さは、 50 A以上且つ 150 A以下であってもよい。 [0036] The thickness of the first transparent conductive film may be 50 A or more and 150 A or less.
[0037] 上記の構成によれば、第 1透明導電膜において位置検出用の信号が確実に発生 して、その位置検出用の信号を、例えば、位置検出回路に確実に伝えることが可能 になる。これとは反対に、第 1透明導電膜の厚さが 50 A未満の場合には、第 1透明 導電膜の電気抵抗が高くなりすぎて抵抗値が基板面内で安定せず、タツチされた位 置を正確に検出することは困難である。また、第 1透明導電膜の厚さが 150Aを超え た場合には、第 1透明導電膜の透過率が大幅に低下して、表示品位が損なわれてし まつ。 [0037] According to the above configuration, it is possible to reliably generate a position detection signal in the first transparent conductive film, and to reliably transmit the position detection signal to, for example, a position detection circuit. . On the other hand, when the thickness of the first transparent conductive film is less than 50 A, the electric resistance of the first transparent conductive film becomes too high, and the resistance value is not stable within the substrate surface and is touched. It is difficult to detect the position accurately. In addition, if the thickness of the first transparent conductive film exceeds 150A, the transmittance of the first transparent conductive film is greatly reduced, and the display quality is impaired.
[0038] 上記第 1透明導電膜は、酸化インジウムと酸化スズとの非晶質化合物、又は、酸ィ匕 インジウムと酸ィ匕亜鉛との化合物により形成されて 、てもよ 、。  [0038] The first transparent conductive film may be formed of an amorphous compound of indium oxide and tin oxide or a compound of indium oxide and zinc oxide.
[0039] 上記の構成によれば、酸化インジウムと酸化スズとの非晶質化合物、又は、酸化ィ ンジゥムと酸ィ匕亜鉛との化合物は、多結晶性の酸化インジウムと酸化スズとの化合物 よりも電気的に高抵抗であるので、表示用の信号が供給される第 2透明導電膜が、 多結晶性の酸化インジウムと酸化スズとの化合物により形成される一般的な場合には 、タツチ位置を検出する第 1透明導電膜が、第 2透明導電膜よりも電気的に高抵抗に なる。  [0039] According to the above configuration, the amorphous compound of indium oxide and tin oxide, or the compound of indium oxide and zinc oxide is more than the compound of polycrystalline indium oxide and tin oxide. In the general case where the second transparent conductive film to which a display signal is supplied is formed of a compound of polycrystalline indium oxide and tin oxide, the contact position is The first transparent conductive film for detecting the electric resistance becomes electrically higher than the second transparent conductive film.
[0040] また、本発明に係るタツチパネル表示装置は、静電容量結合方式によりタツチされ た位置を検出すると共に画像を表示するタツチパネル表示装置であって、互いに対 向配置された一対の表示パネル用基板、及び上記一対の表示パネル用基板の間に 設けられた表示媒体層を含み、画像を表示するための表示パネルと、上記表示パネ ルに対向配置された一対のスイッチングパネル用基板、及び上記一対のスィッチン グパネル用基板の間に設けられた液晶層を含み、画像の表示状態を切り替えるため のスイッチングパネルとを備え、上記一対のスイッチングパネル用基板のうち、上記 表示パネルカゝら遠い側の基板には、タツチされた位置を検出するための透明導電膜 が設けられて 、ることを特徴とする。 [0040] Further, the touch panel display device according to the present invention is a touch panel display device that detects the position touched by the capacitive coupling method and displays an image, and is used for a pair of display panels arranged to face each other. A display panel for displaying an image, a pair of switching panel substrates disposed opposite to the display panel, and a display medium layer provided between the substrate and the pair of display panel substrates; A switching panel for switching a display state of an image including a liquid crystal layer provided between the pair of switching panel substrates, and the substrate on the side farther from the display panel cover among the pair of switching panel substrates A transparent conductive film for detecting the touched position Is provided.
[0041] 上記の構成によれば、表示パネルによって画像が表示される。また、表示パネルか ら遠い側のスイッチングパネル基板の表面をタツチすることにより、透明導電膜は、そ のスイッチングパネル基板を越しにタツチされた位置で、タツチした人体の静電容量 を介して接地され、例えば、第 1導電膜の周囲に設けられた各位置検出用電極と接 地点との間の抵抗値に変化が生じる。そして、この変化を例えば位置検出回路によ つて検出することにより、タツチされた位置が検出され、静電容量結合方式のタツチパ ネルとして機能することになる。  [0041] According to the above configuration, an image is displayed on the display panel. In addition, by touching the surface of the switching panel substrate far from the display panel, the transparent conductive film is grounded via the capacitance of the touched human body at the position touched across the switching panel substrate. For example, the resistance value between each position detection electrode provided around the first conductive film and the contact point changes. Then, by detecting this change by, for example, a position detection circuit, the touched position is detected and functions as a capacitive coupling type touch panel.
[0042] さらに、タツチ位置を検出する透明導電膜は、表示パネルで表示用の信号が供給 される一般的な透明導電膜よりも電気的に高抵抗であるので、位置検出用の信号が 透明導電膜において確実に発生すると共に、表示パネルにおいて表示用の信号が 表示媒体層に速やかに供給される。そのため、本発明のタツチパネル表示装置は、 タツチパネル機能を有していても、シャドーイングの発生が抑えられ、表示品位の劣 化が抑止される。  [0042] Further, since the transparent conductive film for detecting the touch position has a higher electrical resistance than a general transparent conductive film to which a display signal is supplied from the display panel, the position detection signal is transparent. In addition to being reliably generated in the conductive film, a display signal is promptly supplied to the display medium layer in the display panel. Therefore, even if the touch panel display device of the present invention has a touch panel function, generation of shadowing is suppressed and display quality is prevented from being deteriorated.
[0043] また、従来では、タツチ位置を検出する透明導電膜が形成されたタツチパネルを、 表示装置のディスプレイ画面の前面に装着して、タツチパネル機能及び表示スィッチ ング機能を有する表示装置として、 5枚の基板を必要としていたのに対して、本発明 のタツチパネル表示装置は、 4枚の基板により構成され、基板を 1枚省略することが可 能となるので、装置自体が薄く軽量にすることが可能になる。  [0043] Conventionally, a touch panel on which a transparent conductive film for detecting the touch position is formed is mounted on the front surface of the display screen of the display device, so that five display devices having a touch panel function and a display switching function are provided. Whereas the touch panel display device of the present invention is composed of four substrates and one substrate can be omitted, the device itself must be thin and light. It becomes possible.
[0044] 以上のことにより、静電容量結合方式のタツチパネルにおいて、表示品位の劣化が 抑止されると共に、装置自体を薄く軽量にすることが可能になる。  [0044] As described above, in the capacitive coupling type touch panel, it is possible to suppress deterioration of display quality and to make the device itself thin and light.
[0045] また、本発明に係るタツチパネルは、静電容量結合方式によりタツチされた位置を 検出するタツチパネルであって、基板と、上記基板上に設けられ、タツチされた位置 を検出するための第 1透明導電膜と、上記第 1透明導電膜を覆う絶縁層と、上記絶縁 層を覆うように設けられ、表示用の信号が供給される第 2透明導電膜とを備えている ことを特徴とする。  [0045] Further, the touch panel according to the present invention is a touch panel for detecting a position touched by a capacitive coupling method, and is provided on the substrate and a first touch panel for detecting the touched position. 1 a transparent conductive film, an insulating layer covering the first transparent conductive film, and a second transparent conductive film provided so as to cover the insulating layer and supplied with a display signal. To do.
[0046] 上記の構成によれば、基板上に設けられた第 2透明導電膜に表示用の信号を供給 することにより、例えば、上記基板と他の基板との間に挟持された表示媒体層に電圧 が印加されて、画像が表示される。 [0046] According to the above configuration, by supplying a display signal to the second transparent conductive film provided on the substrate, for example, a display medium layer sandwiched between the substrate and another substrate. To voltage Is applied and an image is displayed.
[0047] また、基板をタツチすることにより、第 1透明導電膜は基板を越しにタツチされた位 置で、タツチした人体の静電容量を介して接地され、例えば、第 1導電膜の周囲に設 けられた各位置検出用電極と接地点との間の抵抗値に変化が生じる。そして、この 変化を例えば位置検出回路によって検出することにより、タツチされた位置が検出さ れ、静電容量結合方式のタツチパネルとして機能することになる。  [0047] Further, by touching the substrate, the first transparent conductive film is grounded via the capacitance of the touched human body at the position touched across the substrate, for example, around the first conductive film. There is a change in the resistance value between each position detection electrode and the ground point. Then, by detecting this change using, for example, a position detection circuit, the touched position is detected, and it functions as a capacitive coupling type touch panel.
[0048] さらに、タツチ位置を検出する第 1透明導電膜は、一般に表示用の信号が供給され る第 2透明導電膜よりも電気的に高抵抗であるので、位置検出用の信号が第 1透明 導電膜において確実に発生すると共に、表示用の信号が第 2透明導電膜に速やか に供給さる。そのため、本発明のタツチパネルは、タツチパネル機能を有していても、 シャドーイングの発生が抑えられ、表示品位の劣化が抑止される。  [0048] Furthermore, since the first transparent conductive film for detecting the touch position generally has a higher electrical resistance than the second transparent conductive film to which a display signal is supplied, the position detection signal is the first. It is reliably generated in the transparent conductive film, and a display signal is promptly supplied to the second transparent conductive film. Therefore, even if the touch panel of the present invention has a touch panel function, the occurrence of shadowing is suppressed and the deterioration of display quality is suppressed.
[0049] また、従来では、タツチ位置を検出する第 1透明導電膜が形成されたタツチパネル を、表示装置のディスプレイ画面の前面に装着して、タツチパネル機能を有する表示 装置として、 3枚の基板を必要としていたのに対して、本発明のタツチパネルは、表示 装置を構成する一対の基板の一方によって構成され、基板を 1枚省略することが可 能になるので、装置自体が薄く軽量にすることが可能になる。  [0049] Conventionally, a touch panel on which a first transparent conductive film for detecting a touch position is formed is attached to the front surface of the display screen of the display device, and three substrates are used as a display device having a touch panel function. In contrast to the need, the touch panel of the present invention is composed of one of a pair of substrates constituting a display device, and one substrate can be omitted, so that the device itself is thin and lightweight. Is possible.
[0050] 以上のことにより、静電容量結合方式のタツチパネルにおいて、表示品位の劣化が 抑止されると共に、装置自体を薄く軽量にすることが可能になる。  [0050] As described above, in the capacitively coupled touch panel, the display quality is prevented from deteriorating and the device itself can be made thin and light.
発明の効果  The invention's effect
[0051] 本発明のタツチパネル表示装置は、静電容量結合方式によりタツチされた位置を検 出すると共に画像を表示するタツチパネル表示装置において、第 2基板に、表示用 の信号が供給される第 2透明導電膜と、タツチされた位置を検出するための第 1透明 導電膜とをそれぞれ設けて 、るので、表示品位の劣化を抑止することができると共に 、装置自体を薄く軽量にすることができる。  [0051] The touch panel display device of the present invention is a touch panel display device that detects the position touched by the capacitive coupling method and displays an image. The second touch panel display device supplies a display signal to the second substrate. Since the transparent conductive film and the first transparent conductive film for detecting the touched position are respectively provided, it is possible to suppress deterioration of display quality and to make the device itself thin and light. .
図面の簡単な説明  Brief Description of Drawings
[0052] [図 1]図 1は、本発明の実施形態 1に係るタツチパネル表示装置 50aの断面模式図で ある。  FIG. 1 is a schematic cross-sectional view of a touch panel display device 50a according to Embodiment 1 of the present invention.
[図 2]図 2は、本発明の実施形態 1に係るタツチパネル表示装置 50aを構成するタツ チパネル 30aを部分的に示した平面模式図である。 [Fig. 2] Fig. 2 is a diagram showing a structure of a touch panel display device 50a according to Embodiment 1 of the present invention. FIG. 6 is a schematic plan view partially showing the H panel 30a.
[図 3]図 3は、図 2中の III— III断面における断面模式図である。  FIG. 3 is a schematic sectional view taken along the line III-III in FIG.
[図 4]図 4は、本発明の実施形態 1に係るタツチパネル表示装置 50aを構成するタツ チパネル 30aの位置検出用電極 A、 B、 C及び Dを示した平面模式図である。  FIG. 4 is a schematic plan view showing position detection electrodes A, B, C, and D of the touch panel 30a constituting the touch panel display device 50a according to Embodiment 1 of the present invention.
[図 5]図 5は、静電容量結合方式タツチセンサの動作原理を説明するための模式図 である。  FIG. 5 is a schematic diagram for explaining the operating principle of a capacitive coupling type touch sensor.
[図 6]図 6は、本発明の実施形態 1に係るタツチパネル表示装置 50aの動作原理を説 明するための模式図である。  FIG. 6 is a schematic diagram for explaining the operating principle of the touch panel display device 50a according to Embodiment 1 of the present invention.
[図 7]図 7は、本発明の実施形態 1に係るタツチパネル表示装置を構成するタツチパ ネル 30bの断面模式図である。  FIG. 7 is a schematic cross-sectional view of a touch panel 30b constituting the touch panel display device according to Embodiment 1 of the present invention.
[図 8]図 8は、本発明の実施形態 2に係るタツチパネル表示装置 50cの断面模式図で ある。  FIG. 8 is a schematic cross-sectional view of a touch panel display device 50c according to Embodiment 2 of the present invention.
[図 9]図 9は、本発明の実施形態 3に係るタツチパネル表示装置 50dの断面模式図で ある。  FIG. 9 is a schematic cross-sectional view of a touch panel display device 50d according to Embodiment 3 of the present invention.
[図 10]図 10は、本発明の実施形態 4に係るタツチパネル表示装置を構成するタツチ パネル 30eの断面模式図である。  FIG. 10 is a schematic cross-sectional view of a touch panel 30e constituting a touch panel display device according to Embodiment 4 of the present invention.
[図 11]図 11は、本発明の実施形態 5に係るタツチパネル表示装置 50fの断面模式図 である。  FIG. 11 is a schematic cross-sectional view of a touch panel display device 50f according to Embodiment 5 of the present invention.
[図 12]図 12は、本発明の実施形態 5に係るタツチパネル表示装置を構成するタツチ パネル 30gの断面模式図である。  FIG. 12 is a schematic cross-sectional view of a touch panel 30g constituting a touch panel display device according to Embodiment 5 of the present invention.
[図 13]従来のタツチパネル表示装置 150の断面模式図である。  FIG. 13 is a schematic cross-sectional view of a conventional touch panel display device 150.
符号の説明 Explanation of symbols
1 第 2透明電極 (第 2透明導電膜) 1 Second transparent electrode (second transparent conductive film)
2 カラーフイノレター層  2 Color Fino Letter Layer
3 第 1透明電極 (第 1透明導電膜) 3 First transparent electrode (first transparent conductive film)
4 第 2ガラス基板 (第 2基板) 4 Second glass substrate (second substrate)
7a 画素電極 7a Pixel electrode
8 第 1ガラス基板 (第 1基板) 14 絶縁層 8 First glass substrate (first substrate) 14 Insulating layer
19a 駆動用基板 (スイッチングパネル用基板)  19a Driving board (Switching panel board)
19b 対向基板 (スイッチングパネル用基板)  19b Counter substrate (substrate for switching panel)
20a アクティブマトリクス基板 (表示パネル用基板)  20a Active matrix substrate (Display panel substrate)
30a, 30b, 30c, 30d タツチノ ネル  30a, 30b, 30c, 30d Tacchinnel
30f, 30g タツチパネル(スイッチングパネル)  30f, 30g touch panel (switching panel)
35 カラーフィルター基板 (表示パネル用基板)  35 Color filter substrate (Display panel substrate)
40 液晶層(表示媒体層)  40 Liquid crystal layer (display medium layer)
41 液晶層  41 Liquid crystal layer
45 液晶表示パネル  45 LCD panel
50a, 50c, 50d, 50f タツチノ ネル表示装置  50a, 50c, 50d, 50f Tacchinnel display device
発明を実施するための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION
[0054] 以下、本発明の実施形態を図面に基づいて詳細に説明する。以下の実施形態で は、スイッチング素子として TFTを用いたアクティブマトリクス駆動型の液晶表示装置 を例に説明する。但し、本発明は以下の実施形態に限定されるものではなぐ他の構 成であってもよい。  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. In the following embodiments, an active matrix driving type liquid crystal display device using TFT as a switching element will be described as an example. However, the present invention is not limited to the following embodiments, and may have other configurations.
[0055] 《発明の実施形態 1》  [Embodiment 1 of the Invention]
以下に、本発明の実施形態 1に係るタツチパネル表示装置につ ヽて説明を行う。  The touch panel display device according to Embodiment 1 of the present invention will be described below.
[0056] 図 1は、本発明の実施形態 1に係るタツチパネル表示装置 50aの断面模式図である 。また、図 2は、タツチパネル表示装置 50aを構成するタツチパネル 30aを部分的に 示した平面模式図であり、図 3は、図 2中の III III断面における断面模式図である。  FIG. 1 is a schematic cross-sectional view of a touch panel display device 50a according to Embodiment 1 of the present invention. FIG. 2 is a schematic plan view partially showing the touch panel 30a constituting the touch panel display device 50a. FIG. 3 is a schematic cross-sectional view taken along the III-III section in FIG.
[0057] タツチパネル表示装置 50aは、アクティブマトリクス基板 20と、そのアクティブマトリク ス基板 20に対向配置されたタツチパネル 30aと、それらアクティブマトリクス基板 20及 びタツチパネル 30aの間に挟持され、表示媒体層である液層層 40と、アクティブマトリ タス基板 20の下側に偏光板 5及び光学シート類 10を介して設けられたバックライト 6 と、タツチパネル 30aの上側に設けられた偏光板 5とを備えて 、る。  The touch panel display device 50a is an active matrix substrate 20, a touch panel 30a disposed opposite to the active matrix substrate 20, and the active matrix substrate 20 and the touch panel 30a. The touch panel display device 50a is a display medium layer. A liquid layer 40; a backlight 6 provided on the lower side of the active matrix substrate 20 via the polarizing plate 5 and the optical sheet 10; and a polarizing plate 5 provided on the upper side of the touch panel 30a. The
[0058] アクティブマトリクス基板 20は、第 1基板である第 1ガラス基板 8と、 TFTアレイ層 7と を備えている。 [0059] TFTアレイ層 7は、相互に並行に延びるように設けられた複数のゲート線と、それら のゲート線と直交する方向に相互に並行に延びるように設けられた複数のソース線と 、各ゲート線の間にゲート線と並行に延びるように設けられた容量線と、ゲート線及び ソース線の各々の交差部分に設けられた TFTと、各 TFTに対応して隣り合う一対の ゲート線及び隣り合う一対のソース線で囲われる表示領域に設けられ、画素を構成 する画素電極 7aとを備えて 、る。 The active matrix substrate 20 includes a first glass substrate 8 that is a first substrate, and a TFT array layer 7. [0059] The TFT array layer 7 includes a plurality of gate lines provided to extend in parallel to each other, a plurality of source lines provided to extend in parallel to each other in a direction orthogonal to the gate lines, Capacitance lines provided between the gate lines so as to extend in parallel with the gate lines, TFTs provided at the intersections of the gate lines and the source lines, and a pair of adjacent gate lines corresponding to the respective TFTs And a pixel electrode 7a which is provided in a display region surrounded by a pair of adjacent source lines and which constitutes a pixel.
[0060] また、アクティブマトリクス基板 20は、第 1ガラス基板 8上に、ゲート絶縁膜及び層間 絶縁膜が順に積層された多層積層構造となっている。  The active matrix substrate 20 has a multilayer laminated structure in which a gate insulating film and an interlayer insulating film are sequentially laminated on the first glass substrate 8.
[0061] 第 1ガラス基板 8と上記ゲート絶縁膜との層間には、ゲート線及び容量線が設けら れている。このゲート線は、各 TFTに対応してソース線の延びる方向に突出したゲー ト電極を有している。  A gate line and a capacitor line are provided between the first glass substrate 8 and the gate insulating film. This gate line has a gate electrode projecting in the direction in which the source line extends corresponding to each TFT.
[0062] 上記ゲート絶縁膜と上記層間絶縁膜との層間には、 TFTを構成する半導体層が設 けられ、半導体層の上層には、ソース線、各 TFTに対応してソース線力もゲート線の 延びる方向に突出したソース電極、そのソース電極と対畤するドレイン電極が設けら れている。  [0062] A semiconductor layer constituting the TFT is provided between the gate insulating film and the interlayer insulating film, and the source line force and the gate line corresponding to each TFT are provided above the semiconductor layer. A source electrode protruding in the extending direction of the electrode and a drain electrode facing the source electrode are provided.
[0063] 上記層間絶縁膜の上層には、ドレイン電極にコンタクトホールを介して接続された 画素電極 7aが設けられ、さらに、画素電極 7aの上層には、配向膜が設けられている  [0063] A pixel electrode 7a connected to the drain electrode through a contact hole is provided above the interlayer insulating film, and an alignment film is provided above the pixel electrode 7a.
[0064] ドレイン電極は、容量線の配設して!/ヽる領域まで延設され、容量線と対向する部分 が補助容量電極となっている。そして、その補助容量電極は、ゲート絶縁膜を介して 容量線と共に補助容量を構成して!/ヽる。 [0064] The drain electrode is extended to a region where the capacitance line is arranged, and the portion facing the capacitance line is an auxiliary capacitance electrode. The auxiliary capacitor electrode forms an auxiliary capacitor together with the capacitor line via the gate insulating film.
[0065] タツチパネル 30aは、第 2基板である第 2ガラス基板 4と、その第 2ガラス基板 4上に 設けられ、タツチされた位置を検出するための第 1透明導電膜である第 1透明電極 3 と、その第 1透明電極 3を覆い絶縁層として機能するカラーフィルタ一層 2と、そのカラ 一フィルタ一層 2を覆うように設けられ、表示用の信号が供給される第 2透明導電膜 である第 2透明電極 1とを備えている。  [0065] The touch panel 30a includes a second glass substrate 4 that is a second substrate, and a first transparent electrode that is provided on the second glass substrate 4 and that is a first transparent conductive film for detecting the touched position. 3, a color filter layer 2 that covers the first transparent electrode 3 and functions as an insulating layer, and a second transparent conductive film that is provided so as to cover the color filter layer 2 and is supplied with a display signal. And a second transparent electrode 1.
[0066] 第 1透明電極 3の表面抵抗は、タツチパネルとして十分に機能させるために 400〜 1600 Ωに、第 2透明電極 1の表面抵抗は、表示品位を保持するために 30〜100 Ω になっている。 [0066] The surface resistance of the first transparent electrode 3 is 400 to 1600 Ω in order to sufficiently function as a touch panel, and the surface resistance of the second transparent electrode 1 is 30 to 100 Ω in order to maintain display quality. It has become.
[0067] ここで、第 1透明電極 3の表面抵抗は、 400 Ω以上且つ 1600 Ω以下であるので、 第 1透明電極 3において位置検出用の信号が確実に発生して、その位置検出用の 信号を、位置検出用回路に確実に伝えることができる。これとは反対に、第 1透明電 極 3の表面抵抗力 ΟΟ Ω未満の場合、又は 1600 Ωを超えた場合には、タツチされた 位置を正確に検出することは困難である。  Here, since the surface resistance of the first transparent electrode 3 is not less than 400 Ω and not more than 1600 Ω, a position detection signal is reliably generated in the first transparent electrode 3, and the position detection The signal can be reliably transmitted to the position detection circuit. On the other hand, if the surface resistance of the first transparent electrode 3 is less than ΩΩ, or exceeds 1600 Ω, it is difficult to accurately detect the touched position.
[0068] 第 1透明電極 3は、図 4に示すようにその周端の各角部に、電気的に接続された位 置検出用電極 A、 B、 C及び Dが設けられている。  As shown in FIG. 4, the first transparent electrode 3 is provided with position detection electrodes A, B, C, and D that are electrically connected to each corner of the peripheral edge thereof.
[0069] また、第 2ガラス基板 4は、各位置検出用電極 A、 B、 C及び D力も延びる位置検出 用配線部 11と、その位置検出用配線部 11の末端である位置検出用配線端子部 13 と、第 1透明電極 3の周端を覆うように設けられた額縁部 12とを有している。  [0069] The second glass substrate 4 includes a position detection wiring portion 11 in which each of the position detection electrodes A, B, C, and D forces also extends, and a position detection wiring terminal that is an end of the position detection wiring portion 11. Part 13 and a frame part 12 provided so as to cover the peripheral edge of the first transparent electrode 3.
[0070] カラーフィルタ一層 2は、各画素に対応して赤、緑及び青のうちの 1色が配設された 着色層 2aと、各着色層 2aの間に設けられたブラックマトリクス 2bとを備えている。  [0070] The color filter layer 2 includes a coloring layer 2a in which one of red, green, and blue is disposed corresponding to each pixel, and a black matrix 2b provided between the coloring layers 2a. I have.
[0071] 液晶層 40は、電気光学特性を有する液晶分子力 なるネマチック液晶材料等によ り構成されている。  [0071] The liquid crystal layer 40 is made of a nematic liquid crystal material having liquid crystal molecular force having electro-optical characteristics.
[0072] このタツチパネル表示装置 50aは、各画素電極 7a毎に 1つの画素が構成されてお り、各画素において、ゲート線力もゲート信号が送られて TFTをオン状態としたときに 、ソース線からソース信号が送られてソース電極及びドレイン電極を介して、画素電 極 7aに所定の電荷を書き込まれ、画素電極 7aと第 2透明電極 1との間で電位差が生 じることになり、液晶層 40からなる液晶容量、及び補助容量に所定の電圧が印加さ れるように構成されている。そして、タツチパネル表示装置 50aでは、その印加電圧 の大きさに応じて液晶分子の配向状態が変わることを利用して、バックライト 6から入 射する光の透過率を調整することにより、画像が表示される。  In this touch panel display device 50a, one pixel is formed for each pixel electrode 7a. In each pixel, when the gate signal is sent to the gate line force to turn on the TFT, the source line is turned on. A source signal is sent from the pixel electrode and a predetermined charge is written to the pixel electrode 7a via the source electrode and the drain electrode, and a potential difference is generated between the pixel electrode 7a and the second transparent electrode 1, A predetermined voltage is applied to the liquid crystal capacitor and the auxiliary capacitor composed of the liquid crystal layer 40. In the touch panel display device 50a, an image is displayed by adjusting the transmittance of light incident from the backlight 6 by utilizing the change in the alignment state of the liquid crystal molecules according to the magnitude of the applied voltage. Is done.
[0073] 次に、タツチパネル表示装置 50aのタツチパネルとしての動作について説明する。 Next, the operation of the touch panel display device 50a as a touch panel will be described.
[0074] タツチパネル 30aの表面、即ち、偏光板 5の表面をペンや指によって触れた場合、 第 1透明電極 3が人を介してグランド (接地面)と容量的に結合される。この容量とは、 偏光板 5及び第 1透明電極 3の間の容量と、並びに、人と地面との間に存在する容量 との総和である。なお、タツチパネル 30aに触れていない場合は、位置検出用電極 A 、 B、 C及び Dから同じ大きさの電圧が印加されるため、定常電流は流れない。 [0074] When the surface of the touch panel 30a, that is, the surface of the polarizing plate 5 is touched with a pen or a finger, the first transparent electrode 3 is capacitively coupled to the ground (grounding surface) through a person. This capacity is the sum of the capacity between the polarizing plate 5 and the first transparent electrode 3 and the capacity existing between the person and the ground. If the touch panel 30a is not touched, the position detection electrode A Since the same voltage is applied from B, C and D, no steady current flows.
[0075] 容量結合した接触部分と第 1透明電極 3の各位置検出用電極 A、 B、 C及び Dとの 間における電気抵抗は、接触部分と各位置検出用電極 A、 B、 C及び Dとの間の距 離に比例する。従って、第 1透明電極 3の各位置検出用電極 A、 B、 C及び Dを介し て、接触部分と位置検出用電極 A、 B、 C及び Dとの間の各距離に比例した電流が流 れること〖こなる。これらの電流の大きさを検出すれば、接触部分の位置座標を求める ことができる。 [0075] The electrical resistance between the capacitively coupled contact portion and each position detection electrode A, B, C, and D of the first transparent electrode 3 is the contact resistance and each position detection electrode A, B, C, and D. Is proportional to the distance between. Therefore, a current proportional to each distance between the contact portion and the position detection electrodes A, B, C, and D flows through the position detection electrodes A, B, C, and D of the first transparent electrode 3. It will be awkward. By detecting the magnitude of these currents, the position coordinates of the contact portion can be obtained.
[0076] 具体的に図 5を参照しながら、本発明で採用する静電容量結合方式による位置検 出方法の基本原理を説明する。  [0076] The basic principle of the position detection method using the capacitive coupling method employed in the present invention will be described with reference to FIG.
[0077] 図 5では、説明を簡単にするため、電極 A及び Bに挟まれた 1次元抵抗体が示され ている。実際の表示装置では、 2次元的な広がりを持つ対向導電膜がこの 1次元抵 抗体と同様の機能を発揮する。 In FIG. 5, a one-dimensional resistor sandwiched between electrodes A and B is shown for ease of explanation. In an actual display device, the opposing conductive film having a two-dimensional extent performs the same function as this one-dimensional antibody.
[0078] 電極 A及び Bのそれぞれには、電流—電圧変換用の抵抗 rが接続されている。電極A current-voltage conversion resistor r is connected to each of the electrodes A and B. electrode
A及び Bは、位置検出回路に接続される。 A and B are connected to a position detection circuit.
[0079] 電極 Aとグランドとの間、及び、電極 Bとグランドとの間には、同相同電位の電圧(交 流 e)が印加される。このとき、電極 A及び Bは常に同電位にあるため、電極 Aと電極 B との間を電流は流れない。 [0079] A voltage having the same homologous potential (AC e) is applied between the electrode A and the ground and between the electrode B and the ground. At this time, since the electrodes A and B are always at the same potential, no current flows between the electrodes A and B.
[0080] 仮に、指で位置 Xをタツチしたとすると、指によってタツチされた位置 Xから電極 Aま での抵抗を R、位置 Xから電極 Bまでの抵抗を R、 R=R +Rとする。このとき、人の [0080] If the position X is touched with a finger, the resistance from the position X touched by the finger to the electrode A is R, the resistance from the position X to the electrode B is R, and R = R + R . At this time,
1 2 1 2 インピーダンスを Zとし、電極 Aを流れる電流を i、電極 Bを流れる電流を iとした場合  1 2 1 2 When impedance is Z, current through electrode A is i, and current through electrode B is i
1 2 1 2
、以下の式が成立する。 The following formula is established.
[0081] e=ri +R i + (i +i ) Z (式 1)  [0081] e = ri + R i + (i + i) Z (Formula 1)
1 1 1 1 2  1 1 1 1 2
e=ri +R i + (i +i ) Z (式 2)  e = ri + R i + (i + i) Z (Formula 2)
2 2 2 2 2  2 2 2 2 2
上記の式 1及び式 2から、以下の式 3及び式 4が得られる。  From the above formulas 1 and 2, the following formulas 3 and 4 are obtained.
[0082] i (r+R ) =i (r+R ) (式 3) [0082] i (r + R) = i (r + R) (Equation 3)
1 1 2 2  1 1 2 2
i =i (r+R ) / (r+R ) (式 4)  i = i (r + R) / (r + R) (Equation 4)
2 1 1 2  2 1 1 2
式 4を式 1に代入すると、以下の式 5が得られる。  Substituting Equation 4 into Equation 1 yields Equation 5 below.
[0083] e=ri +R i + (i +i (r+R ) / (r+R ) ) Z =i (R(Z+r)+RR +2Zr+r2)/(r+R) (式 5) [0083] e = ri + R i + (i + i (r + R) / (r + R)) Z = i (R (Z + r) + RR + 2Zr + r 2 ) / (r + R) (Equation 5)
1 1 2 2  1 1 2 2
上記式 5から、次の式 6が得られる。  From the above equation 5, the following equation 6 is obtained.
[0084] i =e(r+R)/(R(Z+r)+RR +2Zr+r2) (式 6) [0084] i = e (r + R) / (R (Z + r) + RR + 2Zr + r 2 ) (Formula 6)
1 2 1 2  1 2 1 2
同様にして、式 7が得られる。  Similarly, Equation 7 is obtained.
[0085] i =e(r+R)/(R(Z+r)+RR +2Zr+r2) (式 7) [0085] i = e (r + R) / (R (Z + r) + RR + 2Zr + r 2 ) (Formula 7)
2 1 1 2  2 1 1 2
ここで、 R、 Rの比を全体の抵抗 Rを用いて表すと、式(8)が得られる。  Here, when the ratio of R and R is expressed by using the entire resistance R, the equation (8) is obtained.
1 2  1 2
[0086] R /R= (2r/R+l)i/(i +i ) -r/R (式 8)  [0086] R / R = (2r / R + l) i / (i + i) -r / R (Formula 8)
1 2 1 2  1 2 1 2
rと Rは既知であるので、電極 Aを流れる電流 iと電極 Bを流れる電流 iを測定によつ  Since r and R are known, the current i flowing through electrode A and the current i flowing through electrode B are measured.
1 2  1 2
て求めれば、式 8から R ZR  From equation 8, R ZR
1 を決定することができる。なお、 R ZR  1 can be determined. R ZR
1 は、指で接触した 人間を含むインピーダンス Zに依存しない。従って、インピーダンス Zがゼロ、無限大 でない限り、式 8が成立し、人、材料による変化、状態を無視できる。  1 does not depend on the impedance Z including the person touching the finger. Therefore, as long as impedance Z is not zero or infinite, Equation 8 holds, and changes and conditions due to people and materials can be ignored.
[0087] 次に、図 6を参照しながら、上記 1次元の場合における関係式を 2次元の場合に拡 大した場合を説明する。ここでは、図 4に示すように、第 1透明電極 3の各角部 (4隅) に位置検出用電極 A、 B、 C及び Dを形成している。これらの位置検出用電極 A、 B、 C及び Dは、位置検出用配線部 11及び位置検出用配線端子部 13を介して位置検 出回路に接続されている。  Next, the case where the relational expression in the one-dimensional case is expanded to the two-dimensional case will be described with reference to FIG. Here, as shown in FIG. 4, position detection electrodes A, B, C, and D are formed at each corner (four corners) of the first transparent electrode 3. These position detection electrodes A, B, C, and D are connected to a position detection circuit via a position detection wiring portion 11 and a position detection wiring terminal portion 13.
[0088] この位置検出用電極 A、 B、 C及び Dには、同相同電位の交流電圧が印加され、指 等の接触によって第 1透明電極 3の 4隅を流れる電流をそれぞれ i、 i、 i及び iとする  [0088] The position detection electrodes A, B, C, and D are applied with alternating voltages of the same homogenous potential, and the currents flowing through the four corners of the first transparent electrode 3 by contact with a finger or the like are respectively i, i, i and i
1 2 3 4 1 2 3 4
。この場合、前述の計算と同様の計算により、以下の式が得られる。 . In this case, the following expression is obtained by the same calculation as the above calculation.
[0089] X=k +k -(i (i +i +i +i ) (式 9) [0089] X = k + k-(i (i + i + i + i) (Equation 9)
1 2 2 3 1 2 3 4  1 2 2 3 1 2 3 4
Y=k +k · (i +i +i +i +i ) (式 10)  Y = k + k (i + i + i + i + i) (Equation 10)
1 2 2 3 1 2 3 4  1 2 2 3 1 2 3 4
ここで、 Xは第 1透明電極 3上におけるタツチされた位置の X座標、 Yは第 1透明電 極 3上におけるタツチされた位置の Y座標である。また、 kはオフセット、 kは倍率で  Here, X is the X coordinate of the touched position on the first transparent electrode 3, and Y is the Y coordinate of the touched position on the first transparent electrode 3. K is the offset, k is the magnification
1 2 ある。 k及び kは、人のインピーダンスに依存しない定数である。  1 2 There are. k and k are constants that do not depend on human impedance.
1 2  1 2
[0090] 上記の式 9及び 10に基づけば各位置検出用電極 A、 B、 C及び Dを流れる i、 i、 i  [0090] Based on the above formulas 9 and 10, i, i, i flowing through the position detection electrodes A, B, C and D
1 2 3 及び iの測定値力も接触位置を決定することができる。  The measured force of 1 2 3 and i can also determine the contact position.
4  Four
[0091] 上記の例では、第 1透明電極 3の 4隅に電極を配置し、各電極を流れる電流を測定 することにより、 2次元的な広がりを持つ面上における接触位置を検出しているが、第 1透明電極 3の電極数は 4つに限られるものではない。 2次元的な位置検出に必要な 電極の最低数は 3である力 電極の数を 5以上に増カロさせることにより、位置検出の 精度を向上させることが可能である。 [0091] In the above example, electrodes are arranged at the four corners of the first transparent electrode 3, and a current flowing through each electrode is measured to detect a contact position on a two-dimensionally spread surface. But second 1 The number of electrodes of transparent electrode 3 is not limited to four. The minimum number of electrodes required for two-dimensional position detection is 3. By increasing the number of force electrodes to 5 or more, the accuracy of position detection can be improved.
[0092] 上述した原理に従って、接触位置の座標を決定するには、第 1透明電極 3に設けた 複数の位置検出用電極 A、 B、 C及び Dを流れる電流の値を測定する必要がある。 [0092] In order to determine the coordinates of the contact position in accordance with the principle described above, it is necessary to measure the value of the current flowing through the plurality of position detection electrodes A, B, C and D provided on the first transparent electrode 3. .
[0093] 次に、本発明の実施形態 1に係るタツチパネル表示装置 50aの製造方法について 説明する。なお、タツチパネル表示装置 50aは、後述するアクティブマトリクス基板作 製工程、タツチパネル作製工程及びタツチパネル表示装置作製工程を経て製造され る。 Next, a method for manufacturing the touch panel display device 50a according to Embodiment 1 of the present invention will be described. The touch panel display device 50a is manufactured through an active matrix substrate manufacturing process, a touch panel manufacturing process, and a touch panel display device manufacturing process, which will be described later.
[0094] くアクティブマトリクス基板作製工程〉  [0094] Active matrix substrate manufacturing process>
まず、第 1ガラス基板 8上の基板全体に、アルミニウム等力もなる金属膜 (厚さ 1500 First, a metal film (thickness 1500 mm) that has aluminum isotropic force over the entire substrate on the first glass substrate 8.
A程度)をスパッタリング法により成膜し、その後、フォトリソグラフィー技術 (Photo Eng raving Process,以下、「PEP技術」と称する)によりパターン形成して、ゲート線、ゲー ト電極及び容量線を形成する。 A) is formed by sputtering, and then a pattern is formed by a photolithography technique (hereinafter referred to as “PEP technique”) to form gate lines, gate electrodes, and capacitor lines.
[0095] 次!、で、ゲート線、ゲート電極及び容量線上の基板全体に、 CVD (Chemical Vapor [0095] Next, on the entire substrate on the gate line, gate electrode, and capacitor line, CVD (Chemical Vapor
D印 osition)法により窒化シリコン膜 (厚さ 4000A程度)等を成膜し、ゲート絶縁膜を 形成する。  A silicon nitride film (thickness of about 4000 A) is formed by the D mark osition method, and a gate insulating film is formed.
[0096] 次いで、ゲート絶縁膜上の基板全体に、 CVD法により真性アモルファスシリコン膜( 厚さ 1500 A程度)と、リンがドープされた n+アモルファスシリコン膜 (厚さ 400 A程度 )とを連続して成膜し、その後、 PEP技術により島状にパターン形成して、真性ァモル ファスシリコン層及び n+アモルファスシリコン層カゝらなる半導体層を形成する。 Next, an intrinsic amorphous silicon film (thickness of about 1500 A) and a phosphorus-doped n + amorphous silicon film (thickness of about 400 A) are continuously formed on the entire substrate on the gate insulating film by a CVD method. After that, a film is formed into an island shape by the PEP technique, and a semiconductor layer such as an intrinsic amorphous silicon layer and an n + amorphous silicon layer is formed.
[0097] 次いで、半導体層が形成されたゲート絶縁膜上に、アルミニウム、チタン等からなる 金属膜 (厚さ 1500 A程度)をスパッタリング法により成膜し、その後、 PEP技術により パターン形成して、ソース線、ソース電極及びドレイン電極を形成する。  [0097] Next, a metal film (thickness of about 1500 A) made of aluminum, titanium, or the like is formed on the gate insulating film on which the semiconductor layer is formed by sputtering, and then patterned by PEP technology. A source line, a source electrode, and a drain electrode are formed.
[0098] 次いで、ソース電極及びドレイン電極をマスクとして n+アモルファスシリコン層をェ ツチング除去することにより、チャネル部を形成する。  Next, the n + amorphous silicon layer is etched away using the source electrode and the drain electrode as a mask to form a channel portion.
[0099] 次いで、ソース電極及びドレイン電極が形成されたゲート絶縁膜上の基板全体に、 スピン塗布法を用いて感光性アクリル榭脂膜 (厚さ 3 μ m程度)等を塗布し、層間絶 縁膜を形成する。 [0099] Next, a photosensitive acrylic resin film (thickness of about 3 μm) or the like is applied to the entire substrate on the gate insulating film on which the source electrode and the drain electrode are formed by using a spin coating method. Form an edge film.
[0100] 次いで、層間絶縁膜のドレイン電極に対応する部分をエッチング除去して、コンタク トホールを形成する。  [0100] Next, a portion corresponding to the drain electrode of the interlayer insulating film is removed by etching to form a contact hole.
[0101] 次いで、層間絶縁膜上の基板全体に、多結晶の ITO (Indium Tin Oxide)膜からな る透明導電膜 (厚さ 1000 A程度)をスパッタリング法により成膜し、その後、 PEP技 術によりパターン形成して、画素電極 7aを形成する。  [0101] Next, a transparent conductive film (thickness of about 1000 A) made of a polycrystalline ITO (Indium Tin Oxide) film is formed on the entire substrate on the interlayer insulating film by sputtering, and then the PEP technology Then, the pixel electrode 7a is formed by pattern formation.
[0102] 次いで、画素電極 7aが形成された基板全体に、ポリイミド榭脂を厚さ 500 A程度で 塗布して、ラビング法により、その表面に配向処理を施して配向膜を形成する。  [0102] Next, polyimide resin is applied to the entire substrate on which the pixel electrode 7a is formed at a thickness of about 500 A, and an alignment treatment is performed on the surface by rubbing to form an alignment film.
[0103] 上記のようにして、第 1ガラス基板 8上に TFTアレイ層 7が形成されたアクティブマト リクス基板 20を作製することができる。  [0103] As described above, the active matrix substrate 20 in which the TFT array layer 7 is formed on the first glass substrate 8 can be manufactured.
[0104] なお、第 1ガラス基板 8には、表示領域の周辺外側に広がった領域があり、その領 域には表示領域内の画素用 TFTを駆動し、画素電極 7aに所望量の電荷を供給す るための駆動回路 (ゲートドライバ及びソースドライノく)が形成されている。  Note that the first glass substrate 8 has a region extending outside the periphery of the display region, in which the pixel TFT in the display region is driven, and a desired amount of charge is applied to the pixel electrode 7a. A drive circuit (a gate driver and a source drain) for supply is formed.
[0105] また、好ま U、態様では、駆動回路を構成する TFTは、表示領域内の TFTと同一 工程で形成するので、駆動回路の動作速度を高めるに、半導体層を多結晶シリコン 膜により構成することが好ましい。さらに、 TFTの動作速度をできるだけ高めるには、 CGS (Continuous Grain Silicon,連続粒界シリコン)膜を用いて TFTを作製すること が望ましい。  [0105] In addition, in the preferred embodiment, the TFT constituting the drive circuit is formed in the same process as the TFT in the display region, so that the semiconductor layer is made of a polycrystalline silicon film in order to increase the operation speed of the drive circuit. It is preferable to do. Furthermore, in order to increase the TFT operating speed as much as possible, it is desirable to fabricate the TFT using a CGS (Continuous Grain Silicon) film.
[0106] <タツチパネル作製工程 >  [0106] <Touch panel manufacturing process>
まず、第 2ガラス基板 4上に、非晶質の ITO膜又は IZO (Indium Zinc Oxide)膜から なる透明導電膜 (厚さ 50〜150A)を、表面抵抗力 00〜1600 Ωになるように、マス クを用いたスパッタリング法により成膜して、第 1透明電極 3を形成する。この透明導 電膜は、上記所定の表面抵抗になれば、多結晶 ΙΤΟ膜、 In O膜であってもよい。  First, a transparent conductive film (thickness 50 to 150 A) made of an amorphous ITO film or an IZO (Indium Zinc Oxide) film is formed on the second glass substrate 4 so that the surface resistance is 00 to 1600 Ω. A first transparent electrode 3 is formed by sputtering using a mask. The transparent conductive film may be a polycrystalline film or an In 2 O film as long as the predetermined surface resistance is reached.
2 3  twenty three
[0107] ここで、第 1透明電極 3の厚さは、 50A以上且つ 150A以下であるので、第 1透明 電極 3において位置検出用の信号が確実に発生して、その位置検出用の信号を、位 置検出用回路に確実に伝えることができる。これとは反対に、第 1透明電極 3の厚さ が 50 A未満の場合には、第 1透明電極 3の電気抵抗が高くなりすぎて、タツチされた 位置を正確に検出することは困難である。また、第 1透明電極 3の厚さが 150Aを超 えた場合には、第 1透明導電膜の透過率が大幅に低下して、表示品位が損なわれて しまう。 Here, since the thickness of the first transparent electrode 3 is not less than 50A and not more than 150A, a signal for position detection is reliably generated in the first transparent electrode 3, and the signal for position detection is generated. This can be transmitted to the position detection circuit without fail. On the other hand, if the thickness of the first transparent electrode 3 is less than 50 A, the electrical resistance of the first transparent electrode 3 becomes too high, and it is difficult to accurately detect the touched position. is there. The thickness of the first transparent electrode 3 exceeds 150A. In such a case, the transmittance of the first transparent conductive film is greatly reduced, and the display quality is impaired.
[0108] また、非晶質の ITO膜又は IZO膜は、多結晶性の ITO膜よりも電気的に高抵抗で あるので、表示用の信号が供給される第 2透明電極 1が、多結晶性の ITO膜により形 成される一般的な場合には、タツチ位置を検出する第 1透明電極 3が、第 2透明電極 1よりも電気的に高抵抗になる。  [0108] Further, since the amorphous ITO film or the IZO film has a higher electrical resistance than the polycrystalline ITO film, the second transparent electrode 1 to which a display signal is supplied is formed of a polycrystalline film. In the general case formed by a conductive ITO film, the first transparent electrode 3 for detecting the touch position has a higher electrical resistance than the second transparent electrode 1.
[0109] 次いで、第 1透明電極 3の周端に沿って、 ITO膜等力もなる透明導電膜 (厚さ 3000 A程度)を、表面抵抗が 3〜5 Ωになるように、マスクを用いたスパッタリング法により 成膜して、額縁部 12を形成する。  [0109] Next, along the peripheral edge of the first transparent electrode 3, a transparent conductive film (thickness of about 3000 A) having an ITO film equal force was used using a mask so that the surface resistance was 3 to 5 Ω. A frame 12 is formed by sputtering.
[0110] 次いで、第 1透明電極 3及び額縁部 12が形成された基板上に、 Ag合金 (厚さ 300 OA程度)を表面抵抗が 0. 2〜0. 3 Ωになるように、マスクを用いたスパッタリング法 により成膜して、位置検出用配線部 11並びに位置検出用電極 A、 B、 C及び Dを形 成する。  [0110] Next, on the substrate on which the first transparent electrode 3 and the frame portion 12 are formed, an Ag alloy (thickness of about 300 OA) is masked so that the surface resistance is 0.2 to 0.3 Ω. Films are formed by the sputtering method used to form the position detection wiring part 11 and the position detection electrodes A, B, C and D.
[0111] 次いで、位置検出用配線部 11並びに位置検出用電極 A、 B、 C及び Dが形成され た基板全体に、印刷法を用いて黒色顔料を含んだ感光性レジスト材料等を厚さ 1〜 2 m程度で塗布し、その後、 PEP技術によりパターン形成してブラックマトリクス 2b を形成する。  [0111] Next, the entire thickness of the substrate on which the position detection wiring portion 11 and the position detection electrodes A, B, C, and D are formed is coated with a photosensitive resist material containing a black pigment using a printing method. Apply at ~ 2 m, and then form a black matrix 2b by patterning using PEP technology.
[0112] 次いで、ブラックマトリクス 2bが形成された基板全体に、赤、緑及び青の顔料のうち のいずれかが分散された感光性レジスト材料等を厚さ 1〜3 μ m程度で塗布し、その 後、 PEP技術によりパターン形成して、選択した色の着色層 2aを形成する。さらに、 他の 2色につ 、ても同様な工程を繰り返して、各画素に 1色の着色層 2aが配設され たカラーフィルタ一層 2を形成する。  [0112] Next, a photosensitive resist material or the like in which any one of red, green, and blue pigments is dispersed is applied to the entire substrate on which the black matrix 2b is formed in a thickness of about 1 to 3 μm. Thereafter, a pattern is formed by the PEP technique to form the colored layer 2a of the selected color. Further, the same process is repeated for the other two colors to form a color filter layer 2 in which a colored layer 2a of one color is provided for each pixel.
[0113] ここで、カラーフィルタ一層 2の膜厚が 1〜3 m程度の場合には、タツチ位置を検 出するための第 1透明電極 3と対向信号が入力される第 2透明電極 1との間の電気容 量 Cによって、第 1透明電極 3と第 2透明電極 1との間で干渉が起こることにより、タツ チ位置が検出されにくくなる虞れがある。そのため、対向信号の影響を受けないよう に、図 7に示すように、カラーフィルタ一層 2に透明な絶縁層 14を積層させることが望 ましい。この絶縁層 14は、カラーフィルタ一層 2を形成した後に、カラーフィルタ一層 2と第 2透明電極 1との層間に形成しても、第 1透明層 3を形成した後に、第 1透明電 極 3とカラーフィルタ一層 2との層間に形成してもよい。また、絶縁層 14は、感光性レ ジスト材料等により構成され、 PEP技術、版、インクジェット等を用いて積層される。そ して、第 1透明電極 3と第 2透明電極 1との間の電気容量 Cは、 ε (誘電率) X S (面積 )Zd (膜厚)によって算出され、対角 6インチのパネルの場合、 0. 03 /z F程度に抑え ることが望ましいので、絶縁層 14の膜厚は、 30 m程度になる。なお、絶縁層 14が 有しない場合には、電気容量 Cが 0. 3 F程度になって、第 1透明電極 3と第 2透明 電極 1との間で干渉が起こり易くなる。 [0113] Here, when the film thickness of the color filter layer 2 is about 1 to 3 m, the first transparent electrode 3 for detecting the touch position and the second transparent electrode 1 to which the counter signal is inputted, Due to the electrical capacitance C between the first transparent electrode 3 and the second transparent electrode 1, interference may occur, making it difficult to detect the touch position. Therefore, it is desirable to laminate a transparent insulating layer 14 on the color filter layer 2 as shown in FIG. 7 so as not to be affected by the counter signal. This insulating layer 14 is formed after the color filter layer 2 is formed. Alternatively, it may be formed between the first transparent electrode 3 and the color filter layer 2 after the first transparent layer 3 is formed. The insulating layer 14 is made of a photosensitive resist material or the like, and is laminated using PEP technology, a plate, an ink jet, or the like. The capacitance C between the first transparent electrode 3 and the second transparent electrode 1 is calculated by ε (dielectric constant) XS (area) Zd (film thickness). Therefore, the thickness of the insulating layer 14 is about 30 m. If the insulating layer 14 is not provided, the electric capacity C becomes about 0.3 F, and interference is likely to occur between the first transparent electrode 3 and the second transparent electrode 1.
[0114] 次いで、カラーフィルタ一層 2が形成された基板全体に、 ITO膜等カゝらなる透明導 電膜 (厚さ 1400 A程度)を、表面抵抗が 30〜: ίΟΟ Ωになるように、マスクを用いたス ノッタリング法により成膜して、第 2透明電極 1を形成する。  [0114] Next, a transparent conductive film (thickness of about 1400 A) such as an ITO film is applied to the entire substrate on which the color filter layer 2 is formed, so that the surface resistance is 30 to about Ω. The second transparent electrode 1 is formed by forming a film by a notching method using a mask.
[0115] 次いで、画素電極 7aが形成された基板全体に、ポリイミド榭脂を厚さ 500 A程度で 塗布して、ラビング法により、その表面に配向処理を施して配向膜を形成する。  Next, a polyimide resin is applied to the entire substrate on which the pixel electrode 7a is formed at a thickness of about 500 A, and an alignment treatment is performed on the surface by rubbing to form an alignment film.
[0116] 上記のようにして、タツチパネル 30aを作製することができる。  [0116] The touch panel 30a can be manufactured as described above.
[0117] <タツチパネル表示装置作製工程 >  [0117] <Touch panel display device manufacturing process>
まず、アクティブマトリクス基板 20及びタツチパネル 30aうちの一方にスクリーン印刷 により、熱硬化性エポキシ榭脂等力もなるシール材料を液晶注入口の部分を欠 ヽた 枠状パターンに塗布して、他方の基板に液晶層の厚さに相当する直径を持ち、榭脂 又はシリカからなる球状のスぺーサーを散布する。  First, by applying screen printing to one of the active matrix substrate 20 and the touch panel 30a, a sealing material having a thermosetting epoxy resin equivalent force is applied to the frame-like pattern lacking the liquid crystal inlet portion, and applied to the other substrate. Sprinkle spherical spacers with a diameter corresponding to the thickness of the liquid crystal layer and made of resin or silica.
[0118] 次いで、アクティブマトリクス基板 20とタツチパネル 30aとを貼り合わせ、シール材料 を硬化させ、空セルを形成する。  [0118] Next, the active matrix substrate 20 and the touch panel 30a are bonded together, the sealing material is cured, and empty cells are formed.
[0119] 次いで、空セルのアクティブマトリクス基板 20及びタツチパネル 30aの間に、減圧法 により液晶材料を注入し液晶層 40を形成する。その後、液晶注入口に UV硬化榭脂 を塗布して、 UV照射により UV硬化榭脂を硬化して、注入口を封止する。  [0119] Next, a liquid crystal material is injected between the active matrix substrate 20 and the touch panel 30a of the empty cell by a decompression method to form a liquid crystal layer 40. Then, apply UV curable resin to the liquid crystal injection port, cure the UV curable resin by UV irradiation, and seal the injection port.
[0120] 次いで、アクティブマトリクス基板 20側の表面に偏光板 5、光学シート類 10及びバッ クライト 6を、タツチパネル 30aの表面に偏光板 5を、それぞれ取り付ける。  Next, the polarizing plate 5, the optical sheets 10 and the backlight 6 are attached to the surface of the active matrix substrate 20, and the polarizing plate 5 is attached to the surface of the touch panel 30a.
[0121] 以上のようにして、タツチパネル表示装置 50aを製造することができる。  [0121] The touch panel display device 50a can be manufactured as described above.
[0122] 以上説明したように、本発明の実施形態 1に係るタツチパネル表示装置 50aによれ ば、第 1ガラス基板 8上に設けられた各画素電極 7aと、第 2ガラス基板 4上に設けられ た第 2透明電極 1とにそれぞれ表示用の信号を供給することにより、液晶層 40に電圧 が印加されて、画像が表示される。 [0122] As described above, according to the touch panel display device 50a according to the first embodiment of the present invention. For example, by supplying a display signal to each pixel electrode 7a provided on the first glass substrate 8 and to the second transparent electrode 1 provided on the second glass substrate 4, the liquid crystal layer 40 is supplied with a display signal. A voltage is applied and an image is displayed.
[0123] また、第 2ガラス基板 4の偏光板 5の表面をタツチすることにより、第 1透明電極 3は 第 2ガラス基板 4を越しにタツチされた位置で、タツチした人体の静電容量を介して接 地され、第 1透明電極 3の周囲に設けられた各位置検出用電極 A、 B、 C及び Dと接 地点との間の抵抗値に変化が生じる。そして、この変化を位置検出回路によって検 出することにより、タツチされた位置が検出され、静電容量結合方式のタツチパネルと して機能することになる。  [0123] Further, by touching the surface of the polarizing plate 5 of the second glass substrate 4, the first transparent electrode 3 has the capacitance of the touched human body at the position touched across the second glass substrate 4. The resistance value between the position detection electrodes A, B, C, and D provided around the first transparent electrode 3 and the contact point changes. Then, by detecting this change by the position detection circuit, the touched position is detected and functions as a capacitive coupling type touch panel.
[0124] さらに、タツチ位置を検出する第 1透明電極 3は、一般に、表示用の信号が供給さ れる第 2透明電極 1よりも電気的に高抵抗であるので、位置検出用の信号が第 1透明 電極 3において確実に発生すると共に、表示用の信号を第 2透明電極 1を介して液 晶層 40に速やかに供給することができる。  [0124] Furthermore, since the first transparent electrode 3 for detecting the touch position is generally electrically higher in resistance than the second transparent electrode 1 to which a display signal is supplied, the position detection signal is the first one. The signal can be reliably generated at the 1 transparent electrode 3 and a display signal can be promptly supplied to the liquid crystal layer 40 via the second transparent electrode 1.
[0125] そのため、本実施形態のタツチパネル表示装置 50aは、タツチパネル機能を有して いても、シャドーイングの発生が抑えられ、表示品位の劣化を抑止することができる。  Therefore, even if the touch panel display device 50a of the present embodiment has a touch panel function, the occurrence of shadowing can be suppressed and deterioration of display quality can be suppressed.
[0126] また、従来では、タツチ位置を検出する透明電極が形成されたタツチパネルを、表 示装置のディスプレイ画面の前面に装着して、タツチパネル機能を有する表示装置と して、 3枚の基板を必要としていたのに対して、本実施形態のタツチパネル表示装置 50aは、 2枚のガラス基板 4及び 8により構成され、ガラス基板を 1枚省略しているので 、装置自体が薄く軽量にすることができる。  [0126] Conventionally, a touch panel on which a transparent electrode for detecting the touch position is formed is mounted on the front surface of the display screen of the display device, so that three substrates are used as a display device having a touch panel function. Whereas the touch panel display device 50a of the present embodiment is composed of two glass substrates 4 and 8 and one glass substrate is omitted, the device itself can be made thin and light. it can.
[0127] 従って、静電容量結合方式のタツチパネルにぉ 、て、表示品位の劣化を抑止する ことができると共に、装置自体を薄く軽量にすることができる。  [0127] Therefore, it is possible to suppress the deterioration of display quality in the capacitive coupling type touch panel and to make the device itself thin and light.
[0128] また、従来のタツチパネル表示装置では、図 13に示すように偏光板 105とその表面 に取り付けられたタツチパネル 130との間に空気層 118が存在するため、その空気 層 118によって屈折率の差が大きくなり、光透過率が低下してしまうと!、う欠点を有し ていたが、本実施形態のタツチパネル表示装置 50aでは、上記空気層 118に対応す る空気層が存在しないので、透過率を向上させることができる。  Further, in the conventional touch panel display device, as shown in FIG. 13, since the air layer 118 exists between the polarizing plate 105 and the touch panel 130 attached to the surface, the refractive index of the air layer 118 is reduced. If the difference becomes large and the light transmittance decreases !, the touch panel display device 50a of the present embodiment has no air layer corresponding to the air layer 118. The transmittance can be improved.
[0129] さらに、従来のタツチパネル表示装置の製造工程では、液晶パネルの作製がー且 終了してから、別工程で偏光板を貼り付け、モジュール実装した後に、さらにタツチパ ネルを取り付けて 、たのに対して、本実施形態のタツチパネル表示装置 50aの構成 では、タツチパネルの機能を従来の対向基板の内部に組み込んでいるため、インライ ン方式での生産が可能となるため、製造工程を削減することができる。 [0129] Further, in the manufacturing process of the conventional touch panel display device, the liquid crystal panel can be manufactured. After finishing the process, the polarizing plate is attached in a separate process, and after the module is mounted, the touch panel is further attached. On the other hand, the touch panel display device 50a according to the present embodiment has the function of the touch panel. Since it is built into the counter substrate, in-line production is possible, and the manufacturing process can be reduced.
[0130] また、本実施形態のタツチパネル表示装置 50aは、 2枚のガラス基板 4及び 8により 構成され、上記のように従来よりもガラス基板を 1枚省略することが可能となるので、ガ ラス基板の分断回数を減らすことができ、製造工程を削減することができる。そのため 、分断の際のカレット (ガラスの屑)の付着による製造歩留まりの低下を抑制することも できる。 [0130] Further, the touch panel display device 50a of the present embodiment is constituted by two glass substrates 4 and 8, and it is possible to omit one glass substrate as compared with the conventional glass substrate as described above. The number of divisions of the substrate can be reduced, and the manufacturing process can be reduced. Therefore, it is possible to suppress a decrease in manufacturing yield due to adhesion of cullet (glass waste) at the time of division.
[0131] 《発明の実施形態 2》  << Embodiment 2 of the Invention >>
以下に、本発明の実施形態 2に係るタツチパネル表示装置について説明を行う。な お、以下の各実施形態では、図 1〜図 7と同じ部分については同じ符号を付して、そ の詳細な説明を省略する。  The touch panel display device according to Embodiment 2 of the present invention will be described below. In the following embodiments, the same parts as those in FIGS. 1 to 7 are denoted by the same reference numerals, and detailed description thereof is omitted.
[0132] 図 8は、本発明の実施形態 2に係るタツチパネル表示装置 50cの断面模式図である FIG. 8 is a schematic cross-sectional view of a touch panel display device 50c according to Embodiment 2 of the present invention.
[0133] タツチパネル表示装置 50cは、アクティブマトリクス基板 20と、そのアクティブマトリク ス基板 20に対向配置されたタツチパネル 30cと、それらアクティブマトリクス基板 20及 びタツチパネル 30cの間に挟持され、表示媒体層である液層層 40と、アクティブマトリ タス基板 20の下側に偏光板 5及び光学シート類 10を介して設けられたバックライト 6 と、タツチパネル 30cの上側に設けられた偏光板 5とを備えて 、る。 [0133] The touch panel display device 50c is a display medium layer sandwiched between the active matrix substrate 20, the touch panel 30c disposed opposite to the active matrix substrate 20, and the active matrix substrate 20 and the touch panel 30c. A liquid layer 40; a backlight 6 provided on the lower side of the active matrix substrate 20 via the polarizing plate 5 and the optical sheet 10; and a polarizing plate 5 provided on the upper side of the touch panel 30c. The
[0134] タツチパネル表示装置 50cにおいて、タツチパネル 30c以外の構成要素は、実施 形態 1と実質的に同じであるため、タツチパネル 30cを中心に説明する。  In the touch panel display device 50c, the components other than the touch panel 30c are substantially the same as those in the first embodiment, and therefore, the touch panel 30c will be mainly described.
[0135] タツチパネル 30cは、第 2基板である第 2ガラス基板 4と、その第 2ガラス基板 4上に 設けられたカラーフィルタ一層 2と、そのカラーフィルタ一層 2を覆うように設けられ、タ ツチされた位置を検出するための第 1透明導電膜である第 1透明電極 3と、その第 1 透明電極 3を覆う絶縁層 14と、その絶縁層 14を覆うように設けられ、表示用の信号が 供給される第 2透明導電膜である第 2透明電極 1とを備えている。  [0135] The touch panel 30c is provided so as to cover the second glass substrate 4 as the second substrate, the color filter layer 2 provided on the second glass substrate 4, and the color filter layer 2. A first transparent electrode 3 which is a first transparent conductive film for detecting the position, a insulating layer 14 covering the first transparent electrode 3, and a display signal provided so as to cover the insulating layer 14. And a second transparent electrode 1 which is a second transparent conductive film to which is supplied.
[0136] 次に、タツチパネル 30cの作製方法について説明する。 [0137] まず、第 2ガラス基板 4の基板全体に、印刷法を用いて黒色顔料を含んだ感光性レ ジスト材料等を厚さ 1〜2 /ζ πι程度で塗布し、その後、 PEP技術によりパターン形成し てブラックマトリクス 2bを形成する。 [0136] Next, a method for manufacturing the touch panel 30c will be described. [0137] First, a photosensitive resist material containing a black pigment is applied to the entire substrate of the second glass substrate 4 at a thickness of about 1-2 / ζ πι using a printing method, and then by PEP technology. A black matrix 2b is formed by pattern formation.
[0138] 次いで、ブラックマトリクス 2bが形成された基板全体に、赤、緑及び青の顔料のうち のいずれかが分散された感光性レジスト材料等を厚さ 1〜3 μ m程度で塗布し、その 後、 PEP技術によりパターン形成して、選択した色の着色層 2aを形成する。さらに、 他の 2色につ 、ても同様な工程を繰り返して、各画素に 1色の着色層 2aが配設され たカラーフィルタ一層 2を形成する。  [0138] Next, a photosensitive resist material or the like in which any one of red, green, and blue pigments is dispersed is applied to the entire substrate on which the black matrix 2b is formed in a thickness of about 1 to 3 μm. Thereafter, a pattern is formed by the PEP technique to form the colored layer 2a of the selected color. Further, the same process is repeated for the other two colors to form a color filter layer 2 in which a colored layer 2a of one color is provided for each pixel.
[0139] 次いで、非晶質の ITO膜又は IZO膜からなる透明導電膜 (厚さ 50〜: LOOA)を、表 面抵抗力 00〜1600 Ωになるように、マスクを用いたスパッタリング法により成膜して 、第 1透明電極 3を形成する。この透明導電膜は、上記所定の表面抵抗になれば、 多結晶 ΙΤΟ膜、 In O膜であってもよい。  [0139] Next, a transparent conductive film (thickness 50-: LOOA) made of an amorphous ITO film or IZO film is formed by sputtering using a mask so as to have a surface resistance of 00-1600 Ω. The first transparent electrode 3 is formed as a film. This transparent conductive film may be a polycrystalline film or an In 2 O film as long as it has the predetermined surface resistance.
2 3  twenty three
[0140] 次いで、第 1透明電極 3の周端に沿って、 ITO膜等力もなる透明導電膜 (厚さ 3000 A程度)を、表面抵抗が 3〜5 Ωになるように、マスクを用いたスパッタリング法により 成膜して、額縁部 12を形成する。  [0140] Next, along the peripheral edge of the first transparent electrode 3, a transparent conductive film (thickness of about 3000 A) having an ITO film equal force was used with a mask so that the surface resistance was 3 to 5 Ω. A frame 12 is formed by sputtering.
[0141] 次いで、第 1透明電極 3が形成された基板上に、 Ag合金 (厚さ 3000 Α程度)を表 面抵抗が 0. 2〜0. 3 Ωになるように、マスクを用いたスパッタリング法により成膜して 、位置検出用配線部 11並びに位置検出用電極 A、 B、 C及び Dを形成する。  [0141] Next, on the substrate on which the first transparent electrode 3 is formed, an Ag alloy (thickness of about 3000 mm) is sputtered using a mask so that the surface resistance is 0.2 to 0.3 Ω. The film is formed by the method, and the position detection wiring portion 11 and the position detection electrodes A, B, C, and D are formed.
[0142] 次いで、第 1透明電極 3が形成された基板全体に、感光性レジスト材料等を厚さ 30  [0142] Next, a photosensitive resist material or the like is applied to the entire substrate on which the first transparent electrode 3 is formed to a thickness of 30.
/z m程度で塗布し、その後、 PEP技術によりパターン形成して絶縁層 14を形成する  Apply at about / z m, and then form a pattern by PEP technology to form the insulating layer 14
[0143] 次いで、絶縁層 14が形成された基板全体に、 ITO膜等カゝらなる透明導電膜 (厚さ 1 400A程度)を、表面抵抗が 30〜: ίΟΟ Ωになるように、マスクを用いたスパッタリング 法により成膜して、第 2透明電極 1を形成する。 [0143] Next, a transparent conductive film (thickness of about 1400A) such as an ITO film is applied to the entire substrate on which the insulating layer 14 has been formed, with a mask so that the surface resistance is 30 to: Ω Ω. The second transparent electrode 1 is formed by film formation by the sputtering method used.
[0144] 次いで、画素電極 7aが形成された基板全体に、ポリイミド榭脂を厚さ 500 A程度で 塗布して、ラビング法により、その表面に配向処理を施して配向膜を形成する。  [0144] Next, polyimide resin is applied to the entire substrate on which the pixel electrode 7a is formed at a thickness of about 500 A, and an alignment process is performed on the surface by rubbing to form an alignment film.
[0145] 上記のようにして、タツチパネル 30cを作製することができる。  [0145] The touch panel 30c can be manufactured as described above.
[0146] 以上説明したように、本発明の実施形態 2に係るタツチパネル表示装置 50cによれ ば、ガラス基板上にカラーフィルタ一層が形成された一般的なカラーフィルター基板 上に、第 1透明電極 3、絶縁層 14及び第 2透明電極 1を順に形成することによつてもAs described above, according to the touch panel display device 50c according to the second embodiment of the present invention. For example, the first transparent electrode 3, the insulating layer 14, and the second transparent electrode 1 may be formed in this order on a general color filter substrate in which a color filter layer is formed on a glass substrate.
、本発明のタツチパネルの構成が実現可能であるため、一般的な市販のカラーフィ ルター基板を利用して本発明の作用効果が奏される。 Since the structure of the touch panel of the present invention can be realized, the effects of the present invention can be achieved using a general commercially available color filter substrate.
[0147] 《発明の実施形態 3》 << Embodiment 3 of the Invention >>
以下に、本発明の実施形態 3に係るタツチパネル表示装置について説明を行う。  The touch panel display device according to Embodiment 3 of the present invention will be described below.
[0148] 図 9は、本発明の実施形態 3に係るタツチパネル表示装置 50dの断面模式図であ る。 FIG. 9 is a schematic cross-sectional view of a touch panel display device 50d according to Embodiment 3 of the present invention.
[0149] タツチパネル表示装置 50dは、アクティブマトリクス基板 20と、そのアクティブマトリク ス基板 20に対向配置されたタツチパネル 30dと、それらアクティブマトリクス基板 20及 びタツチパネル 30dの間に挟持され、表示媒体層である液層層 40と、アクティブマト リクス基板 20の下側に偏光板 5及び光学シート類 10を介して設けられたバックライト 6と、タツチパネル 30dの上側に設けられた偏光板 5とを備えている。  [0149] The touch panel display device 50d is a display medium layer sandwiched between the active matrix substrate 20, the touch panel 30d disposed opposite to the active matrix substrate 20, and the active matrix substrate 20 and the touch panel 30d. A liquid layer 40; a backlight 6 provided on the lower side of the active matrix substrate 20 via the polarizing plate 5 and the optical sheet 10; and a polarizing plate 5 provided on the upper side of the touch panel 30d. .
[0150] タツチパネル表示装置 50dにおいて、タツチパネル 30d以外の構成要素は、実施 形態 1と実質的に同じであるため、タツチパネル 30dを中心に説明する。  [0150] In the touch panel display device 50d, the components other than the touch panel 30d are substantially the same as those in the first embodiment, and therefore, the touch panel 30d will be mainly described.
[0151] タツチパネル 30dは、第 2基板である第 2ガラス基板 4と、その第 2ガラス基板 4の図 中下側に設けられたカラーフィルタ一層 2と、そのカラーフィルタ一層 2を覆うように設 けられ、表示用の信号が供給される第 2透明導電膜である第 2透明電極 1と、第 2ガラ ス基板 4の図中上側に設けられ、タツチされた位置を検出するための第 1透明導電膜 である第 1透明電極 3とを備えている。  [0151] The touch panel 30d is provided so as to cover the second glass substrate 4 as the second substrate, the color filter layer 2 provided on the lower side of the second glass substrate 4, and the color filter layer 2. A second transparent electrode 1 that is a second transparent conductive film to which a display signal is supplied and a first glass electrode provided on the upper side of the second glass substrate 4 for detecting the touched position. And a first transparent electrode 3 which is a transparent conductive film.
[0152] 次に、タツチパネル 30dの作製方法について説明する。  [0152] Next, a method for manufacturing the touch panel 30d will be described.
[0153] まず、第 2ガラス基板 4の一方の面の基板全体に、非晶質の ITO膜又は IZO膜から なる透明導電膜 (厚さ 50〜: L00A)を、表面抵抗力 00〜1600 Ωになるように、マス クを用いたスパッタリング法により成膜して、第 1透明電極 3を形成する。この透明導 電膜は、上記所定の表面抵抗になれば、多結晶 ΙΤΟ膜、 In O膜であってもよい。  [0153] First, a transparent conductive film (thickness 50-: L00A) made of an amorphous ITO film or IZO film is applied to the entire surface of one surface of the second glass substrate 4, and the surface resistance is 00-1600 Ω. Then, the first transparent electrode 3 is formed by sputtering using a mask. The transparent conductive film may be a polycrystalline film or an In 2 O film as long as the predetermined surface resistance is reached.
2 3  twenty three
[0154] 次 、で、第 2ガラス基板 4の他方の面の基板全体に、印刷法を用いて黒色顔料を 含んだ感光性レジスト材料等を厚さ 1〜2 m程度で塗布し、その後、 PEP技術によ りパターン形成してブラックマトリクス 2bを形成する。 [0155] 次いで、ブラックマトリクス 2bが形成された基板全体に、赤、緑及び青の顔料のうち のいずれかが分散された感光性レジスト材料等を厚さ 1〜3 μ m程度で塗布し、その 後、 PEP技術によりパターン形成して、選択した色の着色層 2aを形成する。さらに、 他の 2色につ 、ても同様な工程を繰り返して、各画素に 1色の着色層 2aが配設され たカラーフィルタ一層 2を形成する。 [0154] Next, a photosensitive resist material containing a black pigment is applied to the entire substrate on the other side of the second glass substrate 4 with a thickness of about 1 to 2 m using a printing method, and then The black matrix 2b is formed by patterning using PEP technology. [0155] Next, a photosensitive resist material or the like in which any one of red, green, and blue pigments is dispersed is applied to the entire substrate on which the black matrix 2b is formed in a thickness of about 1 to 3 μm. Thereafter, a pattern is formed by the PEP technique to form the colored layer 2a of the selected color. Further, the same process is repeated for the other two colors to form a color filter layer 2 in which a colored layer 2a of one color is provided for each pixel.
[0156] 次いで、カラーフィルタ一層 2が形成された基板全体に、 ITO膜等カゝらなる透明導 電膜 (厚さ 1400 A程度)を、表面抵抗が 30〜: ίΟΟ Ωになるように、マスクを用いたス ノ ッタリング法により成膜して、第 2透明電極 1を形成する。  [0156] Next, a transparent conductive film (thickness of about 1400 A) such as an ITO film is applied to the entire substrate on which the color filter layer 2 is formed, so that the surface resistance is 30 to: ΟΟ Ω. The second transparent electrode 1 is formed by forming a film by a sputtering method using a mask.
[0157] 次 ヽで、画素電極 7aが形成された基板全体に、ポリイミド榭脂を厚さ 500 A程度で 塗布して、ラビング法により、その表面に配向処理を施して配向膜を形成する。  [0157] Next, polyimide resin is applied to the entire substrate on which the pixel electrode 7a is formed at a thickness of about 500 A, and an alignment treatment is performed on the surface by rubbing to form an alignment film.
[0158] 上記のようにして、タツチパネル 30dを作製することができる。  [0158] The touch panel 30d can be manufactured as described above.
[0159] 以上説明したように、本発明の実施形態 3に係るタツチパネル表示装置 50dによれ ば、ガラス基板上にカラーフィルタ一層が形成された一般的なカラーフィルター基板 に、第 1透明電極 3及び第 2透明電極 1を形成することによつても、本発明のタツチパ ネルの構成が実現可能であるため、一般的な市販のカラーフィルター基板を利用し て本発明の作用効果が奏される。  [0159] As described above, according to the touch panel display device 50d according to Embodiment 3 of the present invention, the first transparent electrode 3 and the general color filter substrate in which the color filter layer is formed on the glass substrate. By forming the second transparent electrode 1, the structure of the touch panel of the present invention can be realized, so that the effects of the present invention can be achieved using a general commercially available color filter substrate.
[0160] 《発明の実施形態 4》  << Embodiment 4 of the Invention >>
以下に、本発明の実施形態 4に係るタツチパネル表示装置につ ヽて説明を行う。  The touch panel display device according to Embodiment 4 of the present invention will be described below.
[0161] 図 10は、本発明の実施形態 4に係るタツチパネル表示装置を構成するタツチパネ ル 30eの断面模式図である。本実施形態では、上記実施形態 1のタツチパネル 30a 及び偏光板 5の構成力 タツチパネル 30eとなって!/、る。  FIG. 10 is a schematic cross-sectional view of a touch panel 30e constituting the touch panel display device according to Embodiment 4 of the present invention. In this embodiment, the touch panel 30a of the first embodiment and the constituent force of the polarizing plate 5 become the touch panel 30e!
[0162] タツチパネル 30eは、第 2基板である第 2ガラス基板 4と、その第 2ガラス基板 4上に 設けられた偏光パターン層 15、その偏光パターン層 15を覆いタツチされた位置を検 出するための第 1透明導電膜である第 1透明電極 3と、その第 1透明電極 3を覆い絶 縁層として機能するカラーフィルタ一層 2と、そのカラーフィルタ一層 2を覆うように設 けられ、表示用の信号が供給される第 2透明導電膜である第 2透明電極 1とを備えて いる。  [0162] The touch panel 30e detects the second glass substrate 4 as the second substrate, the polarization pattern layer 15 provided on the second glass substrate 4, and the touched position covering the polarization pattern layer 15. A first transparent electrode 3 that is a first transparent conductive film, a color filter layer 2 that covers the first transparent electrode 3 and functions as an insulating layer, and covers the color filter layer 2 to display And a second transparent electrode 1 which is a second transparent conductive film to which a signal for use is supplied.
[0163] 次に、タツチパネル 30eの作製方法について説明する。 [0164] まず、第 2ガラス基板 4の基板全体に、版を用いて、偏光特性を有する感光性榭脂 膜 (厚さ 2〜3 ;ζ ΐη程度)等を塗布し、偏光パターン層 15を形成する。 [0163] Next, a method for manufacturing the touch panel 30e will be described. [0164] First, a photosensitive resin film having a polarization characteristic (thickness 2 to 3; about ζ 偏光 η) or the like is applied to the entire second glass substrate 4 using a plate, and the polarization pattern layer 15 is applied. Form.
[0165] 次いで、偏光パターン層 15が形成された基板全体に、非晶質の ITO膜又は IZO 膜からなる透明導電膜 (厚さ 50〜150A)を、表面抵抗力 00〜1600 Ωになるよう に、マスクを用いたスパッタリング法により成膜して、第 1透明電極 3を形成する。この 透明導電膜は、上記所定の表面抵抗になれば、多結晶 ΙΤΟ膜、 In O膜であっても  Next, a transparent conductive film (thickness 50 to 150 A) made of an amorphous ITO film or IZO film is applied to the entire substrate on which the polarization pattern layer 15 is formed so that the surface resistance is 00 to 1600 Ω. Then, a first transparent electrode 3 is formed by film formation by a sputtering method using a mask. This transparent conductive film may be a polycrystalline film or an InO film as long as it has the predetermined surface resistance.
2 3  twenty three
よい。  Good.
[0166] 次いで、第 1透明電極 3の周端に沿って、 ITO膜等力もなる透明導電膜 (厚さ 3000 [0166] Next, along the peripheral edge of the first transparent electrode 3, a transparent conductive film (thickness 3000
A程度)を、表面抵抗が 3〜5 Ωになるように、マスクを用いたスパッタリング法により 成膜して、額縁部 12を形成する。 The frame portion 12 is formed by sputtering using a mask so that the surface resistance is 3 to 5 Ω.
[0167] 次いで、第 1透明電極 3が形成された基板上に、 Ag合金 (厚さ 3000 Α程度)を表 面抵抗が 0. 2〜0. 3 Ωになるように、マスクを用いたスパッタリング法により成膜して[0167] Next, on the substrate on which the first transparent electrode 3 is formed, an Ag alloy (thickness of about 3000 mm) is sputtered using a mask so that the surface resistance is 0.2 to 0.3 Ω. By film formation
、位置検出用配線 11並びに位置検出用電極 A、 B、 C及び Dを形成する。 The position detection wiring 11 and the position detection electrodes A, B, C and D are formed.
[0168] 次いで、第 1透明電極 3が形成された基板全体に、印刷法を用いて黒色顔料を含 んだ感光性レジスト材料等を厚さ 1〜2 /ζ πι程度で塗布し、その後、 PEP技術により ノターン形成してブラックマトリクス 2bを形成する。 [0168] Next, a photosensitive resist material containing a black pigment is applied to the entire substrate on which the first transparent electrode 3 is formed using a printing method at a thickness of about 1/2 / ππι, and then The black matrix 2b is formed by forming a turn using PEP technology.
[0169] 次 、で、ブラックマトリクス 2bが形成された基板全体に、赤、緑及び青の顔料のうち のいずれかが分散された感光性レジスト材料等を厚さ 1〜3 μ m程度で塗布し、その 後、 PEP技術によりパターン形成して、選択した色の着色層 2aを形成する。さらに、 他の 2色につ 、ても同様な工程を繰り返して、各画素に 1色の着色層 2aが配設され たカラーフィルタ一層 2を形成する。 [0169] Next, a photosensitive resist material in which any of red, green and blue pigments is dispersed is applied to the entire substrate on which the black matrix 2b is formed in a thickness of about 1 to 3 μm. Thereafter, a pattern is formed by the PEP technique to form the colored layer 2a of the selected color. Further, the same process is repeated for the other two colors to form a color filter layer 2 in which a colored layer 2a of one color is provided for each pixel.
[0170] 次いで、カラーフィルタ一層 2が形成された基板全体に、 ITO膜等カゝらなる透明導 電膜 (厚さ 1400 A程度)を、表面抵抗が 30〜: ίΟΟ Ωになるように、マスクを用いたス ノ ッタリング法により成膜して、第 2透明電極 1を形成する。 [0170] Next, a transparent conductive film (thickness of about 1400 A) such as an ITO film is applied to the entire substrate on which the color filter layer 2 is formed, so that the surface resistance is 30 to: ΟΟ Ω. The second transparent electrode 1 is formed by forming a film by a sputtering method using a mask.
[0171] 次いで、画素電極 7aが形成された基板全体に、ポリイミド榭脂を厚さ 500 A程度で 塗布して、ラビング法により、その表面に配向処理を施して配向膜を形成する。 [0171] Next, polyimide resin is applied to the entire substrate on which the pixel electrode 7a is formed at a thickness of about 500 A, and an alignment treatment is performed on the surface by rubbing to form an alignment film.
[0172] 上記のようにして、タツチパネル 30eを作製することができる。 [0172] The touch panel 30e can be manufactured as described above.
[0173] 以上説明したように、本発明の実施形態 4に係るタツチパネル表示装置によれば、 従来、表示装置の表面に貼り付けられていた偏光板を、表示装置の内部に組み込 むができるので、偏光板の貼り付け工程を削減することができる。 [0173] As described above, according to the touch panel display device according to Embodiment 4 of the present invention, Conventionally, a polarizing plate that has been attached to the surface of a display device can be incorporated into the inside of the display device, so that the step of attaching the polarizing plate can be reduced.
[0174] 本実施形態では、実施形態 1のタツチパネル 30aを構成する偏光板 5の代わりに偏 光パターン層 15を適用したが、この偏光パターン層 15を上記及び後述の各実施形 態のタツチパネルにっ 、て適用してもよ!、。  In the present embodiment, the polarization pattern layer 15 is applied instead of the polarizing plate 5 constituting the touch panel 30a of the first embodiment. However, the polarization pattern layer 15 is used in the touch panels of the above-described and following embodiments. You can apply it!
[0175] 《発明の実施形態 5》  [0175] Embodiment 5 of the Invention
以下に、本発明の実施形態 5に係るタツチパネル表示装置について説明を行う。  The touch panel display device according to Embodiment 5 of the present invention will be described below.
[0176] 図 11は、本発明の実施形態 5に係るタツチパネル表示装置 50fの断面模式図であ る。  FIG. 11 is a schematic cross-sectional view of a touch panel display device 50f according to Embodiment 5 of the present invention.
[0177] タツチパネル表示装置 50fは、画像を表示するための液晶表示パネル 45と、その 液晶表示パネル 45に偏光板 5及び位相差板 9を介して対向配置されたタツチパネル 30fと、液晶表示パネル 45の図中下側に偏光板 5及び光学シート類 10を介して設け られたバックライト 6とを備えている。そして、タツチパネル表示装置 50fは、スィッチン グパネルとして機能するタツチパネル 30fによって、 2D表示と 3D表示との切替を可 能とする 2DZ3D切替型液晶表示パネルのように、複数の視点に対して異なる画像 を表示する第 1の表示状態と全画面表示で 1つの画像を表示する第 2の表示状態と を切替可能に構成されて ヽる。  [0177] The touch panel display device 50f includes a liquid crystal display panel 45 for displaying an image, a touch panel 30f disposed opposite to the liquid crystal display panel 45 with a polarizing plate 5 and a retardation plate 9, and a liquid crystal display panel 45. A backlight 6 provided through a polarizing plate 5 and an optical sheet 10 is provided on the lower side in FIG. The touch panel display device 50f displays different images for a plurality of viewpoints, such as a 2DZ3D switching type liquid crystal display panel that enables switching between 2D display and 3D display by the touch panel 30f that functions as a switching panel. The first display state to be switched and the second display state to display one image in the full screen display can be switched.
[0178] 液晶表示パネル 45は、互いに対向配置された一対の表示パネル用基板であるァ クティブマトリクス基板 20a及びカラーフィルター基板 35と、それらアクティブマトリクス 基板 20a及びカラーフィルター基板 35の間に挟持され、表示媒体層である液層層 4 0とを備えている。  [0178] The liquid crystal display panel 45 is sandwiched between the active matrix substrate 20a and the color filter substrate 35, which are a pair of display panel substrates arranged to face each other, and the active matrix substrate 20a and the color filter substrate 35. And a liquid layer 40 as a display medium layer.
[0179] アクティブマトリクス基板 20aには、上記各実施形態のアクティブマトリクス基板 20の 端部に、表示を行うべき画像に対応した画像データを入力するための FPC (Flexible [0179] The active matrix substrate 20a has an FPC (Flexible for inputting image data corresponding to an image to be displayed at the end of the active matrix substrate 20 of each of the embodiments described above.
Printed Circuit)等の配線 21aが取り付けられて!/、る。 Wiring 21a such as Printed Circuit) is attached!
[0180] カラーフィルター基板 35は、ガラス基板 19cと、そのガラス基板 19上に設けられた カラーフィルタ一層 2と、そのカラーフィルタ一層 2を覆うように設けられ、表示用の信 号 (画像データ)が供給される第 2透明電極 1とを備えて ヽる。 [0180] The color filter substrate 35 is provided so as to cover the glass substrate 19c, the color filter layer 2 provided on the glass substrate 19, and the color filter layer 2, and a display signal (image data). And a second transparent electrode 1 to which is supplied.
[0181] タツチパネル 30fは、互いに対向配置された一対のスイッチングパネル用基板であ る駆動用基板 19a及び対向基板 19bと、それら駆動用基板 19a及び対向基板 19bの 間に挟持された液晶層 41と、対向基板 19bの表面に設けられた偏光板 5とを備えて いる。 [0181] The touch panel 30f is a pair of switching panel substrates disposed to face each other. A driving substrate 19a and a counter substrate 19b, a liquid crystal layer 41 sandwiched between the driving substrate 19a and the counter substrate 19b, and a polarizing plate 5 provided on the surface of the counter substrate 19b.
[0182] 駆動用基板 19aには、液晶層 41の ON時に駆動電圧を印加するための駆動電極 が設けられ、及び FPC (Flex¾le Printed Circuit)等の配線 21bが取り付けられる。  [0182] The drive substrate 19a is provided with a drive electrode for applying a drive voltage when the liquid crystal layer 41 is turned on, and a wiring 21b such as an FPC (Flex¾le Printed Circuit) is attached.
[0183] 対向基板 19bには、タツチされた位置を検出するための透明導電膜である第 1透明 電極 3と、その第 1透明電極 3を覆うように絶縁層と、その絶縁層上に液晶層 41の O N時に駆動電圧を印加するための駆動電極とが設けられている。  [0183] The counter substrate 19b includes a first transparent electrode 3 which is a transparent conductive film for detecting the touched position, an insulating layer so as to cover the first transparent electrode 3, and a liquid crystal on the insulating layer. A drive electrode for applying a drive voltage when the layer 41 is ON is provided.
[0184] 第 1透明電極 3は、上記各実施形態と同様に、その周端の各角部に、電気的に接 続された位置検出用電極が設けられている。そして、対向基板 19bは、各位置検出 用電極から延びる位置検出用配線部と、その位置検出用配線部の末端である位置 検出用配線端子部と、第 1透明電極 3の周端を覆うように設けられた額縁部とを有し ている。  [0184] The first transparent electrode 3 is provided with a position detection electrode electrically connected to each corner of the peripheral end thereof, as in the above embodiments. The counter substrate 19b covers the position detection wiring portion extending from each position detection electrode, the position detection wiring terminal portion that is the end of the position detection wiring portion, and the peripheral edge of the first transparent electrode 3. And a frame portion provided in the frame.
[0185] ここで、タツチパネル表示装置 50fでは、タツチパネル 30fがタツチされた位置を検 出する位置検出手段として機能するだけでなぐ液晶層 41の ONZOFFに応じて透 過する光の偏光状態を切り替えることが可能である切替手段として機能して 、る。例 えば、タツチパネル 30fは、 2D表示時と 3D表示時とで透過する光への光学変調作 用を異ならせることによって切替手段として機能する。  [0185] Here, in the touch panel display device 50f, the polarization state of the transmitted light is switched according to ONZOFF of the liquid crystal layer 41 just by functioning as a position detecting means for detecting the touched position of the touch panel 30f. It functions as a switching means that is possible. For example, the touch panel 30f functions as a switching means by changing the optical modulation action to the transmitted light between 2D display and 3D display.
[0186] 次に、タツチパネル表示装置 50fの製造方法について説明する。なお、タツチパネ ル表示装置 50fは、上記実施形態 1で説明したアクティブマトリクス基板作製工程と、 以下に説明するカラーフィルター基板作製工程、タツチパネル作製工程及びタツチ パネル表示装置作製工程を経て製造される。  [0186] Next, a method for manufacturing the touch panel display device 50f will be described. The touch panel display device 50f is manufactured through the active matrix substrate manufacturing process described in the first embodiment, the color filter substrate manufacturing process, the touch panel manufacturing process, and the touch panel display device manufacturing process described below.
[0187] <カラーフィルター基板作製工程 >  [0187] <Color filter substrate fabrication process>
まず、ガラス基板 19c上の基板全体に、印刷法を用いて黒色顔料を含んだ感光性 レジスト材料等を厚さ 1〜2 /ζ πι程度で塗布し、その後、 PEP技術によりパターン形成 してブラックマトリクス 2bを形成する。  First, a photosensitive resist material containing a black pigment is applied to the entire substrate on the glass substrate 19c with a thickness of about 1-2 / ζ πι using a printing method, and then a black pattern is formed by PEP technology. A matrix 2b is formed.
[0188] 次 、で、ブラックマトリクス 2bが形成された基板全体に、赤、緑及び青の顔料のうち のいずれかが分散された感光性レジスト材料等を厚さ 1〜3 μ m程度で塗布し、その 後、 PEP技術によりパターン形成して、選択した色の着色層 2aを形成する。さらに、 他の 2色につ 、ても同様な工程を繰り返して、各画素に 1色の着色層 2aが配設され たカラーフィルタ一層 2を形成する。 Next, a photosensitive resist material in which any of red, green and blue pigments is dispersed is applied to the entire substrate on which the black matrix 2b is formed in a thickness of about 1 to 3 μm. And that Thereafter, a pattern is formed by the PEP technique to form the colored layer 2a of the selected color. Further, the same process is repeated for the other two colors to form a color filter layer 2 in which a colored layer 2a of one color is provided for each pixel.
[0189] 次いで、カラーフィルタ一層 2が形成された基板全体に、 ITO膜等カゝらなる透明導 電膜 (厚さ 1400 A程度)を、表面抵抗が 30〜: ίΟΟ Ωになるように、マスクを用いたス ノ ッタリング法により成膜して、第 2透明電極 1を形成する。 [0189] Next, a transparent conductive film (thickness of about 1400 A) such as an ITO film is applied to the entire substrate on which the color filter layer 2 is formed, so that the surface resistance is 30 to: ΟΟ Ω. The second transparent electrode 1 is formed by forming a film by a sputtering method using a mask.
[0190] 次いで、画素電極 7aが形成された基板全体に、ポリイミド榭脂を厚さ 500 A程度で 塗布して、ラビング法により、その表面に配向処理を施して配向膜を形成する。 Next, a polyimide resin is applied to the entire substrate on which the pixel electrode 7a is formed at a thickness of about 500 A, and an alignment treatment is performed on the surface by rubbing to form an alignment film.
[0191] 上記のようにして、カラーフィルター基板 35を作製することができる。 [0191] The color filter substrate 35 can be produced as described above.
[0192] <タツチパネル作製工程 > [0192] <Touch panel manufacturing process>
まず、ガラス基板上に、 ITO膜等カゝらなる透明導電膜 (厚さ 100 A程度)を、マスク を用いたスパッタリング法により成膜して、駆動電極等を形成する。  First, a transparent conductive film (thickness of about 100 A) such as an ITO film is formed on a glass substrate by a sputtering method using a mask to form drive electrodes and the like.
[0193] 次いで、駆動電極等が形成された駆動用基板 19a上の基板全体に、ポリイミド榭脂 を厚さ 500A程度で塗布して、ラビング法により、その表面に配向処理を施して配向 膜を形成して駆動用基板 19aを作製する。 [0193] Next, a polyimide resin is applied to the entire substrate on the drive substrate 19a on which the drive electrodes and the like are formed at a thickness of about 500A, and an alignment treatment is performed on the surface by rubbing to form an alignment film. Then, a driving substrate 19a is manufactured.
[0194] また、ガラス基板 19上に、非晶質の ITO膜又は IZO (Indium Zinc Oxide)膜からな る透明導電膜 (厚さ 50〜150A)を、表面抵抗力 00〜1600 Ωになるように、マスク を用いたスパッタリング法により成膜して、透明電極 3を形成する。この透明導電膜はFurther, a transparent conductive film (thickness 50 to 150 A) made of an amorphous ITO film or an IZO (Indium Zinc Oxide) film is formed on the glass substrate 19 so that the surface resistance is 00 to 1600 Ω. Then, a transparent electrode 3 is formed by forming a film by a sputtering method using a mask. This transparent conductive film
、上記所定の表面抵抗になれば、多結晶 ΙΤΟ膜、 In O膜であってもよい。 As long as the predetermined surface resistance is reached, a polycrystalline film or an In 2 O film may be used.
2 3  twenty three
[0195] 次いで、第 1透明電極 3の周端に沿って、 ITO膜等力もなる透明導電膜 (厚さ 3000 A程度)を、表面抵抗が 3〜5 Ωになるように、マスクを用いたスパッタリング法により 成膜して、額縁部を形成する。  [0195] Next, along the peripheral edge of the first transparent electrode 3, a transparent conductive film (thickness of about 3000 A) having an ITO film equal force was used with a mask so that the surface resistance was 3 to 5 Ω. The frame is formed by sputtering.
[0196] 次いで、第 1透明電極 3及び額縁部が形成された基板上に、 Ag合金 (厚さ 3000 A 程度)を表面抵抗が 0. 2〜0. 3 Ωになるように、マスクを用いたスパッタリング法によ り成膜して、位置検出用配線部及び各位置検出用電極を形成する。  [0196] Next, on the substrate on which the first transparent electrode 3 and the frame portion are formed, an Ag alloy (thickness of about 3000 A) is used so that the surface resistance is 0.2 to 0.3 Ω. The position detection wiring portion and each position detection electrode are formed by the sputtering method.
[0197] 次いで、透明電極 3、額縁部、位置検出用配線部及び各位置検出用電極が形成さ れた基板全体に、感光性レジスト材料等を厚さ 1〜3 m程度で塗布し、その後、 PE P技術によりパターン形成して絶縁層を形成する。 [0198] 次いで、絶縁層が形成された基板全体に、 ITO膜等カゝらなる透明導電膜 (厚さ 140[0197] Next, a photosensitive resist material or the like is applied to the entire substrate on which the transparent electrode 3, the frame portion, the position detection wiring portion, and each position detection electrode are formed to a thickness of about 1 to 3 m, and thereafter Then, the insulating layer is formed by patterning with PE P technology. Next, a transparent conductive film (thickness 140) such as an ITO film is formed on the entire substrate on which the insulating layer is formed.
OA程度)を、表面抵抗が 30〜: ίΟΟ Ωになるように、マスクを用いたスパッタリング法 により成膜して、駆動電極等を形成する。 OA) is formed by a sputtering method using a mask so that the surface resistance is 30 to: ΩΩ, thereby forming drive electrodes and the like.
[0199] 次 、で、駆動電極等が形成された基板全体に、ポリイミド榭脂を厚さ 500 Α程度で 塗布して、ラビング法により、その表面に配向処理を施して、対向基板 19bを作製す る。 [0199] Next, polyimide resin was applied to the entire substrate on which the drive electrodes and the like were formed to a thickness of about 500 mm, and the surface was subjected to orientation treatment by a rubbing method to produce a counter substrate 19b. The
[0200] 次いで、駆動用基板 19a及び対向基板 19bのうちの一方にスクリーン印刷により、 熱硬化性エポキシ榭脂等力 なるシール材料を液晶注入口の部分を欠 ヽた枠状パ ターンに塗布して、他方の基板に液晶層の厚さに相当する直径を持ち、榭脂又はシ リカからなる球状のスぺーサーを散布する。  [0200] Next, by applying screen printing to one of the driving substrate 19a and the counter substrate 19b, a seal material having the same strength as thermosetting epoxy resin is applied to the frame-shaped pattern lacking the liquid crystal inlet portion. Then, a spherical spacer having a diameter corresponding to the thickness of the liquid crystal layer and made of resin or silica is sprayed on the other substrate.
[0201] 次いで、駆動用基板 19aと対向基板 19bとを貼り合わせ、シール材料を硬化させ、 空セルを形成する。  [0201] Next, the driving substrate 19a and the counter substrate 19b are bonded together, the sealing material is cured, and an empty cell is formed.
[0202] 次いで、空セルの駆動用基板 19a及び対向基板 19bの間に、減圧法により液晶材 料を注入し液晶層 41を形成する。その後、液晶注入口に UV硬化榭脂を塗布して、 UV照射により UV硬化榭脂を硬化して、注入口を封止する。  [0202] Next, a liquid crystal material is injected between the driving substrate 19a and the counter substrate 19b of the empty cell by a decompression method to form a liquid crystal layer 41. Then, apply UV curable resin to the liquid crystal inlet, cure the UV curable resin by UV irradiation, and seal the inlet.
[0203] 次いで、対向基板 19bの表面に偏光板 5を取り付ける。  [0203] Next, the polarizing plate 5 is attached to the surface of the counter substrate 19b.
[0204] 上記のようにして、タツチパネル 30fを作製することができる。  [0204] The touch panel 30f can be manufactured as described above.
[0205] <タツチパネル表示装置作製工程 >  [0205] <Touch panel display device manufacturing process>
まず、アクティブマトリクス基板 20a及びカラーフィルター基板 35の一方にスクリーン 印刷により、熱硬化性エポキシ榭脂等カゝらなるシール材料を液晶注入口の部分を欠 いた枠状パターンに塗布して、他方の基板に液晶層の厚さに相当する直径を持ち、 榭脂又はシリカからなる球状のスぺーサーを散布する。  First, a seal material such as a thermosetting epoxy resin is applied on one of the active matrix substrate 20a and the color filter substrate 35 to a frame-like pattern lacking the liquid crystal injection port by screen printing, and the other A spherical spacer made of resin or silica having a diameter corresponding to the thickness of the liquid crystal layer is sprayed on the substrate.
[0206] 次いで、アクティブマトリクス基板 20aとカラーフィルター基板 35とを貼り合わせ、シ ール材料を硬化させ、空セルを形成する。  [0206] Next, the active matrix substrate 20a and the color filter substrate 35 are bonded together, and the seal material is cured to form empty cells.
[0207] 次いで、空セルのアクティブマトリクス基板 20a及びカラーフィルター基板 35の間に 、減圧法により液晶材料を注入し液晶層 40を形成する。その後、液晶注入口に UV 硬化榭脂を塗布して、 UV照射により UV硬化榭脂を硬化して、注入口を封止して、 液晶表示パネル 45を作製する。 [0208] 次いで、液晶表示パネル 45を構成するアクティブマトリクス基板 20aの表面に偏光 板 5を、液晶表示パネル 45を構成するカラーフィルター基板 35の表面に偏光板 5、 光学シート類 10及びバックライト 6を、それぞれ取り付ける。 [0207] Next, a liquid crystal material is injected between the active matrix substrate 20a of the empty cell and the color filter substrate 35 by a decompression method to form a liquid crystal layer 40. Thereafter, a UV curable resin is applied to the liquid crystal injection port, the UV curable resin is cured by UV irradiation, the injection port is sealed, and the liquid crystal display panel 45 is manufactured. [0208] Next, the polarizing plate 5 is provided on the surface of the active matrix substrate 20a constituting the liquid crystal display panel 45, and the polarizing plate 5, the optical sheets 10 and the backlight 6 are provided on the surface of the color filter substrate 35 constituting the liquid crystal display panel 45. Attach to each.
[0209] 次いで、偏光板 5等が取り付けられた液晶表示パネル 45のアクティブマトリクス基板 20a側に、位相差板 9を介して、タツチパネル 30fを駆動用基板 19a側カゝら取り付ける  [0209] Next, the touch panel 30f is attached to the drive substrate 19a side via the phase difference plate 9 on the active matrix substrate 20a side of the liquid crystal display panel 45 to which the polarizing plate 5 and the like are attached.
[0210] 以上のようにして、タツチパネル表示装置 50fを製造することができる。 [0210] The touch panel display device 50f can be manufactured as described above.
[0211] 以上説明したように、本発明の実施形態 5に係るタツチパネル表示装置 50fによれ ば、第 1ガラス基板 8上に設けられた各画素電極 7aと、第 2ガラス基板 4上に設けられ た第 2透明電極 1とにそれぞれ表示用の信号を供給することにより、液晶層 40に電圧 が印加されて、画像が表示される。 [0211] As described above, according to the touch panel display device 50f according to Embodiment 5 of the present invention, the pixel electrodes 7a provided on the first glass substrate 8 and the second glass substrate 4 are provided. By supplying a display signal to each of the second transparent electrodes 1, a voltage is applied to the liquid crystal layer 40 and an image is displayed.
[0212] また、対向基板 19bの偏光板 5の表面をタツチすることにより、第 1透明電極 3はガラ ス基板 19を越しにタツチされた位置で、タツチした人体の静電容量を介して接地され 、第 1透明電極 3の周囲に設けられた各位置検出用電極と接地点との間の抵抗値に 変化が生じる。そして、この変化を位置検出回路によって検出することにより、タツチ された位置が検出され、静電容量結合方式のタツチパネルとして機能することになる [0212] In addition, by touching the surface of the polarizing plate 5 of the counter substrate 19b, the first transparent electrode 3 is grounded via the capacitance of the touched human body at the position touched over the glass substrate 19. Then, a change occurs in the resistance value between each position detection electrode provided around the first transparent electrode 3 and the ground point. By detecting this change by the position detection circuit, the touched position is detected, and it functions as a capacitively coupled touch panel.
[0213] さらに、タツチ位置を検出する第 1透明電極 3は、一般に、表示用の信号が供給さ れる第 2透明電極 1よりも電気的に高抵抗であるので、位置検出用の信号が第 1透明 電極 3において確実に発生すると共に、表示用の信号を第 2透明電極 1を介して液 晶層 40に速やかに供給することができる。 [0213] Furthermore, since the first transparent electrode 3 for detecting the touch position is generally electrically higher in resistance than the second transparent electrode 1 to which the display signal is supplied, the position detection signal is the first one. The signal can be reliably generated at the 1 transparent electrode 3 and a display signal can be promptly supplied to the liquid crystal layer 40 via the second transparent electrode 1.
[0214] そのため、本実施形態のタツチパネル表示装置 50fは、タツチパネル機能を有して いても、シャドーイングの発生が抑えられ、表示品位の劣化を抑止することができる。  [0214] Therefore, even if the touch panel display device 50f of the present embodiment has a touch panel function, generation of shadowing can be suppressed and deterioration of display quality can be suppressed.
[0215] また、従来では、タツチ位置を検出する透明電極が形成されたタツチパネルを、表 示装置のディスプレイ画面の前面に装着して、タツチパネル機能及び表示スィッチン グ機能を有する表示装置として、 5枚の基板を必要としていたのに対して、本実施形 態のタツチパネル表示装置 50fは、 4枚のガラス基板により構成され、ガラス基板を 1 枚省略して!/、るので、装置自体が薄く軽量にすることができる。 [0216] 従って、静電容量結合方式のタツチパネルにおいて、表示品位の劣化を抑止する ことができると共に、装置自体を薄く軽量にすることができる。 [0215] Conventionally, five touch panels having a touch panel function and a display switching function are provided by attaching a touch panel on which a transparent electrode for detecting the touch position is formed in front of the display screen of the display device. The touch panel display device 50f of the present embodiment is composed of four glass substrates, omitting one glass substrate! /, So the device itself is thin and lightweight. Can be. [0216] Therefore, in the capacitively coupled touch panel, it is possible to suppress deterioration of display quality and to make the device itself thin and light.
[0217] また、本実施形態のタツチパネル表示装置 50fにおいて、タツチパネル 30fを、図 1[0217] Further, in the touch panel display device 50f of the present embodiment, the touch panel 30f is configured as shown in FIG.
2に示すようなタツチパネル 30gとしてもよい。このタツチパネル 30gでは、第 1透明電 極 3が対向基板 19bと偏光板 5との間に設けられいるだけで、その他の構成はタツチ パネル 30fと実質的に同じである。 A touch panel as shown in 2 may be 30 g. In the touch panel 30g, only the first transparent electrode 3 is provided between the counter substrate 19b and the polarizing plate 5, and the other configuration is substantially the same as that of the touch panel 30f.
[0218] なお、本発明のタツチパネル表示装置の表示方式としては、液晶駆動用のスィッチ ング素子が TFTであるアクティブマトリクス駆動方式の液晶表示装置が軽量、低消費 電力の点で好適である力 STN液晶等の液晶表示方式、有機 EL等その他の表示 デバイスにも応用できる。 [0218] Note that as a display method of the touch panel display device of the present invention, an active matrix drive type liquid crystal display device in which the switching element for driving the liquid crystal is TFT is suitable in terms of light weight and low power consumption. STN It can also be applied to liquid crystal display methods such as liquid crystal and other display devices such as organic EL.
産業上の利用可能性  Industrial applicability
[0219] 以上説明したように、本発明は、装置自体を薄く軽量にすることができるため、カー ナビ、 PDA(Personal Digital Assistant)等について有用である。 [0219] As described above, the present invention is useful for car navigation systems, PDAs (Personal Digital Assistants) and the like because the device itself can be made thin and light.

Claims

請求の範囲 The scope of the claims
[1] 静電容量結合方式によりタツチされた位置を検出すると共に画像を表示するタツチ パネル表示装置であって、  [1] A touch panel display device for detecting a position touched by a capacitive coupling method and displaying an image,
互いに対向配置された第 1基板及び第 2基板と、  A first substrate and a second substrate disposed opposite to each other;
上記第 1基板及び第 2基板の間に設けられた表示媒体層と、  A display medium layer provided between the first substrate and the second substrate;
上記表示媒体層及び上記第 1基板の間に配置された複数の画素電極と、 上記表示媒体層及び上記第 2基板の間に配置され、タツチされた位置を検出する ための第 1透明導電膜と、  A plurality of pixel electrodes disposed between the display medium layer and the first substrate; and a first transparent conductive film disposed between the display medium layer and the second substrate and detecting a touched position. When,
上記第 1透明導電膜及び上記表示媒体層の間に設けられ、表示用の信号が供給 される第 2透明導電膜と、  A second transparent conductive film provided between the first transparent conductive film and the display medium layer and supplied with a display signal;
上記第 2透明導電膜及び上記第 1透明導電膜の間に介在された絶縁層とを備えて An insulating layer interposed between the second transparent conductive film and the first transparent conductive film.
V、ることを特徴とするタツチパネル表示装置。 A touch panel display device characterized by V.
[2] 請求項 1に記載されたタツチパネル表示装置にぉ 、て、  [2] The touch panel display device according to claim 1, wherein
上記第 1透明導電膜の表面抵抗は、 400 Ω以上且つ 1600 Ω以下であることを特 徴とするタツチパネル表示装置。  A touch panel display device, wherein the surface resistance of the first transparent conductive film is 400 Ω or more and 1600 Ω or less.
[3] 請求項 1に記載されたタツチパネル表示装置にぉ 、て、 [3] In the touch panel display device according to claim 1,
上記絶縁層は、カラーフィルタ一層であることを特徴とするタツチパネル表示装置。  The touch panel display device, wherein the insulating layer is a single color filter layer.
[4] 請求項 1に記載されたタツチパネル表示装置にぉ 、て、 [4] The touch panel display device according to claim 1, wherein
上記第 2基板と上記第 1透明導電膜との間には、カラーフィルタ一層が設けられて A color filter layer is provided between the second substrate and the first transparent conductive film.
V、ることを特徴とするタツチパネル表示装置。 A touch panel display device characterized by V.
[5] 請求項 1に記載されたタツチパネル表示装置にぉ 、て、  [5] The touch panel display device according to claim 1, wherein
上記第 1透明導電膜の厚さは、 50A以上且つ 150A以下であることを特徴とするタ ツチパネル表示装置。  A touch panel display device, wherein the thickness of the first transparent conductive film is 50A or more and 150A or less.
[6] 請求項 1に記載されたタツチパネル表示装置にぉ 、て、 [6] The touch panel display device according to claim 1, wherein
上記第 1透明導電膜は、酸化インジウムと酸化スズとの非晶質化合物、又は、酸ィ匕 インジウムと酸ィ匕亜鉛との化合物により形成されていることを特徴とするタツチパネル 表示装置。  The touch panel display device, wherein the first transparent conductive film is formed of an amorphous compound of indium oxide and tin oxide or a compound of indium oxide and zinc oxide.
[7] 静電容量結合方式によりタツチされた位置を検出すると共に画像を表示するタツチ パネル表示装置であって、 [7] Touch for detecting the position touched by the capacitive coupling method and displaying an image A panel display device,
互いに対向配置された一対の表示パネル用基板、  A pair of display panel substrates disposed opposite to each other;
及び上記一対の表示パネル用基板の間に設けられた表示媒体層を含み、画像を 表示するための表示パネルと、  And a display medium layer provided between the pair of display panel substrates, and a display panel for displaying an image,
上記表示パネルに対向配置された一対のスイッチングパネル用基板、 及び上記一対のスイッチングパネル用基板の間に設けられた液晶層を含み、画像 の表示状態を切り替えるためのスイッチングパネルとを備え  A pair of switching panel substrates disposed opposite to the display panel, and a switching panel that includes a liquid crystal layer provided between the pair of switching panel substrates and for switching an image display state.
上記一対のスイッチングパネル用基板のうち、上記表示パネル力も遠 ヽ側の基板 には、タツチされた位置を検出するための透明導電膜が設けられていることを特徴と するタツチパネル表示装置。  A touch panel display device characterized in that a transparent conductive film for detecting a touched position is provided on a substrate on the far side of the display panel force among the pair of switching panel substrates.
静電容量結合方式によりタツチされた位置を検出するタツチパネルであって、 基板と、  A touch panel for detecting a position touched by a capacitive coupling method, comprising: a substrate;
上記基板上に設けられ、タツチされた位置を検出するための第 1透明導電膜と、 上記第 1透明導電膜を覆う絶縁層と、  A first transparent conductive film for detecting a touched position provided on the substrate; an insulating layer covering the first transparent conductive film;
上記絶縁層を覆うように設けられ、表示用の信号が供給される第 2透明導電膜とを 備えて 、ることを特徴とするタツチパネル。  A touch panel comprising: a second transparent conductive film provided so as to cover the insulating layer and supplied with a display signal.
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