WO2006055310A2 - Article with patterned layer on surface - Google Patents
Article with patterned layer on surface Download PDFInfo
- Publication number
- WO2006055310A2 WO2006055310A2 PCT/US2005/040275 US2005040275W WO2006055310A2 WO 2006055310 A2 WO2006055310 A2 WO 2006055310A2 US 2005040275 W US2005040275 W US 2005040275W WO 2006055310 A2 WO2006055310 A2 WO 2006055310A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- substrate
- regions
- article
- microstructured surface
- wettable
- Prior art date
Links
- 239000000758 substrate Substances 0.000 claims abstract description 54
- 239000000463 material Substances 0.000 claims abstract description 34
- 238000000576 coating method Methods 0.000 claims abstract description 32
- 239000011248 coating agent Substances 0.000 claims abstract description 25
- 238000004519 manufacturing process Methods 0.000 claims abstract description 10
- 238000000034 method Methods 0.000 claims description 15
- 229920001940 conductive polymer Polymers 0.000 claims description 8
- 238000002347 injection Methods 0.000 claims description 4
- 239000007924 injection Substances 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 238000000465 moulding Methods 0.000 claims description 4
- 239000004033 plastic Substances 0.000 claims description 4
- 229920003023 plastic Polymers 0.000 claims description 4
- 239000004020 conductor Substances 0.000 claims description 3
- 239000011521 glass Substances 0.000 claims description 3
- 239000013618 particulate matter Substances 0.000 claims description 3
- 229920000123 polythiophene Polymers 0.000 claims description 3
- 238000001035 drying Methods 0.000 claims description 2
- 238000005299 abrasion Methods 0.000 claims 1
- 238000001723 curing Methods 0.000 claims 1
- 238000013007 heat curing Methods 0.000 claims 1
- 229920000642 polymer Polymers 0.000 description 9
- 238000009736 wetting Methods 0.000 description 7
- -1 polytetrafluoroethylene Polymers 0.000 description 6
- 229920000098 polyolefin Polymers 0.000 description 5
- AGBXYHCHUYARJY-UHFFFAOYSA-N 2-phenylethenesulfonic acid Chemical compound OS(=O)(=O)C=CC1=CC=CC=C1 AGBXYHCHUYARJY-UHFFFAOYSA-N 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229920000128 polypyrrole Polymers 0.000 description 4
- 230000002209 hydrophobic effect Effects 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 229920000515 polycarbonate Polymers 0.000 description 3
- 239000004417 polycarbonate Substances 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 230000010076 replication Effects 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 238000003851 corona treatment Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000004049 embossing Methods 0.000 description 2
- 229920000554 ionomer Polymers 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 230000003362 replicative effect Effects 0.000 description 2
- 238000005488 sandblasting Methods 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 1
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 description 1
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical compound CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 description 1
- GKWLILHTTGWKLQ-UHFFFAOYSA-N 2,3-dihydrothieno[3,4-b][1,4]dioxine Chemical compound O1CCOC2=CSC=C21 GKWLILHTTGWKLQ-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 239000002033 PVDF binder Substances 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- 238000002679 ablation Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- IAQRGUVFOMOMEM-UHFFFAOYSA-N butene Natural products CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 239000002322 conducting polymer Substances 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 208000028659 discharge Diseases 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000172 poly(styrenesulfonic acid) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 239000011116 polymethylpentene Substances 0.000 description 1
- 229920000306 polymethylpentene Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920005606 polypropylene copolymer Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000003678 scratch resistant effect Effects 0.000 description 1
- 238000007767 slide coating Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000007666 vacuum forming Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0012—Processes making use of the tackiness of the photolithographic materials, e.g. for mounting; Packaging for photolithographic material; Packages obtained by processing photolithographic materials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/0427—Coating with only one layer of a composition containing a polymer binder
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/043—Improving the adhesiveness of the coatings per se, e.g. forming primers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/044—Forming conductive coatings; Forming coatings having anti-static properties
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/046—Forming abrasion-resistant coatings; Forming surface-hardening coatings
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
- H05K3/1208—Pretreatment of the circuit board, e.g. modifying wetting properties; Patterning by using affinity patterns
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2465/00—Characterised by the use of macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Derivatives of such polymers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
- H05K2203/1173—Differences in wettability, e.g. hydrophilic or hydrophobic areas
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/60—Forming conductive regions or layers, e.g. electrodes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
Definitions
- This invention relates to surfaces with fractal micro-features and more particularly, to patterned material deposition on surface with fractal micro- features.
- microstructured surfaces are known to affect the wetting properties of the surface and may be constructed to prevent the wetting of the surface.
- US20020084290A1 entitled “Method and apparatus for dispensing small volume of liquid, such as with a wetting-resistant nozzle” by Materna, et al published 20020704 describes a wetting-resistant nozzle for accurately and precisely dispensing small volumes of liquids and describes the use of surface roughness to increase the hydrophobic character of the surface.
- Such microstructures may be formed with a mold. Means for creating such molds are known and described in, for example, US6641767 B2 entitled “Methods for replication, replicated articles, and replication tools" by Zhang et al, issued 20031104.
- US6641767B2 describes a method of replicating a structured surface that includes providing a tool having a structured surface having a surface morphology of a crystallized vapor deposited material; and replicating the structured surface of the tool to form a replicated article.
- a replicated article includes at least one replicated surface, wherein the replicated surface includes a replica of a crystallized vapor deposited material.
- a replication tool includes: a tool body that includes a tooling surface; and a structured surface on the tooling surface, wherein the structured surface includes crystallized vapor deposited material or a replica of crystallized vapor deposited material.
- US 2004/0026832 Al by Gier et al published 20040212 describes an embossing method for producing a microstructured surface relief.
- Such molded or embossed microstructured surfaces typically have fractal or random surface structures having sizes in the nanometer to tens of microns range.
- a random roughness microstructurerd surface having similar feature sizes in the nanometer to tens of microns range may be created by abrasive mechanical means such as sandblasting, abrasive water jet, rubbing with sandpaper or abrasive, and the like.
- abrasive mechanical means such as sandblasting, abrasive water jet, rubbing with sandpaper or abrasive, and the like.
- It would also be possible to prepare a microstructured rough surface by adding material onto an originally manufactured smooth surface, such as by adhering grains of particulate matter of a suitable size using a suitable adhesive. Such coatings or abrading can be performed using rollers in contact with the surface.
- the invention is directed towards an article comprising: a) a substrate having first regions having a microstructured surface and second regions not having a microstructured surface, where the first regions and second regions are relatively differentially wettable; and b) a patterned layer formed on the substrate from a coating that preferentially wets the relatively more wettable regions of the substrate.
- the invention is directed towards a method of making a patterned coating, comprising the steps of: a) providing a substrate having first regions having a microstructured surface and second regions not having a microstructured surface, where the first regions and second regions are relatively differentially wettable; and b) coating the substrate with a coating material that preferentially wets the relatively more wettable regions of the substrate to form a patterned layer on the substrate.
- Articles of the invention comprising a patterned layer on a surface have the advantage that they may be constructed at a high speed and at a low cost.
- FIG. 1 is a schematic view of a microstructured patterned surface according to one embodiment of the present invention
- Fig. 2 is a schematic diagram illustrating a manufacturing process for manufacturing the surface illustrated in Fig. 1 ;
- Fig. 3 is flow diagram for the process of Fig. 2; and Fig. 4 is a schematic view of a surface having a patterned conductive coating according to an embodiment of the present invention.
- the present invention comprises a substrate with a surface 10 having first regions 20 having a microstructured surface and second regions 30 not having a microstructured surface, where the first regions and second regions are relatively differentially wettable.
- first regions 20 having a microstructured surface
- second regions 30 not having a microstructured surface
- the first regions and second regions are relatively differentially wettable.
- the first or second region may be relatively more wettable than the other.
- the second regions 30 not having microstructured surfaces will typically be more wettable than the first regions 20.
- Substrate 10 may comprise rigid or flexible materials, may be transparent or opaque, and may be manufactured using continuous roll or batch processes. Materials such as glasses, plastics, and metals, e.g., may be employed. In a preferred embodiment, substrate 10 comprises a transparent polymeric material. Such plastic substrates may provide high light transmission properties, are inexpensive, and a sheet of polymeric material can be readily formed with microstructures.
- Suitable polymer materials include polyolefins, polyesters, polyamides, polycarbonates, cellulosic esters, polystyrene, polyvinyl resins, polysulfonamides, polyethers, polyimides, polyvinylidene chloride, polyvinylidene fluoride, polyurethanes, polyphenylenesulf ⁇ des, polytetrafluoroethylene, polyacetals, polysulfonates, polyester ionomers, and polyolefin ionomers, as well as copolymers and blends thereof.
- Polyolefins, particularly polypropylene, polyethylene, polymethylpentene, and mixtures thereof may be particularly suitable.
- Polyolefin copolymers including copolymers of propylene and ethylene such as hexene, butene and octene can also be used.
- Polyolefin polymers are suitable because they are low in cost and have good strength and surface properties and have been shown to be soft and scratch resistant.
- Polycarbonate polymers are also particularly suitable, as they have high light transmission and strength properties. Copolymers and/or mixtures of these polymers can be used.
- Applicants have constructed substrate surfaces having replicated fractal -like microstructures varying in size from 20 to 100 nm using polycarbonate and polyester substrate materials.
- the size, shape, and locations of the microstructured surface areas may be optimized for specific applications.
- the microstructure features formed in the first regions 20 may be regularly arranged or may be random.
- the profile of the microstructures can vary to complement a variety of materials so as to maximize the lifetime, clarity, and physical properties of the substrate material as well as the wettability of the regions.
- the substrate material may be transparent or opaque, rigid or flexible, for example glass, metal, metal foil, or plastic. In many applications, a transparent, flexible material is useful, particularly for display applications.
- the microstructured surface regions are formed in the substrate in an injection roll molding step of a substrate manufacturing process.
- a polymer 82 is heated above its melting point, and is injected under pressure into a nip 86 formed by a patterned roller 80 and an elastomer covered backing roller 84 in direct contact with the patterned roller 80.
- the patterned roller 80 has a pattern of cavities for forming the microstractures.
- the polymer is injected into the nip 86, some of the melted polymer fills the cavities of the patterned roller to form the microstructures and the balance of the polymer is squeezed into a flat sheet. After the microstructured patterned surface has been formed, the surface is mechanically released from both of the rollers.
- the microstructured surface regions may have self-similar fractal surface structures at a variety of different sizes. Such fractal surfaces are known to affect the wetting properties of the surface and may be constructed to prevent the wetting of the surface of any material molded with microstructures from the patterned roller 80.
- the microstructured surfaces once formed may be coated with a suitable material to further increase the hydrophobic or lyophobic nature of the surface. Suitable materials may be taken from classes of polymers including fluorocarbons, perfluorocarbons, polysiloxanes and mixtures thereof. For example, TEFLONTM (polytetrafluoroethylene)is a widely-known and available hydrophobic material with low surface energy. Such materials may be added prior to the microstructured patterning step in specific locations or onto specific locations after the patterned roller has formed such microstructures. .
- the surface is coated 110 with a material to form a patterned layer.
- a material having suitable wetting characteristics matched to the microstructure surface may be employed.
- the material applied to the surface will preferentially spread over the relatively more wettable areas of the surface in contrast to the microstructured region, thus forming a patterned coating on the surface.
- the coated material comprises an electrically conductive polymer, such as substituted or unsubstituted polythiophenes, substituted or unsubstituted polypyrrole, and substituted or unsubstituted polyaniline.
- Preferred electrically conducting polymers for the present invention include polypyrrole styrene sulfonate (referred to as polypyrrole/poly (styrene sulfonic acid) in US Pat. No. 5,674,654), 3,4- dialkoxy substituted polypyrrole styrene sulfonate, and 3,4-dialkoxy substituted polythiophene styrene sulfonate.
- the most preferred substituted electronically conductive polymers include poly(3,4-ethylene dioxythiophene styrene sulfonate).
- the coated layer may be applied to the substrate surface using a variety of coating means, for example rollers 90 (Fig. 2).
- Suitable coating methods including curtain coating, roll coating and spin coating, slide coating, blade coating, electro ⁇ photographic coating and spin coating.
- the surface on which the conductive material is deposited can be pre-treated for improved adhesion by any of the means known in the art, such as acid etching, flame treatment, corona discharge treatment, glow discharge treatment or can be coated with a suitable primer layer.
- corona discharge treatment is the preferred means for adhesion promotion.
- the coating may then be dried or cured 120, for example by heat with a heated roller 94 (Fig. 2), radiation such as ultra-violet light, or drying in a dry atmosphere to form a patterned conductive coating with localized areas of conductivity and other areas with no conductivity.
- the web may be cut with knives 92 into individual sheets. Referring to Fig. 4, the pattern of Fig. 1 forms a patterned layer comprising conductive area 50, and a non-conductive area 40 on the surface 10.
- the pattern-coated substrate of the present invention can be integrated into a flat-panel display by using either the cover or the substrate of the flat-panel display as the substrate surface 10.
- the flat-panel display may emit light through a transparent cover or through a transparent substrate.
- patterned conductive coatings obtained in accordance with the invention may provide electrical conductivity within a flat-panel display, such as an OLED display, or within an electrically operated touch screen. Electrical devices or conductors may be applied to the substrate surface 10 in electrical connection to the patterned coating.
- Injection roll molding has been shown to more efficiently replicate the desired microstructures compared to embossing and vacuum forming. It is further contemplated that the surface may be cut into the desired size for application to an LCD or OLED flat-panel display, for example.
- the present invention may be used in conjunction with any flat-panel display, including but not limited to OLED and liquid crystal display devices.
- a patterned microstructured surface examples include abrasive mechanical means such as sandblasting, abrasive water jet, rubbing with sandpaper or abrasive, and the like. It is also possible to prepare a rough microstructured patterned surface by adding material onto an originally manufactured smooth surface, such as by adhering grains of particulate matter of a suitable size using a suitable adhesive. Such patterned coatings or abrading can be performed using rollers in contact with the surface.
Abstract
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007541264A JP2008520082A (en) | 2004-11-12 | 2005-11-07 | Article having a patterned layer on the surface |
EP05851399A EP1810080A2 (en) | 2004-11-12 | 2005-11-07 | Article with patterned layer on surface |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/987,992 US20060105148A1 (en) | 2004-11-12 | 2004-11-12 | Article with patterned layer on surface |
US10/987,992 | 2004-11-12 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2006055310A2 true WO2006055310A2 (en) | 2006-05-26 |
WO2006055310A3 WO2006055310A3 (en) | 2006-08-10 |
Family
ID=35892430
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2005/040275 WO2006055310A2 (en) | 2004-11-12 | 2005-11-07 | Article with patterned layer on surface |
Country Status (4)
Country | Link |
---|---|
US (1) | US20060105148A1 (en) |
EP (1) | EP1810080A2 (en) |
JP (1) | JP2008520082A (en) |
WO (1) | WO2006055310A2 (en) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7199322B2 (en) * | 2004-11-12 | 2007-04-03 | Eastman Kodak Company | Variable spacer dots for touch screen |
US7208691B2 (en) * | 2004-11-12 | 2007-04-24 | Eastman Kodak Company | Touch screen having undercut spacer dots |
US7230198B2 (en) * | 2004-11-12 | 2007-06-12 | Eastman Kodak Company | Flexible sheet for resistive touch screen |
US20060105152A1 (en) * | 2004-11-12 | 2006-05-18 | Eastman Kodak Company | Flexible sheet for resistive touch screen |
US7397466B2 (en) * | 2004-11-12 | 2008-07-08 | Eastman Kodak Company | Integral spacer dots for touch screen |
US7163733B2 (en) * | 2004-11-12 | 2007-01-16 | Eastman Kodak Company | Touch screen having spacer dots with channels |
US7196281B2 (en) * | 2004-11-12 | 2007-03-27 | Eastman Kodak Company | Resistive touch screen having conductive mesh |
JP4380713B2 (en) * | 2007-03-01 | 2009-12-09 | セイコーエプソン株式会社 | Manufacturing method of liquid jet head unit |
JP2010219006A (en) * | 2009-03-19 | 2010-09-30 | Toppan Printing Co Ltd | El element, backlight device, lighting system, electronic signboard device, and display device |
KR101927848B1 (en) * | 2012-09-17 | 2018-12-12 | 삼성디스플레이 주식회사 | Organic electroluminescent display and method of manufacturing the same |
KR20150022560A (en) * | 2013-08-23 | 2015-03-04 | 삼성전기주식회사 | Printed circuit board and method of manufacturing the same |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5512131A (en) * | 1993-10-04 | 1996-04-30 | President And Fellows Of Harvard College | Formation of microstamped patterns on surfaces and derivative articles |
WO1997007429A1 (en) * | 1995-08-18 | 1997-02-27 | President And Fellows Of Harvard College | Self-assembled monolayer directed patterning of surfaces |
EP0794015A1 (en) * | 1996-03-04 | 1997-09-10 | Motorola, Inc. | Apparatus and method for patterning a surface |
US6180239B1 (en) * | 1993-10-04 | 2001-01-30 | President And Fellows Of Harvard College | Microcontact printing on surfaces and derivative articles |
US20020071943A1 (en) * | 1999-03-02 | 2002-06-13 | Hawker Craig Jon | Substrates prepared by chemical amplification of self-assembled monolayers with spatially localized polymer brushes |
WO2004004025A2 (en) * | 2002-06-28 | 2004-01-08 | Infineon Technologies Ag | Method for the economical structuring of conducting polymers by means of defining hydrophilic and hydrophobic regions |
US20040156988A1 (en) * | 2002-08-26 | 2004-08-12 | Mehenti Neville Z. | Selective and alignment-free molecular patterning of surfaces |
US6776094B1 (en) * | 1993-10-04 | 2004-08-17 | President & Fellows Of Harvard College | Kit For Microcontact Printing |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10001135A1 (en) * | 2000-01-13 | 2001-07-19 | Inst Neue Mat Gemein Gmbh | Process for the production of a microstructured surface relief by embossing thixotropic layers |
US6641767B2 (en) * | 2000-03-10 | 2003-11-04 | 3M Innovative Properties Company | Methods for replication, replicated articles, and replication tools |
WO2002038280A2 (en) * | 2000-11-10 | 2002-05-16 | Therics, Inc. | A wetting-resistant nozzle for dispensing small volumes of liquid and a method for manufacturing a wetting-resistant nozzle |
JP2004294878A (en) * | 2003-03-27 | 2004-10-21 | Seiko Epson Corp | Method of manufacturing microstructure, device, optical element, integrated circuit, and electronic equipment |
US20060105152A1 (en) * | 2004-11-12 | 2006-05-18 | Eastman Kodak Company | Flexible sheet for resistive touch screen |
-
2004
- 2004-11-12 US US10/987,992 patent/US20060105148A1/en not_active Abandoned
-
2005
- 2005-11-07 EP EP05851399A patent/EP1810080A2/en not_active Withdrawn
- 2005-11-07 JP JP2007541264A patent/JP2008520082A/en active Pending
- 2005-11-07 WO PCT/US2005/040275 patent/WO2006055310A2/en active Application Filing
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5512131A (en) * | 1993-10-04 | 1996-04-30 | President And Fellows Of Harvard College | Formation of microstamped patterns on surfaces and derivative articles |
US6180239B1 (en) * | 1993-10-04 | 2001-01-30 | President And Fellows Of Harvard College | Microcontact printing on surfaces and derivative articles |
US6776094B1 (en) * | 1993-10-04 | 2004-08-17 | President & Fellows Of Harvard College | Kit For Microcontact Printing |
WO1997007429A1 (en) * | 1995-08-18 | 1997-02-27 | President And Fellows Of Harvard College | Self-assembled monolayer directed patterning of surfaces |
EP0794015A1 (en) * | 1996-03-04 | 1997-09-10 | Motorola, Inc. | Apparatus and method for patterning a surface |
US20020071943A1 (en) * | 1999-03-02 | 2002-06-13 | Hawker Craig Jon | Substrates prepared by chemical amplification of self-assembled monolayers with spatially localized polymer brushes |
WO2004004025A2 (en) * | 2002-06-28 | 2004-01-08 | Infineon Technologies Ag | Method for the economical structuring of conducting polymers by means of defining hydrophilic and hydrophobic regions |
US20040156988A1 (en) * | 2002-08-26 | 2004-08-12 | Mehenti Neville Z. | Selective and alignment-free molecular patterning of surfaces |
Non-Patent Citations (1)
Title |
---|
KUMAR A ET AL: "PATTERNED SELF-ASSEMBLED MONOLAYERS AND MESO-SCALE PHENOMENA" ACCOUNTS OF CHEMICAL RESEARCH, ACS, WASHINGTON, DC, US, vol. 28, no. 5, May 1995 (1995-05), pages 219-226, XP000673351 ISSN: 0001-4842 * |
Also Published As
Publication number | Publication date |
---|---|
JP2008520082A (en) | 2008-06-12 |
WO2006055310A3 (en) | 2006-08-10 |
US20060105148A1 (en) | 2006-05-18 |
EP1810080A2 (en) | 2007-07-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2006055310A2 (en) | Article with patterned layer on surface | |
KR101392781B1 (en) | Method and apparatus for forming patterned coated films | |
EP2298046B1 (en) | Providing a plastic substrate with a metallic pattern | |
US20170320261A1 (en) | Method for Producing Patterned Materials | |
Hoshian et al. | Robust hybrid elastomer/metal-oxide superhydrophobic surfaces | |
EP2444844A2 (en) | Pattern transfer method and apparatus therefor | |
US20110209749A1 (en) | Pattern transfer method and apparatus, flexible display panel, flexible solar cell, electronic book, thin film transistor, electromagnetic-shielding sheet, and flexible printed circuit board applying thereof | |
US8033014B2 (en) | Method of making a molded interconnect device | |
KR101264673B1 (en) | method for fabricating detail pattern by using soft mold | |
KR100293454B1 (en) | Method for compression molding | |
EP2220917B1 (en) | Methods for manufacturing electronic devices by tip printing and scrape coating | |
Beltrão et al. | A review on in‐mold electronics technology | |
US20120097329A1 (en) | Stencils for High-Throughput Micron-Scale Etching of Substrates and Processes of Making and Using the Same | |
KR20170140897A (en) | Thermo-responsive smart adhesive pad | |
US20150047883A1 (en) | Transparent conductive coatings on an elastomeric substrate | |
Kodihalli Shivaprakash et al. | Roll-to-roll hot embossing of high aspect ratio micro pillars for superhydrophobic applications | |
US7618510B2 (en) | Imprinting polymer film on patterned substrate | |
US20060121243A1 (en) | Surface bonding method for PET film and silica gel buttons and a manufactured article of the same | |
EP2080603A1 (en) | Manufacturing film or sheet material having openings | |
Shan et al. | A polymer-metal hybrid flexible mould and application for large area hot roller embossing | |
KR101873206B1 (en) | Manfacturing method of patterned flexible transparent electrode | |
KR102186468B1 (en) | Fabricating method for electronic components magazine | |
Kao et al. | Residual-layer-free direct printing by selective filling of a mould | |
KR20180075637A (en) | Method for fabricating OLED device using patterned film mask | |
WO2023048645A2 (en) | Hybrid manufacturing and electronic devices made thereby |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A2 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KM KN KP KR KZ LC LK LR LS LT LU LV LY MA MD MG MK MN MW MX MZ NA NG NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SM SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A2 Designated state(s): GM KE LS MW MZ NA SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LT LU LV MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WWE | Wipo information: entry into national phase |
Ref document number: 2005851399 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2007541264 Country of ref document: JP |
|
WWP | Wipo information: published in national office |
Ref document number: 2005851399 Country of ref document: EP |