WO2006133291A3 - Transmission ion miscroscope - Google Patents

Transmission ion miscroscope Download PDF

Info

Publication number
WO2006133291A3
WO2006133291A3 PCT/US2006/022107 US2006022107W WO2006133291A3 WO 2006133291 A3 WO2006133291 A3 WO 2006133291A3 US 2006022107 W US2006022107 W US 2006022107W WO 2006133291 A3 WO2006133291 A3 WO 2006133291A3
Authority
WO
WIPO (PCT)
Prior art keywords
image
ion
miscroscope
sample
transmission ion
Prior art date
Application number
PCT/US2006/022107
Other languages
French (fr)
Other versions
WO2006133291A2 (en
Inventor
Billy W Ward
Original Assignee
Alis Technology Corp
Billy W Ward
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alis Technology Corp, Billy W Ward filed Critical Alis Technology Corp
Publication of WO2006133291A2 publication Critical patent/WO2006133291A2/en
Publication of WO2006133291A3 publication Critical patent/WO2006133291A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H01J2237/0802—Field ionization sources
    • H01J2237/0807—Gas field ion sources [GFIS]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/262—Non-scanning techniques

Abstract

Transmission ion microscope. A bright light ion source (10) generates an ion beam (12) that is focused on a sample (18) by an electrostatic condenser lens (14,16). An objective lens (22) focuses the ion beam transmitted through the sample to forth an image. A projector lens (28) enlarges the image and a phosphor screen (30) receives the enlarged image to generate light allowing visualization of the image.
PCT/US2006/022107 2005-06-07 2006-06-07 Transmission ion miscroscope WO2006133291A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/146,741 US7414243B2 (en) 2005-06-07 2005-06-07 Transmission ion microscope
US11/146,741 2005-06-07

Publications (2)

Publication Number Publication Date
WO2006133291A2 WO2006133291A2 (en) 2006-12-14
WO2006133291A3 true WO2006133291A3 (en) 2007-02-01

Family

ID=37398703

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2006/022107 WO2006133291A2 (en) 2005-06-07 2006-06-07 Transmission ion miscroscope

Country Status (2)

Country Link
US (1) US7414243B2 (en)
WO (1) WO2006133291A2 (en)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7557361B2 (en) * 2003-10-16 2009-07-07 Alis Corporation Ion sources, systems and methods
US7554096B2 (en) * 2003-10-16 2009-06-30 Alis Corporation Ion sources, systems and methods
US7557359B2 (en) * 2003-10-16 2009-07-07 Alis Corporation Ion sources, systems and methods
US7518122B2 (en) * 2003-10-16 2009-04-14 Alis Corporation Ion sources, systems and methods
US7554097B2 (en) * 2003-10-16 2009-06-30 Alis Corporation Ion sources, systems and methods
US9159527B2 (en) 2003-10-16 2015-10-13 Carl Zeiss Microscopy, Llc Systems and methods for a gas field ionization source
US7786452B2 (en) * 2003-10-16 2010-08-31 Alis Corporation Ion sources, systems and methods
US8110814B2 (en) 2003-10-16 2012-02-07 Alis Corporation Ion sources, systems and methods
US7511279B2 (en) * 2003-10-16 2009-03-31 Alis Corporation Ion sources, systems and methods
US7511280B2 (en) * 2003-10-16 2009-03-31 Alis Corporation Ion sources, systems and methods
US7557358B2 (en) * 2003-10-16 2009-07-07 Alis Corporation Ion sources, systems and methods
US7521693B2 (en) * 2003-10-16 2009-04-21 Alis Corporation Ion sources, systems and methods
US7557360B2 (en) * 2003-10-16 2009-07-07 Alis Corporation Ion sources, systems and methods
US7786451B2 (en) 2003-10-16 2010-08-31 Alis Corporation Ion sources, systems and methods
TW200737267A (en) * 2006-03-20 2007-10-01 Alis Corp Systems and methods for a helium ion pump
US7804068B2 (en) * 2006-11-15 2010-09-28 Alis Corporation Determining dopant information
EP2068345B1 (en) 2007-12-05 2016-07-20 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH High resolution gas field ion column with reduced sample load
US8334701B2 (en) * 2008-08-29 2012-12-18 Carl Zeiss Nts, Llc Repairing defects
CN101752161B (en) * 2008-12-02 2011-07-06 北京有色金属研究总院 Preparation method of fluorescent screen of transmission electron microscope
US9275817B2 (en) 2012-04-09 2016-03-01 Frederick Wight Martin Particle-beam column corrected for both chromatic and spherical aberration
WO2014014446A1 (en) 2012-07-16 2014-01-23 Fei Company Endpointing for focused ion beam processing
JP6177817B2 (en) 2015-01-30 2017-08-09 松定プレシジョン株式会社 Charged particle beam apparatus and scanning electron microscope
CN109243966B (en) * 2018-09-11 2023-09-15 南京信息工程大学 Tripolar velocity imager for detecting electron, ion and neutral free radical

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4139773A (en) * 1977-11-04 1979-02-13 Oregon Graduate Center Method and apparatus for producing bright high resolution ion beams
GB1604898A (en) * 1977-05-26 1981-12-16 Philips Nv Electron microscope

Family Cites Families (49)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1604898A (en) * 1924-07-05 1926-10-26 Fynn Valere Alfred Asynchronous motor
GB1180894A (en) 1967-06-20 1970-02-11 Nat Res Dev Atom Probe Field Ion Microscope.
US3868507A (en) 1973-12-05 1975-02-25 Atomic Energy Commission Field desorption spectrometer
US4352985A (en) * 1974-01-08 1982-10-05 Martin Frederick W Scanning ion microscope
DE2538521C2 (en) * 1975-08-28 1977-09-08 Siemens AG, 1000 Berlin und 8000 München Corpuscular beam transmission microscope with a deflection system behind the specimen
US4236073A (en) * 1977-05-27 1980-11-25 Martin Frederick W Scanning ion microscope
JPS57132632A (en) * 1981-02-09 1982-08-17 Hitachi Ltd Ion source
JPS57212754A (en) * 1981-06-24 1982-12-27 Hitachi Ltd Electron-beam controller for electron microscope
US4639301B2 (en) 1985-04-24 1999-05-04 Micrion Corp Focused ion beam processing
DE3677062D1 (en) 1985-06-04 1991-02-28 Denki Kagaku Kogyo Kk SOURCE OF CHARGED PARTICLES.
JPH01130450A (en) 1987-11-13 1989-05-23 Fujitsu Ltd Manufacture of emitter for electric field ion source
US4874947A (en) 1988-02-26 1989-10-17 Micrion Corporation Focused ion beam imaging and process control
EP0366851B1 (en) 1988-11-01 1994-02-16 International Business Machines Corporation Low-voltage source for narrow electron/ion beams
US5034612A (en) * 1989-05-26 1991-07-23 Micrion Corporation Ion source method and apparatus
JPH088245B2 (en) 1990-09-28 1996-01-29 株式会社島津製作所 Focused ion beam etching system
US5188705A (en) 1991-04-15 1993-02-23 Fei Company Method of semiconductor device manufacture
JP2502875B2 (en) 1992-01-30 1996-05-29 松下電器産業株式会社 Wiring pattern inspection device
JPH05343019A (en) * 1992-06-03 1993-12-24 Hitachi Ltd Charged particle beam device and observation thereof
US5414261A (en) * 1993-07-01 1995-05-09 The Regents Of The University Of California Enhanced imaging mode for transmission electron microscopy
JPH0745230A (en) * 1993-07-30 1995-02-14 Fuji Photo Film Co Ltd Image recording method and device by electric field ion microscope or field emission microscope
JP3041565B2 (en) 1993-11-30 2000-05-15 セイコーインスツルメンツ株式会社 Sample processing method
JPH09184714A (en) 1995-12-28 1997-07-15 Hitachi Ltd Pattern dimension measuring method
JP2796622B2 (en) 1996-03-07 1998-09-10 セイコーインスツルメンツ株式会社 Fine processing method and fine processing structure
US5916424A (en) 1996-04-19 1999-06-29 Micrion Corporation Thin film magnetic recording heads and systems and methods for manufacturing the same
US5783830A (en) * 1996-06-13 1998-07-21 Hitachi, Ltd. Sample evaluation/process observation system and method
US6042738A (en) 1997-04-16 2000-03-28 Micrion Corporation Pattern film repair using a focused particle beam system
US6538254B1 (en) 1997-07-22 2003-03-25 Hitachi, Ltd. Method and apparatus for sample fabrication
US6268608B1 (en) 1998-10-09 2001-07-31 Fei Company Method and apparatus for selective in-situ etching of inter dielectric layers
US6414307B1 (en) 1999-07-09 2002-07-02 Fei Company Method and apparatus for enhancing yield of secondary ions
US20070131877A9 (en) 1999-11-29 2007-06-14 Takashi Hiroi Pattern inspection method and system therefor
JP2001176440A (en) 1999-12-15 2001-06-29 Jeol Ltd Ion beam equipment and auger microprobe
US6683320B2 (en) 2000-05-18 2004-01-27 Fei Company Through-the-lens neutralization for charged particle beam system
US7084399B2 (en) 2000-07-18 2006-08-01 Hitachi, Ltd. Ion beam apparatus and sample processing method
JP3597761B2 (en) 2000-07-18 2004-12-08 株式会社日立製作所 Ion beam device and sample processing method
US6504151B1 (en) 2000-09-13 2003-01-07 Fei Company Wear coating applied to an atomic force probe tip
US6959874B2 (en) * 2001-02-23 2005-11-01 Bardwell William E Biometric identification system using biometric images and personal identification number stored on a magnetic stripe and associated methods
JP3973372B2 (en) 2001-03-23 2007-09-12 株式会社日立製作所 Substrate inspection apparatus and substrate inspection method using charged particle beam
EP1376650A4 (en) 2001-03-26 2008-05-21 Kanazawa Inst Of Technology Scanning atom probe and analysis method using scanning atom probe
JP3867524B2 (en) * 2001-07-05 2007-01-10 株式会社日立製作所 Observation apparatus and observation method using electron beam
US7053370B2 (en) 2001-10-05 2006-05-30 Canon Kabushiki Kaisha Information acquisition apparatus, cross section evaluating apparatus, cross section evaluating method, and cross section working apparatus
JP3944373B2 (en) 2001-10-12 2007-07-11 株式会社日立ハイテクノロジーズ Sample length measuring method and scanning microscope
US6583423B2 (en) 2001-11-16 2003-06-24 Ion Beam Applications, S.A. Article irradiation system with multiple beam paths
JP2004039453A (en) 2002-07-03 2004-02-05 Seiko Instruments Inc Fine stencil structure modifying device
US20040121069A1 (en) 2002-08-08 2004-06-24 Ferranti David C. Repairing defects on photomasks using a charged particle beam and topographical data from a scanning probe microscope
US7067867B2 (en) * 2002-09-30 2006-06-27 Nanosys, Inc. Large-area nonenabled macroelectronic substrates and uses therefor
JP2006079846A (en) 2004-09-07 2006-03-23 Canon Inc Cross section evaluation device of sample and cross section evaluation method of sample
JP4664041B2 (en) * 2004-10-27 2011-04-06 株式会社日立ハイテクノロジーズ Charged particle beam apparatus and sample preparation method
JP4338627B2 (en) * 2004-12-17 2009-10-07 株式会社日立ハイテクノロジーズ Charged particle beam apparatus and charged particle beam microscopic method
US7431856B2 (en) 2005-05-18 2008-10-07 National Research Council Of Canada Nano-tip fabrication by spatially controlled etching

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1604898A (en) * 1977-05-26 1981-12-16 Philips Nv Electron microscope
US4139773A (en) * 1977-11-04 1979-02-13 Oregon Graduate Center Method and apparatus for producing bright high resolution ion beams

Non-Patent Citations (6)

* Cited by examiner, † Cited by third party
Title
BREESE M B H ET AL: "Ion optical study of a transmission ion microscope", NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, SECTION - B: BEAM INTERACTIONS WITH MATERIALS AND ATOMS, ELSEVIER, AMSTERDAM, NL, vol. 158, no. 1-4, 2 September 1999 (1999-09-02), pages 236 - 240, XP004253526, ISSN: 0168-583X *
CHANSON P ET AL: "Sur les premières images obtenues avec un microscope protonique", COMPTES RENDUS HEBDOMADAIRES DES SEANCES DE L'ACADEMIE DES SCIENCES FRANCE, vol. 233, 3 December 1951 (1951-12-03), France, pages 1436 - 1438, XP009075206 *
GRIVET PIERRE ET AL: "ION MICROSCOPY: HISTORY AND ACTUAL TRENDS", ANN NY ACAD SCI 1978 NY ACAD OF SCI, vol. 306, 23 February 1977 (1977-02-23), NEW YORK, NY, pages 158 - 182, XP001247900 *
KNOLL M, RUSKA E: "Das Elektronenmikroskop", ZEITSCHRIFT FUR PHYSIK GERMANY, vol. 78, no. 5-6, 4 October 1932 (1932-10-04), pages 318 - 339, XP009075185 *
MAGNAN C: "The Proton Microscope", NUCLEONICS; NUCLEONICS APR 1949, vol. 4, no. 4, April 1949 (1949-04-01), NEW YORK, NY, UNITED STATES, pages 52 - 66, XP001247978 *
VALDIVIEZ R ET AL INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS: "The mechanical design of a proton microscope for radiography at 800 MeV", PROCEEDINGS OF THE 2003 PARTICLE ACCELERATOR CONFERENCE. PAC 2003. PORTLAND, OR, MAY 12 - 16, 2003, PARTICLE ACCELERATOR CONFERENCE, NEW YORK, NY : IEEE, US, vol. VOL. 1 OF 5, 12 May 2003 (2003-05-12), pages 1664 - 1666, XP010699626, ISBN: 0-7803-7738-9 *

Also Published As

Publication number Publication date
WO2006133291A2 (en) 2006-12-14
US20060284091A1 (en) 2006-12-21
US7414243B2 (en) 2008-08-19

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