WO2007003563A1

WO2007003563A1 - Projection light facility provided with a plurality of projective lenses

Info

Publication number: WO2007003563A1
Application number: PCT/EP2006/063663
Authority: WO
Inventors: Aurelian Dodoc; Wilhelm Ulrich; Heiko Feldmann
Original assignee: Carl Zeiss Smt Ag
Priority date: 2005-07-01
Filing date: 2006-06-28
Publication date: 2007-01-11
Also published as: JP6063637B2; JP2008545153A; KR101407797B1; DE102005030839A1; JP6116788B2; KR20120040755A; KR101478832B1; JP2012168550A; KR20080022125A

Abstract

The invention relates to a projection light facility (1) comprising a plurality of projection objective lenses (10) for reproducing each object field (50) on the image field (60). The image fields (60) are located in a substrate area (40) on the substrate plane, wherein said substrate area (40) is displaceable in a predefined scanning direction (5) with respect to the plurality of projection objective lenses, at least one projection objective lens is provided with a partial section of the optical axis thereof which is not perpendicular to the substrate plane and the projection of said partial section on the substrate plane is not parallel to the scanning direction (5).

Description

Projection exposure system with a plurality of projection lenses

The invention relates to a projection exposure apparatus with a plurality of projection objectives. In particular, the invention relates to a projection exposure apparatus in which a larger installation space is made possible for the individual projection objectives.

There are various approaches known to those in the lithographic production of e.g. LC ("liquid crystal") or FP (= "flat panel") display devices required to produce large image fields (eg more than 1 m in diameter) .In particular, it is known, a plurality of projection lenses to each other on two rows transverse to the scanning direction to be arranged such that the projection objectives from these two rows image staggered field sections, which then overlap in the exposure process, as shown in Figures 27 and 28. The known projection exposure apparatus 1 'shown in Figure 27, for example, has a plurality of illumination systems 2 and a plurality of projection lenses 3, between which a mask holder 4 holds a mask 5 arranged in a mask or reticle plane of the projection exposure apparatus 1 ', whose structures are projected through the projection objectives 3 onto a substrate or wafer plane held by a substrate holder 6 Substrate 7 are shown.

In the prior art, systems with lenses arranged in one or more rows, for example in US 5,579,147, US 5,581,075, US 5,602,620, US 5,614,988, US 5,617,181, US 5,617,211, US 5,623,343, US 5,625,436, US 5,668,624, US 5,912,726, US 6,795,169, WO 0019261, US 6,144,495.

With increasing apertures, the required installation space of the projection lenses increases as a result of the increasing diameters of the optical elements, in which case in particular catadioptric systems use large concave mirrors (with diameters of, for example, over 0.5 m).

Object of the present invention is to provide a projection exposure system with a plurality of projection lenses, in which a larger space is made possible for the individual projection lenses.

According to one approach, a projection exposure apparatus according to the invention has at least two projection lenses, each of which images an object field into an image field, these image fields being arranged in a substrate area in a substrate plane, the substrate area being movable in a predetermined scanning direction relative to the plurality of projection objectives, - Wherein at least one of these projection lenses has a portion of its optical axis, which is not perpendicular to the substrate plane, and

- where the projection of this subsection into the

Substrate plane is not parallel to the scan direction.

In a preferred embodiment, the angle between at least one of these projections and the scanning direction is greater than 2 ° in absolute value, preferably greater than 3 °, and still more preferably greater than 4 °. In a further preferred embodiment, the angle between two such projections in terms of magnitude greater than 2 °, preferably greater than 3 °, and more preferably greater than 4 °.

According to the invention, an arrangement of the projection objectives is selected in which not all of the projection lenses which follow each other transversely to the scan direction are arranged in a straight line (ie as is conventional on a straight line perpendicular to the scan direction), but rather a suitable arrangement of the projection objectives with respect to the scan direction or to each other is deviated from this which leads to the fact that in the individual projection objectives an enlarged space is available. In particular, one or more

Projection lenses with folded beam path, which have at least one not perpendicular to the substrate portion extending portion of the optical axis, with this portion of the optical axis obliquely to the scanning direction. Such projection lenses with folded beam path often have at the end of the folded portion of the optical axis on a concave mirror, for which then an enlarged space is available due to the inventive arrangement. Accordingly, in particular, the concave mirror may have a larger diameter compared to a conventional linear arrangement of the projection lenses, in which the folded portions of the optical axis each parallel to the scanning direction and in which the concave mirror of adjacent projection lenses would collide even at smaller diameters. According to another approach, a projection exposure apparatus according to the invention has at least two projection lenses, each of which images an object field into an image field, these image fields being arranged in a substrate region which is movable in a predetermined scanning direction relative to the plurality of projection lenses, at least one of them Image fields is limited by a plurality of rectilinear side lines such that the normal on the longest of these side lines is not parallel to the scan direction.

In a preferred embodiment, the angle between at least one of these normals and the scanning direction is greater than 2 ° in absolute value, preferably greater than 3 °, and more preferably greater than 4 °. In a further preferred embodiment, the angle between two such normals is greater in absolute value than 2 °, preferably greater than 3 °, and more preferably greater than 4 °.

According to a further approach, a projection exposure apparatus according to the invention has at least two projection lenses, each of which images an object field into an image field, these image fields being arranged in a substrate region which is movable in a predetermined scanning direction relative to the plurality of projection lenses, each of them of these picture fields has a plurality of corner points, and wherein the picture fields are arranged such that the longest connecting line between two corner points in one of these picture fields is not parallel to the longest connecting line between two corner points in the other of these picture fields. In a preferred embodiment, the angle between these connecting straight lines is greater than 2 ° in absolute value, preferably greater than 3 °, and more preferably greater than 4 °.

According to a further approach, a projection exposure apparatus according to the invention has a plurality of projection lenses, each of which images an object field into an image field, these image fields being arranged in a substrate region which is movable in a predetermined scanning direction relative to the plurality of projection lenses, and wherein at least three successive arranged transversely to the scanning direction image fields lie on a non-linear curve.

According to a further approach, a projection exposure apparatus according to the invention has a plurality of projection lenses, each of which images an object field into an image field, these image fields being arranged in a substrate region which is movable in a predetermined scanning direction relative to the plurality of projection lenses during a scanning process wherein the image fields are arranged in at least two groups extending transversely to the scan direction such that image fields of one group are offset with respect to image fields of the other group transversely to the scan direction, and wherein the image fields are along at least one of the groups a non-linear curves are arranged.

In the above, further approaches according to the invention, in each case such an arrangement of the projection objectives is selected that not all of them are transverse to the scanning direction successive or adjacent image fields are arranged along straight lines, but in particular the image fields are arranged on at least one nonlinear curve, whereby an increased space is available for the projection fields generating projection fields. As a result of the increased installation space achieved, these projection lenses can use optical elements (in particular mirrors and lenses) of larger diameter and thus also achieve higher apertures.

According to a further preferred embodiment, the plurality of projection lenses further comprises a third group of projection lenses which generates a third group of image fields arranged with respect to the scanning direction between the first nonlinear curve and the second nonlinear curve. In such a three-row arrangement, for a certain overall size of the field exposed in the scanning process in the substrate plane, the image fields generated by the individual projection lenses may be smaller than in a double-row arrangement, since more image fields are joined together during the scanning process or overlap to be brought. As a result, the individual projection lenses can in turn have smaller optical elements, so that even better space utilization can be achieved.

According to a further preferred embodiment, adjacent projection lenses have an inverted arrangement of their optical elements. This results in an even more effective use of space, when relatively larger subsystems or their optical elements are arranged in addition to relatively smaller subsystems or their optical elements, resulting in a total of a space-saving Arrangement leads compared to a structure in which the respective largest optical elements (eg concave mirror) of adjacent lenses are arranged side by side.

In order to ensure a cross-scan positive image scale and a faithful joining together of the image fields generated in the substrate plane in the course of the scan process, the projection objectives in preferred embodiments can e.g. generate an odd number of intermediate images and / or have, for example, a roof prism or a roof mirror image arrangement for image inversion without intermediate image.

According to a further aspect, the present invention also relates to a projection exposure apparatus having a plurality of projection objectives, each of which images an object field into an image field, wherein the image fields are arranged in a substrate region which is movable in a predetermined scanning direction relative to the plurality of projection objectives. and wherein at least some of the projection objectives comprise a first subsystem and at least a second subsystem, wherein the first subsystem is a catadioptric subsystem and the second subsystem is a purely refractive subsystem.

This makes it possible to achieve a compact design. In particular, the optical axes of the two subsystems can be offset parallel to each other. Preferably, the intermediate image generated by the first subsystem is then arranged centrically to the optical axis of the second subsystem. Such an arrangement is advantageous in terms of the dimensions of the second, purely refractive subsystem, since the lens groups of the second subsystem are designed to be smaller and also the field dependence of aberrations in the second subsystem is reduced.

According to a further preferred embodiment, a pattern to be imaged by the projection objectives is generated in the object fields by a microelectronic-mechanical system (MEMS), in particular one or more digital micromirror devices (DMD).

Since in this case the orientation of the pictures over the

Use of the DMD 's electronically controlled in the desired manner, can be dispensed with on the one hand on the production of intermediate images or the use of roof prisms for the preparation of the positive AbbildungsmaßStabes. Furthermore, this can also be due to a movement of the generated

Object fields are dispensed relative to the projection lenses, resulting in a significant structural simplification and a reduced adjustment effort result. Furthermore, the complex process of mask production is avoided.

According to a further aspect, the present invention therefore also relates to a projection exposure apparatus having a plurality of projection lenses, each of which images an object field into an image field, wherein the

Image fields are arranged in a substrate region, which is movable in a predetermined scanning direction relative to the plurality of projection lenses, and wherein the object fields are arranged relative to the plurality of projection lenses at a fixed position. The invention further relates to a method for the microlithographic production of microstructured components as well as to a microstructured component produced by means of such a method, in particular an LCD device or a Fiat Panel Display.

Further embodiments of the invention are described in the description and the dependent claims.

The invention will be explained in more detail with reference to embodiments shown in the accompanying drawings.

Show it:

Figure 1 is a schematic perspective view of a structure of a projection exposure apparatus according to the invention with a plurality of projection lenses;

2a-f are schematic representations of arrangements of image fields generated in each case by means of a projection exposure apparatus according to the invention in plan view;

Figure 3 is a schematic representation of

Illustrating the available for the version of the projection lenses of a projection exposure apparatus according to the invention (Figure 3b) space compared to that in a conventional

Projection exposure system available space (Figure 3a); Figure 4a-b is a schematic representation of exemplary

Arrangements of field diaphragms for use in a projection exposure apparatus according to the invention;

FIGS. 5-14 show various embodiments of the individual projection lenses of a projection exposure apparatus according to the invention;

Figure 15-16 advantageous arrangements of adjacent

Projection lenses of a projection exposure apparatus according to the invention;

Figure 17 is a schematic representation of the arrangement of means of an inventive

Projection exposure system generated image fields in plan view according to another embodiment of the invention;

Figure 18 is a schematic representation of the structure of a

Projection exposure system for generating an array of image fields according to Figure 17;

Figure 19a-b is a schematic representation of the structure of a projection exposure apparatus according to another

Aspect of the present invention;

Figure 20-25 various versions of

Projection exposure equipment according to further preferred embodiments;

Figure 26 is a schematic perspective view of a structure of an inventive A projection exposure apparatus comprising a plurality of projection lenses according to another embodiment;

Figure 27 is a schematic perspective view of a structure of a projection exposure apparatus with a plurality of projection lenses according to the prior art; and

FIG. 28 shows a schematic illustration of the arrangement of image fields generated by means of the projection exposure apparatus of FIG. 27 in plan view.

1 shows a projection exposure apparatus with a plurality of projection objectives in a schematic perspective view for explaining the principle of the present invention.

The projection exposure apparatus 1 has a plurality of illumination systems 10 and a plurality of

Projection lenses 20, between which a mask holder 31 holds a arranged in a mask or Retikelebene the projection exposure system 1 mask 30 whose structures are projected by the projection lenses 20 on a arranged in a substrate or wafer plane and held by a substrate holder 41 substrate 40. Dashed lines in Fig. 1, the arrangement of a plurality of object fields 50, which are imaged by the plurality of projection lenses 20 on a plurality of image fields 60. The optical axes of the

Projection lenses 20 are parallel to each other. The projection lenses 20 each have a magnification β << 1, wherein also the Image scale in the direction perpendicular to the scan direction (in Fig. 1 so the y direction) direction (in Fig. 1 So the x direction) applicable magnification ß _x = l is, so that from upright object fields 50 even upright image fields 60 are generated while ensuring that the individual image fields 60 generated during the scan process match one another.

The representation in particular in Fig. 1 and Fig. 2 is only illustrative, with about the number of

Projection lenses and the object or image fields is arbitrary and typically much larger.

According to FIG. 1, the arrangement of the projection objectives 20 is selected such that the object fields 50 and the generated image fields 60 (more precisely the respective centers of the object fields 50 and the generated image fields 60) along two mutually concave curves A and B are shown in FIG are arranged, as shown in Fig. 2a, which indicates a schematic plan view of the generated image fields, can be seen even better. In FIGS. 2b and 2c, respective arrangements with different geometries of image fields 60 '(in FIG. 2b) and 60''(in FIG. 2c) are shown, the image fields 60' having a hexagonal geometry and the image fields 60 '' have a trapezoidal geometry, and wherein the object fields not shown here in each case have the corresponding geometry. It can be seen that here too the image fields 60 'and 60 "are arranged along two mutually concave curves A' and B '(in FIG. 2b) and A" and B "(in FIG. 2c). For the course of these curves, which describe the arrangement of the object or image fields 50, 60, a suitable, for the individual object or image fields 50, 60 uniform Geometric criterion are used, for example, these curves can each extend through the geometric center or the center of gravity of the object or image fields 50, 60.

In FIGS. 2a-c, two directions x and y are also indicated in each case for each image field 60, 60 'or 60' ', specifically numbered as xl-x7 or yl-y7 for the different image fields drawn. The directions xl-x7 and yl-y7 are respectively associated with the longest (or, as in FIGS. 2a and 2b, one of several equally long) rectilinear lateral lines, the x-direction being parallel to this lateral line and the y-direction Direction perpendicular to this. It can be seen that for the respective image fields arranged along one of the curved curves A, B, the associated y-directions (i.e., the directions of the normals on the longest sideline) are not parallel to the scanning direction S. The inventive arrangement of the image fields respectively generating projection lenses can thus also be defined by the criterion that the normal of the longest sideline (s) of the respective image field is at an angle to the scanning direction S, said angle preferably at least 2 ° , preferably at least 3 ° and more preferably at least 4 °.

In Fig. 2d-f is in a further representation of the corresponding image fields 60, 60 'and 60''respectively the longest connecting line between two vertices designated dl to d7. According to FIG. 2 d (with rectangular image fields 60), this connecting straight line corresponds in each case to the diagonal in the rectangular image field 60. In FIG. 2 e (with hexagonal image fields 60 ') This connecting straight line corresponds in each case to the connection between the two outermost, mutually opposite corner points, and in FIG. 2f (with trapezoidal image fields 60 ") this connecting straight line corresponds to the longest side line of the trapezoid. It can be seen that for the respective image fields arranged along one of the curved curves A, B, the associated connecting straight lines dl-d7 are also not parallel to the scanning direction S. The inventive arrangement of the image fields respectively generating projection lenses can thus also be defined by the criterion that the longest connecting line between two vertices of the respective image field is at an angle to the scanning direction S, said angle preferably at least 2 °, preferably at least 3 ° and even more preferably at least 4 °.

The object or image fields 50 and 60 are rectangular (as arranged in the object or in an intermediate image plane) field diaphragms 70 and 71 according to FIG. 4, as in FIGS. 2a and 4a, trapezoidal 4b or in any other suitable form such that in the exposure process, in which both the mask holder 31 and the substrate holder 41 are moved in the scanning direction represented by the broad arrows "S", the image fields 60 are formed from the two curves " A "and" B "overlap, as can be seen from the respective dashed lines shown in Fig. 2a-c.

As can be seen from Fig. 3, the inventive leads

Arrangement that an increased space is available for the individual projection lenses 20. For this purpose is the in the inventive arrangement available standing space (according to the hatched area in Fig. 3b) of the in a conventional rectilinear arrangement of the object or image fields shown in FIG. 27 and FIG. 28 available space (according to the hatched area in Fig. 3a) compared. It can be seen that in the trapezoidal shaded areas of FIG. 3b, the triangular areas overhanging a rectangle (whose smaller side length corresponds to the smaller side length of the trapezoidal hatched areas) have been obtained which, in two-dimensional projection, for example on the substrate plane, make clear the added installation space.

Projection lenses, which substantially fill the space shown in Fig. 3b and in which the

Image fields as shown in Fig. 3a or 3b are arranged, are each projection lenses with folded beam path, in Fig. 3b extend the longer center axes of the respective trapezoidal surfaces in the direction of the folded optical axis, these directions are designated pl-p7. It can be seen that as a result of the inventive arrangement of the individual projection lenses, the projections of the respective subsections of the optical axis in the substrate plane which are not perpendicular to the substrate plane (but according to FIG. 3b in the direction of the arrows pl-p7), not parallel to the scanning direction but at an angle thereto, this angle is preferably at least 2 °, more preferably at least 3 ° and even more preferably at least 4 °.

As a result of the invention achieved increased space, the projection lenses 20 of the projection exposure system 1 optical elements (especially mirrors and lenses) of larger diameter and thus achieve higher apertures.

The arrangement of the projection lenses 20 or the image fields 60 generated thereby is not limited to the specific arrangement illustrated in FIGS. 2 and 3. Thus, according to the invention, the desired gain in installation space also occurs on curved curves in another suitable arrangement. Preferably, the curves A and B, along which the image fields 60 of the projection lenses 20 are arranged, are mutually concave curves, which are more preferably arranged mirror-symmetrically to a center axis extending between the curves A and B. The curves A and B may, without the invention being limited thereto, be in particular circular segments, but e.g. also have the shape of other conic sections, such as parabolas or ellipses.

Exemplary embodiments of the respective individual projection objectives are explained below, without the invention being limited to such embodiments, with reference to FIGS. 5-14.

According to FIG. 5 a, a single projection objective 110 can have approximately a purely refractive and unfolded beam path and can be constructed from two subsystems 110 a and 110 b each having two positive lens groups 111, 112 and 113, 114, between which an intermediate image is generated. According to FIG. 5b, a construction of a projection lens 120 with two subsystems 120a and 120b is shown, each with two positive lens groups 121, 122 and 123, 124 and one folding mirror 125 and 126, respectively, with convolution carried out close to the intermediate image. According to Fig. 5c is another variant of a projection lens 130 with folded optical path having two double mirrors 131, 132 and an intermediate image, wherein between the double mirrors 131, 132 a first positive lens group 133, a second negative lens group 134, a third positive lens group 135 and a fourth positive lens group 136 is arranged.

According to FIG. 6, a projection objective 140 can also have a roof prism 141 which has an inversion of the generated image and thus an overall positive

Image scale in the direction perpendicular to the scan direction (i.e., in Fig. 1 in the x direction) is also generated without the presence of an intermediate image. The projection lens 140 shown has a folding mirror 142, a positive lens group 143, a negative lens group 144 near a concave mirror 145, and the roof prism 141.

The projection lens 140 shown is of the Dyson type, which in the sense of the present application means objectives which have a system with a concave mirror (here: "145") and a positive lens group (here: "143"). The term "Dyson type" is also to be understood systems in which this concave mirror and the positive lens group are not necessarily arranged concentric with each other and in which (as shown here) also a negative lens group 144 arranged on the concave mirror 145 for correcting chromatic aberrations can be.

According to FIG. 7, a projection objective 150, in a modification of the projection objective 140, may also have a plane mirror 155 instead of the concave mirror 145, wherein otherwise functionally identical parts are shown with reference numerals increased by "10".

According to FIG. 8, a projection lens 160 can also be constructed as a catadioptric system of the offner type, which in the context of the present application means objectives which are constructed by a system having a concentric sequence in the beam path comprising a concave mirror, a convex mirror and the concave mirror. The projection lens 160 shown includes a folding mirror 161, a concave mirror 162, a convex mirror 163 (at which the beams are reflected both before and after the concave mirror 162) and a roof prism 164.

According to FIG. 9, the roof prism can also be replaced by corresponding mirror arrangements in which, in contrast to the prism, the reflective surfaces 171, 172 (in FIGS. 9a) and 173, 174 (in FIG. 9b) are on the outside, and analogously to Dachkantprisma image reversal in only one spatial direction (eg x-direction) is achieved, with reference to the thinner, continuous lines in each case the course of two beams sl, s2 (in Fig. 9a) or s3, s4 (in Fig. 9b) is indicated ,

10, in a projection lens 180, two partial systems 180a and 180b, each of the Dyson type, may be combined with each other, or between them, between which an intermediate image is formed. Each of the subsystems 180a, 180b has a double-fold mirror 181a, 181b, a positive lens group 182a, 182b, a negative lens group 183a, 183b, and a concave mirror 184a, 184b, respectively. 11, in a projection lens 190, two subsystems 190a and 190b, one of the Offner type and one of the Dyson type, may be combined with each other, between which an intermediate image IMI is formed. The Offner-type subsystem 190a includes a folding mirror 191, a concave mirror 192, a convex mirror 193, and a folding mirror 194. The Dyson type subsystem 190b includes a folding mirror 195, a positive lens group 196, a negative lens group 197, a concave mirror 198, and a second folding mirror 199. Here, the optical axes of the two subsystems 190a and 190b do not have to match, which is advantageous in terms of the dimensions of the Dyson type subsystem S2.

According to FIG. 12, in a projection objective 200, two partial systems 200a and 200b, each of which is of the offner type, may also be combined or arranged successively, between which an intermediate image is formed. Each of the Offner-type subsystems 200a and 200b has a folding mirror 201a and 201b, a concave mirror 202a and 202b, a convex mirror 203a and 203b and a folding mirror 204a and 204b, respectively.

According to FIG. 13, in a projection objective 210, two subsystems 210a and 210b, one of which is of the Dyson type and one is purely refractive, may also be combined or arranged successively, between which an intermediate image is formed. The Dyson type subsystem 210a includes a folding mirror 211, a positive lens group 212, a negative lens group 213, a concave mirror 214, and a second folding mirror 215. The purely refractive subsystem 210b has two positive lens groups 216 and 217 on. Again, the optical axes of the two subsystems 210a and 210b do not have to match, which is advantageous in terms of the dimensions of the purely refractive subsystem 210b. It is thus advantageous if the optical axes of the two subsystems have a parallel offset from one another, with the intermediate image, which is generated by the first subsystem 210a, being arranged centrically relative to the optical axis of the second subsystem 210b, as shown in FIG. In other words, the second subsystem 210b may be centered to the intermediate image. An advantage of this arrangement is that the lens groups 216 and 217 of the second subsystem 210b can be made smaller and also the field dependence of aberrations in the second subsystem 210b can be reduced.

According to FIG. 14, in a projection objective 220, two subsystems S1 and S2, one of which is of the offner type and one of which is purely refractive, may also be combined or arranged successively, between which an intermediate image IMI is formed. The subsystem Sl of

Offner type comprises a folding mirror 221, a concave mirror 222, a convex mirror 223 and a folding mirror 224. The purely refractive subsystem S2 has two positive lens groups 225 and 226. Again, the optical axes of the two subsystems Sl and S2 do not have to match, which is advantageous in terms of the dimensions of the purely refractive subsystem S2, to which reference is made to the comments on Fig. 13.

While basically all the projection lenses in the projection exposure apparatus according to the invention can each be of identical construction, in particular according to one of the above advantageous embodiments, there also exist Further preferred arrangements in which the respective relative arrangement of mutually adjacent projection lenses varies systematically: Embodiments based thereon and explained below are based on the fact that in the above embodiments of the individual projection objective, in each case the installation space required by an offer-type subsystem is greater than the space required by a subsystem of the Dyson type, which in turn is greater than the space required by a purely refractive subsystem. This circumstance is taken into account in the following two exemplary embodiments by the choice of a relative arrangement of successive projection objectives which is favorable in each case with regard to the installation space.

Referring to FIG. 15, the arrangement in successive projection lenses is selected such that a first projection lens 230 combines, successively, a first subsystem 230a of the offner type and a second subsystem 230b of the dyson type, which is thus shown in FIG

Structure corresponds to the projection lens 190 of FIG. 11. Adjacent to the first projection objective 230 is a second projection objective 240 which, in combination, has a first subsystem 240a of the Dyson type and a second subsystem 240b of the offner type.

Referring to FIG. 16, the arrangement in successive projection lenses is selected so that a first projection lens 250 combines, respectively, a first subsystem 250a of the purely refractive type and a second subsystem 250b of the Dyson type. Adjacent to the first projection lens 250 is a second projection lens 260, which is combined or successively having a first subsystem 260a of the Dyson type and a second purely refractive subsystem 260b, so that the second projection system 260 in construction corresponds to the projection objective 210 of FIG.

The arrangements according to FIGS. 15 and 16 can each be continued analogously along a respective row of projection objectives 20 according to FIG. 1, so that a further saving in construction space results from relatively larger subsystems or their optical elements besides relatively smaller ones Subsystems or their optical elements are arranged, resulting in an overall space-saving arrangement or a larger space utilization (for example, compared to a structure in which, for example, the large concave mirrors from different Offner systems 230a, 240b are arranged in adjacent projection lenses side by side) ,

According to a further aspect of the invention illustrated in FIGS. 17 and 18, the projection objectives in a projection exposure apparatus according to the invention can also be arranged in three (instead of two) rows, wherein in turn the projection objectives in the two outer rows are preferably arranged such that according to FIG 17 the generated image fields along two concave ones

Curves A and B are arranged, between which then lie the image fields generated by the projection lenses in the middle row, again according to FIG. 17 in a staggered arrangement such that the image fields 60 generated during the scanning process match and overlap one another. Such an embodiment has the further advantage that due to the three-row arrangement for a given overall size during the scanning process exposed fields in the substrate plane, the image fields generated by the individual projection lenses may be smaller than approximately in a double-row arrangement, as more image fields are joined or overlapped during the scanning process. As a result, the individual projection lenses can in turn have smaller optical elements, so that better space utilization can be achieved, in particular in connection with the previously described arrangements (eg, according to FIGS. 15 and 16).

A (merely exemplary and non-limiting) construction of three projection lenses (arranged along the dashed line as viewed from the direction "aa" of Fig. 17) is shown in Fig. 18. Thus, for the projection objectives 300, the image fields are formed on the middle one Curve "C" purely refractive systems are used, which according to FIG. 18, for example a first subsystem 300a of a first positive group 301 and a second positive group 302, and a second subsystem 300bb of a first positive group 303 and a second positive group 304, between which an intermediate image is generated. For the projection lenses for generating the image fields on the outer (curved) curves "A" and "B" projection lenses come with the structure of explained in connection with FIG

Projection lens 180 are used, in each of which two partial systems 180a and 180b, each of the Dyson type, are combined or arranged successively, between which an intermediate image is formed.

In accordance with a further aspect of the present invention, a modification of the scanning process explained with reference to FIG Projection exposure system can be used, that can be dispensed with a movable mask holder and even on movable components in the mask or Retikelebene. According to this aspect of the invention so-called "DMD's" (digital micromirror device = DMD, also: deformable micromirror device) is used instead of conventional masks, which in a conventional manner, a matrix-like arrangement of a plurality of each of have an axis rotatable micromirrors, by the electronic

Depending on the reflection direction of the respective mirror, the light can be selectively coupled into or out of the beam path of the objective so that an electronically controlled modulation of the light coupled into the objective (which is otherwise achieved, for example, by chromium coating on a conventional reticle) is achieved ,

In addition to the possible omission of a movable reticle plane or platform, the concomitant reduced adjustment effort and the avoidance of the complex process of mask production, the use of DMD's in the projection exposure apparatuses according to the invention has the further advantage that for the production of the positive AbbildungsmaßStabes or The upright image orientation can be dispensed with the production of intermediate images, since the correct orientation of the images on the use of the DMD 's electronically controlled in the desired manner. Also according to this aspect, the plurality of projection lenses are arranged so that the generated image fields are arranged along a plurality of rows. This may in particular be both two rows (analogous to FIG. 2) and three rows (analogous to FIG. 17), these two rows (or, in the case of three rows according to FIG Fig. 17, the two outer rows) again preferably have the shape of concave curves in order to achieve the above-described advantageous enlargement of the available space.

However, the aforementioned advantages of using the DMDs are also achieved in the case of a linear arrangement of the projection objectives. According to a further aspect of the present application, this therefore also generally relates to a projection exposure apparatus having a

A plurality of projection objectives in which at least one MEMS (= "microelectromechanical system"), in particular a DMD, is used to generate an object field to be imaged by the projection objectives.

FIGS. 19-24 show different embodiments of imaging systems with the use of DMDs, which differ in particular with regard to the coupling of the illumination light.

According to FIG. 19a, in an imaging system 400, the illumination light generated by a light source 401 with illumination optics 402 is coupled in via a beam splitter cube 403, which directs the light reflected at its partially transmissive layer 404 to the DMD 405, from where that on the DMD structure according to FIG electronic control reflected light after passing through the partially transparent layer 404 enters a lens 406. According to FIG. 19b, the light coming from the light source 401 and the illumination optics 402 can also initially be deflected at a tilt mirror 407. Another possible arrangement of an imaging system 410 with light source 411, illumination optics 412,

Beam splitter cube 413 with semitransparent layer 414 and DMD 415 is shown in FIG. 20, where the light coming from the DMD 415, after passing through the beam splitter cube 413, passes through a refractive group 416 and two plane mirror surfaces 417, 418, between which an intermediate image is produced. A folding mirror 419 folds the beam path to the image plane. The generation of an intermediate image is not necessary according to the above explanations, since as a result of the use of the DMD, the correct orientation of the images can be controlled electronically in the desired manner.

Another possible arrangement of an imaging system 420 with light source 421, illumination optics 422,

Beam splitter cube 423 with semitransparent layer 424 and DMD 425 is shown in FIG. 21, wherein the beam path after the beam splitter cube 423 includes a positive lens group 424, a negative lens group 425 and a concave mirror 426 and a folding mirror 427.

Another possible arrangement of an imaging system 430 with light source 431, illumination optics 432, beam splitter cube 433 with semitransparent layer 434, and DMD 435 is shown in FIG

Lens group 436 between the beam splitter cube 433 and DMD 435 and another positive lens group 437 between the beam splitter cube 433 and the image plane are arranged. In this configuration, the positive lens group 436 forms both a part of the illumination system and a part of the projection lens, since they are from both the DMD 435 and the DMD 435 coming rays is going through. The lighting is coupled close to the pupil in the lens.

FIGS. 23 and 24 show imaging systems 440 and 450 without beam splitter cube, in which the illumination light is coupled obliquely into the DMD (directly according to FIG. 23 or via a folding mirror 453 according to FIG. 24) before it has been reflected on the DMD 443 and 454 respectively passes through the respective projection objective 444 or 455.

In a further embodiment, the object to be imaged can also be composed of several DMDs. In order not to bring the edges of the DMD 's here in appearance, an optical composition of the field segments by means of additional systems. FIG. 25 schematically shows an arrangement 500 in which, for example, three segments can be combined which correspond to three different DMDs 501, 502 and 503. The illumination of the DMDs 501, 502 and 503 occurs from a light source 508 via a common illumination optic 504 and is coupled by means of a beam splitter cube 505 into a positive lens group 506, after which the three segments are merged representing the three different DMDs 501 , 502 and 503 respectively. The merged segments are mapped either directly or as shown in FIG. 25 via a projection objective 507 onto the substrate plane or the wafer. Of course, the number of three DMD 's is merely exemplary, so that two or more than three DMD' s can be combined in an analogous manner.

Also according to this aspect, the plurality of

Imaging systems or projection lenses arranged so the generated image fields are arranged along several rows. A schematic perspective view of the structure of a corresponding

Projection exposure apparatus 600 is shown in FIG. 26, wherein the illumination optics 601 with light sources 602 as well as the DMDs 603 and the projection objectives 604 have the relative arrangements shown in FIG.

The arrangement in rows can again in particular both in two rows (analogous to FIG. 2) and in three rows

(analogous to FIG. 17), these two rows (or, in the case of three rows according to FIG. 17, the two outer rows) again preferably having the shape of concave curves in order to achieve the advantageous enlargement of the available one described above To achieve space.

While the invention has been described in terms of specific embodiments, numerous variations and alternative embodiments, e.g. by combination and / or exchange of features of individual embodiments. Accordingly, it will be understood by those skilled in the art that such variations and alternative embodiments are intended to be embraced by the present invention, and the scope of the invention is limited only in terms of the appended claims and their equivalents.

Claims

claims

1. projection exposure system (1), with

• at least two projection lenses (20), each of which has an object field (50) in an image field

(60, 60 ', 60 ");

Wherein these image fields (60, 60 ', 60' ') in a substrate region (40) are arranged in a substrate plane, wherein the substrate region (40) in a predetermined scanning direction (S) relative to the

A plurality of projection lenses (20) is movable;

• where at least one of these projection lenses

(20) has a portion of its optical axis which is not perpendicular to the

Substrate level runs; and

• wherein the projection (pi-p?) Of this subsection in the substrate plane is not parallel to the scanning direction (S).

2. Projection exposure system according to claim 1, characterized in that the angle between this projection (pi-p?) And the scanning direction in terms of magnitude greater than 2 °, preferably greater than 3 °, and more preferably greater than 4 °.

3. Projection exposure apparatus according to claim 1 or 2, characterized in that an angle between two such projections (pi-p _? ) Of different projection lenses in terms of magnitude greater than 2 °, preferably greater than 3 °, and more preferably greater than 4 °.

4. projection exposure system (1), with

(60, 60 ', 60 "); these image fields (60, 60', 60") being in one

Substrate region (40) are arranged, which in a predetermined scanning direction (S) relative to the plurality of projection lenses (20) is movable; Wherein at least one of these image fields (60, 60 ',

60 '') is limited by a plurality of rectilinear side lines such that the normal (γl-γ7) on the longest of these side lines is not parallel to the scanning direction (S).

5. Projection exposure apparatus according to claim 4, characterized in that the angle between these normals and the scanning direction (S) in terms of magnitude greater than 2 °, preferably greater than 3 °, and more preferably greater than 4 °.

6. Projection exposure apparatus according to claim 4 or 5, characterized in that the angle between at least two such normals of different image fields in terms of magnitude greater than 2 °, preferably greater than 3 °, and more preferably greater than 4 °.

7. projection exposure apparatus (1), comprising • at least two projection objectives (20), each of which images an object field (50) into an image field (60, 60 ', 60 ");

• these image fields (60, 60 ', 60 ") in one Substrate region (40) are arranged, which in a predetermined scanning direction (S) relative to the plurality of projection lenses (20) is movable; • each of these image fields (60, 60 ', 60'') a

Having a plurality of vertices; and

• wherein the image fields (60, 60 ', 60' ') are arranged such that the longest occurring connecting line (dl-d7) between two vertices in one of these image fields not parallel to the longest connecting line (dl-d7) between two vertices in the other of these frames is.

8. Projection exposure apparatus according to claim 7, characterized in that the angle between these connecting lines in terms of magnitude greater than 2 °, preferably greater than 3 °, and more preferably greater than 4 °.

9. projection exposure system (1), with

• a plurality of projection lenses (20), each of which has an object field (50) in an image field

(60); • these image fields (60) in one

Substrate region (40) are arranged, which in a predetermined scanning direction (S) relative to the plurality of projection lenses (20) is movable; and • wherein at least three image fields (60) arranged successively transversely to the scanning direction lie on a nonlinear curve (A, B).

10. Projection exposure system (1), with

(60, 60 ', 60 "); these image fields (60, 60', 60") being in one

Substrate region (40) are arranged, which is movable in a predetermined scanning direction (S) relative to the plurality of projection lenses (20) during a scanning process; These image fields (60, 60 ', 60 ") being arranged in at least two groups extending in each case transversely to the scan direction such that image fields of one group are offset with respect to image fields of the other group transversely to the scan direction; and

• wherein these image fields (60, 60 ', 60' ') of at least one of the groups along a non-linear curves (A, B) are arranged.

11. A projection exposure apparatus according to claim 10, characterized in that the image fields (60, 60 ', 60' ') of both groups along non-linearly extending curves (A, B) are arranged.

12, projection exposure apparatus according to claim 11, characterized in that the first non-linear curve (A) and the second non-linear curve are concavely curved relative to each other.

13. A projection exposure apparatus according to claim 11 or 12, characterized in that the plurality of projection lenses (20) further comprises: - a third group of projection lenses (20), which generates a third group of image fields (60, 60 ', 60'') arranged with respect to the scanning direction between the first nonlinear curve (A) and the second nonlinear curve (B).

14. A projection exposure apparatus according to claim 13, characterized in that the image fields (60, 60 ', 60' ') of the third group of image fields along a straight line are arranged transversely to the scanning direction.

15. Projection exposure apparatus according to one of claims 11 to 14, characterized in that the first non-linear curve (A) and the second non-linear curve (B) are arranged to each other mirror symmetry.

16 projection exposure apparatus according to one of claims 11 to 15, characterized in that the first non-linear curve (A) and the second non-linear curve (B) each have the shape of a circle segment.

17. Projection exposure system according to one of claims 13 to 16, characterized in that the image fields (60, 60 ', 60' ') of the third group of image fields (60) are respectively generated by a projection objective (300), which has a purely refractive structure having.

18. Projection exposure apparatus according to one of the preceding claims, characterized in that form in at least some of the projection lenses, the optical axes of all subsystems of the respective projection lens a uniform optical axis of this projection lens.

19. A projection exposure apparatus according to one of the preceding claims, characterized in that at least some of the projection lenses have a first subsystem (210a, 220a) and at least one second subsystem (210b, 220b), wherein the first subsystem (210a, 220a) is a catadioptric subsystem and the second subsystem (210b, 220b) is a purely refractive subsystem.

20. Projection exposure system according to claim 19, characterized in that the optical axes of the two subsystems are offset parallel to each other.

21. The projection exposure apparatus as claimed in claim 20, characterized in that the intermediate image generated by the first subsystem (210a, 220a) is arranged centrically to the optical axis of the second subsystem (210b, 220b).

22. Projection exposure system according to one of the preceding claims, characterized in that the projection lenses (20) each have the same structure.

23. Projection exposure system according to one of the preceding claims, characterized in that adjacent projection lenses (230, 240, 250, 260) have an inverted arrangement of their optical elements.

24. Projection exposure apparatus according to one of the preceding claims, characterized in that the projection objectives (20) have a magnification β = 1.

25. Projection exposure system according to one of the preceding claims, characterized in that at least one of the projection lenses (20) has no folding mirror.

26. Projection exposure system according to one of the preceding claims, characterized in that at least one of the projection lenses (20) generates at least one intermediate image.

27. A projection exposure apparatus according to claim 26, characterized in that at least one of

Projection objectives (20) generates an odd number of intermediate images.

28. Projection exposure system according to one of the preceding claims, characterized in that at least one of the projection lenses has at least one catadioptric subsystem with at least one concave mirror.

29. Projection exposure system according to one of the preceding claims, characterized in that at least one of the projection lenses (140, 150, 160) has at least one roof prism (141, 151, 164) or a roof edge mirror arrangement (171-174).

30. Projection exposure system according to one of the preceding claims, characterized in that at least one of the projection lenses at least comprises an Offner-type subsystem.

31. A projection exposure apparatus according to one of the preceding claims, characterized in that at least one of the projection lenses has at least one subsystem of the Dyson type.

32. Projection exposure apparatus according to one of the preceding claims, characterized in that at least one of the projection lenses has at least one subsystem of the Offner type and at least one subsystem of the Dyson type.

33. The projection exposure apparatus according to one of the preceding claims, characterized in that a first projection objective (230) comprises a first subsystem (230a) of the Offner type and a second subsystem (230b) of the Dyson type, and a second projection objective adjacent to the first projection objective (240) a first subsystem (240a) of the Dyson type adjacent the first subsystem (230a) of the first projection lens (230) and an offer second subsystem (240b) adjacent the second subsystem (230b) of the first projection lens (230) having.

34. The projection exposure apparatus according to one of the preceding claims, characterized in that a first projection objective has a first subsystem of the offner type and a second purely refractive subsystem, and a first projection objective adjacent second projection objective a the first subsystem of the first projection lens adjacent the first purely refractive subsystem and a second subsystem of the first projection lens adjacent to the second subsystem Offner-type.

35. Projection exposure apparatus according to one of the preceding claims, characterized in that a first projection objective (260) comprises a first subsystem (260a) of the Dyson type and a second purely refractive subsystem (260b), and a second projection lens (260) adjacent to the second Projection objective (250) has a first purely refractive subsystem (250a) adjacent to the first subsystem (260a) of the first projection objective (260) and a second subsystem (250b) of the Dyson type adjacent to the second subsystem (260b) of the first projection objective (260) ,

36. Projection exposure system according to one of the preceding claims, characterized in that at least one of the projection lenses has two subsystems of Offner type, between which an intermediate image is generated.

37. Projection exposure apparatus according to one of the preceding claims, characterized in that at least one of the projection lenses has two subsystems of Dyson type, between which an intermediate image is generated.

38. Projection exposure system (1), with

• a plurality of projection lenses (20), each of which has an object field (50) in an image field (60);

• wherein the image fields (60) in a substrate area

(40) are arranged, which in a predetermined scanning direction (S) relative to the plurality of projection lenses (20) is movable; and

Wherein at least one of the projection lenses has a first subsystem (210a, 220a) and at least one second subsystem (210b, 220b); Wherein the first subsystem (210a, 220a) is a catadioptric subsystem and the second subsystem (210b, 220b) is a purely refractive subsystem.

39. Projection exposure system according to claim 38, characterized in that the optical axes of the two subsystems are offset parallel to each other.

40. The projection exposure apparatus as claimed in claim 39, characterized in that the intermediate image generated by the first subsystem (210a, 220a) is arranged centrally relative to the optical axis of the second subsystem (210b, 220b).

41. Projection exposure apparatus according to one of the preceding claims, characterized in that the object fields (50) are arranged in a reticle region (30) which is movable in the predetermined scanning direction relative to the plurality of projection objectives (20).

42. Projection exposure system according to one of claims 1 to 40, characterized in that the object fields (50) are arranged at a fixed position relative to the plurality of projection lenses (20).

43. Projection exposure apparatus according to claim 42, characterized in that in at least one of

Object fields a pattern to be imaged by a projection lens by a microelectronic-mechanical system (MEMS) can be generated.

44. Projection exposure apparatus according to claim 43, characterized in that the microelectronic-mechanical system (MEMS) has at least one digital micromirror device (DMD).

45. The projection exposure apparatus according to claim 44, characterized in that in at least one of the object fields a pattern to be imaged by a projection objective is generated by a plurality of DMDs.

46. The projection exposure apparatus as claimed in claim 45, characterized in that the patterns generated by the plurality of DMDs are combined to form a common object field.

47. Projection exposure apparatus according to one of the preceding claims, characterized in that it is designed for a working wavelength of less than 250 nm, preferably less than 200 nm and more preferably less than 160 nm.

48. Projection exposure system, with

• a plurality of projection lenses (20), from each of which images an object field (50) into an image field (60);

Wherein these image fields (60) are arranged in a substrate region (40), which in a predetermined scanning direction relative to the

A plurality of projection lenses (20) is movable; and

• wherein the object fields (50) relative to the plurality of projection lenses (20) are arranged at a fixed position.

49. Projection exposure apparatus according to claim 48, characterized in that in the object fields (50) each by a projection lens (20) to be imaged pattern by a microelectronic-mechanical system (MEMS) can be generated.

50. The projection exposure apparatus as claimed in claim 49, characterized in that the microelectronic-mechanical system (MEMS) has at least one digital micromirror device (DMD).

51. A method for the microlithographic production of microstructured components, the method comprising the following steps:

Providing a substrate (40) on which a layer of a photosensitive material is at least partially applied;

Providing a mask area (30) having structures to be imaged;

Providing a projection exposure apparatus according to any one of claims 1 to 50; Projecting at least a portion of the mask area (30) onto a portion of the layer using the projection exposure apparatus.

52. A method for the microlithographic production of microstructured components, the method comprising the following steps:

Generating an object field using at least one digital micromirror device (DMD);

Providing a projection exposure apparatus according to one of the preceding claims; and projecting at least part of the object field onto a region of the layer with the aid of the projection exposure apparatus.

53. A microstructured device fabricated using a method according to claim 51 or 52.

54. LCD device, characterized in that it is manufactured using a method according to claim 51 or 52.

55. Fiat panel display, characterized in that it is manufactured using a method according to claim 51 or 52.