WO2007046820A3 - Interferometric analysis for the manufacture of nano-scale devices - Google Patents

Interferometric analysis for the manufacture of nano-scale devices Download PDF

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Publication number
WO2007046820A3
WO2007046820A3 PCT/US2005/042638 US2005042638W WO2007046820A3 WO 2007046820 A3 WO2007046820 A3 WO 2007046820A3 US 2005042638 W US2005042638 W US 2005042638W WO 2007046820 A3 WO2007046820 A3 WO 2007046820A3
Authority
WO
WIPO (PCT)
Prior art keywords
nano
manufacture
relative
scale devices
interferometric analysis
Prior art date
Application number
PCT/US2005/042638
Other languages
French (fr)
Other versions
WO2007046820A2 (en
Inventor
Pawan K Nimmakayala
Tom H Rafferty
Alireza Aghili
Byung-Jin Choi
Philip D Schumaker
Daniel A Babbs
Van N Truskett
Original Assignee
Molecular Imprints Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/000,321 external-priority patent/US7630067B2/en
Application filed by Molecular Imprints Inc filed Critical Molecular Imprints Inc
Priority to KR1020077012811A priority Critical patent/KR101299473B1/en
Priority to JP2007543499A priority patent/JP5198070B2/en
Priority to CN2005800407515A priority patent/CN101115971B/en
Priority to EP05858633.0A priority patent/EP1817545B1/en
Publication of WO2007046820A2 publication Critical patent/WO2007046820A2/en
Publication of WO2007046820A3 publication Critical patent/WO2007046820A3/en

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01CMEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C3/00Measuring distances in line of sight; Optical rangefinders
    • G01C3/02Details
    • G01C3/06Use of electric means to obtain final indication
    • G01C3/08Use of electric radiation detectors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01CMEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C3/00Measuring distances in line of sight; Optical rangefinders
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003Alignment type or strategy, e.g. leveling, global alignment
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/703Gap setting, e.g. in proximity printer
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7042Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049Technique, e.g. interferometric
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073Alignment marks and their environment
    • G03F9/7076Mark details, e.g. phase grating mark, temporary mark
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y35/00Methods or apparatus for measurement or analysis of nanostructures

Abstract

The present invention features a system and method to determine relative spatial parameters between two coordinate systems, which may be a mold and a region of a substrate in which mold is employed to generate a pattern. To that end, relative alignment between the two coordinate systems at multiple points is sensed to determine relative spatial parameters therebetween. The relative spatial parameters include a relative area and a relative shape.
PCT/US2005/042638 2004-11-30 2005-11-21 Interferometric analysis for the manufacture of nano-scale devices WO2007046820A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1020077012811A KR101299473B1 (en) 2004-11-30 2005-11-21 Interferometric analysis for the manufacture of nano-scale devices
JP2007543499A JP5198070B2 (en) 2004-11-30 2005-11-21 Interference analysis to produce nanoscale devices
CN2005800407515A CN101115971B (en) 2004-11-30 2005-11-21 Interferometric analysis for the manufacture of nano-scale devices
EP05858633.0A EP1817545B1 (en) 2004-11-30 2005-11-21 Interferometric analysis for the manufacture of nano-scale devices

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US11/000,321 2004-11-30
US11/000,331 2004-11-30
US11/000,331 US7292326B2 (en) 2004-11-30 2004-11-30 Interferometric analysis for the manufacture of nano-scale devices
US11/000,321 US7630067B2 (en) 2004-11-30 2004-11-30 Interferometric analysis method for the manufacture of nano-scale devices

Publications (2)

Publication Number Publication Date
WO2007046820A2 WO2007046820A2 (en) 2007-04-26
WO2007046820A3 true WO2007046820A3 (en) 2007-10-18

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2005/042638 WO2007046820A2 (en) 2004-11-30 2005-11-21 Interferometric analysis for the manufacture of nano-scale devices

Country Status (5)

Country Link
US (1) US7292326B2 (en)
EP (1) EP1817545B1 (en)
KR (1) KR101299473B1 (en)
CN (1) CN101115971B (en)
WO (1) WO2007046820A2 (en)

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US7292326B2 (en) 2007-11-06
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WO2007046820A2 (en) 2007-04-26
EP1817545B1 (en) 2017-08-09
CN101115971B (en) 2013-05-08
KR101299473B1 (en) 2013-08-29
US20060126058A1 (en) 2006-06-15
EP1817545A4 (en) 2010-12-22
CN101115971A (en) 2008-01-30

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