US718834A
(en)
*
|
1902-08-14 |
1903-01-20 |
Guy T Godfrey |
Trap for catching fleas.
|
JPS51135276A
(en)
*
|
1975-05-12 |
1976-11-24 |
Kawaguchiko Seimitsu Kk |
Insect capturing device
|
US4117624A
(en)
*
|
1977-07-25 |
1978-10-03 |
Pestolite, Inc. |
Insect trap
|
US4438584A
(en)
*
|
1979-06-29 |
1984-03-27 |
J. T. Eaton & Company, Inc. |
Trap for rats, mice, and other vermin
|
US4346164A
(en)
*
|
1980-10-06 |
1982-08-24 |
Werner Tabarelli |
Photolithographic method for the manufacture of integrated circuits
|
US5046280A
(en)
*
|
1989-04-19 |
1991-09-10 |
E. I. Du Pont De Nemours & Company |
Device for killing insects
|
US4959924A
(en)
*
|
1989-04-05 |
1990-10-02 |
S. C. Johnson & Son, Inc. |
Insect bait station
|
US5231790A
(en)
*
|
1992-06-16 |
1993-08-03 |
Kansas State University Research Foundation |
Flea trap
|
JP2753930B2
(en)
*
|
1992-11-27 |
1998-05-20 |
キヤノン株式会社 |
Immersion type projection exposure equipment
|
US5528049A
(en)
*
|
1993-09-15 |
1996-06-18 |
Fox Investment Company |
Frequency emitter for control of insects
|
EP0737033A4
(en)
*
|
1993-12-17 |
1997-01-15 |
Johnson & Son Inc S C |
Flea trap
|
US5513465A
(en)
*
|
1993-12-17 |
1996-05-07 |
S. C. Johnson & Son, Inc. |
Method and apparatus for catching insects
|
JPH08316124A
(en)
*
|
1995-05-19 |
1996-11-29 |
Hitachi Ltd |
Method and apparatus for projection exposing
|
US5896695A
(en)
*
|
1996-07-01 |
1999-04-27 |
Walker; Robert T. |
Device for controlling crawling or flying insects
|
US5825043A
(en)
*
|
1996-10-07 |
1998-10-20 |
Nikon Precision Inc. |
Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus
|
US5950355A
(en)
*
|
1997-04-03 |
1999-09-14 |
Gilbert Industries |
Flying insect trap with decorative frame mount
|
US5915948A
(en)
*
|
1997-05-28 |
1999-06-29 |
Waterbury Companies, Inc. |
Insect attractant device
|
AU730886B2
(en)
*
|
1997-08-25 |
2001-03-15 |
Earth Chemical Co. Ltd. |
Method for catching flea and apparatus for catching flea
|
US6023896A
(en)
*
|
1998-08-24 |
2000-02-15 |
Finish Group Ltd. |
Modular partition systems and methods for assembling such systems
|
US6202341B1
(en)
*
|
1998-12-11 |
2001-03-20 |
Alan Bernard |
Reusable pesticide bait station
|
US6995930B2
(en)
*
|
1999-12-29 |
2006-02-07 |
Carl Zeiss Smt Ag |
Catadioptric projection objective with geometric beam splitting
|
US7187503B2
(en)
*
|
1999-12-29 |
2007-03-06 |
Carl Zeiss Smt Ag |
Refractive projection objective for immersion lithography
|
US6397515B1
(en)
*
|
2000-01-21 |
2002-06-04 |
Jeffrey K. Brown |
Electronic fly trap
|
US6393759B1
(en)
*
|
2000-01-21 |
2002-05-28 |
Jeffrey K. Brown |
Electronic fly trap apparatus with cover
|
US6871443B2
(en)
*
|
2000-04-28 |
2005-03-29 |
Paraclipse, Inc. |
Flying insect trap
|
KR100866818B1
(en)
*
|
2000-12-11 |
2008-11-04 |
가부시키가이샤 니콘 |
Projection optical system and exposure apparatus comprising the same
|
DE10229818A1
(en)
*
|
2002-06-28 |
2004-01-15 |
Carl Zeiss Smt Ag |
Focus detection method and imaging system with focus detection system
|
US7092069B2
(en)
*
|
2002-03-08 |
2006-08-15 |
Carl Zeiss Smt Ag |
Projection exposure method and projection exposure system
|
DE10210899A1
(en)
*
|
2002-03-08 |
2003-09-18 |
Zeiss Carl Smt Ag |
Refractive projection lens for immersion lithography
|
US6988326B2
(en)
*
|
2002-09-30 |
2006-01-24 |
Lam Research Corporation |
Phobic barrier meniscus separation and containment
|
US6954993B1
(en)
*
|
2002-09-30 |
2005-10-18 |
Lam Research Corporation |
Concentric proximity processing head
|
US7383843B2
(en)
*
|
2002-09-30 |
2008-06-10 |
Lam Research Corporation |
Method and apparatus for processing wafer surfaces using thin, high velocity fluid layer
|
US6788477B2
(en)
*
|
2002-10-22 |
2004-09-07 |
Taiwan Semiconductor Manufacturing Co., Ltd. |
Apparatus for method for immersion lithography
|
CN101713932B
(en)
*
|
2002-11-12 |
2012-09-26 |
Asml荷兰有限公司 |
Lithographic apparatus and device manufacturing method
|
SG121822A1
(en)
*
|
2002-11-12 |
2006-05-26 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
DE60335595D1
(en)
*
|
2002-11-12 |
2011-02-17 |
Asml Netherlands Bv |
Immersion lithographic apparatus and method of making a device
|
CN101470360B
(en)
*
|
2002-11-12 |
2013-07-24 |
Asml荷兰有限公司 |
Immersion lithographic apparatus and device manufacturing method
|
US7110081B2
(en)
*
|
2002-11-12 |
2006-09-19 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
SG121818A1
(en)
*
|
2002-11-12 |
2006-05-26 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
DE10253679A1
(en)
*
|
2002-11-18 |
2004-06-03 |
Infineon Technologies Ag |
Optical arrangement used in the production of semiconductor components comprises a lens system arranged behind a mask, and a medium having a specified refractive index lying between the mask and the lens system
|
SG131766A1
(en)
*
|
2002-11-18 |
2007-05-28 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
DE10258718A1
(en)
*
|
2002-12-09 |
2004-06-24 |
Carl Zeiss Smt Ag |
Projection lens, in particular for microlithography, and method for tuning a projection lens
|
US6992750B2
(en)
*
|
2002-12-10 |
2006-01-31 |
Canon Kabushiki Kaisha |
Exposure apparatus and method
|
US7010958B2
(en)
*
|
2002-12-19 |
2006-03-14 |
Asml Holding N.V. |
High-resolution gas gauge proximity sensor
|
US6781670B2
(en)
*
|
2002-12-30 |
2004-08-24 |
Intel Corporation |
Immersion lithography
|
US7090964B2
(en)
*
|
2003-02-21 |
2006-08-15 |
Asml Holding N.V. |
Lithographic printing with polarized light
|
US6943941B2
(en)
*
|
2003-02-27 |
2005-09-13 |
Asml Netherlands B.V. |
Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems
|
US7029832B2
(en)
*
|
2003-03-11 |
2006-04-18 |
Samsung Electronics Co., Ltd. |
Immersion lithography methods using carbon dioxide
|
TWI295414B
(en)
*
|
2003-05-13 |
2008-04-01 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
TWI347741B
(en)
*
|
2003-05-30 |
2011-08-21 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
US7684008B2
(en)
*
|
2003-06-11 |
2010-03-23 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
JP2005019616A
(en)
*
|
2003-06-25 |
2005-01-20 |
Canon Inc |
Immersion type exposure apparatus
|
JP4343597B2
(en)
*
|
2003-06-25 |
2009-10-14 |
キヤノン株式会社 |
Exposure apparatus and device manufacturing method
|
EP1498778A1
(en)
*
|
2003-06-27 |
2005-01-19 |
ASML Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
DE60308161T2
(en)
*
|
2003-06-27 |
2007-08-09 |
Asml Netherlands B.V. |
Lithographic apparatus and method for making an article
|
EP1494074A1
(en)
*
|
2003-06-30 |
2005-01-05 |
ASML Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
SG109000A1
(en)
*
|
2003-07-16 |
2005-02-28 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
EP1500982A1
(en)
*
|
2003-07-24 |
2005-01-26 |
ASML Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7175968B2
(en)
*
|
2003-07-28 |
2007-02-13 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and a substrate
|
US7326522B2
(en)
*
|
2004-02-11 |
2008-02-05 |
Asml Netherlands B.V. |
Device manufacturing method and a substrate
|
EP1503244A1
(en)
*
|
2003-07-28 |
2005-02-02 |
ASML Netherlands B.V. |
Lithographic projection apparatus and device manufacturing method
|
US7779781B2
(en)
*
|
2003-07-31 |
2010-08-24 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7145643B2
(en)
*
|
2003-08-07 |
2006-12-05 |
Asml Netherlands B.V. |
Interface unit, lithographic projection apparatus comprising such an interface unit and a device manufacturing method
|
US7700267B2
(en)
*
|
2003-08-11 |
2010-04-20 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Immersion fluid for immersion lithography, and method of performing immersion lithography
|
US7579135B2
(en)
*
|
2003-08-11 |
2009-08-25 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Lithography apparatus for manufacture of integrated circuits
|
US7061578B2
(en)
*
|
2003-08-11 |
2006-06-13 |
Advanced Micro Devices, Inc. |
Method and apparatus for monitoring and controlling imaging in immersion lithography systems
|
US7085075B2
(en)
*
|
2003-08-12 |
2006-08-01 |
Carl Zeiss Smt Ag |
Projection objectives including a plurality of mirrors with lenses ahead of mirror M3
|
US7070915B2
(en)
*
|
2003-08-29 |
2006-07-04 |
Tokyo Electron Limited |
Method and system for drying a substrate
|
US6954256B2
(en)
*
|
2003-08-29 |
2005-10-11 |
Asml Netherlands B.V. |
Gradient immersion lithography
|
TWI245163B
(en)
*
|
2003-08-29 |
2005-12-11 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
TWI263859B
(en)
*
|
2003-08-29 |
2006-10-11 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
US7014966B2
(en)
*
|
2003-09-02 |
2006-03-21 |
Advanced Micro Devices, Inc. |
Method and apparatus for elimination of bubbles in immersion medium in immersion lithography systems
|
JP3870182B2
(en)
*
|
2003-09-09 |
2007-01-17 |
キヤノン株式会社 |
Exposure apparatus and device manufacturing method
|
US6961186B2
(en)
*
|
2003-09-26 |
2005-11-01 |
Takumi Technology Corp. |
Contact printing using a magnified mask image
|
EP1519231B1
(en)
*
|
2003-09-29 |
2005-12-21 |
ASML Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
EP1519230A1
(en)
*
|
2003-09-29 |
2005-03-30 |
ASML Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7369217B2
(en)
*
|
2003-10-03 |
2008-05-06 |
Micronic Laser Systems Ab |
Method and device for immersion lithography
|
JP2005136374A
(en)
*
|
2003-10-06 |
2005-05-26 |
Matsushita Electric Ind Co Ltd |
Semiconductor manufacturing apparatus and pattern formation method using the same
|
US7678527B2
(en)
*
|
2003-10-16 |
2010-03-16 |
Intel Corporation |
Methods and compositions for providing photoresist with improved properties for contacting liquids
|
US7924397B2
(en)
*
|
2003-11-06 |
2011-04-12 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Anti-corrosion layer on objective lens for liquid immersion lithography applications
|
US7545481B2
(en)
*
|
2003-11-24 |
2009-06-09 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7125652B2
(en)
*
|
2003-12-03 |
2006-10-24 |
Advanced Micro Devices, Inc. |
Immersion lithographic process using a conforming immersion medium
|
US20050185269A1
(en)
*
|
2003-12-19 |
2005-08-25 |
Carl Zeiss Smt Ag |
Catadioptric projection objective with geometric beam splitting
|
US7394521B2
(en)
*
|
2003-12-23 |
2008-07-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7589818B2
(en)
*
|
2003-12-23 |
2009-09-15 |
Asml Netherlands B.V. |
Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus
|
US20050147920A1
(en)
*
|
2003-12-30 |
2005-07-07 |
Chia-Hui Lin |
Method and system for immersion lithography
|
US7088422B2
(en)
*
|
2003-12-31 |
2006-08-08 |
International Business Machines Corporation |
Moving lens for immersion optical lithography
|
JP4371822B2
(en)
*
|
2004-01-06 |
2009-11-25 |
キヤノン株式会社 |
Exposure equipment
|
JP4429023B2
(en)
*
|
2004-01-07 |
2010-03-10 |
キヤノン株式会社 |
Exposure apparatus and device manufacturing method
|
US20050153424A1
(en)
*
|
2004-01-08 |
2005-07-14 |
Derek Coon |
Fluid barrier with transparent areas for immersion lithography
|
KR101407204B1
(en)
*
|
2004-01-14 |
2014-06-13 |
칼 짜이스 에스엠티 게엠베하 |
Projection objective
|
US7026259B2
(en)
*
|
2004-01-21 |
2006-04-11 |
International Business Machines Corporation |
Liquid-filled balloons for immersion lithography
|
US7391501B2
(en)
*
|
2004-01-22 |
2008-06-24 |
Intel Corporation |
Immersion liquids with siloxane polymer for immersion lithography
|
US7050146B2
(en)
*
|
2004-02-09 |
2006-05-23 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US20050205108A1
(en)
*
|
2004-03-16 |
2005-09-22 |
Taiwan Semiconductor Manufacturing Co., Ltd. |
Method and system for immersion lithography lens cleaning
|
US7027125B2
(en)
*
|
2004-03-25 |
2006-04-11 |
International Business Machines Corporation |
System and apparatus for photolithography
|
US7084960B2
(en)
*
|
2004-03-29 |
2006-08-01 |
Intel Corporation |
Lithography using controlled polarization
|