WO2007142865A3 - Thin film photovoltaic structure and fabrication - Google Patents
Thin film photovoltaic structure and fabrication Download PDFInfo
- Publication number
- WO2007142865A3 WO2007142865A3 PCT/US2007/012422 US2007012422W WO2007142865A3 WO 2007142865 A3 WO2007142865 A3 WO 2007142865A3 US 2007012422 W US2007012422 W US 2007012422W WO 2007142865 A3 WO2007142865 A3 WO 2007142865A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- fabrication
- thin film
- film photovoltaic
- layer
- photovoltaic structure
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 239000010409 thin film Substances 0.000 title 1
- 238000004299 exfoliation Methods 0.000 abstract 3
- 239000012212 insulator Substances 0.000 abstract 2
- 239000004065 semiconductor Substances 0.000 abstract 2
- 239000013078 crystal Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/84—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being other than a semiconductor body, e.g. being an insulating body
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C27/00—Joining pieces of glass to pieces of other inorganic material; Joining glass to glass other than by fusing
- C03C27/02—Joining pieces of glass to pieces of other inorganic material; Joining glass to glass other than by fusing by fusing glass directly to metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C27/00—Joining pieces of glass to pieces of other inorganic material; Joining glass to glass other than by fusing
- C03C27/06—Joining glass to glass by processes other than fusing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
- H01L31/0392—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009513192A JP2009539255A (en) | 2006-05-31 | 2007-05-24 | Thin film photovoltaic structure and manufacturing |
EP07809181A EP2022097A2 (en) | 2006-05-31 | 2007-05-24 | Thin film photovoltaic structure and fabrication |
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US81006106P | 2006-05-31 | 2006-05-31 | |
US60/810,061 | 2006-05-31 | ||
US11/511,041 | 2006-08-28 | ||
US11/511,040 | 2006-08-28 | ||
US11/511,040 US20070277874A1 (en) | 2006-05-31 | 2006-08-28 | Thin film photovoltaic structure |
US11/511,041 US20070277875A1 (en) | 2006-05-31 | 2006-08-28 | Thin film photovoltaic structure |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2007142865A2 WO2007142865A2 (en) | 2007-12-13 |
WO2007142865A3 true WO2007142865A3 (en) | 2008-05-08 |
Family
ID=38801981
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2007/012422 WO2007142865A2 (en) | 2006-05-31 | 2007-05-24 | Thin film photovoltaic structure and fabrication |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP2022097A2 (en) |
JP (1) | JP2009539255A (en) |
KR (1) | KR20090028581A (en) |
TW (1) | TW200814341A (en) |
WO (1) | WO2007142865A2 (en) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080070340A1 (en) * | 2006-09-14 | 2008-03-20 | Nicholas Francis Borrelli | Image sensor using thin-film SOI |
EP2075850A3 (en) * | 2007-12-28 | 2011-08-24 | Semiconductor Energy Laboratory Co, Ltd. | Photoelectric conversion device and manufacturing method thereof |
US7967936B2 (en) | 2008-12-15 | 2011-06-28 | Twin Creeks Technologies, Inc. | Methods of transferring a lamina to a receiver element |
SG174289A1 (en) * | 2009-03-20 | 2011-10-28 | Solar Implant Technologies Inc | Advanced high efficiency crystalline solar cell fabrication method |
US20100244108A1 (en) * | 2009-03-31 | 2010-09-30 | Glenn Eric Kohnke | Cmos image sensor on a semiconductor-on-insulator substrate and process for making same |
TW201119019A (en) * | 2009-04-30 | 2011-06-01 | Corning Inc | CMOS image sensor on stacked semiconductor-on-insulator substrate and process for making same |
US8749053B2 (en) | 2009-06-23 | 2014-06-10 | Intevac, Inc. | Plasma grid implant system for use in solar cell fabrications |
EP2721647A2 (en) * | 2011-06-15 | 2014-04-23 | 3M Innovative Properties Company | Solar cell with improved conversion efficiency |
CN104428883B (en) | 2011-11-08 | 2017-02-22 | 因特瓦克公司 | substrate processing system and method |
WO2014100506A1 (en) | 2012-12-19 | 2014-06-26 | Intevac, Inc. | Grid for plasma ion implant |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4152535A (en) * | 1976-07-06 | 1979-05-01 | The Boeing Company | Continuous process for fabricating solar cells and the product produced thereby |
US5395481A (en) * | 1993-10-18 | 1995-03-07 | Regents Of The University Of California | Method for forming silicon on a glass substrate |
JPH114008A (en) * | 1997-06-11 | 1999-01-06 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of thin film solar battery |
EP0926709A2 (en) * | 1997-12-26 | 1999-06-30 | Canon Kabushiki Kaisha | Method of manufacturing an SOI structure |
US6656271B2 (en) * | 1998-12-04 | 2003-12-02 | Canon Kabushiki Kaisha | Method of manufacturing semiconductor wafer method of using and utilizing the same |
US20040197949A1 (en) * | 2003-02-28 | 2004-10-07 | Shohei Hata | Anodic bonding method and electronic device having anodic bonding structure |
US20040229444A1 (en) * | 2003-02-18 | 2004-11-18 | Couillard James G. | Glass-based SOI structures |
US20060234477A1 (en) * | 2005-04-13 | 2006-10-19 | Gadkaree Kishor P | Glass-based semiconductor on insulator structures and methods of making same |
-
2007
- 2007-05-24 WO PCT/US2007/012422 patent/WO2007142865A2/en active Application Filing
- 2007-05-24 KR KR1020087032241A patent/KR20090028581A/en not_active Application Discontinuation
- 2007-05-24 JP JP2009513192A patent/JP2009539255A/en not_active Abandoned
- 2007-05-24 EP EP07809181A patent/EP2022097A2/en not_active Withdrawn
- 2007-05-29 TW TW096119237A patent/TW200814341A/en unknown
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4152535A (en) * | 1976-07-06 | 1979-05-01 | The Boeing Company | Continuous process for fabricating solar cells and the product produced thereby |
US5395481A (en) * | 1993-10-18 | 1995-03-07 | Regents Of The University Of California | Method for forming silicon on a glass substrate |
JPH114008A (en) * | 1997-06-11 | 1999-01-06 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of thin film solar battery |
EP0926709A2 (en) * | 1997-12-26 | 1999-06-30 | Canon Kabushiki Kaisha | Method of manufacturing an SOI structure |
US6656271B2 (en) * | 1998-12-04 | 2003-12-02 | Canon Kabushiki Kaisha | Method of manufacturing semiconductor wafer method of using and utilizing the same |
US20040229444A1 (en) * | 2003-02-18 | 2004-11-18 | Couillard James G. | Glass-based SOI structures |
US20040197949A1 (en) * | 2003-02-28 | 2004-10-07 | Shohei Hata | Anodic bonding method and electronic device having anodic bonding structure |
US20060234477A1 (en) * | 2005-04-13 | 2006-10-19 | Gadkaree Kishor P | Glass-based semiconductor on insulator structures and methods of making same |
Non-Patent Citations (2)
Title |
---|
LEE T-H ET AL: "Semiconductor layer transfer by anodic wafer bonding", SOI CONFERENCE, 1997. PROCEEDINGS., 1997 IEEE INTERNATIONAL FISH CAMP, CA, USA 6-9 OCT. 1997, NEW YORK, NY, USA,IEEE, US, 6 October 1997 (1997-10-06), pages 40 - 41, XP010256194, ISBN: 0-7803-3938-X * |
WHITE P A ET AL: "Direct glassing of silicon solar cells", CONFERENCE PROCEEDINGS ARTICLE, IEEE, 26 September 1988 (1988-09-26), pages 949 - 953, XP010750679 * |
Also Published As
Publication number | Publication date |
---|---|
KR20090028581A (en) | 2009-03-18 |
JP2009539255A (en) | 2009-11-12 |
TW200814341A (en) | 2008-03-16 |
EP2022097A2 (en) | 2009-02-11 |
WO2007142865A2 (en) | 2007-12-13 |
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