WO2007144125A3 - Imaging device - Google Patents

Imaging device Download PDF

Info

Publication number
WO2007144125A3
WO2007144125A3 PCT/EP2007/005127 EP2007005127W WO2007144125A3 WO 2007144125 A3 WO2007144125 A3 WO 2007144125A3 EP 2007005127 W EP2007005127 W EP 2007005127W WO 2007144125 A3 WO2007144125 A3 WO 2007144125A3
Authority
WO
WIPO (PCT)
Prior art keywords
immersion
protective plate
lens
medium
lens system
Prior art date
Application number
PCT/EP2007/005127
Other languages
German (de)
French (fr)
Other versions
WO2007144125A2 (en
Inventor
Karl-Heinz Schuster
Original Assignee
Zeiss Carl Smt Ag
Karl-Heinz Schuster
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag, Karl-Heinz Schuster filed Critical Zeiss Carl Smt Ag
Publication of WO2007144125A2 publication Critical patent/WO2007144125A2/en
Publication of WO2007144125A3 publication Critical patent/WO2007144125A3/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/33—Immersion oils, or microscope systems or objectives for use with immersion fluids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus

Abstract

The invention relates to a lens system or a lens mirror system, in particular a projection objective, for imaging a pattern, in particular an object structure, that is arranged on an object plane of a lens system or the lens mirror system on an image plane of the projection objective with the aid of an immersion medium (2), that is arranged between an optical element (1) of the lens system or the lens mirror system and the image plane. A protective plate (13, 17) is arranged between the lens system and the immersion medium (2) and at least one means is arranged laterally on the element (1) and/or subsequently on the protective plate (3, 17) such that the sub pressure of the immersion medium (2) is much less on the external contour of the element (1), between the element (1) and the protective plate (3, 17) than on the immersion fluid itself. Suitable means are, for example, a seal, an intermediate immersion fluid, a surrounding lateral wall, supply and discharge lines for the exchange of the medium between the element (1) and the protective plate (3) or receiving means for adsorbing or absorbing an immersion agent (2).
PCT/EP2007/005127 2006-06-13 2007-06-11 Imaging device WO2007144125A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102006027609A DE102006027609A1 (en) 2006-06-13 2006-06-13 imaging device
DE102006027609.4 2006-06-13

Publications (2)

Publication Number Publication Date
WO2007144125A2 WO2007144125A2 (en) 2007-12-21
WO2007144125A3 true WO2007144125A3 (en) 2008-02-21

Family

ID=38473908

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2007/005127 WO2007144125A2 (en) 2006-06-13 2007-06-11 Imaging device

Country Status (2)

Country Link
DE (1) DE102006027609A1 (en)
WO (1) WO2007144125A2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016012193A1 (en) * 2014-07-25 2016-01-28 Asml Netherlands B.V. Immersion lithographic apparatus and device manufacturing method
DE102017217380A1 (en) 2017-09-29 2019-04-04 Carl Zeiss Microscopy Gmbh Immersion device for the dynamic adaptation of a medium to a sample
DE102017217389A1 (en) * 2017-09-29 2019-04-04 Carl Zeiss Microscopy Gmbh An optical lens for use in a media delivery device and lens, media delivery device and microscope
DE102019207210B4 (en) 2019-05-17 2020-06-25 Carl Zeiss Smt Gmbh Methods for the detection of defects

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1510871A2 (en) * 2003-08-29 2005-03-02 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US20050225737A1 (en) * 2003-12-19 2005-10-13 Carl Zeiss Smt Ag Projection objective for immersion lithography

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL171014B (en) * 1952-07-11 Yoshida Kogyo Kk ZIPPER.
US7133114B2 (en) * 2004-09-20 2006-11-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1510871A2 (en) * 2003-08-29 2005-03-02 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US20050225737A1 (en) * 2003-12-19 2005-10-13 Carl Zeiss Smt Ag Projection objective for immersion lithography

Also Published As

Publication number Publication date
DE102006027609A1 (en) 2007-12-20
WO2007144125A2 (en) 2007-12-21

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