WO2008087827A1 - Image forming optical system, exposure equipment and device manufacturing method - Google Patents

Image forming optical system, exposure equipment and device manufacturing method Download PDF

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Publication number
WO2008087827A1
WO2008087827A1 PCT/JP2007/074376 JP2007074376W WO2008087827A1 WO 2008087827 A1 WO2008087827 A1 WO 2008087827A1 JP 2007074376 W JP2007074376 W JP 2007074376W WO 2008087827 A1 WO2008087827 A1 WO 2008087827A1
Authority
WO
WIPO (PCT)
Prior art keywords
image forming
optical system
conjugate position
conjugate
forming optical
Prior art date
Application number
PCT/JP2007/074376
Other languages
French (fr)
Japanese (ja)
Inventor
Youhei Fujishima
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Publication of WO2008087827A1 publication Critical patent/WO2008087827A1/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements

Abstract

It is an object to provide an image forming optical system that has an effective image forming region with a shape suitable for a collective type exposure device, for example, and that is a reflective refracting type with a small absolute value of an image forming magnification and a high numerical aperture. The image forming optical system forms an image of a first surface (R) on a second surface (W) and is provided with a first image forming system (G1) disposed between the first surface and a first conjugate position optically conjugate with the first surface, a second image forming system (G2) disposed between a second conjugate position optically conjugate with the first conjugate position and the first conjugate position, and a third image forming system (G3) disposed between the second conjugate position and the second surface. If the image forming magnifications of the first, second and third image forming systems are M1, M2 and M3, respectively, the following conditions are satisfied: 0.8<|M1|<2, 0.8<|M2|<2 and 0.03<|M3|<0.2.
PCT/JP2007/074376 2007-01-16 2007-12-19 Image forming optical system, exposure equipment and device manufacturing method WO2008087827A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-006844 2007-01-16
JP2007006844 2007-01-16

Publications (1)

Publication Number Publication Date
WO2008087827A1 true WO2008087827A1 (en) 2008-07-24

Family

ID=39635832

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/074376 WO2008087827A1 (en) 2007-01-16 2007-12-19 Image forming optical system, exposure equipment and device manufacturing method

Country Status (2)

Country Link
TW (1) TW200844677A (en)
WO (1) WO2008087827A1 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103278912A (en) * 2013-06-19 2013-09-04 中国科学院光电技术研究所 Reflective type ultra-violet lithography objective lens
CN104111515A (en) * 2014-07-11 2014-10-22 中国科学院光电技术研究所 Large-numerical-aperture immersed projection object lens
US8908269B2 (en) 2004-01-14 2014-12-09 Carl Zeiss Smt Gmbh Immersion catadioptric projection objective having two intermediate images
US8913316B2 (en) 2004-05-17 2014-12-16 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
US9772478B2 (en) 2004-01-14 2017-09-26 Carl Zeiss Smt Gmbh Catadioptric projection objective with parallel, offset optical axes

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002277742A (en) * 2000-10-23 2002-09-25 Nikon Corp Reflection and refraction optical system and exposure device equipped with the same optical system
WO2005059654A1 (en) * 2003-12-15 2005-06-30 Carl Zeiss Smt Ag Objective as a microlithography projection objective with at least one liquid lens
WO2006005547A1 (en) * 2004-07-14 2006-01-19 Carl Zeiss Smt Ag Catadioptric projection objective
JP2007298984A (en) * 2006-05-05 2007-11-15 Carl Zeiss Smt Ag High-na projection objective
JP2008046641A (en) * 2006-08-15 2008-02-28 Carl Zeiss Smt Ag Projection objective of microlithographic projection exposure apparatus

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002277742A (en) * 2000-10-23 2002-09-25 Nikon Corp Reflection and refraction optical system and exposure device equipped with the same optical system
WO2005059654A1 (en) * 2003-12-15 2005-06-30 Carl Zeiss Smt Ag Objective as a microlithography projection objective with at least one liquid lens
WO2006005547A1 (en) * 2004-07-14 2006-01-19 Carl Zeiss Smt Ag Catadioptric projection objective
JP2007298984A (en) * 2006-05-05 2007-11-15 Carl Zeiss Smt Ag High-na projection objective
JP2008046641A (en) * 2006-08-15 2008-02-28 Carl Zeiss Smt Ag Projection objective of microlithographic projection exposure apparatus

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8908269B2 (en) 2004-01-14 2014-12-09 Carl Zeiss Smt Gmbh Immersion catadioptric projection objective having two intermediate images
US9772478B2 (en) 2004-01-14 2017-09-26 Carl Zeiss Smt Gmbh Catadioptric projection objective with parallel, offset optical axes
US8913316B2 (en) 2004-05-17 2014-12-16 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
US9019596B2 (en) 2004-05-17 2015-04-28 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
US9134618B2 (en) 2004-05-17 2015-09-15 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
US9726979B2 (en) 2004-05-17 2017-08-08 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
CN103278912A (en) * 2013-06-19 2013-09-04 中国科学院光电技术研究所 Reflective type ultra-violet lithography objective lens
CN103278912B (en) * 2013-06-19 2015-07-08 中国科学院光电技术研究所 Reflective type ultra-violet lithography objective lens
CN104111515A (en) * 2014-07-11 2014-10-22 中国科学院光电技术研究所 Large-numerical-aperture immersed projection object lens
CN104111515B (en) * 2014-07-11 2016-09-28 中国科学院光电技术研究所 A kind of large-numerical aperture immersion projection objective

Also Published As

Publication number Publication date
TW200844677A (en) 2008-11-16

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