WO2008089121A3 - A thermal vacuum gauge - Google Patents

A thermal vacuum gauge Download PDF

Info

Publication number
WO2008089121A3
WO2008089121A3 PCT/US2008/050963 US2008050963W WO2008089121A3 WO 2008089121 A3 WO2008089121 A3 WO 2008089121A3 US 2008050963 W US2008050963 W US 2008050963W WO 2008089121 A3 WO2008089121 A3 WO 2008089121A3
Authority
WO
WIPO (PCT)
Prior art keywords
enclosure
heater
structures
vacuum gauge
vacuum
Prior art date
Application number
PCT/US2008/050963
Other languages
French (fr)
Other versions
WO2008089121A2 (en
Inventor
Robert E Higashi
Original Assignee
Honeywell Int Inc
Robert E Higashi
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Honeywell Int Inc, Robert E Higashi filed Critical Honeywell Int Inc
Publication of WO2008089121A2 publication Critical patent/WO2008089121A2/en
Publication of WO2008089121A3 publication Critical patent/WO2008089121A3/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L21/00—Vacuum gauges
    • G01L21/10—Vacuum gauges by measuring variations in the heat conductivity of the medium, the pressure of which is to be measured
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L11/00—Measuring steady or quasi-steady pressure of a fluid or a fluent solid material by means not provided for in group G01L7/00 or G01L9/00
    • G01L11/002—Measuring steady or quasi-steady pressure of a fluid or a fluent solid material by means not provided for in group G01L7/00 or G01L9/00 by thermal means, e.g. hypsometer

Abstract

A system for determining a gas pressure or gauging a vacuum in a hermetically sealed enclosure. One or more heater structures and one or more temperature sensor structures situated on a substrate may be used in conjunction for measuring a thermal conductivity of a gas in the enclosure. Each heater has significant thermal isolation from each sensor structure. Electronics connected to each heater and sensor of their respective structures may provide processing to calculate the pressure or vacuum in the enclosure. The enclosure may contain various electronic components such as bolometers.
PCT/US2008/050963 2007-01-16 2008-01-14 A thermal vacuum gauge WO2008089121A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/623,561 2007-01-16
US11/623,561 US7613586B2 (en) 2007-01-16 2007-01-16 Thermal vacuum gauge

Publications (2)

Publication Number Publication Date
WO2008089121A2 WO2008089121A2 (en) 2008-07-24
WO2008089121A3 true WO2008089121A3 (en) 2008-12-18

Family

ID=39616756

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2008/050963 WO2008089121A2 (en) 2007-01-16 2008-01-14 A thermal vacuum gauge

Country Status (2)

Country Link
US (1) US7613586B2 (en)
WO (1) WO2008089121A2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8504313B2 (en) * 2010-03-22 2013-08-06 Dennis Cardinale Electronic vacuum gauge and systems and methods of calibration and operation of same
US9335231B2 (en) * 2014-03-25 2016-05-10 Mks Instruments, Inc. Micro-Pirani vacuum gauges
JP6293588B2 (en) * 2014-06-27 2018-03-14 東京エレクトロン株式会社 Pressure sensor and pressure sensor manufacturing method
US10845263B2 (en) 2018-04-17 2020-11-24 Mks Instruments, Inc. Thermal conductivity gauge
JP2023550350A (en) 2020-11-16 2023-12-01 エム ケー エス インストルメンツ インコーポレーテッド heat conduction vacuum gauge

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4651564A (en) * 1982-09-30 1987-03-24 Honeywell Inc. Semiconductor device
US5187674A (en) * 1989-12-28 1993-02-16 Honeywell Inc. Versatile, overpressure proof, absolute pressure sensor
US20050176179A1 (en) * 2002-12-27 2005-08-11 Kimiya Ikushima Electronic device and method of manufacturing the same

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8603999D0 (en) * 1986-02-18 1986-03-26 Vg Instr Group Vacuum monitoring apparatus
US4682503A (en) * 1986-05-16 1987-07-28 Honeywell Inc. Microscopic size, thermal conductivity type, air or gas absolute pressure sensor
US5079954A (en) * 1990-12-27 1992-01-14 The Boc Group, Inc. Vacuum gauge
DE4107295A1 (en) * 1991-03-07 1992-09-10 Manfred Dr Rer Nat Ritschel METHOD FOR DETERMINING CHEMICAL AND / OR PHYSICAL PROPERTIES OF A GAS ATMOSPHERE
EP0660096B1 (en) * 1993-12-23 1999-03-17 Heimann Optoelectronics GmbH Microvacuumsensor
JP4493139B2 (en) * 2000-02-02 2010-06-30 キヤノンアネルバ株式会社 Ionization gauge
US6973834B1 (en) * 2004-10-18 2005-12-13 A.T.C.T. Advanced Thermal Chips Technologies Ltd. Method and apparatus for measuring pressure of a fluid medium and applications thereof
DE102005020960B3 (en) * 2005-05-06 2006-12-14 Pierburg Gmbh Gas pressure measuring method e. g. for hydrogen aggregates for motor vehicles, involves having temperature measuring instrument for measuring gas temperature and mechanism for determination of temperature of heating element

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4651564A (en) * 1982-09-30 1987-03-24 Honeywell Inc. Semiconductor device
US5187674A (en) * 1989-12-28 1993-02-16 Honeywell Inc. Versatile, overpressure proof, absolute pressure sensor
US20050176179A1 (en) * 2002-12-27 2005-08-11 Kimiya Ikushima Electronic device and method of manufacturing the same

Also Published As

Publication number Publication date
WO2008089121A2 (en) 2008-07-24
US20080168842A1 (en) 2008-07-17
US7613586B2 (en) 2009-11-03

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