WO2008098913A1 - An apparatus for activating a plasma focus unit - Google Patents

An apparatus for activating a plasma focus unit Download PDF

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Publication number
WO2008098913A1
WO2008098913A1 PCT/EP2008/051645 EP2008051645W WO2008098913A1 WO 2008098913 A1 WO2008098913 A1 WO 2008098913A1 EP 2008051645 W EP2008051645 W EP 2008051645W WO 2008098913 A1 WO2008098913 A1 WO 2008098913A1
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Prior art keywords
node
bank
capacitors
mesh
current
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PCT/EP2008/051645
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French (fr)
Inventor
Gianluigi Basile
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O.C.E.M. S.P.A.
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Publication of WO2008098913A1 publication Critical patent/WO2008098913A1/en

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Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/02Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/04Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using magnetic fields substantially generated by the discharge in the plasma
    • H05H1/06Longitudinal pinch devices
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21BFUSION REACTORS
    • G21B1/00Thermonuclear fusion reactors
    • G21B1/11Details
    • G21B1/21Electric power supply systems, e.g. for magnet systems, switching devices, storage devices, circuit arrangements
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21BFUSION REACTORS
    • G21B3/00Low temperature nuclear fusion reactors, e.g. alleged cold fusion reactors
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00Energy generation of nuclear origin
    • Y02E30/10Nuclear fusion reactors

Definitions

  • the invention relates to the technical sector of apparatus for supplying a plasma focus unit and activation thereof.
  • a Plasma Focus unit is a device that enables generation of nuclear fusion reactions: it comprises two coaxial cylindrical electrodes, facing one another, the dielectric of which is constituted by a gas or gas mixtures, for example deuterium or a mixture of deuterium and tritium, maintained at a controlled pressure.
  • the fusion reaction takes place following generation of an electrical discharge of a given intensity through the dielectric, caused by a determined tension difference applied across the electrodes; by way of example, a plasma focus unit can be designed such that a current spike of the order of a million amperes corresponds to an application of a difference of 30 kVolts across of its electrodes, such as to generate a nuclear fusion reaction.
  • Figure 1 shows a circuit for supplying a plasma focus unit of known type.
  • the circuit includes an electrical mesh Ei in which the following are inserted: the plasma focus unit PF, a capacitor bank C, and a first switch, for example of the spark gap type SWi, known to the expert in the sector, of dimensions which will support conduction of high current spikes.
  • the bank of capacitors C derived between a first A and a second node B, is energised by an external supply source ES, which is destined to charge the capacitors C of the bank to a predetermined tension level (potential difference between the nodes A, B) when the first switch SWi is open.
  • tension V 0 now present across terminals H, K of the PF unit, is such as to determine a violent discharge of current i c through the dielectric, with consequent generation of a nuclear fusion reaction.
  • the application of the tension difference V 0 generates circulation of an oscillating current io, damped over time, at a frequency which is the same as the resonance frequency for the first mesh Ei; in this case, the resonance frequency depends on the inductance value L p of the first mesh Ei (typically constituted by only the parasitic inductances) and the equivalent capacity of the capacitor bank C, while the damped effect on the amplitude of the oscillating current, which lasts only a few hundredths of a nano-second, is due mainly to the resistive behaviour of the PF unit.
  • the aim of the present invention is to provide an apparatus for activating a new- concept plasma focus unit which offers greater energy saving in repetitive use with respect to prior-art devices, given a same number of nuclear fusion reactions obtained over a time unit.
  • a further aim of the invention is to provide an apparatus for activating a plasma focus unit, which apparatus has higher productivity than those in the prior art, in order to increase the number of nuclear reactions achieved in a given time unit.
  • a still further aim of the invention consists in providing a reliable and functional apparatus having relatively contained costs with respect to the advantages attained.
  • a plasma focus unit of a type comprising at least a first electric mesh, in turn comprising: the plasma focus unit; a bank of capacitors derived from a first tension node and a second tension node, with the bank of capacitors being destined to be charged by a supply device to a predetermined potential difference, greater in the first node than in the second node; and a first switch, characterised in that it comprises a first component, inserted in the first electric mesh, for unidirectional conduction of the current generated by the bank of capacitors when the potential of the first node is greater than the potential of the second node, and in that it further comprises an additional electric branch derived between the first node and the second node, to define a second electric mesh, in which, apart from the bank of capacitors, a second component for unidirectional conduction of the current generated by the -A-
  • figure 1 is an electrical diagram of an apparatus of known type for supplying and activating a plasma focus unit
  • figure 2 is the electrical diagram of the apparatus of the present invention for supplying and activating a plasma focus unit
  • figure 3 contains two graphs representing the progression over time of two significant electrical quantities
  • figure 4 includes the electrical diagram of several apparatus of the invention for supplying and activating a plasma focus unit.
  • the apparatus of the present invention comprises a circuit for supplying and activating the plasma focus PF unit, made up of a first mesh Ei and a second mesh E 2 and energised by an external supply device ES via the first node A and the second node B.
  • the first electric mesh Ei comprises a parasitic inductance L p , the bank of capacitors C, derived between the nodes A, B, the plasma focus unit PF and the first switch SWi, for example a spark gap or a solid state switch; in addition, the first mesh Ei includes a first unidirectional component Di, such as a specially shaped diode, for unidirectional conduction of the current when the potential difference V AB between the first A node and the second B node is positive (the potential of the first node A being greater than that of the second node B).
  • the above-cited unidirectional component Di can be integrated directly into the switch SWi, which can be, for example, a Silicon Controlled Rectifier.
  • the second electrical mesh E 2 includes the bank of capacitors C and an additional branch RA derived across the bank of capacitors C; it comprises, apart from the bank of capacitors C, an additional inductor L A of a specific value, for example higher than that of the inductance L p of the first mesh Ei (for reasons which will be more fully explained in the following), a second switch SW 2 , for example of the spark gap or solid state type, and a second unidirectional component D 2 , for example a specially-sized diode for unidirectional conduction of the current when the potential difference V AB between the first node A and the second node B is negative.
  • the closing of the second switch SW 2 is commanded, causing circulation of a current i c generated by the residual energy stored in the bank of capacitors C and now directed oppositely on this branch, which can be directed only in the second electric mesh E 2 ; in this case too the current exhibits a damped oscillation over time, having a frequency which is the same as the resonance frequency for the second electric mesh E 2 , where the resonance frequency depends on the value of the additional inductance L A and the equivalent capacity of the bank of capacitors C, and the damped effect on the amplitude can be imputed to the parasitic resistance (not represented) of the second mesh E 2 .
  • the current i c which runs in the second mesh E 2 is exhausted at the end of the relative half-period (time t 3 ), as it cannot invert due to the presence of the second diode D 2 ; the tension V AB across the bank of capacitors C, in phase quadrature with respect to the current i c , over time t 2 -t 3 inverts its polarity, reaching a value V 3 which is lower than Vi, by effect of the dissipation of energy in heat (Joule effect) on the parasitic resistance of the second mesh E 2 .
  • the difference of potential VAB across the bank of capacitors C, equal to V 3 is therefore newly positive even though it is lower than the tension V 0 required for a new impulse.
  • the current i c which runs in the second mesh E 2 exhibits an amplitude and a frequency which are lower than those circulating in the first mesh Ei, as the additional inductance L A is greater than the parasitic inductance L P (L A >L P ); this is advantageous in terms of both the losses due to the Joule effect, which are lower than those on the first mesh Ei, and for the dimensions of the second switch SW 2 , which can be less expensive than the first switch SWi.
  • the following state includes activation of the external device ES for supplying the bank of capacitors C up to complete resetting of the tension V 0 .
  • the successive operating cycles are repeated similarly: at the end of each cycle, only the energy required for charging the bank of capacitors C from tension V 3 to tension V 0 will need to be supplied, necessary for obtaining the nuclear fusion reaction internally of the plasma focus unit.
  • the subsequent nuclear fusion reactions advantageously each require a quantity of electrical energy which is much lower than the amount required in the prior art: in known apparatus, at each cycle the resonance current circulating in the first mesh Ei is extinguished, with a consequent total discharge of the bank of capacitors C and the energy stored there; with the present invention, the current i c circulates in the first mesh Ei for only a half-period, sufficient for the nuclear reaction, and further circulates in the second mesh E 2 for a further half-period, in order to enable the inversion of the polarity of the residual tension
  • the external supply device ES will need much less time to restore the energy passed by the bank of capacitors C during each operating cycle, given that now it only has to supply a part of the total demanded; this advantageously enables a considerable increase in the productivity of the apparatus of the invention, as each cycle time depends greatly on the time required for charging the bank of capacitors C to the desired tension V 0 . It is clear that charging starting from a tension V 3 of the order of V 0 will require much less time with respect to what occurred in the prior art, in which charging started from zero tension.
  • the apparatus of the invention enables installation of an external supply device ES of a much lower power, with a consequent considerable reduction in the relative costs and sizes thereof.
  • a still further advantage of the present invention is that it provides an apparatus for activating a plasma focus unit which is reliable, functional and has relatively contained costs with respect to the advantages it offers.
  • circuital configuration with a single supply mesh Ei shown in figure 2 and for which configuration it might be problematic and expensive to size the diode Di and the switch SWi, can be substituted by the circuital configuration illustrated in figure 4, which shows a plurality of supply meshes MEi, ME 2 , ... ME N each provided with a relative diode and current switch dimensioned only for the current of branch i C i , ic2, ⁇ ⁇ ⁇ -,
  • a first variant (not illustrated in the figures) includes omission of the additional inductor L A ; in this case, the circulating resonant current i c , in the operating configurations, exhibits in the second mesh E 2 a frequency and amplitude value which is greater and which depends on the parasitic inductance (not indicated) of the second electrical mesh E 2 (which was before of insignificant entity in the presence of the additional inductor L A ); with respect to the above- described embodiment, the increase in current i c in the second mesh E 2 will lead to greater dissipation of energy in heat, provided by the bank of capacitors C, further requiring the interposing of a second switch SW 2 having adequate characteristics for supporting higher current loads.
  • a second further variant of the invention includes the omission of the second switch SW 2 in the additional branch RA and, possibly, of the additional inductor L A (in agreement with the above-cited first variant); in this case, following the closure of the first switch SWi and the generation of a resonance current in the first mesh Ei, a resonance current originates in the second mesh E 2 (of the same type as the one described above when the second switch SW 2 is closed at time t 2 ) when the tension V AB across the bank of capacitors C inverts and the potential at node B exceeds, by a predetermined amount, the potential of node A.

Abstract

An apparatus for activating a plasma focus unit, comprising a first electric mesh (E1), in turn comprising: the plasma focus unit (PF); a bank of capacitors (C) derived from a first tension node (A) and a second tension node (B); a switch (SW1), and a diode (D1) for conducting the current (ic) when the potential of the node (A) is greater than the potential of the node (B). The apparatus further comprises an additional electric branch (RA) connected to the bank of capacitors (C) to define an electric mesh (E2), comprising: a diode (D2) for conducting the current (ic) when the potential of the node (B) is greater than the potential of the node (A); and a current switch (SW2).

Description

AN APPARATUS FOR ACTIVATING A PLASMA FOCUS UNIT
TECHNICAL FIELD
The invention relates to the technical sector of apparatus for supplying a plasma focus unit and activation thereof.
BACKGROUND ART
As is known, a Plasma Focus unit is a device that enables generation of nuclear fusion reactions: it comprises two coaxial cylindrical electrodes, facing one another, the dielectric of which is constituted by a gas or gas mixtures, for example deuterium or a mixture of deuterium and tritium, maintained at a controlled pressure. The fusion reaction takes place following generation of an electrical discharge of a given intensity through the dielectric, caused by a determined tension difference applied across the electrodes; by way of example, a plasma focus unit can be designed such that a current spike of the order of a million amperes corresponds to an application of a difference of 30 kVolts across of its electrodes, such as to generate a nuclear fusion reaction.
Figure 1 shows a circuit for supplying a plasma focus unit of known type.
The circuit includes an electrical mesh Ei in which the following are inserted: the plasma focus unit PF, a capacitor bank C, and a first switch, for example of the spark gap type SWi, known to the expert in the sector, of dimensions which will support conduction of high current spikes. The bank of capacitors C, derived between a first A and a second node B, is energised by an external supply source ES, which is destined to charge the capacitors C of the bank to a predetermined tension level (potential difference between the nodes A, B) when the first switch SWi is open.
Once the bank of capacitors C is charged at a predetermined tension V0, then the first switch SWi is closed; tension V0, now present across terminals H, K of the PF unit, is such as to determine a violent discharge of current ic through the dielectric, with consequent generation of a nuclear fusion reaction. The application of the tension difference V0, as is known, generates circulation of an oscillating current io, damped over time, at a frequency which is the same as the resonance frequency for the first mesh Ei; in this case, the resonance frequency depends on the inductance value Lp of the first mesh Ei (typically constituted by only the parasitic inductances) and the equivalent capacity of the capacitor bank C, while the damped effect on the amplitude of the oscillating current, which lasts only a few hundredths of a nano-second, is due mainly to the resistive behaviour of the PF unit.
It has been experimentally proven that the nuclear fusion reaction occurs, in a single occasion, during the first half-period of the circulating current in the first mesh Ei. It follows that protraction of the electrical charge internally of the dielectric of the PF unit, and thus the circulation of current ic in the first mesh Ei after the fusion reaction, constitutes a useless dissipation of energy which leads to complete discharging of the capacitor bank C. The successive fusion reaction, therefore, is subordinated to a complete charging of the capacitor bank C from tension zero to tension V0, which requires a considerable amount of time (for charging) and energy.
In the light of the above drawbacks in the prior art, the aim of the present invention is to provide an apparatus for activating a new- concept plasma focus unit which offers greater energy saving in repetitive use with respect to prior-art devices, given a same number of nuclear fusion reactions obtained over a time unit.
In addition, a further aim of the invention is to provide an apparatus for activating a plasma focus unit, which apparatus has higher productivity than those in the prior art, in order to increase the number of nuclear reactions achieved in a given time unit.
A still further aim of the invention consists in providing a reliable and functional apparatus having relatively contained costs with respect to the advantages attained.
DISCLOSURE OF THE INVENTION
The above aims are obtained by means of an apparatus for activating a plasma focus unit, of a type comprising at least a first electric mesh, in turn comprising: the plasma focus unit; a bank of capacitors derived from a first tension node and a second tension node, with the bank of capacitors being destined to be charged by a supply device to a predetermined potential difference, greater in the first node than in the second node; and a first switch, characterised in that it comprises a first component, inserted in the first electric mesh, for unidirectional conduction of the current generated by the bank of capacitors when the potential of the first node is greater than the potential of the second node, and in that it further comprises an additional electric branch derived between the first node and the second node, to define a second electric mesh, in which, apart from the bank of capacitors, a second component for unidirectional conduction of the current generated by the -A-
bank of capacitors when the potential of the second node is greater than the potential of the first node.
BRIEF DESCRIPTION OF THE DRAWINGS
The characteristics of the invention which do not emerge from the above will be more fully detailed in the following, in agreement with what is written in the claims and with the aid of the accompanying figures of the drawings, in which:
figure 1 is an electrical diagram of an apparatus of known type for supplying and activating a plasma focus unit;
figure 2 is the electrical diagram of the apparatus of the present invention for supplying and activating a plasma focus unit;
figure 3 contains two graphs representing the progression over time of two significant electrical quantities;
figure 4 includes the electrical diagram of several apparatus of the invention for supplying and activating a plasma focus unit.
BEST MODE FOR CARRYING OUT THE INVENTION
With reference to figure 2, the apparatus of the present invention comprises a circuit for supplying and activating the plasma focus PF unit, made up of a first mesh Ei and a second mesh E2 and energised by an external supply device ES via the first node A and the second node B.
As in the prior art solution described herein above, and represented in figure 1 , the first electric mesh Ei comprises a parasitic inductance Lp, the bank of capacitors C, derived between the nodes A, B, the plasma focus unit PF and the first switch SWi, for example a spark gap or a solid state switch; in addition, the first mesh Ei includes a first unidirectional component Di, such as a specially shaped diode, for unidirectional conduction of the current when the potential difference VAB between the first A node and the second B node is positive (the potential of the first node A being greater than that of the second node B). By way of example, in place of the diode the above-cited unidirectional component Di can be integrated directly into the switch SWi, which can be, for example, a Silicon Controlled Rectifier.
The second electrical mesh E2 includes the bank of capacitors C and an additional branch RA derived across the bank of capacitors C; it comprises, apart from the bank of capacitors C, an additional inductor LA of a specific value, for example higher than that of the inductance Lp of the first mesh Ei (for reasons which will be more fully explained in the following), a second switch SW2, for example of the spark gap or solid state type, and a second unidirectional component D2, for example a specially-sized diode for unidirectional conduction of the current when the potential difference VAB between the first node A and the second node B is negative.
There follows a description of the operation of the apparatus of the present invention, with reference to the graphs of figure 3, which relate to the progression of the tension VAB across the bank of capacitors C and the current ic circulating there, which alternatively flows in the first Ei(to≤t≤ti) and the second mesh E2 (t2≤t≤t3).
Starting from a condition in which the bank of capacitors C is uncharged, i.e. in which the tension VAB at its terminals is nil, and in which the first switch SWi and the second switch SW2 are open, the external device ES is activated to supply the bank of capacitors C with a suitable charge current (not indicated) up until a determined potential difference V0 is reached at the terminals (condition VAB=V0 at time t≤t0), conventionally considered positive (potential in the first node A is greater than that at the second node B).
At time to the first switch SWi is closed and this causes (without considering, for the sake of simplicity, delay times) circulation of a current ic, generated by the bank of capacitors C, which can flows only in the first electric mesh Ei; the tension at terminals H, K of unit PF is such as to cause a discharge through the dielectric, closing the circuit in the first mesh Ei. As is known, the current ic generated exhibits a damped oscillation, having a frequency which is equal to the resonance frequency for the first mesh Ei, (having regard to the equivalent capacity of the bank of capacitors C and the relative parasitic inductance Lp); however, the presence of the first diode Di enables circulation of the current ic only in the relative first half-period (figure 3, to≤t≤ti), in which however there occurs a fusion reaction internally of the plasma focus PF unit (time t*, indicatively denoted in figure 3); at the end of the first half-period (time ti), the current ic is annulled and the tension VAB in phase quadrature with respect to the current ic is negative and modularly less than the tension V0 (VAB=-VI , VI<V0), by effect of the dissipation of energy into heat (the Joule effect) on the resistances of the first mesh Ei (parasitic resistance and equivalent resistance of the PF unit, neither shown in the figure).
At this point, when the current ic in the first mesh Ei is exhausted, as mentioned due to the effect of the first diode Di, the first switch SWi opens; the potential difference across the bank of capacitors C is now negative and equal to Vi (potential of the second node B greater than that of first node A).
At generic time t2>ti, the closing of the second switch SW2 is commanded, causing circulation of a current ic generated by the residual energy stored in the bank of capacitors C and now directed oppositely on this branch, which can be directed only in the second electric mesh E2; in this case too the current exhibits a damped oscillation over time, having a frequency which is the same as the resonance frequency for the second electric mesh E2, where the resonance frequency depends on the value of the additional inductance LA and the equivalent capacity of the bank of capacitors C, and the damped effect on the amplitude can be imputed to the parasitic resistance (not represented) of the second mesh E2. The current ic which runs in the second mesh E2 is exhausted at the end of the relative half-period (time t3), as it cannot invert due to the presence of the second diode D2; the tension VAB across the bank of capacitors C, in phase quadrature with respect to the current ic, over time t2-t3 inverts its polarity, reaching a value V3 which is lower than Vi, by effect of the dissipation of energy in heat (Joule effect) on the parasitic resistance of the second mesh E2.
The difference of potential VAB across the bank of capacitors C, equal to V3 is therefore newly positive even though it is lower than the tension V0 required for a new impulse. The current ic which runs in the second mesh E2 exhibits an amplitude and a frequency which are lower than those circulating in the first mesh Ei, as the additional inductance LA is greater than the parasitic inductance LP (LA>LP); this is advantageous in terms of both the losses due to the Joule effect, which are lower than those on the first mesh Ei, and for the dimensions of the second switch SW2, which can be less expensive than the first switch SWi. The following state, not illustrated in figure 3, in which both switches SWi, SW2 are open, includes activation of the external device ES for supplying the bank of capacitors C up to complete resetting of the tension V0. The successive operating cycles are repeated similarly: at the end of each cycle, only the energy required for charging the bank of capacitors C from tension V3 to tension V0 will need to be supplied, necessary for obtaining the nuclear fusion reaction internally of the plasma focus unit.
After the first start-up cycle of the apparatus of the invention, the subsequent nuclear fusion reactions advantageously each require a quantity of electrical energy which is much lower than the amount required in the prior art: in known apparatus, at each cycle the resonance current circulating in the first mesh Ei is extinguished, with a consequent total discharge of the bank of capacitors C and the energy stored there; with the present invention, the current ic circulates in the first mesh Ei for only a half-period, sufficient for the nuclear reaction, and further circulates in the second mesh E2 for a further half-period, in order to enable the inversion of the polarity of the residual tension
(VAB=-VI) across the bank of capacitors C, but with a much lower intensity. As a result, the bank of capacitors C supplies only a relatively contained part of the energy previously stored during the charging stage
(in which, as mentioned, it reaches a potential difference Of V0).
By direct consequence, the external supply device ES will need much less time to restore the energy passed by the bank of capacitors C during each operating cycle, given that now it only has to supply a part of the total demanded; this advantageously enables a considerable increase in the productivity of the apparatus of the invention, as each cycle time depends greatly on the time required for charging the bank of capacitors C to the desired tension V0. It is clear that charging starting from a tension V3 of the order of V0 will require much less time with respect to what occurred in the prior art, in which charging started from zero tension.
In other words, considering the same productivity required for other known-type solutions, the apparatus of the invention enables installation of an external supply device ES of a much lower power, with a consequent considerable reduction in the relative costs and sizes thereof.
A still further advantage of the present invention is that it provides an apparatus for activating a plasma focus unit which is reliable, functional and has relatively contained costs with respect to the advantages it offers.
Note that in some applications the discharge current required for generation of the nuclear fusion reaction of the plasma focus unit can reach extremely high values, with current spikes up to the order of a million amperes; in these cases correct dimensioning of the bank of capacitors C, the diode Di and the switch SWi in the mesh Ei (figure 2) can become problematic and expensive, so it is advisable, even when not necessary, to have several apparatuses of the invention derived from the same plasma focus unit; this solution has been illustrated in figure 4. Thus a plurality of electrical meshes MEi, ME2, ...., MEN are provided, each of which is destined to contribute via the relative bank of capacitors Ci, C2, , CN to the definition of a current iCi, ic2, ■ ■■■, icN representing the quota part of the discharge current ic required for generating the nuclear fusion reaction of the plasma focus unit; in figure 4 each additional branch and supply device (of the type illustrated in figure 2) derived from the terminals J, K (with J=1 , 2, ..., N) of the corresponding bank of capacitors Ci, C2, , CN has been represented, for the sake of simplicity, by a relative additional block BAi1 BA2, ...., BAN.
In this way a circuital configuration with a single supply mesh Ei, shown in figure 2 and for which configuration it might be problematic and expensive to size the diode Di and the switch SWi, can be substituted by the circuital configuration illustrated in figure 4, which shows a plurality of supply meshes MEi, ME2, ... MEN each provided with a relative diode and current switch dimensioned only for the current of branch iCi , ic2, ■ ■ ■ -,
Figure imgf000011_0001
Alternatively, a first variant (not illustrated in the figures) includes omission of the additional inductor LA; in this case, the circulating resonant current ic, in the operating configurations, exhibits in the second mesh E2 a frequency and amplitude value which is greater and which depends on the parasitic inductance (not indicated) of the second electrical mesh E2 (which was before of insignificant entity in the presence of the additional inductor LA); with respect to the above- described embodiment, the increase in current ic in the second mesh E2 will lead to greater dissipation of energy in heat, provided by the bank of capacitors C, further requiring the interposing of a second switch SW2 having adequate characteristics for supporting higher current loads. The new tension value across the banks of capacitors C, starting from which the relative charge by the external device ES will have to take place, is thus lower than that (V3) which would be obtained in the presence of the additional inductor LA, in agreement with the preferred embodiment. The advantageous technical-functional characteristics of the present invention are still valid, however.
Additionally, a second further variant of the invention (also not shown in the figures) includes the omission of the second switch SW2 in the additional branch RA and, possibly, of the additional inductor LA (in agreement with the above-cited first variant); in this case, following the closure of the first switch SWi and the generation of a resonance current in the first mesh Ei, a resonance current originates in the second mesh E2 (of the same type as the one described above when the second switch SW2 is closed at time t2) when the tension VAB across the bank of capacitors C inverts and the potential at node B exceeds, by a predetermined amount, the potential of node A. For a certain time interval, two resonating currents circulate, which respectively flow in the first electric mesh Ei and the second electric mesh E2, without prejudicing the nuclear fusion reaction internally of the plasma focus PF unit. Thus the advantageous technical-functional characteristics of the present invention are safeguarded.
The foregoing is provided by way of non-limiting example, so that any variants of a practical-applicational nature are considered to enter within the protective ambit of the invention as it is described herein above and as it is now claimed.

Claims

1 ). An apparatus for activating a plasma focus unit, of a type comprising at least a first electric mesh (Ei ), in turn comprising: the plasma focus unit (PF); a bank of capacitors (C) derived from a first tension node (A) and a second tension node (B), with the bank of capacitors (C) being destined to be charged by a supply device (ES) to a predetermined potential difference (VAB), greater in the first node (A) than in the second node (B); and a first switch (SWi), characterised in that it comprises a first component (Di), inserted in the first electric mesh (Ei), for unidirectional conduction of the current (ic) generated by the bank of capacitors (C) when the potential of the first node (A) is greater than the potential of the second node (B), and in that it further comprises an additional electric branch (RA) derived from the first node and the second node (B), to define a second electric mesh (E2), in which, apart from the bank of capacitors (C), a second component (D2) is included for unidirectional conduction of the current (ic) generated by the bank of capacitors (C) when the potential of the second node (B) is greater than the potential of the first node (A).
2). The apparatus of claim 1 , characterised in that the additional electric branch (RA) further comprises a second switch (SW2).
3). The apparatus of claim 1 , characterised in that it further comprises an additional inductor (LA) inserted in the additional branch (RA).
4). The apparatus of claim 1 , characterised in that it further comprises an additional inductor (LA) inserted in the additional branch (RA), the value of which inductance is greater than an equivalent parasitic inductance (Lp) of the first electric mesh (Ei). 5). The apparatus of claim 1 , characterised in that the first switch (SWi) is of a spark gap type.
6). The apparatus of claim 1 , characterised in that the first switch (SWi) is of a solid state type.
7). The apparatus of claim 1 , characterised in that the second switch (SW2) is of a spark gap type.
8). The apparatus of claim 1 , characterised in that the second switch (SW2) is of a solid state type.
PCT/EP2008/051645 2007-02-14 2008-02-12 An apparatus for activating a plasma focus unit WO2008098913A1 (en)

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ITBO2007A000080 2007-02-14
IT000080A ITBO20070080A1 (en) 2007-02-14 2007-02-14 APPARATUS FOR THE ACTIVATION OF A PLASMA FOCUS UNIT

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4446096A (en) * 1981-11-27 1984-05-01 Auchterlonie Richard C High speed plasma focus fusion reactor
US5729562A (en) * 1995-02-17 1998-03-17 Cymer, Inc. Pulse power generating circuit with energy recovery
EP1047288A2 (en) * 1999-03-15 2000-10-25 Cymer, Inc. Plasma focus high energy photon source
US7072370B2 (en) * 2003-12-23 2006-07-04 Xtreme Technologies Gmbh Arrangement for generating pulsed currents with a high repetition rate and high current strength for gas discharge pumped radiation sources

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4446096A (en) * 1981-11-27 1984-05-01 Auchterlonie Richard C High speed plasma focus fusion reactor
US5729562A (en) * 1995-02-17 1998-03-17 Cymer, Inc. Pulse power generating circuit with energy recovery
EP1047288A2 (en) * 1999-03-15 2000-10-25 Cymer, Inc. Plasma focus high energy photon source
US7072370B2 (en) * 2003-12-23 2006-07-04 Xtreme Technologies Gmbh Arrangement for generating pulsed currents with a high repetition rate and high current strength for gas discharge pumped radiation sources

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
ZUCKER O ET AL: "The plasma focus as a large fluence neutron source", NUCLEAR INSTRUMENTS AND METHODS NETHERLANDS, vol. 145, no. 1, 15 August 1977 (1977-08-15), pages 185 - 190, XP002479891, ISSN: 0029-554X *

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