WO2008102694A1 - 表示装置、表示装置用の製造装置、及び表示装置の製造方法 - Google Patents

表示装置、表示装置用の製造装置、及び表示装置の製造方法 Download PDF

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Publication number
WO2008102694A1
WO2008102694A1 PCT/JP2008/052501 JP2008052501W WO2008102694A1 WO 2008102694 A1 WO2008102694 A1 WO 2008102694A1 JP 2008052501 W JP2008052501 W JP 2008052501W WO 2008102694 A1 WO2008102694 A1 WO 2008102694A1
Authority
WO
WIPO (PCT)
Prior art keywords
display device
luminescent part
inorganic film
film
heat
Prior art date
Application number
PCT/JP2008/052501
Other languages
English (en)
French (fr)
Inventor
Toshio Negishi
Original Assignee
Ulvac, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac, Inc. filed Critical Ulvac, Inc.
Priority to JP2009500158A priority Critical patent/JPWO2008102694A1/ja
Priority to CN2008800055651A priority patent/CN101617564B/zh
Priority to EP08711331A priority patent/EP2120510A4/en
Publication of WO2008102694A1 publication Critical patent/WO2008102694A1/ja
Priority to US12/544,665 priority patent/US7857673B2/en
Priority to US12/926,437 priority patent/US20110069473A1/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02107Forming insulating materials on a substrate
    • H01L21/02225Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02282Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
    • H01L21/02288Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating printing, e.g. ink-jet printing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/54Screens on or from which an image or pattern is formed, picked-up, converted, or stored; Luminescent coatings on vessels
    • H01J1/62Luminescent screens; Selection of materials for luminescent coatings on vessels
    • H01J1/70Luminescent screens; Selection of materials for luminescent coatings on vessels with protective, conductive, or reflective layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02367Substrates
    • H01L21/0237Materials
    • H01L21/02373Group 14 semiconducting materials
    • H01L21/02376Carbon, e.g. diamond-like carbon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293Organic, e.g. plastic
    • H01L23/295Organic, e.g. plastic containing a filler
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/84Passivation; Containers; Encapsulations
    • H10K50/842Containers
    • H10K50/8426Peripheral sealing arrangements, e.g. adhesives, sealants
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/84Passivation; Containers; Encapsulations
    • H10K50/844Encapsulations
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/87Arrangements for heating or cooling
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/16Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10Methods of surface bonding and/or assembly therefor

Abstract

 発光効率が低下しない表示装置を提供する。本発明の表示装置1は、発光部15が位置する凹部13が充填膜27で充填されてから無機膜28が形成されるので、無機膜28に亀裂が生じない。無機膜28はダイヤモンドライクカーボンやAlNのように、気密性と熱伝導性が高い材料で構成されているので、発光部15に水や酸素が進入し難いだけでなく、発光部15の熱は無機膜28に伝達され、発光部15が高温にならない。更に、第一、第二のパネル10、20の間の隙間は樹脂膜29で充填されているので、外部から大気が進入しない。発光部15は水や酸素や熱によってダメージを受けないので、本発明の表示装置1は寿命が長い。
PCT/JP2008/052501 2007-02-21 2008-02-15 表示装置、表示装置用の製造装置、及び表示装置の製造方法 WO2008102694A1 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2009500158A JPWO2008102694A1 (ja) 2007-02-21 2008-02-15 表示装置、表示装置用の製造装置、及び表示装置の製造方法
CN2008800055651A CN101617564B (zh) 2007-02-21 2008-02-15 显示装置、用于制造显示装置的装置、以及显示装置的制造方法
EP08711331A EP2120510A4 (en) 2007-02-21 2008-02-15 DISPLAY DEVICE, APPARATUS, AND METHOD FOR MANUFACTURING DISPLAY DEVICE
US12/544,665 US7857673B2 (en) 2007-02-21 2009-08-20 Display device, apparatus for producing display device, and method for producing display device
US12/926,437 US20110069473A1 (en) 2007-02-21 2010-11-18 Display device, apparatus for producing display device, and method for producing display device

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007-040867 2007-02-21
JP2007040867 2007-02-21
JP2007040866 2007-02-21
JP2007-040866 2007-02-21

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US12/544,665 Continuation US7857673B2 (en) 2007-02-21 2009-08-20 Display device, apparatus for producing display device, and method for producing display device

Publications (1)

Publication Number Publication Date
WO2008102694A1 true WO2008102694A1 (ja) 2008-08-28

Family

ID=39709971

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/052501 WO2008102694A1 (ja) 2007-02-21 2008-02-15 表示装置、表示装置用の製造装置、及び表示装置の製造方法

Country Status (7)

Country Link
US (2) US7857673B2 (ja)
EP (2) EP2120510A4 (ja)
JP (2) JPWO2008102694A1 (ja)
KR (1) KR101098859B1 (ja)
CN (1) CN101617564B (ja)
TW (1) TW200904237A (ja)
WO (1) WO2008102694A1 (ja)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009245734A (ja) * 2008-03-31 2009-10-22 Rohm Co Ltd 有機el素子
WO2014065171A1 (ja) * 2012-10-23 2014-05-01 シャープ株式会社 貼合基板の製造方法
WO2017018265A1 (ja) * 2015-07-27 2017-02-02 東レエンジニアリング株式会社 封止膜形成装置および封止膜形成方法
JP2020123585A (ja) * 2014-01-21 2020-08-13 カティーバ, インコーポレイテッド 電子デバイスのカプセル化のための装置および技術
US11107712B2 (en) 2013-12-26 2021-08-31 Kateeva, Inc. Techniques for thermal treatment of electronic devices
US11338319B2 (en) 2014-04-30 2022-05-24 Kateeva, Inc. Gas cushion apparatus and techniques for substrate coating
US11633968B2 (en) 2008-06-13 2023-04-25 Kateeva, Inc. Low-particle gas enclosure systems and methods

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5870330B2 (ja) * 2011-06-30 2016-02-24 株式会社Joled 表示パネル及び表示パネルの製造方法
FR2985076B1 (fr) * 2011-12-23 2014-08-29 Valeo Systemes Thermiques Module de commande et d'affichage pour vehicule automobile et procede de fabrication
KR101188748B1 (ko) * 2012-07-18 2012-10-09 지스마트 주식회사 투명전광판 및 그 제조방법
JP6253923B2 (ja) * 2013-08-30 2017-12-27 株式会社ジャパンディスプレイ タッチセンサ内蔵有機エレクトロルミネッセンス装置
KR102080296B1 (ko) * 2013-12-03 2020-02-21 엘지디스플레이 주식회사 유기 발광 장치
JP6684564B2 (ja) * 2015-10-14 2020-04-22 株式会社ジャパンディスプレイ 有機el表示装置
KR20170071779A (ko) * 2015-12-16 2017-06-26 주식회사 트레이스 반구형 터치센서 판넬의 진공 열성형 장치
JP6932910B2 (ja) * 2016-10-27 2021-09-08 船井電機株式会社 表示装置
CN109830181A (zh) 2017-11-23 2019-05-31 群创光电股份有限公司 显示装置
CN110571354B (zh) * 2019-09-09 2022-03-01 云谷(固安)科技有限公司 封装结构、显示面板及显示装置
CN113571435B (zh) * 2021-07-02 2024-02-27 矽磐微电子(重庆)有限公司 芯片封装结构的形成方法

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JP2004119086A (ja) * 2002-09-25 2004-04-15 Sony Corp 表示装置
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JP2004119086A (ja) * 2002-09-25 2004-04-15 Sony Corp 表示装置
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JP2005251721A (ja) * 2003-09-24 2005-09-15 Seiko Epson Corp 電気光学装置、電気光学装置の製造方法、及び電子機器
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JP2005209631A (ja) * 2003-12-26 2005-08-04 Semiconductor Energy Lab Co Ltd 発光装置、電子機器、および発光装置の作製方法
JP2006286211A (ja) 2005-03-31 2006-10-19 Pioneer Electronic Corp 有機elパネルの製造方法
JP2007128741A (ja) * 2005-11-04 2007-05-24 Seiko Epson Corp 有機el発光装置および電子機器、有機el発光装置の製造方法

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See also references of EP2120510A4

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009245734A (ja) * 2008-03-31 2009-10-22 Rohm Co Ltd 有機el素子
US11633968B2 (en) 2008-06-13 2023-04-25 Kateeva, Inc. Low-particle gas enclosure systems and methods
WO2014065171A1 (ja) * 2012-10-23 2014-05-01 シャープ株式会社 貼合基板の製造方法
US11107712B2 (en) 2013-12-26 2021-08-31 Kateeva, Inc. Techniques for thermal treatment of electronic devices
JP2020123585A (ja) * 2014-01-21 2020-08-13 カティーバ, インコーポレイテッド 電子デバイスのカプセル化のための装置および技術
US11489119B2 (en) 2014-01-21 2022-11-01 Kateeva, Inc. Apparatus and techniques for electronic device encapsulation
US11338319B2 (en) 2014-04-30 2022-05-24 Kateeva, Inc. Gas cushion apparatus and techniques for substrate coating
WO2017018265A1 (ja) * 2015-07-27 2017-02-02 東レエンジニアリング株式会社 封止膜形成装置および封止膜形成方法
JP2017025395A (ja) * 2015-07-27 2017-02-02 東レエンジニアリング株式会社 封止膜形成装置および封止膜形成方法

Also Published As

Publication number Publication date
KR101098859B1 (ko) 2011-12-26
EP2120510A1 (en) 2009-11-18
JPWO2008102694A1 (ja) 2010-05-27
CN101617564A (zh) 2009-12-30
TW200904237A (en) 2009-01-16
EP2560459A3 (en) 2013-04-10
US7857673B2 (en) 2010-12-28
KR20090117742A (ko) 2009-11-12
JP2012109248A (ja) 2012-06-07
CN101617564B (zh) 2013-02-06
US20110069473A1 (en) 2011-03-24
US20100013385A1 (en) 2010-01-21
EP2120510A4 (en) 2012-05-30
EP2560459A2 (en) 2013-02-20

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