WO2009108311A3 - Isolated transistors and diodes and isolation and termination structures for semiconductor die - Google Patents

Isolated transistors and diodes and isolation and termination structures for semiconductor die Download PDF

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Publication number
WO2009108311A3
WO2009108311A3 PCT/US2009/001187 US2009001187W WO2009108311A3 WO 2009108311 A3 WO2009108311 A3 WO 2009108311A3 US 2009001187 W US2009001187 W US 2009001187W WO 2009108311 A3 WO2009108311 A3 WO 2009108311A3
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WO
WIPO (PCT)
Prior art keywords
trench
isolation
diodes
semiconductor die
termination structures
Prior art date
Application number
PCT/US2009/001187
Other languages
French (fr)
Other versions
WO2009108311A2 (en
Inventor
Donald R. Disney
Richard K. Williams
Original Assignee
Advanced Analogic Technologies, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Analogic Technologies, Inc. filed Critical Advanced Analogic Technologies, Inc.
Priority to EP09716068.3A priority Critical patent/EP2248162A4/en
Priority to JP2010548708A priority patent/JP5449203B2/en
Priority to KR1020147013019A priority patent/KR101483404B1/en
Priority to KR1020107021292A priority patent/KR101303405B1/en
Priority to CN200980115026.8A priority patent/CN102037562B/en
Priority to KR1020127025876A priority patent/KR101363663B1/en
Priority to KR1020137023583A priority patent/KR101456408B1/en
Publication of WO2009108311A2 publication Critical patent/WO2009108311A2/en
Publication of WO2009108311A3 publication Critical patent/WO2009108311A3/en

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    • H01L29/10—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/1025—Channel region of field-effect devices
    • H01L29/1029—Channel region of field-effect devices of field-effect transistors
    • H01L29/1033—Channel region of field-effect devices of field-effect transistors with insulated gate, e.g. characterised by the length, the width, the geometric contour or the doping structure
    • H01L29/105—Channel region of field-effect devices of field-effect transistors with insulated gate, e.g. characterised by the length, the width, the geometric contour or the doping structure with vertical doping variation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
    • H01L29/417—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions carrying the current to be rectified, amplified or switched
    • H01L29/41725—Source or drain electrodes for field effect devices
    • H01L29/41766—Source or drain electrodes for field effect devices with at least part of the source or drain electrode having contact below the semiconductor surface, e.g. the source or drain electrode formed at least partially in a groove or with inclusions of conductor inside the semiconductor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/861—Diodes
    • H01L29/8613—Mesa PN junction diodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/861—Diodes
    • H01L29/866—Zener diodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Abstract

Various integrated circuit devices, in particular a transistor, are formed inside an isolation structure which includes a floor isolation region and a trench extending from the surface of the substrate to the floor isolation region. The trench may be filled with a dielectric material or may have a conductive material in a central portion with a dielectric layer lining the walls of the trench. Various techniques for terminating the isolation structure by extending the floor isolation region beyond the trench, using a guard ring, and a forming a drift region are described.
PCT/US2009/001187 2008-02-27 2009-02-25 Isolated transistors and diodes and isolation and termination structures for semiconductor die WO2009108311A2 (en)

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KR1020147013019A KR101483404B1 (en) 2008-02-27 2009-02-25 Isolated transistors and diodes and isolation and termination structures for semiconductor die
KR1020107021292A KR101303405B1 (en) 2008-02-27 2009-02-25 Isolated transistors and diodes and isolation and termination structures for semiconductor die
CN200980115026.8A CN102037562B (en) 2008-02-27 2009-02-25 Isolated transistors and diodes and isolation and termination structures for semiconductor die
KR1020127025876A KR101363663B1 (en) 2008-02-27 2009-02-25 Isolated transistors and diodes and isolation and termination structures for semiconductor die
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