WO2009111669A3 - Maskless doping technique for solar cells - Google Patents
Maskless doping technique for solar cells Download PDFInfo
- Publication number
- WO2009111669A3 WO2009111669A3 PCT/US2009/036239 US2009036239W WO2009111669A3 WO 2009111669 A3 WO2009111669 A3 WO 2009111669A3 US 2009036239 W US2009036239 W US 2009036239W WO 2009111669 A3 WO2009111669 A3 WO 2009111669A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- create
- contact regions
- solar cells
- maskless
- ion implantation
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 4
- 238000005468 ion implantation Methods 0.000 abstract 2
- 238000010884 ion-beam technique Methods 0.000 abstract 2
- 238000001459 lithography Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic System
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
A improved, lower cost method of producing solar cells utilizing selective emitter design is disclosed. The contact regions are created on the substrate without the use of lithography or masks. The method utilizes ion implantation technology, and the relatively low accuracy requirements of the contact regions to reduce the process steps needed to produce a solar cell. In some embodiments, the current of the ion beam is selectively modified to create the highly doped contact regions. In other embodiments, the ion beam is focused, either through the use of an aperture or via adjustments to the beam line components to create the necessary doping profile. In still other embodiments, the wafer scan rate is modified to create the desired ion implantation pattern.
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US3387308P | 2008-03-05 | 2008-03-05 | |
US61/033,873 | 2008-03-05 | ||
US7427808P | 2008-06-20 | 2008-06-20 | |
US61/074,278 | 2008-06-20 | ||
US12/200,117 US20090317937A1 (en) | 2008-06-20 | 2008-08-28 | Maskless Doping Technique for Solar Cells |
US12/200,117 | 2008-08-28 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2009111669A2 WO2009111669A2 (en) | 2009-09-11 |
WO2009111669A3 true WO2009111669A3 (en) | 2009-12-17 |
Family
ID=41056657
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2009/036239 WO2009111669A2 (en) | 2008-03-05 | 2009-03-05 | Maskless doping technique for solar cells |
Country Status (1)
Country | Link |
---|---|
WO (1) | WO2009111669A2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8697553B2 (en) | 2008-06-11 | 2014-04-15 | Intevac, Inc | Solar cell fabrication with faceting and ion implantation |
US8697552B2 (en) | 2009-06-23 | 2014-04-15 | Intevac, Inc. | Method for ion implant using grid assembly |
US9318332B2 (en) | 2012-12-19 | 2016-04-19 | Intevac, Inc. | Grid for plasma ion implant |
US9324598B2 (en) | 2011-11-08 | 2016-04-26 | Intevac, Inc. | Substrate processing system and method |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102013219599A1 (en) * | 2013-09-27 | 2015-04-16 | International Solar Energy Research Center Konstanz E.V. | Method for producing a contact structure of a photovoltaic cell and photovoltaic cell |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62134978A (en) * | 1985-12-09 | 1987-06-18 | Fujitsu Ltd | Manufacture of complementary high speed semiconductor device |
JP2000106436A (en) * | 1998-07-28 | 2000-04-11 | Matsushita Electronics Industry Corp | Manufacture of semiconductor device |
WO2004012219A1 (en) * | 2002-07-29 | 2004-02-05 | Axcelis Technologies, Inc. | Adjustable implantation angle workpiece support structure for an ion beam implanter |
-
2009
- 2009-03-05 WO PCT/US2009/036239 patent/WO2009111669A2/en active Application Filing
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62134978A (en) * | 1985-12-09 | 1987-06-18 | Fujitsu Ltd | Manufacture of complementary high speed semiconductor device |
JP2000106436A (en) * | 1998-07-28 | 2000-04-11 | Matsushita Electronics Industry Corp | Manufacture of semiconductor device |
WO2004012219A1 (en) * | 2002-07-29 | 2004-02-05 | Axcelis Technologies, Inc. | Adjustable implantation angle workpiece support structure for an ion beam implanter |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8697553B2 (en) | 2008-06-11 | 2014-04-15 | Intevac, Inc | Solar cell fabrication with faceting and ion implantation |
US8871619B2 (en) | 2008-06-11 | 2014-10-28 | Intevac, Inc. | Application specific implant system and method for use in solar cell fabrications |
US8697552B2 (en) | 2009-06-23 | 2014-04-15 | Intevac, Inc. | Method for ion implant using grid assembly |
US8749053B2 (en) | 2009-06-23 | 2014-06-10 | Intevac, Inc. | Plasma grid implant system for use in solar cell fabrications |
US8997688B2 (en) | 2009-06-23 | 2015-04-07 | Intevac, Inc. | Ion implant system having grid assembly |
US9303314B2 (en) | 2009-06-23 | 2016-04-05 | Intevac, Inc. | Ion implant system having grid assembly |
US9324598B2 (en) | 2011-11-08 | 2016-04-26 | Intevac, Inc. | Substrate processing system and method |
US9318332B2 (en) | 2012-12-19 | 2016-04-19 | Intevac, Inc. | Grid for plasma ion implant |
US9583661B2 (en) | 2012-12-19 | 2017-02-28 | Intevac, Inc. | Grid for plasma ion implant |
Also Published As
Publication number | Publication date |
---|---|
WO2009111669A2 (en) | 2009-09-11 |
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