WO2009130603A3 - Spatial light modulator with structured mirror surfaces - Google Patents
Spatial light modulator with structured mirror surfaces Download PDFInfo
- Publication number
- WO2009130603A3 WO2009130603A3 PCT/IB2009/005765 IB2009005765W WO2009130603A3 WO 2009130603 A3 WO2009130603 A3 WO 2009130603A3 IB 2009005765 W IB2009005765 W IB 2009005765W WO 2009130603 A3 WO2009130603 A3 WO 2009130603A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- slms
- light modulator
- spatial light
- mirror surfaces
- structured mirror
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/06—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the phase of light
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
- G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1809—Diffraction gratings with pitch less than or comparable to the wavelength
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0808—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more diffracting elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1861—Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP09734982.3A EP2269108B1 (en) | 2008-04-24 | 2009-04-24 | Spatial light modulator with structured mirror surfaces |
CN200980121054.0A CN102084280B (en) | 2008-04-24 | 2009-04-24 | Spatial light modulator with structured mirror surfaces |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US4771508P | 2008-04-24 | 2008-04-24 | |
US61/047,715 | 2008-04-24 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2009130603A2 WO2009130603A2 (en) | 2009-10-29 |
WO2009130603A3 true WO2009130603A3 (en) | 2010-01-21 |
Family
ID=40940533
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/IB2009/005765 WO2009130603A2 (en) | 2008-04-24 | 2009-04-24 | Spatial light modulator with structured mirror surfaces |
Country Status (5)
Country | Link |
---|---|
US (1) | US8077377B2 (en) |
EP (1) | EP2269108B1 (en) |
KR (1) | KR101657053B1 (en) |
CN (1) | CN102084280B (en) |
WO (1) | WO2009130603A2 (en) |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20090015922A1 (en) * | 2007-06-29 | 2009-01-15 | Allview Research Llc | Writing a diffractive structure |
WO2009099409A1 (en) * | 2008-02-06 | 2009-08-13 | Hewlett-Packard Development Company, L.P. | Optical device |
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US20120086948A1 (en) * | 2010-10-08 | 2012-04-12 | Electronics And Telecommunications Research Institute | Optical coherence tomography apparatus for enhanced axial contrast and reference mirror having multiple planes for the same |
JP5953657B2 (en) * | 2011-05-17 | 2016-07-20 | 株式会社ニコン | Spatial light modulator, exposure apparatus, and device manufacturing method |
US10317346B2 (en) * | 2011-09-02 | 2019-06-11 | Nikon Corporation | Method and device for inspecting spatial light modulator, and exposure method and device |
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DE102013213842A1 (en) * | 2013-07-16 | 2015-01-22 | Carl Zeiss Smt Gmbh | Optical component |
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US9915524B2 (en) * | 2015-05-11 | 2018-03-13 | Kla-Tencor Corporation | Optical metrology with small illumination spot size |
DE102016217785A1 (en) | 2016-09-16 | 2018-03-22 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Optical arrangement for generating light field distributions and method for operating an optical arrangement |
CN106595521B (en) * | 2016-12-12 | 2019-12-13 | 武汉颐光科技有限公司 | vertical objective lens type Mueller matrix imaging ellipsometer based on liquid crystal phase modulation |
CN110235060B (en) * | 2017-01-20 | 2021-12-07 | 应用材料公司 | Resolution enhanced digital lithography with anti-glare DMDs |
US10416539B2 (en) | 2017-06-21 | 2019-09-17 | Dolby Laboratories Licensing Corporation | Spatial light modulator for reduction of certain order light |
WO2019027931A1 (en) | 2017-07-31 | 2019-02-07 | Rutgers, The State University Of New Jersey | Apparatus and method for dewetting-based spatial light modulation for high-power lasers |
US10976533B2 (en) | 2018-02-12 | 2021-04-13 | Intelligent Imaging Innovations, Inc. | Tiling light sheet selective plane illumination microscopy using discontinuous light sheets |
US10236027B1 (en) * | 2018-02-12 | 2019-03-19 | Microsoft Technology Licensing, Llc | Data storage using light of spatially modulated phase and polarization |
CN108627248B (en) * | 2018-05-08 | 2020-06-19 | 中国科学院合肥物质科学研究院 | Spectrometer with digital micromirror array and heterodyne interference combined modulation |
JP7106682B2 (en) * | 2018-08-23 | 2022-07-26 | デュアリタス リミテッド | Hologram calculation method |
JP6857163B2 (en) * | 2018-09-26 | 2021-04-14 | 日本電信電話株式会社 | Polarization Imaging Imaging System |
US20220163919A1 (en) * | 2020-11-23 | 2022-05-26 | GM Global Technology Operations LLC | Micromirror pixel design to eliminate intensity artifacts in holographic displays |
WO2023028106A1 (en) * | 2021-08-24 | 2023-03-02 | Arizona Board Of Regents On Behalf Of The University Of Arizona | Optical enhancement of phase modulation depth for a phase light modulator |
US11899198B2 (en) | 2022-05-23 | 2024-02-13 | Applied Materials, Inc. | Controlling light source wavelengths for selectable phase shifts between pixels in digital lithography systems |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0477566A2 (en) * | 1990-09-28 | 1992-04-01 | Texas Instruments Incorporated | Improvements in or relating to light modulation |
US6169624B1 (en) * | 1999-08-11 | 2001-01-02 | Asif A. Godil | Achromatic optical modulators |
US6501600B1 (en) * | 1999-08-11 | 2002-12-31 | Lightconnect, Inc. | Polarization independent grating modulator |
US6590695B1 (en) * | 2002-02-26 | 2003-07-08 | Eastman Kodak Company | Micro-mechanical polarization-based modulator |
US20040251430A1 (en) * | 2003-06-12 | 2004-12-16 | Micronic Laser Systems Ab | Method for high precision printing of patterns |
US7170669B1 (en) * | 2005-09-28 | 2007-01-30 | Anvik Corporation | Spatial light modulator array with heat minimization and image enhancement features |
US20080002155A1 (en) * | 2003-11-01 | 2008-01-03 | Fusao Ishii | Spatial light modulator with sub-wavelength structure |
US20080024745A1 (en) * | 2006-07-31 | 2008-01-31 | Asml Netherlands B.V. | Patterning device utilizing sets of stepped mirrors and method of using same |
Family Cites Families (53)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4498010A (en) | 1983-05-05 | 1985-02-05 | The Perkin-Elmer Corporation | Virtual addressing for E-beam lithography |
JPH0642448B2 (en) | 1987-09-30 | 1994-06-01 | 株式会社東芝 | Alignment method |
US4879605A (en) | 1988-02-29 | 1989-11-07 | Ateq Corporation | Rasterization system utilizing an overlay of bit-mapped low address resolution databases |
US4989255A (en) | 1988-03-25 | 1991-01-29 | Texas Instruments Incorporated | Expansion of compact database for pattern inspector or writer |
US6348907B1 (en) | 1989-08-22 | 2002-02-19 | Lawson A. Wood | Display apparatus with digital micromirror device |
DE4022732A1 (en) | 1990-07-17 | 1992-02-20 | Micronic Laser Systems Ab | STRUCTURE MANUFACTURED ON A LIGHT-SENSITIVE-SUBSTRATE BY FOCUSED LASER RADIATION, AND METHOD AND DEVICE FOR THEIR PRODUCTION |
US5103101A (en) | 1991-03-04 | 1992-04-07 | Etec Systems, Inc. | Multiphase printing for E-beam lithography |
US5278949A (en) | 1991-03-12 | 1994-01-11 | Hewlett-Packard Company | Polygon renderer which determines the coordinates of polygon edges to sub-pixel resolution in the X,Y and Z coordinates directions |
JPH0770470B2 (en) | 1991-10-30 | 1995-07-31 | フラウンホファー・ゲゼルシャフト・ツール・フォルデルング・デル・アンゲバンテン・フォルシュング・アインゲトラーゲネル・フェライン | Irradiation device |
US5312513A (en) | 1992-04-03 | 1994-05-17 | Texas Instruments Incorporated | Methods of forming multiple phase light modulators |
ATE168791T1 (en) | 1992-04-06 | 1998-08-15 | Microunity Systems Eng | METHOD FOR PRODUCING A LITHOGRAPHIC PATTERN IN A PROCESS FOR PRODUCING SEMICONDUCTOR DEVICES |
US5311360A (en) | 1992-04-28 | 1994-05-10 | The Board Of Trustees Of The Leland Stanford, Junior University | Method and apparatus for modulating a light beam |
US5393987A (en) | 1993-05-28 | 1995-02-28 | Etec Systems, Inc. | Dose modulation and pixel deflection for raster scan lithography |
US5471305A (en) | 1993-07-23 | 1995-11-28 | Fuji Photo Optical Co., Ltd. | Alignment verification system for use with interferometer and having a line sensor |
US5563706A (en) | 1993-08-24 | 1996-10-08 | Nikon Corporation | Interferometric surface profiler with an alignment optical member |
BR9303997A (en) | 1993-10-01 | 1995-05-30 | Petroleo Brasileiro Sa | Process for the production of basic librifying oils with high viscosity indexes and high cetane diesel oil |
US5583688A (en) | 1993-12-21 | 1996-12-10 | Texas Instruments Incorporated | Multi-level digital micromirror device |
US5467146A (en) | 1994-03-31 | 1995-11-14 | Texas Instruments Incorporated | Illumination control unit for display system with spatial light modulator |
US5539567A (en) | 1994-06-16 | 1996-07-23 | Texas Instruments Incorporated | Photolithographic technique and illuminator using real-time addressable phase shift light shift |
US5504504A (en) | 1994-07-13 | 1996-04-02 | Texas Instruments Incorporated | Method of reducing the visual impact of defects present in a spatial light modulator display |
DE69535346T2 (en) | 1994-08-04 | 2007-05-24 | Texas Instruments Inc., Dallas | DISPLAY DEVICE |
US5598265A (en) | 1995-04-06 | 1997-01-28 | Zygo Corporation | Method for profiling an object surface using a large equivalent wavelength and system therefor |
US5835256A (en) | 1995-06-19 | 1998-11-10 | Reflectivity, Inc. | Reflective spatial light modulator with encapsulated micro-mechanical elements |
US5621216A (en) | 1996-04-26 | 1997-04-15 | International Business Machines Corporation | Hardware/software implementation for multipass E-beam mask writing |
US5870176A (en) | 1996-06-19 | 1999-02-09 | Sandia Corporation | Maskless lithography |
US6177980B1 (en) | 1997-02-20 | 2001-01-23 | Kenneth C. Johnson | High-throughput, maskless lithography system |
US5774254A (en) | 1997-06-26 | 1998-06-30 | Xerox Corporation | Fault tolerant light modulator display system |
US6201545B1 (en) | 1997-09-23 | 2001-03-13 | Ati Technologies, Inc. | Method and apparatus for generating sub pixel masks in a three dimensional graphic processing system |
CA2307315C (en) | 1997-10-29 | 2011-04-05 | Calum Eric Macaulay | Apparatus and methods relating to spatially light modulated microscopy |
US6496187B1 (en) | 1998-02-17 | 2002-12-17 | Sun Microsystems, Inc. | Graphics system configured to perform parallel sample to pixel calculation |
SE9800665D0 (en) | 1998-03-02 | 1998-03-02 | Micronic Laser Systems Ab | Improved method for projection printing using a micromirror SLM |
US6142641A (en) | 1998-06-18 | 2000-11-07 | Ultratech Stepper, Inc. | Four-mirror extreme ultraviolet (EUV) lithography projection system |
US6261728B1 (en) | 1998-10-19 | 2001-07-17 | Vanguard International Semiconductor Corporation | Mask image scanning exposure method |
US6489984B1 (en) | 1998-12-29 | 2002-12-03 | Kenneth C. Johnson | Pixel cross talk suppression in digital microprinters |
US6188519B1 (en) | 1999-01-05 | 2001-02-13 | Kenneth Carlisle Johnson | Bigrating light valve |
US6118535A (en) | 1999-06-02 | 2000-09-12 | Goldberg; Kenneth Alan | In Situ alignment system for phase-shifting point-diffraction interferometry |
SE516914C2 (en) | 1999-09-09 | 2002-03-19 | Micronic Laser Systems Ab | Methods and grid for high performance pattern generation |
US6184994B1 (en) | 1999-10-20 | 2001-02-06 | Ade Phase Shift Technology | Method and apparatus for absolutely measuring flat and sperical surfaces with high spatal resolution |
WO2001093303A2 (en) | 2000-06-01 | 2001-12-06 | Applied Materials, Inc. | High throughput multipass printing with lithographic quality |
US6645677B1 (en) | 2000-09-18 | 2003-11-11 | Micronic Laser Systems Ab | Dual layer reticle blank and manufacturing process |
US20020197565A1 (en) | 2001-06-21 | 2002-12-26 | I-Pien Wu | Method of transferring photomask patterns |
US7034963B2 (en) | 2001-07-11 | 2006-04-25 | Applied Materials, Inc. | Method for adjusting edges of grayscale pixel-map images |
US6618185B2 (en) | 2001-11-28 | 2003-09-09 | Micronic Laser Systems Ab | Defective pixel compensation method |
US6717650B2 (en) | 2002-05-01 | 2004-04-06 | Anvik Corporation | Maskless lithography with sub-pixel resolution |
US6819463B2 (en) | 2002-05-10 | 2004-11-16 | Corporation For National Research Initiatives | Electro-optic phase-only spatial light modulator |
US6828542B2 (en) | 2002-06-07 | 2004-12-07 | Brion Technologies, Inc. | System and method for lithography process monitoring and control |
US7186486B2 (en) | 2003-08-04 | 2007-03-06 | Micronic Laser Systems Ab | Method to pattern a substrate |
WO2005057291A1 (en) * | 2003-12-11 | 2005-06-23 | Micronic Laser Systems Ab | Method and apparatus for patterning a workpiece and methods of manufacturing the same |
EP1719018A1 (en) * | 2004-02-25 | 2006-11-08 | Micronic Laser Systems Ab | Methods for exposing patterns and emulating masks in optical maskless lithography |
US7227687B1 (en) | 2004-06-25 | 2007-06-05 | Silicon Light Machines Corporation | Complex spatial light modulator |
US7400382B2 (en) * | 2005-04-28 | 2008-07-15 | Asml Holding N.V. | Light patterning device using tilting mirrors in a superpixel form |
US7209275B2 (en) * | 2005-06-30 | 2007-04-24 | Asml Holding N.V. | Method and system for maskless lithography real-time pattern rasterization and using computationally coupled mirrors to achieve optimum feature representation |
US7502160B2 (en) | 2007-03-02 | 2009-03-10 | Alcatel-Lucent Usa Inc. | Speckle reduction in laser-projector images |
-
2009
- 2009-04-24 KR KR1020107026355A patent/KR101657053B1/en active IP Right Grant
- 2009-04-24 CN CN200980121054.0A patent/CN102084280B/en active Active
- 2009-04-24 US US12/430,046 patent/US8077377B2/en active Active
- 2009-04-24 EP EP09734982.3A patent/EP2269108B1/en active Active
- 2009-04-24 WO PCT/IB2009/005765 patent/WO2009130603A2/en active Application Filing
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0477566A2 (en) * | 1990-09-28 | 1992-04-01 | Texas Instruments Incorporated | Improvements in or relating to light modulation |
US6169624B1 (en) * | 1999-08-11 | 2001-01-02 | Asif A. Godil | Achromatic optical modulators |
US6501600B1 (en) * | 1999-08-11 | 2002-12-31 | Lightconnect, Inc. | Polarization independent grating modulator |
US6590695B1 (en) * | 2002-02-26 | 2003-07-08 | Eastman Kodak Company | Micro-mechanical polarization-based modulator |
US20040251430A1 (en) * | 2003-06-12 | 2004-12-16 | Micronic Laser Systems Ab | Method for high precision printing of patterns |
US20080002155A1 (en) * | 2003-11-01 | 2008-01-03 | Fusao Ishii | Spatial light modulator with sub-wavelength structure |
US7170669B1 (en) * | 2005-09-28 | 2007-01-30 | Anvik Corporation | Spatial light modulator array with heat minimization and image enhancement features |
US20080024745A1 (en) * | 2006-07-31 | 2008-01-31 | Asml Netherlands B.V. | Patterning device utilizing sets of stepped mirrors and method of using same |
Non-Patent Citations (2)
Title |
---|
FLORENCE JAMES M ET AL: "Full-complex spatial filtering with a phase mostly DMD", PROCEEDINGS OF THE SPIE - THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, SPIE, US, vol. 1558, 1 January 1991 (1991-01-01), pages 487 - 498, XP007910081 * |
GALE M T ET AL: "Replication technology for optical microsystems", OPTICS AND LASERS IN ENGINEERING, ELSEVIER, vol. 43, no. 3-5, 1 March 2005 (2005-03-01), pages 373 - 386, XP004629257, ISSN: 0143-8166 * |
Also Published As
Publication number | Publication date |
---|---|
KR101657053B1 (en) | 2016-09-13 |
KR20110008274A (en) | 2011-01-26 |
CN102084280A (en) | 2011-06-01 |
EP2269108A2 (en) | 2011-01-05 |
EP2269108B1 (en) | 2017-11-01 |
US20090303571A1 (en) | 2009-12-10 |
CN102084280B (en) | 2015-07-15 |
WO2009130603A2 (en) | 2009-10-29 |
US8077377B2 (en) | 2011-12-13 |
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