WO2009144071A1 - Arrangement and method for removing alkali- or alkaline earth-metals from a vacuum coating chamber - Google Patents
Arrangement and method for removing alkali- or alkaline earth-metals from a vacuum coating chamber Download PDFInfo
- Publication number
- WO2009144071A1 WO2009144071A1 PCT/EP2009/054214 EP2009054214W WO2009144071A1 WO 2009144071 A1 WO2009144071 A1 WO 2009144071A1 EP 2009054214 W EP2009054214 W EP 2009054214W WO 2009144071 A1 WO2009144071 A1 WO 2009144071A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- coating chamber
- vacuum coating
- gas
- arrangement
- metals
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4405—Cleaning of reactor or parts inside the reactor by using reactive gases
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Battery Electrode And Active Subsutance (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Vapour Deposition (AREA)
- Secondary Cells (AREA)
Abstract
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011510915A JP5623390B2 (en) | 2008-05-30 | 2009-04-08 | Apparatus and method for removing alkali metal or alkaline earth metal from a vacuum coating chamber |
CN200980120576.9A CN102046833B (en) | 2008-05-30 | 2009-04-08 | Arrangement and method for removing alkali- or alkaline earth-metals from a vacuum coating chamber |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/130,572 US8083859B2 (en) | 2008-05-30 | 2008-05-30 | Arrangement and method for removing alkali- or alkaline earth-metals from a vacuum coating chamber |
EP08009925.2A EP2130940B1 (en) | 2008-05-30 | 2008-05-30 | Arrangement and method for removing alkali- or alkaline earth-metals from a vacuum coating chamber |
EP08009925.2 | 2008-05-30 | ||
US12/130,572 | 2008-05-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009144071A1 true WO2009144071A1 (en) | 2009-12-03 |
Family
ID=40666844
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2009/054214 WO2009144071A1 (en) | 2008-05-30 | 2009-04-08 | Arrangement and method for removing alkali- or alkaline earth-metals from a vacuum coating chamber |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5623390B2 (en) |
KR (1) | KR101613982B1 (en) |
CN (1) | CN102046833B (en) |
TW (1) | TWI391506B (en) |
WO (1) | WO2009144071A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012008455A1 (en) * | 2010-07-13 | 2012-01-19 | 株式会社アルバック | Film-forming apparatus and method for cleaning film-forming apparatus |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5202420B2 (en) * | 2009-04-09 | 2013-06-05 | 株式会社アルバック | Method for removing thin film adhering to vacuum parts |
JP5839556B2 (en) * | 2011-11-18 | 2016-01-06 | 株式会社半導体エネルギー研究所 | Deposition method |
RU2503083C1 (en) * | 2012-05-22 | 2013-12-27 | Закрытое акционерное общество "Инновационный центр "Бирюч" (ЗАО "ИЦ "Бирюч") | Differential ion mobility spectrometer |
TWI495754B (en) * | 2013-02-01 | 2015-08-11 | Adpv Technology Ltd Intetrust | Vacuum coating equipment vacuum measurement device |
CN105274465B (en) * | 2015-11-17 | 2018-01-30 | 沈阳仪表科学研究院有限公司 | The renovation process of vacuum coating intracavitary part cleaning rough surface |
JP7378220B2 (en) * | 2019-04-17 | 2023-11-13 | 株式会社アルバック | Film forming equipment and vacuum parts processing method |
CN110928012A (en) * | 2019-12-06 | 2020-03-27 | 深圳市康盛光电科技有限公司 | Anti-electric breakdown preparation method of ITO conductive film for light modulation film |
CN112501616B (en) * | 2020-11-10 | 2023-03-07 | 合肥综合性国家科学中心能源研究院(安徽省能源实验室) | Method and device for removing lithium alloy adhered to surface of metal sample piece |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0441368A1 (en) * | 1990-02-09 | 1991-08-14 | Applied Materials, Inc. | Method and device for removing excess material from a sputtering chamber |
US5055169A (en) * | 1989-03-17 | 1991-10-08 | The United States Of America As Represented By The Secretary Of The Army | Method of making mixed metal oxide coated substrates |
JP2002206160A (en) * | 2001-01-09 | 2002-07-26 | Sumitomo Electric Ind Ltd | Thin film manufacturing apparatus thin film deposition method, and member for thin film manufacturing apparatus |
US20020185067A1 (en) * | 2001-06-07 | 2002-12-12 | International Business Machines Corporation | Apparatus and method for in-situ cleaning of a throttle valve in a CVD system |
JP2003229365A (en) * | 2002-02-04 | 2003-08-15 | Central Glass Co Ltd | Mixed cleaning gas composition |
US20070163617A1 (en) * | 2004-02-19 | 2007-07-19 | Tokyo Electron Limited | Method for cleaning treatment chamber iIn substrate treating apparatus and method for detecting endpoint of cleaning |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19609970A1 (en) * | 1996-03-14 | 1997-09-18 | Leybold Systems Gmbh | Device for applying thin layers on a substrate |
JP2003007290A (en) * | 2001-06-19 | 2003-01-10 | Sanyo Electric Co Ltd | Manufacturing apparatus of electrode for lithium secondary battery |
DE10358275A1 (en) * | 2003-12-11 | 2005-07-21 | Wiessner Gmbh | Apparatus and method for cleaning at least one process chamber for coating at least one substrate |
KR100989974B1 (en) * | 2005-02-02 | 2010-10-26 | 도쿄엘렉트론가부시키가이샤 | Method for cleaning and method for plasma treatment |
EP2081682B1 (en) * | 2006-09-08 | 2018-05-30 | Signa Chemistry, Inc. | Lithium reagent porous metal oxide compositions |
-
2009
- 2009-04-08 JP JP2011510915A patent/JP5623390B2/en not_active Expired - Fee Related
- 2009-04-08 KR KR1020107029837A patent/KR101613982B1/en active IP Right Grant
- 2009-04-08 CN CN200980120576.9A patent/CN102046833B/en not_active Expired - Fee Related
- 2009-04-08 WO PCT/EP2009/054214 patent/WO2009144071A1/en active Application Filing
- 2009-05-14 TW TW98116043A patent/TWI391506B/en not_active IP Right Cessation
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5055169A (en) * | 1989-03-17 | 1991-10-08 | The United States Of America As Represented By The Secretary Of The Army | Method of making mixed metal oxide coated substrates |
EP0441368A1 (en) * | 1990-02-09 | 1991-08-14 | Applied Materials, Inc. | Method and device for removing excess material from a sputtering chamber |
JP2002206160A (en) * | 2001-01-09 | 2002-07-26 | Sumitomo Electric Ind Ltd | Thin film manufacturing apparatus thin film deposition method, and member for thin film manufacturing apparatus |
US20020185067A1 (en) * | 2001-06-07 | 2002-12-12 | International Business Machines Corporation | Apparatus and method for in-situ cleaning of a throttle valve in a CVD system |
JP2003229365A (en) * | 2002-02-04 | 2003-08-15 | Central Glass Co Ltd | Mixed cleaning gas composition |
US20070163617A1 (en) * | 2004-02-19 | 2007-07-19 | Tokyo Electron Limited | Method for cleaning treatment chamber iIn substrate treating apparatus and method for detecting endpoint of cleaning |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012008455A1 (en) * | 2010-07-13 | 2012-01-19 | 株式会社アルバック | Film-forming apparatus and method for cleaning film-forming apparatus |
JP5553898B2 (en) * | 2010-07-13 | 2014-07-16 | 株式会社アルバック | Film forming apparatus and method for cleaning film forming apparatus |
Also Published As
Publication number | Publication date |
---|---|
JP2011522117A (en) | 2011-07-28 |
TW201006942A (en) | 2010-02-16 |
CN102046833B (en) | 2013-03-27 |
CN102046833A (en) | 2011-05-04 |
TWI391506B (en) | 2013-04-01 |
JP5623390B2 (en) | 2014-11-12 |
KR20110015659A (en) | 2011-02-16 |
KR101613982B1 (en) | 2016-04-20 |
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