WO2009144071A1 - Arrangement and method for removing alkali- or alkaline earth-metals from a vacuum coating chamber - Google Patents

Arrangement and method for removing alkali- or alkaline earth-metals from a vacuum coating chamber Download PDF

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Publication number
WO2009144071A1
WO2009144071A1 PCT/EP2009/054214 EP2009054214W WO2009144071A1 WO 2009144071 A1 WO2009144071 A1 WO 2009144071A1 EP 2009054214 W EP2009054214 W EP 2009054214W WO 2009144071 A1 WO2009144071 A1 WO 2009144071A1
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WO
WIPO (PCT)
Prior art keywords
coating chamber
vacuum coating
gas
arrangement
metals
Prior art date
Application number
PCT/EP2009/054214
Other languages
French (fr)
Inventor
Stefan Bangert
Jose Manuel Dieguez-Campo
Michael König
Nety M. Krishna
Byung-Sung Leo Kwak
Original Assignee
Applied Materials, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US12/130,572 external-priority patent/US8083859B2/en
Priority claimed from EP08009925.2A external-priority patent/EP2130940B1/en
Application filed by Applied Materials, Inc. filed Critical Applied Materials, Inc.
Priority to JP2011510915A priority Critical patent/JP5623390B2/en
Priority to CN200980120576.9A priority patent/CN102046833B/en
Publication of WO2009144071A1 publication Critical patent/WO2009144071A1/en

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4405Cleaning of reactor or parts inside the reactor by using reactive gases

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
  • Secondary Cells (AREA)

Abstract

The invention relates to a cleaning method in which from a vacuum coating chamber (3) of a coating installation (1 ) for the coating of substrates (2) with alkali- or alkaline earth-metals, residues of alkali- or alkaline earth-metals are removed. For this purpose into the chamber (3) a gas from the group of N2, O2 or air is introduced, which reacts with the alkali- or alkaline earth-metals to form the corresponding solid compounds. Water can additionally be introduced into the vacuum coating chamber (3). After the alkali- or alkaline earth-metals have reacted with the gas, the corresponding solid compound is removed from the vacuum coating chamber.

Description

Arrangement and method for removing alkali- or alkaline earth-metals from a vacuum coating chamber
Description
The invention relates to an arrangement and a method according to the preambles of claims 1 and 11.
Modern lithium batteries are, as a rule, produced in a vacuum chamber, wherein a substrate is provided with a lithium layer. The lithium layer is formed, for example, through the deposition on the substrate of lithium in the vapor state. Since lithium is highly reactive, contact by the operating personnel after opening the vacuum chamber must be avoided. Even if the excess lithium has been pumped out of the vacuum chamber, it is still possible for lithium particles deposited on the inner wall of the vacuum chamber or on facings and/or maskings to harm the operating personnel.
Methods for the production of lithium batteries are already known in which lithium is converted in a vacuum chamber into vapor, which is subsequently deposited on a substrate (JP 59-060866, JP 2003-007290, JP 2003-234100, JP 2007-207663). Nothing is found in these publications regarding the cleaning of the vacuum chamber.
It is further known to eliminate undesirable depositions on the inside of a coating installation by means of a cleaning gas (JP 2003-229365). However, lithium or alkali metals are herein not listed.
Furthermore, cleaning a process chamber by means of a gas containing O2 is known (US 2007/0163617 A1 ). Herein the cleaning is carried out at increased temperature and under vacuum. The gas preferably also contains H radicals, since the cleaning process can also be carried out by means of a plasma. However, the walls of the process chamber are cleaned of tungsten and not of lithium or another aggressive material.
A further method for cleaning coating chambers is disclosed in DE 103 38 275 A1. In this method the process chamber is flushed with a conditioned purge gas before a coating process. The purge gas is preferably comprised of O2 and N2 with a humidity value of maximally 30%. The coating chamber is cleaned before the coating process and the coating material is not lithium.
US 2002/0185067 A1 discloses a device and a method for the in situ cleaning of a throttle valve in a CVD system. Here a cleaning gas is introduced which can comprise F2, C2F6, O2 or NF3. Lithium is not discussed.
A cleaning process for a coating chamber is furthermore known in which inter alia N2 and O2 are employed as cleaning gases (EP 1 612 857 A1 ). These gases are converted to plasma and subsequently serve for cleaning the inner wall of a CVD chamber. High frequency is utilized for the generation of the plasma. However, not Li, but rather Si3N4 or SiO2 are removed.
EP 0 441 368 A discloses a device and a method for eliminating excess material from a PVD chamber. During a cleaning cycle a vacuum is generated in the PVD chamber and a gas mixture with reactive gas is introduced into the PVD chamber. The reactive gas is herein activated through plasma discharge. The objects of the cleaning are also screenings. The eliminated material is Ti, W or Al, not however Li.
JP 2002-206160 discloses an apparatus for manufacturing a thin film of lithium metal or lithium alloy. To remove the lithium metal adhering to the inner wall of the apparatus, a heater is provided to melt the lithium metal adhering to the inner wall. By melting and removing the lithium metal adhering to the apparatus, the danger of ignition and explosion resultant from the reaction of the lithium metal with moisture when the apparatus is opened to the atmospheric air can be avoided.
The invention addresses the problem of cleaning such parts of a vacuum coating chamber which during the production of thin-film batteries are unintentionally coated, for example maskings, metal lining sheets and the like.
This problem is solved according to the features of claims 1 and 11.
The advantage attained with the invention comprises in particular that unintentionally coated parts are cleaned in simple manner and the cycle times or service times are shortened. Since the cleaning can also be carried out cyclically, it is possible to operate a coating installation without interruption.
The invention consequently relates to a cleaning method in which from a vacuum coating chamber of a coating installation for the coating of substrates with alkali- or alkaline earth-metals, residues of alkali or alkaline earth-metals are removed. For this purpose into the chamber a gas from the group of N2, O2 or air is introduced which reacts with the alkali- or alkaline earth-metals to form the corresponding solid compounds. Water can still also be additionally introduced into the vacuum coating chamber.
After the alkali- or alkaline earth-metals have reacted with the gas, the corresponding solid compound is removed from the vacuum coating chamber.
An embodiment example of the invention is shown in the drawing and will be described in further detail in the following. In the drawing depict:
Fig. 1 a vacuum chamber for coating a substrate by means of a vaporized material.
A coating installation 1 , in which a substrate 2 can be coated, is shown in Figure 1 in sectional view. This coating installation 1 includes a vacuum coating chamber 3, of which two side-walls 4, 5 are evident. Masking 6 is disposed between the substrate 2 and a vapor feed system 7, which comprises a vaporizer crucible 8, a valve 9 and a vapor inlet 10 to 13. The end of the vapor inlet is formed by a linear distributor 14 implemented as a vertically oriented tube with linearly disposed openings. These openings are located opposite the masking 6. By 15, 16 are denoted covers in the vacuum chamber 3.
In the vaporizer crucible 8 is melted, for example, lithium for the production of thin- film lithium batteries and vaporized. Instead of lithium, another reactive metal from the group of alkali- and alkaline earth-metals, for example cesium, could also be utilized. The vaporized material arrives via the vapor inlet 10 to 13 at the distributor 14 and from here, via the masking 6, which does not need to be provided in every case, at the substrate 2. In addition, the vaporized material also reaches the covers 15, 16 and other parts which it is not intended to reach.
When the coating of substrate 2 is completed, the unintentionally coated parts must be freed of the coating in order for the operating personnel not to be harmed by the reactive lithium when opening the vacuum chamber 3 and removing the coated substrate 2.
However, in order for a person not to come into contact with the lithium or other alkaline earth- or alkali-metals, these metals must be removed from the installation. The removal of these reactive metals from the installation takes place after the coating process has been terminated and the substrates have been transferred from the coating installation 1 via a vacuum lock, not shown in Figure 1. After the substrates have been removed from the coating installation 1 , one or several gases are introduced into the vacuum chamber 3 before the opening the vacuum chamber 3.
For this purpose, outside of vacuum chamber 3 several gas containers 20, 21 , 22 are provided which contain the gases N2, O2 or air. Activation of the gases is not absolutely required. These gas tanks 20, 21 , 22 are connected via supply pipes 23, 24, 25 and valves 26, 27, 28 with the vacuum chamber 3. If N2 is introduced into the vacuum chamber 3, the N2 molecules combine with lithium according to the equation 6 Li + N2 □ 2 Li3N. This end product is a solid which falls from the vertical surfaces to the bottom of the vacuum chamber 3 or adheres at the site of the reaction.
If O2 is introduced into the vacuum chamber 3, based on the expression 4 Li + O2 the colorless powdery solid compound Li2O is formed, which is also nontoxic and falls from vertical parts.
It is understood that instead of pure oxygen, air can also be introduced into the vacuum chamber 3. This air can herein be enriched with O2. Since air contains both nitrogen as well as also oxygen, lithium consequently reacts with the nitrogen as well as also with the oxygen. It is here advantageous if the air has a certain humidity. To this end the air can additionally be enriched with water. If there is also water contained in the air, the following reaction takes place: Li + H2O D LiOH + D H2.
When air and water are introduced, in addition to Li3N and Li2O, LiOH and Li2COs are also formed.
For instance, Li2COs is formed through the following reaction: 2 LiOH + CO2 D Li2CO3 + H2O.
At high temperatures Li2CO3 breaks down again into Li2O and CO2. The same applies also to LiOH which breaks down into Li2O and H2O. The lithium compounds must in every case be nontoxic and remain stable in air.
Since the reactions of H2O, O2 and N2 are exothermic, it is advantageous to cool the vacuum chamber 3. This can be carried out by means of a cooling system, not depicted in Figure 1.
In principle, the metal Li, or also the other alkali- and alkaline earth-metals, can be made to react with other substances, such as, for example, with halogens or hydrogen compounds of these halogens.
However, since these halogens or halogen compounds are highly reactive and can also chemically attack the chamber, it is necessary when employing these compounds to build the chamber of a material that is chemically inert relative to these compounds.
Although activation of the gases is not absolutely required, it is nevertheless advantageous to carry out the reaction at increased temperatures. A temperature in the range from 30° C up to 200° C can be selected, at which the reaction is started. It is obvious that at higher temperatures the reaction proceeds faster. It is of advantage if the reaction takes place at a pressure of up to 100 mbar. The choice of temperature as well as of pressure depends substantially on the design of the vacuum chamber 3. If only pure oxygen is utilized as the gas, the temperature can be, for example, 80° C and the pressure of the oxygen 100 mbar. This ensures optimal reaction conditions.
It is advantageous if during the cleaning process the reaction is monitored by means of a gas sensor 32. A gas sensor 32 to be considered is, for example, a mass spectrometer, a lambda probe or an IR or NIR spectrometer. Via these measuring devices the gas composition can be determined during the process. If a lambda probe is employed, oxygen is preferably added to the gas or gas mixture. In this case the oxygen content can be determined during the process. As long as there is still lithium in the chamber and reacts with the gases, the concentration of the reactive gases is below the concentration of the gases before their introduction into the vacuum chamber 3 vitiated with lithium. As soon as the lithium has reacted with the gases, the concentration of the gases reaches the starting value again. This indicates that the reaction process has been completed. The gas composition, which had been determined by means of the gas sensor 32, is supplied to an evaluation instrument 33. When the process is completed, by means of a pump 30 and an extraction fitting 31 the powder on the bottom of the vacuum chamber 3 can be suctioned out. It is also possible to vent the vacuum chamber 3 and subsequently to remove the powder by means of a dust extractor. It is herein advantageous to remove the lithium salt adhering on the walls of the vacuum chamber 3 by means of ultrasound such that it falls to the bottom. This facilitates the cleaning work considerably. By setting parameters such as, for example, pressure, temperature or the moisture content in the form of water in the gas or the gas mixture, the reaction with the lithium can be accelerated. In order to enrich gases with moisture, water is introduced into the vacuum chamber 3 via a feed pipe 35.
Whether the lithium salts remain adhered to the surface after the cleaning process or spall off and consequently fall to the bottom of the vacuum chamber 3 depends substantially on the layer thicknesses of the formed lithium salts. If the lithium layers formed in the coating reaction are very thin, salts with a very small grain diameter are formed in the cleaning process. Such lithium layers remain preferably well adhered on the walls of the vacuum chamber 3. If during the coating process thick lithium layers have been formed on the walls of the vacuum chamber, layers are formed in the cleaning reaction with the gases, which layers are under mechanical stress, which can lead to the spalling of the coating. For this reason it can be advantageous to remove the salt residues still adhering on the walls of the vacuum chamber 3 by means of ultrasound.
Those skilled in the art can readily recognize that numerous variations and substitutions may be made in the invention, its use and its configuration to achieve substantially the same results as achieved by the embodiments described herein. Accordingly, there is no intention to limit the invention to the disclosed exemplary forms. Many variations, modifications and alternative constructions fall within the scope and spirit of the disclosed invention as expressed in the claims.
Reference numerals
1 coating installation
2 substrate
3 vacuum coating chamber
4 side-wall
5 side-wall
6 masking
7 vapor feed system
8 vaporizer crucible
9 valve
10 vapor inlet
11 vapor inlet
12 vapor inlet
13 vapor inlet
14 linear distributor
15 cover
16 cover
20 gas container
21 gas container
22 gas container
23 supply pipe
24 supply pipe
25 supply pipe
26 valve
27 valve
28 valve
30 pump
31 extraction fitting
32 gas sensor
33 evaluation instrument
35 feed pipe

Claims

AMENDED CLAIMS received by the International Bureau on 24 July 2009 (24.07.2009)
1. Arrangement for removing alkali- or alkaline earth-metals from a vacuum coating chamber (3) of a coating installation (1 ) with at least one gas tank (20 - 22) connected via a supply pipe (23 - 25) with the vacuum coating chamber (3), which gas tank contains a gas from the group N2, O2 or air.
2. Arrangement as claimed in claim 1 , characterized in that between the at least one gas tank (20 - 22) and the vacuum coating chamber (3) a valve (26 - 28) is provided.
3. Arrangement as claimed in claim 1 , characterized in that the vacuum coating chamber (3) includes a feed pipe (35) for H2O, via which H2O can be introduced into the vacuum coating chamber (3).
4. Arrangement as claimed in claim 1 , characterized in that the vacuum coating chamber (3) includes means with which the vacuum coating chamber (3) can be exposed to ultrasound.
5. Arrangement as claimed in claim 1 , characterized in that the vacuum coating chamber (3) includes at least one gas sensor (32).
6. Arrangement as claimed in claim 5, characterized in that the gas sensor (32) is a mass spectrometer.
7. Arrangement as claimed in claim 5, characterized in that the gas sensor (32) is a lambda probe.
8. Arrangement as claimed in claim 1 , characterized in that the vacuum coating chamber (3) includes at the bottom an extraction fitting (31 ) which is connected to a pump (30).
9. Arrangement as claimed in claim 5, characterized in that the gas sensor (32) is an IR or NIR spectroscope.
10. Arrangement as claimed in claim 1 , characterized in that the metal is lithium.
11. Method for removing alkali- or alkaline earth-metals from a vacuum coating chamber (3) of a coating installation (1 ), characterized by the following steps: a) the vacuum coating chamber (3) is set under vacuum after the coating process has been completed, b) a gas from the group of N2, O2 or air is introduced into the vacuum coating chamber (3) such that the gas reacts with the alkali- or alkaline earth-metals in the vacuum coating chamber (3) and forms a solid compound, c) the solid compound is removed from the vacuum coating chamber (3).
12. Method as claimed in claim 11 , characterized in that the metal is lithium.
13. Method as claimed in claim 11 , characterized in that H2O is additionally introduced into the vacuum coating chamber (3).
14. Method as claimed in claim 11 , characterized in that the air is enriched with O2.
15. Method as claimed in claim 11 , characterized in that the gas content during the reaction is determined by means of a gas sensor (32).
16. Method as claimed in claim 15, characterized in that the gas content is determined by means of a mass spectrometer.
17. Method as claimed in claim 15, characterized in that the oxygen content is determined by means of a lambda probe.
18. Method as claimed in claim 11 , characterized in that at the beginning of the process a temperature of 30° C up to 200° C is set.
19. Method as claimed in claim 18, characterized in that the temperature is 80° C.
20. Method as claimed in claim 11 , characterized in that a pressure of 100 mbar is set.
21. Method as claimed in claim 11 , characterized in that the solid compound is removed from the vacuum coating chamber (3) by means of an extraction fitting (31 ) connected to a pump (30).
22. Method as claimed in claim 11 , characterized in that the solid compound is removed from the vacuum coating chamber (3) by means of a dust extractor.
23. Method as claimed in claim 21 or 22, characterized in that the solid compound formed is detached by means of ultrasound from the walls of the vacuum coating chamber (3) before being removed from the vacuum coating chamber (3).
24. Method as claimed in claim 15, characterized in that the gas content is determined by means of an IR or NIR spectroscope.
PCT/EP2009/054214 2008-05-30 2009-04-08 Arrangement and method for removing alkali- or alkaline earth-metals from a vacuum coating chamber WO2009144071A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2011510915A JP5623390B2 (en) 2008-05-30 2009-04-08 Apparatus and method for removing alkali metal or alkaline earth metal from a vacuum coating chamber
CN200980120576.9A CN102046833B (en) 2008-05-30 2009-04-08 Arrangement and method for removing alkali- or alkaline earth-metals from a vacuum coating chamber

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US12/130,572 US8083859B2 (en) 2008-05-30 2008-05-30 Arrangement and method for removing alkali- or alkaline earth-metals from a vacuum coating chamber
EP08009925.2A EP2130940B1 (en) 2008-05-30 2008-05-30 Arrangement and method for removing alkali- or alkaline earth-metals from a vacuum coating chamber
EP08009925.2 2008-05-30
US12/130,572 2008-05-30

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WO2009144071A1 true WO2009144071A1 (en) 2009-12-03

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KR (1) KR101613982B1 (en)
CN (1) CN102046833B (en)
TW (1) TWI391506B (en)
WO (1) WO2009144071A1 (en)

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* Cited by examiner, † Cited by third party
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WO2012008455A1 (en) * 2010-07-13 2012-01-19 株式会社アルバック Film-forming apparatus and method for cleaning film-forming apparatus

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JP5202420B2 (en) * 2009-04-09 2013-06-05 株式会社アルバック Method for removing thin film adhering to vacuum parts
JP5839556B2 (en) * 2011-11-18 2016-01-06 株式会社半導体エネルギー研究所 Deposition method
RU2503083C1 (en) * 2012-05-22 2013-12-27 Закрытое акционерное общество "Инновационный центр "Бирюч" (ЗАО "ИЦ "Бирюч") Differential ion mobility spectrometer
TWI495754B (en) * 2013-02-01 2015-08-11 Adpv Technology Ltd Intetrust Vacuum coating equipment vacuum measurement device
CN105274465B (en) * 2015-11-17 2018-01-30 沈阳仪表科学研究院有限公司 The renovation process of vacuum coating intracavitary part cleaning rough surface
JP7378220B2 (en) * 2019-04-17 2023-11-13 株式会社アルバック Film forming equipment and vacuum parts processing method
CN110928012A (en) * 2019-12-06 2020-03-27 深圳市康盛光电科技有限公司 Anti-electric breakdown preparation method of ITO conductive film for light modulation film
CN112501616B (en) * 2020-11-10 2023-03-07 合肥综合性国家科学中心能源研究院(安徽省能源实验室) Method and device for removing lithium alloy adhered to surface of metal sample piece

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0441368A1 (en) * 1990-02-09 1991-08-14 Applied Materials, Inc. Method and device for removing excess material from a sputtering chamber
US5055169A (en) * 1989-03-17 1991-10-08 The United States Of America As Represented By The Secretary Of The Army Method of making mixed metal oxide coated substrates
JP2002206160A (en) * 2001-01-09 2002-07-26 Sumitomo Electric Ind Ltd Thin film manufacturing apparatus thin film deposition method, and member for thin film manufacturing apparatus
US20020185067A1 (en) * 2001-06-07 2002-12-12 International Business Machines Corporation Apparatus and method for in-situ cleaning of a throttle valve in a CVD system
JP2003229365A (en) * 2002-02-04 2003-08-15 Central Glass Co Ltd Mixed cleaning gas composition
US20070163617A1 (en) * 2004-02-19 2007-07-19 Tokyo Electron Limited Method for cleaning treatment chamber iIn substrate treating apparatus and method for detecting endpoint of cleaning

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19609970A1 (en) * 1996-03-14 1997-09-18 Leybold Systems Gmbh Device for applying thin layers on a substrate
JP2003007290A (en) * 2001-06-19 2003-01-10 Sanyo Electric Co Ltd Manufacturing apparatus of electrode for lithium secondary battery
DE10358275A1 (en) * 2003-12-11 2005-07-21 Wiessner Gmbh Apparatus and method for cleaning at least one process chamber for coating at least one substrate
KR100989974B1 (en) * 2005-02-02 2010-10-26 도쿄엘렉트론가부시키가이샤 Method for cleaning and method for plasma treatment
EP2081682B1 (en) * 2006-09-08 2018-05-30 Signa Chemistry, Inc. Lithium reagent porous metal oxide compositions

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5055169A (en) * 1989-03-17 1991-10-08 The United States Of America As Represented By The Secretary Of The Army Method of making mixed metal oxide coated substrates
EP0441368A1 (en) * 1990-02-09 1991-08-14 Applied Materials, Inc. Method and device for removing excess material from a sputtering chamber
JP2002206160A (en) * 2001-01-09 2002-07-26 Sumitomo Electric Ind Ltd Thin film manufacturing apparatus thin film deposition method, and member for thin film manufacturing apparatus
US20020185067A1 (en) * 2001-06-07 2002-12-12 International Business Machines Corporation Apparatus and method for in-situ cleaning of a throttle valve in a CVD system
JP2003229365A (en) * 2002-02-04 2003-08-15 Central Glass Co Ltd Mixed cleaning gas composition
US20070163617A1 (en) * 2004-02-19 2007-07-19 Tokyo Electron Limited Method for cleaning treatment chamber iIn substrate treating apparatus and method for detecting endpoint of cleaning

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012008455A1 (en) * 2010-07-13 2012-01-19 株式会社アルバック Film-forming apparatus and method for cleaning film-forming apparatus
JP5553898B2 (en) * 2010-07-13 2014-07-16 株式会社アルバック Film forming apparatus and method for cleaning film forming apparatus

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Publication number Publication date
JP2011522117A (en) 2011-07-28
TW201006942A (en) 2010-02-16
CN102046833B (en) 2013-03-27
CN102046833A (en) 2011-05-04
TWI391506B (en) 2013-04-01
JP5623390B2 (en) 2014-11-12
KR20110015659A (en) 2011-02-16
KR101613982B1 (en) 2016-04-20

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