WO2014176378A3 - Defined dosing atmospheric temperature and pressure vapor deposition system - Google Patents

Defined dosing atmospheric temperature and pressure vapor deposition system Download PDF

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Publication number
WO2014176378A3
WO2014176378A3 PCT/US2014/035206 US2014035206W WO2014176378A3 WO 2014176378 A3 WO2014176378 A3 WO 2014176378A3 US 2014035206 W US2014035206 W US 2014035206W WO 2014176378 A3 WO2014176378 A3 WO 2014176378A3
Authority
WO
WIPO (PCT)
Prior art keywords
cartridge
vapor deposition
chemical
deposition system
chemical vapor
Prior art date
Application number
PCT/US2014/035206
Other languages
French (fr)
Other versions
WO2014176378A2 (en
Inventor
Russell C. SLAYBAUGH
Michael Stephen METCALFE
Adam Zax
Guillermo SETA
Original Assignee
Diamon Fusion International, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Diamon Fusion International, Inc. filed Critical Diamon Fusion International, Inc.
Priority to MX2015014937A priority Critical patent/MX2015014937A/en
Priority to CN201480023730.1A priority patent/CN105264112A/en
Priority to EP14788444.9A priority patent/EP2989228A4/en
Priority to KR1020157033332A priority patent/KR20160022299A/en
Priority to CA2909532A priority patent/CA2909532A1/en
Priority to BR112015027019A priority patent/BR112015027019A2/en
Priority to JP2016510769A priority patent/JP2016524648A/en
Priority to AU2014257128A priority patent/AU2014257128A1/en
Publication of WO2014176378A2 publication Critical patent/WO2014176378A2/en
Publication of WO2014176378A3 publication Critical patent/WO2014176378A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4408—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber by purging residual gases from the reaction chamber or gas lines
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45519—Inert gas curtains
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating

Abstract

A closed chemical introduction system used to deliver active ingredients in liquid chemical to a chemical vapor deposition system includes a robust, moisture-free cartridge containing a defined dose of liquid chemical. The cartridge is placed on a mounting slot specially configured to receive the cartridge. Upon initiating the system, a first linear mechanical actuator securely holds the cartridge in the slot, while an extraction lance attached to a second linear mechanical actuator punctures the cartridge from the bottom, extracts the liquid chemical and delivers it to a vaporization chamber. The vaporization chamber evaporates the liquid chemical and delivers the vapors containing the active ingredients to the chemical vapor deposition system. The chemical vapor deposition system may include a treatment chamber, a conveyor, a compressed clean air system to provide separate treatment compartments within the chamber, a moisture system, a chemical vapor system, and a neutralization system to neutralize harmful byproducts.
PCT/US2014/035206 2013-04-24 2014-04-23 Defined dosing atmospheric temperature and pressure vapor deposition system WO2014176378A2 (en)

Priority Applications (8)

Application Number Priority Date Filing Date Title
MX2015014937A MX2015014937A (en) 2013-04-24 2014-04-23 Defined dosing atmospheric temperature and pressure vapor deposition system.
CN201480023730.1A CN105264112A (en) 2013-04-24 2014-04-23 Defined dosing atmospheric temperature and pressure vapor deposition system
EP14788444.9A EP2989228A4 (en) 2013-04-24 2014-04-23 Defined dosing atmospheric temperature and pressure vapor deposition system
KR1020157033332A KR20160022299A (en) 2013-04-24 2014-04-23 Defined dosing atmospheric temperature and pressure vapor deposition system
CA2909532A CA2909532A1 (en) 2013-04-24 2014-04-23 Defined dosing atmospheric temperature and pressure vapor deposition system
BR112015027019A BR112015027019A2 (en) 2013-04-24 2014-04-23 DEFINED DOSAGE PRESSURE VAPOR DEPOSITION SYSTEM AND ATMOSPHERIC TEMPERATURE
JP2016510769A JP2016524648A (en) 2013-04-24 2014-04-23 Normal administration atmospheric temperature and atmospheric pressure deposition system
AU2014257128A AU2014257128A1 (en) 2013-04-24 2014-04-23 Defined dosing atmospheric temperature and pressure vapor deposition system

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201361815649P 2013-04-24 2013-04-24
US61/815,649 2013-04-24

Publications (2)

Publication Number Publication Date
WO2014176378A2 WO2014176378A2 (en) 2014-10-30
WO2014176378A3 true WO2014176378A3 (en) 2015-10-29

Family

ID=51788164

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2014/035206 WO2014176378A2 (en) 2013-04-24 2014-04-23 Defined dosing atmospheric temperature and pressure vapor deposition system

Country Status (12)

Country Link
US (2) US20140318449A1 (en)
EP (1) EP2989228A4 (en)
JP (1) JP2016524648A (en)
KR (1) KR20160022299A (en)
CN (1) CN105264112A (en)
AR (2) AR096071A1 (en)
AU (1) AU2014257128A1 (en)
BR (1) BR112015027019A2 (en)
CA (1) CA2909532A1 (en)
MX (1) MX2015014937A (en)
TW (1) TW201500574A (en)
WO (1) WO2014176378A2 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
PL2979766T3 (en) * 2014-07-30 2018-07-31 Sturm Maschinen & Anlagenbau Gmbh Device and method for metallic coating and holder unit for the device
WO2016154301A1 (en) 2015-03-24 2016-09-29 Siva Power, Inc Thermal management of evaporation sources
FR3039669B1 (en) * 2015-07-31 2019-08-02 Air Liquide Electronics Systems SWIVEL TOUCH SCREEN FOR GAS DISTRIBUTION FACILITY.
WO2018184949A1 (en) * 2017-04-07 2018-10-11 Applied Materials, Inc. Method for cleaning a vacuum chamber, apparatus for vacuum processing of a substrate, and system for the manufacture of devices having organic materials
AU2018347983A1 (en) * 2017-10-09 2020-04-09 Knappco, LLC Control systems for liquid product delivery vehicles
US20190283063A1 (en) 2018-03-14 2019-09-19 Adam Zax Method and apparatus for inline coating of substrates

Citations (5)

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US5550570A (en) * 1989-01-17 1996-08-27 Canon Kabushiki Kaisha Ink jet cartridge mounting device and method
US5962085A (en) * 1991-02-25 1999-10-05 Symetrix Corporation Misted precursor deposition apparatus and method with improved mist and mist flow
US20090035465A1 (en) * 2007-07-30 2009-02-05 Micron Technology, Inc. Chemical vaporizer for material deposition systems and associated methods
EP2336078A1 (en) * 2009-12-18 2011-06-22 Anheuser-Busch InBev S.A. Pressurized gas driven liquid dispensing device comprising a piercing unit
US20110283943A1 (en) * 2010-05-18 2011-11-24 Hon Hai Precision Industry Co., Ltd. Vapor deposition apparatus

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US5550570A (en) * 1989-01-17 1996-08-27 Canon Kabushiki Kaisha Ink jet cartridge mounting device and method
US5962085A (en) * 1991-02-25 1999-10-05 Symetrix Corporation Misted precursor deposition apparatus and method with improved mist and mist flow
US20090035465A1 (en) * 2007-07-30 2009-02-05 Micron Technology, Inc. Chemical vaporizer for material deposition systems and associated methods
EP2336078A1 (en) * 2009-12-18 2011-06-22 Anheuser-Busch InBev S.A. Pressurized gas driven liquid dispensing device comprising a piercing unit
US20110283943A1 (en) * 2010-05-18 2011-11-24 Hon Hai Precision Industry Co., Ltd. Vapor deposition apparatus

Also Published As

Publication number Publication date
AR096070A1 (en) 2015-12-02
CN105264112A (en) 2016-01-20
TW201500574A (en) 2015-01-01
US20140322445A1 (en) 2014-10-30
AU2014257128A1 (en) 2015-11-12
MX2015014937A (en) 2016-05-09
BR112015027019A2 (en) 2017-08-22
JP2016524648A (en) 2016-08-18
US20140318449A1 (en) 2014-10-30
CA2909532A1 (en) 2014-10-30
EP2989228A2 (en) 2016-03-02
WO2014176378A2 (en) 2014-10-30
EP2989228A4 (en) 2016-12-14
KR20160022299A (en) 2016-02-29
US9562288B2 (en) 2017-02-07
AR096071A1 (en) 2015-12-02

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