WO2017204101A1

WO2017204101A1 - Projection exposure device and projection exposure method therefor

Info

Publication number: WO2017204101A1
Application number: PCT/JP2017/018781
Authority: WO
Inventors: 秀人小谷; 田中　良和; 隆正大庭
Original assignee: 株式会社サーマプレシジョン
Priority date: 2016-05-26
Filing date: 2017-05-19
Publication date: 2017-11-30
Also published as: KR20190010538A; CN109154785A; JP2017211534A; TW201805740A; JP6353487B2; SG11201810475VA; TWI730104B; KR102406914B1

Abstract

The present invention is provided with: a sliding table 120 having, formed thereon, a plurality of areas 110, 111 in which workpieces are placed; a first loader 310 and a second loader 311 which are capable of loading and unloading the workpieces 510, 511; a first position detection device 210; a second position detection device 211; a light source 10; a photomask 20; a projection optical system 50; and a control unit 410 which controls the sliding table 120 and each unit. When the workpiece 511 placed in the second area 111 is subjected to projection exposure, the control unit 410 executes parallel processing in which the placement position of the workpiece 510 placed in the first area 110 is detected. Furthermore, when the workpiece 510 placed in the first area 110 is subjected to projection exposure, the control unit 410 executes parallel processing in which the placement position of the workpiece 511 placed in the second area 111 is detected.

Description

Projection exposure apparatus and projection exposure method

The present invention relates to a technique for improving the throughput of a projection exposure apparatus, and more particularly to a technique for improving the throughput by reducing the total projection exposure time.

A projection exposure apparatus that uses a photolithography technique to transfer a pattern on a photomask (reticle) onto a work such as a wafer or a substrate is disclosed in, for example, Reference 1 or Reference 2.

In Cited Document 1, a pattern on an original plate (reticle: photomask) is placed on a table (or stage) that can move in the X (horizontal) -Y (vertical) -θ (rotation) direction via a projection lens. It is projected onto a single exposed object (work). The position of the object to be exposed (work) in each XY direction is detected by a position detection device using a laser interferometer. The cited document 1 discloses a step moving direction for highly accurately aligning the reticle and wafer in step exposure, and a moving direction of the wafer with respect to the laser interferometer of the position detection device.

In Cited Document 2, a table (or stage) on which a single workpiece is placed is not only movable in the X (horizontal) -Y (vertical) -θ (rotating) direction, but also on a photomask (reticle). The table to be placed is movable in the X (horizontal) -Y (vertical) -θ (rotation) direction. Citation 2 discloses that the scan direction and scan speed of both tables can be individually set.

JP 2001-203161 A Japanese Patent Laid-Open No. 11-260697

However, as a material for the workpiece, for example, a brittle material such as a crystal material or a brittle material such as glass even if it is amorphous may be used. It is necessary to take a slow time. For this reason, the time required for loading and unloading the workpiece into the exposure possible area on the stage requires a very long time such as 70 seconds.

In addition, due to the high definition of transfer patterns in recent years, high accuracy is required for the position detection of the workpiece on the stage when the pattern is transferred onto the workpiece by the projection exposure apparatus, and the time required for position detection is required. It tends to increase. Further, when performing exposure a plurality of times while moving to a plurality of positions as in step exposure or the like, more position detection time is required.

In the conventional projection exposure apparatuses such as Patent Documents 1 and 2, a work is first loaded at a predetermined position on the stage, then the position of the work on the stage is detected, and then the position detected next. In addition, exposure is performed after adjusting the position of the stage or photomask in each direction. That is, in the conventional projection exposure apparatus and the projection exposure method thereof, each process is performed individually one by one, and in order to reduce the total processing time, the time required for each individual process is reduced. Alternatively, there was no other way but to shorten the switching time between each process.

SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned problems, and loads / unloads workpieces in the projection exposure process, detects the position of a workpiece placed on the stage, and corresponds to the position of the workpiece. It is an object of the present invention to provide a projection exposure apparatus and a projection exposure method thereof that can reduce the total processing time compared to the prior art by enabling parallel execution of at least two projection exposure processes.

In order to achieve the above object, one embodiment of a projection exposure apparatus according to the present invention provides a predetermined pattern on a workpiece by projecting and exposing with a light from a light source in accordance with a predetermined pattern on the photomask. A projection exposure apparatus for forming a pattern, wherein two first areas and second areas are formed on a top surface of a part on which a work is placed so that the two works can be placed simultaneously without overlapping. The sliding table is configured to be alternately slid in the opposite direction and temporarily stopped at the predetermined first stop position and the second stop position at each direction end, and the workpiece into each area of the slide table. When the slide table is temporarily stopped at a predetermined first stop position, the first region is located immediately above the first region of the slide table. The work placed inside When the first position detecting device arranged to detect the position and the sliding table are temporarily stopped at a predetermined second stop position, the second position of the sliding table is directly above the second area. A second position detection device arranged to detect the placement position of the workpiece placed on the slide table and the second area of the slide table when the slide table is temporarily stopped at the predetermined first stop position. When the workpiece placed on the second area can be projected and exposed, and the sliding table is temporarily stopped at the predetermined second stop position, the first area of the sliding table is directly A light source, a photomask and a projection optical system, which are arranged at the upper part so as to be able to perform projection exposure on the workpiece placed in the first region, sliding of the sliding table and stopping at each stop position; Within each area by the first loader Control to control the processing of loading and unloading of the workpiece, detection of the placement position of the workpiece in each region by the position detection device, and projection exposure to the workpiece in each region by the light source, photomask and projection optical system And the control unit receives the workpiece placed in the first area when the workpiece placed in the second area is projected and exposed by the light source, the photomask and the projection optical system. The position of the workpiece placed in the second area is detected when the placement position is detected by the position detection device and the workpiece placed in the first area is projected and exposed by the light source, the photomask and the projection optical system. Parallel processing for detecting the placement position with the position detection device is performed.

In order to achieve the above object, one embodiment of a projection exposure method according to the present invention provides a predetermined pattern on a work by projecting and exposing a predetermined pattern on a photomask to a predetermined position on the work with light from a light source. A pattern is formed, and two first and second regions are formed on the uppermost surface of the part where the workpiece is placed so that the two workpieces can be placed at the same time. A projection exposure method using a projection exposure apparatus having a slide table configured to be capable of sliding to a predetermined first stop position and second stop position of each direction end, and (A) Sliding the slide table to temporarily stop the first area at a predetermined first stop position; (B) loading the work in the first area of the slide table; and (C) in the first area. To detect the placement position of the workpiece (D) re-sliding the sliding table to temporarily stop the first area at a predetermined second stop position; and (E) projecting a pattern on the photomask onto the work in the first area. And (F) if there is a workpiece that has undergone projection exposure in the second area of the sliding table, the projection exposure is completed from within the second area in parallel with the projection exposure process of (E). A step of unloading the workpiece, and (G) the process of the next cycle by exchanging the first area at the predetermined first stop position and the second area at the predetermined second stop position in the above (A) to (F) And the following cycles are performed by alternately exchanging the first area and the second area.

(A) to (c) are diagrams showing a schematic configuration when the slide table of the exposure apparatus of the first embodiment of the present invention stops at the first stop position, and (a) shows the first stop position. The side view in the case, (b) is a side view in the case of the second stop position, (c) is a top view. 3 is an operation flowchart of the exposure apparatus according to the first embodiment of the present invention.

DETAILED DESCRIPTION OF THE INVENTION General Description In one embodiment of a projection exposure apparatus according to the present invention, the projection exposure apparatus of the present invention projects a photomask with light from a light source in accordance with a predetermined pattern on a workpiece. A projection exposure apparatus that forms a predetermined pattern on a workpiece by exposure, wherein the two first workpieces are placed on the uppermost surface of a portion on which the workpiece is placed so that the two workpieces can be placed simultaneously without overlapping. A sliding table configured so that one region and a second region are formed and alternately slid in opposite directions and can be temporarily stopped at predetermined first stop positions and second stop positions of end portions in each direction; Two first loaders capable of individually loading and unloading workpieces into each area of the moving table, and the first area of the sliding table when the sliding table temporarily stops at a predetermined first stop position. In the first area directly above The first position detection device arranged to detect the placement position of the workpiece placed on the slide table and the second area of the slide table when the slide table temporarily stops at the predetermined second stop position. When the second position detection device arranged so as to detect the placement position of the workpiece placed in the second area and the sliding table are temporarily stopped at the predetermined first stop position immediately above. , When it is directly above the second area of the sliding table and can be projected and exposed to a workpiece placed in the second area, and when the sliding table is temporarily stopped at a predetermined second stop position, A light source, a photomask, a projection optical system, and a slide of the slide table, which are directly above the first area of the slide table and are arranged so that projection exposure can be performed on the workpiece placed in the first area. And stop at each stop position, Loading and unloading of workpieces in each region by a loader, detection of the placement position of the workpiece in each region by a position detection device, projection exposure to the workpiece in each region by a light source, a photomask and a projection optical system, A control unit that controls each process, and the control unit is mounted in the first area when the workpiece placed in the second area is projected and exposed by the light source, the photomask, and the projection optical system. The position of the placed workpiece is detected by the position detection device. Conversely, when the workpiece placed in the first area is projected and exposed by the light source, the photomask, and the projection optical system, the position is placed in the second area. Parallel processing for detecting the placement position of the placed workpiece by the position detection device is performed.

Another embodiment of the projection exposure apparatus according to the present invention is an exposure apparatus in which the projection exposure apparatus performs step exposure with a plurality of shots on a pattern to be projected and exposed on one workpiece.

In another embodiment of the projection exposure apparatus according to the present invention, a device for aligning a position of a pattern to be projected and exposed to a position of a workpiece whose position is detected includes a photomask in a vertical (Y) horizontal (X) height (Z) direction. Including a driving device that linearly moves in at least one direction.

In another embodiment of the projection exposure apparatus according to the present invention, the device for aligning the position of the pattern to be projected and exposed to the position of the workpiece whose position has been detected is tilt drive that changes the angle of the photomask from the plane orthogonal to the exposure light Includes devices.

In another embodiment of the projection exposure apparatus according to the present invention, a stage in which a device for aligning a pattern to be projected and exposed to a position of a workpiece whose position has been detected is placed in a vertical (Y) horizontal direction on a stage placed under a sliding table. (X) A drive device that linearly moves in at least one direction of the height (Z) direction is included.

In another embodiment of the projection exposure apparatus according to the present invention, a device for aligning a position of a pattern to be projected and exposed to a position of a workpiece whose position is detected includes a projection optical system configured to have a vertical (Y) horizontal (X) height (Z ) Including a driving device that moves linearly in at least one direction.

One embodiment of a projection exposure method using a projection exposure apparatus according to the present invention is to form a predetermined pattern on a workpiece by aligning a predetermined pattern on a photomask with a predetermined position on the workpiece and performing projection exposure with light from a light source. In addition, two first areas and second areas are formed on the uppermost surface of the part where the workpiece is placed so that the two workpieces can be placed at the same time and slide in the opposite directions alternately. And a projection exposure method using a projection exposure apparatus having a slide table configured to be capable of temporarily stopping to the predetermined first stop position and second stop position of each direction end, and (A) the slide table And a step of temporarily stopping the first area at a predetermined first stop position, (B) loading a work in the first area of the sliding table, and (C) a work in the first area. Step of detecting the placement position (D) re-sliding the sliding table to temporarily stop the first area at a predetermined second stop position; and (E) projecting and exposing a pattern on the photomask to the work in the first area; (F) When there is a workpiece for which the projection exposure has been completed in the second area of the sliding table, the workpiece for which the projection exposure has been completed from within the second area is performed in parallel with the projection exposure process of (E). A step of unloading, and (G) performing the process of the next cycle by exchanging the first area of the predetermined first stop position and the second area of the predetermined second stop position of (A) to (F), The subsequent cycles include steps of alternately exchanging the first area and the second area.

Advantageous Effects of Invention According to the exposure apparatus of the present invention, a plurality of regions are formed on the uppermost surface of a part on which a work is placed so that a plurality of works can be placed at the same time without sliding. ) And a reciprocating type sliding table configured to be capable of temporary stopping at a plurality of predetermined stopping positions, and in a sliding direction centering on a projection optical system that projects a pattern on a photomask onto a workpiece. By arranging the first loader of the workpiece and the position detection device of the workpiece on the sliding table on both sides in correspondence with different areas on the sliding table, the respective processes can be performed in parallel. Thereby, it is possible to provide a projection exposure apparatus and a projection exposure method thereof that can shorten the total exposure time of the workpiece as compared with the conventional case.

Description of Illustrated Embodiment <First Embodiment>
A first embodiment according to the present invention will be described below with reference to the drawings. FIGS. 1A and 1B show a schematic configuration of the exposure apparatus 1 according to the first embodiment of the present invention, and a substantially rectangular workpiece sliding table 120 on a workpiece stage base 140. Is installed.

On the work sliding table 120, two work placing first areas 110 and a work placing second area 111 are arranged at both ends of the long side of the sliding table 120. The first work placement area 110 and the second work placement area 111 are larger than the surface areas of the first work 510 and the second work 511, and each has a sufficient area for placing each work. In each area, a position recognition mark (ID) or a marker (not shown) indicating a reference point for position measurement may be provided at a place where each workpiece does not interfere.

The work sliding table 120 is connected to a control unit 410 including a microcomputer and a central processing unit (CPU) via an XYZ tilt driving unit 150. In response to a command from the control unit 410, a driving signal is sent from the XYZ tilt driving unit 150 to the work sliding table 120. The work sliding table 120 can precisely control the sliding distance and stop position on the plane of the sliding table by a driving mechanism (not shown). The work sliding table 120 is connected to a power source (not shown) and is supplied with electric power necessary for sliding.

The work stage base 140 is a base for tilting or tilting the work sliding table 120 in each of the X, Y, and Z directions, and a drive mechanism, a guide rail, or the like may be provided as necessary. In the present embodiment, the case of sliding only in the X direction will be described, but other directions and tilt functions can be used for alignment for exposing a predetermined pattern.

The work placement first area 110 is moved to the first stop position 610 or the second stop position 611 by sliding the work slide table 120 via the XYZ tilt driving unit 150 controlled by the control unit 410. You can move and stop at that position. The more detailed the pattern to be exposed, the higher the sliding accuracy and the stopping accuracy and the more precise control is required. For example, the first position detection unit 210 is disposed immediately above the work placement first area 110 when temporarily stopped at the first stop position 610. Further, in FIG. 1A, the first loader 310 is disposed on or near the area of the work placement first area 110 when temporarily stopped at the first stop position 610. The first loader 310 can unload the exposed work from the work placement first area 110 temporarily stopped at the first stop position 610, and can load the unexposed work from that area. For example, a conveyor (not shown) or the like can be used to send the exposed workpiece lowered from the workpiece slide table 120 to the next step or move the unexposed workpiece to the vicinity of the first loader 310. . An exposure projection optical system 50 is disposed immediately above the second stop position 611.

The work placement second area 111 also moves to the first stop position 610 or the second stop position 611 by sliding the work slide table 120 controlled by the control unit 410, and stops at that position. be able to. Since the first stop position 610 and the second stop position 611 are disposed at both ends of the long side of the substantially rectangular work sliding table 120, when the work is temporarily stopped at the first stop position 610, A first position detector 210 is disposed immediately above the placement first area 110, and a first loader 310 is disposed above or in the vicinity of the work placement first area 110. Although the projection optical system 50 for exposure is arranged immediately above the area 111, when it is temporarily stopped at the second stop position 611, the second position detection unit is located immediately above the work placement second area 111. 211 is arranged, a second loader 311 is arranged above or in the vicinity of the work placement second area 111, and an exposure projection optical system 50 is located immediately above the work placement first area 110. Be placed.

The light source unit 10, the photomask 20, the mask XYθ stage 30, and the mask tilt stage 40 are disposed further above the projection optical system 50 for exposure. In the case of FIG. 1A, the second light for placing the work when the exposure light from the light source unit 10 passes through the photomask 20 and the projection optical system 50 and is temporarily stopped at the first stop position 610. The second work 511 placed in the region 111 is exposed, whereby a predetermined pattern on the photomask 20 is transferred onto the second work 511.

The mask XYθ stage 30 is connected to a control unit 410 including a microcomputer and a central processing unit (CPU) via a mask XYθ stage driving unit 60. In response to a command from the control unit 410, a driving signal is sent from the masking XYθ stage driving unit 60 to the masking XYθ stage 30. The mask XYθ stage 30 is precisely controlled by a mask XYθ stage driving unit 60 that can be moved in the X direction (lateral direction), Y direction (vertical direction), and θ (rotation) direction on a stage plane (not shown). Furthermore, the stop position in the XYθ (vertical, horizontal, rotational) direction on the stage plane can be controlled. The mask XYθ stage 30 is also connected to a power supply (not shown) and is supplied with electric power necessary for movement in the XYθ (vertical, horizontal, rotational) direction.

The mask tilt stage 40 is connected to a control unit 410 including a microcomputer and a central processing unit (CPU) via a mask tilt stage driving unit 70. In response to a command from the control unit 410, a driving signal is sent from the mask tilt stage driving unit 70 to the mask tilt stage 40. The mask tilt stage 40 is in a state where the stage plane is precisely tilted (tilted) by the mask tilt stage driving unit 70 that can tilt the stage plane (not shown) from an angle perpendicular to the optical axis. The stop position can be controlled. The mask tilt stage 40 is also connected to a power source (not shown) and supplied with power necessary for tilting the stage plane.

The control unit 410 allows the workpiece sliding table 120, the workpiece stage base 140, and the mask XYθ stage so that the predetermined pattern on the photomask 20 is accurately transferred to a predetermined position on the second workpiece 511. 30 and the position of the tilt stage for mask 40 on the plane, and the angle and tilt angle on the plane are controlled. In that case, for example, using a photomask microscope (not shown), a workpiece microscope, or the like, control is performed so that the mask alignment mark on the photomask (not shown) matches the workpiece alignment mark on the workpiece. be able to. In addition, if necessary, the projection optical system 50 can also be provided with a drive unit and used for control for projecting a predetermined pattern on the photomask to a predetermined position on the work.

Next, the operation of this embodiment will be described with reference to FIG. First, when the process is started, it is confirmed whether or not the sliding table 120 is temporarily stopped at the first stop position 610 (S1). If the sliding table 120 is temporarily stopped at the first stop position 610 (S1: Yes), whether or not an unexposed workpiece is placed in the workpiece placement first area 110 of the sliding table 120. Is confirmed (S2). If the sliding table 120 is not temporarily stopped at the first stop position 610 (S1: No), it means that the sliding table 120 is temporarily stopped at the second stop position 611, and the process proceeds to step S7.

When an unexposed workpiece is not placed on the workpiece placement first area 110 of the sliding table 120 (S2: Yes), the control unit 410 places the unexposed workpiece on the first loader 310 for placing the workpiece. An instruction is output so as to load into one area 110 (S3). When an unexposed workpiece is placed in the workpiece placement first area 110 (S2: No), it is not necessary to load the unexposed workpiece, so the process proceeds to step S4, and the first command is sent from the controller 41. The 1-position detecting unit 210 detects the position of the first workpiece 510 in the workpiece placement first area 110 (S4). In that case, for example, a stage alignment mark on the stage and a work alignment mark on the work may be detected by a work microscope.

When the position of the first work 510 in the first work placement area 110 is detected, the control unit 410 slides the sliding table 120 from the first stop position 610 to the second stop position 611 on the XYZ tilt driving unit 150. (S5), and when the workpiece placement first area 110 on the sliding table 120 reaches the position directly below the projection optical system 50 in the case of the second stop position 611, a command to pause is output ( S6).

When the sliding table 120 is temporarily stopped at the second stop position 611, it is confirmed whether or not there is an exposed workpiece in the workpiece placement second region 111 of the sliding table 120 at the first stop position 610 (S7). ). When there is an exposed workpiece in the workpiece placement second area 111 (S7: Yes), the control unit 410 sends the exposed workpiece to the second loader 311 for the workpiece placement second region 111. Is unloaded (S8), and an instruction is output to load the unexposed workpiece into the workpiece placement second area 111 (S9). If there is no exposed workpiece in the workpiece placement second area 111 (S7: No), there is no need to unload the workpiece, so the process proceeds to step S9, where the unexposed workpiece is placed on the workpiece placement second. The area 111 is loaded (S9).

At the same time as loading the workpiece into the workpiece placement second area 111 after the processing of step S7, the first workpiece 510 whose position has been detected in the workpiece placement first region 110 is At the second stop position 611, transfer onto the first work 510 by projection exposure of a predetermined pattern of the photomask 20 is performed (S10). When the transfer of the predetermined pattern is completed, the control unit 410 outputs a command to slide the XYZ tilt driving unit 150 again (S11), and outputs a command to pause when the sliding table 120 reaches the first stop position 610. (S12).

When the sliding table 120 is temporarily stopped at the first stop position 610, it is confirmed whether or not there is an exposed workpiece in the workpiece placement first area 110 of the sliding table 120 at the first stop position 610 (S13). ). When there is an exposed workpiece in the workpiece placement first area 110 (S13: Yes), the control unit 410 sends the exposed workpiece to the first loader 310. A command is output to unload from (S14), and the process proceeds to step S16 to check whether there is any remaining unexposed workpiece (S16). If there is no exposed workpiece in the workpiece placement first area 110 (S13: No), it is not necessary to unload the workpiece, so the process proceeds to step S16 to determine whether there is no remaining unexposed workpiece. Is confirmed (S16).

At the same time as checking whether or not there is an exposed workpiece in the workpiece placement first area 110 of the sliding table 120 at the first stop position 610 after step S12, the workpiece placement second is performed simultaneously. For the second workpiece 511 whose position has been detected in the region 111, the transfer onto the second workpiece 511 by projection exposure of a predetermined pattern of the photomask 20 is performed at the second stop position 611 (S15), and the control unit In step S16, it is confirmed whether there is no unexposed workpiece remaining 410.

If there is no remaining unexposed workpiece (S16: Yes), the process is terminated. If there is any remaining unexposed workpiece (S16: No), the process returns to step S1 and the first workpiece placement is performed. It is confirmed whether or not the area 110 is temporarily stopped at the first stop position 610 (S1), and the subsequent processing is repeated.

Therefore, the projection exposure apparatus 1 of the present embodiment forms a predetermined pattern on the

workpieces

510 and 511 by aligning a predetermined pattern of the photomask 20 with a predetermined position on the

workpieces

510 and 511 and performing projection exposure with light from a light source. The projection exposure apparatus 1 has two

first areas

110 and 110 so that the two works 510 and 511 can be placed at the same time without overlapping each other on the uppermost surface of the part on which the

works

510 and 511 are placed. A sliding table 120 in which a second region 111 is formed and alternately slid in the opposite direction and configured to be capable of temporarily stopping at a predetermined first stop position 610 and second stop position 611 at each direction end; Two first loaders 310 and second loaders 311 capable of individually loading and unloading

workpieces

510 and 511 into each area of the sliding table 120, and the sliding table 120 are predetermined. When temporarily stopped at the first stop position 610, the placement position of the

workpiece

510 or 511 placed in the first area 110 is detected immediately above the first area 110 of the sliding table 120. When the arranged first position detecting device 210 and the sliding table 120 are temporarily stopped at a predetermined second stop position 611, the second area 111 is placed immediately above the second area 111 of the sliding table 120. When the second position detection device 211 arranged to detect the placement position of the

workpiece

510 or 511 placed on the slide table 120 and the slide table 120 temporarily stop at the predetermined first stop position 610, the slide Projection exposure can be performed on the

workpieces

510 and 511 placed in the second area 111 directly above the second area 111 in the table 120, and the sliding table 12. Is temporarily stopped at a predetermined second stop position 611, it is possible to perform projection exposure on the

workpieces

510 and 511 placed directly in the first area 110 on the sliding table 120 and in the first area 110. The light source 10, the photomask 20 and the projection optical system 50, the sliding of the sliding table 120 and the stop at each

stop position

610, 611, the workpiece 510 into each region by the

first loader

310, 511 loading and unloading,

position detection devices

210 and 211 for detecting the placement position of the

workpieces

510 and 511 in each region, and the light source 10, the photomask 20 and the projection optical system 50 to the

workpieces

510 and 511 in each region. A control unit 410 that controls each process of projection exposure, and the control unit 410 applies to the workpiece 511 placed in the second region 111. When projection exposure is performed by the light source 10, the photomask 20, and the projection optical system 50, the position of the workpiece 510 placed in the first area 110 is detected by the position detection device 210, and conversely, in the first area 110. The position detection device 211 detects the placement position of the workpiece 511 placed in the second region 111 when the workpiece 510 placed on the workpiece 510 is projected and exposed by the light source 10, the photomask 20 and the projection optical system 50. Parallel processing can be performed.

Further, the projection exposure apparatus 1 of the present embodiment can be an exposure apparatus that performs step exposure of a pattern to be projected and exposed on a

single workpiece

510 or 511 by a plurality of shots. Moreover, in the projection exposure apparatus 1 of each embodiment described above, a device that aligns the position of the pattern to be exposed to projection with the position of the

workpieces

510 and 511 whose positions have been detected is the vertical (Y) horizontal (X) height of the photomask 20. A drive device 60 that linearly moves in at least one of the (Z) directions and / or a device that aligns the pattern of the projection exposure to the position of the

workpieces

510 and 511 that have been detected can be obtained by a photo

Tilt drive devices

40 and 70 that change the angle of the mask 20 from the plane orthogonal to the exposure light may be included, and / or the pattern of the projection exposure is aligned with the position of the

workpieces

510 and 511 that have been detected. A stage in which the device is disposed under the sliding table 120 is linearly arranged in at least one of the vertical (Y), horizontal (X), and height (Z) directions. A drive device 150 that can be moved and / or a device that aligns the pattern of the projection exposure to the position of the

workpieces

510, 511 whose position has been detected, allows the projection optical system 50 to be vertically (Y) horizontally (X ) A drive device that moves linearly in at least one direction of the height (Z) direction can be included.

Further, the projection exposure method of the projection exposure apparatus 11 of the present embodiment matches the predetermined pattern of the photomask 20 with a predetermined position on the

workpieces

510 and 511, and performs projection exposure with light from the light source 10 to perform the projection exposure on the

workpieces

510 and 511. The two first regions 110 and the second region 110 are formed so that the two

workpieces

510 and 511 can be placed at the same time on the uppermost surface of the portion on which the

workpieces

510 and 511 are placed. Projection exposure having a slide table 120 in which regions 111 are formed and alternately slid in opposite directions and configured to be capable of temporarily stopping at predetermined first stop positions 610 and second stop positions 611 at the end portions in the respective directions. In the projection exposure method using the apparatus 1, (A) sliding the sliding table 120 to temporarily stop the first region 110 at a predetermined first stop position 610, and (B) a sliding table. Loading the

workpieces

510 and 511 in the first region 110 of the first column 120, (C) detecting the placement position of the

workpieces

510 and 511 in the first region 110, and (D) the sliding table 120. Re-sliding to temporarily stop the first area 110 at a predetermined second stop position 611; and (E) projecting and exposing a pattern on the photomask 20 to the

workpieces

510 and 511 in the first area 110; (F) When there are

workpieces

510 and 511 for which projection exposure has been completed in the second region 111 of the sliding table 120, projection exposure is performed from within the second region 111 in parallel with the projection exposure processing of (E). A step of unloading the

workpieces

510 and 511 that have finished, (G) the first region 110 of the predetermined first stop position 610 and the predetermined second stop position 61 of (A) to (F). Performs the processing of the next cycle interchanged second region 111, for subsequent cycles, has a step of performing interchanged with the first region 110 and the second region 111 are alternately, the.

As described above, in the first embodiment, the projection optical system 50, the first position detection unit 210, the second position detection unit 211, the first loader 310, and the second loader 311 are at the first or second stop positions. When paused, different processes on the first or second different area for placing the work are simultaneously executed in parallel with different processes such as work loading / unloading and position detection or projection exposure. Can do. Therefore, in comparison with the conventional case in which each process is continuously performed in series at the same place, parallel processing is possible in this embodiment, so that the processing time can be shortened.

1 Projection exposure apparatus 1
10 light source 20 photomask (reticle)
DESCRIPTION OF SYMBOLS 30 XY (theta) stage for masks 40 tilt stage for masks 50 projection optical system 60 XY (theta) stage drive part for masks 70 tilt stage drive part for masks 110 1st area | region for workpiece placement 111 2nd area | region for workpiece placement 120 Slide table for workpieces 140 Work stage base 150 XYZ tilt drive unit 210 First position detection unit 211 Second position detection unit 310 First loader 311 Second loader 410 Control unit 510 First work 511 Second work 610 First stop position 611 Second Stop position

Claims

A projection exposure apparatus that forms a predetermined pattern on the work by aligning a predetermined pattern of a photomask with a predetermined position on the work and performing projection exposure with light from a light source,
Two first regions and second regions are formed on the uppermost surface of the part where the workpiece is placed so that the two workpieces can be placed simultaneously without sliding, and alternately slide in opposite directions. A sliding table configured to be capable of temporary stop to the predetermined first stop position and second stop position of each direction end;
Two first loaders capable of individually loading and unloading the workpiece into the respective areas of the sliding table;
When the slide table is temporarily stopped at the predetermined first stop position, the placement position of the work placed in the first area is detected immediately above the first area of the slide table. A first position detection device arranged to
When the slide table is temporarily stopped at the predetermined second stop position, the placement position of the work placed in the second area is detected immediately above the second area of the slide table. A second position detection device arranged to
When the slide table is temporarily stopped at the predetermined first stop position, projection exposure is performed on the work placed directly in the second area of the slide table and in the second area. And when the slide table is temporarily stopped at the predetermined second stop position, the slide table is directly above the first region of the slide table and is placed in the first region. A light source, a photomask, and a projection optical system arranged so that the workpiece can be projected and exposed;
Sliding of the sliding table and stopping at each stop position, loading and unloading of the workpiece into each region by the first loader, detection of the placement position of the workpiece in each region by the position detection device, A control unit that controls each process of projection exposure to a work in each region by a light source, a photomask, and a projection optical system;
Have
When the control unit projects and exposes the work placed in the second area by the light source, the photomask, and the projection optical system, the placement position of the work placed in the first area is determined. The workpiece placed in the second area when the position detection device detects and conversely the workpiece placed in the first area is projected and exposed by the light source, photomask and projection optical system. A projection exposure apparatus that performs parallel processing of detecting the placement position of the projector with the position detection device.
The projection exposure apparatus according to claim 1, wherein the projection exposure apparatus is an exposure apparatus that performs step exposure of a pattern to be projected and exposed with a plurality of shots on one workpiece.
A device for aligning the position of the pattern to be projected and exposed to the position of the workpiece whose position has been detected is a drive device that linearly moves the photomask in at least one of the vertical (Y), horizontal (X), and height (Z) directions. The projection exposure apparatus according to claim 1 or 2.
The device for aligning the position of the pattern to be projected and exposed to the position of the workpiece whose position is detected includes a tilt driving device that changes the angle of the photomask from a plane orthogonal to the exposure light. The projection exposure apparatus described.
The device for aligning the position of the pattern to be projected and exposed to the position of the workpiece whose position has been detected moves the stage disposed under the sliding table to at least one in the vertical (Y) horizontal (X) height (Z) direction. The projection exposure apparatus according to any one of claims 1 to 3, further comprising a drive device that moves linearly in the direction.
A device for aligning the position of the pattern to be projected and exposed to the position of the workpiece whose position has been detected moves the projection optical system linearly in at least one of the vertical (Y), horizontal (X), and height (Z) directions. The projection exposure apparatus according to any one of claims 1 to 3, further comprising a drive device.
A predetermined pattern of the photomask is aligned with a predetermined position on the work, and projection exposure is performed with light from a light source to form the predetermined pattern on the work, and on the uppermost surface of the part on which the work is placed, Two first regions and second regions are formed so that the workpieces can be placed at the same time without overlapping, and alternately slide in opposite directions and a predetermined first stop position and second of each end portion in each direction. A projection exposure method using a projection exposure apparatus having a sliding table configured to be capable of being temporarily stopped at a stop position,
(A) sliding the slide table to temporarily stop the first region at the predetermined first stop position;
(B) loading the workpiece into the first region of the sliding table;
(C) detecting a placement position of the workpiece in the first region;
(D) re-sliding the sliding table to temporarily stop the first region at the predetermined second stop position;
(E) projecting and exposing a pattern on a photomask onto the work in the first region;
(F) If there is the workpiece that has undergone projection exposure in the second area of the slide table, the projection exposure is completed from within the second area in parallel with the projection exposure process of (E). Unloading said workpiece,
(G) The first region at the predetermined first stop position and the second region at the predetermined second stop position in (A) to (F) are replaced with each other to perform the process of the next cycle.
For subsequent cycles, the step of alternately exchanging the first region and the second region,
A projection exposure method comprising: