A substrate dryer causing no water mark on a substrate having a refinedcomplicated structure and capable of suppressing increase of a cost required for a drying treatment is provided. Drying gas of low-molecular silicone generated in a drying gas generation part is heated by a heater and thereafter supplied...http://www.google.fr/patents/US6401353?utm_source=gb-gplus-shareBrevet US6401353 - Substrate dryer
