Apparatus and methods for compensating for the movement of a substrate in a lithographic apparatus during a pulse of radiation include providing a pivotable mirror configured to move a patterned projection beam incident on the substrate in synchronism with the substrate....http://www.google.fr/patents/US7626181?utm_source=gb-gplus-shareBrevet US7626181 - Lithographic apparatus and device manufacturing method
Lithographic apparatus and device manufacturing method
