Photoresist compositions which are useful in a resist flow process are disclosed. A process for forming a contact hole pattern using the disclosed photoresist compositions is also disclosed. The disclosed photoresist resin includes a mixture of two or more polymers. Preferably, a mixture of a first copolymer...http://www.google.fr/patents/US6627379?utm_source=gb-gplus-shareBrevet US6627379 - Photoresist composition for resist flow process, and process for forming contact hole using the same
Photoresist composition for resist flow process, and process for forming ...
