A sensor for monitoring a conductive film in a substrate during chemical mechanical polishing generates an alternating magnetic field that impinges a substrate and induces eddy currents. The sensor can have a core, a first coil wound around a first portion of the core and a second coil wound around a...http://www.google.fr/patents/US6930478?utm_source=gb-gplus-shareBrevet US6930478 - Method for monitoring a metal layer during chemical mechanical polishing using a phase difference signal
Method for monitoring a metal layer during chemical mechanical polishing ...
