An apparatus is described comprising a phase shift mask having a transparent region. The transparent region comprises an etched region of a transparent layer. The etched region has a final etch depth that corresponds to a designed for phase shift and the designed for phase shift is greater than 180....http://www.google.fr/patents/US6428936?utm_source=gb-gplus-shareBrevet US6428936 - Method and apparatus that compensates for phase shift mask manufacturing defects
Method and apparatus that compensates for phase shift mask manufacturing defects
