It is an object to enhance the degree of freedom for the shape of an obtained magnetic field to enhance the inplane uniformity of thickness of first and second films when the first and second films are continuously formed on a substrate to be treated. A main electromagnetic coil 5 is provided outside...http://www.google.fr/patents/US6333269?utm_source=gb-gplus-shareBrevet US6333269 - Plasma treatment system and method
