The present invention provides a resist pattern thickening material, which can utilize ArF excimer laser light; which, when applied over a resist pattern to be thickened e.g., in form of lines and spaces pattern, can thicken the resist pattern to be thickened regardless of the size of the resist pattern...http://www.google.fr/patents/US7799508?utm_source=gb-gplus-shareBrevet US7799508 - Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same
Resist pattern thickening material and process for forming resist pattern ...
