A method is provided of fabricating a thin film transistor semiconductor film of polycrystalline silicon on a transparent substrate suitable for the manufacture of a liquid crystal display. A film of substantially amorphous silicon is placed on the transparent substrate. Suspended in the amorphous...http://www.google.fr/patents/US5827773?utm_source=gb-gplus-shareBrevet US5827773 - Method for forming polycrystalline silicon from the crystallization of microcrystalline silicon
Method for forming polycrystalline silicon from the crystallization of ...
