Provided are a mask pattern including a self-assembled molecular layer, a method of forming the same, and a method of fabricating a semiconductor device. The mask pattern includes a resist pattern formed on a semiconductor substrate and the self-assembled molecular layer formed on at least a sidewall...http://www.google.fr/patents/US20050227492?utm_source=gb-gplus-shareBrevet US20050227492 - Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device
Mask pattern for semiconductor device fabrication, method of forming the ...
