The present invention controls a temperature of a processing liquid to be in within an allowable processing temperature range, whereby the processing efficiency and throughputs can be improved, deterioration of the processing liquid is prevented, and the life of the processing liquid can be extended...http://www.google.fr/patents/US6878216?utm_source=gb-gplus-shareBrevet US6878216 - Substrate processing method and substrate processing system
Substrate processing method and substrate processing system
