A method enabling easy generation of a template handling pattern deformation due to optical conditions or process conditions and suitably detecting pattern position is disclosed. A first method extracts a feature component, that is, symmetry, not affected by optical conditions etc. from the pattern image...http://www.google.fr/patents/US20060126916?utm_source=gb-gplus-shareBrevet US20060126916 - Template generating method and apparatus of the same, pattern detecting method, position detecting method and apparatus of the same, exposure apparatus and method of the same, device manufacturing method and template generating program
Template generating method and apparatus of the same, pattern detecting ...
