A method of in-situ cleaning and deposition of device structures in a high density plasma environment. A device structure is located in a reaction chamber containing a sputter target. An ion containing gas located in the reaction chamber is exposed to an RF voltage to generate a high density plasma containing...http://www.google.fr/patents/US6187151?utm_source=gb-gplus-shareBrevet US6187151 - Method of in-situ cleaning and deposition of device structures in a high density plasma environment
Method of in-situ cleaning and deposition of device structures in a high ...
