Herein disclosed is a semiconductor integrated circuit device fabricating process for forming MISFETs over the principal surface in those active regions of a substrate, which are surrounded by inactive regions formed of an element separating insulating film and channel stopper regions, comprising: the...http://www.google.fr/patents/US6894334?utm_source=gb-gplus-shareBrevet US6894334 - Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same
Semiconductor integrated circuit device, process for fabricating the same ...
